CN101260476A - Purification system of electron beam composite plasma glow discharge - Google Patents
Purification system of electron beam composite plasma glow discharge Download PDFInfo
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- CN101260476A CN101260476A CNA2008101041681A CN200810104168A CN101260476A CN 101260476 A CN101260476 A CN 101260476A CN A2008101041681 A CNA2008101041681 A CN A2008101041681A CN 200810104168 A CN200810104168 A CN 200810104168A CN 101260476 A CN101260476 A CN 101260476A
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Abstract
The invention discloses a purifying system of the electron beam composition plasma cold-cathode discharge, comprising a vacuum unit, an electron smelting unit, a water cooling unit, a plasma cold-cathode discharge unit and a continuous feeding unit (1B), wherein, the electron smelting unit and the plasma cold-cathode discharge unit form an electron beam plasma beam combing and purifying unit (1A). In the purifying process, a material smelting tank (6) and a material collecting tank (9) are arranged, the controllable electron beam with a shape of focus and power on the material smelting tank (6) is adopted to smelt and purify the material, the plasma generated by the cold-cathode discharge is adopted to help the purification to ensure that the metal or nonmetal foreign material in the material is evaporated and purified in the plasma atmosphere.
Description
Technical field
The present invention relates to a kind of device that semi-conductor, metal and dielectric materials are purified in fusion process, more particularly say, be meant a kind of purification system of electron beam composite plasma glow discharge.
Background technology
A large amount of semi-conductor, metal and dielectric materialss that use often require these material impurities the least possible in the industry.Also produced the method for many purifications thereupon.In vacuum environment, utilize the mode of induction or resistive heating, utilize the different purification materials of impurity and raw material saturation vapour pressure, belong to the category of vacuum purification.Purify with respect to general vacuum, the present invention has following characteristics:
Conventional vacuum is purified and is reckoned without the fact that impurity exists with ionic species.The difference of the maximum of great-power electronic bundle and general induction and resistive heating is exactly, except can be used as general heating source application, can also change the valence state of impurity element in the material as the high-energy electron line, change the existing way and the structure of impurity element, auxiliary again electric field or magnetic field with the outside, what make that purification process not only comprises the molecule aspect utilizes that each element vapour pressure is different purifies, and comprises the different purification material that utilizes the movement locus of charged particle in magnetic field and electric field of charged particle aspect.
The mode that conventional vacuum is purified and adopted large size crucible (container) once to feed intake usually, and conventional vacuum equipment for purifying has only a vacuum chamber.During filler, open door for vacuum chamber, crucible or the container that material is housed placed vacuum chamber, filler no longer in whole fusion process, melting finish stove cold after, open vacuum chamber, material is taken out, finish the melting purification process.Utilize the large size crucible once to feed intake,, all might cause the dead angle of the heating zone of material in the crucible, or material heats, the inhomogenous situation of stirring takes place regardless of being in the sorrowful wall heating of crucible or in the heating of the bottom of crucible.And after introducing electric field and magnetic field, because the relation of crucible depth size is difficult in abundant purification material in the environment that utilizes material itself to produce plasma body.
Conventional vacuum is purified and usually smelting pot and collection crucible is united two into one, and promptly inserts a crucible in the vacuum chamber, both has been used for carrying material melting material and has purified, and also uses same crucible collection material.Be used to the main vacuum chamber that purifies and gather materials if vacuum system is divided into, with the prechamber that is used for repeatedly feeding in raw material, undersized melting pot and large-sized material-gathering device are set in main vacuum chamber simultaneously, can give full play to thorough, the sufficient advantage of purifying of melt on a small scale, and the mode that directly adopts the electron beam melt just may be with the material penetration, needn't worry to introduce the pollution of furnace charge that other type of heating cause etc.Melt can be introduced auxiliary purification modes such as electric field, magnetic field and generation plasma body easily on a small scale simultaneously.
