CN101211124B - Coaxial aligning achromatic optical system - Google Patents
Coaxial aligning achromatic optical system Download PDFInfo
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- CN101211124B CN101211124B CN2007101728016A CN200710172801A CN101211124B CN 101211124 B CN101211124 B CN 101211124B CN 2007101728016 A CN2007101728016 A CN 2007101728016A CN 200710172801 A CN200710172801 A CN 200710172801A CN 101211124 B CN101211124 B CN 101211124B
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Abstract
An achromatic optical system for coaxial alignment comprises a mask-labeled lighting system composed of a lighting objective lens group, a filter plate, a beam splitter right-angle prism, an aperture diaphragm and a front imaging objective lens group which are arranged from the exit end of a lighting optical fiber along an optical axis; a mask-labeled imaging system composed of a front imaging objective lens group, an aperture diaphragm, a beam splitter right-angle prism, a back imaging objective lens group and a CCD camera receiving surface which are arranged from the lower surface of a mask plate along the optical axis; an exposure object-labeled lighting system composed of the mask-labeled lighting system and an optical projection system; and an exposure object-labeled imaging system composed of the mask-labeled imaging system and the optical projection system. The system reduces the size of an alignment optical system and is helpful for installation and calibration of an optical machine; and the color difference generated by the optical projection system when aligning the visible light waveband is compensated by the alignment optical system, so as to reduce the structural complexity of the optical projection system.
Description
Technical field
The present invention relates to a kind of coaxial alignment achromatic optical system, relate in particular to a kind of achromatic optical system that in semiconductor lithography equipment, is used for the coaxial alignment system.
Background technology
In semiconductor lithography equipment, the position alignment device is one of very important device.On structure, the position alignment device can be divided into coaxial position alignment device and off-axis position alignment device two big classes.Coaxial position is aimed at and to be meant optical projection system in the exposure device is all passed through in the illumination of exposure object mark and imaging.
The coaxial position alignment device is positioned at the mask plate top, and the coaxial alignment optical system is one of vitals of coaxial position alignment device, and the quality of its designing quality will directly influence the alignment precision of this coaxial position alignment device.The coaxial alignment Design for optical system not only is subjected to the restriction of exposure sources space structure size, require this coaxial alignment optical system can not only be simultaneously, but also require it to realize even illumination and blur-free imaging the exposure object mark with optical projection system to mask mark evenly illumination and blur-free imaging.
In U.S. Pat 5621813, having designed the nearly 20 times alignment optical system of enlargement ratio realizes mask mark and exposure object mark blur-free imaging, in order to optimize image quality, and guarantee sufficiently long operating distance, it is compact more to guarantee the space layout between the optical element to be provided with a plurality of catoptrons in the alignment optical system light path; Though this structure Design can guarantee to obtain higher imaging resolution, owing to be provided with the polylith catoptron in the light path, not only increased the dress school difficulty of alignment optical system, also make the space structure size of this alignment optical system bigger.
In U.S. Pat 7148953 B2, designed the optical projection system of wide wavestrip in the exposure sources, this design wave band has not only comprised uv-exposure wave band 365nm～436nm, but also has comprised and be used for visible light wave range 520nm～650nm that exposure object is marked as picture; Though this structure Design has been eliminated the aberration that produces at visible light wave range when exposure object is marked at by the optical projection system imaging, but when design visual field that increases optical projection system and numerical aperture, for satisfying the design objective demand, principal reflection mirror in the optical projection system light path then needs to be designed to aspheric surface, so not only increase the design complexities of this optical projection system, the more important thing is the difficulty and the equipment processing and manufacturing cost that have increased the dress school.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of coaxial alignment achromatic optical system, defectives such as it not only can solve, and the operating distance that the coaxial alignment optical system exists in the background technology is long, volume is big, dress school difficulty; Simultaneously optical projection system also will be compensated by this alignment optical system aiming at the aberration that visible light wave range produces, thereby reduce the structure complexity of optical projection system in the equipment, effectively controlled the processing and manufacturing cost of equipment.
For reaching above-mentioned purpose, the invention provides a kind of coaxial alignment achromatic optical system, it comprises coaxial alignment optical system and coaxial alignment exposure system, this coaxial alignment optical system comprises mask mark illuminator and mask mark imaging system, and this coaxial alignment exposure system comprises exposure object mark illuminator and exposure object mark imaging system; Characteristics are:
Described mask mark illuminator comprises: the illumination objective lens group, filter plate, beam splitting right-angle prism, aperture diaphragm and the preceding composition that begin to place successively along optical axis from the lighting fiber exit end be as objective lens, and it realizes evenly illumination for being placed on successively to form as the mask mark on the mask plate lower surface after the objective lens before described;
Described mask mark imaging system comprises: begin to form as objective lens and CCD (charge-coupled image sensor) video camera receiving plane as objective lens, aperture diaphragm, beam splitting right-angle prism, back along the preceding composition that optical axis is placed successively from the mask plate lower surface, it realizes blur-free imaging to the mask mark on the described mask plate;
Described exposure object mark illuminator is made up of mask mark illuminator and optical projection system, be that it comprises: the illumination objective lens group that begins to place successively along optical axis from the lighting fiber exit end, filter plate, beam splitting right-angle prism, aperture diaphragm, preceding composition be as objective lens, mask plate and optical projection system, and it realizes evenly illumination to the exposure object mark that is placed on successively on the exposure object upper surface after the optical projection system;
Described exposure object mark imaging system is made up of mask mark imaging system and optical projection system, be that it comprises: begin to form as objective lens and ccd video camera receiving plane as objective lens, aperture diaphragm, beam splitting right-angle prism, back along optical projection system, mask plate, preceding composition that optical axis is placed successively from the exposure object upper surface, it realizes blur-free imaging to the exposure object mark on the described exposure object.
Described mask plate lower surface is the object plane of mask mark imaging system; Described ccd video camera receiving plane is the image planes of mask mark imaging system.
Described exposure object upper surface is the object plane of exposure object mark imaging system; Described ccd video camera receiving plane is the image planes of exposure object mark imaging system.
