CN101086058A - Vacuum deposition film device for continuous band-shaped base-material - Google Patents
Vacuum deposition film device for continuous band-shaped base-material Download PDFInfo
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- CN101086058A CN101086058A CN 200610200516 CN200610200516A CN101086058A CN 101086058 A CN101086058 A CN 101086058A CN 200610200516 CN200610200516 CN 200610200516 CN 200610200516 A CN200610200516 A CN 200610200516A CN 101086058 A CN101086058 A CN 101086058A
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- vacuum
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- sealing
- deposition film
- continuous band
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Abstract
The invention relates to a film device used for continuous ribbon base material vaccum deposition. The ribbon base material can be discharged continuously in the air. The device enters into super vacuum condition with one section or several sections for deposition through several upgoing dynamic vacuum sealing device, then returns to the air through downgoing dynamic vacuum sealing device for material collection. Said device comprises material discharge and collection subsystem, correcting error subsystem, vacuum sealing subsystem, vacuum chamber with one section or several sections, vacuum collection subsystem and vacuum film deposition subsystem; said vacuum sealing device controls the dynamic sealing for ribbon base material entering or going out of vacuum condition. The invention is characterized in that it can realize continuous deposition film coating at vacuum condition for ribbon base material, and the production efficiency is high and quality of film coating is stable.
Description
Technical field
The present invention relates to a kind of film preparation device, particularly on banded labor and materials, prepare the device of film with evaporating deposition technique.
Background technology
When banded labor and materials are carried out vacuum moulding machine and prepare film, general all banded raw material and the product that prepare being put in order twists in atmospheric environment and packs one or several are with in the bigger vacuum chamber of the volume of pressure fully into, vacuumize then, deposit film, destroy vacuum at last and get back in the atmospheric environment and reload; Or earlier with banded labor and materials earlier the section of being divided into expect (light sheet), put into one or several with the less vacuum chamber of pressure volume in atmospheric environment then, vacuumize then, deposit film, destroy vacuum at last and get back in the atmospheric environment and reload.Also can take to use vacuum valve to realize that the section material is up through preparing coating in the less vacuum chamber of multistage pressure different volumes from atmospheric environment to the section material, the less vacuum chamber of descending again process multistage pressure different volumes is got back to atmospheric environment.The above banded base-material vacuum moulding machine prepares the method for film, all can't really realize not destroying under the equipment vacuum state continuous refuelling in atmospheric environment, and production efficiency is low, coating quality is unstable.
Summary of the invention
The object of the present invention is to provide and a kind ofly can in atmospheric environment, continuous refuelling, equipment maintain vacuum state, production efficiency height, the stable banded base-material film coating apparatus of coating quality all the time.
The present invention can realize winding shape labor and materials continuous blowing in atmospheric environment, up have two roll shafts and enter in one section or the sectional high vacuum environment and deposit the preparation film by several grades, and then turn back to through the descending vacuum seal identical and to carry out rewinding in the atmospheric environment with aforementioned up vacuum seal to rolling the vacuum seal that clamps banded base-material.Described device includes the material retractable subsystem, and raw-material discharging device and the material collecting device of depositing product are provided; The correction subsystem is used for correcting the deviation correcting device that produces deviation when banded base-material passes in and out vacuum seal; The vacuum-sealing subsystem is advanced/is gone out the moving device of dynamic seal of vacuum environment in order to realize banded base-material by atmosphere; Vacuum chamber is used to provide one section or sectional cavity of the atmosphere of vacuum deposition film; Vacuum obtains subsystem, promptly various vacuum pump groups and the sub-device of vacuum film deposition.Device provided by the invention only need just need destroy vacuum environment and shut down when changing target or cleaning vacuum chamber, all the other are in continuous duty always.
Description of drawings
Fig. 1 is used for the vacuum unit synoptic diagram of banded base-material deposit film for the present invention;
Fig. 2 is the unitary sectional view of vacuum-sealing.
Embodiment
Embodiments of the invention 1 are described with reference to the accompanying drawings.
