CN101206984A

CN101206984A - Structure for increasing electric plasm display or electric plasm television lightness

Info

Publication number: CN101206984A
Application number: CNA2006101707693A
Authority: CN
Inventors: 芈振伟
Original assignee: Individual
Current assignee: Individual
Priority date: 2006-12-22
Filing date: 2006-12-22
Publication date: 2008-06-25

Abstract

The invention relates to a structure for increasing the brightness of a plasma display or a plasma television, in particular to a full dielectric substance optical thin film reflecting layer additionally arranged between a front glass base plate and a rear glass base plate directly. Through the structure, ultraviolet light with the wavelength between 140 and 200 mm, in particular to ultraviolet light with the wavelength of 147 mm or 173 mm emitted upward is reflected back to a fluorescer layer, and the luminosity of the part (the brightness of visible light is therefore increased, and because the visible light penetrates through the full dielectric substance optical thin film reflecting layer) is utilized again; thereby the whole luminosity from the front panel is enhanced.

Description

A kind of structure that increases plasma display panel or plasma-screen television brightness

Technical field

What the present invention relates to is that a kind of increase plasma display panel PDP (Plasma Display Panel) or plasma-screen television are (when plasma display panel adds TV channel selection function, promptly become so-called plasma-screen television) structure of brightness, especially a kind of rely on adds a full dielectric medium optical thin film reflector layer and utilizes exciting of phosphor layer once again and make wavelength be 140-200nm, especially the ultraviolet light of 147nm or 173nm is reflected, and wavelength is about the above visible light of 400nm and can not be reflected and can pass through aforesaid full dielectric medium optical thin film reflector layer, and is like this and can strengthen the brightness of plasma-screen television front panel.

Background technology

The main structure of plasma display panel PDP is as shown in Figure 1, be matrix circuit structure (Matrix Circuit) its mainly by a front glass substrate 11 and one the back glass substrate 12 formed; Wherein, it below front glass substrate 11 the trickle metal that is provided with the parallel transparency electrode 11a of plural groups and increases electric current, be 111 compositions of so-called bus electrode (bus electrode), be electrically connected producing with the external world, glass substrate 12 places are provided with a plurality of barrier ribs 13 that are coated with phosphor layer in its surface in the back, and then be to be provided with the addressing electrode 11b that transparency electrode on a plurality of and the front glass substrate is vertical arrangement in the bottom surface of each small chamber 15 (cell) that is divided into by barrier rib 13, also can produce as glass substrate 12 after this and be electrically connected with the external world.

Its technical development of panel is still the period that AC exchanges and two kinds of different driving modes of DC direct current are competed mutually until generation nineteen ninety, and the consistent AC AC type PDP plasma display panel of selecting of each company at present.

Please referring to shown in Figure 2, PDP plasma display panel structure aspect is made of layer glass substrate about front glass substrate (frontglass substrate) 11, the back glass substrate (rear glass substrate) 12 etc. as previously mentioned, and injects (inert) gas and finish basic framework in

front glass substrate

11 and 12 discharge spaces that sealed of back glass substrate.Be placed with a plurality of transparency electrode 11a in that front glass substrate 11 is built-in, on the glass substrate 12 of back and 11 of front glass substrates then be to be provided with a plurality of barrier ribs 13, and on the wall of 13 of barrier ribs in twos, be coated with a plurality of phosphor layer 14; Thereafter, then can rely on the discharge of described transparency electrode 11a, the reflection of described phosphor layer 14, and visible light can be reflexed to front glass substrate 11, to strengthen brightness by image that front glass substrate 11 is presented.In addition, shown in figure, can see in the dielectric medium 16 that a plurality of addressing electrode 11b are arranged on described a plurality of phosphor layer 14 belows, therefore, rely on the control of this addressing electrode 11b, with cooperating of transparency electrode 11a, then can choose should luminous demonstration small chamber 15 (cell) and penetrated by front glass substrate 11.By above-mentioned theory as can be known, its main luminescence medium mainly is to rest on the phosphor layer 14 that is coated with on the wall of 13 of barrier ribs in twos.

