CN101093115A - Nickel-chromium heat collection film for conversion of light and heat of solar energy - Google Patents
Nickel-chromium heat collection film for conversion of light and heat of solar energy Download PDFInfo
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- CN101093115A CN101093115A CNA2007100763953A CN200710076395A CN101093115A CN 101093115 A CN101093115 A CN 101093115A CN A2007100763953 A CNA2007100763953 A CN A2007100763953A CN 200710076395 A CN200710076395 A CN 200710076395A CN 101093115 A CN101093115 A CN 101093115A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
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- Y02E10/40—Solar thermal energy, e.g. solar towers
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Abstract
This invention discloses a NiCr heat-collecting film of solar energy light-heat conversion and its manufacturing method, in which an infrared reflection layer, a first absorption film layer, a second absorption film layer and a reflection-reducing film layer are set from top to bottom above a chip foil, and the infrared reflection layer is a film layer of deposited metal-state copper, the two absorption layers are NiCrOxNy alloy, the reflection-reduction layer is a dielectric state NiCrOx alloy film plated with a roll-to-roll magnetic control reaction sputter coater, a chip foil roll is cleaned and dried and charged with working gas and is plated one by one under vacuum and heat condition.
Description
Technical field the present invention relates to a kind of solar energy heating film and manufacture method thereof, more particularly, relates to a kind of solar energy optical-thermal conversion nickel chromium triangle thermal-arrest film and manufacture method thereof.
Background technology in the prior art, directly utilize the thermal-arrest series products of solar energy optical-thermal conversion of productions, mainly contain following two classes: the one, glass-vacuum tube heat collection type: be the interior pipe that adopts the double-layer glass tube that is nested together, its inwall deposits solar energy optical-thermal Transform Sets hotting mask, after sunlight shines on the thermal-arrest film through transparent outer tube, the photo-thermal conversion makes the thermal-arrest film obtain the heat temperature and raises, and the heat on the thermal-arrest film is taken away in interior pipe water flowing, finishes heat exchange.Its shortcoming is that, when not leading to water dry combustion method bombing frangible and fragile because of glass tube, collecting efficiency are relatively low, service life is relatively short, can not makes and the harmonious abnormity that cooperates of building construction; The 2nd, common metal film flat heat collecting type: on the metal foil film substrate, spraying or brushing thermal-arrest rete, solar radiation is behind the thermal-arrest rete, the photo-thermal conversion makes the thermal-arrest rete obtain heat energy, pass to substrate paper tinsel film again, the conduit temperature of substrate paper tinsel film and welding on it is raise, and the water that feeds in the water pipe is taken away heat, finishes heat exchange.Its shortcoming is that infrared emittance is higher, and solar absorptance is lower, thereby collecting efficiency is relatively low.
It is a kind of lower, higher at the infrared band reflectivity for the visible and near infrared band reflectivity in the sunlight that summary of the invention the object of the invention is to provide, and solar radiation is had the solar energy optical-thermal conversion nickel chromium triangle thermal-arrest film and the manufacture method thereof of good selection absorption characteristic.
In order to achieve the above object, the invention provides following technical scheme: develop a kind of solar energy optical-thermal conversion nickel chromium triangle thermal-arrest film, with metal copper foil film or aluminium foil film is substrate paper tinsel film, and this thermal-arrest film has infrared external reflection rete 2, first absorbing membranous layer 3, second absorbing membranous layer 4 and antireflection film layer 5 from bottom to top successively above substrate paper tinsel film 1.Described infrared external reflection rete 2 is the copper thin layers of plated metal attitude, and first absorbing membranous layer 3, second absorbing membranous layer 4 all are oxygen nitrogen nichrome NiCrO
xN
yThin layer, antireflection film layer 5 are dielectric attitude oxygen nichrome NiCrO
xThin layer, each rete deposit and are laminated in one on substrate paper tinsel film 1.