In Fig. 1, the vacuum unit that the present invention is used for banded base-material deposit film comprises discharging device 1, up deviation correcting device 2, up vacuum seal 3, vacuum chamber 4, vacuum chamber pumping equipment 6, descending vacuum seal 8, vacuum seal pumping equipment 10, descending deviation correcting device 9, material collecting device 11.Wherein vacuum seal is to be connected to form from beginning to end by one or more than one vacuum-sealing unit.Each vacuum-sealing unit is formed roll shaft on rolling 22 and lower roller shaft 25 by two in Fig. 2.When banded base-material 24 enters vacuum chamber 4 by vacuum seal 3, to rolling banded base-material is got into vacuum chamber by two unitary roll shafts of vacuum-sealing, be provided with vacuum acquisition device 10 between while two vacuum-sealing unit and between the sealing unit of close vacuum chamber and the vacuum chamber, reach the purpose of dynamic seal.Carry out deposit film after entering vacuum chamber, enter descending vacuum seal 8 then, adopt by descending vacuum seal and banded base-material is extruded vacuum chamber with the identical method of up vacuum seal.Between discharging device 1 and the up vacuum seal 3 and between descending vacuum seal 8 and the material collecting device 11, be respectively equipped with up deviation correcting device 2 and descending deviation correcting device 9, to regulate wandering off that banded labor and materials may occur in moving process.
Claims (5)
1. device that is used for the continuous band-shaped base-material vacuum deposition film, consist predominantly of one section or sectional vacuum chamber, one group of vacuum acquiring system that cooperates with vacuum chamber, it is characterized in that: also comprise one group of vacuum-sealing subsystem that advances/go out vacuum chamber in order to the banded base-material of dynamic seal from atmosphere, starting material and the material retractable subsystem of depositing product are provided, are used for correcting the correction subsystem that produces deviation when banded base-material passes in and out vacuum seal.
2. according to the described device that is used for the continuous band-shaped base-material vacuum deposition film of claim 1, it is characterized in that: the rolling of banded base-material and the system of unreeling are not limited at the vacuum chamber homonymy.
3. according to the described device that is used for the continuous band-shaped base-material vacuum deposition film of claim 1, it is characterized in that: the vacuum-sealing subsystem comprises one or more than one vacuum-sealing unit.
4. according to the described device that is used for the continuous band-shaped base-material vacuum deposition film of claim 1, it is characterized in that: the vacuum-sealing unit of vacuum-sealing subsystem is provided with vacuum and obtains device.
5. according to the described vacuum-sealing subsystem of claim 3, it is characterized in that: the vacuum-sealing unit comprises a pair of roll shaft to rolling.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200610200516 CN101086058A (en) | 2006-06-05 | 2006-06-05 | Vacuum deposition film device for continuous band-shaped base-material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 200610200516 CN101086058A (en) | 2006-06-05 | 2006-06-05 | Vacuum deposition film device for continuous band-shaped base-material |
Publications (1)
Publication Number | Publication Date |
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CN101086058A true CN101086058A (en) | 2007-12-12 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN 200610200516 Pending CN101086058A (en) | 2006-06-05 | 2006-06-05 | Vacuum deposition film device for continuous band-shaped base-material |
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CN (1) | CN101086058A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103074581A (en) * | 2012-12-25 | 2013-05-01 | 王奉瑾 | PVD equipment adopting light heating |
CN105970180A (en) * | 2016-05-30 | 2016-09-28 | 上海应用技术学院 | Deviation-correcting unwinding mechanism of film coating machine |
CN108520833A (en) * | 2018-03-16 | 2018-09-11 | 江苏中天科技股份有限公司 | Porous aluminum macroscopic body and its manufacture system and method |
-
2006
- 2006-06-05 CN CN 200610200516 patent/CN101086058A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103074581A (en) * | 2012-12-25 | 2013-05-01 | 王奉瑾 | PVD equipment adopting light heating |
CN105970180A (en) * | 2016-05-30 | 2016-09-28 | 上海应用技术学院 | Deviation-correcting unwinding mechanism of film coating machine |
CN105970180B (en) * | 2016-05-30 | 2019-05-24 | 上海应用技术学院 | The coating machine unreeling structure that can be rectified a deviation |
CN108520833A (en) * | 2018-03-16 | 2018-09-11 | 江苏中天科技股份有限公司 | Porous aluminum macroscopic body and its manufacture system and method |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20071212 |