CN101105465A - Sample carrier for focused ion beam microscope - Google Patents
Sample carrier for focused ion beam microscope Download PDFInfo
- Publication number
- CN101105465A CN101105465A CNA2006100289464A CN200610028946A CN101105465A CN 101105465 A CN101105465 A CN 101105465A CN A2006100289464 A CNA2006100289464 A CN A2006100289464A CN 200610028946 A CN200610028946 A CN 200610028946A CN 101105465 A CN101105465 A CN 101105465A
- Authority
- CN
- China
- Prior art keywords
- sample
- ion beam
- beam microscope
- focused ion
- platform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Sampling And Sample Adjustment (AREA)
Abstract
The invention discloses a sample carrier for the focusing ion beam microscope, which comprises a platform and a metal foundation which is used to support the platform. A rectangular groove is provided on the surface of the platform. At least one end surface of the rectangular groove is provided with adjustable and movable dead axes, one end of the dead axes is connected with the metal filling piece of a fixed sample. The invention can effectively avoid the damage to the sample when selecting the sample and the operational area of the sample can be increased.
Description
Technical field
The present invention relates to the semiconductor failure analysis field, be meant a kind of sample carrier that is used for focused ion beam microscope especially.
Background technology
Focused ion beam microscope (FIB Focus Ion Beam Microscope) is a kind of ion beam cutting processing instrument, and traditional FIB has the cutting of sample section and makes function.At present focused ion beam microscope be widely used in the semiconductor electronic industry and IC industrial, its main application has: the cutting of the small section of (1) semi-conductor chip is made; (2) modification of chip electronic loop; (3) preparation of example of transmission electron microscope.
The principle of work of FIB is effectively to control by a kind of heavy metal ion bump sample to remove material.It utilizes energetic ion incident solid sample, and with atomic nucleus and the extranulear electron generation elasticity or the inelastic scattering of sample, excited sample produces secondary electron, and by electronic detectors, received signal forms image and control effectively.
FIB sample to be processed need be fixed on the enterprising line operate of metal porous sample stage (Multi-stubholder) of its standard.Usually use copper glue, aluminium glue or carbon paste that sample is fixed, but but will certainly reduce the opereating specification of sample like this, the viscosity owing to glue can cause certain misoperation to cause sample to be damaged when taking off sample sometimes.The effect of metal-to-metal adhesive not only is fixed sample, and it also has conducting function simultaneously, makes sample and the conducting of metal sample platform.
Therefore, in this technical field, need a kind of sample carrier that is used for focused ion beam microscope, adopt a kind of specific stationary installation, but increase the operations area of sample, and reduce damage as far as possible sample.
Summary of the invention
The technical problem to be solved in the present invention provides a kind of sample carrier that is used for focused ion beam microscope, but it can increase the operations area of sample, reduces the damage to sample as far as possible.
For solving the problems of the technologies described above, the present invention is used for the sample carrier of focused ion beam microscope, the metab that it comprises platform and supports this platform, this platform surface offers a rectangular slot, at least one end face of this rectangular slot is provided with the stationary shaft that scalable moves, and an end of this stationary shaft connects the metallic gasket of a fixed sample.
Described metab is the right cylinder of diameter 3mm, and height is smaller or equal to 5mm.
Described whole carrier is a metal material.
After adopting said structure, be used for the sample carrier of focused ion beam microscope, in the time of can avoiding or reduce sampling effectively to the damage of sample, but increase the operations area of sample.
Description of drawings
The present invention is further detailed explanation below in conjunction with accompanying drawing and embodiment.
Fig. 1 is the vertical view of the sample carrier of focused ion beam microscope of the present invention;
Fig. 2 is the cut-open view of the sample carrier of focused ion beam microscope of the present invention.
Embodiment
The present invention is applicable to the silicon chip sample of two kinds of conventional thickness 0.73mm and 0.35mm.
As Fig. 1, shown in 2, this carrier comprises metab 1 and platform 2, and metab 1 is diameter 3mm, highly is the right cylinder of 3mm that this metab 1 supports this platform 2.Platform 2 highly is 1.5mm, the rectangular slot 4 that it is 1mm that the surface offers a degree of depth, and at least one end face of this rectangular slot is provided with the stationary shaft 3 that scalable moves, and an end of axle connects metallic gasket 5, the wide groove width that equals of this metallic gasket 5 in the rectangular slot 4.
During fixed sample, at first metab 1 is fixed on the sample stage of standard, secondly,, reaches the purpose of the size of this rectangular slot 4 of control, sample is fixed by regulating stationary shaft 3 and then adjusting the position of metallic gasket 5 in rectangular slot 4.
Because on the porous sample stage many diameters being arranged is the regularly arranged hole of 3mm, therefore, metab 1 diameter is designed to 3mm, stationary installation directly can be fixed on the porous standard model platform like this, and in order to make the sample conduction, whole carrier uses metal material.
Described stationary shaft 3 can adopt bolt to realize.
Claims (3)
1. sample carrier that is used for focused ion beam microscope, it is characterized in that, the metab that comprises platform and this platform of support, this platform surface offers a rectangular slot, at least one end face of this rectangular slot is provided with the stationary shaft that scalable moves, and an end of this stationary shaft connects the metallic gasket of a fixed sample.