Nickel chromium triangle thermal-arrest film of the present invention, the thickness range of substrate paper tinsel film 1 and each rete can be respectively: substrate paper tinsel film 1 is 0.1～0.3mm, and infrared external reflection rete 2 is 130～160nm, and first absorbing membranous layer 3 is 30～40nm, second absorbing membranous layer 4 is 10～20nm, and antireflection film layer 5 is 40～60nm.
Each rete of nickel chromium triangle thermal-arrest film of the present invention specifies as follows, and infrared external reflection rete 2 is the copper rete of plated metal attitude, and its effect is to guarantee that the thermal-arrest film has enough low infrared emittance, prevents that the heat energy on the substrate paper tinsel film from leaking; First absorbing membranous layer 3, second absorbing membranous layer 4 are the oxygen nitrogen nichrome (NiCrO of sputtering sedimentation state
xN
y) thin layer, absorbed layer can reduce the reflectivity to the light of visible light and near infrared band, can absorb solar energy to greatest extent, it promptly is the solar absorptance height, simultaneously, absorbed layer can improve the light reflectance to infrared band, promptly is that infrared emittance is low, can prevent that the heat energy on the substrate paper tinsel film from leaking; The material of antireflection film layer 5 is transparent dielectric attitude oxygen nichrome (NiCrO) thin layer, and its effect is the reflex that reduces visible light and near infrared band light as much as possible, guarantees that solar energy as much as possible is converted into heat energy.
The manufacture method of nickel chromium triangle thermal-arrest film of the present invention, with volume to volume formula reactive magnetron sputtering coating machine plated film, this technical process is as follows: (1) substrate paper tinsel film coiled strip cleans and oven dry: with substrate paper tinsel film coiled strip, with five groove ultrasonic cleaning drying device continuous wash and the oven dry of volume to volume formula; (2) being coated with of plated film layer: A, elder generation use volume to volume form reactive magnetron sputtering coating machine with the tensioning of substrate paper tinsel film coiled strip, and the operating room of B, coating machine is evacuated to 2.0 * 10 then
-3Pa～5.0 * 10
-3Pa; the deep fat that adds that will lead to central cylinder simultaneously is warming up to 110～160 ℃; C again; each sputtering chamber feeds working gas: feeding flow to first sputtering chamber is the argon gas of 100～800ml/min; be respectively the mist of 10～180ml/min and 100～400ml/min to the second sputtering chamber aerating oxygen and nitrogen flow; be respectively the mist of 30～240ml/min and 60～300ml/min to the 3rd sputtering chamber aerating oxygen and nitrogen flow; feeding flow to the 4th sputtering chamber is the oxygen of 40～300ml/min; D then; the sputtering current of first sputtering chamber is transferred to 5～30A; sputtering voltage transfers to 0.85～2.5kV; the sputtering pressure of working gas is 0.2Pa～0.8Pa; the sputtering current of second sputtering chamber is transferred to 8～50A; sputtering voltage transfers to 0.30～1.5kV; the sputtering pressure of working gas is 0.2Pa～0.8Pa; the sputtering current of the 3rd sputtering chamber is transferred to 8～50A; sputtering voltage transfers to 0.30～1.5kV; the sputtering pressure of working gas is 0.2Pa～0.8Pa; the sputtering current of the 4th sputtering chamber is transferred to 8～60A; sputtering voltage transfers to 0.50～2.2kV; the sputtering pressure of working gas is 0.2Pa～0.8Pa; follow E; start volume to volume substrate paper tinsel film coiled strip locomotive function; substrate paper tinsel film coiled strip is that 200～600mm/min constant speed moves successively by each sputtering chamber by linear velocity; carry out infrared reflecting layer (2) respectively; first absorbed layer (3); the sputtering sedimentation of second absorbed layer (4) and antireflection layer (5); shut down last F; coiled strip is cut into required size.