Described mask mark illuminator can be the critical illumination system according to the requirement of position alignment precision and mask mark illumination uniformity, also can be the Kohler illumination system.
When described mask mark illuminator was the critical illumination system, the lower surface of lighting fiber exit end and mask plate was the object-image conjugate face, and described illumination objective lens group is the two cemented objective groups of illumination.
The two cemented objective groups of described illumination are set up jointly with two cemented objective group second lens glues of illumination by two cemented objective group first lens of illumination; Two cemented objective group first lens of this illumination are biconvex lens, and two cemented objective group second lens of this illumination are biconcave lenss.
When described mask mark illuminator was the Kohler illumination system, described illumination objective lens group was the Kohler illumination objective lens.
Described Kohler illumination objective lens is by Kohler illumination objective lens first lens, Kohler illumination objective lens second lens, Kohler illumination objective lens the 3rd lens, field stop and Kohler illumination objective lens the 4th lens are formed, and setting separated from one another between adjacent two lens.
Described Kohler illumination objective lens first lens, Kohler illumination objective lens second lens and Kohler illumination objective lens the 3rd lens are formed the collecting lens group.
Described Kohler illumination objective lens first lens and Kohler illumination objective lens the 4th lens are meniscus, and described Kohler illumination objective lens second lens are biconcave lenss, and described Kohler illumination objective lens the 3rd lens are biconvex lens.
When described mask mark illuminator was the Kohler illumination system, lighting fiber exit end and aperture diaphragm were the object-image conjugate face; Mask index face on field stop and the mask plate lower surface is the object-image conjugate face.
Described exposure object mark illuminator can be the critical illumination system according to the requirement of position alignment precision and mask mark illumination uniformity, also can be the Kohler illumination system.
When described exposure object mark illuminator was the critical illumination system, described lighting fiber exit end and exposure object upper surface were the object-image conjugate face.
When described exposure object mark illuminator was the Kohler illumination system, described lighting fiber exit end and aperture diaphragm were the object-image conjugate face; Mask index face on field stop and the mask plate lower surface is the object-image conjugate face; Mask index face and the exposure object index face on the exposure object upper surface on the described mask plate lower surface are the object-image conjugate face.
Described beam splitting right-angle prism is made up of 2 right-angle prism gummeds, is coated with the light beam that is used for 50% therein on the inclined-plane of a right-angle prism and reflects, and the light beam to 50% carries out the film of transmission.
By preceding forming as objective lens first lens, preceding composition is as objective lens second lens as objective lens for composition before described, and preceding composition is formed as objective lens the 4th lens as objective lens the 3rd lens and preceding composition, and setting separated from one another between each adjacent lens; Should precedingly form as objective lens first lens is meniscus, and forming as objective lens second lens before this is biconcave lens, and composition is biconvex lens as objective lens the 3rd lens and preceding composition as objective lens the 4th lens before this.
Described back is formed to be made up of as objective lens first lens the back as objective lens and is formed with then forming as objective lens second lens, and setting separated from one another between the two adjacent lens; It is biconcave lenss that this back is formed as objective lens first lens, and it is concave-convex lenss that this back is formed as objective lens second lens.
Optical element below described mask mark illuminator, mask mark imaging system, exposure object mark illuminator and exposure object mark imaging system are shared, comprising: mask plate, preceding composition are as objective lens, aperture diaphragm and beam splitting right-angle prism.
Further, mask mark illuminator of the present invention, mask mark imaging system, exposure object mark illuminator and exposure object mark imaging system also comprise a shared light path deflection mirror group, form as between objective lens and the mask plate before it is arranged on.
Described light path deflection mirror group comprises catoptron.
Described light path deflection mirror group comprises catoptron, external reflection right-angle prism and the internal reflection right-angle prism that sets gradually.
Described light path deflection mirror group is made up of internal reflection right-angle prism and right-angle prism gummed, this right-angle prism is made up of first right-angle prism and second right-angle prism gummed inclined-plane, is plating the internal reflection film on the inclined-plane of first right-angle prism or is plating the external reflection film to realize the function of deflection of light on the inclined-plane of second right-angle prism.
Described light path deflection mirror group is glued together the right-angle side face by 2 internal reflection right-angle prisms according to the parallel mode in two inclined-planes and is formed, and plates the internal reflection film respectively to realize the function of deflection of light on the inclined-plane of 2 internal reflection right-angle prisms.
Described light path deflection mirror group is an optical element that the cross section is a parallelogram, and plates the internal reflection film to realize the function of deflection of light on 2 relative inclined-planes of this optical element.
Described optical projection system can be the all-refraction type optical system, also can be refractive and reflective optical system.
Described mask mark illuminator and exposure object mark illuminator are the coaxial-illuminating system, its respectively with mask mark imaging system and the shared same optical axis of exposure object mark imaging system.
Coaxial alignment achromatic optical system provided by the invention, compare with background technology, have the following advantages: 1, be optimized design, make the space structure of alignment optical system compact more, reduce volume and help ray machine dress school by structure to alignment optical system; 2, optical projection system design wave band is only considered uv-exposure wave band 365nm～436nm, it will be compensated by alignment optical system of the present invention at the aberration of aiming at visible light wave range 520nm～650nm generation, so not only can reduce the design difficulty of optical projection system, also reduce the structural complexity and the processing and manufacturing cost of optical projection system simultaneously.
Description of drawings
Fig. 1 is the vertical view of the coaxial alignment optical system of the embodiment of the invention 1;
Fig. 2 is the front elevation of the coaxial alignment optical system of the embodiment of the invention 1;
Fig. 3 is the ray tracing synoptic diagram of the mask mark illuminator of the embodiment of the invention 1;
Fig. 4 is the ray tracing synoptic diagram of the mask mark imaging system of the embodiment of the invention 1;
Fig. 5 is the structural representation of the exposure object mark imaging system of the embodiment of the invention 1;
Fig. 6-a is the distortion synoptic diagram of the mask mark imaging system of the embodiment of the invention 1;
Fig. 6-b is the distortion synoptic diagram of the exposure object mark imaging system of the embodiment of the invention 1;
Fig. 7 is that Jiao of the exposure object mark imaging system in the embodiment of the invention 1 moves curve synoptic diagram;
Fig. 8-a, 8-b, 8-c are respectively 3 kinds of structural representations realizing light path deviation function among the present invention;
Fig. 9 is the structural representation of the coaxial alignment optical system of the embodiment of the invention 2;
Figure 10 is the structural representation of the coaxial alignment optical system of the embodiment of the invention 3;
Figure 11 is the vertical view of the coaxial alignment optical system of the embodiment of the invention 4;
Figure 12 is the ray tracing synoptic diagram of the mask mark illuminator of the embodiment of the invention 4.
