CN101051160A - Liquid crystal panel and its producing method - Google Patents
Liquid crystal panel and its producing method Download PDFInfo
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- CN101051160A CN101051160A CN 200710106345 CN200710106345A CN101051160A CN 101051160 A CN101051160 A CN 101051160A CN 200710106345 CN200710106345 CN 200710106345 CN 200710106345 A CN200710106345 A CN 200710106345A CN 101051160 A CN101051160 A CN 101051160A
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Abstract
A liquid crystal face plate is prepared for forming the first base plate with a numbers of sub-pixels by the first substrate, switch element array set on the first substrate, UHA on switch element array, contact hole and a reflection electrode set on UHA and electric-connected to on switch element of switch element array through said contact hole; arranging a packing component between the first and the second base plates and filling said packing component full of contact hole then setting a liquid crystal layer between the first and the second base plates.
Description
[technical field]
The present invention is about a kind of display, particularly about the reflection-type or the half-transparent half-reflection type LCD of a kind of tool high aperture and high-contrast.
[background technology]
Along with scientific-technical progress, the LCD of multinomial advantage such as have that power saving, the no width of cloth are penetrated, volume is little, low power consumption, flat square, high-res, image quality are stable, monopolized for original place the status traditional iconoscope (being called for short CRT) band Come greatest impact, especially now various information product as: products such as mobile phone, notebook computer, digital camera, PDA, LCD screen are more and more universal, also make the demand of LCD (LCD) promote greatly.
LCD can be divided into penetration, reflective and Transflective three classes again according to its light source mechanism.Wherein, penetrating LCD system provides light source by backlight module, has the excessive and surround lighting of power consumption and shows very much problems such as unclear when strong (under sunlight).Reflective liquid-crystal display then is to replace transparent electrode layer with reflection electrode layer, mainly provide light source by extraneous light, therefore do not need backlight module that light source is provided, can be applicable to outdoor large liquid crystal display billboard or increase portable electronic product in the resolution of open air etc., but, therefore under the situation of ambient light deficiency, can't act on because of there being the reflected light brightness irregularities to cause the shortcoming of reflecting brightness deficiency.For fear of the shortcoming of above-mentioned two types of LCD, and make full use of its advantage, the transflective liquid crystal display that has penetrating region and echo area then simultaneously becomes one of lcd technology of current primary development.
In addition, be the range of application of challenge LCD integral body, the display technique of LCD constantly drops into research and development Come especially and improves.Wherein, for ordered state with a kind of liquid crystal molecule, the difference of effective optical path difference under different visual angles, aspect image quality, industry just does one's utmost to drop into development wide viewing angle technology.For instance, being developed MVA (the Multi-Domain Vertical Alignment) technology that by Fujitsu just can improve upward about downwards angle of visibility to 120 degree simultaneously.In recent years Come and actually includes production line production in because the wide viewing angle technology constantly is enhanced, and this measure has allowed the improvement of LCD on the visual angle at all no less than traditional CRT.
In the technical development of present LCD, be example with the half-transparent half-reflection MVA LCD of double gap (dual gap).Usually the semi-penetration semi-reflection liquid crystal display of double gap can be provided with one at echo area R and adjust layer 121, and shown in Figure 1A, this adjusts layer can be arranged on colored filter (color filter; CF) substrate-side or thin film transistor (TFT) (thin film transister; TFT) substrate-side.Figure 1A and 1B show respectively and at present the MVA technology are applied to view and cross sectional representation on the double gap semi-penetration semi-reflection liquid crystal display.Shown in Figure 1A, the basic structure of double gap half-transparent half-reflection MVA LCD comprises array basal plate 11, a colored filter substrate 12, and a liquid crystal layer 13.Wherein, array base palte 11 has a plurality of sub picture elements district 110, and each sub picture element district 100 is equipped with an echo area R and a penetrating region T.Colored filter substrate 12 also has a plurality of sub picture elements district 120, and those sub picture element districts 120 are corresponding with a plurality of sub picture elements district 110 of array base palte respectively, and each sub picture element district 120 is being equipped with an adjustment floor 121 with the corresponding position of echo area R.13 of liquid crystal layers are located between array base palte 11 and the colored filter substrate 12.
