CN101195564B - Method for producing trichloro-acetic chloride with by-product in organic acyloxy silicone hydride production process - Google Patents
Method for producing trichloro-acetic chloride with by-product in organic acyloxy silicone hydride production process Download PDFInfo
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- CN101195564B CN101195564B CN2007101647184A CN200710164718A CN101195564B CN 101195564 B CN101195564 B CN 101195564B CN 2007101647184 A CN2007101647184 A CN 2007101647184A CN 200710164718 A CN200710164718 A CN 200710164718A CN 101195564 B CN101195564 B CN 101195564B
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- China
- Prior art keywords
- product
- reaction
- chlorine
- production process
- silicone hydride
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- 239000006227 byproduct Substances 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 125000004423 acyloxy group Chemical group 0.000 title claims abstract description 22
- 150000004678 hydrides Chemical class 0.000 title claims description 19
- 229920001296 polysiloxane Polymers 0.000 title claims description 19
- PVFOMCVHYWHZJE-UHFFFAOYSA-N trichloroacetyl chloride Chemical compound ClC(=O)C(Cl)(Cl)Cl PVFOMCVHYWHZJE-UHFFFAOYSA-N 0.000 title abstract description 6
- 238000000034 method Methods 0.000 claims abstract description 24
- 238000005660 chlorination reaction Methods 0.000 claims abstract description 23
- 238000010574 gas phase reaction Methods 0.000 claims abstract description 17
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 11
- 230000035484 reaction time Effects 0.000 claims abstract description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 36
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 31
- 239000000460 chlorine Substances 0.000 claims description 31
- 229910052801 chlorine Inorganic materials 0.000 claims description 31
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 claims description 28
- 239000012346 acetyl chloride Substances 0.000 claims description 28
- 238000004821 distillation Methods 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 abstract description 55
- 239000012535 impurity Substances 0.000 abstract description 12
- 239000002994 raw material Substances 0.000 abstract description 7
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 abstract description 5
- 238000000926 separation method Methods 0.000 abstract description 4
- 238000000746 purification Methods 0.000 abstract description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 3
- 229910000077 silane Inorganic materials 0.000 abstract 3
- 239000000047 product Substances 0.000 description 29
- 239000007789 gas Substances 0.000 description 19
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 13
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 10
- 238000010992 reflux Methods 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- FBCCMZVIWNDFMO-UHFFFAOYSA-N dichloroacetyl chloride Chemical compound ClC(Cl)C(Cl)=O FBCCMZVIWNDFMO-UHFFFAOYSA-N 0.000 description 9
- 230000004044 response Effects 0.000 description 7
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000004587 chromatography analysis Methods 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000005649 metathesis reaction Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 238000011084 recovery Methods 0.000 description 5
- 239000005051 trimethylchlorosilane Substances 0.000 description 5
- KXJLGCBCRCSXQF-UHFFFAOYSA-N [diacetyloxy(ethyl)silyl] acetate Chemical compound CC(=O)O[Si](CC)(OC(C)=O)OC(C)=O KXJLGCBCRCSXQF-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000012856 packing Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000002194 synthesizing effect Effects 0.000 description 4
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 3
- 229940106681 chloroacetic acid Drugs 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000012452 mother liquor Substances 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- 239000005049 silicon tetrachloride Substances 0.000 description 3
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000001263 acyl chlorides Chemical class 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000007670 refining Methods 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- UCXJIMXPWMPPEW-UHFFFAOYSA-N CC(Cl(Br)(Br)Br)=O Chemical compound CC(Cl(Br)(Br)Br)=O UCXJIMXPWMPPEW-UHFFFAOYSA-N 0.000 description 1
- SDFQLCFMUNOJNA-UHFFFAOYSA-N C[Si](Cl)(C)C.C(C)(=O)Cl Chemical compound C[Si](Cl)(C)C.C(C)(=O)Cl SDFQLCFMUNOJNA-UHFFFAOYSA-N 0.000 description 1
