CN101158776A - Color filter structure and manufacturing method thereof - Google Patents

Abstract

The invention relates to a color filter structure and a manufacturing method thereof, wherein the color filter structure comprises a plurality of black matrix pattern rows with hydrophobic property and a color filter layer; each black matrix pattern row comprises a plurality of light shielding structures which are arranged in series, and each light shielding structure forms an accommodating space for accommodating the color filter layer; each containing space is a closed space and is not communicated with each other, and each shading structure is provided with at least one drain valve to provide a drain force. The invention can reduce the defects of uneven thickness, color mixing and the like possibly caused by the variation of the ink-jet manufacturing process, thereby achieving the effect of uniform chromaticity of the color filter layer and effectively improving the reliability and the yield of the color filter.

Description

Color filter structure and manufacturing method thereof

technical field

The present invention relates to a color filter structure and its manufacturing method, especially to a color filter structure and its manufacture which are designed with traps such as hydrophobic notches or channels to avoid the problems of color mixing and uneven film thickness method.

Background technique

Liquid crystal displays generally use white light as a light source. Color filters must be used to decompose the white light source into three primary colors of red (red, R), green (green, G), and blue (blue, B), and then further mixed into the three primary colors that the human eye can distinguish. Various colors, so the filtering effect of the color filter is an important factor in determining the color picture performance of the LCD, and the cost of the color filter is more expensive than other components, so the color filter has become the most important element of the LCD. One of the important key components.

Existing methods for manufacturing color filters are mainly formed by coating photoresist materials and then exposing and developing them. First, a single-color photoresist ink, such as red photoresist ink, is coated on the substrate by spin coating, and then the red filter layer pattern is formed by soft baking, exposure and development, and hard baking. Then repeat the above steps to form green and blue light filter pattern layers. However, the photoresist ink usage rate of this production method is very low, about 90% of the photoresist ink will be thrown out during the spin coating process, and about 70% of the photoresist ink will be thrown out in the end The liquid is dissolved and removed during the developing process. In addition, the existing method of manufacturing color filters requires a coating manufacturing process, a pre-baking manufacturing process, an exposure manufacturing process, and a developing manufacturing process for each color of photoresist ink, which makes the manufacturing process complicated and costly. expensive.

Therefore, the industry has begun to use the inkjet method to improve the shortcomings of the spin coating method for manufacturing color filters. Please refer to FIG. 1 and FIG. 2 . FIG. 1 and FIG. 2 are method schematic diagrams of a general inkjet manufacturing process. First, as shown in FIG. 1, a glass substrate 10 is provided, and a plurality of black matrix patterns 12 arranged in an array are formed on the glass substrate 10, wherein a plurality of (for example, n*m matrix, n , m is a positive integer) closed accommodation spaces 14 that are not connected to each other and are used to accommodate color photoresist ink. Next, as shown in FIG. 2 , the required photoresist ink is sprayed on the glass substrate 10 by using an inkjet head (not shown) of an inkjet device. Taking the manufacturing process of color filters arranged in strips as an example, a certain primary color pigment (such as red pigment 16R) must be sprayed in the accommodation space between the black matrix patterns 12 of 3n-2 rows in sequence, and then sequentially The other two primary color pigments (for example, green pigment 16G and blue pigment 16B) are sprayed in the accommodation space between the black matrix patterns 12 of 3n−1 rows and 3n rows. Then bake to remove excess solvent components to harden the red ink 16R, green ink 16G and blue ink 16B to form a color filter.

Although the method of making color filters by inkjet manufacturing process is more efficient and lower in cost, the difficulty it faces is that the inkjet head will inevitably produce the variation of ink ejection amount after a period of use, so On the one hand, the amount of photoresist ink in each containing space may be different, making the thickness of the subsequently formed color filter uneven, resulting in uneven display chromaticity and affecting the display effect. What's more, for example, when the amount of colored ink is not enough (generally referred to as unfilled pixel), the filtering effect of the color filter will be poor and a white area (white area) will be generated when the color ink is displayed. When the amount of liquid is too much and overflow occurs, it will not only affect the filtering effect, but also cause the problem of color mixing. Generally speaking, if the overflow occurs between the color filters of the same color, it will not have a great impact on the color performance, but if the overflow occurs between the color filters of different colors, then There will be serious color cast problems due to the mixing of pigments.

Contents of the invention

Therefore, the present invention proposes a color filter structure and a manufacturing method thereof to solve the problems of color unevenness, light leakage in white areas and color shift of the color filter.

In order to achieve the above purpose, the present invention proposes a color filter structure, including:

A transparent substrate, the transparent substrate includes a surface;

A plurality of black matrix pattern columns, the black matrix pattern columns have hydrophobic properties and are arranged on the surface of the transparent substrate to define a plurality of sub-pixels, each of the black matrix pattern columns includes a plurality of light-shielding structures arranged in series along a first direction, each of the light-shielding structures has a thickness and forms an accommodation space, and each of the light-shielding structures has at least one hydrophobic channel, so that they are located in the same black matrix The accommodating spaces adjacent to each other on the pattern column communicate with each other; and

A color filter layer is arranged in the accommodating spaces formed by the light-shielding structures.

In order to achieve the above purpose, the present invention proposes a color filter structure, including:

A transparent substrate, the transparent substrate includes a surface;

A plurality of black matrix pattern columns, the black matrix pattern columns have hydrophobic properties and are arranged on the surface of the transparent substrate to define a plurality of sub-pixels, each of the black matrix pattern columns includes a plurality of a light-shielding structure arranged in series along a first direction, each of the light-shielding structures has a thickness and forms an accommodating space, each of the accommodating spaces is a closed space and is not connected to each other, and each of the light-shielding structures the structure has at least one hydrophobic notch; and

A color filter layer is arranged in the accommodating spaces formed by the light-shielding structures.

In order to achieve the above purpose, the present invention proposes a color filter structure, including:

A transparent substrate, the transparent substrate includes a surface;

A plurality of black matrix pattern columns, the black matrix pattern columns have hydrophobic properties and are arranged on the surface of the transparent substrate to define a plurality of sub-pixels, each of the black matrix pattern columns includes a plurality of light-shielding structures arranged in series along a first direction, each of the light-shielding structures has a thickness and forms an accommodation space, and each of the light-shielding structures has at least one hydrophobic channel, so that they are located in the same black matrix The accommodating spaces adjacent to each other on the pattern column communicate with each other; and

A color filter layer is arranged in the accommodating spaces formed by the light-shielding structures.

In order to achieve the above purpose, the present invention also provides a method for making a color filter structure, comprising:

providing a transparent substrate;

A plurality of black matrix pattern columns are formed on a surface of the transparent substrate, wherein each of the black matrix pattern columns includes a plurality of light-shielding structures arranged in series along a first direction, and each of the light-shielding structures has a thickness and form an accommodating space, and each of the light-shielding structures has at least one gap (or notch, channel);

performing a hydrophobic treatment manufacturing process on the black matrix pattern, so that the gaps of each of the light-shielding structures have hydrophobic properties to form at least one steam trap; and

Perform an inkjet manufacturing process to spray photoresist ink into each of the accommodating spaces in sequence, and use a hydrophobic force (hydrophobic force) generated by each of the traps to interact with each of the accommodating spaces When the hydrostatic force (hydrostatic force) produced by the photoresist ink reaches the static force balance, because the hydrophobic force is mainly related to the adjustment of the size design of the channel or notch or gap, the excess photoresist When the hydrostatic force caused by the ink is greater than the designed hydrophobic force range, the excess photoresist ink can flow into the traps (including the traps, notches or gaps), and make the traps located in each of the traps The photoresist inks in these accommodation spaces of the black matrix pattern columns have the same height to reduce defects such as uneven thickness and color mixing that may be caused by variations in the inkjet manufacturing process, so as to achieve the chromaticity of the color filter layer. The uniform effect can effectively improve the reliability and yield rate of the color filter.

Description of drawings

1 and 2 are method schematic diagrams of the conventional inkjet manufacturing process.

3 to 5 are schematic diagrams illustrating the volume adjustment mechanism of the photoresist ink in a containing space.

6 to 12 are schematic diagrams of color filter structures of various embodiments of the present invention.

FIG. 13 is a flowchart of a method for fabricating a color filter structure according to an embodiment of the present invention.

Reference number

10 Glass substrate 12 Black matrix pattern

14 Accommodating space 16R Red photoresist ink

16G green photoresist ink 16B blue photoresist ink

30 Transparent Substrate 32 Black Matrix Pattern Columns

34 shading structure 36 accommodation space

38 Color filter layer 38R Red filter pattern

38G Green filter pattern 38B Blue filter pattern

40 Hydrophobic channels 42 Hydrophobic notches

Detailed ways

The color filter structure provided by the present invention has the design of a water trap, and the hydrostatic force and hydrostatic force are used to balance the hydrostatic force to solve the problems of uneven chromaticity, light leakage in white areas, and color shift. Please refer to Figure 3 to Figure 5. 3 to 5 illustrate schematic diagrams of the volume adjustment mechanism of the photoresist ink in an accommodating space, wherein FIG. 5 is a top view of FIG. 4 . As shown in Figure 3, when the photoresist ink (undried color filter layer) is injected into an accommodating space, the gravity of the photoresist ink will generate a hydrostatic force Ps, and on the other hand the present invention The trap will generate a hydrophobic force Ph due to its hydrophobic characteristics. Theoretically, the ideal height of photoresist ink before drying is T. However, if the amount of photoresist ink sprayed is too much, for example, its height is T', the hydrostatic force Ph will be greater than the hydrophobic force Ps so that too much The photoresist ink flows into the trap. As shown in FIG. 4 and FIG. 5 , when the photoresist ink flows into the trap, the hydrostatic force Ps is gradually weakened until it reaches a static equilibrium with the hydrophobic force Ph.

The relationship between the hydrostatic force Ps and the hydrophobic force Ph is shown in the following relational formula:

${\mathrm{<span\; class="notranslate">\; P</span>}}_{\mathrm{<span\; class="notranslate">\; h</span>}}<span\; class="notranslate">\; =</span>\mathrm{<span\; class="notranslate">\; 2</span>}<span\; class="notranslate">\; \&Center\; Dot;</span>{\mathrm{<span\; class="notranslate">\; \&sigma;</span>}}_{\mathrm{<span\; class="notranslate">\; gl</span>}}<span\; class="notranslate">\; \&CenterDot;</span>\mathrm{<span\; class="notranslate">\; cos</span>}{\mathrm{<span\; class="notranslate">\; \&theta;</span>}}_{\mathrm{<span\; class="notranslate">\; c</span>}}<span\; class="notranslate">\; \&Center\; Dot;</span><span\; class="notranslate">\; [</span><span\; class="notranslate">\; (</span>\frac{\mathrm{<span\; class="notranslate">\; 1</span>}}{{\mathrm{<span\; class="notranslate">\; w</span>}}_{\mathrm{<span\; class="notranslate">\; 1</span>}}}<span\; class="notranslate">\; +</span>\frac{\mathrm{<span\; class="notranslate">\; 1</span>}}{{\mathrm{<span\; class="notranslate">\; h</span>}}_{\mathrm{<span\; class="notranslate">\; 1</span>}}}<span\; class="notranslate">\; )</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; (</span>\frac{\mathrm{<span\; class="notranslate">\; 1</span>}}{{\mathrm{<span\; class="notranslate">\; w</span>}}_{\mathrm{<span\; class="notranslate">\; 2</span>}}}<span\; class="notranslate">\; +</span>\frac{\mathrm{<span\; class="notranslate">\; 1</span>}}{{\mathrm{<span\; class="notranslate">\; h</span>}}_{\mathrm{<span\; class="notranslate">\; 2</span>}}}<span\; class="notranslate">\; )</span><span\; class="notranslate">\; ]</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; -</span><span\; class="notranslate">\; (</span>\mathrm{<span\; class="notranslate">\; 1</span>}<span\; class="notranslate">\; )</span>$

P _s =ρ·g·h (2)

in

_Ph : Hydrophobic force;

P _s : hydrostatic force;

σ _gl : surface tension of photoresist ink;

θ _c : contact angle between photoresist ink and black matrix pattern column;

ρ: density of photoresist ink;

g: gravitational constant;

h: the height of the photoresist ink before drying;

w ₁ : the width of the accommodation space;

h ₁ : the height of the accommodation space;

w ₂ : the width of the trap;

h ₂ : the height of the steam trap;

It can be seen from the above relationship that the surface tension of the photoresist ink, the contact angle between the photoresist ink and the black matrix pattern row, the density of the photoresist ink, the height of the accommodation space and the height of the trap are known. Under the situation, the ratio of the width w ₁ of the accommodating space to the width w ₂ of the trap can be designed so that when the static force is balanced (that is, Ph _h = P _s ), even if the amount of ink ejected is too large The height of the photoresist ink can also be adjusted and controlled within a desired range (eg T). Therefore, with the balance of hydrophobic force and hydrostatic force, the steam trap can solve the problem of the variable amount of photoresist ink. When the amount of photoresist ink sprayed is too large, it will flow into the trap without overflow. The problem of color mixing is caused, and under the condition of static force balance, the photoresist ink in all the accommodation spaces will have the same height, so that the color filter layer formed after subsequent baking will also have the same height, and The consistency of the height of the color filter layer can be improved.

Please refer to Figure 6 and Figure 7. 6 and 7 are schematic diagrams of the structure of a color filter according to a preferred embodiment of the present invention, wherein FIG. 6 is a schematic appearance diagram, and FIG. 7 is a top view. As shown in FIGS. 6 and 7 , the color filter structure of this embodiment includes a transparent substrate 30 (such as a glass substrate), a plurality of black matrix pattern rows 32 , and a color filter layer 38 . The black matrix pattern columns 32 have hydrophobic properties and are disposed on the surface of the transparent substrate 30 to define a plurality of sub-pixels. Each black matrix pattern row 32 includes a plurality of light-shielding structures 34 arranged in series along a first direction. Each light-shielding structure 34 has a thickness and forms an accommodating space 36 . The color filter layer 38 includes a plurality of color filter patterns of different colors, such as a red filter pattern (first color filter pattern) 38R, a green filter pattern (second color filter pattern) 38G, and a blue filter pattern. Pattern (third color filter pattern) 38B, wherein the red filter pattern 38R, green filter pattern 38G and blue filter pattern 38B are interlaced in a striped manner in the accommodation space 36 formed by the light-shielding structure 32 Inside.

One of the characteristics of the color filter structure of the present invention is that it has a trap design, and the trap has been treated with hydrophobic treatment, so it has hydrophobic properties and can provide hydrophobic force. As mentioned above, the inkjet head may have the problem of variation in the amount of ink ejected, so that the amount of photoresist ink in each accommodating space 36 will have a different amount. Hydrophobic notches 42, each hydrophobic notch 42 can independently play the role of a drain valve, so that when the photoresist ink is sprayed in the accommodating space 36 and before it dries, the excess photoresist ink will flow into the hydrophobic notches 42 Decrease the hydrostatic force until the hydrophobic force and the hydrostatic force reach a static equilibrium. In this way, the photoresist ink will not overflow into the different color accommodation spaces 36 of other columns, and the photoresist ink in each accommodation space 36 can have the same height, so that the color filter formed after drying Layer 38 will also have a consistent thickness.

In this embodiment, hydrophobic notches 42 are formed on the sidewalls of each light-shielding structure 34 , more precisely, each hydrophobic notch 42 and the hydrophobic notch 42 of an adjacent light-shielding structure 34 are disposed on the side adjacent to the light-shielding structure 34 and the adjacent hydrophobic notches 42 are set correspondingly, wherein the accommodation space 36 at both ends of each black matrix pattern row 32 has only a single hydrophobic notch 42, while the other accommodation spaces 36 have two hydrophobic notches respectively 42, but its number is not limited to this. In addition, the hydrophobic notch 42 does not communicate with the adjacent receiving spaces 36 , so that each receiving space 36 is a closed space, but the hydrophobic notch 42 has a hydrophobic property, so it can provide a hydrophobic force to play the role of a trap.

In order to highlight the differences between different embodiments of the present invention, the following descriptions and illustrations of the various embodiments only illustrate the differences between the various embodiments, and do not repeat the same elements. Please refer to Figure 8. FIG. 8 is a top view of a black matrix pattern column of a color filter structure according to another embodiment of the present invention. The embodiment of FIG. 8 is similar to the embodiment of FIG. 6, except that the receiving space 36 at the end of each black matrix pattern column 32 does not have a hydrophobic notch 42, and the rest of the receiving spaces only have a single hydrophobic notch. 42.

Please refer to Figure 9. FIG. 9 is a top view of a black matrix pattern column of a color filter structure according to another embodiment of the present invention. As shown in FIG. 9, compared with the embodiment of FIG. 6, a plurality of hydrophobic notches 42 are formed on the side walls of each light-shielding structure 34 of this embodiment instead of only a single hydrophobic notch 42, and each accommodating space The hydrophobic notches 42 within 36 are evenly distributed. It is worth noting that in the above-mentioned embodiments, the width of the accommodation space 36 is the first width, and the width (or sum of width) of the hydrophobic notch 42 in each accommodation space 36 is the second width, and the second width is the same as the first width. The ratio of the first width is generally between 0.3 and 0.95, and preferably between 0.5 and 0.9, but the ratio of the second width to the first width should still be based on the surface tension of the photoresist ink , the contact angle between the photoresist ink and the black matrix pattern row, the density of the photoresist ink and other parameters are changed, and are not limited to the above range.

Please refer to Figure 10 and Figure 11. 10 and 11 are schematic diagrams of the structure of a color filter according to another embodiment of the present invention, wherein FIG. 10 is a schematic appearance diagram, and FIG. 11 is a top view. As shown in FIGS. 10 and 11 , one of the features of the color filter structure of this embodiment is that each light shielding structure 34 has at least one hydrophobic channel 40 instead of a hydrophobic notch design. In addition to functioning as a trap, the hydrophobic channel 40 enables adjacent accommodation spaces 36 located on the same black matrix pattern column 32 to communicate with each other. The difference from the design of the hydrophobic notch is that the design of the hydrophobic channel 40 allows excess photoresist ink to overflow into the adjacent receiving spaces 36 in the same series through the hydrophobic channel 40 . In this way, the photoresist ink will not overflow into the different color accommodation spaces 36 of other rows, and the photoresist ink of the same color in the same row of accommodation spaces 36 can have the same height, so that after drying The formed color filter layer 38 also has a uniform thickness.

Please refer to Figure 12. FIG. 12 is a top view of a black matrix pattern column of a color filter structure according to another embodiment of the present invention. As shown in FIG. 12 , compared with the embodiment in FIG. 10 , in this embodiment, each light-shielding structure 34 has a plurality of hydrophobic channels 40 instead of only a single hydrophobic channel 40 .

In the above two embodiments, the width of the accommodating space 36 is the first width, and the width (or the sum of the widths) of the hydrophobic channel 40 in each accommodating space 36 is the second width, and the ratio of the second width to the first width is approximately Generally between 0.3 and 0.95, and generally between 0.5 and 0.9 is better. It should be noted that the second width refers to the sum of the widths of the hydrophobic passages 40 in each accommodation space 36, so if the accommodation space 36 only includes a single hydrophobic passage 40, the second width is the width of the hydrophobic passage 40 (for example, in this embodiment The containing space 36 located at both ends of each black matrix pattern row 32 ), and if the containing space includes two hydrophobic channels, the second width refers to the sum of the widths of the hydrophobic channels 40 . In addition, the ratio of the second width to the first width should still be changed according to parameters such as the surface tension of the photoresist ink, the contact angle between the photoresist ink and the black matrix pattern row, and the density of the photoresist ink. It is not limited to the above range. The space formed by the hydrophobic notch 42 or the hydrophobic channel 40 can use the corresponding opaque structure on the substrate containing the TFT control unit to prevent light leakage, such as an opaque layer containing gate lines or other metal wires. structure, make a shielded metal structure, or use the high aperture ratio structure, the organic dielectric layer covers the gate line, so that the liquid crystal molecules can still control the liquid crystal switch in the hydrophobic notch 42 or the hydrophobic channel 40 to shield The light leakage that may be caused here is not repeated because this part is well known to those skilled in the art.

It is worth noting that, basically, when the amount of sprayed photoresist ink varies within a certain range, the photoresist ink located in the accommodation space 36 of the same row will not pass through the hydrophobic force under the effect of hydrophobic force. The channel 40 flows into the adjacent accommodating space 36, yet the variation of the amount of sprayed photoresist ink may exceed the standard value too much under extreme circumstances, resulting in the photoresist ink in a certain accommodating space 36 The hydrostatic force of the liquid may be greater than the hydrophobic force of the hydrophobic channel 40 so that the static force is unbalanced. In the adjacent accommodation space 36 of the row, and when the amount of photoresist ink in this accommodation space 36 drops to an acceptable range, the hydrostatic force and the hydrophobic force will still reach a balance so that all the accommodation spaces 36 The photoresist ink will still have the same height. In order to adapt to the special situation that the amount of variation of the photoresist ink exceeds the standard value too much, one of them or several of them (generally the most end of the accommodation space 36) of the accommodation spaces 36 of each black matrix pattern row 32 can be set It is a dummy accommodating space 36d (as shown in Figure 11 or Figure 12), wherein the dummy accommodating space 36d may not be sprayed with photoresist ink during the inkjet manufacturing process, and thereby acts as a photoresist ink When the amount is too much, it can be used as a buffer space for accommodating excess photoresist ink, so that the amount of photoresist ink in other accommodating spaces 36 can be maintained within a normal range.

Please refer to FIG. 13 , and please also refer to FIG. 6 to FIG. 12 . FIG. 13 is a flowchart of a method for fabricating a color filter structure according to an embodiment of the present invention. As shown in Figure 13, the method for making a color filter structure in this embodiment includes the following steps:

Step 50: providing a transparent substrate;

Step 52: Form a plurality of black matrix pattern rows on a surface of the transparent substrate, wherein each black matrix pattern row includes a plurality of light-shielding structures arranged in series along a first direction, and each light-shielding structure has a thickness and forms an accommodating space , and each light-shielding structure has at least one gap, notch or channel, wherein the gap of the light-shielding structure can be a single or a plurality of passages that communicate with adjacent accommodating spaces, or a single or a plurality of recesses that are not connected with adjacent accommodating spaces mouth;

Step 54: performing a hydrophobic treatment manufacturing process such as a plasma manufacturing process on the black matrix pattern, so that the gaps, the notches or the channels of each light-shielding structure have hydrophobic properties to form at least one steam trap;

Step 56: Perform an inkjet manufacturing process to spray photoresist ink into each accommodation space in sequence, and use a hydrophobic force generated by each trap and a static force generated by the photoresist ink in each accommodation space The hydraulic force achieves a static balance, so that excess photoresist ink flows into the hydrophobic gap, so that the photoresist ink located in the accommodation space of each black matrix pattern column has the same height; and

Step 58 : Perform a baking process after the inkjet process to form a color filter structure with uniform chromaticity.

As can be seen from the above, the present invention utilizes the design of the trap (including the hydrophobic notch or the hydrophobic channel) to provide a hydrophobic force, and by adjusting the width of the hydrophobic channel or the hydrophobic notch, the hydrophobic force and the hydrostatic force of the photoresist ink can reach a force. Balanced to reduce color filter defects that may be caused by variations in the inkjet manufacturing process, thus effectively improving the reliability and yield of color filters.

The above descriptions are only preferred embodiments of the present invention, and all equivalent changes and modifications made according to the claims of the present invention shall fall within the scope of the present invention.

Claims (20)

1. a colorful filter structure is characterized in that, described structure comprises:

One transparency carrier, described transparency carrier comprises a surface;

A plurality of black matrix pattern row, described these black matrix patterns row have hydrophobic property and are arranged on the described surface of described transparency carrier to define pixel a plurality of times, each described black matrix pattern row comprises a plurality of light-shielding structures, arrange along a first direction with series system, each described light-shielding structure has a thickness and forms a spatial accommodation, and each described light-shielding structure has at least one hydrophobic channel, makes that be positioned at same described black matrix pattern lists adjacent described these spatial accommodations and communicate with each other; And

One chromatic filter layer is arranged within described these spatial accommodations of described these light-shielding structures formations.

2. colorful filter structure as claimed in claim 1, wherein said light-shielding structure has one first width, and described hydrophobic channel has one second width, and the ratio of described second width and described first width is substantially between 0.3 to 0.95.

3. colorful filter structure as claimed in claim 2, the ratio of wherein said second width and described first width is substantially between 0.5 to 0.9.

4. colorful filter structure as claimed in claim 1, wherein each described light-shielding structure comprises a plurality of hydrophobic channels, makes that be positioned at same described black matrix pattern lists adjacent described these spatial accommodations and communicate with each other.

5. colorful filter structure as claimed in claim 4, wherein each described light-shielding structure has one first width, and the width summation that is positioned at described these hydrophobic channels of same light-shielding structure is one second width, and the ratio of described second width and described first width is substantially between 0.3 to 0.95.

6. colorful filter structure as claimed in claim 5, the ratio of wherein said second width and described first width is substantially between 0.5 to 0.9.

7. colorful filter structure as claimed in claim 1, wherein said chromatic filter layer comprises a plurality of first color filter pattern, a plurality of second color filter pattern and a plurality of the 3rd color filter pattern, is staggered within described these spatial accommodations in vertical bar shape mode.

8. colorful filter structure as claimed in claim 1, wherein one of them of described these spatial accommodations of each described black matrix pattern row is an illusory spatial accommodation.

9. a colorful filter structure is characterized in that, described structure comprises:

One transparency carrier, described transparency carrier comprises a surface;

A plurality of black matrix pattern row, described these black matrix patterns row have hydrophobic property and are arranged on the described surface of described transparency carrier to define pixel a plurality of times, each described black matrix pattern row comprises a plurality of light-shielding structures, each described light-shielding structure has a thickness and forms a spatial accommodation, each described spatial accommodation is an enclosure space and is not communicated with each other, and each described light-shielding structure has at least one hydrophobic recess; And

One chromatic filter layer is arranged within described these spatial accommodations of described these light-shielding structures formations.

10. colorful filter structure as claimed in claim 9, wherein the described hydrophobic recess of the described hydrophobic recess of each described light-shielding structure and adjacent described light-shielding structure is arranged on the adjacent side of described these light-shielding structures.

11. colorful filter structure as claimed in claim 10, wherein said light-shielding structure has one first width, and described hydrophobic channel has one second width, and the ratio of described second width and described first width is substantially between 0.3 to 0.95.

12. colorful filter structure as claimed in claim 11, the ratio of wherein said second width and described first width is substantially between 0.5 to 0.9.

13. colorful filter structure as claimed in claim 9, wherein each described light-shielding structure includes a plurality of hydrophobic recesses.

14. colorful filter structure as claimed in claim 13, wherein each described light-shielding structure comprises a plurality of sides, and described these hydrophobic recesses are arranged on described these sides of each described light-shielding structure.

15. colorful filter structure as claimed in claim 14, wherein each described light-shielding structure has one first width, and the width summation that is positioned at described these hydrophobic recesses of same light-shielding structure is one second width, and the ratio of described second width and described first width is substantially between 0.3 to 0.95.

16. colorful filter structure as claimed in claim 15, the ratio of wherein said second width and described first width is substantially between 0.5 to 0.9.

17. a method of making colorful filter structure is characterized in that, described method comprises:

One transparency carrier is provided;

Form a plurality of black matrix pattern row in a surface of described transparency carrier, wherein each described black matrix pattern row comprises a plurality of light-shielding structures, each described light-shielding structure has a thickness and forms a spatial accommodation, and each described light-shielding structure has at least one breach;

Described black matrix pattern is carried out a hydrophobic treatments manufacturing process, make the described breach of each described light-shielding structure have hydrophobic property and form at least one drain valve; And

Carry out an ink-jet manufacturing process and in each described spatial accommodation, spray into photoetching celluloid ink liquid in regular turn, and a hydrostatic power of a hydrophobic force that produces by each described drain valve and the generation of the photoetching celluloid ink liquid in each described spatial accommodation reaches statical equilibrium, unnecessary photoetching celluloid ink liquid is flowed in described these drain valves, and make the photoetching celluloid ink liquid of described these spatial accommodations that are positioned at each described black matrix pattern row have identical height.

18. method as claimed in claim 17, wherein each described drain valve is a hydrophobic channel, makes that be positioned at same described black matrix pattern lists adjacent described these spatial accommodations and communicate with each other.

19. method as claimed in claim 17, wherein each described drain valve is a hydrophobic recess, and described these hydrophobic recesses are not communicated with each other, makes each described spatial accommodation form an enclosure space.

20. method as claimed in claim 17, wherein said hydrophobic treatments manufacturing process comprises a plasma manufacturing process.

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