Please referring to shown in Figure 3; the gas that wherein can see in discharge space to be added is the gaseous mixture of xenon and neon normally; helium and xenon mixer are also arranged; but the life-span is shorter; the perhaps gaseous mixture person of helium, xenon and three kinds of gases of neon; xenon shared ratio in mist is generally 10%; the application of doing selection among from 4% to 20% is also arranged; usually can be between the 140nm to 200nm at wavelength and plant mist thus at the light wave that process excites the back to be produced; especially, can form special shock wave kenel at wavelength 147nm and 173nm place.

Please referring again to shown in Figure 2; when transparency electrode 11a in the existing plasma display panel discharges; general observed is the light that is produced by the ultraviolet light institute fluorescence excitation agent layer 14 of downward and side to luminous situation; but ultraviolet light has upward then fully been wasted; see also shown in Figure 4; its upwards ultraviolet light of irradiation absorbed by front glass substrate and protective layer, transparency electrode etc. and become heat energy but not visual luminous energy so that the luminosity of front glass substrate 11 always can't do effective lifting.

Moreover, the optical film technique that is developed with the dielectric medium plated film of 1/4 optical wavelength thickness makes rapid progress in recent years, especially aspect the high-quality coating technique development of the thickness detecting of vacuum coating and monitoring and ion beam sputtering deposition, the feasible multilayer optical film heap plated film that forms with the dielectric material repeated combination of height different refractivity, high reflection plated film of dielectric medium wherein and long wave pass all can reach quite desirable effect, this type of nonmetallic full dielectric medium plated film membrane stack may be up to several layers, ten several layers, even be tens of layers membrane stack, its characteristic is to be highly reflective in the light wave zone of setting, and beyond this light wave zone, average percent of pass is just very high, membrane stack can be repeatability, repeats symmetry or multi-cavity body membrane stack.Then can be set in vacuum-ultraviolet light (VUV with this type of optically coated application; Vacuum Ultra-violet) zone or title deep UV (ultraviolet light) district (FUV:Far-UltravioletRegion120-200nm) (A district as shown in Figure 5 and the A district of Figure 11); Be about the 140nm extension so that be high-reflection region in the 200nm in PDP discharge ultraviolet spectrum shown in the present, and visible light zone (400-800nm) be high-penetration (by) district (B), so see that with the naked eye the glass mirror layer of this type of plated film is transparent, can not cover visible light.The dielectric material of optical thin film is quite a lot of in addition, AlF3 aluminum fluoride from low-refraction 1.36 (when wavelength is 230nm), the MgF2 magnesium fluoride of refractive index 1.38 (when wavelength is 550nm), the LaF3 lanthanum fluoride of refractive index 1.59 (when wavelength is 550nm), the MgO magnesium oxide of refractive index 1.7 (when wavelength is 550nm), the ZnS zinc sulphide of refractive index 2.35 (when wavelength is 550nm) and PbTe single lead (during 5000nm) with high index 5.6, in this employed dielectric material in VUV district is high index of refraction with lanthanum fluoride LaF3 generally, and magnesium fluoride MgF2 is the composition of low-refraction, the plated film of these two kinds of materials can be low to moderate the deep UV (ultraviolet light) that the 140nm place still is difficult for absorbing this district, so be the good material of optical thin film deep UV (ultraviolet light); In addition, also suitable many of the method for optical thin film system plating, it generally is mode based on the gaseous state film forming, can be divided into the long-pending method of long-pending method in physical vapor Shen (being called for short PVD) and chemical gaseous phase Shen (being called for short CVD) again, just repeat no more herein, so as how the so-called optical plated film substitutes traditional reflector layer, to reach the effect of effective raising brightness, is the purpose that the present invention need inquire into.