Please continue with reference to Figure 1A, all be provided with a thin film transistor (TFT) (thin film transistor in each sub picture element district 110 of array base palte 11; TFT) (do not illustrate), and a storage capacitors 111 is in the below of echo area R.Then form a flatness layer 112 surface on array base palte 11.On flatness layer 112, produce concavo-convex surface then in echo area R, plate again have high reflectance metal (for example: aluminium, silver ... Deng) being used as reflecting electrode 113, the penetrating region T in each sub picture element district 110 also is equipped with a transparency electrode 114 simultaneously.What deserves to be mentioned is, have more a contact hole 115 in the echo area R in each sub picture element district 110 of array base palte 11, in order to electrically connect reflecting electrode 113 and storage capacitors 111.In addition, more be provided with an orientation protrusion 122 (protrusion is called for short PR) on the position of colored filter substrate 12 with respect to the echo area R of array base palte 11 and penetrating region T.Because orientation protrusion 122 can change the distribution of line of electric force, make liquid crystal molecule tilt to produce the effect of multizone LCD alignment (multi-domains) toward the direction of orientation protrusion 122, and reach the technology of wide viewing angle, and the problem of existing gray-scale inversion when improving single area LCD alignment (single-domain).Shown in Figure 1B, when upright array base palte 11 of group and colored filter substrate 12, colored filter substrate 12 more is provided with a separation material 123 (photo spacer is called for short PS) and fixes between the panel apart from (cell gap) usually.And array base palte side 11 design a plurality of with separation material 123 corresponding platforms 116, what make that separation material 123 can be more stable keeps the panel spacing.
Yet, please refer to Figure 1B, owing to aforementioned when adjusting influence that layer 121 edge and near the separation material 123 liquid crystal molecule can be subjected to difference in height and making Liquid Crystal Molecules Alignment system be an angle state, cause the situation of dark attitude light leak, make to penetrate the contrast reduction.Liquid crystal molecules in the contact hole 115 also can be subjected to the influence of pothole landform and arrange not goodly, have produced the problem that reflects dark attitude light leak equally, cause the reflection contrast to reduce.And contact hole 115 can not contributed reflectivity, so contact hole also is to make aperture opening ratio reduce.Because of the dark attitude light leak problem of above-mentioned separation material 123, the design attitude that can understand separation material 123 also must be quite careful again.All separation material 123 can be designed on some smooth positions in the past, and a platform 116 can be set usually, dark attitude light leak so a plurality of platforms 116 of liquid crystal also are arranged in each sub picture element district 110 accordingly on every side to cover separation material 123.But this kind is provided with the mode of platform 116 has reduced aperture opening ratio on the contrary, and shown in Figure 1B, the position of several standing meter separation materials 123 also all produces the problem of wasting aperture opening ratio.
In order to solve the problem that above-mentioned contrast and aperture opening ratio reduce, in present LCD manufacture craft, tend to attempt towards the direction of adjusting orientation protrusion 122, separation material 123 or contact hole 115 positions.For example, please refer to Fig. 1 C.Once disclose in No. the 20040189928th, U.S. Patent Publication No.: colored filter substrate 12 is provided with a separation material 123, and array base palte 11 is provided with a contact hole 115 equally, and separation material 123 be arranged at contact hole 115 directly over, and be butted on the both sides platform of contact hole 115 openings.In addition, above separation material 123, more be provided with a light shield layer 124 (BM),, reach the purpose that increases aperture opening ratio and promote contrast in order to cover the light leak of separation material 123 and contact hole 115 simultaneously.
[summary of the invention]
Fundamental purpose of the present invention tie up in provide a kind of display panels with and manufacture method.
Another object of the present invention is to promote the aperture opening ratio of LCD.
A further object of the present invention is to promote the image contrast of LCD.
The invention provides the reflection-type or the half-transparent half-reflection type display panels of a kind of tool high aperture and high-contrast.With the reflective liquid crystal display panel is example, and each sub picture element district of first substrate of display panels comprises a common line, a gate line, an on-off element structure, a data line, a contact hole, a storage capacitor structure, a flatness layer, a reflecting electrode and a filling member at least.Except said elements, more be provided with a light shield layer on above-mentioned contact hole, filling member, orientation protrusion or separation material, and contact hole and filling member system can be positioned at same position.
According to the formed reflective liquid crystal display panel with wide visual angle of the first embodiment of the present invention, wherein, the step that forms filling member at first substrate is to pass through a mask patterning packed layer earlier in regular turn, and packed layer is a kind of organic material for example.Then, etching is through the packed layer of exposure in follow-up manufacture craft, and the remaining part of removal, to form first block in contact hole, can make the contact hole of pothole fill and lead up this pothole via first block, and form second block again on first block, make on the relative position of contact hole, to form orientation protrusion or separation material.At last, provide second substrate and aforesaid first substrate in batch upright, and form a liquid crystal layer between first substrate and second substrate.What need pay special attention to is that the thickness of separation material approximates the thickness of liquid crystal layer, in order to as separation material, also can be used as an orientation protrusion simultaneously.Wherein, second substrate has more a plurality of orientation protrusions for example.
Formed according to a second embodiment of the present invention reflective liquid crystal display panel with wide visual angle.Wherein, filling member system comprises that first block is positioned at contact hole, and second block is positioned on first block, and the thickness of second block approximates the thickness of liquid crystal layer, in order to as a separation material, also can be used as an orientation protrusion simultaneously.What need special instruction is that system can be finished by a lithography step according to the formed filling member of the method for second embodiment, compares with first embodiment, can reduce the manufacture craft of one separation material, also can fill up contact hole simultaneously.
