CN101179212B - Rotating electrical machine winding, rotating electrical machine, and semiconductive insulating component used therein - Google Patents

Rotating electrical machine winding, rotating electrical machine, and semiconductive insulating component used therein Download PDF

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Publication number
CN101179212B
CN101179212B CN2007101672082A CN200710167208A CN101179212B CN 101179212 B CN101179212 B CN 101179212B CN 2007101672082 A CN2007101672082 A CN 2007101672082A CN 200710167208 A CN200710167208 A CN 200710167208A CN 101179212 B CN101179212 B CN 101179212B
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semiconduction
electric rotating
rotating machine
winding
insulating
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CN101179212A (en
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东村丰
仓原吉美
宫尾博
铃木启司
小野田满
田中伸明
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Mitsubishi Heavy Industries Ltd
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Hitachi Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/24Conductive material dispersed in non-conductive organic material the conductive material comprising carbon-silicon compounds, carbon or silicon
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K3/00Details of windings
    • H02K3/32Windings characterised by the shape, form or construction of the insulation
    • H02K3/40Windings characterised by the shape, form or construction of the insulation for high voltage, e.g. affording protection against corona discharges

Abstract

When a rotating electrical machine winding is inserted into a slot with a protective insulation intervening between them, a semiconductive insulating layer is lap-wound between an interlayer insulating layer of the rotating electrical machine winding and the protective insulation, the semiconductive insulating layer being formed by center-folding a continuous semiconductive sheet in the longitudinal direction. A thermal stress relaxation layer is provided inside the center-folded continuous semiconductive sheet so that thermal stress exerted in thickness direction of the insulating layers is absorbed. Accordingly, the invention provides a rotating electrical machine winding capable of preventing corona discharge due to removing or chaping during curing the insulative resin, and a rotating electrical machine.

Description

Electric rotating machine winding and electric rotating machine and the semiconduction insulating substrate that wherein utilizes
Technical field
The semiconducting insulation base material that the present invention relates to electric rotating machine winding and electric rotating machine and wherein utilize relates in particular to electric rotating machine winding and the electric rotating machine of the suitable core for rotary electric machine that the insulating resin one impregnated in assembled the electric rotating machine winding and the semiconduction insulating substrate that wherein utilizes.
Background technology
Generally surpass in the electric rotating machine of induction motor or generator etc. of 3kV in rated voltage; In the slot for winding that forms on the left-hand tools electric machine iron core during mounting rotary electric machine winding; In order not damage main insulating layer, the protection insulating barrier of the semiconduction about using surface resistivity as 1k Ω covers.
Be installed at the electric rotating machine winding that will constitute like this under the state of slot for winding of rotor core; Insulating resin is for example carried out the one dipping under vacuum state; Then; Insulating resin behind the dipping is solidified, thereby guarantees the insulation of electric rotating machine winding, and and rotor core between can not produce the gap.
; In the moment that the insulating resin that makes dipping solidifies, poor because of the coefficient of thermal expansion of electric rotating machine winding and core for rotary electric machine understands can produce thermal stress between the two; Because this thermal stress, can produce in any one frangible portion of main insulating layer, protection insulating barrier and to peel off or the be full of cracks problem.
In order to address this is that, for example, shown in patent documentation 1, proposed a kind ofly in core for rotary electric machine one side near the electric rotating machine winding, be formed between two plate substrates scheme that folder is established the semiconduction insulating barrier of separating layer.
Patent documentation 1: the flat 11-509399 communique of special table
According to the technology shown in the above-mentioned patent documentation 1; Even taken place to peel off or chap in separating layer; Be similar in the semiconduction insulating barrier yet and remain on same potential, therefore, peeling off or chapping in separating layer partly can not take place as making the corona discharge of the rapid deterioration of insulating material.
But, because there is separating layer in said semiconduction insulating barrier, so; Even lap wound two plate substrates also can be discontinuous between two plate substrates, therefore; Can not avoid producing potential difference because of peeling off of producing in this discontinuous part etc., the result can't eliminate corona discharge fully.
