CN101026921A - Plasma generating apparatus and workpiece processing apparatus - Google Patents
Plasma generating apparatus and workpiece processing apparatus Download PDFInfo
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- CN101026921A CN101026921A CN 200710079921 CN200710079921A CN101026921A CN 101026921 A CN101026921 A CN 101026921A CN 200710079921 CN200710079921 CN 200710079921 CN 200710079921 A CN200710079921 A CN 200710079921A CN 101026921 A CN101026921 A CN 101026921A
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- 238000012545 processing Methods 0.000 title claims description 71
- 239000007789 gas Substances 0.000 claims description 105
- 230000003287 optical effect Effects 0.000 claims description 69
- 230000002950 deficient Effects 0.000 claims description 60
- 238000006243 chemical reaction Methods 0.000 claims description 35
- 238000012360 testing method Methods 0.000 claims description 31
- 230000005693 optoelectronics Effects 0.000 claims description 29
- 239000007921 spray Substances 0.000 claims description 27
- 239000013307 optical fiber Substances 0.000 claims description 24
- 238000007689 inspection Methods 0.000 claims description 19
- 230000007246 mechanism Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 230000001590 oxidative effect Effects 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 230000003760 hair shine Effects 0.000 claims description 2
- 238000005286 illumination Methods 0.000 claims description 2
- 238000001514 detection method Methods 0.000 abstract description 8
- 210000002381 plasma Anatomy 0.000 description 360
- 230000015572 biosynthetic process Effects 0.000 description 45
- 238000005755 formation reaction Methods 0.000 description 45
- 239000000758 substrate Substances 0.000 description 21
- 238000009434 installation Methods 0.000 description 15
- 238000010586 diagram Methods 0.000 description 9
- 230000006870 function Effects 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 230000009471 action Effects 0.000 description 8
- 238000004891 communication Methods 0.000 description 8
- 239000004020 conductor Substances 0.000 description 8
- 230000011514 reflex Effects 0.000 description 8
- 239000000498 cooling water Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000001816 cooling Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- 239000004809 Teflon Substances 0.000 description 4
- 229920006362 Teflon® Polymers 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000011796 hollow space material Substances 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000009832 plasma treatment Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 230000009183 running Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000032258 transport Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000803 paradoxical effect Effects 0.000 description 1
- 230000005622 photoelectricity Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000011664 signaling Effects 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/80—Apparatus for specific applications
- H05B6/806—Apparatus for specific applications for laboratory use
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Abstract
The plasma generating apparatus of the present invention includes: a microwave generating unit for generating microwaves; a gas supply unit for supplying a plasma gas; a plasma generation nozzle including a receiving member for receiving the microwave, and adapted to discharge the gas after plasmatizing the gas according to energy of the received microwave; and a light detection unit for detecting light emitted from the plasma gas to generate electrical information.
Description
Technical field
The present invention relates to realize making the plasma producing apparatus of surface of the work cleaning and/or modification and the Workpiece processing apparatus of this plasma generating means of use by to processed workpieces such as substrate irradiation plasma.
Background technology
To processed workpieces such as semiconductor substrate irradiation plasma, the Workpiece processing apparatus of removing on the surface of the work such as organic pollution, surface modification, etching, formation film or removal film are known.The for example special 2003-197397 communique of opening discloses and has used the plasma generation nozzle with concentric inboard electric conductor and outside electric conductor, by between two electric conductors, applying high-frequency impulse electric field (microwave), it or not arc discharge, but generation glow discharge, the plasma processing apparatus of generation plasma.In this device, processing gas from air supply source is circled round between the medial-lateral electric conductor, the process of guiding cavity one side from bottom one side into, generate highdensity plasma simultaneously, by being sprayed onto on the processed workpiece, under normal pressure, obtain high-density plasma from the nozzle that is installed in described cavity one side.
In described prior art, only represented the structure of plasma generation nozzle, do not had to consider how to access stable plasma (plume), left some room for improvement in this respect.
Summary of the invention
The purpose of this invention is to provide a kind of control of the illuminating state that can correctly reflect plasma and the plasma producing apparatus of demonstration, and the Workpiece processing apparatus that uses this plasma generating means.
For realizing this purpose, plasma producing apparatus of the present invention has following formation.