Substrate paper tinsel film coiled strip of the present invention cleans and drying technology is a prior art, idiographic flow with volume to volume formula five groove ultrasonic cleaning drying device continuous wash and oven dry is described as follows: in (1) first groove, carry out ultrasonic wave, neutral detergent rinsing for the first time: the operating temperature of rinsing solution is 40 ℃～60 ℃, the volume proportion of industry water and neutral detergent is 100: 4, according to cleaning, the oil-containing situation of substrate paper tinsel film supplied materials, the proportioning of the neutral detergent that is blended into can be adjusted between 100: 1～100: 8; Hyperacoustic power is 3KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 800～1500mm/min; Substrate paper tinsel film moves with same line speed in following each groove and infrared drying baker; In (2) second grooves, ultrasonic wave, neutral detergent rinsing for the second time: the operating temperature of rinsing solution is 40 ℃～60 ℃, the volume proportion of industry water and neutral detergent is 100: 2, according to cleaning, the oil-containing situation of substrate paper tinsel film supplied materials, the proportioning of the neutral detergent that is blended into can be adjusted between 100: 1～100: 5; Hyperacoustic power is 3KW, and frequency is 20Hz; In (3) three-flutes, the industry water rinsing, the industry water operating temperature is 20 ℃～40 ℃, and hyperacoustic power is 3KW, and frequency is 20Hz; In (4) the 4th grooves, rinsed with deionized water, deionized water operating temperature are 20 ℃～40 ℃, and hyperacoustic power is 3KW, and frequency is 20Hz; In (5) the 5th grooves, rinsed with deionized water, deionized water operating temperature are room temperature; (6) infrared oven dry is 2～3 minutes.Described neutral detergent is the commercially available detergent that is easy to buy on the market, is illustrated in an embodiment.
Compared with prior art, the present invention has following tangible advantage: 1, technique effect is good: solar energy optical-thermal conversion nickel chromium triangle (Ni-Cr) thermal-arrest film of the present invention, because possess infrared reflecting layer arranged, selective absorption films such as biabsorption layer and antireflection layer, low for the visible and near infrared band reflectivity of sunlight is that solar absorptance is higher, higher at the infrared band reflectivity is that infrared emittance is lower, thereby collecting efficiency is higher relatively.And the inner no vacuum environment of product is not afraid of gas leakage, and service life is longer relatively, is difficult for broken the damage, can be made into abnormity such as circular arc, ball face and use; 2, the present invention controls substrate paper tinsel film moving in sputter procedure in volume to volume mode (Roll to Roll), can on very long substrate paper tinsel film, carry out magnetron sputtering plating equably with fast speeds, be convenient to large-scale production, in reactive sputtering process, by changing the kind of metal targets and working gas, adjusting working gas flow, sputtering current are the size of sputtering power and the linear velocity that substrate paper tinsel film moves, reach the while in coating machine, deposition generates unlike material, the metallic state of different-thickness or the thermal-arrest rete of dielectric attitude; 3, solar energy optical-thermal conversion nickel chromium triangle (Ni-Cr) thermal-arrest film of the present invention is of many uses, can be used as the heat collecting element of type products such as plate solar water heater, special-shaped special-shaped solar water heater, solar energy water warmer; 4, the monoblock type solar energy balcony water heater that adopts the present invention to make, environmental protection and energy saving, as the part of building balcony, the scope of application is wide.
Be description of drawings of the present invention below the description of drawings:
Fig. 1 is the structural representation of solar energy optical-thermal conversion nickel chromium triangle (Ni-Cr) thermal-arrest film;
Fig. 2 is a volume to volume form reactive magnetron sputtering coating machine operation principle schematic diagram;
Fig. 3 is five groove ultrasonic cleaning drying device structural representations of volume to volume form.
In Fig. 1～3, the 1st, substrate paper tinsel film, the 2nd, the infrared external reflection rete, 3 is first absorbing membranous layers, 4 is second absorbing membranous layers, the 5th, and antireflection film layer, the 11st, driven pulley, the 12nd, material loading section, 13,14th, neutral sink, the 15th, industry water sink, 16, the 17th, deionized water sink, the 18th, infrared drying baker, the 19th, blanking section, the 20th, driving wheel, the 21st, the air knife that dewaters, the 22nd, every dirty plate, 23 ultrasonic vibration plates, the 24th, supersonic generator, 25 infrared electric heating plates.