Therefore, display panels provided by the present invention and manufacture method system thereof are arranged at separation material and orientation protrusion on the same position, the function of promptly being used as the orientation protrusion with separation material, change the distribution of line of electric force, liquid crystal is toppled over toward separation material, can reach the effect of wide viewing angle technology equally.In addition; the present invention also is arranged at contact hole the below of separation material or orientation protrusion; and because of a light shield layer being set usually on the manufacture craft on separation material or orientation protrusion; in order to covering the dark attitude light leak problem of separation material or orientation protrusion, and then can cover the light leak of contact hole, separation material and orientation protrusion simultaneously.And contact hole system fills and leads up with an organic material for example, compare the platform in the known techniques or only utilize contact hole both sides platform to fix the method for separation material, the present invention not only can increase the aperture opening ratio of display panels, promote its image contrast, more can avoid substrate in batch to found contingent alignment error problem.
[description of drawings]
Figure 1A to Fig. 1 C system shows view and cross sectional representation on the half-transparent half-reflection liquid crystal display panel with wide visual angle of known techniques respectively;
Fig. 2 A system shows according to method of the present invention, is applied to the structure top view in the reflective liquid crystal display panel with wide visual angle;
Fig. 2 B to Fig. 2 D system shows respectively according to the first embodiment of the present invention, is applied to the manufacture craft cross sectional representation in the reflective liquid crystal display panel with wide visual angle;
Fig. 2 E to Fig. 2 G system shows respectively according to the second embodiment of the present invention, is applied to the manufacture craft cross sectional representation in the reflective liquid crystal display panel with wide visual angle;
Fig. 3 A system shows according to method of the present invention, is applied to the structure top view that double gap is partly worn anti-liquid crystal display panel with wide visual angle;
Fig. 3 B to Fig. 3 C system shows the method according to first embodiment of the invention respectively, is applied to double gap and partly wears in the anti-liquid crystal display panel with wide visual angle cross sectional representation along Fig. 3 A profile line A-A ' and B-B ';
Fig. 3 D to Fig. 3 E system shows the method according to second embodiment of the invention, is applied to double gap and partly wears in the anti-liquid crystal display panel with wide visual angle cross sectional representation along Fig. 3 A profile line A-A ' and B-B ';
Fig. 4 A system shows according to method of the present invention, is applied to the structure top view that double gap is partly worn anti-liquid crystal display panel with wide visual angle;
Fig. 4 B to Fig. 4 C system shows the method according to first embodiment of the invention, is applied to double gap and partly wears in the anti-liquid crystal display panel with wide visual angle cross sectional representation along Fig. 4 A profile line A-A ' and B-B ';
Fig. 4 D to Fig. 4 E system shows the method according to second embodiment of the invention, is applied to double gap and partly wears in the anti-liquid crystal display panel with wide visual angle cross sectional representation along Fig. 4 A profile line A-A ' and B-B ';
Fig. 5 A to Fig. 5 B system shows the method according to first embodiment of the invention, be applied to single gap partly wear anti-liquid crystal display panel with wide visual angle in along the cross sectional representation of Fig. 4 A profile line A-A ' and B-B '; And
Fig. 5 C to Fig. 5 D system shows the method according to second embodiment of the invention, be applied to single gap partly wear anti-liquid crystal display panel with wide visual angle in along the cross sectional representation of Fig. 4 A profile line A-A ' and B-B '.
[embodiment]
In Fig. 1 C, because separation material 123 must just be butted on the both sides of contact hole 115 openings, the beginning can stably be kept the panel spacing.So, slightly error on the manufacture craft, for example: separation material width, contact hole A/F, and array base palte and colored filter be at group alignment error immediately etc. all are very easy to cause the error of panel cell gap to result in the situation of qualification rate loss.
In view of this, in order to improve the problem that contrast is not good and aperture opening ratio reduces that known LCD Technology causes, the present invention proposes a kind of new design, not only can increase the aperture opening ratio of LCD by this new design, more can further promote its image contrast.
Now cooperate diagram that the present invention is described in detail in detail, and enumerate preferred embodiment and related application is described as follows:
Please refer to Fig. 2 A to 2G, it is structure top view and manufacture craft cross sectional representation that two kinds of embodiment of the present invention are applied to reflective liquid crystal display panel with wide visual angle.
At first, shown in Fig. 2 A, it is the structure top view that two kinds of embodiment of the present invention are applied to reflective liquid crystal display panel with wide visual angle.Wherein, each sub picture element district 100 of display panels comprises that at least a common line 213, a gate line 214, an on-off element structure (are exemplified as thin film transistor (TFT) (thin filmtransistor in the present embodiment; TFT)) 215, one data line 220, a contact hole (not shown), a storage capacitor structure 219, a reflecting electrode 223, a projection (being exemplified as an orientation protrusion 315) and a filling member 411, wherein semiconductor layer 211 is the below that is positioned at data line 220, can overlapping fully each other (overlap) or partly overlapping.