Embodiment
Below in conjunction with Fig. 1-Figure 12, describe several preferred implementation of the present invention in detail:
As depicted in figs. 1 and 2, the coaxial alignment achromatic optical system that present embodiment provides, comprise coaxial alignment optical system and coaxial alignment exposure system, this coaxial alignment optical system comprises mask mark illuminator and mask mark imaging system, and this coaxial alignment exposure system comprises exposure object mark illuminator and exposure object mark imaging system; Characteristics are:
Described mask mark illuminator comprises: the two cemented objective groups 11 of illumination of placing successively from 10 beginnings of lighting fiber exit end along optical axis, filter plate 14, beam splitting right-angle prism 15, aperture diaphragm 4, preceding composition are as objective lens 26 and light path deflection mirror group;
Described lighting fiber is used for the light that lighting source sends is imported to mask mark illuminator; In the present embodiment 1, this lighting source is a white light; The two cemented objective groups 11 of described illumination are made up of two cemented objective group first lens 12 of illumination and illumination cemented doublet group second lens 13 gummeds, are used to assemble the emergent light of lighting fiber; Two cemented objective group first lens 12 of this illumination are biconvex lens, and two cemented objective group second lens 13 of this illumination are biconcave lenss; Described filter plate 14 is used for the illumination wavelengths of filtering lighting fiber exit end light to the ultraviolet light sensitivity; Described beam splitting right-angle prism 15 is made up of 2 right-angle prisms gummed, is coated with on right-angle prism inclined-plane therein to be used for 50% light beam is reflected the film that 50% light beam carries out transmission; Described aperture diaphragm 4 is used to limit the dispersion angle of lighting fiber exit end light, and limits the beam divergence angle that is used to be marked as picture; Form before described as objective lens 26, by preceding forming, be used for the convergence of illumination beam and the imaging that realizes mark as objective lens first lens 16, the preceding composition as forming objective lens second lens 17, the preceding composition as objective lens the 3rd lens 18 and preceding the composition as objective lens the 4th lens 19; And setting separated from one another between each adjacent lens, thereby can increase the degree of freedom of aberration correction variable; Should precedingly form as objective lens first lens 16 is meniscus, and forming as objective lens second lens 17 before this is biconcave lens, and composition is biconvex lens as objective lens the 3rd lens 18 and preceding composition as objective lens the 4th lens 19 before this; Described light path deflection mirror group comprises catoptron 20, external reflection right-angle prism 21 and the internal reflection right-angle prism 22 that sets gradually, and is used to realize the deviation of light path; Finally, this mask mark illuminator realizes evenly illumination to the mask mark that is placed on successively on mask plate 2 lower surfaces after the described light path deflection mirror group;
As shown in Figure 3, ray tracing synoptic diagram for mask mark illuminator of the present invention, as can be seen from the figure, the light that sends from illumination fiber optic bundle exit end 10 passes through aperture diaphragm 4 after the two cemented objective groups 11 of illumination objective lens are assembled, before shining, the divergence of beam that via hole diameter diaphragm 4 penetrates forms as on the objective lens 26,, realize the mask mark on mask plate 2 lower surfaces is evenly thrown light on after preceding composition converges to the lower surface of mask plate 2 as objective lens 26.
In the embodiment of the invention, in the described mask mark illuminator, lighting fiber exit end 10 is the object-image conjugate face with the lower surface of mask plate 2; Be about to light source direct imaging to illuminated area (these 2 conjugate plane just), so the optical texture of mask mark illuminator is a critical illumination among this embodiment.
In the present embodiment 1, the radius-of-curvature of above-mentioned each lens surface, the center thickness of lens, material refractive index and lens effective aperture that lens adopted all are listed in the table 1.Concrete data in the table 1 are to be 6.35mm according to a lighting fiber end face diameter, and operating distance is 190mm, and mask index face light numerical aperture is 0.06, and enlargement ratio is that 0.5 times and mask index face illumination uniformity are less than the resulting result of 5% design.In the table 1, towards lighting fiber outgoing end face one side be the front surface of optical element, towards mask plate one side is the rear surface of optical element.From lighting fiber outgoing end face along optical axis to mask plate, the radius-of-curvature center towards the radius-of-curvature of mask plate one side for just, the radius-of-curvature center towards the radius-of-curvature of lighting fiber outgoing end face one side for negative.The cemented surface of 2 lens is considered as one side, and is designated the rear surface of supplementary lens, and the radius-of-curvature of level crossing does not identify.Provided simultaneously in the table 1 that optical glass material is 23 degrees centigrade in temperature in the present embodiment 1,1 standard atmospheric pressure, wavelength are the refractive index under the 550nm.