Plasma producing apparatus comprises: the microwave generating unit generates microwave; Gas supply part provides the gas of plasmaization; Plasma generation nozzle comprises the receiving member that receives described microwave, and according to the energy of the microwave that receives, and sprays after making described gaseous plasmaization; And optical detecting unit, detect the light that the gas of described plasmaization sends, generate electrical information.
Description of drawings
Fig. 1 is the stereogram that the integral body of the Workpiece processing apparatus of expression first embodiment of the invention constitutes.
Fig. 2 is the stereogram of the plasma generating unit different with Fig. 1 direction of visual lines.
Fig. 3 is a part of perspective side elevation view of plasma generating unit.
Fig. 4 is the end view (a plasma generation nozzle is made exploded view) that two plasma generation nozzles is amplified expression.
Fig. 5 is the V-V line profile of Fig. 4.
Fig. 6 is the perspective side elevation view that is used for illustrating the plasma generation state of plasma generation nozzle.
Fig. 7 is the in-built perspective elevation of expression slidingtype short-circuiting device.
Fig. 8 is the vertical view that is used to illustrate the plasma generating unit of circulator effect.
Fig. 9 is the perspective side elevation view of the situation that is provided with of expression stub tuner.
Figure 10 is the block diagram of the control system of expression Workpiece processing apparatus.
Figure 11 is the upward view (only representing a plasma generation nozzle) of Fig. 4.
Figure 12 is the stereogram of optical fiber installment state that is used to illustrate the distortion execution mode of first execution mode.
Figure 13 is the control system block diagram of Workpiece processing apparatus of the distortion execution mode of expression first execution mode.
Figure 14 is the whole stereogram that constitutes of the Workpiece processing apparatus of expression second embodiment of the invention.
Figure 15 is the stereogram of the plasma generating unit different with Figure 14 direction of visual lines.
Figure 16 amplifies the profile of expression to plasma generation nozzle and adapter.
Figure 17 is the exploded perspective view of the adapter represented of Figure 16.
Figure 18 is the stereogram that the mounting portion of adapter is amplified expression.
Figure 19 is the profile that schematically illustrates adapter functions.
Figure 20 amplifies the profile of expression to the plasma generation nozzle of the distortion execution mode of second execution mode and adapter.
Figure 21 is the exploded perspective view of adapter shown in Figure 20.
Figure 22 amplifies the profile of expression to the plasma generation nozzle and the adapter of other distortion execution modes of second execution mode.
Figure 23 is the exploded perspective view of adapter shown in Figure 22.
Figure 24 is the stereogram of the plasma generating unit of third embodiment of the invention.
Figure 25 is the control system block diagram of the Workpiece processing apparatus of expression the 3rd execution mode.
Figure 26 is the flow chart that expression detects the defect processing of plasma generation nozzle.
Figure 27 is that the explanation shoot part is taken the schematic diagram of the situation of plume P.
Figure 28 is the control system block diagram of the distortion execution mode of expression the 3rd execution mode.
Embodiment
With reference to the accompanying drawings various execution modes of the present invention are described.
First execution mode
Fig. 1 is the stereogram that the integral body of the Workpiece processing apparatus S of expression one embodiment of the present invention constitutes.This Workpiece processing apparatus S comprises: plasma generating unit PU (plasma producing apparatus), generate plasma, and described plasma is shone to the workpiece W as object being treated; And conveying mechanism C (travel mechanism), with prescribed path conveying workpieces W via the irradiation area of described plasma.Fig. 2 is the stereogram of the plasma generating unit PU different with Fig. 1 direction of visual lines, and Fig. 3 is the perspective side elevation view of a part.In addition, in Fig. 1～Fig. 3, establish the X-X direction and be fore-and-aft direction, Y-Y direction and be left and right directions, Z-Z direction and be above-below direction ,-directions X be the place ahead ,+directions X be the rear ,-the Y direction be left ,+the Y direction be right-hand ,-the Z direction be the below ,+the Z direction is that the top describes.
