CN101075443A - Method for producing pattern magnetic-recording medium with continuous inverse-impression direct transfer - Google Patents
Method for producing pattern magnetic-recording medium with continuous inverse-impression direct transfer Download PDFInfo
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- CN101075443A CN101075443A CN 200710018124 CN200710018124A CN101075443A CN 101075443 A CN101075443 A CN 101075443A CN 200710018124 CN200710018124 CN 200710018124 CN 200710018124 A CN200710018124 A CN 200710018124A CN 101075443 A CN101075443 A CN 101075443A
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Abstract
A method for preparing patternized magnetic recording media of continuous pattern direct-transfer type includes transferring photo-resist at microstructure convex surface of mould to substrate surface by utilizing patternized cylindrical impression mould through micro-contact reverse impression technology in order to form patternized mask layer, growing magnetic media with patternization character at non-mask region on substrate surface by electric plating process and flattening surface of said media and said mask layer by plasma-etching process for obtaining patternized magnetic recording media with space packed by nonmagnetic material.
Description
Technical field
The invention belongs to little manufacturing field, the manufacture method that relates to a kind of patterned magnetic recording medium, be particularly related to a kind of contrary method that pattern directly shifts the shop drawings pattern magnetic-recording medium that impresses that adopts continuously, this method is mainly used in the manufacturing of large-area patterning high density magnetic storage class magnetic recording device.
Background technology
In magnetic memory device,, adopt nanoscale island-shaped pattern magnetic array of spots to replace continuous magnetic recording media for realizing higher magnetic storage density.The high density magnetic memory device is more and more littler to the dimensional requirement of nanoscale island magnetic recording medium, studies show that when the diameter of island magnetic spot during greater than 160nm, the magnetic spot is a multidomain structure, and being reduced to the magnetic spot array of 80nm for the magnetic spot diameter, each magnetic spot all presents stable single domain state.Therefore, when the size on magnetic recording medium island was not more than 80nm, each magnetic islands was a single domain state, and every information can be stored on the magnetic islands of a single domain, can greatly improve the recording density of magnetic medium.High density magnetic memory device for large tracts of land or continuous substrate except requiring high precision, has also proposed requirements at the higher level to throughput rate during fabrication.
For the preparation of nanoscale island-shaped pattern medium, in traditional nano-fabrication technique, normal method that adopts such as LIGA method, electrochemical plating and manually auxiliary self-assembly method, nano impression method (NIL) etc. in the anodized aluminum hole.The LIGA method is to be expected most at present and the technology of most widely used manufacturing micron order size, but because its technical bottleneck problem is not suitable for the manufacturing of the following size of 100nm.Electrochemical plating and manually auxiliary self-assembly method can be produced the size below the 100nm in the anodized aluminum hole, but the pattern of its generation have shape can not manual control, irregular characteristics, be not suitable for the manufacturing of the magnetic recording media pattern of rule.The nano impression method is a kind of can processing dimension minimum manufacture method of 6nm that be, for other job operation, its resolution height, throughput rate height, production cost are low, it is a kind of very promising nanoprocessing method, but traditional nano-imprinting method is when transition diagram, resistance erosion glue cull to occur at resistance erosion glue pattern position, the removal technology of these resistance erosion glue culls can produce damage to the size and dimension precision that shifts pattern usually; For large-area high-density magnetic recording media or the manufacturing of the magnetic recording media of substrate continuously, traditional nano impression then shows as than poor efficiency in addition.
Above-mentioned common process is not strong to the manufacturing adaptability that requires large-duty high density magnetic memory device, and complex manufacturing, production cost height, inefficiency.Therefore, need a kind of high efficiency, high-precision, directly shift the method for the manufacturing pattern magnetic recording media of nanoscale pattern.
Summary of the invention
The objective of the invention is to, the method of the direct transfer type shop drawings of a kind of continuous pattern pattern magnetic-recording medium is provided, this method adopts a kind of continuous nano-imprinting method directly to shift pattern, promptly using, the cylindrical die of patternization carries out the contrary impression of little contact, rotation by impressing mould, the photoresist that is bonded on the mould convex surface continuously, is directly transferred on the suprabasil layer on surface of metal, behind the ultraviolet light polymerization, is that mask is electroplated the growth magnetic material in non-blasnket area with the photoresist pattern again.
