CN101158806A - Preparation method of binary optical elements mask - Google Patents
Preparation method of binary optical elements mask Download PDFInfo
- Publication number
- CN101158806A CN101158806A CNA2007101704632A CN200710170463A CN101158806A CN 101158806 A CN101158806 A CN 101158806A CN A2007101704632 A CNA2007101704632 A CN A2007101704632A CN 200710170463 A CN200710170463 A CN 200710170463A CN 101158806 A CN101158806 A CN 101158806A
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- CN
- China
- Prior art keywords
- chromium plate
- mask
- laser
- chromium
- heating oxidation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
The invention discloses a binary optical component mask preparation method, which adopts a laser direct writing production, the production process is: firstly a double surface polishing quartz glass substrate is plated with a chromium film to form a chromium plate; a design data of a mask is converted into a laser direct writing equipment control program, the program is used for proceeding laser positioning quantifying heating oxidation to the chromium plate, then the chromium plate after laser heating oxidation is eroded, after eroded, the part of the chromium plate with laser heating oxidation is formed oxidation chromium, the part of the chromium plate without laser heating oxidation is dissolved in the eroded liquor to form a chromium plate mask. The invention has the advantages of simple equipment, short production cycles, low costs, high production precision, which is an ideal method of producing optical components in the domestic and abroad at present.
Description
Technical field
The present invention relates to optical technical field, specifically a kind of method for making of binary optical elements mask.
Background technology
In the evolution of diffraction optical element manufacturing technology, binary optical elements is easy with its manufacturing process, the more high advantage of diffraction efficiency, has obtained development faster.The making of binary optical elements has benefited from the processing technology of semiconductor devices, comes the approximate continuity diffraction micro structural by the step-like microstructure of making similar embossment; Its method mainly relies on exposure sources, under the effect of mask, the binary optical elements substrate that scribbles photoresist is selected exposure, realize the making of step after developing by lithographic method, so the mask manufacture quality is one of gordian technique of binary optical elements making success or failure.
The making of binary optical elements mask mainly contains holographic recording method, gray-tone mask method etc., and the development of holographic recording method is fairly perfect, but is still facing difficulty aspect the making hyperfine structure, and the diffraction efficiency of computed hologram and kinoform is not high; Although the gray-tone mask method has the advantages that equipment is simple, cost is low and with short production cycle, the machining precision of its gray-tone mask version is not high, has restricted the development of this method.
Summary of the invention
The method for making that a kind of binary optical elements mask of providing at the deficiencies in the prior art is provided, its adopts laser direct-writing method, has that equipment is simple, fabrication cycle is short, expense is low, make the high characteristics of precision.
The concrete technical scheme that realizes the object of the invention is:
A kind of method for making of binary optical elements mask, it comprises the following steps:
A, chromium plate are made
Select for use quartz glass to make substrate,, form chromium plate its chrome-faced film;
B, LASER HEATING oxidation
By mask design data establishment LASER HEATING oxidation program,, chromium plate is realized the positioning and quantitative heated oxide with this programmed control laser direct writing equipment;
C, chemical corrosion
Adopt K
3Fe (CN)
6The chromium plate of/NaOH mixed solution after to the LASER HEATING oxidation corrodes, and forms mask.
The present invention's beneficial effect compared with prior art is:
(1) the whole process automation control of the present invention, process stabilizing, good reproducibility, easy and simple to handle, the product percent of pass height.
(2) the present invention has improved mask manufacture precision and diffraction efficiency owing to adopt laser writing technology.
Embodiment
The present invention adopts the polar coordinates laser direct writing equipment to carry out.
Embodiment
(1) chromium plate is made
Select the quartz glass substrate of twin polishing for use,, form chromium plate at substrate surface chromium plating film.
(2) LASER HEATING oxidation
By mask design data establishment LASER HEATING oxidation program, with this programmed control laser direct writing equipment.Chromium plate is placed on the laser direct writing equipment universal stage, and under universal stage rotation situation, the laser direct-writing head radially moves, and chromium plate is implemented the quantitative heated oxide of laser positioning.
(3) chemical corrosion
Chromium plate after the LASER HEATING oxidation is put into K
3Fe (CN)
6Corrode in/NaOH the mixed solution, after the corrosion, chromium plate forms chromium oxide through LASER HEATING oxidation position, at K
3Fe (CN)
6Not dissolved in the/NaOH mixed solution, and without LASER HEATING oxidation position at K
3Fe (CN)
6Dissolved in the/NaOH solution, the chromium plate mask forms.
Claims (1)
1. the method for making of a binary optical elements mask is characterized in that it comprises the following steps:
A, chromium plate are made
Select for use quartz glass to make substrate,, form chromium plate its chrome-faced film;
B, LASER HEATING oxidation
By mask design data establishment heated oxide program,, chromium plate is realized the quantitative heated oxide of laser positioning with this programmed control laser direct writing equipment;
C, chemical corrosion
Adopt K
3Fe (CN)
6The chromium plate of/NaOH mixed solution after to the LASER HEATING oxidation corrodes, and forms mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101704632A CN101158806A (en) | 2007-11-15 | 2007-11-15 | Preparation method of binary optical elements mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101704632A CN101158806A (en) | 2007-11-15 | 2007-11-15 | Preparation method of binary optical elements mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101158806A true CN101158806A (en) | 2008-04-09 |
Family
ID=39306944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007101704632A Pending CN101158806A (en) | 2007-11-15 | 2007-11-15 | Preparation method of binary optical elements mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101158806A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010081276A1 (en) * | 2009-01-14 | 2010-07-22 | 国家纳米科学中心 | Metal optical grayscale mask and manufacturing method thereof |
| CN102169285A (en) * | 2011-04-21 | 2011-08-31 | 深圳市科利德光电材料股份有限公司 | Method for repairing redundant chromium points of chromium plate |
| CN102067036B (en) * | 2008-07-23 | 2013-05-01 | 株式会社尼康 | Optical member for photomask and method for manufacturing the optical member |
-
2007
- 2007-11-15 CN CNA2007101704632A patent/CN101158806A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102067036B (en) * | 2008-07-23 | 2013-05-01 | 株式会社尼康 | Optical member for photomask and method for manufacturing the optical member |
| WO2010081276A1 (en) * | 2009-01-14 | 2010-07-22 | 国家纳米科学中心 | Metal optical grayscale mask and manufacturing method thereof |
| US8133642B2 (en) | 2009-01-14 | 2012-03-13 | National Center For Nanoscience And Technology | Metal optical grayscale mask and manufacturing method thereof |
| CN102169285A (en) * | 2011-04-21 | 2011-08-31 | 深圳市科利德光电材料股份有限公司 | Method for repairing redundant chromium points of chromium plate |
| CN102169285B (en) * | 2011-04-21 | 2013-01-09 | 深圳市科利德光电材料股份有限公司 | Method for repairing redundant chromium points of chromium plate |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20080409 |