Summary of the invention
The purification system that the purpose of this invention is to provide a kind of electron beam composite plasma glow discharge, this purification system includes electron beam melting unit, plasma melting unit, continuously feeding unit, the water-cooled unit that gathers materials, to be offered melting trough 6 in the main vacuum chamber 12 by the purification material by the continuously feeding unit, molten materials 5B in the melting trough 6 carries out melting and purifies under the effect of electron beam, ionic fluid, material is overflowed in the material collecting tank 9 under the drive of bearing pin 7 by the molten materials 5B after purifying then.The purification system of electron beam composite plasma glow discharge of the present invention, melting trough that can rotate and the material collecting tank with water-cooling structure are set in purification process, above melting trough, utilize the electron-beam melting and the purification material of power, focal length controllable shapes, the plasma body that utilizes glow discharge to produce is auxiliary purifies, and makes metal or nonmetallic impurity in the material evaporate purification in the plasma atmosphere.
The present invention is a kind of purification system of electron beam composite plasma glow discharge, this purification system includes vacuum unit, electron beam melting unit, plasma glow discharge unit, continuous feeding unit, water cooling unit, and electron beam melting unit, plasma glow discharge unit constitute the compound purifier units 1A of electron beam ionic fluid.
One end of the prechamber 15 of continuous feeding unit 1B is installed on the housing of main vacuum chamber 12 of the compound purifier units 1A of electron beam ionic fluid.The top of the main vacuum chamber 12 of the compound purifier units 1A of electron beam ionic fluid passes on left A electron beam gun mounting plate 4A and is fixed with A electron beam gun 3A, B electron beam gun 3B, and A electron beam gun 3A, B electron beam gun 3B are connected with high voltage electric service tank 1 by the electron beam gun lead-in wire respectively, the right side, top of main vacuum chamber 12 is fixed with C electron beam gun 3C, D electron beam gun 3D by B electron beam gun mounting plate 4B, and C electron beam gun 3C, D electron beam gun 3D are connected with high voltage electric service tank 1 by the electron beam gun lead-in wire respectively.Be connected with one of them lead riser of high voltage electric service tank 1 by electron beam gun lead-in wire 2 as D electron beam gun 3D.The top of main vacuum chamber 12 is equipped with plasma generator 27, is connected with water-cooled electrode 28 with plasma generator 27 and places in the main vacuum chamber 12, and be positioned at the top of melting trough 6.The bottom of melting trough 6 is provided with pin-and-hole 6C, and melting trough 6 is connected on the top of melting trough support 8 by bearing pin 7 and pin-and-hole 6C's, and the bottom of melting trough support 8 is installed on the bottom bracket 11.Be connected with A water cooled bottom plate 10A, B water cooled bottom plate 10B on the bottom bracket 11, on A water cooled bottom plate 10A, the B water cooled bottom plate 10B material collecting tank 9 is installed, the bottom of material collecting tank 9 and A water cooled bottom plate 10A, B water cooled bottom plate 10B joint are respectively equipped with A ceramic insulation pad 10C, B ceramic insulation pad 10D.
Behind the melting groove 6 of material 5A in going into the compound purifier units 1A of electron beam ionic fluid, under the effect of ionic fluid, electron beam, be smelted into molten materials 5B, molten materials 5B under the ionic fluid purification condition that is provided with, electron beam purification condition behind certain hour, by motor or the mechanical operating mechanism that is connected with bearing pin 7 melting groove 6 is tilted to material collecting tank 9 directions, make molten materials 5B flow in the material collecting tank 9; Flow in the process of material collecting tank 9 at molten materials 5B, adjust the angle of C electron beam gun 3C, D electron beam gun 3D, make that can follow molten materials 5B from the electron beam of C electron beam gun 3C, D electron beam gun 3D ejaculation incides the material collecting tank 9.Melting trough 6 flows into molten materials 5B in the material collecting tank 9 in the inclination mode, stream material end at melting trough 6 has C electron beam gun 3C heating and drainage always, guarantee that on the one hand near the molten materials 5B stream material end fully melts, can guarantee that by the scanning mode of regulating C electron beam gun 3C the molten materials 5B of C electron beam gun 3C convection current waterfall shape does scanning for the second time and purifies on the other hand.Purification material 5C in the material collecting tank 9 adopts D electron beam gun 3D scanning to stir and moulding, in this process, can change purification material 5C stacking states by adjusting D electron beam gun 3D output rating, and purification material 5C is purified for the third time.Purification material 5C is condensate in the material collecting tank 9 gradually from bottom to top gradually, and D electron beam gun 3D melts, stirs the upper surface of purification material 5C in the material collecting tank 9 all the time in this process, and forms local molten bath.By controlling the mobile of local molten bath, the material of further purifying.