| The surface | Radius (mm) | Thickness (mm) | Refractive index | Effective aperture (mm) |
| Lighting fiber outgoing end face | 5 | 1 | 6.35 | |
| The cemented doublet group first lens front surface | 14.493 | 10 | 1.51809210 | 6.420417 |
| The cemented doublet group first lens rear surface | -10 | 9.54 | 1.56586053 | 5.065391 |
| The cemented doublet group second lens rear surface | 10.375 | 9.28 | 1 | 3.815578 |
| The filter plate front surface | 1.5 | 1.51809210 | 3.951778 | |
| The filter plate rear surface | 12.75 | 1 | 3.966601 | |
| The beam splitting right-angle prism plane of |
11 | 1.76102445 | 4.157367 | |
| Beam splitting right-angle prism exit facet | 3.24 | 1 | 4.251523 | |
| The aperture diaphragm rear surface | 3.57 | 1 | 4.3 | |
| The preceding composition as the objective lens first lens front surface | -100 | 9.86 | 1.62528167 | 4.98029 |
| The preceding composition as the objective lens first lens rear surface | -57.28 | 19.63 | 1 | 6.325128 |
| The surface | Radius (mm) | Thickness (mm) | Refractive index | Effective aperture (mm) |
| The preceding composition as the objective lens second lens front surface | -47.86 | 9.32 | 1.62528167 | 9.324467 |
| The preceding composition as the objective lens second lens rear surface | 38.99 | 1.3 | 1 | 11.03202 |
| The preceding composition as objective lens the 3rd lens front surface | 48.188 | 3.16 | 1.62528167 | 11.72773 |
| The preceding composition as objective lens the 3rd lens rear surface | -28.84 | 1.16 | 1 | 12.21933 |
| The preceding composition as objective lens the 4th lens front surface | 71.12 | 2.1 | 1.56586053 | 12.4328 |
| Preceding composition is saturating as objective lens the 4th | -56 | 53.5 | 1 | 12.43497 |
| The mirror rear surface | ||||
| The internal reflection right-angle prism plane of |
11 | 1.51809210 | 5.691324 | |
| Internal reflection right-angle prism exit facet | 8.15 | 1 | 4.785834 | |
| The mask plate front surface | 6.35 | 1.45991088 | 3.765136 | |
| Mask plate rear surface (illuminated area) | 1 | 3.231274 |
Table 1
Described mask mark imaging system comprises: begin the light path deflection mirror group of placing successively along optical axis from mask plate 2 lower surfaces, be internal reflection right-angle prism 22, external reflection right-angle prism 21 and catoptron 20, the preceding composition as objective lens 26, aperture diaphragm 4, beam splitting right-angle prism 15, back are formed as objective lens 27 and ccd video camera receiving plane 25;
Described mask mark imaging system and the above-mentioned shared following optical element of mask mark illuminator, comprising: mask plate 2, light path deflection mirror group, preceding composition are as objective lens 26, aperture diaphragm 4 and beam splitting right-angle prism 15; And shared same optical axis;
The lower surface of described mask plate 2 is the object plane of mask mark imaging system; Described back form as objective lens 27 by after form as objective lens first lens 23 with after form as objective lens second lens 24 separate be provided with form, be used to assemble imaging beam to shorten the operating distance of imaging system, form before the associating simultaneously and proofread and correct as the aberration of 26 pairs of optical systems of objective lens; It is biconcave lenss that this back is formed as objective lens first lens 23, and it is concave-convex lenss that this back is formed as objective lens second lens 24; Described ccd video camera receiving plane 25 is used for the mask mark on the described mask plate is realized blur-free imaging, is the image planes of mask mark imaging system.In this mask mark imaging system, the lower surface of mask plate 2 and ccd video camera receiving plane 25 are the object-image conjugate face.
As shown in Figure 4, ray tracing synoptic diagram for mask mark imaging system of the present invention, as can be seen from the figure, begin along optical axis to ccd video camera receiving plane 25 from the mask alignment mark face on the mask plate 2, play strong converging action as 26 pairs of light of objective lens preceding the composition, and the back composition plays disperse function a little as 27 pairs of light beams of objective lens; Generally, the imaging system light beam is assembled the back imaging gradually, distance between the image can be very long like this, and be aligned to image optical system in the present embodiment 1, form before adopting 4 lens that separate each other to form one and play strong converging action as 26 pairs of light beams of objective lens, add to form and form after one as objective lens 27 by light beam slightly dispersed the convergent effect that realizes the imaging system light beam by 2 lens that are separated from each other, thereby shortened distance between image effectively, reduced to be aligned to image optical system bulk and volume thereof.
In the present embodiment 1, the radius-of-curvature of above-mentioned each lens surface, the center thickness of lens, the material refractive index that lens adopted and the external diameter of lens all are listed in the table 2.Concrete data in the table 2 are to be 14mm according to full visual field image height, and operating distance is 260mm, and the object space numerical aperture is 0.06, and enlargement ratio is that 9.2 times and distortion are less than the resulting result of 0.1% design.In the table 2, towards mask plate one side be the optical element front surface, towards the ccd video camera receiving plane is the optical element rear surface.From mask plate along optical axis to the ccd video camera receiving plane, the radius-of-curvature center towards the radius-of-curvature of ccd video camera receiving plane one side for just, the radius-of-curvature center towards the radius-of-curvature of mask plate one side for negative.Because mask mark illuminator and the shared right angle of mask mark imaging system beam splitter prism, aperture diaphragm, the preceding composition as objective lens, catoptron, the external reflection right-angle prism, internal reflection right-angle prism and mask plate, therefore above-mentioned optical element design parameter is with table 1, omit in table 2, plan radius of curvature does not identify; Table 2 has provided simultaneously that optical glass material is 23 degrees centigrade in temperature in the embodiment of the invention 1, and 1 standard atmospheric pressure, wavelength are the refractive index under the 550nm.
| The surface | Radius (mm) | Thickness (mm) | Refractive index | Effective aperture (mm) |
| Beam splitting right-angle prism exit facet | 19.65 | 1 | 3.747542 | |
| The back is formed as the objective lens first lens front surface | -66.526 | 4.48 | 1.69664535 | 2.568711 |
| The back is formed as the objective lens first lens rear surface | 9.863 | 14.77 | 1 | 2.480038 |
| The back is formed as the objective lens second lens front surface | -10.023 | 7.84 | 1.64017485 | 4.577302 |
| The back is formed as the objective lens second lens rear surface | -12.71 | 70 | 1 | 6.65278 |
| Ccd video camera receiving plane (mask mark imaging system image planes) | 1 | 14.11466 |
Table 2
As shown in Figure 5, described exposure object mark illuminator is made up of mask mark illuminator and optical projection system 1, be that it comprises: the two cemented objective groups 11 of illumination of placing successively from 10 beginnings of lighting fiber exit end along optical axis, filter plate 14, beam splitting right-angle prism 15, aperture diaphragm 4, the preceding composition as objective lens 26, light path deflection mirror group (is a catoptron 20, external reflection right-angle prism 21 and internal reflection right-angle prism 22), mask plate 2 and optical projection system 1, it realizes evenly illumination to the exposure object mark that is placed on successively on exposure object 3 upper surfaces after the optical projection system;
In the embodiment of the invention, in the described exposure object mark illuminator, lighting fiber exit end 10 is the object-image conjugate face with exposure object 3 upper surfaces; Be about to light source direct imaging to illuminated area (these 2 conjugate plane just), so the optical texture of this exposure object mark illuminator is a critical illumination.