2. the sample carrier that is used for focused ion beam microscope as claimed in claim 1 is characterized in that, this metab is the cylinder of diameter 3mm, and height is smaller or equal to 5mm.
3. the sample carrier that is used for focused ion beam microscope as claimed in claim 1 is characterized in that, whole carrier is a metal material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006100289464A CN101105465A (en) | 2006-07-14 | 2006-07-14 | Sample carrier for focused ion beam microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2006100289464A CN101105465A (en) | 2006-07-14 | 2006-07-14 | Sample carrier for focused ion beam microscope |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101105465A true CN101105465A (en) | 2008-01-16 |
Family
ID=38999459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006100289464A Pending CN101105465A (en) | 2006-07-14 | 2006-07-14 | Sample carrier for focused ion beam microscope |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101105465A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103674841A (en) * | 2013-12-09 | 2014-03-26 | 中国电子科技集团公司第十一研究所 | Device for bearing tellurium, zinc, and cadmium sample, and method for detecting Zn component in tellurium, zinc, and cadmium sample |
| CN106596603A (en) * | 2016-11-22 | 2017-04-26 | 中国电子科技集团公司第十研究所 | Sample carrying device for testing X-ray topography image of semiconductor wafer and test method |
| CN108227171A (en) * | 2018-02-06 | 2018-06-29 | 重庆熵臻科技有限公司 | A kind of optical instrument microscope of adjustable apparatus for placing size |
| CN109243951A (en) * | 2018-08-28 | 2019-01-18 | 南京理工大学 | One kind being suitable for three-dimensional atom probe and focused ion beam double-beam system sample stage |
| CN109540947A (en) * | 2018-12-21 | 2019-03-29 | 北京科技大学 | A method of preparing FIB three-dimensionalreconstruction " nose " sample |
-
2006
- 2006-07-14 CN CNA2006100289464A patent/CN101105465A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103674841A (en) * | 2013-12-09 | 2014-03-26 | 中国电子科技集团公司第十一研究所 | Device for bearing tellurium, zinc, and cadmium sample, and method for detecting Zn component in tellurium, zinc, and cadmium sample |
| CN106596603A (en) * | 2016-11-22 | 2017-04-26 | 中国电子科技集团公司第十研究所 | Sample carrying device for testing X-ray topography image of semiconductor wafer and test method |
| CN108227171A (en) * | 2018-02-06 | 2018-06-29 | 重庆熵臻科技有限公司 | A kind of optical instrument microscope of adjustable apparatus for placing size |
| CN108227171B (en) * | 2018-02-06 | 2020-10-16 | 江苏锐精光电研究院有限公司 | Microscope for optical instrument of adjustable mechanism size of placing |
| CN109243951A (en) * | 2018-08-28 | 2019-01-18 | 南京理工大学 | One kind being suitable for three-dimensional atom probe and focused ion beam double-beam system sample stage |
| CN109243951B (en) * | 2018-08-28 | 2020-12-18 | 南京理工大学 | Sample table suitable for three-dimensional atom probe and focused ion beam dual-beam system |
| CN109540947A (en) * | 2018-12-21 | 2019-03-29 | 北京科技大学 | A method of preparing FIB three-dimensionalreconstruction " nose " sample |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101105465A (en) | Sample carrier for focused ion beam microscope | |
| DE102010049326B4 (en) | Electrical connection device and test system for use thereof | |
| CN105150224A (en) | Dual clamping mechanical catching hand device | |
| US8955735B2 (en) | Method for enhancing the yield rate of ball implanting of a substrate of an integrated circuit | |
| CN103659366A (en) | Positioning tool for drilling | |
| CN102183724A (en) | A chip failure analysis method based on measuring voltage effect | |
| KR20080114679A (en) | Foup door positioning device for foup opener | |
| CN105269483A (en) | Linkage type clamping mechanism | |
| CN103753125A (en) | Manufacturing process of electronic welding part made of material poor in welding | |
| US9522823B2 (en) | Apparatus for cutting transmission electron microscope micro-grids | |
| US9878510B2 (en) | Pressing apparatus and stamp press apparatus | |
| CN101644640B (en) | Method and apparatus for rapid sample preparation in a focused ion beam microscope | |
| CN102749347A (en) | Method for enhancing success rate of extracting transmission electron microscope sample prepared by focused ion beam | |
| CN101191776A (en) | Focused ion beam microscope sample stage and method of use thereof | |
| EP2446229B1 (en) | Scanning unit of a position measuring device | |
| CN204903311U (en) | A device for bending property test of ultra -thin plate welded joint smaller part footpath | |
| RU2299117C1 (en) | Indexing table | |
| Kisiel et al. | Development of assembly techniques for connection of AlGaN/GaN/Si chips to DBC substrate | |
| CN210572230U (en) | Conversion target sleeve for micro-beam analysis non-target installation | |
| CN207869602U (en) | Bridge heap positioning tool | |
| CN109342475B (en) | FIB sample holder | |
| CN209364184U (en) | One kind rises pin type pump housing fixing tool | |
| EP1626449A3 (en) | Contact structure for a semiconductor material and a method for providing such structure | |
| CN104708410A (en) | Application method of high-precision inclined surface hole drilling positioning fixture | |
| CN105345497A (en) | Linkage type floating clamp |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20080116 |