CN101275105A - Cleaning agent for solar silicon chip - Google Patents
Cleaning agent for solar silicon chip Download PDFInfo
- Publication number
- CN101275105A CN101275105A CNA2007100388854A CN200710038885A CN101275105A CN 101275105 A CN101275105 A CN 101275105A CN A2007100388854 A CNA2007100388854 A CN A2007100388854A CN 200710038885 A CN200710038885 A CN 200710038885A CN 101275105 A CN101275105 A CN 101275105A
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- CN
- China
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- solar silicon
- cleaning agent
- silicon chip
- silicon wafers
- citric acid
- Prior art date
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Abstract
The present invention provides a solar silicon plate cleaning agent, characterized in that the cleaning agent is citric acid. The concentration of the citric acid is 5%. The invention has advantages of reducing the pollution of the water environment to a lower state in the manufacturing course of the solar silicon plate, reducing the corrosion capability of the device to a lower degree, greatly reducing the production cost of the solar silicon plate, beneficial to the wide application of the solar silicon plate.
Description
Technical field
The present invention relates to a kind of clean-out system, particularly a kind of cleaning agent for solar silicon chip.
Background technology
At present along with the raising of people to the understanding of the renewable energy resources, sun power extensively enters into people's the visual field and comes, because in making solar silicon wafers is with the single crystal rod dicing, and then carry out reduction processing obtaining satisfactory solar silicon wafers with alkaline sodium hydroxide, therefore must need with the tart clean-out system the cleaning that neutralizes of the solar silicon wafers in the manufacturing processed.General at present employing hydrochloric acid carries out pickling, because the hydrochloric acid soln after cleaning becomes waste, and hydrochloric acid is a kind of strong acid solution, therefore in the follow-up difficult problem that is treated as, attend the meeting if incline and to cause environmental pollution, and to carry out the significantly rising that harmless processing causes production cost, therefore selecting new clean-out system for use is a problem demanding prompt solution of producing solar silicon wafers.
Summary of the invention
The objective of the invention is to solve in the prior art and in producing solar silicon wafers, utilize hydrochloric acid, a kind of free of contamination cleaning agent for solar silicon chip is provided as the existing the problems referred to above of clean-out system.The present invention designs a kind of cleaning agent for solar silicon chip, it is characterized in that: described clean-out system is a citric acid.The concentration of citric acid is 5%.Advantage of the present invention is that the pollution to water surrounding is reduced to extremely low state in producing solar silicon wafers, an extremely low degree that also alleviates for the corrodibility of equipment, can reduce the production cost of solar silicon wafers greatly, help the wide popularization and application of solar silicon wafers.
Below in conjunction with example the present invention is elaborated.
Embodiment
After the solar silicon wafers after the cut mechanically is carried out reduction processing with sodium hydroxide, clean with clear water, with sodium hydroxide solar silicon wafers is being carried out making herbs into wool then, clean with clear water once more, be that 5% citric acid carries out pickling to solar silicon wafers with concentration subsequently, clean with pure water after the pickling, use the hydrofluoric acid rinsing then, clean oven dry once more with pure water.Can utilize citric acid that solar silicon wafers is carried out pickling mainly is to find after deliberation, originally carried out pickling except neutralizing with hydrochloric acid, also to handle the heavy metal ion in the making herbs into wool process of the solar silicon wafers in producing, but actual situation is that solar silicon wafers is being carried out can not producing heavy metal ion in the making herbs into wool process, therefore can utilize the citric acid of environmental sound that solar silicon wafers is carried out pickling.
Claims (2)
1. cleaning agent for solar silicon chip, it is characterized in that: described clean-out system is a citric acid.
2. by the described a kind of cleaning agent for solar silicon chip of claim 1, it is characterized in that: the concentration of citric acid is 5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007100388854A CN101275105A (en) | 2007-03-30 | 2007-03-30 | Cleaning agent for solar silicon chip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007100388854A CN101275105A (en) | 2007-03-30 | 2007-03-30 | Cleaning agent for solar silicon chip |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101275105A true CN101275105A (en) | 2008-10-01 |
Family
ID=39994968
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007100388854A Pending CN101275105A (en) | 2007-03-30 | 2007-03-30 | Cleaning agent for solar silicon chip |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101275105A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101817006A (en) * | 2010-03-22 | 2010-09-01 | 浙江矽盛电子有限公司 | Method for cleaning surface of solar silicon wafer |
| CN102533470A (en) * | 2011-12-29 | 2012-07-04 | 镇江市港南电子有限公司 | Silicon wafer cleaning liquid |
| CN102744230A (en) * | 2012-07-26 | 2012-10-24 | 浙江矽盛电子有限公司 | Cleaning method for dirty and stuck solar silicon chip |
-
2007
- 2007-03-30 CN CNA2007100388854A patent/CN101275105A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101817006A (en) * | 2010-03-22 | 2010-09-01 | 浙江矽盛电子有限公司 | Method for cleaning surface of solar silicon wafer |
| CN102533470A (en) * | 2011-12-29 | 2012-07-04 | 镇江市港南电子有限公司 | Silicon wafer cleaning liquid |
| CN102744230A (en) * | 2012-07-26 | 2012-10-24 | 浙江矽盛电子有限公司 | Cleaning method for dirty and stuck solar silicon chip |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20081001 |