Plasma generating unit PU utilizes microwave to produce plasma at normal temperatures and pressures, comprises substantially: waveguide 10, transmit microwave; Microwave generating apparatus 20 is configured in the end (left side) of this waveguide 10, produces the microwave of provision wavelengths; Plasma generating unit 30 is arranged on the waveguide 10; Slidingtype short-circuiting device 40 is configured in the other end (right side) of waveguide 10, makes microwave reflection; Circulator 50, separation waveguide 10 sends the microwave reflection in the microwave, makes it not turn back to microwave generating apparatus 20; Dummy load 60 absorbs the microwave reflection that separates with circulator 50; And stub tuner 70, realize the impedance matching of waveguide 10 and plasma generation nozzle 31.In addition, conveying device C comprises the conveying roller 80 that is driven rotation by abridged drive unit among the figure.In the present embodiment, the expression example of conveying device C conveying flat shape workpiece W.
Waveguide 10 is made by nonmagnetic metal such as aluminium, is the elongated tubular that section is a rectangle, the microwave that is produced by microwave generating apparatus 20, transmits to plasma generating unit 30 along its length direction.Waveguide 10 is made of the connector that the waveguide member that is divided into multistage is coupled together between mutual flange part, from an end be linked in sequence the first waveguide member 11 that loads microwave generating apparatus 20, the second waveguide member 12 of stub tuner 70 is installed and the 3rd waveguide member 13 of plasma generating unit 30 be set and constitute.In addition, between the first waveguide member 11 and the second waveguide member 12, circulator 50 is set, slidingtype short-circuiting device 40 is connected the other end of the 3rd waveguide member 13.
In addition, the first waveguide member 11, the second waveguide member 12 and the 3rd waveguide member 13 use top panel, lower panel and two side panels that are made of metal plate respectively, are assembled into the square tube shape, at its two ends mounting flange.In addition, flat board assembling that also can be such, and use extrusion molding or pass through the rectangular waveguide pipe component that the tabular component Bending Processing forms, or use the waveguide of non-Splittable.In addition, be not limited to the waveguide that section is a rectangle, for example also can using, section is the waveguide of ellipse.Have again, be not limited to nonmagnetic metal, can constitute waveguide with various members with waveguide effect.
As shown in Figure 3, microwave generating apparatus 20 is arranged to the mode that microwave transmitting antenna 22 stretches out from apparatus main body portion 21, fixes in the mode that is loaded on the first waveguide member 11.In detail, apparatus main body portion 21 is loaded on the top panel 11U of the first waveguide member 11, microwave transmitting antenna 22 is through running through the through hole 111 that is arranged on the top panel 11U, fixes in the mode of the waveguide space 110 that reaches the first waveguide member, 11 inside.Utilize this formation, the microwave that sends out from microwave transmitting antenna 22, the microwave of 2.45GHz for example by waveguide 10, transmits to the other end (right side) from its end (left side).
In addition, preferably, the arrangement pitch of eight plasma generation nozzles 31 is determined according to the wavelength X G of the microwave that transmits in waveguide 10.For example preferably, 1/2 spacing, 1/4 spacing arrangement plasma generation nozzle 31 with wavelength X G, under the situation of using the 2.45GHz microwave, because λ G=230mm, so as long as with 115mm (λ G/2) spacing or 57.5mm (λ G/4) spacing arrangement plasma generation nozzle 31.
Fig. 4 amplifies the end view (one of them plasma generation nozzle 31 is depicted exploded view as) of expression to two plasma generation nozzles 31, and Fig. 5 is the V-V line sectional side view of Fig. 4.Figure 11 is the upward view of another plasma generation nozzle 31.Plasma generation nozzle 31 comprises center conductive body 32 (internal electrode), nozzle body 33 (outer electrode), nozzle bracket 34, containment member 35 and protection tube 36.
Center conductive body 32 is made by the metal that copper, aluminium, brass etc. have excellent conductive capability, constitute by the rod member about φ 1～5mm, the above-below direction configuration, its upper end 321 1 sides connect the lower panel 13B of the 3rd waveguide member 13, stretch out specific length (this part of stretching out is called reception antenna portion 320 as acceptance division) to waveguide space 130, on the other hand, the lower edge 331 of bottom 322 and nozzle body 33 is substantially on same.Be received in the microwave that transmits in the waveguide 10 by reception antenna portion 320, and give this center conductive body 32 energy of microwave (microwave power).These center conductive body 32 usefulness containment members 35 are supported on the cardinal principle middle part of length direction.