Except said elements, more be provided with a light shield layer 314 and (be exemplified as black matrix" black matrix; BM), be positioned at above-mentioned contact hole (not shown), filling member 411 and orientation protrusion 315 tops, though and contact hole be not shown among this figure, overlapping with filling member 411.In addition, display panels more comprises two guide holes (via) 217 (217a, 217b).Wherein, guide hole 217a is in order to connect data line 220 and on-off element 215, and guide hole 217b is then in order to connect on-off element 215 and storage capacitor structure 219.Technology contents of the present invention does being described below earlier haply in conjunction with the architectural feature of the relative position relation and the display panel of said elements with the cross-sectional view of A-A ' line among Fig. 2 A.
Please refer to Fig. 2 B to 2D, it is the manufacture craft cross-sectional view of demonstration according to the formed reflective liquid crystal display panel with wide visual angle of the first embodiment of the present invention, its structure and process for making will details are as follows: at first, shown in Fig. 2 B, be that one first substrate 20 is provided earlier.Wherein, first substrate 20 is to comprise: it is a transparent insulation substrate for example that one first substrate, 210, the first substrates 210 are provided earlier, and its material can be glass, quartz or plastic cement etc.Then form semi-conductor layer 211 in first substrate 210, form one first insulation course 212 again and be covered in semiconductor layer 211 and whole first substrate 210 tops, the material of semiconductor layer 211 is exemplified as low temperature polycrystalline silicon.Subsequently, form a metal level on first insulation course 212, patterned metal layer is to form a common electrode 213 and a grid 214 simultaneously in the upper surface of first insulation course 212 then.And the material of common electrode 213 and grid 214 can be conductive single layer or multiple layer metal or alloy, as aluminium (Al), chromium (Cr), titanium (Ti) and molybdenum and tungsten alloy (MoW) etc.One second insulation course 216 is to be formed on first insulation course 212, common electrode 213 and the gate line 214.Then, a storage capacitors electrode 218 is arranged at second insulation course, 216 tops.Thus, semiconductor layer 211, first insulation course 212, grid 215 ' have constituted on-off element 215.Semiconductor layer 211, first insulation course 212, common electrode 213, second insulation course 216 and storage capacitors electrode 218 have then constituted a storage capacitor structure 219.
In addition, it should be noted that before forming storage capacitors electrode 218, more comprise formation guide hole 217b in the step of second insulation course 216.Above-mentioned guide hole 217b runs through second insulation course 216 and first insulation course 212 in regular turn, storage capacitors electrode 218 can contact with semiconductor layer 211 by guide hole 217b, in order to allow storage capacitors electrode 218 equate, improve the usefulness of storage capacitor structure 219 with the current potential of semiconductor layer 211.
Then, a flatness layer 221 is formed on on-off element 215 and the storage capacitor structure 219.Wherein, flatness layer 221 can form by rotary coating (spin coating) or non-rotating coating modes such as (Spinless coating), and flatness layer 221 is can an insulation transparent material manufacturing.For example, the low-k photoresist of acryl system.Subsequently, patterning flatness layer 221 forms a contact hole 222 and runs through flatness layer 221 and second insulation course 216 to expose storage capacitors electrode 218.And produce concavo-convex surface structure on these flatness layer 221 surfaces, and plate a reflecting electrode 223 and be formed on the convex-concave surface structure, and electrically connect by contact hole 222 and storage capacitors electrode 218.Wherein, the material of reflecting electrode 223 is the metal with high reflectance, as: aluminium, silver, gold or combinations thereof.Hereto, the primary element of first substrate 20 of display panels is roughly constructed and is finished.
Still with reference to shown in the figure 2B, the major technique feature of present embodiment is to be to form a packed layer 410 and fill up contact hole 222 on the flatness layer 221.What need special instruction is that the photoactive material characteristic system of packed layer 410 is opposite with flatness layer 221 for example.Therefore, in a preferred embodiment, when the material of flatness layer 221 was a positive photoresist, the material of packed layer 410 was a negative photoresist: and when the material of flatness layer 221 was a negative photoresist, the material of packed layer 410 was a positive photoresist.
Subsequently, by a mask Mask patterning packed layer 410 to form a filling member 411.Wherein, form the step of filling member 411 in regular turn shown in Fig. 2 C to 2D.
Please refer to Fig. 2 C, the packed layer 410 of etching in follow-up manufacture craft through exposing, and remove remaining part, and be arranged in contact hole 222 to form one first block 411a, be used to fill up this contact hole 222.Then, please refer to Fig. 2 D, form one second block 411b again on the first block 411a, to act as separation material.At last, provide 20 groups of one second substrate 30 and aforesaid first substrates upright, and form a liquid crystal layer 50 between first substrate 20 and second substrate 30, liquid crystal layer 50 is given an example and for being the MVA type.What need pay special attention to is that the thickness of the second block 411b approximates the thickness of liquid crystal layer 50, in order to as separation material, also can be used as an orientation protrusion simultaneously.