Description of drawings
Fig. 1 is the structure iron of electron beam composite plasma glow discharge purification system of the present invention.
Fig. 2 is the unitary structure iron of continuous feed of the present invention.
Fig. 3 is the process diagrammatic sketch that melting trough is poured material into material collecting tank in the purification process.
Fig. 4 is the sectional view of melting trough.
Fig. 5 is the sectional view of material collecting tank.
Among the figure: the compound purifier units 1B. continuously feeding of 1A. electron beam ionic fluid unit
1. high voltage electric service tank 2. electron beam gun lead-in wires 3A.A electron beam gun 3B.B electron beam gun 3C.C electron beam gun
3D.D electron beam gun 4A.A mounting plate 4B.B mounting plate 5A. material 5B. molten materials
5C. purification material 6. melting trough 6A. cooling-water duct 6B. cell body 6C. pin-and-holes
7. bearing pin 8. melting trough supports 9. material collecting tank 9A. cooling-water duct 9B. cell bodies
10A.A water cooled bottom plate 10B.B water cooled bottom plate 10C.A ceramic insulation pad 10D.B ceramic insulation pad
11. bottom bracket 12. vacuum chambers 13. slide valves 14. feed chutes 15. prechambers
18A.A threaded hole 18B.B threaded hole 18C.C through hole 19. rotating machines 20. shaft couplings
21A.A bearing 21B.B bearing 21C.C bearing 21D.D bearing 22. feed shaft
23A.A screw gear 23B.A screw mandrel 24. driving toothed gear 25A.B screw gear 25B.B screw mandrels
26. end cap 27. plasma generators 28. water-cooled electrodes 29. main vacuum chamber's interfaces
Embodiment
The present invention is described in further detail below in conjunction with accompanying drawing.
The present invention is a kind of purification system of electron beam composite plasma glow discharge, this purification system includes vacuum unit, electron beam melting unit, plasma glow discharge unit, continuous feeding unit, water cooling unit (referring to shown in Figure 1), and electron beam melting unit, plasma glow discharge unit constitute the compound purifier units 1A of electron beam ionic fluid.
Vacuum unit includes prechamber 15 and main vacuum chamber 12, and prechamber 15 is a low pressure environment, and main vacuum chamber 12 is a hyperbaric environment.Prechamber 15 links to each other with the instrument that vacuumizes of the outside that is positioned over purification system of the present invention respectively with main vacuum chamber 12.
The electron beam melting unit includes high voltage electric service tank 1, A electron beam gun 3A, B electron beam gun 3B, C electron beam gun 3C, D electron beam gun 3D.
The plasma glow discharge unit includes plasma generator 27, water-cooled electrode 28.Water-cooled electrode 28 materials can be selected tungsten, molybdenum, copper, stainless steel, nickel, graphite, silver, zirconium, tantalum, aluminium and alloy thereof etc. according to the kind of purification material.In the present invention, the type of the power supply of plasma glow discharge unit feeding can be communicated with direct supply and power frequency, intermediate frequency, high frequency and radio-frequency power supply according to the needs of purification material.By adjusting voltage on the control electrode, produce optionally purify impurity in the material of parameters such as frequency that plasma body forms the electric current behind the loop and feed power supply, and the volatilization that guarantees to introduce electrode within the range of permission.
