CN101092726A - Technique for preparing illusive color pattern on surface of parts possessing surface layer of conductive metal - Google Patents
Technique for preparing illusive color pattern on surface of parts possessing surface layer of conductive metal Download PDFInfo
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- CN101092726A CN101092726A CN 200710009123 CN200710009123A CN101092726A CN 101092726 A CN101092726 A CN 101092726A CN 200710009123 CN200710009123 CN 200710009123 CN 200710009123 A CN200710009123 A CN 200710009123A CN 101092726 A CN101092726 A CN 101092726A
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- camouflage pattern
- conducting metal
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- top layer
- metal top
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Abstract
This invention provides a method for preparing surface camouflage patterns on device containing a conductive metal surface layer. The method comprises: preparing the components of the device, molding, polishing, washing, drying, electroplating alkaline copper onto the surfaces of the dried components, rinsing with clear water, electroplating acidic phosphorus copper, rinsing with clear water, electroplating nickel, rinsing with clear water, electroplating chrome, rinsing with clear water, passivating, baking, and polishing to obtain required camouflage patterns on the surfaces of the components, washing, performing surface anti-oxidative treatment, baking, waxing, and assembling to obtain the components with camouflage patterns. The method combines multiple electroplating processes and surface spraying process, and has such advantages as simple process and abundant raw materials. The obtained device has such advantages as long-term shinning, no corrosion, and beautiful appearance.
Description
Technical field
The invention belongs to the hardware treatment process, be specifically related to a kind of surperficial camouflage pattern preparation technology with conducting metal top layer device.
Background technology
The top layer has the device of conducting metal or the device that itself is exactly conducting metal, because self, utilization extensively.If but these devices are not taked etch-proof measure, the rust corrosion that its surface can be very fast has not only influenced the attractive in appearance of device, has also influenced the work-ing life of device.Generally the anti-corrosive treatment to these devices is to carry out simple passivation, electroplate or be coated with last layer coating on its surface, though this can prevent corrosion at short notice, does not satisfy people far away to the long-term protection against corrosion of these devices and attractive and durable needs.
Goal of the invention
The objective of the invention is to provide a kind of surperficial camouflage pattern preparation technology with conducting metal top layer device, this preparation technology combines with surface spray coating process repeatedly electroplating, the device that is prepared into not only can be for a long time the no rust corrosion of light, and the camouflage pattern that has is elegant in appearance, and the utilization field is extensive.
Surperficial camouflage pattern preparation technology with conducting metal top layer device of the present invention comprises that preparation has each component of conducting metal top layer device, is characterized in that: after described each component moulding, through following step process:
(1) with each component polishing, cleaning, oven dry;
(2) electroplate alkali copper at each good component surface of oven dry;
(3) clear water rinsing;
(4) electroplate acid phosphor-copper at each good component surface of rinsing;
(5) clear water rinsing;
(6) in each good component surface electronickelling of rinsing;
(7) clear water rinsing;
(8) at each good component surface electrodeposited chromium of rinsing;
(9) clear water rinsing; Passivation Treatment; Baking; At each component surface polishing, the camouflage pattern of dishing out and needing;
(10) will throw that each good component clean, surface anti-oxidation is handled, baking, waxing glazing;
(11) device that the surface has camouflage pattern is made in each glazing is good component combination.
Remarkable advantage of the present invention is: preparation method of the present invention will repeatedly electroplate with surface spray coating process and combine, therefore, the device that makes not only can be for a long time the no rust corrosion of light, and the camouflage pattern that has is elegant in appearance, the utilization field is extensive.The preparation method is simple, raw material is easy to get.
Embodiment
Implement the present invention according to content of the present invention.
The condition of electroplating alkali copper is: electrolytic solution: sodium-chlor 30～50g/L, sodium hydroxide 5～15g/L, cuprous cyanide 39g/L, sodium-potassium tartrate 10～30g/L, 1～15 volt of volts DS, 30～50 ℃ of electrolysis temperatures, electrolysis time 3～8 minutes; The condition of the acid phosphor-copper of described plating is: electrolytic solution: copper sulfate 150～250g/L, sulfuric acid 40～80g/L, polyoxyethylene glycol 3～7ml/L; 1～15 volt of volts DS, 25～30 ℃ of electrolysis temperatures, electrolysis time 5～15 minutes; The condition of described electronickelling is: single nickel salt 200～300g/L, nickelous chloride 50～60g/L, boric acid 30～50g/L, polyoxyethylene glycol 5～15g/L; 1～15 volt of volts DS, 45～55 ℃ of electrolysis temperatures, electrolysis time 3～8 minutes; The condition of described electrodeposited chromium is: electrolytic solution: chromic acid 200～300g/L, sulfuric acid 2～3g/L, rare earth 0.5～1.5g/L; 1～15 volt of volts DS, 45～55 ℃ of electrolysis temperatures, electrolysis time 0.5～2 minute; Each component that has plated chromium soaked 1～3 minute in concentration is the chromic anhydride aqueous solution of 50g/L.
