CN101073038B - 形成抗反射涂层的方法 - Google Patents

形成抗反射涂层的方法 Download PDF

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Publication number
CN101073038B
CN101073038B CN2005800420187A CN200580042018A CN101073038B CN 101073038 B CN101073038 B CN 101073038B CN 2005800420187 A CN2005800420187 A CN 2005800420187A CN 200580042018 A CN200580042018 A CN 200580042018A CN 101073038 B CN101073038 B CN 101073038B
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CN
China
Prior art keywords
value
electronic device
solvent
solution
silsesquioxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2005800420187A
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English (en)
Chinese (zh)
Other versions
CN101073038A (zh
Inventor
P-F·付
E·S·莫耶
C·R·耶克勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of CN101073038A publication Critical patent/CN101073038A/zh
Application granted granted Critical
Publication of CN101073038B publication Critical patent/CN101073038B/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Polymers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
CN2005800420187A 2004-12-17 2005-09-29 形成抗反射涂层的方法 Expired - Fee Related CN101073038B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US63695804P 2004-12-17 2004-12-17
US60/636,958 2004-12-17
PCT/US2005/034677 WO2006065316A1 (en) 2004-12-17 2005-09-29 Method for forming anti-reflective coating

Publications (2)

Publication Number Publication Date
CN101073038A CN101073038A (zh) 2007-11-14
CN101073038B true CN101073038B (zh) 2010-05-05

Family

ID=35759377

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800420187A Expired - Fee Related CN101073038B (zh) 2004-12-17 2005-09-29 形成抗反射涂层的方法

Country Status (7)

Country Link
US (1) US8025927B2 (https=)
EP (1) EP1825330B1 (https=)
JP (1) JP4995096B2 (https=)
KR (1) KR101253487B1 (https=)
CN (1) CN101073038B (https=)
TW (1) TWI372312B (https=)
WO (1) WO2006065316A1 (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7756384B2 (en) 2004-11-08 2010-07-13 Dow Corning Corporation Method for forming anti-reflective coating
ATE400672T1 (de) 2004-12-17 2008-07-15 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
WO2006065310A2 (en) 2004-12-17 2006-06-22 Dow Corning Corporation Siloxane resin coating
CN101371196B (zh) 2006-02-13 2012-07-04 陶氏康宁公司 抗反射涂料
US8026035B2 (en) 2007-03-30 2011-09-27 Cheil Industries, Inc. Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same
US8318258B2 (en) 2008-01-08 2012-11-27 Dow Corning Toray Co., Ltd. Silsesquioxane resins
JP2011510133A (ja) * 2008-01-15 2011-03-31 ダウ・コーニング・コーポレイション シルセスキオキサン樹脂
WO2009111122A2 (en) * 2008-03-04 2009-09-11 Dow Corning Corporation Silsesquioxane resins
JP5581224B2 (ja) * 2008-03-05 2014-08-27 ダウ・コーニング・コーポレイション シルセスキオキサン樹脂
CN102245674B (zh) * 2008-12-10 2014-12-10 陶氏康宁公司 倍半硅氧烷树脂
KR20110096155A (ko) * 2008-12-10 2011-08-29 다우 코닝 코포레이션 습식 에칭가능한 반사방지 코팅
US8999625B2 (en) 2013-02-14 2015-04-07 International Business Machines Corporation Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
CN103305036B (zh) * 2013-06-18 2016-09-14 武汉绿凯科技有限公司 一种含poss减反射膜镀膜液及其制备方法与应用
US9376589B2 (en) 2014-07-14 2016-06-28 Enki Technology, Inc. High gain durable anti-reflective coating with oblate voids
US9598586B2 (en) 2014-07-14 2017-03-21 Enki Technology, Inc. Coating materials and methods for enhanced reliability
WO2016064494A2 (en) * 2014-09-17 2016-04-28 Enki Technology, Inc. Multi-layer coatings
KR102858984B1 (ko) * 2016-02-19 2025-09-12 다우 실리콘즈 코포레이션 에이징된 중합체 실세스퀴옥산
TWI747956B (zh) 2016-09-30 2021-12-01 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法
TWI742160B (zh) 2016-09-30 2021-10-11 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
CN1523447A (zh) * 2002-12-02 2004-08-25 ϣ 光致成像波导组合物以及由此构成的波导

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4056492A (en) * 1976-06-24 1977-11-01 General Electric Company Process for the production of a bodied silicone resin without the use of a catalyst
US5320923A (en) * 1993-01-28 1994-06-14 Hewlett-Packard Company Reusable, positive-charging organic photoconductor containing phthalocyanine pigment, hydroxy binder and silicon stabilizer
DE4414653A1 (de) * 1993-05-13 1994-11-17 Gen Electric Schneller klebende Silicon-Klebstoffzusammensetzungen
JP3542185B2 (ja) * 1995-02-02 2004-07-14 ダウ コーニング アジア株式会社 シリコーンレジン、これを含む組成物およびその硬化方法
DE69622364T2 (de) * 1995-08-15 2003-01-23 Dow Corning Asia, Ltd. Härtbare polymethylsilsesquioxane, verfahren zu deren härtung und gehärtete gegenstände
US5861472A (en) * 1996-07-05 1999-01-19 Dow Corning Corporation Method of making silicone pressure sensitive adhesives
US6824879B2 (en) * 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6890448B2 (en) * 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
US6420088B1 (en) 2000-06-23 2002-07-16 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer
US20030176614A1 (en) * 2000-06-30 2003-09-18 Nigel Hacker Organohydridosiloxane resins with high organic content
US20030096090A1 (en) * 2001-10-22 2003-05-22 Boisvert Ronald Paul Etch-stop resins
WO2006065310A2 (en) 2004-12-17 2006-06-22 Dow Corning Corporation Siloxane resin coating
ATE400672T1 (de) 2004-12-17 2008-07-15 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
JP4825811B2 (ja) 2004-12-17 2011-11-30 ダウ・コーニング・コーポレイション 反射防止膜の形成方法、レジスト画像の形成方法、パターンの形成方法及び電子デバイスの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
CN1523447A (zh) * 2002-12-02 2004-08-25 ϣ 光致成像波导组合物以及由此构成的波导

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特开2001-343752A 2001.12.14

Also Published As

Publication number Publication date
KR101253487B1 (ko) 2013-04-11
WO2006065316A1 (en) 2006-06-22
US8025927B2 (en) 2011-09-27
US20080014335A1 (en) 2008-01-17
EP1825330A1 (en) 2007-08-29
EP1825330B1 (en) 2019-04-24
CN101073038A (zh) 2007-11-14
TWI372312B (en) 2012-09-11
JP4995096B2 (ja) 2012-08-08
KR20070088703A (ko) 2007-08-29
TW200622499A (en) 2006-07-01
JP2008524650A (ja) 2008-07-10

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: michigan

Patentee after: Dow organosilicon company

Address before: Michigan

Patentee before: Dow Corning Corporation

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100505

Termination date: 20200929