- VGCXGMAHQTYDJK-UHFFFAOYSA-N Chloroacetyl chloride Chemical compound ClCC(Cl)=O VGCXGMAHQTYDJK-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007806 chemical reaction intermediate Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- SBPBAQFWLVIOKP-UHFFFAOYSA-N chlorpyrifos Chemical class CCOP(=S)(OCC)OC1=NC(Cl)=C(Cl)C=C1Cl SBPBAQFWLVIOKP-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- PXJJSXABGXMUSU-UHFFFAOYSA-N disulfur dichloride Chemical compound ClSSCl PXJJSXABGXMUSU-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- VHHHONWQHHHLTI-UHFFFAOYSA-N hexachloroethane Chemical compound ClC(Cl)(Cl)C(Cl)(Cl)Cl VHHHONWQHHHLTI-UHFFFAOYSA-N 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- 238000007539 photo-oxidation reaction Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- VVWRJUBEIPHGQF-UHFFFAOYSA-N propan-2-yl n-propan-2-yloxycarbonyliminocarbamate Chemical compound CC(C)OC(=O)N=NC(=O)OC(C)C VVWRJUBEIPHGQF-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007101647184A CN101195564B (en) | 2007-12-07 | 2007-12-07 | Method for producing trichloro-acetic chloride with by-product in organic acyloxy silicone hydride production process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007101647184A CN101195564B (en) | 2007-12-07 | 2007-12-07 | Method for producing trichloro-acetic chloride with by-product in organic acyloxy silicone hydride production process |
Publications (2)
Publication Number | Publication Date |
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CN101195564A CN101195564A (en) | 2008-06-11 |
CN101195564B true CN101195564B (en) | 2011-06-01 |
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CN2007101647184A Expired - Fee Related CN101195564B (en) | 2007-12-07 | 2007-12-07 | Method for producing trichloro-acetic chloride with by-product in organic acyloxy silicone hydride production process |
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Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN113402381A (en) * | 2021-05-18 | 2021-09-17 | 常州新东化工发展有限公司 | Preparation method of chloroacetyl chloride |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5030753A (en) * | 1989-10-07 | 1991-07-09 | Hoechst Aktiengesellschaft | Process for the preparation of dichloro- or trichloroacetyl chloride |
CN1323778A (en) * | 2000-05-12 | 2001-11-28 | 山东华阳科技股份有限公司 | Prepn. of trichloro-acetic chloride |
CN1086689C (en) * | 1999-09-14 | 2002-06-26 | 中南工业大学 | Process for photooxidation synthesis of trichloro-acetyl chloride |
CN1562941A (en) * | 2004-03-24 | 2005-01-12 | 大庆市富杰化工有限公司 | Method for preparing trichlorideacetyl chloride from mother liquor of chloroactic acid |
-
2007
- 2007-12-07 CN CN2007101647184A patent/CN101195564B/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5030753A (en) * | 1989-10-07 | 1991-07-09 | Hoechst Aktiengesellschaft | Process for the preparation of dichloro- or trichloroacetyl chloride |
CN1086689C (en) * | 1999-09-14 | 2002-06-26 | 中南工业大学 | Process for photooxidation synthesis of trichloro-acetyl chloride |
CN1323778A (en) * | 2000-05-12 | 2001-11-28 | 山东华阳科技股份有限公司 | Prepn. of trichloro-acetic chloride |
CN1562941A (en) * | 2004-03-24 | 2005-01-12 | 大庆市富杰化工有限公司 | Method for preparing trichlorideacetyl chloride from mother liquor of chloroactic acid |
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CN101195564A (en) | 2008-06-11 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: ZHEJIANG HESHENG SILICON INDUSTRY CO., LTD. |
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C41 | Transfer of patent application or patent right or utility model | ||
C53 | Correction of patent for invention or patent application | ||
CB03 | Change of inventor or designer information |
Inventor after: Tan Jun Inventor after: Fan Hong Inventor after: Li Bogeng Inventor after: Ma Guowei Inventor before: Tan Jun Inventor before: Fan Hong Inventor before: Li Bogeng |
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COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: TAN JUN FAN HONG LI BOGENG TO: TAN JUN FAN HONG LI BOGENG MA GUOWEI |
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TA01 | Transfer of patent application right |
Effective date of registration: 20110216 Address after: 310027 Hangzhou, Zhejiang Province, Xihu District, Zhejiang Road, No. 38, No. Applicant after: Zhejiang University Co-applicant after: Zhejiang Hesheng Silicon Industry Co., Ltd. Address before: 310027 Hangzhou, Zhejiang Province, Xihu District, Zhejiang Road, No. 38, No. Applicant before: Zhejiang University |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: 310027 Hangzhou, Zhejiang Province, Xihu District, Zhejiang Road, No. 38, No. Patentee after: Zhejiang University Patentee after: He Shenggui industry incorporated company Address before: 310027 Hangzhou, Zhejiang Province, Xihu District, Zhejiang Road, No. 38, No. Patentee before: Zhejiang University Patentee before: Zhejiang Hesheng Silicon Industry Co., Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110601 Termination date: 20151207 |
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