CN101219851A - Mould made glass cavity and manufacturing method thereof - Google Patents
Mould made glass cavity and manufacturing method thereof Download PDFInfo
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- CN101219851A CN101219851A CNA200710200525XA CN200710200525A CN101219851A CN 101219851 A CN101219851 A CN 101219851A CN A200710200525X A CNA200710200525X A CN A200710200525XA CN 200710200525 A CN200710200525 A CN 200710200525A CN 101219851 A CN101219851 A CN 101219851A
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- protective membrane
- media layer
- ground
- produced glass
- model core
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Abstract
The invention relates to a model core of model-making glass, including base materials, a medium layer and a protection film, in which the medium layer is arranged on the base materials; the protection film is arranged on the medium layer; the protection film has a model-making surface of a model-making groove; the base material is silicon nitride and the material of the medium material is silicon material. The invention also provides a method for manufacturing the model core of the model-making glass.
Description
Technical field
The invention relates to a kind of moulded glass equipment, especially about a kind of die produced glass model core and manufacture method thereof.
Background technology
Along with Development of Multimedia Technology, digital camera, Kamera more and more are consumers in general's favor, when people's logarithmic code camera, Kamera are pursued miniaturization, its quality of image of shooting object is also proposed higher requirement, the image frame of promptly wishing shot object is clear, and the image quality of object depends on the quality of each optical module in the digital camera to a great extent.
Aspherical lens is optical module indispensable in the digital camera, and existing digital camera aspherical lens is to make by the model method.Because moulded glass need carry out under high temperature (about 600 ℃) and high pressure (10-30KN), so being equipped with aspherical lens, the model legal system need possess the die that strict design is produced, this die generally need possess following characteristics:
1. good chemical stability is to avoid producing reaction with glass;
2. enough hardness and physical strength are to avoid surperficial scratch;
3. high-temperature stability is decomposed in the model process avoiding;
4. resistance to sudden heating is to stand the high temperature punching press of model process;
5. having workability makes it be easy for being processed into specific optical surface;
6. die will have certain life-span to reduce cost.
Die produced glass model core comprises single material at least; or the unitized construction of ground and protective membrane; general ground material is stainless steel, silicon carbide, wolfram varbide etc.; and the material of protective membrane is generally diamond like carbon film (Diamond Like Film; DLC), precious metal plated film or precious metal alloys plated film; precious metal plated film such as iridium (Iridium; Ir), platinum (Platinum; Pt), ruthenium (Ruthenium; Ru) etc., precious metal alloys plated film such as iridium-ruthenium alloy (Ir-Ru), iridium-rhenium alloys (Ir-Re) etc.Diamond like carbon film (DLC) is difficult to reach the gratifying die life-span; and precious metal or precious metal alloys all have very strong chemical stability, enough hardness and high thermal resistance; but because tack is relatively poor between precious metal protective membrane and the ground; make die significantly reduce work-ing life, improved the cost of moulded glass indirectly.
In view of this, provide a kind of die produced glass model core that has than long life, protective membrane combine with ground closely and the model temperature is higher to be necessity in fact.
Summary of the invention
The object of the present invention is to provide a kind of have than long life, protective membrane combine with ground closely and the higher die produced glass model core of model temperature.
Another object of the present invention is to provide a kind of method of making above-mentioned die produced glass model core.
A kind of die produced glass model core, it comprises ground, media layer and protective membrane, this media layer is positioned at the surface of ground; this protective membrane is positioned at the surface of media layer; and the model face with a model groove, wherein the material of this ground is a silicon nitride, the material of this media layer is silicon materials.
A kind of manufacture method of die produced glass model core may further comprise the steps:
One ground is provided;
Deposition one deck media layer is in substrate surface;
At media layer surface deposition layer protecting film, can obtain die produced glass model core;
Wherein the material of this ground is a silicon nitride, and the material of this media layer is silicon materials.
This media layer is to be deposited on substrate surface by reactive d.c. sputtering, reactive sputter, reactive radio-frequency sputtering or the chemical vapor deposition method of exchanging.Compare prior art, die produced glass model core of the present invention have than long life, protective membrane combine with ground closely and the model temperature higher.
Description of drawings
Fig. 1 is the structural representation of die produced glass model core of the present invention.
Embodiment
Shown in Figure 1 in conjunction with reference; die produced glass model core of the present invention comprises ground 1, media layer 2 and protective membrane 3; wherein media layer 2 is positioned on this ground 1; protective membrane 3 is positioned on this media layer 2; this protective membrane 3 has the model face 31 of a model groove, and the material of this ground 1 is wolfram varbide (WC), and the material 2 of this media layer is noncrystalline hydrocarbon (amorphous C:H; be designated hereinafter simply as a-C:H) material, the material of this protective membrane 3 is silicon carbide (SiC) or iridium-platinum alloy (Ir-Pt).