In addition, the electric rotating machine winding can vibrate because acting on the electromagnetic force of slot for winding depth direction when electric rotating machine turns round.To this vibration force; Because the electric rotating machine winding is rotated electric machine iron core through discontinuous semiconduction insulating barrier and partly supports; Therefore; This supporting force is little, because of applying repeatedly of electromagnetic force makes the supporting of electric rotating machine winding become unstable, has vibration, noise or causes the damaged problem of insulating material.
Summary of the invention
The objective of the invention is to, provide a kind of caused corona discharge of peeling off or chap that produces can prevent to solidify the time because of insulating resin, to electromagnetic force can stable support electric rotating machine winding electric rotating machine winding and electric rotating machine.
The present invention to achieve these goals, the periphery of the interlayer insulating film that on coil-conductor, forms forms main insulating layer, constitutes the electric rotating machine winding; This electric rotating machine winding is inserted in the slot for winding that forms on the core for rotary electric machine across the protection insulating barrier, inserts chock to the open side of said slot for winding and fix said electric rotating machine winding, under this state; Make said electric rotating machine winding and core for rotary electric machine one be impregnated into insulating resin, and the insulating resin of dipping is solidified, thereby constitute said electric rotating machine; Wherein, Between said interlayer insulating film and protection insulating barrier,, form the semiconduction insulating barrier with the semiconduction continuous slice lap wound of doubling along its length; And; The inboard of the semiconduction continuous slice after doubling is formed with the thermal stress absorbed layer that the thermal stress that acts on the thickness of insulating layer direction is absorbed, and wherein this thermal stress absorbed layer is made up of non-adhesive linkage or elastomer.
According to above-mentioned formation; Even the thermal stress during because of the resin solidification behind the varnished insulation resin produces in the semiconduction insulating barrier and peels off or chap; Owing to the semiconduction continuous slice lap wound of doubling is electrically connected, therefore, be equipotential in the semiconduction insulating barrier; So what can prevent in the semiconduction insulating barrier, to produce peels off or chaps and corona discharge takes place.
And; Through machinery behind the semiconduction continuous slice lap wound of doubling is along its length formed the semiconduction insulating barrier continuously; Thereby the electric rotating machine winding is rotated the electric machine iron core supporting across continuous semiconduction insulating barrier; Therefore, this supporting force is stablized greatly, can obtain electric rotating machine winding and electric rotating machine to electromagnetic force ability stable support electric rotating machine winding.
Description of drawings
Fig. 1 is the profile of stator winding of first execution mode of expression electric rotating machine of the present invention;
Fig. 2 is the drawing in side sectional elevation along the A-A line of Fig. 1;
Fig. 3 is the local vertical profile end view of summary of representing generator as electric rotating machine of the present invention;
Fig. 4 is the local vertical profile stereogram of stator winding of second execution mode of expression electric rotating machine of the present invention;
Fig. 5 is the drawing in side sectional elevation along the B-B line of Fig. 4;
Fig. 6 is the local vertical profile stereogram of stator winding of the 3rd execution mode of expression electric rotating machine of the present invention;
Fig. 7 is the local vertical profile stereogram of stator winding of the 4th execution mode of expression electric rotating machine of the present invention;
Fig. 8 is the drawing in side sectional elevation along the C-C line of Fig. 7;
Fig. 9 is the variation of Fig. 8;
Figure 10 is the figure that is equivalent to Fig. 8 of stator winding of the 5th execution mode of expression electric rotating machine of the present invention;
Figure 11 is the figure that is equivalent to Figure 10 of stator winding of the 6th execution mode of expression electric rotating machine of the present invention;
Figure 12 is the figure that is equivalent to Fig. 7 of stator winding of the 7th execution mode of expression electric rotating machine of the present invention.