Moreover the method system that forms second substrate 30 comprises: one second substrate 310 is provided, forms a chromatic filter layer 311 subsequently in second substrate 310.Form an overlayer 312 (overcoat) again on chromatic filter layer 311.Then, formation is positioned on the overlayer 312 with electrode 313 altogether.And second substrate 30 more comprises a plurality of projectioies (being orientation protrusion 315 for example), and is provided with light shield layer 314, be positioned at substantially filling member 411 and orientation protrusion 315 directly over or overlap each other.The Liquid Crystal Molecules Alignment mode of Fig. 2 D is that liquid crystal molecule can be toppled over towards orientation protrusion 315 and separation material 411b, reaches the performance of wide viewing angle under bright attitude drives (common electrode 313 has a voltage difference with reflecting electrode 223).
Because major technique of the present invention is characterised in that the position of display panels intermediate gap thing, ridge and contact hole, and the structure that is arranged at on-off element below the flatness layer and colored filter side is roughly identical with aforesaid first embodiment, so the second follow-up embodiment and the explanation of each related application are no longer given unnecessary details.
Please refer to Fig. 2 E to 2G, it is the manufacture craft process flow diagram of formed according to a second embodiment of the present invention reflective liquid crystal display panel with wide visual angle cross-sectional view.At first, shown in Fig. 2 E, after forming flatness layer 221, contact hole 222, reflecting electrode 223 and packed layer 410 in regular turn, impose photoetching technique in packed layer 410 by a mask Mask.Then, in follow-up manufacture craft, keep packed layer 410, and remove unexposed part, to form a filling member 411, shown in Fig. 2 F through exposure.At last, please refer to Fig. 2 G, provide 20 groups of second substrate 30 and aforesaid first substrates upright, and form liquid crystal layer 50 between first substrate 20 and second substrate 30.
Wherein, filling member 411 is to comprise that one first block 411a is positioned at contact hole 222, be used to fill up contact hole 222, and one second block 411b, be positioned on the first block 411a, and the thickness of the second block 411b approximates the thickness of liquid crystal layer 50, in order to as a separation material, also can be used as simultaneously an orientation protrusion, the first block 411a and the second block 411b form and simultaneously for one.The Liquid Crystal Molecules Alignment mode of Fig. 2 G is that liquid crystal molecule can be toppled over towards orientation protrusion 315 and separation material 411b, reaches the performance of wide viewing angle under bright attitude drives (common electrode 313 has a voltage difference with reflecting electrode 223).
In a second embodiment, be directly to utilize photoetching making technology separation material to be made in the position of contact hole.In other words, filling member 411 is can be finished by a lithography step, compares with first embodiment, not only can reduce the manufacture craft of one separation material, also can fill up contact hole simultaneously, and contingent alignment error problem when upright first substrate of minimizing group and second substrate.
Comprehensive the above, though first and second embodiment of the present invention is that example is done an explanation with reflective liquid crystal display panel with wide visual angle, range of application of the present invention is not limited in this.It more can be applicable to the situation of double gap (dual gap) half-transparent half-reflection display panels and single gap (single gap) half-transparent half-reflection display panels.Then, be described in detail as follows doing one with regard to above-mentioned application collocation diagram one by one:
Please refer to Fig. 3 A to Fig. 3 E, it is to show that respectively the method according to this invention is applied to view and cross sectional representation on the structure of one of half-transparent half-reflection display panels embodiment.
Please refer to Fig. 3 A, it is that present embodiment is applied to view on the double gap Transflective liquid crystal display panel with wide visual angle.The shown structure of Fig. 3 A is before reflecting electrode 223 forms, and just the structure of flatness layer 221 below is identical with Fig. 2 A haply, and its only difference is to have among Fig. 3 A a through electrode 224 and and adjusts layers 316.And the two textural difference is as described below.
Please refer to Fig. 3 B, is the cross sectional representation according to the formed double gap half-transparent half-reflection of first embodiment of the present invention liquid crystal display panel with wide visual angle.
At first, shown in Fig. 3 B, be cross sectional representation along Fig. 3 AA-A ' line.Wherein, each sub picture element district has an echo area R and a penetrating region R.After flatness layer 221 formed, reflecting electrode 223 was to be arranged on the flatness layer 221, and is arranged in echo area R.And first substrate 20 comprises that more through electrode 224 is arranged on the flatness layer 221 and is positioned at penetrating region T, electrically connects with reflecting electrode 223.And the architectural feature that has contact hole 222 in the flatness layer 221 is equally used so that reflecting electrode 223 electrically connects with storage capacitors electrode 218.Then, filling member 411 is arranged between first substrate 20 and second substrate 30, and fills up contact hole 222, and forms liquid crystal layer 50 between first substrate 20 and second substrate 30.