Described exposure object mark imaging system is made up of mask mark imaging system and optical projection system, be that it comprises: begin to form as objective lens 27 and ccd video camera receiving plane 25 as objective lens 26, aperture diaphragm 4, beam splitting right-angle prism 15, back along optical projection system 1, mask plate 2, light path deflection mirror group (being internal reflection right-angle prism 22, external reflection right-angle prism 21 and catoptron 20), preceding composition that optical axis is placed successively from the upper surface of exposure object 3, it realizes blur-free imaging to the exposure object mark on the described exposure object.
The upper surface of described exposure object 3 is the object plane of exposure object mark imaging system; Described ccd video camera receiving plane 25 is the image planes of exposure object mark imaging system.And the upper surface of this exposure object 3 and ccd video camera receiving plane 25 are the object-image conjugate face.
Described optical projection system 1 can be the all-refraction type optical system, also can be refractive and reflective optical system.
Described exposure object mark illuminator, exposure object mark imaging system and the above-mentioned shared following optical element of mask mark illuminator, mask mark imaging system, comprising: mask plate 2, light path deflection mirror group, preceding composition are as objective lens 26, aperture diaphragm 4 and beam splitting right-angle prism 15; And shared same optical axis.
Be designed to defectives such as system architecture complexity, dress school difficulty that wide wavestrip causes are big, processing and manufacturing cost height for overcoming optical projection system 1 in the background technology, optical projection system 1 in the embodiment of the invention 1 only is designed to the ultraviolet band correcting chromatic aberration to 365nm～435nm, and optical projection system 1 then is marked as the picture system balance by mask of the present invention aiming at the aberration that visible light wave range 520nm～650nm produces.The mask mark imaging system of the embodiment of the invention can not only be to the mask mark blur-free imaging on the mask plate 2, and the exposure object mark imaging system that this mask mark imaging system and optical projection system 1 are formed also can blur-free imaging to the upper surface of exposure object 3.The embodiment of the invention is by optimizing the structural parameters of mask mark illuminator and mask mark imaging system, not only make the illumination uniformity of mask mark illuminator and exposure object mark illuminator satisfy designing requirement, and make the imaging performance of mask mark imaging system and exposure object mark imaging system also satisfy the design objective demand less than 5%.
Fig. 6-a and Fig. 6-b are respectively that mask is marked as systematical distortion synoptic diagram and exposure object and is marked as picture systematical distortion synoptic diagram, and horizontal ordinate is the distortion ratio among the figure, and ordinate is the normalization visual field.Wherein, the wavelength of curve 01 correspondence is 520nm, and the wavelength of curve 02 correspondence is 590nm, and the wavelength of curve 03 correspondence is 650nm.From Fig. 6-a and Fig. 6-b as can be seen, mask mark imaging system and exposure object mark imaging system all less than 0.1%, satisfy the system design index request in the distortion of aiming at visible light wave range 520nm～650nm.
Fig. 7 is that exposure object mark imaging system Jiao moves curve synoptic diagram, and this curve has reflected the image planes drift condition of the image planes relative predominant wavelength 550nm of exposure object mark imaging system under different wave length.As can be seen from Figure 7, exposure object mark imaging system in the present embodiment 1 has identical image planes position at wavelength 550nm with wavelength 600nm place, because the imaging receiver that alignment optical system adopted is a ccd video camera, its spectral response to 550nm～600nm wave band is relatively sensitiveer, therefore the exposure object mark imaging system in the embodiment of the invention is the achromatism imaging optical system, it has not only compensated optical projection system 1 at the aberration of aiming at visible light wave range 520nm～650nm, and has reduced the design complexities and the processing and manufacturing cost of optical projection system 1.
As shown in Figure 9,1 of present embodiment 2 and previous embodiment are unique different to be, the light path deflection mirror group difference that adopts, only adopt catoptron 20 to realize light path deviation function in the present embodiment 2, external reflection right-angle prism 21 and internal reflection right-angle prism 22 among the embodiment 1 have been saved, other structure in the present embodiment and structural parameters are all identical with embodiment 1, and also can reach described purpose and effect.
As shown in figure 10, different is for present embodiment 3 and previous embodiment, do not adopt light path deflection mirror group between preceding composition is as objective lens 26 and mask plate 2, other structure in the present embodiment 3 and structural parameters are all identical with previous embodiment, and also can reach described purpose and effect.
According to the needs of mask mark illumination uniformity, the optical texture of the mask mark illuminator of being mentioned in the previous embodiment 1 also can be designed as Kohler illumination system as shown in figure 11.
Described mask mark illuminator comprises: the Kohler illumination objective lens 50 of placing successively along optical axis from lighting fiber exit end 10 beginning, filter plate 14, beam splitting right-angle prism 15, aperture diaphragm 4, preceding composition are as objective lens 26 and light path deflection mirror group; Present embodiment 4 with unique difference of embodiment 1 is exactly: replaced illumination pair cemented objective groups 11 among the embodiment 1 with Kohler illumination objective lens 50 among the embodiment 4, will make the mask index face have higher illumination uniformity like this.
Described Kohler illumination objective lens 50, by Kohler illumination objective lens first lens 51, Kohler illumination objective lens second lens 52, Kohler illumination objective lens the 3rd lens 53, field stop 54 and Kohler illumination objective lens the 4th lens 55 are formed, and setting separated from one another between adjacent two lens.Kohler illumination objective lens first lens 51 described in the present embodiment 4 and Kohler illumination objective lens the 4th lens 55 are meniscus, described Kohler illumination objective lens second lens 52 are biconcave lenss, and described Kohler illumination objective lens the 3rd lens 53 are biconvex lens.
