CN101118290A - Variable focal length X-ray compound lens and manufacturing method thereof - Google Patents
Variable focal length X-ray compound lens and manufacturing method thereof Download PDFInfo
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- CN101118290A CN101118290A CNA2007100559449A CN200710055944A CN101118290A CN 101118290 A CN101118290 A CN 101118290A CN A2007100559449 A CNA2007100559449 A CN A2007100559449A CN 200710055944 A CN200710055944 A CN 200710055944A CN 101118290 A CN101118290 A CN 101118290A
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Abstract
The present invention belongs to the field of the optical technology and relates to a varifocal X-ray combination lens and its manufacture method. This combination lens consists of a lens main body and air cavities arranged on the lens main body at intervals; the material of the lens main body is PMMA. The manufacture method of the present invention is firstly making in turn the required lays of polyimide, metal film, optical resist, etc. on the surface of the monocrystal line silicon chip which plays the role of support; secondly performing the processes of photoetching, electroforming, removing of photoresist, windowing, and so on, then completing the preparation of the photomask used in photoetching the lens main body and the photomask used in photoetching the air cavities; Finally, performing two times of the X-ray photoetching using the prepared photomasks, thus finishing the manufacture of the varifocal X-ray combination lens. The present invention has the advantages of good focusing effect, slight scattering, high transmission of the X-ray radiation, simple technics, and so on.
Description
Technical field:
The invention belongs to optical technical field, relate to a kind of microstructure X ray optical element, specifically a kind of variable focal length X-ray compound lens and preparation method thereof.
Background technology:
The X ray compound lens is a kind of novel microstructure X ray optical element that Snigirev proposed in 1996, is specially adapted to sigmatron wave band (more than the 5keV).Since this device proposes, external very active always to its research.At present, the combination refractor is verified a huge superiority: they can be to sigmatron pack, focusing efficiency height, the light path that do not need to turn back, be easy to arrangement and operation, high-temperature stability is good and easily cool off, can eliminate spherical aberration etc.In recent years, the various applied researcies that focus on and collimate based on the X ray compound lens are very active.Such as hard X ray microprobe, X-ray microscope, x-ray tomography photography, little X-ray fluorescence spectra determination method (μ-XRF), chemical microanalysis, little fluorescence and little EXAFS measures and the collimation of monochromator preparation light beam etc.These have all shown the huge applications potentiality and the wide application prospect of X ray compound lens.
Be the A1 material paraboloidal X ray varifocal compound lens (A.Khounsary that adopts mould pressing technology to make with the immediate project organization of the present invention in the world, et al., Proc.Of SPIE Vol.4783 (2002): 49-54), this compound lens is made of spaced air chamber on lens body and the lens body, and the gap between the adjacent vacant air cavity forms lens unit; Described lens body front view is wedge structure, and this wedge structure is made up of right-angled trapezium and rectangle, and the long base of right-angled trapezium overlaps with a long limit of rectangle, and the right-angle side of right-angled trapezium overlaps with a broadside of rectangle; Described air chamber is the parabolic cylindrical cavity that constitutes.Its method for making is to use the die with the complementary structure of made to carry out punching press on the Al of heating, thereby obtain the basic structure of lens, then the structure of cooling is carried out alignment, with two flat boards the plurality of units structure is clamped again, select suitable length diagonally to cut the variable focal length X-ray compound lens that obtains requiring.Because this compound lens has used the lower Al material of price, and adopt mould pressing technology to obtain parabolic shape, thereby have following shortcoming: machining precision is low, influences focusing effect; The interval of adjacent two air chambers is bigger, influences the X-radiation transmitance; Surfaceness is higher, and scattering is increased; Complex process.And this compound lens is because the height of air chamber is continuous variation, thereby can only realize continuous vari-focus.Domestic research about the X ray compound lens at present is less.
Summary of the invention:
The technical problem to be solved in the present invention provides that the interval of a kind of machining precision height, adjacent two air chambers is little, surfaceness is low, the simple variable focal length X-ray compound lens of manufacture craft and preparation method thereof.
The present invention includes spaced air chamber on lens body and the lens body, described lens body material adopts PMMA.
As an improvement of the present invention be: described lens body is a stepped appearance, comprises at least one air chamber in each step.When all comprising an air chamber in each step of lens body, compound lens can continuous vari-focus; When the air chamber that comprises in each step is two when above, compound lens can be realized discrete zoom.