Each component polishes with all cotton fabric wheel, linear velocity per second 14m～70m in step (1), (9), and throwing each good component smooth finish is 7.
To adopt 80 ℃ of trielines or 20 ℃～80 ℃ alkaline aqueous solutions or concentration be 5%～30% hydrochloric acid in the cleaning of each component in step (1), the step (10), scavenging period 10～30 minutes, ultrasonic wave or manual the cleaning; Described alkaline aqueous solution is that concentration is one or more in 5%～50% sodium hydroxide, yellow soda ash, sodium bicarbonate, common washing powder or the detergent solution.
The drying condition of each component is in the step (1): 100～130 ℃ of temperature, 15～30 minutes time.
Passivation Treatment in the step (9) is for being to soak 1～3 minute in the aqueous solution of potassium bichromate, 1.5ml/L glacial acetic acid of 50g/L in concentration; Baking condition in the described step (9) is temperature 80～110C °, 30～15 minutes time.
Polish dish out golden partially camouflage pattern or inclined to one side silver color camouflage pattern in the step (9) at each component surface; The described golden partially camouflage pattern process of dishing out is: at dish out coating expose portion area ratio of each component surface: phosphor-copper 5, brass 2.5, the camouflage pattern of nickel 2.5; The described inclined to one side silver color camouflage pattern process of dishing out is: at dish out coating expose portion area ratio of each component surface: chromium 5, phosphor-copper 2.5, the camouflage pattern of brass 2.5.
The surface anti-oxidation treatment step is in the step (10): with electroplating tailor-made paint or general high temperature baking vanish, spray at each component with electrophoresis or manual mode; Baking condition is in the described step (10): temperature 100～130C °, and 30～10 minutes time.
Having conducting metal top layer device is that the top layer is any device of conducting metal or itself is exactly any device of conducting metal, as the saxophone that does with copper etc.
Embodiment 1
Preparation has the saxophone of camouflage pattern.
(1) each component of preparation saxophone, each component of saxophone are polished: polish with all cotton fabric wheel, linear velocity per second 14m～70m, throwing good each component smooth finish of saxophone is 7;
Clean: adopting 80 ℃ of trielines or 20 ℃～80 ℃ alkaline aqueous solutions or concentration is 5%～30% hydrochloric acid, scavenging period 10～30 minutes, ultrasonic wave or manual cleaning; Described alkaline aqueous solution is that concentration is one or more in 5%～50% sodium hydroxide, yellow soda ash, sodium bicarbonate, common washing powder or the detergent solution;
Oven dry: drying condition is: 100～130 ℃ of temperature, 15～30 minutes time.
(2) electroplate alkali copper at good each component surface of saxophone of oven dry, the condition of described plating alkali copper is: electrolytic solution: sodium-chlor 40g/L, sodium hydroxide 10g/L, cuprous cyanide 39g/L, sodium-potassium tartrate 20g/L; 1～15 volt of volts DS, 30～50 ℃ of electrolysis temperatures, electrolysis time 5 minutes;
(3) clear water rinsing;
(4) electroplate acid phosphor-copper at good each component surface of saxophone of rinsing, the condition of the acid phosphor-copper of described plating is: electrolytic solution: copper sulfate 200g/L, sulfuric acid 60g/L, polyoxyethylene glycol 5ml/L; 1～15 volt of volts DS, 28 ℃ of electrolysis temperatures, electrolysis time 5～15 minutes;
(5) clear water rinsing;
(6) in good each the component surface electronickelling of saxophone of rinsing, the condition of described electronickelling is: single nickel salt 250g/L, nickelous chloride 56g/L, boric acid 40g/L, polyoxyethylene glycol 10g/L; 1～15 volt of volts DS, 50 ℃ of electrolysis temperatures, electrolysis time 5 minutes;
(7) clear water rinsing;
(8) at good each the component surface electrodeposited chromium of saxophone of rinsing, the condition of described electrodeposited chromium is: electrolytic solution: chromic acid 250g/L, sulfuric acid 2.5g/L, rare earth 1g/L; 1～15 volt of volts DS, 50 ℃ of electrolysis temperatures, electrolysis time 1～2 minute;
Each component of saxophone that plated chromium soaked 1～2 minute in concentration is the chromic anhydride aqueous solution of 50g/L;
(9) clear water rinsing; Passivation Treatment: Passivation Treatment is for soaking 1～3 minute in the aqueous solution of the potassium bichromate of 50g/L, 1.5ml/L glacial acetic acid; Baking: baking condition is temperature 80～110C °, 30～15 minutes time; In the polishing of each component surface of saxophone, the camouflage pattern of dishing out and needing: the golden partially camouflage pattern process of dishing out is: each component surface of saxophone coating expose portion area ratio of dishing out: phosphor-copper 5, brass 2.5, the camouflage pattern of nickel 2.5; The described inclined to one side silver color camouflage pattern process of dishing out is: at dish out coating expose portion area ratio of each component surface of saxophone: chromium 5, phosphor-copper 2.5, the camouflage pattern of brass 2.5.