For achieving the above object, the manufacture method of the direct transfer type patterned magnetic recording medium of pattern provided by the invention mainly may further comprise the steps:
(1) at first (substrate can be plate-like, sheet or continuous material in planar substrates, material such as Si, aluminium, glass or continuous flexiplast base material such as commercially available polycarbonate (PC) plate) the non magnetic conductive metal film of uniform deposition one deck (as Ag) on the surface, thickness is nanoscale, and this layer metal is as follow-up electroplating work procedure required conductive electrode and plated material growth basic unit.
(2) release treatment of impressing mould.With handling in the existing pattern cylindrical die immersion detackifier, carry out drying after the taking-up.Template surface after the processing becomes hydrophobicity by water wettability, and surface energy significantly reduces, and can guarantee the smooth transfer of photoresist pattern.Detackifier is general optional as alkyl trichlorosilane toluene solution.
(3) carrying out pattern then directly shifts continuously.Adopt contrary method for stamping, with the cylindrical impressing mould of patternization, pick a certain amount of photoresist, when the erosion of the resistance on mould convex surface glue rotates to when contact with suprabasil layer on surface of metal, resistance is lost glue and is adhered on the layer on surface of metal of substrate.Behind ultraviolet light polymerization, resistance erosion glue forms the masking layer of patternization on the layer on surface of metal of substrate.
(4) being masking layer with the resistance of patternization erosion glue, is the utmost point in the electroplated electrode with the metal level on the substrate surface, the magnetic material of growing on the non-blasnket area on the metal level.The thickness of electroplating the magnetic material layer of being grown is lower than the thickness of resistance erosion glue masking layer, to guarantee the pattern of magnetic material.
(5) pattern after will electroplating carries out plasma etching, makes the pattern planarization of photoresist and magnetic material layer, promptly obtains filling pattern patterned magnetic recording medium at interval by nonmagnetic substance.
The method of the direct transfer type shop drawings of pattern of the present invention pattern magnetic-recording medium relies on contrary imprint process, adopt cylindrical impressing mould rotation impression, can impress production continuously, the size of its gained pattern magnetic recording media depends on the size of impressing mould.Compare with traditional impression, it does not have impression resistance erosion glue cull when shifting pattern continuously, omitted once resistance erosion glue cull etching procedure, under the prerequisite of the size and dimension precision that has guaranteed pattern, has simplified manufacture process, has greatly improved throughput rate.
Improvements of the present invention are to adopt cylindrical impressing mould rotation to carry out continuous embossed, contrary impression and electroplating technology process combined method, continuously, directly transfer to the resistance erosion glue that is bonded on the impressing mould convex surface on the layer on surface of metal of substrate, guaranteed the continuous transfer of pattern, avoided the appearance of traditional impression resistance erosion glue cull, save resistance erosion glue cull etching procedure, simplify the manufacturing process of pattern magnetic recording media, improved throughput rate.
The present invention has improved throughput rate owing to adopted cylindrical impressing mould to carry out contrary impression, has reduced production cost, has guaranteed to shift the dimensional accuracy and the form accuracy of pattern.
The resulting patterned magnetic recording medium of the present invention can be used as the stored record medium of the magnetic memory device of high density magnetic storage class magnetic recording device or continuous base material.
Description of drawings
Fig. 1 is the non magnetic conducting metal transition film 2 of deposition in substrate 1;
Fig. 2 is the surface cylindrical impressing mould 3 of patternization;
Fig. 3 is the local enlarged diagram of cylindrical impressing mould 3, and wherein, 3a is the partial enlarged drawing of impressing mould; 3b is the cross-sectional view of impressing mould;
Fig. 4 is the schematic cross-sectional view of cylindrical impressing mould 3;
Fig. 5 is continuously contrary moulding process;
Fig. 6 is the pattern of the back photoresist 4 that obtains of impression on metal level 2 surfaces of substrate;
Fig. 7 obtains the magnetic medium layer 7 of growing in non-blasnket area for being masking layer with the photoresist 4 of patternization, be that electroplated electrode is electroplated with conducting metal transition film 2;
Fig. 8 is the pattern of the magnetic medium layer 7 at interval for adopting what obtain planarization behind the plasma etching with photoresist 8;
Label among the figure is represented respectively: 1, base material, select as Si, aluminium, glass or flexible polycarbonate (PC) plate; 2, conducting metal transition film, material are selected nonmagnetic substance, and as Ag etc., this conducting metal transition film is as the electroplated electrode layer of follow-up electroplating work procedure; 3, cylindrical impressing mould, material is selected Cu or Ni etc.; 4, photoresist is made of urethane acrylate monomer, oligomer and ultraviolet initiator; 5, ultraviolet light beam; 6, photoresist flow control container; 7, magnetic medium layer; 8, the photoresist of planarization.