Described air chamber is the cylindrical cavity that the double-paraboloid cylinder constitutes, the cylindrical cavity that perhaps single parabolic cylinder and plane constitute, and perhaps elliptical cylinder-shape cavity, perhaps other can make lens unit realize the random geometry structure of focusing.
The course of work of variable focal length X-ray compound lens of the present invention is; One end incident of the height maximum of sigmatron from lens body is passed along the orientation of air chamber in the lens body, and from the other end of lens body, a promptly highly minimum end-fire goes out.During air chamber in sigmatron scioptics main body, if short transverse mobile lens combination along air chamber, with the lens unit that makes sigmatron through different numbers, the lens unit of these different numbers forms the compound lens of different focal, thereby the effect that makes the sigmatron of outgoing be focused is different.Like this, light is equivalent to the lens combination through a focal length variations, has realized the purpose of varifocal.
Variable focal length X-ray compound lens of the present invention method for making comprise the following steps:
The first step, required mask during preparation photolithography lens main body;
Second step, required mask during preparation photoetching air chamber;
In the 3rd step, utilize the mask of first step preparation to prepare lens body;
In the 4th step, prepare air chamber with the lens body of the 3rd step preparation and the mask of second step preparation.
Mask step required during preparation photolithography lens main body is as follows:
(A) monocrystalline silicon piece is carried out cleaning;
(B) a surface spin at monocrystalline silicon piece applies one deck polyimide coating, plays the effect of setting off the metal absorber;
(C) monocrystalline silicon piece of coating polyimide is placed in the baking oven solidifies;
(D) growth of the polyimide surface after curing layer of metal is as first Seed Layer;
(E) on first Seed Layer, apply one deck PMMA (polymethylmethacrylate), then in PMMA superficial growth layer of metal as second Seed Layer;
(F) on second Seed Layer, apply one deck thick photoresist;
(G) use the reticle identical that photoresist is carried out extreme ultraviolet photolithographic, develop then, post bake with lens body front view shape;
(H) go on foot in the structure of finishing in the part electroforming metal layer that is not covered, as grenz ray photo etched mask absorber at (G) by photoresist;
(I) remove the photoresist of dash area and second Seed Layer below the photoresist, obtain the required metal mask of one deck PMMA under the photoetching;
(J), the PMMA layer is carried out the exposure of orthogonal projection formula grenz ray with the mask of being finished through step (I);
(K) behind the removal mask, the PMMA layer is developed;
(L) go on foot in the structure of finishing in the part electroforming metal layer that is not covered at (K) by PMMA;
(M) adopt no mask grenz ray exposure method to remove unexposed PMMA structure before, and remove first Seed Layer below the PMMA;
(N) photoetching and corrosion are carried out in another surface of the structure that step (M) is finished, promptly leave on monocrystalline silicon piece and the corresponding window of lens body front view shape, then finish the making of X-ray lithography mask for the first time;
Mask step required during preparation photoetching air chamber is as follows:
(A) when (O) repeating to prepare the photolithography lens main body in the required mask, (B), (C), (D), (E), (F) six steps;
(P) use with the reticle of air chamber shape of cross section complementation the thick photoresist in the step (O) is carried out the extreme ultraviolet photoetching, develop then, post bake;
(Q) in the structure that (P) step is finished in the part electroforming metal layer that is not covered by photoresist, as grenz ray photo etched mask absorber, remove dash area thick photoresist and under second Seed Layer, obtain the required metal mask of one deck PMMA under the photoetching;
(R), the PMMA layer is carried out the exposure of orthogonal projection formula grenz ray with the mask of being finished through step (Q);
(S) behind the removal mask, the PMMA layer is developed;
(T) in the structure that (S) step is finished in the part electroforming metal layer that is not covered, as the X-ray lithography mask absorber second time by PMMA;
(U) adopt no mask grenz ray exposure to remove unexposed PMMA structure before, and remove first Seed Layer below the PMMA;
(V) photoetching and corrosion are carried out in another surface of the structure that step (U) is finished, promptly leave the window with the complementation of air chamber shape of cross section on monocrystalline silicon piece, then finish the making of X-ray lithography mask for the second time;
Preparation lens body step is as follows:
(W) monocrystalline silicon piece of playing a supporting role is cleaned;
(X) set the PMMA of thickness at surface-coated one deck of monocrystalline silicon piece, and solidify;
The mask that step (N) when (Y) using preparation photolithography lens main body in the required mask completes carries out the X ray exposure, develops PMMA;
(Z) structure after will developing is put into the deionized water rinsing, obtains the lens body structure;
Preparation air chamber step is as follows:
(A ') fixes the structure that the step (Z) of making in the lens body is finished;
The mask that step (V) when (B ') uses preparation photoetching air chamber in the required mask completes carries out the X ray exposure, develops the required surface of the fixing structure of step (A ');
Structure after (C ') will develop is put into the deionized water rinsing, then finishes the making of variable focal length X-ray compound lens.
