CN101215686B - PVD bushing magnetron sputtering technique using bushing before-sputtering negative grid bias in sputtering cabin to clean - Google Patents
PVD bushing magnetron sputtering technique using bushing before-sputtering negative grid bias in sputtering cabin to clean Download PDFInfo
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- CN101215686B CN101215686B CN2007100932167A CN200710093216A CN101215686B CN 101215686 B CN101215686 B CN 101215686B CN 2007100932167 A CN2007100932167 A CN 2007100932167A CN 200710093216 A CN200710093216 A CN 200710093216A CN 101215686 B CN101215686 B CN 101215686B
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Abstract
The invention discloses a process for cleaning physical vapor deposition bearing magnetron sputtering through minus bias before sputtering in a sputtering chamber, which comprises treatment before sputtering, bearing loading fixture, vacuum pumping, sputtering Ni gate layer, a sputtering AlSnCu friction reducing layer and testing size and shape. The keys are that after the sputtering chamber is vacuumized, the bearing is cleaned through the minus bias before sputtering, a magnetron sputtering first diffusion layer is added between the minus bias before sputtering cleaning and the physical vapor deposition bearing magnetron sputtering Ni gate layer, after the sputtering Ni gate layer, and a second diffusion layer is added before the sputtering AlSnCu friction reducing layer and the magnetron sputtering. The invention cleans the inner surface of the physical vapor deposition bearing through the minus bias, thereby improving the adhesion strength between a physical vapor deposition bearing sputtering film layer and a base. Through the method of magnetron sputtering diffusion layer, and through the metal structure and a mechanical interlock structure of the diffusion layer, the adhesion strength between the sputtering layer and the base and the sputtering layers are improved.
Description
Technical field
The invention belongs to the production technique of bearing shell, specifically, relate to a kind of bearing shell production technique of inner surface of bearing bush being cleaned by negative bias before spattering.
Background technology
Bearing shell is the critical movements parts of diesel engine heart, is again basi components and consumable part.
As the heart movement parts, they are critical movements parts of decision diesel engine performance and reliability.
As basi components, they are put in order diesel engine and play crucial supporting role.
Bearing shell in use lost efficacy, serious consequence such as will directly cause the main frame cylinder deformation or break.
Because bearing shell is running stores, occupies heart, diesel engine need disintegrate or the part disintegration during replacing, and the consumption worker is consuming time.Break down in the use, must cause the parking accident.This is definitely unallowed.
Since the last century the eighties, Austria rice crust (Miba) sliding surface bearing limited-liability company, Bael,Switzerland are adopted this (Balzers) company, (Federal-MogulWorld Wide is Inc.) with Federal-Mogul Wiesbaden Gmbh﹠amp in the German global company of expense moral riel-Mo Guer; Co.KG Wiesbaden company etc. has successively delivered many pieces of patents with regard to the structure of PVD bearing shell, and product has obtained applying in certain limit, makes significant progress.Commonly used processes bearing shell by the method for magnetron sputtering exactly.
Magnetron sputtering principle: in the sputter cabin of highfield, high-intensity magnetic field, high vacuum, feed small amounts of inert gas (argon gas).Electronics is subjected to the Lorentz force action in magnetic field and carries out spiral accelerated motion and collide with ar atmo under the condition of highfield, high-intensity magnetic field (field direction and direction of an electric field are angled).Ar atmo is ionized into positive argon ion (Ar
+) and another electronics.Argon ion (Ar
+) under electric field action, quicken to fly to sputtering target (negative electrode), make spattered material be dissociated into have at a high speed, the particulate of the high energy internal surface that condenses upon bearing shell that splashes out forms sputtered layer
Because the tempo of main frame is very fast in recent years, load and specific pressure obviously improve, and this has just proposed strict more requirement to the quality and the corresponding manufacturing process of PVD bearing shell.Bearing shell is packed into before the sputter cabin pre-treatment of spattering of matrix internal surface is removed dirt and can't be satisfied existing requirement, make after the processing, between sputtering layer and the matrix and the adhesion strength between sputtering layer and the sputtering layer limited.