Described Kohler illumination objective lens first lens 51, Kohler illumination objective lens second lens 52 and Kohler illumination objective lens the 3rd lens 53 are formed the collecting lens group, will converge to from the illumination light that lighting fiber exit end 10 sends on the field stop 54; Field stop 54 will be used to limit the angle of divergence of the illuminating bundle that sends from lighting fiber exit end 10; The light beam that Kohler illumination objective lens the 4th lens 55 are assembled from field stop 54 outgoing by filter plate 14 and beam splitting right-angle prism 15, is imaged onto lighting fiber exit end 10 on the aperture diaphragm 4.
As shown in figure 12, ray tracing synoptic diagram for the embodiment of the invention 4 described mask mark illuminators, as can be seen from the figure, the illuminating bundle that sends from lighting fiber exit end 10 passes through by Kohler illumination objective lens first lens 51, and the collecting lens group that Kohler illumination objective lens second lens 52 and Kohler illumination objective lens the 3rd lens 53 are formed converges directly on the field stop 54; The light beam that Kohler illumination objective lens the 4th lens 55 are assembled from field stop 54 outgoing, by filter plate 14 and beam splitting right-angle prism 15, lighting fiber exit end 10 is imaged onto on the aperture diaphragm 4, this moment field stop 54 be full of by the light beam that sends from lighting fiber exit end 10 and field stop in each point evenly thrown light on; Converge on the aperture diaphragm 4 through filter plate 14 and beam splitting right-angle prism 15 from the diverging light of field stop 54 outgoing, before shining, the divergence of beam that via hole diameter diaphragm 4 penetrates forms as on the objective lens 26,, realize the mask mark on mask plate 2 lower surfaces is evenly thrown light on after preceding composition converges to the lower surface of mask plate 2 as objective lens 26.
In the embodiment of the invention 4, in the described mask mark illuminator, lighting fiber exit end 10 is the object-image conjugate face with aperture diaphragm 4; Mask index face on field stop 54 and mask plate 2 lower surfaces is the object-image conjugate face, so the optical texture of this embodiment mask mark illuminator is Kohler illumination.
In the present embodiment 4, the radius-of-curvature of above-mentioned each lens surface, the center thickness of lens, the material refractive index that lens adopted and the external diameter of lens all are listed in the table 3.Concrete data in the table 3 are to be 6.35mm according to a lighting fiber end face diameter, and operating distance is 210mm, and mask index face light numerical aperture is 0.06, and enlargement ratio is that 0.5 times and mask index face illumination uniformity are less than the resulting result of 5% design.In the table 3, towards lighting fiber outgoing end face one side be the front surface of optical element, towards mask plate one side is the rear surface of optical element.From lighting fiber outgoing end face along optical axis to mask plate, the radius-of-curvature center towards the radius-of-curvature of mask plate one side for just, the radius-of-curvature center towards the radius-of-curvature of lighting fiber outgoing end face one side for negative.Because mask mark illuminator described in the present embodiment 4 and the mask mark illuminator described in the embodiment 1 are at filter plate, right angle beam splitter prism, aperture diaphragm, the preceding composition as objective lens, catoptron, identical on the external reflection right-angle prism, internal reflection right-angle prism and mask plate structure parameter, therefore above-mentioned optical element design parameter is with table 1, omit in table 3, plan radius of curvature does not identify; Table 3 has provided simultaneously that optical glass material is 23 degrees centigrade in temperature in the embodiment of the invention 1, and 1 standard atmospheric pressure, wavelength are the refractive index under the 550nm.
| The surface | Radius (mm) | Thickness (mm) | Refractive index | Effective aperture (mm) |
| Lighting fiber |
2 | 1 | 6.35 | |
| The Kohler illumination objective lens first lens front surface | 7 | 2.8 | 1.76102960 | 6.524554 |
| The Kohler illumination objective lens first lens rear surface | 13.614 | 8.1 | 1 | 5.590162 |
| The Kohler illumination objective lens second lens front surface | -10 | 1.52 | 1.67710013 | 2.505734 |
| The Kohler illumination objective lens second lens rear surface | 5.012 | 13.32 | 1 | 2.280744 |
| Kohler illumination objective lens the 3rd lens front surface | 17.061 | 3.36 | 1.64099035 | 3.537764 |
| Kohler illumination objective lens the 3rd lens rear surface | -9.727 | 0.8 | 1 | 3.465002 |
| Field stop | 4.82 | 1 | 3.2 | |
| Kohler illumination objective lens the 4th lens front surface | -6.742 | 5.28 | 1.61525229 | 2.994528 |
| Kohler illumination objective lens the 4th lens rear surface | -10.3 | 6 | 1 | 3.756726 |
Table 3
In the embodiment of the invention 4, described exposure object mark illuminator is made up of mask mark illuminator and optical projection system 1, it is that it comprises: the Kohler illumination objective lens 50 of placing successively along optical axis from lighting fiber exit end 10 beginning, filter plate 14, beam splitting right-angle prism 15, aperture diaphragm 4, the preceding composition as objective lens 26, light path deflection mirror group (is a catoptron 20, external reflection right-angle prism 21 and internal reflection right-angle prism 22), mask plate 2 and optical projection system 1, it realizes evenly illumination to the exposure object mark that is placed on successively on exposure object 3 upper surfaces after the optical projection system;
In the embodiment of the invention 4, in the described exposure object mark illuminator, lighting fiber exit end 10 is the object-image conjugate face with aperture diaphragm 4; Mask index face on field stop 54 and mask plate 2 lower surfaces is the object-image conjugate face; Exposure object index face on mask index face on mask plate 2 lower surfaces and exposure object 3 upper surfaces is the object-image conjugate face, therefore when field stop 54 is evenly thrown light on, exposure will evenly be thrown light on to the item mark, so the optical texture of this exposure object mark illuminator is Kohler illumination.