Wherein, the formation method of filling member 411 is with reference to the step of 2B to 2D figure, be that first in regular turn patterning packed layer 410 (this figure does not show) is positioned at contact hole 222 to define the first block 411a, form the second block 411b subsequently on the first block 411a, and the thickness of the second block 411b approximates the thickness of liquid crystal layer 50, in order to as a separation material, also can be used as an orientation protrusion simultaneously.
Moreover, aforementioned second substrate 30 that provides is before forming the step of common electrode 313 in second substrate 310, more comprise forming another overlayer (not shown) in second substrate 310, and another overlayer of patterning (not shown) is adjusted layer 316 in second substrate 310 to form.Wherein, the thickness of adjusting layer 316 is about 45% to 55% of liquid crystal layer 50 maximum ga(u)ges, its role is to adjust liquid crystal layer 50 and is positioned at penetrating region T and has different thickness with echo area R.In addition, second substrate 310 more comprises a plurality of orientation protrusions 315, is arranged on directly over the R of echo area.And be provided with light shield layer 314, be positioned at substantially contact hole 222, filling member 411 and orientation protrusion 315 directly over.
In addition, please comparison chart 3C again is the cross sectional representation along Fig. 3 AB-B ' line.The chromatic filter layer 311 of second substrate 30 can further be subdivided into red filter unit 311R, green filter unit 311G and blue filter unit 311B again.Three kinds of above-mentioned filter unit systems correspond respectively to each sub picture element district 100 on first substrate 20.It should be noted that with a most preferred embodiment position of filling member 411 can be arranged under the blue filter unit 311B usually.
Please refer to Fig. 3 D, is the cross sectional representation of formed according to a second embodiment of the present invention double gap half-transparent half-reflection liquid crystal display panel with wide visual angle.The difference of the display panels that Fig. 3 B and Fig. 3 D are shown is the formation method of filling member.In Fig. 3 D, be that direct patterning packed layer 410 (this figure does not indicate) is to form filling member 411.Wherein, filling member 411 comprises that the first block 411a is positioned at contact hole 222, and second block 411b on the first block 411a, and the thickness of the second block 411b approximates the thickness of liquid crystal layer 50, the first block 411a and the second block 411b form and simultaneously for one.
Furthermore, according to the method for second embodiment of the invention, the position of filling member 411 also can be arranged at red filter unit 311R and green filter unit 311G, shown in Fig. 3 E simultaneously from being not limited to blue filter unit 311B below.
Please refer to Fig. 4 A to Fig. 4 E, it is to show that respectively method according to present embodiment is applied to view and cross sectional representation on the structure of double gap half-transparent half-reflection display panels.
Please refer to Fig. 4 A, it is that the present invention is applied to view on the double gap Transflective liquid crystal display panel with wide visual angle.The shown structure of Fig. 4 A is before flatness layer 221 forms, and just the structure of flatness layer 221 below is identical with Fig. 3 A haply, and its unique difference is to adjust layers 316 differences that the position is set.And above-mentioned textural difference is as described below.
At first, shown in Fig. 4 B, be cross sectional representation along Fig. 4 AA-A ' line.Wherein, first substrate 20 has a plurality of sub picture elements district 100 equally, picture element region 100 also all has echo area R and penetrating region T each time, and reflecting electrode 223 is to be arranged in echo area R, and 224 of through electrodes are positioned at that penetrating region T goes up and electrically connect with reflecting electrode 223.Yet, after the difference of Ben Tu and Fig. 3 B is to form flatness layer 221, impose a photoetching making technology again with patterning flatness layer 221.And the step of patterning flatness layer 221 system is in regular turn for removing the part flatness layer 221 that is arranged in penetrating region T, and keeps the flatness layer 221 that is arranged in echo area R, and its thickness be about liquid crystal layer 50 thickness 45% to 55%.What specify is, remaines in the flatness layer 221 of echo area R, and its functional equivalent is in aforesaid adjustments layers 316.
As for, other architectural feature is roughly identical with Fig. 3 B, elements such as contact hole 222, reflecting electrode 223 and filling member 411 promptly is set in regular turn in first substrate 210, to form first substrate 20.And provide second substrate 30 and first substrate to stand for 20 groups, form liquid crystal layer 50 then between first substrate 20 and second substrate 30.Wherein, the manufacture method of filling member 411 is positioned at contact hole 222 for the definition first block 411a in regular turn, form the second block 411b subsequently on the first block 411a, and the thickness of the second block 411b approximates the thickness of liquid crystal layer 50, the second block 411b is roughly awl cylindricality wide at the top and narrow at the bottom.