Among the figure: the 1-generator; The 5-rotor; The 6-stator; 7-stator core (core for rotary electric machine); The 7G-slot for winding; 8-stator winding (electric rotating machine winding); The 10-wire conductor; The 11-interlayer insulating film; The 12-main insulating layer; 13,20-semiconduction insulating barrier; 13A, 18A, 18B, 19A, 20A-semiconduction continuous slice (sheet); 13B, 13C, 18C, 19B, 20B-thermal stress absorbed layer; 15,18,19-protects insulating barrier; 17-corona shielding (corona shield) layer.
Embodiment
Below, first execution mode of electric rotating machine of the present invention is described to Fig. 1~generator shown in Figure 3.
As shown in Figure 3, generator 1 comprises: housing 2; Rotating shaft 4, it is rotatably freely supported on this housing 2 through bearing 3A, 3B; Rotor 5, it is supported by this rotating shaft 4, and has magnetic pole; With stator 6, its space and this rotor 5 across Zhou Fangxiang is opposed.
And stator 6 is made up of stator core that is supported on said housing 27 and the stator winding 8 that is installed on this stator core 7.
In addition, in the execution mode of this execution mode and following explanation, stator core 7 is equivalent to core for rotary electric machine of the present invention, and stator winding 8 is equivalent to electric rotating machine winding of the present invention.
Said stator core 7 Zhou Fangxiang equally spaced be formed with a plurality of from said rotor 5 opposed internal side diameters to outside diameter and spread all over the slot for winding 7G of stator core 7 total lengths, be formed with wedge groove 7A at the peristome of slot for winding 7G.And, through chock 7W being inserted into this wedge groove 7A, can the stator winding that be installed in slot for winding 7G 8 is fixing.
On the other hand; Like Fig. 1 and shown in Figure 2; A plurality of wire conductor 10 that stator winding 8 will adopt known insulating material to implement wire insulation twine with known insulating material by many and form interlayer insulating film 11; And a plurality of wire conductor 10 that formed interlayer insulating film 11 are twined in its periphery adopt known insulating material to form main insulating layer 12, and then to have formed surface resistivity in the periphery of this main insulating layer 12 be the semiconduction insulating barrier 13 about 1k Ω.
The stator winding 8 that constitutes is like this built up two sections across the middle filler 14 that is made up of insulating material; Under this state; Through the formed protection insulating barrier 15 of known semiconduction insulating material that surface resistivity equates with semiconduction insulating barrier 13, stator winding 8 is inserted into the slot for winding 7G of stator core 7.After inserting stator winding 8, superimposed protection insulating barrier 15 surrounds stator winding 8, and filler 16 under the overlapping above that wedge that is made up of insulating material then, is inserted into chock 7W among the wedge groove 7A.
The semiconduction insulating substrate that is used to form said semiconduction insulating barrier 13 has semiconduction continuous slice (sheet) 13A; This semiconduction continuous slice 13A is through for example sneaking into carbon particle in the base material of polyester non-woven fabric; And then sneak into the insulating resin of carbon particle and form to surface applied, this semiconduction continuous slice 13A has for example been applied the non-adhesive linkage of conduct of silicone resin by the inboard in doubling thermal stress absorbed layer 13B constitutes.With the periphery of the semiconduction continuous slice 13A lap wound that constitutes like this, thereby formed semiconduction insulating barrier 13 to main insulating layer 12.
As said insulating resin of sneaking into carbon particle, epoxy resin, mylar, modified polyimide resin etc. are for example arranged.And the base material as carbon particle is adhered to is not limited to polyester non-woven fabric, also can use polyester textile, glass fabric etc., and the resin that becomes the thermal stress absorbed layer 13B of non-adhesive linkage can be a fluorine resin.
Like this, the stator winding that is installed on stator core 78 is received in the vacuum impregnation groove, for example,, insulating resin is impregnated in the gap that each insulating barrier is inside and outside and slot for winding 7G is interior with aqueous insulating resins such as known step vacuum pressed epoxy resin-impregnated.Then, be heating and curing, thereby obtain not producing between stator core 7 and the wire conductor 10 stator 6 in space through making the insulating resin behind the dipping.