Advantage of the present invention is that lens have adopted three-dimensional produced by micro processing technology, makes compound lens have the machining precision height, focusing effect is good, can process advantages such as multiple geometric configuration and structure; Surfaceness of the present invention is low, has solved the big problem of bringing because of roughness is higher of scattering; The variable focal length X-ray focusing combined lens that adopts deep layer X-ray lithography fabrication techniques to go out has higher structure height and depth-to-width ratio, and the height dimension that has solved structure is little, and the interval of adjacent two air chambers is bigger, influences the problem of X-radiation transmitance.In addition, with deep layer X-ray lithography technology, technology is simple, the variable focal length X-ray focusing combined lens that can produce integrated, disposable Precision Machining moulding, not need precision to debug.
Description of drawings:
Fig. 1 is a variable focal length X-ray compound lens structural representation of the present invention.Among the figure, 1 is lens body, and 2 is air chamber.
Fig. 2 is the further improved structural representation of variable focal length X-ray compound lens of the present invention.1 is lens body, and 2 is air chamber, and 4 is two air chamber gaps.W is the wide of lens body 1, L=L
1+ L
2+ L
3+ L
4+ L
5Be the long limit of lens body 1, L
1, L
2, L
3, L
4, L
5Be respectively the length of bench of lens body 1, H=H
1+ H
2+ H
3+ H
4+ H
5For of lens body 1 is high, H
1, H
1+ H
2, H
1+ H
2+ H
3, H
1+ H
2+ H
3+ H
4, H
1+ H
2+ H
3+ H
4+ H
5Be respectively the bench height of lens body 1.The compound lens variable focal length is nL, wherein n＞1.
Fig. 3 is the structural representation of manufacturing process of the present invention photoetching for the first time.Among the figure, 5 is the upper surface of lens body 1, and 6 is the lower surface of lens body 1, and W also is the wide of each step, L
1And H
1The length and the height of corresponding first step, L
2And H
1+ H
2The length and the height of corresponding second step, L
3And H
1+ H
2+ H
3The length and the height of corresponding the 3rd step, L
4And H
1+ H
2+ H
3+ H
4The length and the height of corresponding the 4th step, L
5And H
1+ H
2+ H
3+ H
4+ H
5The length and the height of corresponding the 5th step.
Fig. 4 is a concave lens cellular construction synoptic diagram of the present invention.Among the figure, 3 is lens unit.
Fig. 5 is that the present invention makes the used reticle structural representation of lens body.
Fig. 6 is that the present invention makes the used reticle structural representation of lens unit structure (being air chamber).
Embodiment:
As shown in Figure 1, X ray varifocal compound lens of the present invention comprises spaced air chamber 2 on lens body 1 and the lens body 1.Gap between the adjacent vacant air cavity 2 forms concavees lens, and promptly lens unit 3.All lens units 3 have constituted lens combination together.
As shown in Figure 2, the further improved structure of X ray varifocal compound lens of the present invention is: be carved with an emptying air cavity 2 on lens body 1, adjacent vacant air cavity 2 has certain interval, all air chambers 2 are the double-paraboloid cylindrical structure, and its cross section is the figure that a pair of relative para-curve is formed, perhaps single parabolic cylinder structure, its cross section is a para-curve, perhaps elliptic cylinder structure, its cross section are oval, and perhaps other can realize the random geometry structure that focuses on.Like this, adjacent vacant air cavity 2 just forms concavees lens with the gap between them, and promptly lens unit 3.All lens units 3 have constituted lens combination together.By on short transverse, choosing suitable differing heights at rectangular parallelepiped, the length that these different vertical separations are suitable, the formation step-like structure formation of successively decreasing step by step lens body 1 (as shown in Figure 3).That is to say that lens body 1 is to be arranged in order by the rectangular parallelepiped that successively decreases highly step by step to form, each rectangular parallelepiped is as a step, and each rectangular parallelepiped width equates, equals the width of lens body 1.Adjacent two rectangular parallelepipeds overlap on by the wide and high face of forming, and align on the face of a long and wide composition therein.Align on the face of all long at one and the wide composition of all rectangular parallelepipeds, formation is step-like on the face of and wide composition long at another.