The water cooling unit includes the water cooling passageway that the cell body of water cooling passageway that the cell body of melting groove 6 is provided with, material collecting tank 9 is provided with, and for melting groove 6, material collecting tank 9 provide the chilled water unit of cooling water source, this chilled water unit places the outside of purification system of the present invention.Referring to shown in Figure 4, melting groove 6 is a v-shaped structure, and the bottom of melting groove 6 is provided with pin-and-hole 6C, is provided with cooling-water duct 6A in the cell body 6B of melting groove 6, and the import of cooling-water duct 6A and outlet are communicated with the chilled water unit of outside respectively.Referring to shown in Figure 5, be provided with cooling-water duct 9A in the cell body 9B of material collecting tank 9, the import of cooling-water duct 9A and outlet are communicated with the chilled water unit of outside respectively.The bottom of material collecting tank 9 is installed on A water cooled bottom plate 10A, the B water cooled bottom plate 10B by A ceramic insulation pad 10C, B ceramic insulation pad 10D.
Referring to shown in Figure 1, an end of the prechamber 15 of continuous feeding unit 1B is installed on the housing of main vacuum chamber 12 of the compound purifier units 1A of electron beam ionic fluid.The top of the main vacuum chamber 12 of the compound purifier units 1A of electron beam ionic fluid passes on left A electron beam gun mounting plate 4A and is fixed with A electron beam gun 3A, B electron beam gun 3B, and A electron beam gun 3A, B electron beam gun 3B are connected with high voltage electric service tank 1 by the electron beam gun lead-in wire respectively, the right side, top of main vacuum chamber 12 is fixed with C electron beam gun 3C, D electron beam gun 3D by B electron beam gun mounting plate 4B, and C electron beam gun 3C, D electron beam gun 3D are connected with high voltage electric service tank 1 by the electron beam gun lead-in wire respectively.Be connected with one of them lead riser of high voltage electric service tank 1 by electron beam gun lead-in wire 2 as D electron beam gun 3D.The top of main vacuum chamber 12 is equipped with plasma generator 27, is connected with water-cooled electrode 28 with plasma generator 27 and places in the main vacuum chamber 12, and be positioned at the top of melting trough 6.The bottom of melting trough 6 is provided with pin-and-hole 6C, and melting trough 6 is connected on the top of melting trough support 8 by bearing pin 7 and pin-and-hole 6C's, and the bottom of melting trough support 8 is installed on the bottom bracket 11.Be connected with A water cooled bottom plate 10A, B water cooled bottom plate 10B on the bottom bracket 11, on A water cooled bottom plate 10A, the B water cooled bottom plate 10B material collecting tank 9 is installed, the bottom of material collecting tank 9 and A water cooled bottom plate 10A, B water cooled bottom plate 10B joint are respectively equipped with A ceramic insulation pad 10C, B ceramic insulation pad 10D.
Referring to shown in Figure 2, A leading screw 23B, B leading screw 25B, feed shaft 22 are installed in the material feeding housing 16 of continuous feeding unit 1B; The left end of A leading screw 23B is installed in the A bearing 21A, A bearing 21A is connected the top, left side of material feeding housing 16, the right-hand member of A leading screw 23B is installed in the C bearing 21C behind the through hole by A threaded hole 18A, A gear 23A in turn, and C bearing 21C is connected the top, right side of material feeding housing 16; The left end of B leading screw 25B is installed in the B bearing 21B, B bearing 21B is connected the below, left side of material feeding housing 16, the right-hand member of B leading screw 25B is installed in the D bearing 21D behind the through hole by B threaded hole 18B, B gear 25B in turn, and D bearing 21D is connected the below, right side of material feeding housing 16; In the present invention, feed shaft 22 is made of sleeve and expansion link, and the sleeve right-hand member is connected on the C through hole 18C of double nut 18, and the left end of expansion link is inserted in the sleeve, and the right-hand member of expansion link is connected on the feed chute 14.Feed shaft 22 is positioned at the central position of material feeding housing 16, after the sleeve left end of feed shaft 22 stretches out centre hole 16A, realize being connected by the output shaft of shaft coupling 20 and rotating machine 19, the expansion link right-hand member of feed shaft 22 is installed on the feed chute 14 after passing the C through hole 18C of double nut 18.The motor 17 that moves ahead is installed on the material feeding housing 16 by terminal pad 17A, and the output shaft of the motor 17 that moves ahead is connected with driving toothed gear 24, driving toothed gear 24 and A gear 23A, B gear 25B engagement.Driving toothed gear 24 moves clockwise under the driving of the motor 17 that moves ahead, and then A gear 23A, the B gear 25B with its engagement is motion counterclockwise.The right side of material feeding housing 16 is connected with the left side of prechamber 15, is placed with feed chute 14 in the prechamber 15, and the top of prechamber 15 is provided with end cap 26, and the right-hand member of prechamber 15 is provided with slide valve 13.