Please refer to Fig. 4 C, is the cross sectional representation along Fig. 4 AB-B ' line.The shown architectural feature of Fig. 4 C is identical with Fig. 3 C haply, does not add at this and gives unnecessary details.Its unique difference is to adjust the difference of layer position as described above, and promptly adjusting layer (being flatness layer 221) in Fig. 4 C is to be arranged on first substrate 20.
Please refer to Fig. 4 D, is the cross sectional representation of formed according to a second embodiment of the present invention half-transparent half-reflection liquid crystal display panel with wide visual angle.Wherein, the difference of the shown display panels of Fig. 4 D and Fig. 4 B is the formation method of filling member.In Fig. 4 D, be that direct patterning packed layer 410 (this figure does not indicate) is to form filling member 411.Wherein, filling member 411 comprises that the first block 411a is positioned at contact hole 222, and the second block 411b is on the first block 411a, and the thickness of the second block 411b approximates the thickness of liquid crystal layer 50, the width of the second block 411b is roughly consistent identical, cylindrical.
Furthermore, according to the method for second embodiment of the invention, the position of filling member 411 also can be arranged at red filter unit 311R and green filter unit 311G, shown in Fig. 3 E simultaneously from being not limited to blue filter unit 311B below.
Please refer to Fig. 5 A to Fig. 5 D, it is to show the cross sectional representation that is applied to single gap half-transparent half-reflection display panels according to the method for present embodiment respectively.Wherein, the shown architectural feature of the top view of present embodiment is identical with Fig. 4 A, so do not need additionally to provide the top view of present embodiment.But it should be noted that by cross sectional representation and can learn that the difference of Ben Tu and aforementioned 3A to 4E figure is to adjust having or not of layer, that is the shown display panels of this figure only has single spacing.Therefore, above-mentioned textural difference is done with the cross-sectional view of A-A ' line among Fig. 4 A and B-B ' line haply and is described below.
Please refer to Fig. 5 A, is the cross sectional representation along Fig. 4 AA-A ' line.Wherein, first substrate 20 has a plurality of sub picture elements district 100 equally, picture element region 100 also all has echo area R and penetrating region T each time, and reflecting electrode 223 is to be arranged in echo area R, and 224 of through electrodes are positioned at that penetrating region T goes up and electrically connect with reflecting electrode 223.As shown in the figure, Fig. 5 A has the architectural feature of contact hole 222 and filling member 411 equally, and provides second substrate 30 and first substrate to stand for 20 groups, forms liquid crystal layer 50 then between first substrate 20 and second substrate 30.Wherein, the manufacture method of filling member 411 is positioned at contact hole 222 for the definition first block 411a in regular turn, form the second block 411b subsequently on the first block 411a, and the thickness of the second block 411b approximates the thickness of liquid crystal layer 50.
As above-mentioned, the difference of Fig. 5 A and Fig. 4 B promptly is, do not have among Fig. 5 A to adjust layer 316 or other are equal to the structure of adjusting layer 316.Therefore, except the difference of this architectural feature, other structure divisions of Fig. 5 B, Fig. 5 C and Fig. 5 D are identical with Fig. 4 C, Fig. 4 D and Fig. 4 E respectively, so do not given unnecessary details.
According to above-mentioned explanation, can understand technical characterictic of the present invention and be:
(1) is to integrate separation material and orientation protrusion, it is arranged on the same position, promptly be used as the function of orientation protrusion, change the distribution of line of electric force, the past separation material of liquid crystal is toppled over, can reach the effect of wide viewing angle technology equally with separation material.At this moment; the present invention is arranged at contact hole the below of separation material or orientation protrusion in the lump; and because of a light shield layer can being set usually on the manufacture craft on separation material or orientation protrusion, in order to covering the light leak problem of separation material or orientation protrusion, and then can cover the light leak of contact hole simultaneously.Not only can increase the aperture opening ratio of display panels, more can further promote its image contrast.
(2) in addition, be to fill up contact hole in first embodiment with a packing material, in order to allow separation material can stand directly on the contact hole top, kept the stable of display panels spacing.
Though the present invention illustrates as above with preferred embodiments, so it is not only to terminate in the foregoing description in order to limit the present invention's spirit with the invention entity.Usually know the knowledgeable to having in the affiliated technical field, when understanding and utilize other element or mode to produce identical effect easily.Be with, the modification of being done in not breaking away from spirit of the present invention and scope all should be included in the following claim.
Claims (20)
1. liquid crystal panel comprises:
One first substrate has a plurality of sub picture elements district, and this first substrate comprises:
One first substrate;
One switch element array is formed in this first substrate, and wherein this switch element array comprises that one first on-off element is arranged in this sub picture element district;
One flatness layer is formed on this switch element array, has a contact hole; And
One reflecting electrode is arranged on this flatness layer also by this contact hole and the electric connection of this first on-off element;
One second substrate is provided with this first substrate subtend;
One filling member between this first substrate and this second substrate, and fills up this contact hole; And
One liquid crystal layer is between this first substrate and this second substrate.