As stated, at the varnished insulation resin and make its moment that is heating and curing, stator winding 8 and stator core 7 are by integrated.Then, in reaching the cooling procedure of normal temperature, wire conductor 10, various insulating barrier 11,12,13,15 and stator core 7 are shunk with different coefficient of thermal expansions respectively.But, because because of different coefficient of thermal expansions produces and act on the thermal stress on the thickness of insulating layer direction, absorbed by the non-adhesive linkage of the thermal stress absorbed layer 13B in the semiconduction insulating barrier 13, so, in main insulating layer 12, can not produce and peel off or chap.
On the other hand; Semiconduction insulating barrier 13 is stripped from because of the non-adhesive linkage of thermal stress absorbed layer 13B; But owing to the semiconduction continuous slice 13A lap wound of doubling is electrically connected, therefore, semiconduction insulating barrier 13 can be maintained equipotential across the stripping portion of non-adhesive linkage up and down with it.As a result, even produce stripping portion, corona discharge can not take place in the there yet.And then even produce stripping portion, machinery is also bonding continuously owing to the semiconduction continuous slice 13A lap wound of doubling, and therefore, semiconduction continuous slice 13A can rupture continuously midway.As a result, main insulating layer 12 is adhered to stator core 7 securely, can guarantee the endurance to the electromagnetic force of effect on wire conductor 10.
In addition, when the current potential of the wire conductor 10 of stator winding 8 whole when identical, interlayer insulating film 11 expression wire insulation layers.Below identical.
Then, based on Fig. 4 and Fig. 5, second execution mode of electric rotating machine of the present invention is described.Wherein, because the mark identical with Fig. 1~Fig. 3 represented same component parts, therefore omit detailed description once more.
In this execution mode, and the difference of first execution mode is: semiconduction insulating barrier 13 is between interlayer insulating film 11 and main insulating layer 12, be formed with corona shielding layer 17 and dispose new protection insulating barrier 18 in the periphery of corona shielding layer 17 in the periphery of main insulating layer 12.
Because said semiconduction insulating barrier 13 has adopted formation identical with first execution mode and identical winding method, so detailed.
Said corona shielding layer 17 is through sneaking into carbon particle in the base material of polyester non-woven fabric, and then is mixed with the insulating resin of carbon particle to surface applied, and this base material lap wound is formed.Wherein,, epoxy resin, mylar, modified polyimide resin etc. are arranged, and base material is not limited to polyester non-woven fabric, also can uses polyester textile, glass fabric etc. as insulating resin.
Said protection insulating barrier 18 is formed with semiconduction continuous slice 18A, 18B and as the thermal stress absorbed layer 18C of non-adhesive linkage; Said two semiconduction continuous slice 18A, 18B are for example through sneaking into carbon particle in polyester non-woven fabric; And then sneaked into the insulating resin of carbon particle and form to surface applied, said thermal stress absorbed layer 18C forms through between two semiconduction continuous slice 18A, 18B, for example applying silicone resin.Forming the scope of this thermal stress absorbed layer 18C, is the scope of the both sides except the length direction central part of the slot for winding 7G of stator core 7.
Same with first execution mode, after insulating resin, it is heating and curing the stator winding that constitutes like this 8 and stator core 7 one vacuum impregnations.
Then; In reaching the cooling procedure of normal temperature; Because of the difference of the coefficient of thermal expansion of each parts can produce the thermal stress that acts on the thickness of insulating layer direction; But this thermal stress is absorbed by the non-adhesive linkage of the thermal stress absorbed layer 13B in the semiconduction insulating barrier 13, therefore in main insulating layer 12, can not produce to peel off or chap.
On the other hand, at the length direction central part of slot for winding 7G,, therefore, can prevent the length direction top offset of stator winding 8 at slot for winding 7G because stator core 7, protection insulating barrier 18 and corona shielding layer 17 are bonding securely.And, because the coefficient of thermal expansion that produces in the length direction both sides of slot for winding 7G is poor, can be absorbed by the non-adhesive linkage in the protection insulating barrier 18, instant heating stress absorbing layer 18C, therefore, can not make main insulating layer 12 produce deterioration.