With reference to Fig. 1, above substrate paper tinsel film 1, have infrared external reflection rete 2, first absorbing membranous layer 3, second absorbing membranous layer 4 and antireflection film layer 5 from bottom to top successively, each rete deposits and is laminated in one on substrate paper tinsel film 1.
With reference to Fig. 2; with volume to volume formula reactive magnetron sputtering coating machine plated film; technical process is as follows: the coiled strip of the substrate paper tinsel film 1 that will clean and dry passes through cylinder; through the regulating wheel tensioning; vacuumize unit and vacuumize this moment; the while central cylinder; the coiled strip of substrate paper tinsel film 1 is along the central cylinder uniform motion; successively feed argon gas to first sputtering chamber; to second sputtering chamber aerating oxygen and the nitrogen; to the 3rd sputtering chamber aerating oxygen and nitrogen; to the 4th sputtering chamber aerating oxygen, carry out infrared reflecting layer 2 respectively; first absorbed layer 3; the sputtering sedimentation of second absorbed layer 4 and antireflection layer 5 is shut down; last blanking is also with the coiled strip blanking of film plating substrate paper tinsel film 1, and coiled strip is cut into required size.
With reference to Fig. 3, idiographic flow with volume to volume formula five groove ultrasonic cleaning drying device continuous wash and oven dry is described as follows: the coiled strip of substrate paper tinsel film 1 enters 12 through driven pulley and successively enters neutral sink 13 by material loading section 12,14 is first groove, second groove, carry out ultrasonic wave twice, the neutral detergent rinsing, enter the i.e. three-flute of industry water sink 15 then, carry out the industry water rinsing, enter deionized water sink 16 formerly, 17 is the 4th groove, the 5th groove, go into rinsed with deionized water, then enter infrared drying baker 18 and carry out infrared oven dry, entering blanking section 19, send to plated film by driving wheel 20, in preceding four sinks, have every dirty plate 22, ultrasonic vibration plate 23, there is supersonic generator 24 preceding four sinks below, and there is infrared electric heating plate 25 infrared drying baker 18 belows.
By specific embodiment the present invention is carried out more detailed description below the specific embodiment:
The manufacturing of solar energy optical-thermal conversion nickel chromium triangle (Ni-Cr) the thermal-arrest film of embodiment 1. 300mm copper bases
(1) selecting width for use is 300mm, thickness is 0.2mm, length is the coiled strip copper foil membrane of 200m is changed nickel chromium triangle (Ni-Cr) thermal-arrest film as solar energy optical-thermal deposition substrate, at first it is placed on the material loading position of five groove ultrasonic cleaning drying devices of volume to volume form, stub bar is guided into the blanking position, start the machine, substrate is cleaned, oven dry is handled, and cleans, the technological process of oven dry is: ultrasonic wave for the first time, neutral detergent rinsing---ultrasonic wave for the second time, neutral detergent rinsing---industry water rinsing---the infrared oven dry of rinsed with deionized water---rinsed with deionized water---.Concrete technological parameter is:
In the neutral sink 13, ultrasonic wave, neutral detergent rinsing for the first time, the operating temperature of neutral detergent solution is 60 ℃, proportioning is 100: 12; Hyperacoustic power is 3KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min.Neutral detergent adopts the clean CS-T101H of Star in Zhuhai, below each embodiment identical;
In the neutral sink 14, ultrasonic wave, neutral detergent rinsing for the second time, the operating temperature of neutral detergent solution is 60 ℃, proportioning is 100: 5; Hyperacoustic power is 3KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min.Extra large board W23-222 during neutral detergent adopts, below each embodiment identical;
In the industry water sink 15, the industry water rinsing, the industry water operating temperature is 40 ℃, and hyperacoustic power is 3KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min;
In the deionized water sink 16, rinsed with deionized water, deionized water operating temperature are 40 ℃, and hyperacoustic power is 3KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min;
In the deionized water sink 17, rinsed with deionized water, deionized water operating temperature are room temperature, and the linear velocity that substrate paper tinsel film moves is 1200mm/min;
Infrared drying time is 2 minutes.Then,
(2) on copper base paper tinsel film one side surface, adopt the reactive magnetron sputtering method, make infrared reflecting layer, absorbed layer and antireflection layer.