This nozzle body 33 has as the function that is configured in the external current conductor around the center conductive body 32, guarantees around center conductive body 32 to be inserted on the central shaft in tubular space 332 under the state of the annulus H (insulation gap) that stipulates.Nozzle body 33 cooperates with nozzle bracket 34, and the peripheral part of upside cylindrical portion 33U is contacted with the internal perisporium in the lower support space 341 of nozzle bracket 34, in addition, the upper surface of flange part 33F is contacted with the lower edge 343 of nozzle bracket 34.In addition, preferably, nozzle body 33 for example uses rod-shaped conductor or adjusts screw etc., is installed on the nozzle bracket 34 with mounting or dismounting fixture construction freely.
Not expression among the figure, but on this air vent 344, pipe joint etc. is installed, be used to connect the end of the air supply pipe that predetermined process gas is provided.Under the situation of the fixed position of nozzle bracket 34 cooperation, make the intercommunicating pore 333 of such air vent 344 and nozzle body 33 be in the state that is interconnected at nozzle body 33, carry out set positions separately.In addition, air seal circle 37 is clipped between nozzle body 33 and the nozzle bracket 34 from the docking section gas leakage of air vent 344 and intercommunicating pore 333 in order to suppress.
These air vents 344 and intercommunicating pore 333 also can uniformly-spaced be worn a plurality of holes at circumferencial direction, open the 2003-197397 communique as described spy in addition, can be not yet along radial direction to central hole, and along the tangential direction perforation of the outer peripheral face in described tubular space 332, make and handle gas and circle round.In addition, air vent 344 and intercommunicating pore 333 also can be not orthogonal to center conductive body 32, better circulate in order to make processing gas, are arranged to 321 1 side direction bottoms, the 322 lopsidedness perforation from the upper end.
Protection tube 36 (do not have in Fig. 5 expression) is made of the transparent quartz glass tube of specific length etc., and external diameter equates with the internal diameter in the tubular space 332 of nozzle body 33 substantially.This protection tube 36 has the function of the paradoxical discharge (sparking) that prevents in the lower edge 331 of nozzle body 33, plume P that normal injection is narrated later, and it is inserted in the described tubular space 332, stretches out a part from the lower edge 331 of nozzle body 33.In addition, protection tube 36 also can all be packed in the tubular space 332, makes its leading section consistent with lower edge 331, or than lower edge 331 more deep inboards.
Formation plasma generation nozzle 31 as above-mentioned, then nozzle body 33, nozzle bracket 34 and the 3rd waveguide member 13 (waveguide 10) become conducting state (current potential is identical), on the other hand, because the supports of the containment member 35 of center conductive body 32 usefulness insulating properties, thus with these members be electric insulating state.Therefore as shown in Figure 6, waveguide 10 is being under the state of earthing potential, reception antenna portion 320 with center conductive body 32 receives microwave, in case microwave power is offered center conductive body 32, will it bottom 322 and the lower edge 331 of nozzle body 33 near the formation electric field concentrate portion.
Under such state, if for example oxygen or the such oxygen processing gas that contains of air are offered annulus H from air vent 344, then excite processing gas, near the bottom 322 of center conductive body 32, produce plasma (ionized gas) by described microwave power.Although this plasma electron temperature is tens thousand of degree, but gas temperature (is compared with the gas temperature that neutral molecule shows for the reactive plasma near ambient temperature, the electron temperature that electronics shows is the plasma of high state very), be the plasma that under normal pressure, produces.
The processing gas of plasmaization by the air-flow of giving from air vent 344, sprays from the lower edge 331 of nozzle body 33 as plume P like this.In this plume P, comprise atomic group, for example use oxygen-containing gas, generate oxygen atomic group, can become the plume P that has decomposition and remove organic substance effect, the effect of removal diaphragm etc. as handling gas.In the plasma generating unit PU of present embodiment, arrange a plurality of plasma generation nozzles 31, so can produce the linear plume P that extends along left and right directions.
Therefore, if use such inert gas of argon gas or nitrogen, just can carry out various substrate surface cleanings and surface modification as handling gas.In addition, as using fluorochemical gas, then can become hydrophobic surface to surface modified substrate, contain the chemical compound gas of hydrophilic group by use, can be surface modified substrate hydrophilic surface.In addition, as using the chemical compound gas of containing metal element, then can on substrate, form metal film layer.
In each the plasma generation nozzle 31 that constitutes like this,, set up optical detecting unit in order to detect the light that plume P sends.In the present embodiment, optical detecting unit comprises optical fiber 38 (light conducting member) and opto-electronic conversion member 982 (Figure 10).