Summary of the invention

The main purpose of the present invention promptly is that a kind of structure that increases plasma display panel or plasma-screen television brightness is being provided, its employed technological means mainly promptly is to put below at front glass substrate a full dielectric medium optical thin film reflector layer is arranged, so the ultraviolet light that is produced upward in the room between the glass substrate of front and back can be reflected, wherein said ultraviolet light wavelength is 140-200nm, especially wavelength 147nm or 173nm, wavelength are that the above visible rays to 800nm of 400nm then gives passing through of high transmission; So, add that by transparency electrode addressing electrode cooperates the ultraviolet light that is produced, each color element of reflected back red, green, blue that then can be able to because of full dielectric medium optical thin film reflector layer of the present invention once again shows on the phosphor layer of small chamber (cell), and form red, green, blue visible light of all kinds, and penetrate away by front glass substrate, and reach the purpose of strengthening plasma display panel or plasma-screen television brightness.

Means more used in the present invention then be can front glass substrate below put a full dielectric medium optical thin film reflector layer arranged, simultaneously, then putting one deck below the glass substrate phosphor layer of back can be with the full dielectric medium optical thin film reflector layer of visible light reflection, then relying on the set full dielectric medium optical thin film reflector layer of described front glass substrate is to be the light of 140-200nm with wavelength, especially wavelength is that the light of 147nm or 173nm is reflected, wavelength is that the visible light light of 400-800nm is then after running into the set full dielectric medium optical thin film reflector layer of described back glass substrate, similarly reflected, then can utilize ultraviolet reflection of light and visual reflection of light when the time comes and can strengthen the purpose of plasma display panel or plasma-screen television brightness.

Means more used in the present invention then be can front glass substrate below put a full dielectric medium optical thin film reflector layer arranged, simultaneously, below the glass substrate phosphor layer of back, then put another full dielectric medium optical thin film reflector layer, rely on this two-layer full dielectric medium optical thin film reflector layer and can be the light of 140-200nm with wavelength, especially wavelength be that the light of 147nm or 173nm is reflected and reaches the purpose of strengthening plasma display panel or plasma-screen television brightness.

Means more used in the present invention promptly be can front glass substrate below put a full dielectric medium optical thin film reflector layer arranged, simultaneously, then putting a full dielectric medium optical thin film reflector layer and below the glass substrate phosphor layer of back can be with the full dielectric medium optical thin film reflector layer of visible light reflection, rely on the set identical material full dielectric medium optical thin film reflector layer of described front glass substrate and back glass substrate and can be the ultraviolet light of 140-200nm with wavelength, especially wavelength is that the ultraviolet light of 147nm or 173nm is reflected earlier, the visible light that by means of the described full dielectric medium optical thin film reflector layer that visible light can be reflected can be 400-800nm again with wavelength reflects again, and reaches the purpose of strengthening plasma display panel or plasma-screen television brightness.

Description of drawings

Fig. 1 is the schematic perspective view of existing plasma display panel or plasma-screen television structure;

Fig. 2 is for having the structural representation that plasma display panel or plasma-screen television form in the brightness of front glass substrate place now;

The schematic diagram of the spectrum that produces when Fig. 3 is excited in discharge space for neon and xenon;

When Fig. 4 discharges for having now, the schematic diagram that the ultraviolet light that makes progress is wasted;

The reflectance of Fig. 5 high reflection of full dielectric medium plated film and the distribution map of transmission for different light wave length penetrate;

Fig. 6 is the making flow chart of the structure of increase plasma display panel provided by the present invention or plasma-screen television brightness;

Fig. 7 is the structural representation of first embodiment of the structure of increase plasma display panel provided by the present invention or plasma-screen television brightness;

Fig. 8 is the structural representation of second embodiment of the structure of increase plasma display panel provided by the present invention or plasma-screen television brightness;

Fig. 9 is the structural representation of the 3rd embodiment of the structure of increase plasma display panel provided by the present invention or plasma-screen television brightness;

Figure 10 is the structural representation of the 4th embodiment of the structure of increase plasma display panel provided by the present invention or plasma-screen television brightness;

Figure 11 can reach the purpose schematic diagram of high reflectance (in the shortwave district) and high penetration (in the long-wavelength region) for full dielectric medium optical thin film long-pass provided by the present invention (Long Wave Pass) reflector layer.