At first the substrate paper tinsel film coiled strip of finishing cleaning, drying is put into the material loading position of the reactive magnetron sputtering coating machine of volume to volume form, and stub bar pass regulating wheel, central cylinder is guided take-up position into, start the machine, automatically with the tensioning of substrate paper tinsel film.
Concrete technological process and technological parameter are:
The first step: the operating room of reactive magnetron sputtering coating machine is vacuumized, make its vacuum reach 2.0 * 10
-3Pa～5.0 * 10
-3Pa simultaneously along with vacuum, is warming up to 150 ℃ to the deep fat that adds that leads to central cylinder, makes the central cylinder outside wall temperature reach about 150 ℃, thereby indirectly the substrate paper tinsel film of being close to the central cylinder outer wall is heated to 145 ℃.
Second step: go into the working gas argon gas all to first sputtering chamber, its flow is 240ml/min; Go into working gas oxygen nitrogen mixture body all to second sputtering chamber, the flow of oxygen is 40ml/min, and the flow of nitrogen is 120ml/min; Go into working gas oxygen nitrogen mixture body all to the 3rd sputtering chamber, the flow of oxygen is 60ml/min, and the flow of nitrogen is 80ml/min; Go into working gas oxygen all to the 4th sputtering chamber, the flow of oxygen is 80ml/min;
The 3rd step: the sputtering current of first sputtering chamber is transferred to 8.5A, and sputtering voltage transfers to 0.88kV, and the sputtering pressure of working gas is 0.5Pa; The sputtering current of second sputtering chamber is transferred to 12A, and sputtering voltage transfers to 0.45kV, and the sputtering pressure of working gas is 0.5Pa; The sputtering current of the 3rd sputtering chamber is transferred to 10A, and sputtering voltage transfers to 0.45kV, and the sputtering pressure of working gas is 0.5Pa; The sputtering current of the 4th sputtering chamber transfers to 8A, and sputtering voltage transfers to 0.5kV, and the sputtering pressure of working gas is 0.4Pa;
The 4th step: start volume to volume substrate paper tinsel film locomotive function, automatically keeping constant-tension (substrate material difference, the constant-tension value is set also difference) prerequisite under, make substrate paper tinsel film move through four sputtering chambers, successively finish the sputter deposition craft of infrared reflecting layer, two absorbed layers, antireflection layer as constant linear velocity.
(3) the complete uncoiling of substrate paper tinsel film in the material loading volume, tension force adds ambassador's volume to volume mobile system and stops, close and open the reactive magnetron sputtering coating machine this moment, cut the stub bar part, take out the material volume of having finished plated film at the blanking end, by the product design requirement coiled strip is cut into following appearance and size: 2000mm * 300mm * 0.2mm at last.
The manufacturing of solar energy optical-thermal conversion nickel chromium triangle (Ni-Cr) the thermal-arrest film of embodiment 2.800mm copper base
(1) selecting width for use is 800mm, and thickness is 0.2mm, and length is the coiled strip copper foil membrane of 108m is changed nickel chromium triangle (Ni-Cr) thermal-arrest film as solar energy optical-thermal deposition substrate.At first, stub bar is guided into the blanking position, start the machine, substrate is cleaned, dries processing its material loading position that is placed on five groove ultrasonic cleaning drying devices of volume to volume form.Processing procedure is with embodiment 1, and concrete technological parameter is:
In the neutral sink 13, the operating temperature of neutral detergent solution is 60 ℃, and proportioning is 100: 12; Hyperacoustic power is 9KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min;
In the neutral sink 14, the operating temperature of neutral detergent solution is 60 ℃, and proportioning is 100: 5; Hyperacoustic power is 9KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min;
In the industry water sink 15, the industry water operating temperature is 40 ℃, and hyperacoustic power is 9KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min.