And semiconduction insulating barrier 13 is stripped from because of the non-adhesive linkage of thermal stress absorbed layer 13B, but owing to the semiconduction continuous slice 13A lap wound of doubling is electrically connected, therefore, can it be maintained equipotential up and down across the stripping portion of non-adhesive linkage.As a result, even produce stripping portion, corona discharge can not take place in the there yet.And then; Even the generation stripping portion, mechanical type is bonding owing to the semiconduction continuous slice 13A lap wound of doubling, therefore; Semiconduction continuous slice 13A can rupture continuously midway; Thereby wire conductor 10 is adhered to stator core 7 securely through main insulating layer 12 grades, can guarantee the endurance to the electromagnetic force of effect on wire conductor 10.
Fig. 6 representes the 3rd execution mode of electric rotating machine of the present invention, because the mark identical with Fig. 4 and Fig. 5 represented same component parts, therefore omits detailed description once more.
In this execution mode, be: the thermal stress absorbed layer 13C that has elastomer, for example constitutes in the inboard of the semiconduction continuous slice 13A of doubling by the silicone rubber of having sneaked into carbon particle with the difference of second execution mode.
In this execution mode, also can obtain and the equal effect of above-mentioned each execution mode.
Fig. 7 and Fig. 8 represent the 4th execution mode of electric rotating machine of the present invention, because the mark identical with Fig. 1~Fig. 6 represented same component parts, therefore omit detailed description once more.
In this execution mode, the lengthwise dimension of the slot for winding 7G of stator core 7 is shorter than said execution mode, and the thermal stress that on the length direction of stator winding 8, acts on each insulating barrier is little, thereby is fit to the structure little to the influence of main insulating layer 12.
This stator winding 8 is through forming interlayer insulating film 11 on the wire conductor after the wire rod insulation processing 10; And form semiconduction insulating barrier 13 above that; And then form main insulating layer 12 on it, on form corona shielding layer 17 again, and form protection insulating barrier 15 above that and constitute.Then, same with said each execution mode, stator winding 8 being installed under the state of stator core 7, come the varnished insulation resin through vacuum impregnation, the insulating resin of dipping is heating and curing.
In this execution mode, also can obtain and the equal effect of above-mentioned each execution mode.
Fig. 9 representes the variation of the 4th execution mode, makes semiconduction insulating barrier 13 be double-layer structural, and to make the lap wound direction of semiconduction continuous slice 13A be that rightabout is reeled.
Through such coiling semiconduction continuous slice 13A; The length direction effect of stator winding 8, by the thermal expansion difference of wire conductor 10, each insulating barrier, stator core 7 and the displacement of shrinking the thermal stress absorbed layer 13B of the semiconduction insulating barrier 13 that difference causes can not be partial to folk prescription to, but in the even displacement of length direction both end sides along both sides.
Figure 10 representes the 5th execution mode of electric rotating machine of the present invention, because the mark identical with Fig. 1~Fig. 9 represented same component parts, therefore omits detailed description once more.
In this execution mode; Only the length direction central portion at the slot for winding 7G of stator winding 8 forms semiconduction insulating barrier 13; In the both sides of the length direction except that central portion of slot for winding 7G, form by range upon range of thermal stress absorbed layer 18C for double-deck semiconduction continuous slice 18A, protection insulating barrier 18 that 18B constitutes.
Through adopting above-mentioned formation; Except playing the effect identical,, absorbed by the thermal stress absorbed layer 13B of semiconduction insulating barrier 13 and the thermal stress absorbed layer 18C of protection insulating barrier 18 owing to the thermal stress that produces and act on the thickness of insulating layer direction because of the difference of coefficient of thermal expansion with above-mentioned each execution mode; And; The thermal stress that acts on the length direction of slot for winding 7G is protected the thermal stress absorbed layer 18C of insulating barrier 18 to absorb, and therefore, can not make main insulating layer 12 produce deterioration.