Embodiment 5
Present embodiment 5 and previous embodiment are unique different to be, the light path deflection mirror group of employing shown in Fig. 8-a is to realize the function of deflection of light, this light path deflection mirror group is made up of internal reflection right-angle prism 32 and right-angle prism 33 gummeds, this right-angle prism 33 is made up of first right-angle prism 30 and second right-angle prism, 31 gummed inclined-planes, is plating the internal reflection film on the inclined-plane of first right-angle prism 30 or plating external reflection film on the inclined-plane of second right-angle prism 31.Other structure among this embodiment 5 and structural parameters are all identical with previous embodiment, and also can reach purpose of the present invention and effect.
Embodiment 6
Present embodiment 6 and previous embodiment are unique different to be, the light path deflection mirror group of employing shown in Fig. 8-b is to realize the function of deflection of light, this light path deflection mirror group is made up of 2 internal reflection right- angle prisms 32 and 34 gummed inclined-planes, respectively plating internal reflection film on the inclined-plane of 2 internal reflection right-angle prisms 32 and 34.Other structure among this embodiment 6 and structural parameters are all identical with previous embodiment, and also can reach purpose of the present invention and effect.
Embodiment 7
Present embodiment 7 and previous embodiment are unique different to be, the light path deflection mirror group of employing shown in Fig. 8-c is to realize the function of deflection of light, this light path deflection mirror group is the optical element 40 that a cross section is a parallelogram, and is shown in plating internal reflection film on 2 relative inclined-planes of this optical element 40 according to Fig. 8-c.Other structure among this embodiment 7 and structural parameters are all identical with previous embodiment, and also can reach purpose of the present invention and effect.
That more than introduces only is based on several preferred embodiment of the present invention, can not limit scope of the present invention with this.Anyly belong to parts replacement, combination or discrete well know in the art, all do not exceed protection scope of the present invention what structure of the present invention was done.
Claims (29)
1. coaxial alignment achromatic optical system, comprise coaxial alignment optical system and coaxial alignment exposure system, this coaxial alignment optical system comprises mask mark illuminator and mask mark imaging system, and this coaxial alignment exposure system comprises exposure object mark illuminator and exposure object mark imaging system; It is characterized in that:
Described mask mark illuminator comprises: the illumination objective lens group, filter plate, beam splitting right-angle prism, aperture diaphragm and the preceding composition that begin to place successively along optical axis from the lighting fiber exit end be as objective lens, and it realizes evenly illumination for being placed on successively to form as the mask mark on the mask plate lower surface after the objective lens before described;
Described mask mark imaging system comprises: begin to form as objective lens and ccd video camera receiving plane as objective lens, aperture diaphragm, beam splitting right-angle prism, back along the preceding composition that optical axis is placed successively from the mask plate lower surface, it realizes blur-free imaging to the mask mark on the described mask plate;
Described exposure object mark illuminator is made up of mask mark illuminator and optical projection system, be that it comprises: the illumination objective lens group that begins to place successively along optical axis from the lighting fiber exit end, filter plate, beam splitting right-angle prism, aperture diaphragm, preceding composition be as objective lens, mask plate and optical projection system, and it realizes evenly illumination to the exposure object mark that is placed on successively on the exposure object upper surface after the optical projection system;
Described exposure object mark imaging system is made up of mask mark imaging system and optical projection system, be that it comprises: begin to form as objective lens and ccd video camera receiving plane as objective lens, aperture diaphragm, beam splitting right-angle prism, back along optical projection system, mask plate, preceding composition that optical axis is placed successively from the exposure object upper surface, it realizes blur-free imaging to the exposure object mark on the described exposure object.
2. coaxial alignment achromatic optical system as claimed in claim 1 is characterized in that, described mask plate lower surface is the object plane of mask mark imaging system; Described ccd video camera receiving plane is the image planes of mask mark imaging system.
3. coaxial alignment achromatic optical system as claimed in claim 1 is characterized in that, described exposure object upper surface is the object plane of exposure object mark imaging system; Described ccd video camera receiving plane is the image planes of exposure object mark imaging system.
4. coaxial alignment achromatic optical system as claimed in claim 1 is characterized in that, described mask mark illuminator is the critical illumination system, and described illumination objective lens group is the two cemented objective groups of illumination.
5. coaxial alignment achromatic optical system as claimed in claim 1 is characterized in that, described mask mark illuminator is the Kohler illumination system, and described illumination objective lens group is the Kohler illumination objective lens.
6. coaxial alignment achromatic optical system as claimed in claim 1 is characterized in that, described exposure object mark illuminator is the critical illumination system, and described illumination objective lens group is the two cemented objective groups of illumination.
7. coaxial alignment achromatic optical system as claimed in claim 1 is characterized in that, described exposure object mark illuminator is the Kohler illumination system, and described illumination objective lens group is the Kohler illumination objective lens.
8. as claim 4 or 6 described coaxial alignment achromatic optical systems, it is characterized in that the two cemented objective groups of described illumination are set up jointly with two cemented objective group second lens glues of illumination by two cemented objective group first lens of illumination.
9. coaxial alignment achromatic optical system as claimed in claim 8 is characterized in that, two cemented objective group first lens of described illumination are biconvex lens, and two cemented objective group second lens of described illumination are biconcave lenss.
10. coaxial alignment achromatic optical system as claimed in claim 4 is characterized in that, when described mask mark illuminator was the critical illumination system, the lower surface of described lighting fiber exit end and mask plate was the object-image conjugate face.
11. coaxial alignment achromatic optical system as claimed in claim 6 is characterized in that, when described exposure object mark illuminator was the critical illumination system, described lighting fiber exit end and exposure object upper surface were the object-image conjugate face.
12. as claim 5 or 7 described coaxial alignment achromatic optical systems, it is characterized in that, described Kohler illumination objective lens is by Kohler illumination objective lens first lens, Kohler illumination objective lens second lens, Kohler illumination objective lens the 3rd lens, field stop and Kohler illumination objective lens the 4th lens are formed, and setting separated from one another between adjacent two lens; Wherein, described Kohler illumination objective lens first lens, Kohler illumination objective lens second lens and Kohler illumination objective lens the 3rd lens are formed the collecting lens group.
13. coaxial alignment achromatic optical system as claimed in claim 12, it is characterized in that, described Kohler illumination objective lens first lens and Kohler illumination objective lens the 4th lens are meniscus, described Kohler illumination objective lens second lens are biconcave lenss, and described Kohler illumination objective lens the 3rd lens are biconvex lens.