In the deionized water sink 16, the deionized water operating temperature is 40 ℃, and hyperacoustic power is 9KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min.
In the deionized water sink 17, the deionized water operating temperature is a room temperature, and the linear velocity that substrate paper tinsel film moves is 1200mm/min;
Infrared drying time is 3 minutes, then,
(2) on copper base paper tinsel film one side surface, adopt the reactive magnetron sputtering method, make infrared reflecting layer, absorbed layer and antireflection layer.
At first the substrate paper tinsel film coiled strip of finishing cleaning, drying is put into the material loading position of the reactive magnetron sputtering coating machine of volume to volume form, and stub bar pass regulating wheel, central cylinder is guided take-up position into, start the machine, automatically with the tensioning of substrate paper tinsel film.
Concrete technological process and technological parameter are:
The first step: the operating room of reactive magnetron sputtering coating machine is vacuumized, make its vacuum reach 2.0 * 10
-3Pa～5.0 * 10
-3Pa simultaneously along with vacuum, is warming up to 160 ℃ to the deep fat that adds that leads to central cylinder, makes the central cylinder outside wall temperature reach about 155 ℃, thereby indirectly the substrate paper tinsel film of being close to the central cylinder outer wall is heated to 150 ℃;
Second step: go into the working gas argon gas all to first sputtering chamber, its flow is 700ml/min; Go into working gas oxygen nitrogen mixture body all to second sputtering chamber, the flow of oxygen is 120ml/min, and the flow of nitrogen is 350ml/min; Go into working gas oxygen nitrogen mixture body all to the 3rd sputtering chamber, the flow of oxygen is 180ml/min, and the flow of nitrogen is 240ml/min; Go into working gas oxygen all to the 4th sputtering chamber, the flow of oxygen is 240ml/min;
The 3rd step: the sputtering current of first sputtering chamber is transferred to 24A, and sputtering voltage transfers to 2.4kV, and the sputtering pressure of working gas is 0.6Pa; The sputtering current of second sputtering chamber is transferred to 35A, and sputtering voltage transfers to 1.2kV, and the sputtering pressure of working gas is 0.6Pa; The sputtering current of the 3rd sputtering chamber is transferred to 28A, and sputtering voltage transfers to 1.2kV, and the sputtering pressure of working gas is 0.6Pa; The sputtering current of the 4th sputtering chamber transfers to 30A, and sputtering voltage transfers to 1.5kV, and the sputtering pressure of working gas is 0.6Pa;
The 4th step: start volume to volume substrate paper tinsel film locomotive function, automatically keeping constant-tension (substrate material difference, the constant-tension value is set also difference) prerequisite under, make substrate paper tinsel film move through four sputtering chambers, successively finish the sputter deposition craft of infrared reflecting layer, two absorbed layers, antireflection layer as constant linear velocity;
(3) the complete uncoiling of substrate paper tinsel film in the material loading volume, tension force adds ambassador's volume to volume mobile system and stops, close and open the reactive magnetron sputtering coating machine this moment, cut the stub bar part, take out the material volume of having finished plated film at the blanking end, by the product design requirement coiled strip is cut into following appearance and size: 4800mm * 800mm * 0.2mm at last.