Below in conjunction with accompanying drawing method for making of the present invention is done further to describe in detail.
Embodiment
Fig. 1～Fig. 8 is the manufacture craft schematic flow sheet of the direct transfer type patterned magnetic recording medium of continuous pattern.Continuous pattern of the present invention directly shifts the method for shop drawings pattern magnetic-recording medium, comprises the combination of following technology: metal deposition process (accompanying drawing 1), impressing mould surface treatment (accompanying drawing 2,3,4), imprint process (accompanying drawing 5,6), electroplating technology (accompanying drawing 7), plasma etching industrial (accompanying drawing 8).
Compare with traditional nano-imprint process, the method for preparing patterned magnetic recording medium provided by the invention, adopt contrary impression of rotation and the electroplating technology technology that combines, continuously, directly shift pattern, production process is simpler, production efficiency is higher, at aspects such as make efficiency and costs greater advantage is arranged all.
Specific implementation process of the present invention is as follows:
(1) at the nonmagnetic conducting metal transition of substrate 1 surface deposition film 2.Substrate 1 can be commercially available metallic aluminium dish or glass disc, or continuous flexible material such as polycarbonate (PC) plate.Deposit metal on substrate 1 surface with commercially available sputter, forming thickness is nano level metal transfer film 2, and this conducting metal transition film 2 is as the required conductive electrode of follow-up electroplating work procedure.
It is characteristics and structures shape by high density patterned magnetic recording media that the conducting metal transition film 2 of deposition and the material of magnetic medium layer 7 are selected.In when read-write, the magnetic line of force is by single magnetic recording unit and soft magnetosphere magnetic recording unit under the formation closed magnetic circuit of GMR read-write head with patterned magnetic recording, and the magnetic line of force by magnetic recording unit is a vertical direction.For keeping readwrite performance and high storage density preferably, the single magnetic recording unit of patterned magnetic recording medium should have good perpendicular magnetic anisotropic.
Therefore the material of conducting metal transition film 2 can be selected good conductivity and be the metal of face-centred cubic structure such as Ag etc.The electric conductivity of Ag is fine, and is face-centered cubic (fcc) structure.In follow-up electroplating work procedure 6, if be electroplated substrates with Ag, the magnetic medium layer 7 that can smooth growth has face-centered cubic (fcc) structure, after process annealing, the face-centered cubic of magnetic material (fcc) structure can change center of area four directions L1 into
0Ordered phase so just can make the patterned magnetic recording medium of manufacturing have good magnetic anisotropy in vertical direction.
The material of magnetic medium layer 7 can be selected CoPt, FePt, CoPd, FePd or Co
(n)Pt
(m), Fe
(n)Pt
(m)Deng alloy, the chemical ordered alloy of these materials is the center of area four directions L1 that generally acknowledge
0The ordered phase material has high magnetocrystalline anisotropy and magnetic moment anisotropy, L1
0The c axle of phase is an easy magnetizing axis, and the c axle is orientated perpendicular to substrate, so these have center of area four directions L1
0The alloy of ordered phase has good magnetic anisotropy in vertical direction.
(2) release treatment on impressing mould surface.For preventing the adhesion of template and photoresist in moulding process, need carry out surface treatment to template, to reduce its surface free energy.Impressing mould 3 is immersed in the detackifier (as alkyl trichlorosilane toluene solution), exist at template surface under the situation of one deck hydrone, the water molecule reaction of detackifier and template surface, produce silanol intermediate product and HCL, and then more stable network structure of crosslinked generation takes place between the adjacent silanol.Carry out drying after the taking-up, the impressing mould surface energy after the processing descends, and its antisticking effect is better, can guarantee the smooth transfer of photoresist.