The focal length of the combination of lenses that lens unit 3 constitutes in each step of lens body 1 equates that lens unit 3 numbers in the step of differing heights can equate or not wait.Because each bench height difference makes the interior lens unit 3 of the different steps height difference of air chamber 2 highly just, thereby makes the compound lens focal length difference that different steps constitute.The pancratic size of combinations thereof lens is greater than the length of lens body.These lens zoom that can continuous vari-focus also can disperse.
As shown in Figure 1, variable focal length X-ray compound lens of the present invention comprises lens body 1, air chamber 2.Lens body 1 can be selected PMMA (polymethylmethacrylate) for use.The variable focal length size of lens body 1 can be selected the change in size scope of 5cm～5m greater than the length L of lens body 1.
As shown in Figure 3, the lens body 1 of variable focal length X-ray compound lens of the present invention is to form step in a side of rectangular parallelepiped to constitute.The width of each step is W, L
1And H
1The length and the height of corresponding first step, L
2And H
1+ H
2The length and the height of corresponding second step, L
3And H
1+ H
2+ H
3The length and the height of corresponding the 3rd step, L
4And H
1+ H
2+ H
3+ H
4The length and the height of corresponding the 4th step, L
5And H
1+ H
2+ H
3+ H
4+ H
5The length and the height of corresponding the 5th step.Between the upper surface 5 and lower surface 6 of lens body 1, have one group of vertical with upper and lower surface longitudinally air chamber 2.Between each air chamber 2 is equidistant.Have gap 4 between adjacent two air chambers 2, make two adjacent air chambers 2 form concave lens unit 3, as shown in Figure 4, these lens units 3 constitute compound lens.Compound lens focal length in different steps changes, and that is to say that the compound lens focal length changes in the different steps of lens body 1.
The length L of this lens body is got 0.5mm～20cm scope, and width W is got 2 μ m～3cm scope, height H=H
1+ H
2+ H
3+ H
4+ H
5Get 1mm～10mm scope.Lens unit 3 numbers are in 20～1000 scopes, and the dual paraboloid radius-of-curvature is got 1 μ m～1cm scope.The number of step is not limit, the length of each step and in the limited range of lens body, choosing arbitrarily highly as required, and the number of lens unit is also chosen arbitrarily from 1 to 1000 as required in each step.Thereby can realize continuous vari-focus or discrete zoom.
Manufacture craft process of the present invention is: at first make required aspects such as polyimide, metallic film and photoresist successively at the monocrystalline silicon sheet surface of playing a supporting role, through photoetching, electroforming is removed photoresist, steps such as windowing are finished the making of twice required mask of X-ray lithography.Primary making is an employed mask when obtaining the photolithography lens main body, and secondary making is an employed mask when obtaining the photoetching air chamber; Secondly, prepare X-ray resist at silicon chip surface, carry out X-ray lithography twice with the mask for preparing again, photoetching for the first time is in order to obtain the lens body structure, photoetching for the second time is to form the air chamber structure on lens body, thereby on main body, form the structure of lens unit, finally finish the making of X ray varifocal compound lens.
Concrete manufacturing process of the present invention is as follows:
The first step, required mask during preparation photolithography lens main body 1.