Figure 11 representes the 6th execution mode of electric rotating machine of the present invention, because the mark identical with Fig. 4 and Fig. 5 represented same component parts, therefore omits detailed description once more.
This execution mode improves Fig. 4 and second execution mode shown in Figure 5; In second execution mode; Two semiconduction continuous slice 18A, 18B have been utilized as protection insulating barrier 18; But the protection insulating barrier 19 of this execution mode makes a slice semiconduction continuous slice 19A doubling; Side folder is established thermal stress absorbed layer 19B within it, and prepares two groups of such doubling semiconduction continuous slice 19A, makes the broken line of each semiconduction continuous slice 19A be positioned at the length direction central portion of slot for winding 7G.
Through above-mentioned formation, can obtain and the equal effect of said each execution mode.
Figure 12 representes the 7th execution mode of electric rotating machine of the present invention, because the mark identical with Fig. 4 and Fig. 5 represented same component parts, therefore omits detailed description once more.
In this execution mode, only with the relative two sides of slot for winding 7G in the opposed side of face of a side, form the semiconduction insulating barrier 20 that is arranged at main insulating layer 12 along its length.Semiconduction insulating barrier 20 has: for example apply silicone resin with the semiconduction continuous slice 20A of same material of the semiconduction continuous slice 13A of said execution mode and formation with in the inboard of semiconduction continuous slice 20A and as the thermal stress absorbed layer 20B of non-adhesive linkage.And, twine the thin slice of (taping) semiconduction and form corona shielding layer 17 in the periphery of semiconduction continuous slice 20A.
Through above-mentioned formation; Except can obtain with the same effect of each execution mode; Since in the formation of main insulating layer 12 opposition side of semiconduction insulating barrier 20 1 sides do not have thermal stress absorbed layer 20B, therefore, main insulating layer 12 by strong bond in stator core 7; Bonding through this, have to electromagnetic force and can stablize the effect that keeps wire conductor 10.
With the first~seven execution mode electric rotating machine of the present invention is illustrated, the result that reality is measured the adhesive strength of cutting off direction of the insulating barrier in the electric rotating machine of these execution modes is as shown in table 1.
[table 1]
Table 1
Test portion Embodiment 1 Embodiment 2 Embodiment 3 Embodiment 4 Embodiment 5 Embodiment 6 Embodiment 7 Existing example
Adhesive strength (MPa) 1.8 3.6 3.4 3.8 3.5 3.6 3.6 1.2
Can confirm from this result,, can improve the adhesive strength of existing example according to the first~seven execution mode.
As stated, according to the present invention, the caused corona discharge of peeling off or chap that can obtain to prevent to produce when insulating resin from solidifying, and to electromagnetic force can stable support electric rotating machine winding electric rotating machine winding and electric rotating machine.
In addition, in above explanation, be that example is illustrated with the stator winding of generator, but also can be applicable to certainly in the rotor winding of stator winding or generator and motor of motor as the electric rotating machine winding.
And, in above explanation, be illustrated, but also can be applicable to not have in the electric rotating machine winding of interlayer insulating film 11 certainly to the electric rotating machine winding that has interlayer insulating film 11.

Claims (20)

1. electric rotating machine winding, this electric rotating machine winding lap wound semiconduction insulating substrate and be formed with the semiconduction insulating barrier, this electric rotating machine winding comprises: with the semiconduction continuous slice of said semiconduction insulating substrate doubling along its length; With the thermal stress absorbed layer of the inboard that is present in the semiconduction continuous slice after this doubling, wherein this thermal stress absorbed layer is made up of non-adhesive linkage or elastomer.
2. electric rotating machine winding according to claim 1 is characterized in that,
Semiconduction continuous slice after the said doubling is to form through applying the insulating resin of having sneaked into carbon particle to insulating substrate.
3. electric rotating machine winding according to claim 1 is characterized in that,
Said non-adhesive linkage is the overlay that the semiconduction continuous slice after said doubling has applied silicone resin.
4. electric rotating machine winding according to claim 1 is characterized in that,
Said non-adhesive linkage is the overlay that the semiconduction continuous slice after said doubling has applied fluorine resin.