(10) will throw good each component of saxophone cleans: adopting 80 ℃ of trielines or 20 ℃～80 ℃ alkaline aqueous solutions or concentration is 5%～30% hydrochloric acid, scavenging period 10～30 minutes, ultrasonic wave or manual cleaning; Described alkaline aqueous solution is that concentration is one or more in 5%～50% sodium hydroxide, yellow soda ash, sodium bicarbonate, common washing powder or the detergent solution; Surface anti-oxidation is handled: with electroplating tailor-made paint or general high temperature baking vanish, spray at each component spare of saxophone with electrophoresis or manual mode; Baking: temperature 100～130C °, 30～10 minutes time, waxing glazing;
(12) saxophone with camouflage pattern is made in glazing is good each component combination of saxophone.
Claims (10)
1. surperficial camouflage pattern preparation technology with conducting metal top layer device comprises that preparation has each component of conducting metal top layer device, is characterized in that: after described each component moulding, through following step process:
(1) with each component polishing, cleaning, oven dry;
(2) electroplate alkali copper at each good component surface of oven dry;
(3) clear water rinsing;
(4) electroplate acid phosphor-copper at each good component surface of rinsing;
(5) clear water rinsing;
(6) in each good component surface electronickelling of rinsing;
(7) clear water rinsing;
(8) at each good component surface electrodeposited chromium of rinsing;
(9) clear water rinsing; Passivation Treatment; Baking; At each component surface polishing, the camouflage pattern of dishing out and needing;
(10) will throw that each good component clean, surface anti-oxidation is handled, baking, waxing glazing;
(11) device that the surface has camouflage pattern is made in each glazing is good component combination.
2. the surperficial camouflage pattern preparation technology with the device on conducting metal top layer according to claim 1, it is characterized in that: the condition of described plating alkali copper is: electrolytic solution: sodium-chlor 30～50g/L, sodium hydroxide 5～15g/L, cuprous cyanide 39g/L, sodium-potassium tartrate 10～30g/L, 1～15 volt of volts DS, 30～50 ℃ of electrolysis temperatures, electrolysis time 3～8 minutes; The condition of the acid phosphor-copper of described plating is: electrolytic solution: copper sulfate 150～250g/L, sulfuric acid 40～80g/L, polyoxyethylene glycol 3～7ml/L; 1～15 volt of volts DS, 25～30 ℃ of electrolysis temperatures, electrolysis time 5～15 minutes; The condition of described electronickelling is: single nickel salt 200～300g/L, nickelous chloride 50～60g/L, boric acid 30～50g/L, polyoxyethylene glycol 5～15g/L; 1～15 volt of volts DS, 45～55 ℃ of electrolysis temperatures, electrolysis time 3～8 minutes; The condition of described electrodeposited chromium is: electrolytic solution: chromic acid 200～300g/L, sulfuric acid 2～3g/L, rare earth 0.5～1.5g/L; 1～15 volt of volts DS, 45～55 ℃ of electrolysis temperatures, electrolysis time 0.5～2 minute; Each component that has plated chromium soaked 1～3 minute in concentration is the chromic anhydride aqueous solution of 50g/L.
3. the surperficial camouflage pattern preparation technology with conducting metal top layer device according to claim 1, it is characterized in that: each component polishes with all cotton fabric wheel, linear velocity per second 14m～70m in described step (1), (9), and throwing each good component smooth finish is 7.
4. the surperficial camouflage pattern preparation technology with conducting metal top layer device according to claim 1, it is characterized in that: to adopt 80 ℃ of trielines or 20 ℃～80 ℃ alkaline aqueous solutions or concentration be 5%～30% hydrochloric acid in the cleaning of each component in described step (1), the step (10), scavenging period 10～30 minutes, ultrasonic wave or manual the cleaning; Described alkaline aqueous solution is that concentration is one or more in 5%～50% sodium hydroxide, yellow soda ash, sodium bicarbonate, common washing powder or the detergent solution.
5. the surperficial camouflage pattern preparation technology with conducting metal top layer device according to claim 1, it is characterized in that: the drying condition of each component is in the described step (1): 100～130 ℃ of temperature, 15～30 minutes time.
6. the surperficial camouflage pattern preparation technology with conducting metal top layer device according to claim 1 is characterized in that: the Passivation Treatment in the described step (9) is for being to soak 1～3 minute in the aqueous solution of potassium bichromate, 1.5ml/L glacial acetic acid of 50g/L in concentration; Baking condition in the described step (9) is temperature 80～110C °, 30～15 minutes time.
7. the surperficial camouflage pattern preparation technology with conducting metal top layer device according to claim 1 is characterized in that: polish dish out golden partially camouflage pattern or inclined to one side silver color camouflage pattern in the described step (9) at each component surface; The described golden partially camouflage pattern process of dishing out is: at dish out coating expose portion area ratio of each component surface: phosphor-copper 5, brass 2.5, the camouflage pattern of nickel 2.5; The described inclined to one side silver color camouflage pattern process of dishing out is: at dish out coating expose portion area ratio of each component surface: chromium 5, phosphor-copper 2.5, the camouflage pattern of brass 2.5.
8. the surperficial camouflage pattern preparation technology with conducting metal top layer device according to claim 1, it is characterized in that: the surface anti-oxidation treatment step is in the described step (10): with electroplating tailor-made paint or general high temperature baking vanish, spray at each component with electrophoresis or manual mode; Baking condition is in the described step (10): temperature 100～130C °, and 30～10 minutes time.
9. the surperficial camouflage pattern preparation technology with conducting metal top layer device according to claim 1 is characterized in that: described device with conducting metal top layer is that the top layer is any device of conducting metal or itself is exactly any device of conducting metal.
10. the surperficial camouflage pattern preparation technology with conducting metal top layer device according to claim 9 is characterized in that: the described saxophone of device for doing with copper with conducting metal top layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200710009123A CN100591806C (en) | 2007-06-21 | 2007-06-21 | Technique for preparing illusive color pattern on surface of parts possessing surface layer of conductive metal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200710009123A CN100591806C (en) | 2007-06-21 | 2007-06-21 | Technique for preparing illusive color pattern on surface of parts possessing surface layer of conductive metal |
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| Publication Number | Publication Date |
|---|---|
| CN101092726A true CN101092726A (en) | 2007-12-26 |
| CN100591806C CN100591806C (en) | 2010-02-24 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN200710009123A Expired - Fee Related CN100591806C (en) | 2007-06-21 | 2007-06-21 | Technique for preparing illusive color pattern on surface of parts possessing surface layer of conductive metal |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103014798A (en) * | 2012-12-17 | 2013-04-03 | 山东国强五金科技有限公司 | Electrochromism processing method for iron-based powder metallurgic part |
| CN105506691A (en) * | 2015-12-28 | 2016-04-20 | 广东欧珀移动通信有限公司 | Surface treatment method for stainless steel, stainless steel housing and mobile terminal |
| CN109554743A (en) * | 2018-12-19 | 2019-04-02 | 嘉善县东方银河实业有限公司 | A kind of efficient copper sheet button electrophoretic process technique |
| CN114509884A (en) * | 2022-02-24 | 2022-05-17 | 京东方科技集团股份有限公司 | Circuit board and preparation method thereof, functional backboard, backlight module and display device |
-
2007
- 2007-06-21 CN CN200710009123A patent/CN100591806C/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103014798A (en) * | 2012-12-17 | 2013-04-03 | 山东国强五金科技有限公司 | Electrochromism processing method for iron-based powder metallurgic part |
| CN103014798B (en) * | 2012-12-17 | 2015-09-09 | 山东国强五金科技有限公司 | The electrodeposited chromium treatment process of iron-base sintered metal piece |
| CN105506691A (en) * | 2015-12-28 | 2016-04-20 | 广东欧珀移动通信有限公司 | Surface treatment method for stainless steel, stainless steel housing and mobile terminal |
| CN109554743A (en) * | 2018-12-19 | 2019-04-02 | 嘉善县东方银河实业有限公司 | A kind of efficient copper sheet button electrophoretic process technique |
| CN114509884A (en) * | 2022-02-24 | 2022-05-17 | 京东方科技集团股份有限公司 | Circuit board and preparation method thereof, functional backboard, backlight module and display device |
| CN114509884B (en) * | 2022-02-24 | 2023-11-17 | 京东方科技集团股份有限公司 | Circuit board, preparation method thereof, functional backboard, backlight module and display device |
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| Publication number | Publication date |
|---|---|
| CN100591806C (en) | 2010-02-24 |
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