(A) silicon substrate adopts the monocrystalline silicon piece of (100) or (110) or (111) crystal face, and substrate cleaning step is:
1). remove organism such as greasy dirt with toluene, acetone, ethanol etc.;
2). boil the removal metallic ion with chloroazotic acid;
3). use the deionized water ultrasonic cleaning, absolute ethyl alcohol dehydration back oven dry;
(B) a surface spin at monocrystalline silicon piece applies the polyimide coating of a layer thickness between the 2-30 micron;
(C) monocrystalline silicon piece of coating polyimide is placed in the baking oven solidifies, polyimide paint solidification condition is relevant with thickness, adopt gradient heating during intensification, continue slowly to drop to room temperature behind the appropriate time after the arrival maximum temperature, embrittlement does not take place simultaneously to guarantee that polyimide fully solidifies;
(D) the polyimide surface evaporation one deck gold after curing is as first Seed Layer;
(E) on first Seed Layer, apply one deck PMMA, then at PMMA surface evaporation one deck gold as second Seed Layer.Here PMMA adopts modes such as a spin coating or a glue to carry out gluing;
(F) apply one deck thick photoresist on second Seed Layer, thick photoresist can be selected novolac-DNQ photoresist etc. for use;
(G) use reticle (dash area is light tight) as shown in Figure 5 that photoresist is carried out extreme ultraviolet photolithographic, development, post bake, obtain and structure (dash area is a photoresist) as shown in Figure 5;
(H) go on foot in the structure of finishing in the part electroforming gold that is not covered, as grenz ray photo etched mask absorber at (G) by photoresist.Electroforming negative electrode seed layer materials can be selected metal materials such as gold for use;
(I) remove the photoresist of dash area and second Seed Layer below the photoresist, obtain the required gold mast of one deck PMMA under the photoetching.Remove thick photoresist with acetone or special-purpose glue-dispenser, the metal level below dry etching or wet etching removal photoresist;
(J), the PMMA layer is carried out the exposure of orthogonal projection formula grenz ray with the gold mast of being finished through step (I);
(K) behind the gold mast and second Seed Layer of removal photoetching PMMA, the PMMA layer is developed.Develop and adopt 25 ℃ GG toning system;
(L) go on foot in the structure of finishing in the part electroforming gold layer that is not covered at (K) by PMMA;
(M) adopt the photoetching of no mask grenz ray exposure method, the removal unexposed PMMA before that develops, and first Seed Layer below dry etching or wet etching removal PMMA.The conditions of exposure of no mask grenz ray exposure is identical with the conditions of exposure that mask exposure is arranged;
(N) photoetching and corrosion are carried out in another surface of the structure that step (M) is finished, promptly with wet etching or be dry-etched in and leave window on the monocrystalline silicon piece, then finish the making of X-ray lithography mask for the first time.
Second step, required mask during preparation photoetching air chamber.
(O) repeat (A), (B), (C), (D), (E), (F) six steps;
(P) use reticle (dash area is light tight) as shown in Figure 6 that the thick photoresist in the step (O) is carried out extreme ultraviolet photoetching, development, post bake, obtain the structure identical (dash area is a photoresist) with Fig. 6;
(Q) in the structure finished of (P) step in the part electroforming gold layer that is not covered by photoresist, as grenz ray photo etched mask absorber, electroforming negative electrode seed layer materials can be selected metal materials such as gold for use.Remove the thick photoresist of dash area with acetone or special-purpose glue-dispenser, remove second Seed Layer below the photoresist, obtain the gold mast of one deck PMMA under the photoetching with dry etching or wet etching;
(R), the PMMA layer is carried out the exposure of orthogonal projection formula grenz ray with the mask of being finished through step (Q);
(S) behind the gold mast and second Seed Layer of removal photoetching PMMA, the PMMA layer is developed.Develop and adopt 25 ℃ GG toning system;
(T) go on foot in the structure of finishing in the part electroforming gold that is not covered, as the X-ray lithography mask absorber second time at (S) by PMMA;
(U) adopt the photoetching of no mask grenz ray exposure method, the removal unexposed PMMA before that develops, and first Seed Layer below dry etching or wet etching removal PMMA.The conditions of exposure of no mask grenz ray exposure is identical with the conditions of exposure that mask exposure is arranged;
(V) photoetching and corrosion are carried out in another surface of the structure that step (U) is finished, promptly with wet etching or be dry-etched in and leave window on the monocrystalline silicon piece, then finish the making of X-ray lithography mask for the second time.
The 3rd step, the preparation lens body.