Description of reference numerals: 11-front glass substrate; The 11a-transparency electrode; Glass substrate behind the 11b-addressing electrode; 13-barrier rib phosphor layer; 15-small chamber; The 16-dielectric medium; The A-high-reflection region; B-is high by the district; 23-transparent dielectric layer and sealant; The 24-protective layer; The 25-first full dielectric medium optical thin film reflector layer; 25 '-the second full dielectric medium optical thin film reflector layer; 26-the 3rd full dielectric medium optical thin film reflector layer; The 27-anti-reflecting layer; The 111-bus electrode.

Embodiment

See also the appended graphic Fig. 6 of the utility model, wherein the those shown is the formation step of plasma display panel described in the present invention or plasma-screen television front glass substrate, by it at first is to insert front glass substrate 11 (being step S1) as can be known in graphic, side at described glass substrate 11 is formed with transparency electrode 11a (being step S2) again, is formed with bus electrode 111 (being step S3) (buselectrode) in described transparency electrode 11a side again; Thereafter, a side of described bus electrode 111 then has the formation (being step S4) of transparent dielectric layer and sealant 23, and coming then is that a side at described transparent dielectric layer and sealant 23 is formed with a magnesium oxide (MgO) protective layer 24 (being step S5) again.

The of the present invention first full dielectric medium optical thin film reflector layer 25 then is the side at above-mentioned protective layer 24, and just the side towards back glass substrate direction forms (being step S6); It mainly is to form in the mode that the optical thin film plated film multilayer film of light wavelength lambda/4 or other ratio etc. is piled, and the membrane stack multilayer optical film heap plated film that to be the dielectric material repeated combination with the height different refractivity form, this type of nonmetallic full dielectric medium plated film membrane stack may be up to several layers, even be tens of layers, its characteristic is to be highly reflective (average reflectance of various angles can reach about 99.5%) in the light wave zone of setting, and beyond this light wave zone, the average percent of pass of various angles is just very high, also can be up to 95% (anti-reflective film adding).Then can set the ultraviolet light zone with this type of optically coated application is highly reflective and be cross-country traveling ability in the visible light zone, is transparent so with the naked eye see the glass of this type of plated film, can not cover visible light.

Rely on the first above-mentioned full dielectric medium optical thin film reflector layer 25, if the light that is sent by transparency electrode 11a is venerated the light between wavelength 140-200nm, especially wavelength is that the light of 147nm or 173nm then can give whole phosphor layer 14 (as shown in Figure 7) that reflect back into, to strengthen the brightness at front glass substrate 11.

Moreover, for ultraviolet light, because the thickness that phosphor layer was coated with as thin as a wafer, density is therefore not good, so that some zone have trickle between the crack exist, so outwards penetrate for fear of ultraviolet light, the outside of this skim phosphor layer can further be provided with the optical coating that can make shortwave light be reflected, make ultraviolet light can repeat repeatedly to reflect and fluorescent agent coat excited and become visible light, as shown in Figure 8, an embodiment more of the present invention then be can front glass substrate 11 below put one first full dielectric medium optical thin film reflector layer 25 arranged, simultaneously, below phosphor layer 14, be provided with one second full dielectric medium optical thin film reflector layer 25 ' again, rely on the described first full dielectric medium optical thin film reflector layer 25 with the described second full dielectric medium optical thin film reflector layer 25 ' and can be the light of 140-200nm with wavelength, especially wavelength be that the light of 147nm or 173nm is reflected the purpose that reaches reinforcement plasma display panel or plasma-screen television brightness.