5. electric rotating machine forms main insulating layer in the periphery of coil-conductor, constitutes the electric rotating machine winding; This electric rotating machine winding is inserted in the slot for winding that is formed at core for rotary electric machine across the protection insulating barrier, inserts chock to the open side of said slot for winding and fix said electric rotating machine winding, under this state; Said electric rotating machine winding and core for rotary electric machine one are impregnated in the insulating resin; And the insulating resin of dipping is solidified, thereby constitute said electric rotating machine
Between said main insulating layer and protection insulating barrier; Semiconduction continuous slice lap wound with doubling along its length; Form the semiconduction insulating barrier, and, the inboard of the semiconduction continuous slice after doubling; Be formed with the thermal stress absorbed layer that the thermal stress that acts on the thickness of insulating layer direction is absorbed, wherein this thermal stress absorbed layer is made up of non-adhesive linkage or elastomer.
6. electric rotating machine forms main insulating layer in the periphery of coil-conductor, constitutes the electric rotating machine winding; This electric rotating machine winding is inserted in the slot for winding that is formed at core for rotary electric machine across the protection insulating barrier, inserts chock to the open side of said slot for winding and fix said electric rotating machine winding, under this state; Said electric rotating machine winding and core for rotary electric machine one are impregnated in the insulating resin; And the insulating resin of dipping is solidified, thereby constitute said electric rotating machine
Between said main insulating layer and protection insulating barrier; The semiconduction insulating barrier that formation is made up of the semiconduction thin slice along the semiconduction continuous slice of the doubling of the length direction of said slot for winding configuration and the semiconduction continuous slice outside of lap wound after this doubling; And; The inboard of the semiconduction continuous slice after doubling; Be formed with the thermal stress absorbed layer that the thermal stress that acts on the thickness of insulating layer direction is absorbed, wherein this thermal stress absorbed layer is made up of non-adhesive linkage or elastomer.
7. according to claim 5 or 6 described electric rotating machines, it is characterized in that,
Said semiconduction continuous slice is to form through applying the insulating resin of sneaking into carbon particle to insulating substrate.
8. according to claim 5 or 6 described electric rotating machines, it is characterized in that,
Said non-adhesive linkage is the overlay that the semiconduction continuous slice after said doubling has applied silicone resin.
9. according to claim 5 or 6 described electric rotating machines, it is characterized in that,
Said non-adhesive linkage is the overlay that the semiconduction continuous slice after said doubling has applied fluorine resin.
10. electric rotating machine; Periphery at the interlayer insulating film that is formed at coil-conductor forms main insulating layer and corona shielding layer successively, constitutes the electric rotating machine winding, and this electric rotating machine winding is inserted in the slot for winding that is formed at core for rotary electric machine across the protection insulating barrier; Insert chock to the open side of said slot for winding and fix said electric rotating machine winding; Under this state, said electric rotating machine winding and core for rotary electric machine one are impregnated in the insulating resin, and the insulating resin of dipping is solidified; Thereby constitute said electric rotating machine
Between said interlayer insulating film and protection insulating barrier; Semiconduction continuous slice lap wound with doubling along its length; Form the semiconduction insulating barrier, and, the inboard of the semiconduction continuous slice after doubling; Be formed with the thermal stress absorbed layer that the thermal stress that acts on the thickness of insulating layer direction is absorbed, wherein this thermal stress absorbed layer is made up of non-adhesive linkage or elastomer.
11. electric rotating machine; Periphery at the interlayer insulating film that is formed at coil-conductor forms main insulating layer and corona shielding layer successively, constitutes the electric rotating machine winding, and this electric rotating machine winding is inserted in the slot for winding that is formed at core for rotary electric machine across the protection insulating barrier; Insert chock to the open side of said slot for winding and fix said electric rotating machine winding; Under this state, said electric rotating machine winding and core for rotary electric machine one are impregnated in the insulating resin, and the insulating resin of dipping solidify; Thereby constitute said electric rotating machine
Between said main insulating layer and interlayer insulating film; Semiconduction continuous slice lap wound with doubling along its length; Form the semiconduction insulating barrier, and, the inboard of the semiconduction continuous slice after doubling; Be formed with the thermal stress absorbed layer that the thermal stress that acts on the thickness of insulating layer direction is absorbed, wherein this thermal stress absorbed layer is made up of non-adhesive linkage or elastomer.