(W) silicon substrate adopts the monocrystalline silicon piece of (100) or (110) or (111) crystal face, and substrate cleaning step is:
1). remove organism such as greasy dirt with toluene, acetone, ethanol etc.;
2). boil the removal metallic ion with chloroazotic acid;
3). use the deionized water ultrasonic cleaning, absolute ethyl alcohol dehydration back oven dry;
(X) monocrystalline silicon piece surface-coated is set the PMMA of thickness, and solidifies.The PMMA of silicon chip surface adopts modes such as a spin coating or a glue to carry out gluing;
(Y) mask that uses step (N) to make carries out the X ray exposure, develops PMMA, develops and adopts 25 ℃ GG toning system;
(Z) structure after will developing is put into the deionized water rinsing, obtains the lens body structure.
The 4th step, the preparation air chamber.
(A ') fixes the structure that step (Z) is finished;
The mask that (B ') uses step (V) to complete carries out the X ray exposure, develops fixing lens body 1 upper surface 6 of step (A '), develops and adopts 25 ℃ GG toning system;
Structure after (C ') will develop is put into the deionized water rinsing, then finishes a kind of making of variable focal length X-ray compound lens.
Claims (8)
1. a variable focal length X-ray compound lens comprises upward spaced air chamber (2) of lens body (1) and lens body (1), it is characterized in that described lens body (1) material adopts PMMA.
2. variable focal length X-ray compound lens according to claim 1 is characterized in that described lens body (1) is a stepped appearance, comprises at least one air chamber (2) in each step.
3. according to claim 1 or 2 any described variable focal length X-ray compound lens of claim, it is characterized in that the cylindrical cavity that described air chamber (2) constitutes for the double-paraboloid cylinder, the cylindrical cavity that perhaps single parabolic cylinder and plane constitute, perhaps elliptical cylinder-shape cavity.
4. the method for making of the described variable focal length X-ray compound lens of claim 1 is characterized in that comprising the following steps:
The first step, required mask during preparation photolithography lens main body;
Second step, required mask during preparation photoetching air chamber;
The 3rd step, the mask fabrication lens body that utilizes the first step to prepare;
In the 4th step, the lens body of making of the 3rd step and second goes on foot the mask fabrication air chamber for preparing.
5. the method for making of variable focal length X-ray compound lens according to claim 4, required mask comprises the following steps: when it is characterized in that described preparation photolithography lens main body
(A) monocrystalline silicon piece is carried out cleaning;
(B) a surface spin at monocrystalline silicon piece applies one deck polyimide coating;
(C) monocrystalline silicon piece of coating polyimide is placed in the baking oven solidifies;
(D) growth of the polyimide surface after curing layer of metal is as first Seed Layer;
(E) on first Seed Layer, apply one deck PMMA, then in PMMA superficial growth layer of metal as second Seed Layer;
(F) on second Seed Layer, apply one deck thick photoresist;
(G) use the reticle identical that photoresist is carried out extreme ultraviolet photolithographic, develop then, post bake with lens body front view shape;
(H) go on foot in the structure of finishing in the part electroforming metal layer that is not covered, as grenz ray photo etched mask absorber at (G) by photoresist;
(I) remove the photoresist of dash area and second Seed Layer below the photoresist, obtain the required metal mask of one deck PMMA under the photoetching;
(J), the PMMA layer is carried out the exposure of orthogonal projection formula grenz ray with the mask of being finished through step (I);
(K) behind the removal mask, the PMMA layer is developed;
(L) go on foot in the structure of finishing in the part electroforming metal layer that is not covered at (K) by PMMA;
(M) adopt no mask grenz ray exposure method to remove unexposed PMMA structure before, and remove first Seed Layer below the PMMA;
(N) photoetching and corrosion are carried out in another surface of the structure that step (M) is finished, promptly leave on monocrystalline silicon piece and the corresponding window of lens body front view shape.