(3) contrary continuously impression directly shifts pattern.When impression, cylindrical impressing mould 3 rotates above conducting metal transition film 2, be useful on the photoresist flow control container 6 of the following leakage speed of the liquid photoresist of control in cylindrical impressing mould 3 sides, the photoresist that photoresist flow control container 6 spills covers the impressing mould surface, when the photoresist on the impressing mould convex surface 4 moves to when conducting metal transition thin layer 2 in the substrate 1 contacts, because the impressing mould surface energy is lower, photoresist 4 is transferred to conducting metal transition thin layer 2 surfaces in the substrate 1, after ultraviolet light beam 5 exposures, solidify, form the photoresist pattern of no photoresist cull on conducting metal transition thin layer 2 surfaces of substrate 1.
In traditional impression operation, the impression back can residual certain thickness cull in the middle of the pattern of photoresist.For guaranteeing carrying out smoothly of follow-up electroplating work procedure, cull must be removed fully, expose conducting metal transition thin layer 2, the general method of plasma etching that adopts is removed cull in the technology, therefore might cause the loss of pattern size and dimension precision.The present invention compares with traditional impression operation, the method for stamping that adopts continuous pattern directly to shift, and the cull of no photoresist exists, and has then saved the cull of photoresist and has removed operation, can guarantee the size and the precision of pattern effectively, has improved production efficiency.
(4) plating of magnetic material.In the non-blasnket area of photoresist, be an electrode of plating with conducting metal transition thin layer 2, be masking layer with the photoresist 4 of patternization, growth magnetic medium layer 7 on the conducting metal transition thin layer 2 of non-blasnket area.For guaranteeing the pattern precision of magnetic material, the height of the general magnetic medium layer of electroplating 7 should be lower than the thickness of masking layer photoresist 4.The material of magnetic medium layer 7 can be alloy such as Co
(n)Pt
(m), Fe
(n)Pt
(m)Deng, also can be the multiple layer metal alternating structure, as alloys such as Co/Pt, Fe/Pt, Co/Pd, Fe/Pd.Carry out process annealing after the plating, can obtain to have the L1 of center of area tetragonal
0The magnetic material of ordered phase.
(5) plasma etching planarization magnetic recording media pattern.Exceed the part of magnetic medium layer 7 with plasma etching resistance erosion glue 4.When etching, selecting has protective effect and to the etching gas of magnetic material unprotect effect to photoresist, as with O
2Be the reactive ion etching (RIE) of reacting gas, can make magnetic medium layer 7 and photoresist 4 planarizations.After etching, the height of the photoresist 8 of planarization is identical with the height of magnetic medium layer 7.Obtain the patterned magnetic recording medium of isolating by nonmagnetic substance formed by the photoresist 8 of planarization and magnetic medium layer 7 thus.
Claims (7)
1, a kind of method that adopts continuous pattern directly to shift the shop drawings pattern magnetic-recording medium is characterized in that may further comprise the steps:
Step 1 at first deposits one deck conducting metal transition thin layer in substrate, this conducting metal transition thin layer is as the required conductive electrode of follow-up electroplating work procedure;
Step 2 with carrying out release treatment in the existing pattern cylindrical die immersion detackifier, is carried out drying after the taking-up, described detackifier is an alkyl trichlorosilane toluene solution;
Step 3, carrying out contrary impression pattern then directly shifts continuously, with the cylindrical impressing mould of patterning, pick an amount of photoresist, when the photoresist on the cylindrical impressing mould convex surface rotates to when contacting with suprabasil conducting metal transition thin layer, photoresist is adhered on the conducting metal transition thin layer surface of substrate; Behind ultraviolet light polymerization, photoresist forms the pattern masking layer on the conducting metal transition thin layer surface of substrate;
Step 4 in the non-blasnket area of photoresist, is an electrode of plating with conducting metal transition thin layer, is masking layer with the photoresist of patternization, growth magnetic medium layer on the conducting metal transition thin layer of non-blasnket area;
Step 5 is carried out plasma etching with the pattern after electroplating, and makes the pattern planarization of photoresist and magnetic medium layer, promptly obtains filling pattern patterned magnetic recording medium at interval by nonmagnetic substance.