The method of making this die produced glass model core may further comprise the steps:
One wolfram varbide ground 1 is provided;
Deposition one deck a-C:H media layer 2 is in ground 1 surface;
At media layer 2 surface deposition layer protecting films 3.
Wherein the a-C:H material of media layer 2 is on ground 1 by a kind of sputter in reactive d.c. sputtering (DC Reactive Sputtering), reactive interchange sputter (AC Reactive Sputtering) or the reactive radio-frequency sputtering methods such as (RF Reactive Sputtering).With argon gas (Ar) and methane (CH
4) or argon gas (Ar) and ethane (C
2H
6) mixed gas as the sputter source of the gas, in vacuum chamber, carry out reactive sputtering, control sputtering condition obtain the media layer 2 that a layer thickness is 2nm-8nm, the material of this media layer is by reactive sputtering and obtains a-C:H.
When the material of protective membrane 3 is silicon carbide; with silicon carbide is sputtering target material; a kind of with in argon gas and methane, krypton gas and methane, argon gas and hydrogen or krypton gas and the hydrogen as the sputter source of the gas; wherein methane or the hydrogen ratio in mixed gas is 5%-20%; the frequency of radio-frequency power supply is 13.56MHz; can obtain this protective membrane 3 by reactive radio-frequency sputtering, the thickness of this protective membrane 3 should be controlled between the 20-100nm.
When the material of protective membrane 3 is an iridium-platinum alloy, can obtain this protective membrane 3 by magnetically controlled DC sputtering or radio-frequency sputtering, the thickness of this protective membrane 3 should be controlled between the 20-100nm equally.
The a-C:H material can improve adhesivity between ground and the protective membrane as the media layer of die produced glass model core, can carry out the model circulation with the a-C:H material as the die produced glass model core of media layer and surpass 10000 times, thereby can significantly improve the die life-span.
In the die produced glass model core of another embodiment of the present invention, the material of ground 1 is silicon carbide (SiC), and the material of media layer 2 is silicon (Si), and the material of protective membrane 3 is silicon carbide (SiC) or iridium-platinum alloy (Ir-Pt).
The method of making this die produced glass model core may further comprise the steps:
One silicon carbide ground 1 is provided;
Deposition one deck silicon media layer 2 is in ground 1 surface;
At media layer 2 surface deposition layer protecting films 3.
Wherein the silicon materials of media layer 2 are by exchanging sputter (AC Sputtering), radio-frequency sputtering (RF Sputtering) or chemical vapor deposition (Chemical Vapor Deposition, a kind of surface that is deposited on ground 1 in the method such as CVD), wherein the thickness of silicon media layer 2 should be controlled to be 2-8nm.
When the material of protective membrane 3 is silicon carbide; with silicon carbide is sputtering target material; a kind of with in argon gas, krypton gas, argon gas and methane, krypton gas and methane, argon gas and hydrogen or krypton gas and the hydrogen as the sputter source of the gas; wherein methane or the hydrogen ratio in mixed gas is 5%-20%; the frequency of radio-frequency power supply is 13.56MHz; can obtain this protective membrane 3 by reactive radio-frequency sputtering, the thickness of this protective membrane 3 should be controlled between the 20-100nm.
When the material of protective membrane 3 is an iridium-platinum alloy, can obtain this protective membrane 3 by magnetically controlled DC sputtering or radio-frequency sputtering, the thickness of this protective membrane 3 should be controlled between the 20-100nm equally.
With silicon carbide is ground, is the adhesivity that media layer can significantly strengthen protective membrane and ground with silicon, thereby improves the die life-span.
In the die produced glass model core of the third embodiment of the present invention, the material of ground 1 is silicon nitride (Si
3N
4), the material of media layer 2 is silicon (Si), the material of protective membrane 3 is iridium-platinum alloy or silicon nitride.
The method of making this die produced glass model core may further comprise the steps:
One silicon nitride ground 1 is provided;
Deposition one deck silicon media layer 2 is in ground 1 surface;
At media layer 2 surface deposition layer protecting films 3.
Wherein the silicon materials of media layer 2 are by exchanging sputter (AC Sputtering), radio-frequency sputtering (RF Sputtering) or chemical vapor deposition (Chemical Vapor Deposition, a kind of surface that is deposited on ground 1 in the method such as CVD), wherein the thickness of silicon media layer 2 should be controlled to be 2-8nm.
When the material of protective membrane 3 is silicon nitride; with the silicon nitride is sputtering target material; with argon gas and nitrogen is the sputter source of the gas, silicon nitride can be deposited on the surface of media layer 2 by reactive d.c. sputtering or reactive radio-frequency sputtering, and the thickness of this protective membrane 3 should be controlled between the 20-100nm.
When the material of protective membrane 3 is an iridium-platinum alloy, can obtain this protective membrane 3 by magnetically controlled DC sputtering or radio-frequency sputtering, the thickness of this protective membrane 3 should be controlled between the 20-100nm equally.
With the silicon nitride is ground, is the adhesivity that media layer can significantly strengthen protective membrane and ground with silicon, thereby improves the die life-span.