And promptly being provided with one below phosphor layer 14, another practice can reflect the 3rd full dielectric medium optical thin film reflector layer 26 (as shown in Figure 9) of visible light, then wavelength is that the visible light light of 400-800nm is after running into the described the 3rd full dielectric medium optical thin film reflector layer 26, similarly reflected, then can utilize ultraviolet reflection of light and visual reflection of light when the time comes and reach the purpose of strengthening plasma display panel or plasma-screen television brightness.

As shown in figure 10, another embodiment of the present invention promptly be can front glass substrate 11 below put one first full dielectric medium optical thin film reflector layer 25 arranged, simultaneously, then be to put one second full dielectric medium optical thin film reflector layer 25 ' and can reflect the 3rd full dielectric medium optical thin film reflector layer 26 of visible light below phosphor layer 14, relying on the described first full dielectric medium optical thin film reflector layer 25 can be the light of 140-200nm with wavelength with the described second full dielectric medium optical thin film reflector layer 25 ', especially wavelength is that the light of 147nm or 173nm is reflected, and rely on the described the 3rd full dielectric medium optical thin film reflector layer 26 and can be that the visible light of 400-800nm reflects with wavelength again, and reach the purpose of reinforcement plasma display panel or plasma-screen television brightness.In addition, when being provided with the second full dielectric medium optical thin film reflector layer 25 ' or the 3rd full dielectric medium optical thin film reflector layer 26 on the glass substrate 12 of described back separately, promptly as the embodiment of Fig. 8 to Figure 10,16 of dielectric mediums that coat described addressing electrode 11b on the glass substrate 12 of described back originally can be cancelled.

If generating of the present invention space is words of having injected mercury and inert gas, can with wavelength the light of 170-270nm then, especially the ultraviolet light of wavelength 184.9nm or 253.7nm is reflected, wavelength is that the above light to 800nm of 400nm then can high transmission give by, this then is aforementioned so-called shortwave reflection, the example that long-pass is best excessively; But general plasma display panel or plasma-screen television do not use mercury, its reason is except the factor of environmental protection, mainly be because the relation of working temperature, the boiling point of mercury is 357 ℃ 1 under atmospheric, but if reduce to 182.85 ℃ and will gasify in that 10Torr air pressure is next, if then be 44.85 ℃ to 0.01Torr and will gasify for a short time, because vacuum is tens Torr in the pipe of general mercury vapor lamp, the mercury ratio is easier to become gas under such low pressure, and the vacuum of plasma display panel or plasma-screen television pressure is 500Torr, near an atmospheric pressure 760Torr, be tens times of mercury vapor lamp, so mercury is difficult for becoming gas as a means of utilization.But if the discharge gas pressure of plasma display panel or plasma-screen television is reduced to tens Torr, may be again will face that inert gas exhausts easily and long shortcoming of life-span, the gas of mercury also can have been used if there is automatic air supply device then can reduce the air pressure of plasma display panel or plasma-screen television.This situation then can in other appended graphic Figure 11, see with, as seen from the figure to being that the 140-200nm place is a high reflectivity regions at wavelength, and be more than the 400nm during when wavelength to 800nm, then be the high penetration zone.Thus then as can be known, the of the present invention first full dielectric medium optical thin film reflector layer 25 is when being seated in front glass substrate 11, and shortwave is reflected in certain can reaching, and the purpose that allows long-pass to cross.

Moreover, among above-mentioned each embodiment of the present invention, all can above described glass substrate 11, add the luminosity that an anti-reflecting layer (AR:Anti-Reflector) 27 (being step S7) comes reinforced glass substrate 11 to send in the surface; Generally can increase by about 5% brightness.