2, the method for claim 1 is characterized in that, described base material is rigid substrate or flexible parent metal.
3, method as claimed in claim 2 is characterized in that, described rigid substrate is metallic aluminium or glass, and described flexible parent metal is continuous flexible polycarbonate plate.
4, the method for claim 1 is characterized in that, the material of described cylindrical impressing mould is rigid material or resilient material.
5, method as claimed in claim 4 is characterized in that, described rigid material is metal Ni or metal Cu.
6, method as claimed in claim 4 is characterized in that, described resilient material is a dimethyl silicone polymer.
7, the method for claim 1 is characterized in that, described magnetic material is CoPt, FePt, CoPd, FePd, Co
(n)Pt
(m)Perhaps Fe
(n)Pt
(m)Alloy.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2007100181242A CN100468528C (en) | 2007-06-26 | 2007-06-26 | Method for producing pattern magnetic-recording medium with continuous inverse-impression direct transfer |
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|---|---|---|---|
| CNB2007100181242A CN100468528C (en) | 2007-06-26 | 2007-06-26 | Method for producing pattern magnetic-recording medium with continuous inverse-impression direct transfer |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101976019A (en) * | 2010-11-12 | 2011-02-16 | 复旦大学 | Nano-size photoetching method and photoetching equipment for special-shaped surface |
| CN102169289A (en) * | 2011-05-17 | 2011-08-31 | 西安交通大学 | Reverse-roll imprint-moulding method of over-long grating ruler for machine tool |
| CN102193310A (en) * | 2011-05-17 | 2011-09-21 | 西安交通大学 | Method for forming grating for machine tool measurement in two-step solidifying rolling pressing forming manner |
| CN106067478A (en) * | 2016-08-08 | 2016-11-02 | 深圳市华星光电技术有限公司 | Pixel defines the manufacture method of layer and the manufacture method of OLED |
| CN110426918A (en) * | 2019-06-17 | 2019-11-08 | 集美大学 | A kind of light function textured film imprinting apparatus and method for stamping based on magnetic fluid |
| US11213976B2 (en) | 2016-12-22 | 2022-01-04 | Illumina, Inc. | Imprinting apparatus |
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2007
- 2007-06-26 CN CNB2007100181242A patent/CN100468528C/en not_active Expired - Fee Related
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101976019A (en) * | 2010-11-12 | 2011-02-16 | 复旦大学 | Nano-size photoetching method and photoetching equipment for special-shaped surface |
| CN102169289A (en) * | 2011-05-17 | 2011-08-31 | 西安交通大学 | Reverse-roll imprint-moulding method of over-long grating ruler for machine tool |
| CN102193310A (en) * | 2011-05-17 | 2011-09-21 | 西安交通大学 | Method for forming grating for machine tool measurement in two-step solidifying rolling pressing forming manner |
| CN102169289B (en) * | 2011-05-17 | 2012-07-04 | 西安交通大学 | Reverse-roll imprint-moulding method of over-long grating ruler for machine tool |
| CN102193310B (en) * | 2011-05-17 | 2012-09-05 | 西安交通大学 | Method for forming grating for machine tool measurement in two-step solidifying roll-pressing forming method |
| CN106067478A (en) * | 2016-08-08 | 2016-11-02 | 深圳市华星光电技术有限公司 | Pixel defines the manufacture method of layer and the manufacture method of OLED |
| US11213976B2 (en) | 2016-12-22 | 2022-01-04 | Illumina, Inc. | Imprinting apparatus |
| TWI823844B (en) * | 2016-12-22 | 2023-12-01 | 美商伊路米納有限公司 | An imprinting apparatus, a method of forming a working stamp, and a method of using such working stamp |
| CN110426918A (en) * | 2019-06-17 | 2019-11-08 | 集美大学 | A kind of light function textured film imprinting apparatus and method for stamping based on magnetic fluid |
| CN110426918B (en) * | 2019-06-17 | 2022-06-21 | 集美大学 | Magnetofluid-based optical function textured film imprinting device and imprinting method |
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