The manufacturing of solar energy optical-thermal conversion nickel chromium triangle (Ni-Cr) the thermal-arrest film of embodiment 3.1000mm aluminium alloy substrate
(1) width of selecting for use market to buy is 1000mm, and thickness is 0.3mm, and length is the coiled strip alloy foil film of 150m is changed nickel chromium triangle (Ni-Cr) thermal-arrest film as solar energy optical-thermal deposition substrate.At first, stub bar is guided into the blanking position, start the machine, substrate is cleaned, dries processing its material loading position that is placed on five groove ultrasonic cleaning drying devices of volume to volume form.Processing procedure is with embodiment 1, and concrete technological parameter is:
In the neutral sink 13, the operating temperature of neutral detergent solution is 60 ℃, and proportioning is 100: 12; Hyperacoustic power is 9KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min;
In the neutral sink 14, the operating temperature of neutral detergent solution is 60 ℃, and proportioning is 100: 5; Hyperacoustic power is 9KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min;
In the industry water sink 15, the industry water operating temperature is 40 ℃, and hyperacoustic power is 9KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min;
In the deionized water sink 16, the deionized water operating temperature is 40 ℃, and hyperacoustic power is 9KW, and frequency is 20Hz; The linear velocity that substrate paper tinsel film moves is 1200mm/min;
In the deionized water sink 17, the deionized water operating temperature is a room temperature, and the linear velocity that substrate paper tinsel film moves is 1200mm/min;
Infrared drying time is 3 minutes, then
(2) on copper base paper tinsel film one side surface, adopt the reactive magnetron sputtering method, make infrared reflecting layer, absorbed layer and antireflection layer.
At first the substrate paper tinsel film coiled strip of finishing cleaning, drying is put into the material loading position of the reactive magnetron sputtering coating machine of volume to volume form, and stub bar pass regulating wheel, central cylinder is guided take-up position into, start the machine, automatically with the tensioning of substrate paper tinsel film.
Concrete technological process and technological parameter are:
The first step; The operating room of reactive magnetron sputtering coating machine is vacuumized, make its vacuum reach 2.0 * 10
-3Pa～5.0 * 10
-3Pa simultaneously along with vacuum, is warming up to 160 ℃ to the deep fat that adds that leads to central cylinder, makes the central cylinder outside wall temperature reach about 155 ℃, thereby indirectly the substrate paper tinsel film of being close to the central cylinder outer wall is heated to 150 ℃;
Second step: go into the working gas argon gas all to first sputtering chamber, its flow is 800ml/min; Go into working gas oxygen nitrogen mixture body all to second sputtering chamber, the flow of oxygen is 140ml/min, and the flow of nitrogen is 380ml/min; Go into working gas oxygen nitrogen mixture body all to the 3rd sputtering chamber, the flow of oxygen is 200ml/min, and the flow of nitrogen is 280ml/min; Go into working gas oxygen all to the 4th sputtering chamber, the flow of oxygen is 300ml/min;
The 3rd step: the sputtering current of first sputtering chamber is transferred to 26A, and sputtering voltage transfers to 2.5kV, and the sputtering pressure of working gas is 0.6Pa; The sputtering current of second sputtering chamber is transferred to 38A, and sputtering voltage transfers to 1.5kV, and the sputtering pressure of working gas is 0.6Pa; The sputtering current of the 3rd sputtering chamber is transferred to 32A, and sputtering voltage transfers to 1.5kV, and the sputtering pressure of working gas is 0.6Pa; The sputtering current of the 4th sputtering chamber transfers to 35A, and sputtering voltage transfers to 1.8kV, and the sputtering pressure of working gas is 0.6Pa;
The 4th step: start volume to volume substrate paper tinsel film locomotive function, automatically keeping constant-tension (substrate material difference, the constant-tension value is set also difference) prerequisite under, make substrate paper tinsel film move through four sputtering chambers, successively finish the sputter deposition craft of infrared reflecting layer, two absorbed layers, antireflection layer as constant linear velocity.
(3) the complete uncoiling of substrate paper tinsel film in the material loading volume, tension force adds ambassador's volume to volume mobile system and stops, close and open the reactive magnetron sputtering coating machine this moment, cut the stub bar part, take out the material volume of having finished plated film at the blanking end, by the product design requirement coiled strip is cut into following appearance and size: 5000mm * 1000mm * 0.3mm at last.