Just, in each plasma generation nozzle 31,, an end 381 (first end) of optical fiber 38 is installed near the described transparent protection tube 36 of its front end.One end 381 of this optical fiber 38 supports by the supporting member on the lower edge 331 that is installed in nozzle body 33 391, and its end face 3811 is closely contacted with the outer circumference surface 361 of described protection tube 36.With becket etc. the front end of an end 381 is suitably handled, and an end 381 inserts in the reach through hole 3911 of supporting members 391, fixing with Screw etc.On the other hand, as shown in figure 10, the other end 382 of optical fiber 38 (second end) is connected on the opto-electronic conversion member 982.
Supporting member 391 usefulness installation components 393 and Screw 394 etc. are fixed on the lower edge 331 of nozzle body 33.Optical fiber 38 suitably retracts, so that do not disturb air supply pipe of narrating later 922 that is connected on the air vent 344 etc., is installed in wire clamp 395 on the lower panel 13B of described the 3rd waveguide member 13.
Slidingtype short-circuiting device 40 is used to make the center conductive body 32 that is contained on each plasma generation nozzle 31 and is provided with in the bonding state optimization of the microwave of waveguide 10 internal communications, in order to change the reflection position of microwave, can adjust the standing wave figure and be connected the right-hand member of the 3rd waveguide member 13.Therefore under the situation of not utilizing standing wave, the dummy load with the effect of absorption electric wave is installed substitutes this slidingtype short-circuiting device 40.
Fig. 7 is expression slidingtype short-circuiting device 40 in-built perspective elevation.As shown in Figure 7, slidingtype short-circuiting device 40 has the cover body structure of the rectangular cross section identical with waveguide 10, and it comprises: cover body portion 41 has and uses the hollow space 410 that constitutes with waveguide 10 same materials; Reflex block 42 is cylindric, is contained in the described hollow space 410; Rectangular block 43 is mounted to one with the bottom of reflex block 42, slides along left and right directions in described hollow space 410; Travel mechanism 44 is assembled on this rectangular block 43; And adjust knob 46, directly be connected on the reflex block 42 by axle 45.
Fig. 8 is the vertical view of plasma generating unit PU that is used to illustrate the effect of circulator 50.As shown in the figure, first port 51 at circulator 50 connects the first waveguide member 11 respectively, connects the second waveguide member 12 at second port 52, connects dummy load 60 at the 3rd port 53.And, shown in arrow a, be sent to the second waveguide member 12 via second port 52 from first port 51 from the microwave that the microwave transmitting antenna 22 of microwave generating apparatus 20 produces.And from the microwave reflection of the second waveguide member, 12 incidents, shown in arrow b, from second port, 52 deflections the 3rd port 53, to dummy load 60 incidents.
The length that the waveguide short-circuit line 71 that stub tuner unit 70A～70C has is respectively given prominence to its waveguide space 120 utilizes each hook stick 72 independently to adjust.The power consumption that the outstanding length of these waveguide short-circuit lines 71 is for example sought center conductive body 32 by monitoring microwave electrical power, simultaneously decides for maximum point (microwave reflection is minimum point).In addition, such impedance matching and slidingtype short-circuiting device 40 interlocks are implemented.The operation of this stub tuner 70 preferably also is to use stepping motor etc. to carry out automatically.
Conveying device C has along a plurality of conveying rollers 80 of the transfer passage configuration of regulation, drives conveying roller 80 by abridged drive unit among the figure, and the workpiece W as process object is carried through described plasma generating unit 30.Wherein, the workpiece W as process object can exemplify out: the circuit substrate of planar substrates that plasma display or semiconductor substrate are such and actual installation electronic unit etc.In addition, also can be not the part of flat shape or assembly etc. as process object, in this case, can adopt alternative transport rollers such as conveyer belt.
Electric formation to the Workpiece processing apparatus S of first execution mode describes below.Figure 10 is the control system block diagram of expression Workpiece processing apparatus S.This control system comprises: overall control part 90, by CPU (central processing unit) 901 and its formations such as peripheral circuit; Microwave output control part 91 is made of output interface and drive circuit etc.; Gas flow control part 92; Carry control part 93; Operating portion 95 is made of display unit and guidance panel etc., and the operation signal of regulation is offered described overall control part 90; First～the 3rd transducer input part 96～98 is made of input interface and analog/digital converter etc.; Flow sensor 961; Velocity transducer 971; Drive motor 931; And flow control valve 923.