14. coaxial alignment achromatic optical system as claimed in claim 12 is characterized in that, when described mask mark illuminator was the Kohler illumination system, described lighting fiber exit end and aperture diaphragm were the object-image conjugate face; Mask index face on field stop and the mask plate lower surface is the object-image conjugate face.
15. coaxial alignment achromatic optical system as claimed in claim 12 is characterized in that, when described mask mark illuminator was the Kohler illumination system, described lighting fiber exit end and aperture diaphragm were the object-image conjugate face; Mask index face on field stop and the mask plate lower surface is the object-image conjugate face; Mask index face and the exposure object index face on the exposure object upper surface on the described mask plate lower surface are the object-image conjugate face.
16. coaxial alignment achromatic optical system as claimed in claim 1, it is characterized in that, described beam splitting right-angle prism is made up of 2 right-angle prism gummeds, is coated with the light beam that is used for 50% therein on the inclined-plane of a right-angle prism and reflects, and the light beam to 50% carries out the film of transmission.
17. coaxial alignment achromatic optical system as claimed in claim 1, it is characterized in that, form as objective lens before described by preceding forming as objective lens first lens, the preceding composition as objective lens second lens, form as objective lens the 4th lens preceding the composition as objective lens the 3rd lens and preceding composition, and setting separated from one another between each adjacent lens.
18. coaxial alignment achromatic optical system as claimed in claim 17, it is characterized in that, forming as objective lens first lens before described is meniscus, forming as objective lens second lens before described is biconcave lens, and be biconvex lens as objective lens the 3rd lens and preceding composition as objective lens the 4th lens described preceding the composition.
19. coaxial alignment achromatic optical system as claimed in claim 1 is characterized in that, described back is formed to be made up of as objective lens first lens the back as objective lens and is formed with then forming as objective lens second lens, and setting separated from one another between the two adjacent lens.
20. coaxial alignment achromatic optical system as claimed in claim 19 is characterized in that, it is biconcave lenss that described back is formed as objective lens first lens, and it is concave-convex lenss that described back is formed as objective lens second lens.
21. coaxial alignment achromatic optical system as claimed in claim 1, it is characterized in that, optical element below described mask mark illuminator, mask mark imaging system, exposure object mark illuminator and exposure object mark imaging system are shared, comprising: mask plate, preceding composition are as objective lens, aperture diaphragm and beam splitting right-angle prism.
22. coaxial alignment achromatic optical system as claimed in claim 1, it is characterized in that, described mask mark illuminator, mask mark imaging system, exposure object mark illuminator and exposure object mark imaging system also comprise a shared light path deflection mirror group, form as between objective lens and the mask plate before it is arranged on.
23. coaxial alignment achromatic optical system as claimed in claim 22 is characterized in that, described light path deflection mirror group is a catoptron.
24. coaxial alignment achromatic optical system as claimed in claim 22 is characterized in that, described light path deflection mirror group comprises catoptron, external reflection right-angle prism and the internal reflection right-angle prism that sets gradually.
25. coaxial alignment achromatic optical system as claimed in claim 22, it is characterized in that, described light path deflection mirror group is made up of internal reflection right-angle prism and right-angle prism gummed, this right-angle prism is made up of first right-angle prism and second right-angle prism gummed inclined-plane, is plating the internal reflection film on the inclined-plane of first right-angle prism or plating external reflection film on the inclined-plane of second right-angle prism.
26. coaxial alignment achromatic optical system as claimed in claim 22, it is characterized in that, described light path deflection mirror group is glued together the right-angle side face by 2 internal reflection right-angle prisms according to the parallel mode in two inclined-planes and is formed, and plates the internal reflection film respectively on the inclined-plane of 2 internal reflection right-angle prisms.
27. coaxial alignment achromatic optical system as claimed in claim 19 is characterized in that, described light path deflection mirror group is an optical element that the cross section is a parallelogram, and plates the internal reflection film on 2 relative inclined-planes of this optical element.
28. coaxial alignment achromatic optical system as claimed in claim 1, it is characterized in that, described mask mark illuminator and exposure object mark illuminator are the coaxial-illuminating system, its respectively with mask mark imaging system and the shared same optical axis of exposure object mark imaging system.
29. coaxial alignment achromatic optical system as claimed in claim 1 is characterized in that, described optical projection system is the all-refraction type optical system, or refractive and reflective optical system.
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| CN2007101728016A CN101211124B (en) | 2007-12-21 | 2007-12-21 | Coaxial aligning achromatic optical system |
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| CN2007101728016A CN101211124B (en) | 2007-12-21 | 2007-12-21 | Coaxial aligning achromatic optical system |
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| CN101211124B true CN101211124B (en) | 2010-06-02 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5477057A (en) * | 1994-08-17 | 1995-12-19 | Svg Lithography Systems, Inc. | Off axis alignment system for scanning photolithography |
| US5621813A (en) * | 1993-01-14 | 1997-04-15 | Ultratech Stepper, Inc. | Pattern recognition alignment system |
| US6151102A (en) * | 1996-04-09 | 2000-11-21 | Nikon Corporation | Projection exposure apparatus |
| CN1655064A (en) * | 2005-03-07 | 2005-08-17 | 上海微电子装备有限公司 | In-situ detection method for stray light in step scan projection mask aligner |
-
2007
- 2007-12-21 CN CN2007101728016A patent/CN101211124B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5621813A (en) * | 1993-01-14 | 1997-04-15 | Ultratech Stepper, Inc. | Pattern recognition alignment system |
| US5477057A (en) * | 1994-08-17 | 1995-12-19 | Svg Lithography Systems, Inc. | Off axis alignment system for scanning photolithography |
| US6151102A (en) * | 1996-04-09 | 2000-11-21 | Nikon Corporation | Projection exposure apparatus |
| CN1655064A (en) * | 2005-03-07 | 2005-08-17 | 上海微电子装备有限公司 | In-situ detection method for stray light in step scan projection mask aligner |
Non-Patent Citations (1)
| Title |
|---|
| JP特开2001-267212A 2001.09.28 |
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Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |