CN101158776A - Colorful optical filter structure and preparation method thereof - Google Patents
Colorful optical filter structure and preparation method thereof Download PDFInfo
- Publication number
- CN101158776A CN101158776A CNA2007101626258A CN200710162625A CN101158776A CN 101158776 A CN101158776 A CN 101158776A CN A2007101626258 A CNA2007101626258 A CN A2007101626258A CN 200710162625 A CN200710162625 A CN 200710162625A CN 101158776 A CN101158776 A CN 101158776A
- Authority
- CN
- China
- Prior art keywords
- width
- hydrophobic
- light
- black matrix
- shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Optical Filters (AREA)
Abstract
The invention relates to a color filter piece structure and the manufacturing method, the color filter piece structure comprises a plurality of black matrix pattern arrays with hydrophobic properties and a color filter layer; each black matrix pattern array comprises a plurality of shade structures arranged with a series mode, and each shade structure forms an accommodated space to accommodate the color filter layer; the shade structures are closed space and communicated with each other, the shade structure at least is provided with a hydrophobic valve so as to provide a hydrophobic force. The invention can reduce the fault of the uneven thickness and the mixed color due to the variation of the inject manufacturing process, so the even chroma effect of the color filter layer is reached, and the reliability quality and the non defective ratio of the color filter piece are effectively enhanced.
Description
Technical field
The invention relates to a kind of colorful filter structure and preparation method thereof, refer to especially a kind ofly have the design of drain valves such as hydrophobic recess or hydrophobic channel and can avoid colorful filter structure of colour mixture and thickness inequality problem and preparation method thereof.
Background technology
LCD generally uses white light as light source, must utilize colored filter that white light source is resolved into red (red, R), green (green, G), blue (blue, B) primaries, further be mixed into the various colors that human eye can be offered an explanation again, therefore the filter effect of colored filter is the key factor of the colour picture performance of decision LCD, the cost of adding colored filter is more expensive than other element, so colored filter becomes one of most important key element of LCD.
Existing method of making colored filter mainly is that the mode of utilizing the post-exposure of coating photoresist material to develop is formed.At first, with solid color photoetching celluloid ink liquid, for example red photoetching celluloid ink liquid is coated on the substrate in the rotary coating mode, utilizes soft roasting, exposure imaging and hard manufacturing process formation red filter layer pattern such as roasting again.Repeat above-mentioned steps subsequently again and form green and blue filter pattern layer.Yet the photoetching celluloid ink liquid utilization rate of this production method is very low, has ninety percent photoetching celluloid ink liquid to be thrown out of in the process of rotary coating approximately, back seventy percent photoetching celluloid ink liquid dissolved the removing in developing process of can having an appointment again.In addition, existing method of making colored filter need once be coated with manufacturing process, pre-baking fabrication technique, exposure manufacturing process and development manufacturing process at the photoetching celluloid ink liquid of each color respectively, makes that manufacturing process is complicated and cost is expensive.
Therefore, industry begins to utilize ink ejecting method to improve the shortcoming that the rotary coating mode is made colored filter at present.Please refer to Fig. 1 and Fig. 2, Fig. 1 and Fig. 2 are the method synoptic diagram of general ink-jet manufacturing process.At first as shown in Figure 1, one glass substrate 10 is provided, and on glass substrate 10, form a plurality of black matrix patterns that are in array-like arrangement 12, wherein form a plurality of (n*m matrixes for example between the black matrix pattern 12, n, m are positive integer) disconnected each other enclosed type spatial accommodation 14, in order to hold colored photoetching celluloid ink liquid.Then as shown in Figure 2, utilize the ink gun (figure does not show) of an ink-jet apparatus, the required photoetching celluloid ink liquid of spraying on glass substrate 10.The manufacturing process of the colored filter of arranging with strip is example, spraying a certain primary colors pigment (for example red pigment 16R) in the spatial accommodation between the capable black matrix pattern 12 of 3n-2 is sprayed at other two primary colors pigment (for example viridine green 16G and blue pigment 16B) in the spatial accommodation between the black matrix pattern 12 that 3n-1 is capable and 3n is capable more in regular turn in regular turn.Baking is removed unnecessary solvent composition so that red ink liquid 16R, green ink liquid 16G and blue ink liquid 16B harden to form colored filter more subsequently.
Though it is more efficient and cost is lower to utilize the ink-jet manufacturing process to make the practice of colored filter, yet the difficult problem that it faced is ink gun and can produces the problem of ink ejection amount variation in use for some time unavoidablely, may make photoetching celluloid ink liquid in each spatial accommodation, have different amounts thus, make colored filter in uneven thickness of follow-up formation, cause to show that colourity is uneven and influence display effect.What is more, for example when the amount of color ink liquid is not enough (generally being referred to as unfilled pixel), can make that the filter effect of colored filter is not good and when showing, produce white area (white area), and when the amount of color ink liquid too much produces overflow (overflow) phenomenon, not only can influence filter effect, the problem of colour mixture (color mixing) more likely takes place.Generally speaking, if overflow is to occur between the colored filter of same color can too much influence not arranged to color representation, yet, then can mix the serious colour cast problem that produces because of pigment if overflow is when occurring between the colored filter of different colours.
Summary of the invention
Therefore the present invention proposes a kind of colorful filter structure and preparation method thereof, to solve colourity inequality, white area light leak and the colour cast problem of colored filter.
For reaching above-mentioned purpose, the present invention proposes a kind of colorful filter structure, comprising:
One transparency carrier, described transparency carrier comprises a surface;
A plurality of black matrix pattern row, described these black matrix patterns row have hydrophobic property and are arranged on the described surface of described transparency carrier to define pixel a plurality of times, each described black matrix pattern row comprises a plurality of light-shielding structures, arrange along a first direction with series system, each described light-shielding structure has a thickness and forms a spatial accommodation, and each described light-shielding structure has at least one hydrophobic channel, makes that be positioned at same described black matrix pattern lists adjacent described these spatial accommodations and communicate with each other; And
One chromatic filter layer is arranged within described these spatial accommodations of described these light-shielding structures formations.
For reaching above-mentioned purpose, the present invention proposes a kind of colorful filter structure, comprising:
One transparency carrier, described transparency carrier comprises a surface;
A plurality of black matrix pattern row, described these black matrix patterns row have hydrophobic property and are arranged on the described surface of described transparency carrier to define pixel a plurality of times, each described black matrix pattern row comprises a plurality of light-shielding structures, arrange along a first direction with series system, each described light-shielding structure has a thickness and forms a spatial accommodation, each described spatial accommodation is an enclosure space and is not communicated with each other, and each described light-shielding structure has at least one hydrophobic recess; And
One chromatic filter layer is arranged within described these spatial accommodations of described these light-shielding structures formations.
For reaching above-mentioned purpose, the present invention proposes a kind of colorful filter structure, comprising:
One transparency carrier, described transparency carrier comprises a surface;
A plurality of black matrix pattern row, described these black matrix patterns row have hydrophobic property and are arranged on the described surface of described transparency carrier to define pixel a plurality of times, each described black matrix pattern row comprises a plurality of light-shielding structures, arrange along a first direction with series system, each described light-shielding structure has a thickness and forms a spatial accommodation, and each described light-shielding structure has at least one hydrophobic channel, makes that be positioned at same described black matrix pattern lists adjacent described these spatial accommodations and communicate with each other; And
One chromatic filter layer is arranged within described these spatial accommodations of described these light-shielding structures formations.
For reaching above-mentioned purpose, the present invention also provides a kind of method of making colorful filter structure, comprising:
One transparency carrier is provided;
Form a plurality of black matrix pattern row in a surface of described transparency carrier, wherein each described black matrix pattern row comprises a plurality of light-shielding structures, arrange along a first direction with series system, each described light-shielding structure has a thickness and forms a spatial accommodation, and each described light-shielding structure has at least one breach (or recess, passage);
Described black matrix pattern is carried out a hydrophobic treatments manufacturing process, make the described breach of each described light-shielding structure have hydrophobic property and form at least one drain valve; And
Carry out an ink-jet manufacturing process and in each described spatial accommodation, spray into photoetching celluloid ink liquid in regular turn, and the hydrostatic power (hydrostatic force) that a hydrophobic force (hydrophobic force) that produces by each described drain valve and photoetching celluloid ink liquid in each described spatial accommodation produce is when both reach statical equilibrium, the size design that mainly is associated with described passage or recess or breach because of hydrophobic force is adjusted, so unnecessary photoetching celluloid ink liquid cause hydrostatic power greater than the design the hydrophobic force scope time, described unnecessary photoetching celluloid ink liquid just can flow into described these drain valves and (comprise hydrophobic channel, recess or breach) in, and make the photoetching celluloid ink liquid of described these spatial accommodations that are positioned at each described black matrix pattern row have identical height, defectives such as the uneven thickness that may cause with the variation that reduces the ink-jet manufacturing process and colour mixture, and reach fiduciary level and the yields that chromatic filter layer colourity effect of uniform also can effectively promote colored filter.
Description of drawings
Fig. 1 and Fig. 2 are the method synoptic diagram of existing ink-jet manufacturing process.
Fig. 3 to Fig. 5 has illustrated the volume of photoetching celluloid ink liquid in a spatial accommodation and has adjusted machine-processed synoptic diagram.
Fig. 6 to Figure 12 is the synoptic diagram of the colorful filter structure of various embodiments of the present invention.
Figure 13 makes the method flow diagram of colorful filter structure for one embodiment of the invention.
Drawing reference numeral
10 glass substrates, 12 black matrix patterns
The red photoetching celluloid ink of 14 spatial accommodation 16R liquid
The blue photoetching celluloid ink of the green photoetching celluloid ink of 16G liquid 16B liquid
30 transparency carriers, 32 black matrix patterns row
34 light-shielding structures, 36 spatial accommodations
The red filter pattern of 38 chromatic filter layer 38R
The blue filter pattern of the green filter pattern 38B of 38G
40 hydrophobic channels, 42 hydrophobic recesses
Embodiment
Colorful filter structure provided by the invention has the design of drain valve, and the statical equilibrium of using hydrophobic power and hydrostatic power is to solve colourity inequality, white area light leak and colour cast problem.Please refer to Fig. 3 to Fig. 5.Fig. 3 to Fig. 5 has illustrated the volume of photoetching celluloid ink liquid in a spatial accommodation and has adjusted machine-processed synoptic diagram, and wherein Fig. 5 is the vertical view of Fig. 4.As shown in Figure 3, after photoetching celluloid ink liquid (undried chromatic filter layer) injected within the spatial accommodation, the gravity of photoetching celluloid ink liquid can produce a hydrostatic power Ps, and drain valve of the present invention on the other hand then can produce a hydrophobic force Ph because of hydrophobic property.In theory, the ideal height of photoetching celluloid ink liquid before dry is T, yet when if the quantity for spray of photoetching celluloid ink liquid is too much, for example it highly be T ', and hydrostatic power Ph can make in the too much photoetching celluloid ink liquid inflow drain valve greater than hydrophobic force Ps at this moment.As Fig. 4 and shown in Figure 5, in the process in photoetching celluloid ink liquid flows into drain valve, can make hydrostatic power Ps slowly weaken, till reaching statical equilibrium with hydrophobic force Ph.
The relation of hydrostatic power Ps and hydrophobic force Ph is shown in following relational expression:
P
s＝ρ·g·h (2)
Wherein
P
h: hydrophobic force;
P
s: hydrostatic power;
σ
Gl: the surface tension of photoetching celluloid ink liquid;
θ
c: the contact angle of photoetching celluloid ink liquid and black matrix pattern row;
ρ: the density of photoetching celluloid ink liquid;
G: gravity constant;
H: the height before photoetching celluloid ink liquid is not dry;
w
1: the width of spatial accommodation;
h
1: the height of spatial accommodation;
w
2: the width of drain valve;
h
2: the height of drain valve;
By the above-mentioned relation formula as can be known, under the height of the height of the density of the contact angle of the surface tension of photoetching celluloid ink liquid, photoetching celluloid ink liquid and black matrix pattern row, photoetching celluloid ink liquid, spatial accommodation and drain valve is known situation, can be by the width w that designs spatial accommodation
1Width w with drain valve
2Ratio, make when static(al) reaches the shape of balance can time (that is P
h=P
s), even the excessive also height of photoetching celluloid ink liquid for example can the adjustment of ink ejection amount is controlled at (for example T) in the desirable scope.Therefore by hydrophobic force and hydrostatic equilibrium of forces, drain valve can solve the problem of the amount of variability of photoetching celluloid ink liquid, when the quantity for spray of photoetching celluloid ink liquid is excessive, can flow in the drain valve, do not cause the colour mixture problem and can not produce overflow, and the photoetching celluloid ink liquid under the situation of statical equilibrium in all spatial accommodations all can have identical height, the chromatic filter layer that follow-up thus baking back forms also can have identical height, and can improve the consistance of colorized optical filtering layer height.
Please refer to Fig. 6 and Fig. 7.Fig. 6 and 7 figure are the synoptic diagram of the colorful filter structure of a preferred embodiment of the present invention, and wherein Fig. 6 is a schematic appearance, and Fig. 7 is a vertical view.As Fig. 6 and shown in Figure 7, the colorful filter structure of present embodiment comprises a transparency carrier 30 (a for example glass substrate), a plurality of black matrix pattern row 32, and a chromatic filter layer 38.Black matrix pattern row 32 have hydrophobic property and are arranged on the surface of transparency carrier 30, define pixel a plurality of times.Each black matrix pattern row 32 comprises a plurality of light-shielding structures 34, arranges along a first direction with series system, and each light-shielding structure 34 has a thickness and forms a spatial accommodation 36.Chromatic filter layer 38, the color filter patterns that comprises plural number kind different colours, for example red filter pattern (the first color filter pattern) 38R, green filter pattern (the second color filter pattern) 38G and blue filter pattern (the 3rd color filter pattern) 38B, wherein red filter pattern 38R, green filter pattern 38G and blue filter pattern 38B are crisscross arranged within the spatial accommodation 36 that light-shielding structure 32 constitutes in vertical bar shape (stripe) mode.
One of feature of colorful filter structure of the present invention is to have drain valve design, and drain valve is through hydrophobic treatments, therefore has hydrophobic property and hydrophobic force can be provided.As previously mentioned, ink gun may produce the problem of ink ejection amount variation, make photoetching celluloid ink liquid in each spatial accommodation 36, can have different amounts, and the practice of present embodiment has at least one hydrophobic recess 42 for each light-shielding structure 34, each hydrophobic recess 42 can be brought into play the effect of drain valve separately, make to be sprayed within the spatial accommodation 36 and as yet not before the drying when photoetching celluloid ink liquid that unnecessary photoetching celluloid ink liquid can flow into hydrophobic recess 42 descends hydrostatic power and till hydrophobic force and hydrostatic power reach statical equilibrium.So, the unlikely overflow of photoetching celluloid ink liquid to the different color tolerances of other row are received within the space 36, and can make the photoetching celluloid ink liquid of each spatial accommodation 36 have identical height, and then make the formed chromatic filter layer 38 in dry back also can have consistent thickness.
Present embodiment is formed at hydrophobic recess 42 on the sidewall of each light-shielding structure 34, the hydrophobic recess 42 of each hydrophobic recess 42 and adjacent light-shielding structure 34 is arranged on the adjacent side of light-shielding structure 34 or rather, and adjacent hydrophobic recess 42 is corresponding setting, wherein the spatial accommodation 36 at the two ends of each black matrix pattern row 32 only has single hydrophobic recess 42, other spatial accommodation 36 then has two hydrophobic recesses 42 respectively, but its quantity is not limited to this.Therefore in addition, hydrophobic recess 42 is interconnected adjacent spatial accommodation 36, make that each spatial accommodation 36 is an enclosure space, but hydrophobic recess 42 has hydrophobic property, therefore can provide hydrophobic force and brings into play the effect of drain valve.
In order to highlight the difference between the different embodiments of the invention, the explanation of following each embodiment and diagram only are illustrated with regard to the different place of each embodiment, and repeat no more components identical.Please refer to Fig. 8.Fig. 8 is the vertical view that the black matrix pattern of the colorful filter structure of another embodiment of the present invention is listed as.The embodiment of Fig. 8 and the embodiment of Fig. 6 are similar, and its difference is do not have the hydrophobic recess 42 except the spatial accommodation 36 of each black matrix pattern row 32 least significant end, and remaining spatial accommodation all only has single hydrophobic recess 42.
Please refer to Fig. 9.Fig. 9 is the top view that the black matrix pattern of the colorful filter structure of further embodiment of this invention is listed as.As shown in Figure 9, compare, be formed with a plurality of hydrophobic recesses 42 on the sidewall of each light-shielding structure 34 of present embodiment, but not single hydrophobic recess 42 is only arranged, and the hydrophobic recesses 42 in each spatial accommodation 36 be evenly distribution with the embodiment of Fig. 6.What deserves to be explained is in the various embodiments described above, the width of spatial accommodation 36 is first width, and the width of the hydrophobic recess 42 in each spatial accommodation 36 (or width and) is second width, and the ratio of second width and first width is substantially between 0.3 to 0.95, and being preferable substantially between 0.5 to 0.9, yet the ratio of second width and first width must be changed according to parameter such as the surface tension of photoetching celluloid ink liquid, photoetching celluloid ink liquid and the contact angle of black matrix pattern row, the density of photoetching celluloid ink liquid, and is not limited to above-mentioned scope.
Please refer to Figure 10 and Figure 11.Figure 10 and Figure 11 are the synoptic diagram of the colorful filter structure of another embodiment of the present invention, and wherein Figure 10 is a schematic appearance, and Figure 11 is a vertical view.As Figure 10 and shown in Figure 11, one of feature of the colorful filter structure of present embodiment is that each light-shielding structure 34 has at least one hydrophobic channel 40, but not the design of hydrophobic recess.Hydrophobic channel 40 and makes that be positioned at spatial accommodation 36 adjacent on the same black matrix pattern row 32 communicates with each other except that the effect that can bring into play drain valve.Be with the design difference of hydrophobic recess, the design of hydrophobic channel 40 can make unnecessary photoetching celluloid ink liquid via hydrophobic channel 40 overflows to the adjacent spatial accommodation 36 of same series connection.So, the unlikely overflow of photoetching celluloid ink liquid to the different color tolerances of other row are received within the space 36, and can make that the photoetching celluloid ink liquid of same color has identical height within the spatial accommodation 36 of same row, and then make the formed chromatic filter layer 38 in dry back also can have consistent thickness.
Please refer to Figure 12.Figure 12 is the vertical view that the black matrix pattern of the colorful filter structure of further embodiment of this invention is listed as.As shown in figure 12, compare with the embodiment of Figure 10, the practice of present embodiment has a plurality of hydrophobic channels 40 for each light-shielding structure 34, but not only has single hydrophobic channel 40.
In above-mentioned two embodiment, the width of spatial accommodation 36 is first width, and the width of the hydrophobic channel 40 in each spatial accommodation 36 (or width and) is second width, and the ratio of second width and first width is substantially between 0.3 to 0.95, and being preferable substantially between 0.5 to 0.9.What deserves to be explained is that second width is meant the width summation of the hydrophobic channel 40 in each spatial accommodation 36, therefore if spatial accommodation 36 only comprises single hydrophobic channel 40, then second width is the width (for example being positioned at the spatial accommodation 36 at each black matrix pattern row 32 two ends in the present embodiment) of hydrophobic channel 40, and if spatial accommodation comprises two hydrophobic channels, then second width is meant the width summation of hydrophobic channel 40.In addition, the ratio of second width and first width must be changed according to parameter such as the surface tension of photoetching celluloid ink liquid, photoetching celluloid ink liquid and the contact angle of black matrix pattern row, the density of photoetching celluloid ink liquid, and is not limited to above-mentioned scope.The space that above-mentioned hydrophobic recess 42 or hydrophobic channel 40 form, can utilize light tight structure corresponding on the substrate that contains the TFT control module of group in case leak-stopping light, the light non-transmittable layers structure that for example contains gate line or other plain conductors, the metal construction that making is covered, or utilize in the high aperture structure, organic dielectric layer is covered on the gate line, make liquid crystal molecule still can control liquid crystal shutter in parts such as hydrophobic recess 42 or hydrophobic channels 40, cover the light leak that may cause herein, because this part is known by this operator of grasp, therefore repeat no more.
What deserves to be explained is, basically under the situation of the variation of the quantity for spray of photoetching celluloid ink liquid in to a certain degree, the photoetching celluloid ink liquid that is positioned at the spatial accommodation 36 of same row under the effect of hydrophobic force can't flow into adjacent spatial accommodation 36 by hydrophobic channel 40, yet the variation of the quantity for spray of photoetching celluloid ink liquid might the value of being above standard under great situation too much, and cause the hydrostatic power of the photoetching celluloid ink liquid in a certain spatial accommodation 36 to make static unbalance greater than the hydrophobic force of hydrophobic channel 40, photoetching celluloid ink liquid under this situation in this spatial accommodation 36 can flow to the adjacent spatial accommodation 36 that is positioned at same row through the influence of hydrostatic power via hydrophobic channel 40, and when the amount of the photoetching celluloid ink liquid in this spatial accommodation 36 dropped in the acceptable scope, hydrostatic power still can reach balance with hydrophobic force and make the photoetching celluloid ink liquid in all spatial accommodations 36 still can have identical height.For the amount of variability that adapts to photoetching celluloid ink liquid exceeds the too many special status of standard value, one of them of the spatial accommodation 36 of each black matrix pattern row 32 or wherein several (being generally the spatial accommodation 36 of least significant end) can be set at one illusory (dummy) spatial accommodation 36d (as Figure 11 or shown in Figure 12), wherein illusory spatial accommodation 36d may not be coated with photoetching celluloid ink liquid when the ink-jet manufacturing process, and whereby when the amount of photoetching celluloid ink liquid is too much, can be used as the cushion space that holds unnecessary photoetching celluloid ink liquid, make the amount of the photoetching celluloid ink liquid in other spatial accommodation 36 maintain normal range.
Please refer to Figure 13, and please in the lump with reference to figure 6 to Figure 12.Figure 13 makes the method flow diagram of colorful filter structure for one embodiment of the invention.As shown in figure 13, present embodiment is made the method for colorful filter structure, comprises the following steps:
Step 50 a: transparency carrier is provided;
Step 52: form a plurality of black matrix pattern row in a surface of transparency carrier, wherein each black matrix pattern row comprises a plurality of light-shielding structures, arrange along a first direction with series system, each light-shielding structure has a thickness and forms a spatial accommodation, and each light-shielding structure has at least one breach, recess or passage, wherein the breach of light-shielding structure can be the passage single or spatial accommodation that a plurality of connections are adjacent, or is single or a plurality of recesses that are not communicated with adjacent spatial accommodation;
Step 54: black matrix pattern is carried out a for example plasma manufacturing process of a hydrophobic treatments manufacturing process, make the described breach of each light-shielding structure, described recess or described passage have hydrophobic property and form at least one drain valve;
Step 56: carry out an ink-jet manufacturing process and in each spatial accommodation, spray into photoetching celluloid ink liquid in regular turn, and a hydrostatic power of a hydrophobic force that produces by each drain valve and the generation of the photoetching celluloid ink liquid in each spatial accommodation reaches statical equilibrium, unnecessary photoetching celluloid ink liquid is flowed in the hydrophobic breach, and make the photoetching celluloid ink liquid of the spatial accommodation that is positioned at each black matrix pattern row have identical height; And
Step 58: after the ink-jet manufacturing process, carry out a baking manufacturing process, to form the uniform colorful filter structure of colourity.
From the above, the present invention utilizes drain valve (comprising hydrophobic recess or hydrophobic channel) design that one hydrophobic force is provided, and make the hydrostatic power of hydrophobic force and photoetching celluloid ink liquid reach dynamic balance by the width of adjusting hydrophobic channel or hydrophobic recess, with the colored filter defective that the variation that reduces the ink-jet manufacturing process may cause, therefore can effectively promote the fiduciary level and the yield of colored filter.
The above only is preferred embodiment of the present invention, and all equalizations of being done according to claim scope of the present invention change and modify, and all should belong to covering scope of the present invention.
Claims (20)
1. a colorful filter structure is characterized in that, described structure comprises:
One transparency carrier, described transparency carrier comprises a surface;
A plurality of black matrix pattern row, described these black matrix patterns row have hydrophobic property and are arranged on the described surface of described transparency carrier to define pixel a plurality of times, each described black matrix pattern row comprises a plurality of light-shielding structures, arrange along a first direction with series system, each described light-shielding structure has a thickness and forms a spatial accommodation, and each described light-shielding structure has at least one hydrophobic channel, makes that be positioned at same described black matrix pattern lists adjacent described these spatial accommodations and communicate with each other; And
One chromatic filter layer is arranged within described these spatial accommodations of described these light-shielding structures formations.
2. colorful filter structure as claimed in claim 1, wherein said light-shielding structure has one first width, and described hydrophobic channel has one second width, and the ratio of described second width and described first width is substantially between 0.3 to 0.95.
3. colorful filter structure as claimed in claim 2, the ratio of wherein said second width and described first width is substantially between 0.5 to 0.9.
4. colorful filter structure as claimed in claim 1, wherein each described light-shielding structure comprises a plurality of hydrophobic channels, makes that be positioned at same described black matrix pattern lists adjacent described these spatial accommodations and communicate with each other.
5. colorful filter structure as claimed in claim 4, wherein each described light-shielding structure has one first width, and the width summation that is positioned at described these hydrophobic channels of same light-shielding structure is one second width, and the ratio of described second width and described first width is substantially between 0.3 to 0.95.
6. colorful filter structure as claimed in claim 5, the ratio of wherein said second width and described first width is substantially between 0.5 to 0.9.
7. colorful filter structure as claimed in claim 1, wherein said chromatic filter layer comprises a plurality of first color filter pattern, a plurality of second color filter pattern and a plurality of the 3rd color filter pattern, is staggered within described these spatial accommodations in vertical bar shape mode.
8. colorful filter structure as claimed in claim 1, wherein one of them of described these spatial accommodations of each described black matrix pattern row is an illusory spatial accommodation.
9. a colorful filter structure is characterized in that, described structure comprises:
One transparency carrier, described transparency carrier comprises a surface;
A plurality of black matrix pattern row, described these black matrix patterns row have hydrophobic property and are arranged on the described surface of described transparency carrier to define pixel a plurality of times, each described black matrix pattern row comprises a plurality of light-shielding structures, each described light-shielding structure has a thickness and forms a spatial accommodation, each described spatial accommodation is an enclosure space and is not communicated with each other, and each described light-shielding structure has at least one hydrophobic recess; And
One chromatic filter layer is arranged within described these spatial accommodations of described these light-shielding structures formations.
10. colorful filter structure as claimed in claim 9, wherein the described hydrophobic recess of the described hydrophobic recess of each described light-shielding structure and adjacent described light-shielding structure is arranged on the adjacent side of described these light-shielding structures.
11. colorful filter structure as claimed in claim 10, wherein said light-shielding structure has one first width, and described hydrophobic channel has one second width, and the ratio of described second width and described first width is substantially between 0.3 to 0.95.
12. colorful filter structure as claimed in claim 11, the ratio of wherein said second width and described first width is substantially between 0.5 to 0.9.
13. colorful filter structure as claimed in claim 9, wherein each described light-shielding structure includes a plurality of hydrophobic recesses.
14. colorful filter structure as claimed in claim 13, wherein each described light-shielding structure comprises a plurality of sides, and described these hydrophobic recesses are arranged on described these sides of each described light-shielding structure.
15. colorful filter structure as claimed in claim 14, wherein each described light-shielding structure has one first width, and the width summation that is positioned at described these hydrophobic recesses of same light-shielding structure is one second width, and the ratio of described second width and described first width is substantially between 0.3 to 0.95.
16. colorful filter structure as claimed in claim 15, the ratio of wherein said second width and described first width is substantially between 0.5 to 0.9.
17. a method of making colorful filter structure is characterized in that, described method comprises:
One transparency carrier is provided;
Form a plurality of black matrix pattern row in a surface of described transparency carrier, wherein each described black matrix pattern row comprises a plurality of light-shielding structures, each described light-shielding structure has a thickness and forms a spatial accommodation, and each described light-shielding structure has at least one breach;
Described black matrix pattern is carried out a hydrophobic treatments manufacturing process, make the described breach of each described light-shielding structure have hydrophobic property and form at least one drain valve; And
Carry out an ink-jet manufacturing process and in each described spatial accommodation, spray into photoetching celluloid ink liquid in regular turn, and a hydrostatic power of a hydrophobic force that produces by each described drain valve and the generation of the photoetching celluloid ink liquid in each described spatial accommodation reaches statical equilibrium, unnecessary photoetching celluloid ink liquid is flowed in described these drain valves, and make the photoetching celluloid ink liquid of described these spatial accommodations that are positioned at each described black matrix pattern row have identical height.
18. method as claimed in claim 17, wherein each described drain valve is a hydrophobic channel, makes that be positioned at same described black matrix pattern lists adjacent described these spatial accommodations and communicate with each other.
19. method as claimed in claim 17, wherein each described drain valve is a hydrophobic recess, and described these hydrophobic recesses are not communicated with each other, makes each described spatial accommodation form an enclosure space.
20. method as claimed in claim 17, wherein said hydrophobic treatments manufacturing process comprises a plasma manufacturing process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101626258A CN101158776A (en) | 2007-10-15 | 2007-10-15 | Colorful optical filter structure and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101626258A CN101158776A (en) | 2007-10-15 | 2007-10-15 | Colorful optical filter structure and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101158776A true CN101158776A (en) | 2008-04-09 |
Family
ID=39306922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007101626258A Pending CN101158776A (en) | 2007-10-15 | 2007-10-15 | Colorful optical filter structure and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101158776A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102183806A (en) * | 2011-03-01 | 2011-09-14 | 友达光电股份有限公司 | Color filter array and manufacturing method thereof |
| US20110287682A1 (en) * | 2009-02-10 | 2011-11-24 | Panasonic Corporation | Organic el display manufacturing method |
| CN103311269A (en) * | 2013-05-29 | 2013-09-18 | 京东方科技集团股份有限公司 | OLED (organic light emitting diode) pixel limit structure and manufacturing method thereof |
-
2007
- 2007-10-15 CN CNA2007101626258A patent/CN101158776A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110287682A1 (en) * | 2009-02-10 | 2011-11-24 | Panasonic Corporation | Organic el display manufacturing method |
| US9111886B2 (en) * | 2009-02-10 | 2015-08-18 | Joled Inc. | Method of repairing a defect of an organic EL display |
| CN102183806A (en) * | 2011-03-01 | 2011-09-14 | 友达光电股份有限公司 | Color filter array and manufacturing method thereof |
| CN103311269A (en) * | 2013-05-29 | 2013-09-18 | 京东方科技集团股份有限公司 | OLED (organic light emitting diode) pixel limit structure and manufacturing method thereof |
| US10446622B2 (en) | 2013-05-29 | 2019-10-15 | Boe Technology Group Co., Ltd. | OLED pixel defining structure with at least two intercommunicated sub-pixel defining zones of same color, manufacturing method thereof and array substrate |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0655631B1 (en) | Method for manufacturing a color filter and a liquid crystal panel | |
| CN202041673U (en) | Color filter and liquid crystal display | |
| CN100405092C (en) | Color filter and preparation method thereof | |
| CN100464224C (en) | Color filter and manufacture method therefor | |
| KR100759838B1 (en) | Method for patterning color filter of liquid crystal display using ink-jet | |
| CN102934017A (en) | Color display device for electronic paper, and process for production thereof | |
| CN105867008B (en) | The preparation method of color membrane substrates and color membrane substrates, display panel | |
| CN102269834A (en) | Color optical filter and manufacturing method thereof | |
| US9867289B2 (en) | Filled large-format imprinting method | |
| US8059234B2 (en) | Color filter and black matrix thereof | |
| CN104765184A (en) | Liquid crystal display panel | |
| CN101158776A (en) | Colorful optical filter structure and preparation method thereof | |
| CN102393592A (en) | Pixel unit of full-color display panel and method for manufacturing color filter layer of panel | |
| CN202453608U (en) | Colour film substrate and liquid crystal display | |
| KR20070077677A (en) | Flatness method with height gap of color filter in tft-lcd and color filter board | |
| US20090086352A1 (en) | Color filter structure and method of making the same | |
| CN100426015C (en) | Colour optical filter separating wall and producing method thereof, colour filter and producing method thereof | |
| CN101105632A (en) | Coating device and color filter production method | |
| KR20060088684A (en) | Method for manufacturing color filter | |
| CN102778714B (en) | Color filter and manufacturing method thereof | |
| EP1953587B1 (en) | Systems for displaying images and methods for fabricating the same | |
| US8144291B2 (en) | Display device and production method thereof | |
| JP4460201B2 (en) | Color filter manufacturing apparatus and manufacturing method | |
| CN201587179U (en) | Ink spray system | |
| CN101101347A (en) | Filter and color filter production method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20080409 |