6. the method for making of variable focal length X-ray compound lens according to claim 4, required mask comprises the following steps: when it is characterized in that described preparation photoetching air chamber
(A) when (O) repeating to prepare the photolithography lens main body in the required mask, (B), (C), (D), (E), (F) six steps;
(P) use with the reticle of air chamber shape of cross section complementation the thick photoresist in the step (O) is carried out the extreme ultraviolet photoetching, develop then, post bake;
(Q) in the structure that (P) step is finished in the part electroforming metal layer that is not covered by photoresist, as grenz ray photo etched mask absorber, remove dash area thick photoresist and under second Seed Layer, obtain the required metal mask of one deck PMMA under the photoetching;
(R), the PMMA layer is carried out the exposure of orthogonal projection formula grenz ray with the mask of being finished through step (Q);
(S) behind the removal mask, the PMMA layer is developed;
(T) in the structure that (S) step is finished in the part electroforming metal layer that is not covered, as the X-ray lithography mask absorber second time by PMMA;
(U) adopt no mask grenz ray exposure to remove unexposed PMMA structure before, and remove first Seed Layer below the PMMA;
(V) photoetching and corrosion are carried out in another surface of the structure that step (U) is finished, promptly leave the window with the complementation of air chamber shape of cross section on monocrystalline silicon piece.
7. the method for making of variable focal length X-ray compound lens according to claim 4 is characterized in that described making lens body comprises the following steps:
(W) monocrystalline silicon piece of playing a supporting role is cleaned;
(X) set the PMMA of thickness at surface-coated one deck of monocrystalline silicon piece, and solidify;
The mask that step (N) when (Y) using preparation photolithography lens main body in the required mask completes carries out the X ray exposure, develops PMMA;
(Z) structure after will developing is put into the deionized water rinsing, obtains the lens body structure.
8. the method for making of variable focal length X-ray compound lens according to claim 4 is characterized in that described making air chamber comprises the following steps:
(A ') fixes the structure that the step (Z) of making in the lens body is finished;
The mask that step (V) when (B ') uses preparation photoetching air chamber in the required mask completes carries out the X ray exposure, develops the required surface of the fixing structure of step (A ');
Structure after (C ') will develop is put into the deionized water rinsing, finishes the making of variable focal length X-ray compound lens.
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| CN103454069A (en) * | 2013-08-20 | 2013-12-18 | 浙江工业大学 | Device for testing focusing performance of X-ray compound refractive lens |
| CN105022235A (en) * | 2015-07-15 | 2015-11-04 | 中国科学院长春光学精密机械与物理研究所 | Manufacture method of extreme ultraviolet source collecting mirror with half-wave zone structure |
| CN105572151A (en) * | 2016-01-28 | 2016-05-11 | 长治清华机械厂 | Determination method for simultaneous radiographic inspection of transillumination parameters of materials with different thicknesses |
| CN105699402A (en) * | 2016-01-28 | 2016-06-22 | 长治清华机械厂 | Oriented X ray combined transillumination method of materials with different thicknesses |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6091798A (en) * | 1997-09-23 | 2000-07-18 | The Regents Of The University Of California | Compound refractive X-ray lens |
| US6718009B1 (en) * | 2002-09-13 | 2004-04-06 | The University Of Chicago | Method of making of compound x-ray lenses and variable focus x-ray lens assembly |
| CN1170459C (en) * | 2002-09-28 | 2004-10-06 | 中国科学院长春光学精密机械与物理研究所 | Organic material high-energy X-ray focusing combined lens and its preparation method |
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2007
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| CN102136305A (en) * | 2011-02-17 | 2011-07-27 | 浙江工业大学 | Embedded bidimensional focused X-ray combined refraction lens |
| CN102136305B (en) * | 2011-02-17 | 2013-04-17 | 浙江工业大学 | Embedded bidimensional focused X-ray combined refraction lens |
| CN103454069A (en) * | 2013-08-20 | 2013-12-18 | 浙江工业大学 | Device for testing focusing performance of X-ray compound refractive lens |
| CN103454069B (en) * | 2013-08-20 | 2016-04-13 | 浙江工业大学 | X-ray combination refractor focusing performance proving installation |
| CN105022235A (en) * | 2015-07-15 | 2015-11-04 | 中国科学院长春光学精密机械与物理研究所 | Manufacture method of extreme ultraviolet source collecting mirror with half-wave zone structure |
| CN105572151A (en) * | 2016-01-28 | 2016-05-11 | 长治清华机械厂 | Determination method for simultaneous radiographic inspection of transillumination parameters of materials with different thicknesses |
| CN105699402A (en) * | 2016-01-28 | 2016-06-22 | 长治清华机械厂 | Oriented X ray combined transillumination method of materials with different thicknesses |
| CN105572151B (en) * | 2016-01-28 | 2019-10-25 | 山西航天清华装备有限责任公司 | Same ray detection different-thickness material transmitting illumination parameter determines method |
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