Summary of the invention
The object of the present invention is to provide a kind of in the sputter cabin PVD bushing magnetron sputtering technique that negative bias is cleaned that carries out to the PVD inner surface of bearing bush, improve the adhesion strength between PVD bearing shell sputtered layer and the matrix.
A kind of PVD bushing magnetron sputtering technique that spatters preceding negative bias cleaning by bearing shell in the sputter cabin, pass through electrochemical deoiling out of my cabin with the ordinary method of producing the PVD bearing shell, pickling, electrolytic degreasing, ultrasonic cleaning, treatment trough, driving, baking oven, rectifier, control subsystems etc. spatter pre-treatment, bearing shell is packed in the magnetron sputtering cabin on the anchor clamps, the magnetron sputtering cabin vacuumizes, sputter nickel-barrier layer (Ni), sputter aluminum alloy antifriction layer (AlSnCu), check size and outward appearance, its key is: described sputter cabin vacuumize and the sputter nickel-barrier layer between bearing shell spattered before negative bias clean, the processing condition that negative bias was cleaned before described bearing shell spattered: PVD bearing shell matrix is in the sputter cabin that vacuumizes, and temperature is 30～60 ℃ in the sputter cabin; The working gas partial pressure of ar gas is 1～3Pa.Adopt 1Cr18Ni9Ti stainless steel target, do not adorn magnet in the target.To the energising of PVD bearing shell matrix, PVD bearing shell matrix voltage is-300～-1600 volts; PVD bearing shell matrix electric current is 0.4～2.5 ampere; Treatment time: 3～40 minutes.Satisfy the preceding negative bias of spattering of above-mentioned processing parameter and clean, to carried out completely " online cleaning " by the workpiece of sputter, from improving the adhesion strength between sputtered layer and the matrix.
In order further to improve the intensity of PVD bearing shell matrix and sputtering layer and sputtering layer and sputtering layer, can be before described bearing shell spatters set up magnetron sputtering first diffusion layer between negative bias cleaning and the bearing shell matrix sputter nickel-barrier layer; Set up magnetron sputtering second diffusion layer between described sputter nickel-barrier layer and the sputter aluminum alloy antifriction layer; The processing condition of described magnetron sputtering first diffusion layer: PVD bearing shell matrix is in the sputter cabin that vacuumizes, the matrix lining layer that participates in spattering mutually is CuPbSn, employing purity is 99.99% nickel target, and to the energising of PVD bearing shell matrix, PVD bearing shell matrix negative bias is-300～-1700 volts; PVD bearing shell matrix electric current is 0.5～2 ampere; To the energising of nickel target, the logical negative voltage of nickel target is-200～-620 volts; The nickel target current is 0.3～1 ampere; It is 3～40 minutes that matrix lining layer and nickel target spatter the treatment time mutually; Last each weight percentages of components of first diffusion layer is as follows: Cu 0～5%; CuPb 2～5%; CuPbSn 5～10%; CuNi 10～30%; CuPbSnNi 3～15%; The CuPbNi surplus; The processing condition of described magnetron sputtering second diffusion layer: the PVD bearing shell matrix that is coated with nickel-barrier layer is in the sputter cabin that vacuumizes, the nickel-barrier layer that participates in spattering mutually is Ni, employing purity is 99.2% Al-Sn-Cu alloys target, the weight percentage of tin in this Al-Sn-Cu alloy: 16～24%; The weight percentage of copper: 0.6～1.5%; All the other are the weight percentage of aluminium, to the energising of PVD bearing shell matrix, PVD bearing shell matrix negative bias :-150～-1600 volts; PVD bearing shell matrix electric current is 0.3～2 ampere; To the energising of Al-Sn-Cu alloys target, Al-Sn-Cu alloys target negative voltage :-150～-600 volts; Al-Sn-Cu alloys target electric current: 0.2～1 ampere; Nickel-barrier layer (4) spatters the treatment time mutually with the Al-Sn-Cu alloys target: 2～30 minutes; Each weight percentages of components of the second last diffusion layer (5) is as follows: Ni 0～3%; Ni 3Al 2～15%; NiAl 5～10%; Al3Ni210～30%; Al 10～20%; NiAlSnCu 0～15%; AlSnCu 10～25%; The AlSn surplus.Between sputtering layer and matrix and sputtering layer and sputtering layer,,, further improve adhesion strength between sputtering layer and matrix and sputtering layer and the sputtering layer by strong structure of the metal of diffusion layer and mechanical interlock by the method for magnetron sputtering diffusion layer.