12. electric rotating machine according to claim 11 is characterized in that,
Said semiconduction insulating barrier is folded with the said thermal stress absorbed layer that silicone resin constitutes in the inboard of the semiconduction continuous slice of doubling along its length, and to have adopted the coiling direction that makes said semiconduction continuous slice be rightaboutly double-deckly to constitute.
13. electric rotating machine; Periphery at the interlayer insulating film that is formed at coil-conductor forms main insulating layer and corona shielding layer successively, constitutes the electric rotating machine winding, and this electric rotating machine winding is inserted in the slot for winding that is formed at core for rotary electric machine across the protection insulating barrier; Insert chock to the open side of said slot for winding and fix said electric rotating machine winding; Under this state, said electric rotating machine winding and core for rotary electric machine one are impregnated in the insulating resin, and the insulating resin of dipping is solidified; Thereby constitute said electric rotating machine
Between said main insulating layer and interlayer insulating film; Semiconduction continuous slice lap wound with doubling along its length; Form the semiconduction insulating barrier; The inboard of the semiconduction continuous slice after doubling is formed with the first thermal stress absorbed layer that the thermal stress that acts on the thickness of insulating layer direction is absorbed, and; Form the second thermal stress absorbed layer that the thermal stress to the length direction that acts on the electric rotating machine winding absorbs at said protection insulating barrier, wherein first, second thermal stress absorbed layer is made up of non-adhesive linkage or elastomer.
14. electric rotating machine according to claim 13 is characterized in that,
Said protection insulating barrier is made up of two semiconduction continuous insulation thin slices; The said second thermal stress absorbed layer is non-adhesive linkage, and this non-adhesive linkage is folded between said two semiconduction continuous insulation thin slices of the both sides except the length direction central portion of said slot for winding.
15. electric rotating machine according to claim 13 is characterized in that,
Said protection insulating barrier is made up of the semiconduction continuous insulation thin slice of two doublings; Make the broken line of this semiconduction continuous insulation thin slice lay respectively at the length direction central authorities of said slot for winding; And the said second thermal stress absorbed layer is the non-adhesive linkage of inboard that is folded in the semiconduction continuous insulation thin slice of said doubling.
16. electric rotating machine according to claim 13 is characterized in that,
Make said semiconduction insulating barrier be positioned at the length direction central portion of said slot for winding, and, make said protection insulating barrier be positioned at the both sides except the length direction central portion of said slot for winding.
17. semiconduction insulating substrate; It forms the semiconduction insulating barrier on the electric rotating machine winding; This semiconduction insulating substrate comprises: the semiconduction continuous slice of doubling along its length and be folded in this doubling after the thermal stress absorbed layer of inboard of semiconduction continuous slice, wherein this thermal stress absorbed layer is made up of non-adhesive linkage or elastomer.
18. semiconduction insulating substrate according to claim 17 is characterized in that,
Said semiconduction continuous slice is to form through applying the insulating resin of sneaking into carbon particle to insulating substrate.
19. semiconduction insulating substrate according to claim 18 is characterized in that,
Said non-adhesive linkage is the overlay that the semiconduction continuous slice after said doubling has applied silicone resin.
20. semiconduction insulating substrate according to claim 18 is characterized in that,
Said non-adhesive linkage is the overlay that the semiconduction continuous slice after said doubling has applied fluorine resin.
CN2007101672082A 2006-11-07 2007-11-01 Rotating electrical machine winding, rotating electrical machine, and semiconductive insulating component used therein Active CN101179212B (en)

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DE102007050838A1 (en) 2008-06-05
DE102007050838B4 (en) 2013-07-04

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