Wherein, the 3rd transducer input part 98 (efferent) constitutes the part of generation corresponding to the optical detecting unit of the electrical information of plume P, comprising: eight opto-electronic conversion members 982, multiplex adapter 983 and analog/digital (A/D) transducer 984 of the quantity of shielding cover body 981, corresponding plasma generation nozzle 31.The 3rd transducer input part 98 is configured to leave plasma generation nozzle 31.
Opto-electronic conversion member 982 is made of the photo-electric conversion elements such as photodiode that the light that plume P is sent has sensitivity.The other end 382 of optical fiber 38 is relative with the sensitive surface of opto- electronic conversion member 982, and 982 outputs of opto-electronic conversion member are corresponding to the signal of telecommunication (analog signal) of the brightness of the plume P that produces from each plasma generation nozzle 31.
91 pairs of microwave output control parts start-stop control, and output intensity control from the microwaves of microwave generating apparatus 20 outputs, generate the pulse signal of described 2.45GHz, carry out the action that the microwave of the apparatus main body 21 of microwave generating apparatus 20 takes place and control.
The flow of the processing gas that each plasma generation nozzle 31 of gas flow control part 92 subtend plasma generating units 30 provides is controlled.Specifically, air supply pipe 922 is connected high-pressure gas cylinder etc. and handles between gas source 921 and each the plasma generation nozzle 31, respectively the described flow control valve 923 that is arranged on the air supply pipe 922 is carried out switch control, and aperture is adjusted.
The action of carrying 93 pairs of control parts to make conveying roller 80 drive the drive motor 931 that rotates is controlled, to the conveying of workpiece W begin and stop, and transporting velocity etc. control.
Overall control part 90 is served as the control of total body action of this Workpiece processing apparatus S, according to the operation signal of giving from operating portion 95, supervision is from the measurement result of the flow sensor 961 of first sensor input part 96 inputs, the transporting velocity of the workpiece W that measures from the velocity transducer 971 of the second transducer input part 97 input, and the measurement result of the illuminating state of the plasma from each plasma generation nozzle 31 of the 3rd transducer input part 98 input (light that sends from plume) etc., order according to the rules is to described microwave output control part 91, gas flow control part 92, with carry control part 93 to move control.
Specifically, described CPU901 is according to the control program that pre-deposits in the first memory 902, beginning conveying workpieces W, workpiece W guiding plasma generating unit 30, the processing gas of regulation flow is offered each plasma generation nozzle 31, give microwave power simultaneously, generate plasma (plume P), limit conveying workpieces W, the limit is to the jet surface plume P of workpiece W.So a plurality of workpiece W are handled continuously.
At this moment, CPU901 detects a plurality of plasma generation nozzles 31 respectively by the optical fiber 38 that is provided with, and the light intensity according to importing the 3rd transducer input part 98 monitors the plasma illuminating state in each plasma generation nozzle 31.
Then, CPU901 reads to be measured by producer in advance and deposits the plume size in the second memory 903, that can obtain wishing and the brightness value of shape in, according to the control program that is deposited in the first memory 902, carry out switch control and aperture adjustment respectively, to reach this brightness value to described flow control valve 923.For example, in that brightness value is increased under the situation of (strengthening plume P), improve flow etc.In addition, the plasma illuminating state detected each plasma nozzle 31 shows on the display part of operating portion 95.
As adopt the Workpiece processing apparatus S of above explanation, because with Work transfer device C conveying workpieces W, make the plasma that is installed on the waveguide 10 from a plurality of arrangements generate nozzle 31 simultaneously, the gas of plasmaization is sprayed to workpiece W, so can carry out plasma treatment continuously to a plurality of processed workpieces, in addition, also can carry out plasma treatment effectively to large-area workpiece.Therefore, compare, the Workpiece processing apparatus S or the plasma generating equipment PU that various processed workpieces are carried out the plasma processing operation function admirable can be provided with the Workpiece processing apparatus of batch.And, owing to can under the temperature and pressure in the external world, generate plasma, so need not vacuum chamber etc., device structure is simplified.