The present invention produces the detection of bearing shell
(1) draws the lattice check
Firmly be deep to 16 of grid square matrix, length of side 1mm with sharp-pointed, sharp pocket knife, do not find that sputtering layer has any part to break away from the phenomenon of matrix from surperficial the drawing of sputtering layer.This obviously is better than the index (drawing two parallel lines at a distance of 2mm) that GB5270-85 provides.
(2) thermal shock check
To (190～200) ℃ insulation half an hour, drop into quenching in the distilled water of room temperature at electric heating air blast baking box internal heating after the taking-up immediately; Under the fluorescent lamp lighting condition of natural light or 40W, detect by an unaided eye after drying moisture, find to bubble, peel phenomenon.Adhesion strength between sputtering layer and the matrix, between sputtering layer and the sputtering layer obviously is better than the index (quenching after (140～160) ℃ baking) that GB5270-85 provides.
Beneficial effect: the bearing shell that the present invention produces negative bias of carrying out to the PVD inner surface of bearing bush in the sputter cabin is cleaned, and improves the adhesion strength between PVD bearing shell sputtered layer and the matrix.Between sputtering layer and matrix and sputtering layer and sputtering layer,,, improve adhesion strength between sputtering layer and matrix and sputtering layer and the sputtering layer by strong structure of the metal of diffusion layer and mechanical interlock by the method for magnetron sputtering diffusion layer.
Description of drawings
Fig. 1 is the section stratiform structural representation that the present invention produces the PVD bearing shell.
Embodiment
Embodiment 1
As shown in Figure 1, spatter the PVD bushing magnetron sputtering technique that preceding negative bias is cleaned by bearing shell in the sputter cabin, pass through electrochemical deoiling out of my cabin with the ordinary method of producing the PVD bearing shell earlier, pickling, electrolytic degreasing, ultrasonic cleaning, treatment trough, driving, baking oven, rectifier, control subsystems etc. spatter pre-treatment, bearing shell is packed in the magnetron sputtering cabin on the anchor clamps, the magnetron sputtering cabin vacuumizes, negative bias was cleaned before bearing shell spattered, PVD bearing shell matrix 1 is in the sputter cabin that vacuumizes, adopt the stainless steel target, to 1 energising of PVD bearing shell matrix, PVD bearing shell matrix 1 voltage is-1600 volts; PVD bearing shell matrix 1 electric current is 2.5 amperes; Treatment time is 3 minutes.Magnetron sputtering first diffusion layer 3, PVD bearing shell matrix 1 are in the sputter cabin that vacuumizes, and employing purity is 99.99% nickel target, and PVD bearing shell matrix negative bias is-1700 volts; PVD bearing shell matrix electric current is 2 amperes; Nickel target negative voltage is-200 volts; The nickel target current is 0.3 ampere; Treatment time is 8 minutes; Last first diffusion layer, 3 each weight percentages of components are as follows: CuPb 2%; CuPbSn 10%; CuPbSn 5%; CuNi 30%; CuPbSnNi 3%; The CuPbNi surplus; First diffusion layer, 3 thickness 0.05um, use conventional method sputter nickel-barrier layer (Ni) 4, magnetron sputtering second diffusion layer 5 again, the PVD bearing shell matrix that is coated with nickel-barrier layer (Ni) 4 is in the sputter cabin that vacuumizes, the nickel-barrier layer 4 that participates in spattering mutually is Ni, employing purity is 99.2% Al-Sn-Cu alloys target, employing purity is 99.2% Al-Sn-Cu alloys target, the weight percentage of tin in this Al-Sn-Cu alloy: 24%; The weight percentage of copper: 0.6%; All the other are the weight percentage of aluminium, and PVD bearing shell matrix negative bias is-200 volts; PVD bearing shell matrix electric current is 0.3 ampere; Nickel target negative voltage is-180 volts; The nickel target current is 0.2 ampere; Treatment time is 6 minutes; The second last diffusion layer 5 each weight percentages of components are as follows: Ni 3%; Ni