In addition; first of the indication full dielectric medium optical thin film reflector layer 25 or the second full dielectric medium optical thin film reflector layer 25 ' are to have the ultraviolet light (below the 400nm that can reflect any angle among the present invention; generally define); can allow simultaneously visible light (400nm～800nm again; generally define; certainly also can define 380nm above is visible light; acuity on human eye is decided) function passed through; such as various reflectance coatings such as long-pass; high reflection; band is logical; band ends; cut-off light filtering films or the like title, the dielectric medium plated film that the while visible light is passed through as long as have the ultraviolet light wave reflection is all in protection range of the present invention.

In addition, the people who knows described technology also can know and knows: the described front glass substrate 11 that is located at ought also can be substituted by other suitable electrode with back 12 transparency electrode 11a in order to the discharge generation ultraviolet light of glass substrate.

The above only is preferred embodiment of the present invention, only is illustrative for the purpose of the present invention, and nonrestrictive.Those skilled in the art is understood, and can carry out many changes to it in the spirit and scope that claim of the present invention limited, revise, even equivalence, but all will fall within the scope of protection of the present invention.

Claims

1. structure that increases plasma display panel or plasma-screen television brightness, its be have a front glass substrate, a back glass substrate, a plurality of electrode that is located at described front glass substrate and described back glass substrate one side respectively, a plurality of be formed on described front glass substrate with described afterwards between glass substrate and adding the discharge space of inert gas is arranged, described discharge space also can produce the ultraviolet light of wavelength between 140nm to 200nm because of the effect of above-mentioned electrode, and a plurality of phosphor layer that are coated on glass substrate top, described back, it is characterized in that:

The below of described front glass substrate is also to be provided with one first full dielectric medium optical thin film reflector layer, enabling described wavelength is that the ultraviolet light of 140nm to 200nm reflexes to described a plurality of phosphor layer and becomes visible light to excite, described visible light is the penetrable described first full dielectric medium optical thin film reflector layer simultaneously, reaches the brightness of strengthening plasma display panel or plasma-screen television.

2. the structure of increase plasma display panel according to claim 1 or plasma-screen television brightness, it is characterized in that: the set a plurality of phosphor layer of glass substrate below, described back also is provided with one second full dielectric medium optical thin film reflector layer, but the described second full dielectric medium optical thin film reflector layer also has the ultraviolet light that reflection wavelength is 140nm to 200nm, enable the described first full dielectric medium optical thin film reflector layer that cooperates described front glass substrate set, to strengthen ultraviolet reflection of light to described wavelength 140nm to 200nm.

3. the structure of increase plasma display panel according to claim 1 or plasma-screen television brightness, it is characterized in that: the below of the set a plurality of phosphor layer of described back glass substrate also is provided with one and can reflects the 3rd full dielectric medium optical thin film reflector layer of visible light, the described the 3rd full dielectric medium optical thin film reflector layer will be reflected by the visible light that described a plurality of phosphor layer excited, to strengthen the brightness of plasma display panel or plasma-screen television.

4. the structure of increase plasma display panel according to claim 3 or plasma-screen television brightness, it is characterized in that: between described back set a plurality of phosphor layer of glass substrate and the described the 3rd full dielectric medium optical thin film reflector layer is also to be provided with one second full dielectric medium optical thin film reflector layer, enable the described first full dielectric medium optical thin film reflector layer that cooperates described front glass substrate set, to strengthen for described wavelength is the ultraviolet reflection of light of 140nm to 200nm, and rely on the described the 3rd full dielectric medium optical thin film reflector layer that the visible light that described a plurality of phosphor layer is excited is reflected, to strengthen the brightness of plasma display panel or plasma-screen television.

5. the structure of increase plasma display panel according to claim 1 or plasma-screen television brightness is characterized in that: described ultraviolet light wavelength refers in particular to 147nm or 173nm.