In addition, make the microwave that generates from microwave generating apparatus 20, the center conductive body 32 that has with each plasma generation nozzle 31 receives, energy according to this microwave, can spray the gas of plasmaizations from plasma generation nozzle 31 separately, so the energy that microwave is had is simplified to the transmission system of each plasma generation nozzle 31.Therefore, the simplification that can implement device constitutes, cost reduction etc.
In addition, plasma generating unit 30 is a row alignment arrangements by a plurality of plasma generation nozzles 31 and forms, size t width unanimous on the whole with Width vertical with the throughput direction of flat work W, therefore, this workpiece W is only once passed through plasma generating unit 30 with conveying device C, just can finish the processing of whole of workpiece W, the efficient to the plasma treatment of flat workpiece is obviously improved.In addition, can carry out the uniform surface treatment of quality etc. at the gas of identical time jet plasmaization to the workpiece W that transports.
In addition, because light with optical fiber 38 seizure plume P, with the 3rd transducer input part 98 that is configured to separate with plasma generation nozzle 31, be transformed into the signal of telecommunication, so, be not subjected to the influence of microwave noise by carrying out faint voltage and/or the electric current that opto-electronic conversion obtains with photoelectricity translation building block 982.Therefore, in analog/digital converter 984, can correctly be transformed into the digital signal of using in control or the demonstration.Therefore, the control and the demonstration of the illuminating state of plasma can be correctly reflected, stable plume P can be obtained.In addition, owing to there is not opto-electronic conversion member 982 around plasma generation nozzle 31, institute is so that workpiece W near plasma generation nozzle 31, can shine highdensity plasma.
In addition, in shielding cover body 981 that the composed component of the 3rd transducer input part 98 is packed into, of the influence of described microwave noise can be reduced, output that is used for described control and the output that is used to show etc. can be more correctly exported the multiplex adapter 983 of handling the signal after the opto-electronic conversion and analog/digital converter 984 itself.
Continuation describes the distortion execution mode of above-mentioned first execution mode.Figure 12 is the stereogram of installment state of optical fiber 38 that is used to illustrate the distortion execution mode of first execution mode, using the same reference numerals to represent with similar, the corresponding part of the formation of Fig. 4～shown in Figure 6, has omitted the explanation to it.What pay close attention to is in this distortion execution mode, at the front end of described plasma generation nozzle 31, along the direction that the gas of plasmaization blows out, is set side by side with an end 381 (first end) of a plurality of optical fiber 38.
Specifically, for example this is shown in Figure 12, one end 381 of each optical fiber 38 is used in pair of supporting members 391A, the 391B clamping that separates in optical fiber 38 orientations, the end face 3811 that makes it is on a face, by being fastened on described supporting member 391A, the 391B, keeping and be fixed on this supporting member 391A, the 391B with Screw 396.This supporting member 391A, 391B are installed in respectively on the installation component 393 ' with Screw 394 ', and this installation component 393 ' is fixed on the lower edge 331 of described nozzle body 33 with Screw 394.
Like this, along the gas blow-off direction of plasma generation nozzle 31,, can fine monitor the intensity of plume P by end face 3811 in the face of a plurality of optical fiber 38.
Figure 13 is the control system block diagram of Workpiece processing apparatus S ' of the other distortion execution mode of expression first execution mode.The formation of representing among the formation of this Figure 13 and the Figure 10 that narrates previously is similar, and corresponding part uses the same reference numerals to represent, and has omitted the explanation to it.What pay close attention to is in this distortion execution mode, and the end face alignment surface of the other end 382 of optical fiber 38 is to an opto-electronic conversion member 982.Therefore described multiplex adapter 983 is not set, this opto-electronic conversion member 982 directly is connected on the analog/digital converter 984.
By such formation, can not detect the indivedual brightness of the plume P in each plasma generation nozzle 31, but, owing to predesignated the standard luminous quantity of the plume P in each plasma generation nozzle 31, so from the luminous quantity of a plurality of plasma generation nozzles and, can unify the several plasma generation nozzles of supervision effectively and light.
Except above-mentioned, first execution mode for example can also adopt following distortion execution mode.
(1) in the above-described embodiment, represented the example that a plurality of plasma generation nozzles 31 are configured to form a line, but the arrangement of nozzle can suitably be determined according to the shape of workpiece W and microwave electrical power etc., for example can on the throughput direction of workpiece W, be arranged in matrix, or zigzag is arranged to multiple row plasma generation nozzle 31.