Referring to shown in Figure 3, behind the melting groove 6 of material 5A in going into the compound purifier units 1A of electron beam ionic fluid, ionic fluid (the unitary water-cooled electrode 28 of plasma glow discharge produces), electron beam (the unitary A electron beam gun of electron beam melting 3A, B electron beam gun 3B generation) is smelted into molten materials 5B under the effect, the ionic fluid purification condition that molten materials 5B is being provided with, under the electron beam purification condition behind certain hour, by motor or the mechanical operating mechanism that is connected with bearing pin 7 melting groove 6 is tilted to material collecting tank 9 directions, make molten materials 5B flow in the material collecting tank 9; Flow in the process of material collecting tank 9 at molten materials 5B, adjust the angle of C electron beam gun 3C, D electron beam gun 3D, make that can follow molten materials 5B from the electron beam of C electron beam gun 3C, D electron beam gun 3D ejaculation incides the material collecting tank 9.Melting trough 6 flows into molten materials 5B in the material collecting tank 9 in the inclination mode, stream material end at melting trough 6 has C electron beam gun 3C heating and drainage always, guarantee that on the one hand near the molten materials 5B stream material end fully melts, can guarantee that by the scanning mode of regulating C electron beam gun 3C the molten materials 5B of C electron beam gun 3C convection current waterfall shape does scanning for the second time and purifies on the other hand.Purification material 5C in the material collecting tank 9 adopts D electron beam gun 3D scanning to stir and moulding, in this process, can change purification material 5C stacking states by adjusting D electron beam gun 3D output rating, and purification material 5C is purified for the third time.Purification material 5C is condensate in the material collecting tank 9 gradually from bottom to top gradually, and D electron beam gun 3D melts, stirs the upper surface of purification material 5C in the material collecting tank 9 all the time in this process, and forms local molten bath.By controlling mobile (adjusting output rating by D electron beam gun 3D realizes) in local molten bath, the material of further purifying.
The charging stage of the purification system of electron beam composite plasma glow discharge of the present invention is:
Guaranteeing to open the end cap 26 of prechamber 15 under the prerequisite that slide valve 13 cuts out, material 5A is added in the feed chute 14, close end cap 26, prechamber 15 is vacuumized processing.Prechamber 15 should keep the following vacuum tightness of 8Pa.Vacuumize finish after, open slide valve 13, move ahead motor 17 of utilization drives feed shaft 22 and drives feed chutes 14 and arrive main vacuum chamber's interfaces 29, utilizes rotating machine 19 to drive feed shaft 22 with certain rotating speed and rotates to certain angle, and material 5A is poured in the melting trough 6.After batch turning was finished, feed chute 14 was stepped back to prechamber 15 under rotating machine 19 counterrotation cons, closes slide valve 13, prepares charging next time.