In the die produced glass model core of the fourth embodiment of the present invention, the material of ground 1 is carbon boron nitride (BNC), and the material of media layer 2 is noncrystalline C:N (amorphous C:N is designated hereinafter simply as a-C:N), and the material of protective membrane 3 is iridium-platinum alloy or carbon boron nitride.
The method of making this die produced glass model core may further comprise the steps:
One carbon boron nitride ground 1 is provided;
The media layer 2 of deposition one deck a-C:N material is in ground 1 surface;
At media layer 2 surface deposition layer protecting films 3.
The a-C:N material of media layer 2 is on ground 1 by a kind of sputter in the methods such as reactive d.c. sputtering, reactive interchange sputter or reactive radio-frequency sputtering.With graphite is sputtering target material, is the sputter source of the gas with argon gas and nitrogen, can be with media layer 2 sputters of a-C:N material in ground 1 surface by above-mentioned reactive sputtering.
When the material of protective membrane 3 is the carbon boron nitride; with the carbon boron nitride is sputtering target material; with argon gas and nitrogen is the sputter source of the gas, by reactive d.c. sputtering, reactive exchange a kind of in the methods such as sputter or reactive radio-frequency sputtering with these protective membrane 3 sputters in the surface of media layer 2.
When the material of protective membrane 3 is an iridium-platinum alloy, can obtain this protective membrane 3 by magnetically controlled DC sputtering or radio-frequency sputtering, the thickness of this protective membrane 3 should be controlled between the 20-100nm equally.
With the a-C:N material is that media layer can improve the adhesivity between carbon boron nitride ground and the protective membrane, thereby improves the life-span of die.
Claims (10)
1. die produced glass model core; it comprises ground, media layer and protective membrane; this media layer is positioned at the surface of ground; this protective membrane is positioned at the surface of media layer; and this protective membrane has the model face of a model groove; it is characterized in that: the material of this ground is a silicon nitride, and the material of this media layer is silicon materials.
2. die produced glass model core as claimed in claim 1 is characterized in that: the thickness of this media layer is 2-8nm, and the thickness of this protective membrane is 20-100nm.
3. die produced glass model core as claimed in claim 1 is characterized in that: the material of this protective membrane is an iridoplatinum.
4. die produced glass model core as claimed in claim 1 is characterized in that: the material of this protective membrane is a silicon nitride.
5. the manufacture method of a die produced glass model core is characterized in that, this method may further comprise the steps:
One ground is provided;
Deposition one deck media layer is in substrate surface;
At media layer surface deposition layer protecting film;
Wherein the material of ground is a silicon nitride, and the material of media layer is silicon materials.
6. die produced glass model core as claimed in claim 5 is characterized in that: the thickness of this media layer is 2-8nm.
7. die produced glass model core as claimed in claim 5 is characterized in that: the thickness of this protective membrane is 20-100nm.
8. the manufacture method of die produced glass model core as claimed in claim 5 is characterized in that: the silicon materials of this media layer are by exchanging the surface that sputter or radio-frequency sputtering are deposited on this ground.
9. the manufacture method of die produced glass model core as claimed in claim 5; it is characterized in that: the material of this protective membrane is a silicon nitride; this protective membrane is to be sputtering target material with the silicon nitride; with argon gas and nitrogen is the sputter source of the gas, is deposited on the surface system of media layer by reactive d.c. sputtering or reactive radio-frequency sputtering silicon nitride.
10. die produced glass model core as claimed in claim 1 is characterized in that: the material of this protective membrane is an iridoplatinum, and it makes by magnetically controlled DC sputtering or radio-frequency sputtering.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA200710200525XA CN101219851A (en) | 2004-04-10 | 2004-04-10 | Mould made glass cavity and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA200710200525XA CN101219851A (en) | 2004-04-10 | 2004-04-10 | Mould made glass cavity and manufacturing method thereof |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100268596A Division CN100395202C (en) | 2004-04-10 | 2004-04-10 | Mould core for moulded glass and manufacture thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101219851A true CN101219851A (en) | 2008-07-16 |
Family
ID=39629976
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA200710200525XA Pending CN101219851A (en) | 2004-04-10 | 2004-04-10 | Mould made glass cavity and manufacturing method thereof |
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|---|---|
| CN (1) | CN101219851A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103132062A (en) * | 2011-12-02 | 2013-06-05 | 鸿富锦精密工业（深圳）有限公司 | Die core and manufacturing method thereof |
-
2004
- 2004-04-10 CN CNA200710200525XA patent/CN101219851A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103132062A (en) * | 2011-12-02 | 2013-06-05 | 鸿富锦精密工业（深圳）有限公司 | Die core and manufacturing method thereof |
| CN103132062B (en) * | 2011-12-02 | 2016-10-26 | 鸿富锦精密工业（深圳）有限公司 | Die and manufacture method thereof |
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Open date: 20080716 |