3Al 15%; NiAl 5%; Al
3Ni
230%; Al 10%; AlSnCu10; The AlSn surplus, second diffusion layer, 5 thickness 0.05um.When magnetron sputtering first diffusion layer 3 and second diffusion layer 5 in the sputter cabin temperature be 50 ℃; The working gas partial pressure of ar gas is 0.41Pa.Then sputter aluminum alloy antifriction layer (AlSnCu) 6, check size and outward appearance, when negative bias was cleaned before bearing shell was spattered in the sputter cabin temperature be 30 ℃; The working gas partial pressure of ar gas is 1Pa.
Spatter preprocessing system out of my cabin
Form by electrochemical deoiling, pickling, electrolytic degreasing, ultrasonic cleaning, treatment trough, driving, baking oven, rectifier, control subsystem etc.
Host computer system
Form by pump swab system, drive subsystem, power supply, cabin, magnetic control source, temperature control subsystem, industrial computer control subsystem etc.
Spatter after-treatment system
Form by vaccum memory, baking oven, detection, finish, oil sealing, plastic packaging etc.
Workpiece
The connecting rod bearing shell of external diameter 112mm, thickness 3.4mm.
Spatter in the whole operation pre-treatment, with bearing shell pack into anchor clamps, vacuumize, sputter nickel-barrier layer (Ni) 4, sputter aluminum alloy antifriction layer (AlSnCu) 6, check that technologies such as size, outward appearance, fixed length cutting operation all are the technology of present general routine, all whole manufacturing processing unitss all are existing equipment.
Embodiment 2
As shown in Figure 1, spatter the PVD bushing magnetron sputtering technique that preceding negative bias is cleaned by bearing shell in the sputter cabin, bearing shell spatters preceding negative bias cleaning condition: PVD bearing shell matrix 1 voltage is-300 volts; PVD bearing shell matrix 1 electric current is 0.4 ampere; Treatment time is 40 minutes; Magnetron sputtering first diffusion layer 3 processing condition: PVD bearing shell matrix negative bias is-300 volts; PVD bearing shell matrix electric current is 0.5 ampere; Nickel target negative voltage is-620 volts; The nickel target current is 1 ampere; Treatment time is 40 minutes; Last first diffusion layer, 3 each weight percentages of components are as follows: Cu 5%; CuPb 5%; CuPbSn 5%; CuPbSn 10%; CuNi 10%; CuPbSnNi 15%; The CuPbNi surplus; First diffusion layer, 3 thickness 0.5um, the processing condition of described magnetron sputtering second diffusion layer 5: employing purity is 99.2% Al-Sn-Cu alloys target, (the weight percentage of tin: 16%; The weight percentage of copper: 1.5%; All the other are the weight percentage of aluminium), PVD bearing shell matrix negative bias :-1600 volts; PVD bearing shell matrix electric current: 2 amperes; Nickel target negative voltage :-600 volts; Nickel target current: 0.1 ampere; Treatment time: 2 minutes; The second last diffusion layer 5 each weight percentages of components are as follows: Ni
3Al2%; NiAl 10%; Al
3Ni
210%; Al 20%; NiAlSnCu 15%; AlSnCu 25%; The AlSn surplus, second diffusion layer, 3 thickness 0.5um.When described magnetron sputtering first diffusion layer 3 and second diffusion layer 5 in the sputter cabin temperature be 98 ℃; The working gas partial pressure of ar gas is 1Pa.