The melting purification phase of the purification system of electron beam composite plasma glow discharge of the present invention is:
(pressure was less than 10 after the vacuum tightness for the treatment of main vacuum chamber 12 reached requirement
-3Pa), can enter the melting purification phase.Before melt begins, at first connect the power supply of plasma generator 27, the introducing of water-cooled electrode 28 can be adopted water-cooling pattern as required, introduces the material that produces electrode 28 and can select tungsten, molybdenum, copper, stainless steel, nickel, graphite, silver, zirconium, tantalum, aluminium and alloy thereof etc. according to the kind of purification material in main vacuum chamber.The type of the power supply that plasma generator 27 feeds can be communicated with direct supply and power frequency, intermediate frequency, high frequency and radio-frequency power supply according to the needs of purification material.According to the needs of purifying, by adjusting voltage on the control electrode, produce optionally purify impurity in the material of parameters such as frequency that plasma body forms the electric current behind the loop and feed power supply, and the volatilization that guarantees to introduce electrode within the range of permission.The atmosphere that plasma produces not only can be made up of rare gas element, also can utilize the steam of smelting material, and the gaseous product of separating in pyroprocess.Introduce between electrode and the melting trough 6 and can form aura or non-transfer type electric arc.The glow discharge that the secondary electron that the plasma body that produces in the vacuum environment of the melting of high-purity requirement attracts materials to be subjected to produce behind the beam bombardment by the electrode 28 of introducing melting trough 6 tops forms produces.
After given plasma generator 27 feeds required voltage, character according to the purification material, open A electron beam gun 3A and/or B electron beam gun 3B, and the line of control electron beam gun, the line of electron beam gun carries out carrying out purification processes to material 5A in fusion process, thereby make material 5A change molten materials 5B into, molten materials 5B carries out once in melting trough 6 or slowly cooling and remelting fast for several times, and wherein gas and impurity are progressively separated out.
After for some time, melting trough 6 drives bearing pin 7 to the inclination of material collecting tank 9 directions at motor or operating mechanism, makes molten materials 5B flow in the material collecting tank 9.
In the present invention, the electronic beam current of A electron beam gun 3A, B electron beam gun 3B, C electron beam gun 3C, D electron beam gun 3D outgoing in the melting purification process can be by adjusting the electric current of electron beam gun, the electron gun focusing scope, the scan mode of electron beam gun (linear reciprocation scan mode or concentrically ringed scan mode) is carried out regulated at will.Can make melting trough 6 swings by difference setting, stir and the fully effect of melting material to play to the electron beam gun processing parameter.
The purification system of electron beam composite plasma glow discharge of the present invention has following performance:
1. once reinforced in order to solve big volume crucible, the inadequate problem of melting that bottom type of heating melting causes, the present invention adopts continuous several times reinforced, utilizes 6 meltings of small volume purification melting trough to purify, and the mode that adopts large volume material collecting tank 9 to collect purification material 5C.
2. can realize that by the angle of adjusting C electron beam gun 3C, D electron beam gun 3D electron beam follows the material that purification molten materials 5B flows into to material collecting tank 9, to reach the purpose of abundant purification material.
3. purification melting trough 6 and material collecting tank 9 are set, the electron beam evaporation that can in the plasma atmosphere, work, purification material in main vacuum chamber 12.
4. can form aura or non-transfer type electric arc between the water-cooled electrode 28 among the present invention, the molten materials 5B in the melting trough 6.
5. the atmosphere of plasma generation not only can be made up of rare gas element, also can utilize the steam of smelting material, and the gaseous product of separating in pyroprocess.
6. the glow discharge that forms of the plasma body that produces of main vacuum chamber 12 secondary electron that attracts molten materials 5B to be subjected to produce behind the beam bombardment by water-cooled electrode 28 (water-cooled tungsten electrode) produces.
7. before batch turning (material is poured out from melting trough 6) only needs the line of control A electron beam gun 3A, B electron beam gun 3B, molten materials 5B can be carried out once or slow cooling for several times and remelting fast, and wherein gas and impurity are progressively separated out.This operating method is not suitable for for extensive melt, and not only efficient is low, and needs to heat for repeatedly large-scale refining material container repeatedly, brings many difficulties to production.But for adopting electron beam gun melting melting groove 6 materials, will be very simple and easy to do.