6. the structure of increase plasma display panel according to claim 1 or plasma-screen television brightness is characterized in that: the wave-length coverage of described visible light is between between the 400nm to 800nm.

7. the structure of increase plasma display panel according to claim 1 or plasma-screen television brightness is characterized in that: described electrode is a transparency electrode.

8. the structure of increase plasma display panel according to claim 1 or plasma-screen television brightness is characterized in that: described inert gas is that free xenon, neon and helium are formed one or more the mist in the group.

9. the structure of increase plasma display panel according to claim 1 or plasma-screen television brightness is characterized in that: described a plurality of firefly agent layers are that the fluorophor by three kinds of colors of red, green, blue is constituted.

10. structure that increases plasma display panel or plasma-screen television brightness, its be have a front glass substrate, a back glass substrate, a plurality of electrode that is located at described front glass substrate and described back glass substrate one side respectively, a plurality of be formed on described front glass substrate with described afterwards between glass substrate and adding the discharge space of mercury and inert gas is arranged, described discharge space also can produce the ultraviolet light of wavelength between 170nm to 270nm because of the effect of above-mentioned electrode, and a plurality of phosphor layer that are coated on glass substrate top, described back, its feature exists:

The below of described front glass substrate is also to be provided with one first full dielectric medium optical thin film reflector layer, enabling described wavelength is that the ultraviolet light of 170nm to 270nm reflexes to described a plurality of phosphor layer and becomes visible light to excite, described visible light penetrates the described first full dielectric medium optical thin film reflector layer, reaches the brightness of strengthening plasma display panel or plasma-screen television.

11. the structure of increase plasma display panel according to claim 10 or plasma-screen television brightness, it is characterized in that: the set a plurality of phosphor layer of glass substrate below, described back is also to be provided with one second full dielectric medium optical thin film reflector layer, but the described second full dielectric medium optical thin film reflector layer also has the ultraviolet light that reflection wavelength is 170nm to 270nm, enabling the described first full dielectric medium optical thin film reflector layer that cooperates described front glass substrate set, is the ultraviolet reflection of light of 170nm to 270nm to strengthen described wavelength.

12. the structure of increase plasma display panel according to claim 10 or plasma-screen television brightness, it is characterized in that: the below of the set a plurality of phosphor layer of described back glass substrate also is provided with one and can reflects the 3rd full dielectric medium optical thin film reflector layer of visible light, rely on the described the 3rd full dielectric medium optical thin film reflector layer will be reflected by the visible light that described a plurality of phosphor layer excited, to strengthen the brightness of plasma display panel or plasma-screen television.

13. the structure of increase plasma display panel according to claim 12 or plasma-screen television brightness, it is characterized in that: between described back set a plurality of phosphor layer of glass substrate and the described the 3rd full dielectric medium optical thin film reflector layer is also to be provided with one second full dielectric medium optical thin film reflector layer, enable the described first full dielectric medium optical thin film reflector layer that cooperates described front glass substrate set, to strengthen described wavelength is the ultraviolet reflection of light of 170nm to 270nm, and rely on the described the 3rd full dielectric medium optical thin film reflector layer that the visible light that described a plurality of phosphor layer is excited is reflected, to strengthen the brightness of plasma display panel or plasma-screen television.

14. the structure of increase plasma display panel according to claim 10 or plasma-screen television brightness is characterized in that: described ultraviolet light wavelength refers in particular to 184.9nm or 253.7nm.

15. the structure of increase plasma display panel according to claim 10 or plasma-screen television brightness is characterized in that: the wave-length coverage of described visible light then is between between the 400nm to 800nm.

16. the structure of increase plasma display panel according to claim 10 or plasma-screen television brightness is characterized in that: described electrode is a transparency electrode.

17. the structure of increase plasma display panel according to claim 10 or plasma-screen television brightness is characterized in that: described a plurality of firefly agent layers are that the fluorophor by three kinds of colors of red, green, blue is constituted.