When negative bias was cleaned before bearing shell spattered in the sputter cabin temperature be 60 ℃; The working gas partial pressure of ar gas is 3Pa.All the other each technologies and use equipment are identical with embodiment 1.
As shown in Figure 1, spatter the PVD bushing magnetron sputtering technique that preceding negative bias is cleaned by bearing shell in the sputter cabin, bearing shell spatters preceding negative bias cleaning condition: PVD bearing shell matrix 1 voltage is-750 volts; PVD bearing shell matrix 1 electric current is 1.5 amperes; Treatment time is 40 minutes; Magnetron sputtering first diffusion layer 3 processing condition: PVD bearing shell matrix negative bias is-1000 volts; PVD bearing shell matrix electric current is 1.2 amperes; Nickel target negative voltage is-400 volts; The nickel target current is 0.6 ampere; Treatment time: 23 minutes; Last first diffusion layer, 3 each weight percentages of components are as follows: Cu 2.5%; CuPb 3.5%; CuPbSn 7.5%; CuPbSn 7.5%; CuNi20%; CuPbSnNi 9%; The CuPbNi surplus; First diffusion layer, 3 thickness 1um, the processing condition of described magnetron sputtering second diffusion layer 5: employing purity is 99.2% Al-Sn-Cu alloys target, (the weight percentage of tin: 20%; The weight percentage of copper: 1%; All the other are the weight percentage of aluminium), PVD bearing shell matrix negative bias is-900 volts; PVD bearing shell matrix electric current: 1.1 amperes; Nickel target negative voltage :-400 volts; Nickel target current: 0.6 ampere; Treatment time: 16 minutes; The second last diffusion layer 5 each weight percentages of components are as follows: Ni 1.5%; Ni
3Al 8%; NiAl 12%; Al
3Ni
215%; Al 15%; NiAlSnCu7%; AlSnCu 17%; The AlSn surplus.Second diffusion layer, 3 thickness 1um.When described magnetron sputtering first diffusion layer 3 and second diffusion layer 5 in the sputter cabin temperature be 70 ℃; The working gas partial pressure of ar gas is 0.7Pa.
When negative bias was cleaned before bearing shell spattered in the sputter cabin temperature be 50 ℃; The working gas partial pressure of ar gas is 1.5Pa.All the other each technologies and use equipment are identical with embodiment 1.
Claims (4)
- One kind spatter by bearing shell in the sputter cabin before the PVD bushing magnetron sputtering technique that cleans of negative bias, comprise and spatter pre-treatment, bearing shell is packed in the sputter cabin on the anchor clamps, the sputter cabin vacuumizes, sputter nickel-barrier layer (4), sputter aluminum alloy antifriction layer (6), check size and outward appearance, it is characterized in that: described sputter cabin vacuumize and sputter nickel-barrier layer (4) between bearing shell spattered before negative bias clean, the processing condition that negative bias was cleaned before described bearing shell spattered: PVD bearing shell matrix (1) is in the sputter cabin that has vacuumized, adopt 1Cr18Ni9Ti stainless steel target, to PVD bearing shell matrix (1) energising, PVD bearing shell matrix (1) voltage is-300～-1600 volts; PVD bearing shell matrix (1) electric current is 0.4～2.5 ampere; Treatment time is 3～40 minutes; Before spattering, described bearing shell sets up magnetron sputtering first diffusion layer (3) between negative bias cleaning and bearing shell matrix (1) the sputter nickel-barrier layer (4); Set up magnetron sputtering second diffusion layer (5) between described sputter nickel-barrier layer (4) and the sputter aluminum alloy antifriction layer (6).
- According to claim 1 is described spatter by bearing shell in the sputter cabin before the PVD bushing magnetron sputtering technique that cleans of negative bias, it is characterized in that: described bearing shell is spattered before negative bias when cleaning in the sputter cabin temperature be 30～60 ℃; The working gas partial pressure of ar gas is 1～3Pa.