Claims (8)
1, a kind of purification system of electron beam composite plasma glow discharge includes vacuum unit, electron beam melting unit, water cooling unit, it is characterized in that: also include plasma glow discharge unit, continuous feeding unit (1B);
Electron beam melting unit, plasma glow discharge unit constitute the compound purifier units of electron beam ionic fluid (1A);
Described vacuum unit includes prechamber (15) and main vacuum chamber (12);
Described electron beam melting unit includes high voltage electric service tank (1), A electron beam gun (3A), B electron beam gun (3B), C electron beam gun (3C), D electron beam gun (3D);
Described plasma glow discharge unit includes plasma generator (27), water-cooled electrode (28);
One end of the prechamber (15) of continuous feeding unit (1B) is installed on the housing of main vacuum chamber (12) of the compound purifier units of electron beam ionic fluid (1A); The top of the main vacuum chamber (12) of the compound purifier units of electron beam ionic fluid (1A) passes on left A mounting plate (4A) and is fixed with A electron beam gun (3A), B electron beam gun (3B), and A electron beam gun (3A), B electron beam gun (3B) are connected with high voltage electric service tank (1) by the electron beam gun lead-in wire respectively, the right side, top of main vacuum chamber (12) is fixed with C electron beam gun (3C), D electron beam gun (3D) by B mounting plate (4B), and C electron beam gun (3C), D electron beam gun (3D) are connected with high voltage electric service tank (1) by the electron beam gun lead-in wire respectively; The top of main vacuum chamber (12) is equipped with plasma generator (27), is connected with water-cooled electrode (28) with plasma generator (27) and places in the main vacuum chamber (12), and be positioned at the top of melting trough (6); The bottom of melting trough (6) is provided with pin-and-hole (6C), and melting trough (6) is connected on the top of melting trough support (8) by bearing pin (7) and pin-and-hole (6C), and the bottom of melting trough support (8) is installed on the bottom bracket (11); Be connected with A water cooled bottom plate (10A), B water cooled bottom plate (10B) on the bottom bracket (11), on A water cooled bottom plate (10A), the B water cooled bottom plate (10B) material collecting tank (9) is installed, the bottom of material collecting tank (9) and A water cooled bottom plate (10A), B water cooled bottom plate (10B) joint are respectively equipped with A ceramic insulation pad (10C), B ceramic insulation pad (10D);
A leading screw (23B), B leading screw (25B), feed shaft (22) are installed in the material feeding housing (16) of continuous feeding unit (1B); The left end of A leading screw (23B) is installed in the A bearing (21A), A bearing (21A) is connected the top, left side of material feeding housing (16), the right-hand member of A leading screw (23B) is installed in the C bearing (21C) behind the through hole by A threaded hole (18A), A gear (23A) in turn, and C bearing (21C) is connected the top, right side of material feeding housing (16); The left end of B leading screw (25B) is installed in the B bearing (21B), B bearing (21B) is connected the below, left side of material feeding housing (16), the right-hand member of B leading screw (25B) is installed in the D bearing (21D) behind the through hole by B threaded hole (18B), B gear (25B) in turn, and D bearing (21D) is connected the below, right side of material feeding housing (16); Feed shaft (22) is made of sleeve and expansion link, and the sleeve right-hand member is connected on the C through hole (18C) of double nut (18), and the left end of expansion link is inserted in the sleeve, and the right-hand member of expansion link is connected on the feed chute (14); Feed shaft (22) is positioned at the central position of material feeding housing (16), after the sleeve left end of feed shaft (22) stretches out centre hole (16A), realize being connected by the output shaft of shaft coupling (20) and rotating machine (19), the expansion link right-hand member of feed shaft (22) is installed on the feed chute (14) after passing the C through hole (18C) of double nut (18); The motor (17) that moves ahead is installed on the material feeding housing (16) by terminal pad (17A), and the output shaft of the motor that moves ahead (17) is connected with driving toothed gear (24), driving toothed gear (24) and A gear (23A), B gear (25B) engagement.The right side of material feeding housing (16) is connected with the left side of prechamber (15), is placed with feed chute (14) in the prechamber (15), and the top of prechamber (15) is provided with end cap (26), and the right-hand member of prechamber (15) is provided with slide valve (13).
2, the purification system of electron beam composite plasma glow discharge according to claim 1, it is characterized in that: the water cooling unit includes the water cooling passageway that the cell body of water cooling passageway that the cell body of melting groove (6) is provided with, material collecting tank (9) is provided with, and the chilled water unit that cooling water source is provided for melting groove (6), material collecting tank (9).