2. liquid crystal panel according to claim 1 is characterized in that, this sub picture element district have an echo area and
One penetrating region, this reflecting electrode system is arranged in this echo area, and this first substrate more comprises:
One through electrode is arranged on this flatness layer and is positioned at penetrating region, electrically connects with this reflecting electrode.
3. liquid crystal panel according to claim 2 is characterized in that, this filling member comprises:
One first block is positioned at this contact hole; And
One second block, be positioned on this first block and with this second substrate contacts, make this first block and this second block form a separation material.
4. liquid crystal panel according to claim 2 is characterized in that this flatness layer only is arranged in this echo area and is not arranged in this penetrating region, the thickness of this flatness layer be about this liquid crystal layer thickness 45% to 55%.
5. liquid crystal panel according to claim 2 is characterized in that, this second substrate comprises that one adjusts layer, is contact with this filling member, wherein the thickness of this adjustment layer be about this liquid crystal layer thickness 45% to 55%.
6. liquid crystal panel according to claim 1 is characterized in that, this second substrate more comprises a light shield layer, is positioned at substantially directly over this contact hole.
7. liquid crystal panel according to claim 1 is characterized in that, this second substrate more comprises a projection (protrusion), is positioned at substantially directly over this contact hole.
8. liquid crystal panel according to claim 7 is characterized in that, this second substrate more comprises a light shield layer, be positioned at substantially this contact hole and should projection directly over.
9. liquid crystal panel according to claim 1 is characterized in that, the material system of this filling member comprises an eurymeric photoresist, and this flatness layer material system comprises a minus photoresist.
10. liquid crystal panel according to claim 1 is characterized in that, the material system of this filling member comprises a minus photoresist, and this flatness layer material system comprises an eurymeric photoresist.
11. the manufacture method of a liquid crystal panel comprises:
One first substrate is provided, comprises:
Form an on-off element and a storage capacitors in one first substrate, wherein this storage capacitors has a top electrode and the electric connection of this on-off element;
Form a flatness layer on this on-off element and this storage capacitors;
This flatness layer of patterning makes this flatness layer have a contact hole to expose this top electrode;
Forming a reflecting electrode electrically connects on this flatness layer and by this contact hole and this top electrode; And
Form a packed layer on this reflecting electrode and fill up this contact hole;
One second substrate is provided; And
Form a liquid crystal layer between this first substrate and this second substrate.
12. method according to claim 11, it is characterized in that, this first substrate has a plurality of sub picture elements district, this sub picture element district has an echo area and a penetrating region, this reflecting electrode system is arranged in this echo area, wherein the step of this flatness layer of patterning system comprises and removes this flatness layer of part that is arranged in penetrating region, the thickness that is arranged in this flatness layer of this echo area be about this liquid crystal layer thickness 45% to 55%.
13. method according to claim 12 is characterized in that, comprises that more forming a through electrode electrically connects on this penetrating region and with this reflecting electrode.
14. method according to claim 11 is characterized in that, more comprises this packed layer of patterning to form a filling member, this filling member comprises:
One first block is positioned at this contact hole; And
One second block is positioned on this first block, and the thickness of this second block approximates the thickness of this liquid crystal layer.
15. method according to claim 11 is characterized in that, more comprises:
This packed layer of patterning is positioned at this contact hole to form one first block; And
Form one second block on this first block, the thickness of this second block approximates the thickness of this liquid crystal layer.
16. method according to claim 11 is characterized in that, provides the step system of this second substrate to comprise:
Form and use electrode altogether in one second substrate;
Form one first insulation course on this common electrode; And
This first insulation course of patterning is to form a projection, and wherein this projection system contacts with this packed layer and is positioned at substantially directly over this contact hole.
17. method according to claim 16, it is characterized in that, this first substrate has a plurality of sub picture elements district, this sub picture element district has an echo area and a penetrating region, this reflecting electrode system is arranged in this echo area, wherein, more comprise: form one second insulation course in this second substrate in forming this common electrode before this second suprabasil step; And this second insulation course of patterning adjusts layer in this top, echo area to form one, the thickness of this adjustments layer be about this liquid crystal layer thickness 45% to 55%.
18. method according to claim 17 is characterized in that, more comprises this packed layer of patterning to form a filling member, this filling member comprises:
One first block is positioned at this contact hole; And
One second block is positioned on this first block, and the thickness of this second block approximates the thickness of this liquid crystal layer.
19. method according to claim 11 is characterized in that, the material system of this packed layer comprises an eurymeric photoresist, and this flatness layer material system comprises a minus photoresist.
20. method according to claim 11 is characterized in that, the material system of this packed layer comprises a minus photoresist, and this flatness layer material system comprises an eurymeric photoresist.
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| CNB2007101063455A CN100498487C (en) | 2007-05-17 | 2007-05-17 | Liquid crystal panel and its producing method |
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