- 3. spatter the PVD bushing magnetron sputtering technique that preceding negative bias is cleaned according to claim 1 is described by bearing shell in the sputter cabin, it is characterized in that: the processing condition of described magnetron sputtering first diffusion layer (3): PVD bearing shell matrix is in the sputter cabin that vacuumizes, the matrix lining layer (1) that participates in spattering mutually is CuPbSn, employing purity is 99.99% nickel target, to the energising of PVD bearing shell matrix, PVD bearing shell matrix negative bias is-300～-1700 volts; PVD bearing shell matrix electric current is 0.5～2 ampere; To the energising of nickel target, the logical negative voltage of nickel target is-200～-620 volts; The nickel target current is 0.3～1 ampere; It is 3～40 minutes that matrix lining layer (1) spatters the treatment time mutually with the nickel target; Each weight percentages of components of last first diffusion layer (3) is as follows: Cu 0～5%; CuPb 2～5%; CuPbSn5～10%; CuNi 10～30%; CuPbSnNi 3～15%; The CuPbNi surplus.
- 4. spatter the PVD bushing magnetron sputtering technique that preceding negative bias is cleaned according to claim 1 is described by bearing shell in the sputter cabin, it is characterized in that: the processing condition of described magnetron sputtering second diffusion layer (5): the PVD bearing shell matrix that is coated with nickel-barrier layer (4) is in the sputter cabin that vacuumizes, the nickel-barrier layer (4) that participates in spattering mutually is Ni, employing purity is 99.2% Al-Sn-Cu alloys target, the weight percentage of tin in this Al-Sn-Cu alloy: 16～24%; The weight percentage of copper: 0.6～1.5%; All the other are the weight percentage of aluminium, to the energising of PVD bearing shell matrix, PVD bearing shell matrix negative bias :-150～-1600 volts; PVD bearing shell matrix electric current is 0.3～2 ampere; To the energising of Al-Sn-Cu alloys target, Al-Sn-Cu alloys target negative voltage :-150～-600 volts; Al-Sn-Cu alloys target electric current: 0.2～1 ampere; Nickel-barrier layer (4) spatters the treatment time mutually with the Al-Sn-Cu alloys target: 2～30 minutes; Each weight percentages of components of the second last diffusion layer (5) is as follows: Ni 0～3%; Ni 3Al 2～15%; NiAl 5～10%; Al 3Ni 210～30%; Al 10～20%; NiAlSnCu 0～15%; AlSnCu 10～25%; The AlSn surplus.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007100932167A CN101215686B (en) | 2007-12-27 | 2007-12-27 | PVD bushing magnetron sputtering technique using bushing before-sputtering negative grid bias in sputtering cabin to clean |
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|---|---|---|---|
| CN2007100932167A CN101215686B (en) | 2007-12-27 | 2007-12-27 | PVD bushing magnetron sputtering technique using bushing before-sputtering negative grid bias in sputtering cabin to clean |
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| CN101215686B true CN101215686B (en) | 2010-04-21 |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1975188A (en) * | 2005-09-16 | 2007-06-06 | 米巴·格来特来格有限公司 | Bearing element |
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- 2007-12-27 CN CN2007100932167A patent/CN101215686B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1975188A (en) * | 2005-09-16 | 2007-06-06 | 米巴·格来特来格有限公司 | Bearing element |
Non-Patent Citations (3)
| Title |
|---|
| 尹树桐,李庆芬,郭亚军,任正义,王俊.滑动轴承磁控溅射镀层.中国表面工程 2.2002,(2),39-42. |
| 尹树桐,李庆芬,郭亚军,任正义,王俊.滑动轴承磁控溅射镀层.中国表面工程 2.2002,(2),39-42. * |
| 郭亚军.轴瓦磁控溅射镀膜技术及其材料力学性能研究.中国博士学位论文全文数据库 工程科技Ⅰ辑 1.2003,(1),正文第82-83页,正文第33-34页. * |
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