3, the purification system of electron beam composite plasma glow discharge according to claim 1, it is characterized in that: melting groove (6) is a v-shaped structure, the bottom of melting groove (6) is provided with pin-and-hole (6C), be provided with cooling-water duct (6A) in the cell body (6B) of melting groove (6), the import of cooling-water duct (6A) and outlet are communicated with the chilled water unit of outside respectively.
4, the purification system of electron beam composite plasma glow discharge according to claim 1, it is characterized in that: be provided with cooling-water duct (9A) in the cell body (9B) of material collecting tank (9), the import of cooling-water duct (9A) and outlet are communicated with the chilled water unit of outside respectively.
5, the purification system of electron beam composite plasma glow discharge according to claim 1, it is characterized in that: driving toothed gear (24) moves clockwise under the driving of the motor that moves ahead (17), and then A gear (23A), the B gear (25B) with its engagement is motion counterclockwise.
6, the purification system of electron beam composite plasma glow discharge according to claim 1, it is characterized in that: flow in the process of material collecting tank (9) at molten materials (5B), adjust the angle of C electron beam gun (3C), D electron beam gun (3D), make that following molten materials (5B) from the electron beam of C electron beam gun (3C), D electron beam gun (3D) ejaculation flows out direction.
7, the purification system of electron beam composite plasma glow discharge according to claim 1, it is characterized in that: melting trough (6) flows into molten materials (5B) in the material collecting tank (9) in the inclination mode, stream material end at melting trough (6) has C electron beam gun (3C) heating and drainage always, guarantee on the one hand near the fully fusing of molten materials (5B) stream material end, can guarantee by the scanning mode of regulating C electron beam gun (3C) that the molten materials (5B) of C electron beam gun (3C) convection current waterfall shape is done on the other hand and scan purification for the second time.
8, the purification system of electron beam composite plasma glow discharge according to claim 1 is characterized in that: the purification material (5C) in the material collecting tank (9) adopts D electron beam gun (3D) scanning to stir and moulding.
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| Application Number | Priority Date | Filing Date | Title |
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| CN200810104168A CN100587088C (en) | 2008-04-16 | 2008-04-16 | Purification system of electron beam composite plasma glow discharge |
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| CN200810104168A CN100587088C (en) | 2008-04-16 | 2008-04-16 | Purification system of electron beam composite plasma glow discharge |
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| CN100587088C CN100587088C (en) | 2010-02-03 |
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| CN200810104168A Expired - Fee Related CN100587088C (en) | 2008-04-16 | 2008-04-16 | Purification system of electron beam composite plasma glow discharge |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102517460A (en) * | 2011-12-31 | 2012-06-27 | 宁波江丰电子材料有限公司 | Method for purifying tantalum powder and tantalum target |
| CN103952570A (en) * | 2014-04-15 | 2014-07-30 | 中国恩菲工程技术有限公司 | Novel pipe laying type V-shaped copper water jacket sluice |
| CN104520453A (en) * | 2011-11-10 | 2015-04-15 | 先进磁工艺股份有限公司 | Magneto-plasma separator and method for separation |
-
2008
- 2008-04-16 CN CN200810104168A patent/CN100587088C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104520453A (en) * | 2011-11-10 | 2015-04-15 | 先进磁工艺股份有限公司 | Magneto-plasma separator and method for separation |
| CN102517460A (en) * | 2011-12-31 | 2012-06-27 | 宁波江丰电子材料有限公司 | Method for purifying tantalum powder and tantalum target |
| CN102517460B (en) * | 2011-12-31 | 2014-02-05 | 宁波江丰电子材料有限公司 | Method for purifying tantalum powder and tantalum target |
| CN103952570A (en) * | 2014-04-15 | 2014-07-30 | 中国恩菲工程技术有限公司 | Novel pipe laying type V-shaped copper water jacket sluice |
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| Publication number | Publication date |
|---|---|
| CN100587088C (en) | 2010-02-03 |
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