Claims (3)
1, a kind of solar energy optical-thermal conversion nickel chromium triangle thermal-arrest film, with metal copper foil film or aluminium foil film is substrate paper tinsel film, it is characterized in that: have infrared external reflection rete (2), first absorbing membranous layer (3), second absorbing membranous layer (4) and antireflection film layer (5) from bottom to top successively in the top of substrate paper tinsel film (1), described infrared external reflection rete (2) is the copper thin layer of plated metal attitude, and first absorbing membranous layer (3), second absorbing membranous layer (4) all are oxygen nitrogen nichrome NiCrO
xN
yThin layer, antireflection film layer (5) are dielectric attitude oxygen nichrome NiCrOx thin layers, and each rete deposits and be laminated in one on substrate paper tinsel film (1).
2, nickel chromium triangle thermal-arrest film according to claim 1, it is characterized in that: the thickness range of substrate paper tinsel film (1) and each rete is respectively: substrate paper tinsel film (1) 0.1～0.3mm, infrared external reflection rete (2) 130～160nm, first absorbing membranous layer (3) 30～40nm, second absorbing membranous layer (4) 10～20nm, antireflection film layer (5) 40～60nm.
3, the manufacture method of the described nickel chromium triangle thermal-arrest of claim 1 film, with volume to volume formula reactive magnetron sputtering coating machine plated film, it is characterized in that: technical process is as follows:
(1) substrate paper tinsel film coiled strip cleans and oven dry: with substrate paper tinsel film coiled strip, with five groove ultrasonic cleaning drying device continuous wash and the oven dry of volume to volume formula;
(2) being coated with of plated film layer:
A, elder generation use volume to volume form reactive magnetron sputtering coating machine with the tensioning of substrate paper tinsel film coiled strip, then
The operating room of B, coating machine is evacuated to 2.0 * 10
-3Pa～5.0 * 10
-3Pa, the deep fat that adds that will lead to central cylinder simultaneously is warming up to 110～160 ℃, again
C, each sputtering chamber feed working gas: feeding flow to first sputtering chamber is the argon gas of 100～800ml/min, be respectively the mist of 10～180ml/min and 100～400ml/min to the second sputtering chamber aerating oxygen and nitrogen flow, be respectively the mist of 30～240ml/min and 60～300ml/min to the 3rd sputtering chamber aerating oxygen and nitrogen flow, feeding flow to the 4th sputtering chamber is the oxygen of 40～300ml/min, then
D, the sputtering current of first sputtering chamber is transferred to 5～30A, sputtering voltage transfers to 0.85～2.5kV, the sputtering pressure of working gas is 0.2Pa～0.8Pa, the sputtering current of second sputtering chamber is transferred to 8～50A, sputtering voltage transfers to 0.30～1.5kV, the sputtering pressure of working gas is 0.2Pa～0.8Pa, the sputtering current of the 3rd sputtering chamber is transferred to 8～50A, sputtering voltage transfers to 0.30～1.5kV, the sputtering pressure of working gas is 0.2Pa～0.8Pa, and the sputtering current of the 4th sputtering chamber is transferred to 8～60A, and sputtering voltage transfers to 0.50～2.2kV, the sputtering pressure of working gas is 0.2Pa～0.8Pa, then
E, startup volume to volume substrate paper tinsel film coiled strip locomotive function; substrate paper tinsel film coiled strip is that 200～600mm/min constant speed moves successively by each sputtering chamber by linear velocity; carry out the sputtering sedimentation of infrared reflecting layer (2), first absorbed layer (3), second absorbed layer (4) and antireflection layer (5) respectively; shut down, last
F, coiled strip are cut into required size.
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| CNA2007100763953A CN101093115A (en) | 2007-07-06 | 2007-07-06 | Nickel-chromium heat collection film for conversion of light and heat of solar energy |
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| Application Number | Priority Date | Filing Date | Title |
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| CNA2007100763953A CN101093115A (en) | 2007-07-06 | 2007-07-06 | Nickel-chromium heat collection film for conversion of light and heat of solar energy |
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