(2) in the above-described embodiment, the conveying device C that uses conveying workpieces W is as mobile device, as this conveying device C, exemplified workpiece W be placed on conveying roller 80 above the mode of carrying.In addition, for example also can adopt: workpiece W is clipped in the mode of carrying between the lower roller; Do not use conveying roller, workpiece is contained in the basket etc., carry the mode of described basket etc. with the continuous productive process conveyer belt; Or with holding workpiece W such as manipulators, to the mode of plasma generating unit 30 conveyings.Perhaps also can adopt the formation that makes plasma generation nozzle one side shifting as mobile device.Just, so long as workpiece W and plasma generation nozzle 31 relatively move just passable on the face (X, Y face) that intersects with plasma irradiating direction (Z direction).
(3) in the above-described embodiment, enumerated with the magnetron that generates the 2.45GHz microwave and generated the example in source, also can use the various high frequency electric sources beyond the magnetron, in addition, also can use wavelength to be different from the microwave of 2.45GHz as microwave.
(4) in order to measure the microwave power in waveguide 10, preferably, wattmeter is arranged on the suitable position of waveguide 10.For example in order to know the ratio of the microwave power that microwave reflection power and microwave transmitting antenna 22 from microwave generating device 20 send, can the waveguide that wattmeter is equipped with in inside be clipped between the circulator 50 and second waveguide 12.
Second execution mode
Figure 14 is the stereogram that the integral body of the Workpiece processing apparatus S2 of expression second execution mode constitutes.This Workpiece processing apparatus S2 comprises plasma generating unit PU2 (plasma producing apparatus), produces plasma, shines described plasma to the workpiece W as object being treated; And conveying mechanism C, with prescribed path conveying workpieces W via the irradiation area of described plasma.Figure 15 is the stereogram of the plasma generating unit PU2 different with Figure 14 direction of visual lines.In addition, adopt same reference numerals to represent, and omit explanation these parts with Fig. 1, Fig. 2 same section.
The main difference point of first execution mode of this second execution mode and front is: the front end at plasma generation nozzle 31 is equipped with adapter 23, the blow-off outlet that the ring-type blow-off outlet conversion that this plasma generation nozzle 31 is had is grown up, and, to detect the light that the gas of plasmaization sends in the inside of this adapter 23.
In addition, difference also has, and corresponding each plasma generation nozzle 31 is provided with stub tuner unit 70X respectively, and is provided with by near the cooling tubing 39 the plasma generation nozzle 31.
Below adapter 23 parts are elaborated.Figure 16 amplifies the profile of expression to plasma generation nozzle 31 and adapter 23, and Figure 17 is the exploded perspective view of adapter 23, and Figure 18 amplifies the stereogram of expression to those mounting portions on the 3rd waveguide member 13.
The formation of plasma generation nozzle 31 and much at one shown in Figure 5, but along with mounting adapter 23 has the downside cylindrical portion 33B ' with the nozzle body 33 ' of the first execution mode different modes.Just, for mounting adapter 23, be provided with diameter reduction cylindrical portion 338 in the lower end of downside cylindrical portion 33B '.In addition, become high temperature,, on downside cylindrical portion 33B ' periphery wall, fin 339 is set so transmit to plasma generation nozzle 31 in order to suppress this heat owing to adapter 23 accumulates plasma gas in inside.
Slit plate 233,234 embeds in the groove 2323 that forms like this.Like this, form the elongated chamber, space that surrounds by slit plate 233,234 and chamber portion 2321,2322.The gas of the plasmaization that ejects from the tubular space 332 of nozzle body 33 is delivered in the groove 2323 through peristome 2324 from installation portion 231, sprays with band shape from the blow-off outlet 237 that forms between slit plate 233,234.The width W 0 of blow-off outlet 237 is enough bigger than the diameter phi in the tubular space 332 of described nozzle body 33, for example, for φ=5mm, W0=70mm.
Mounting adapter 23, as shown in figure 19, with plasma generation nozzle 31 from the tubular space 332 jet plasma oxidizing gases between center electric conductor 32 and the nozzle body 33, under the situation of irradiation position P ' the irradiation plasma of wishing to wide workpiece W, from the path L1 in tubular space 332, the plasma major part is cooled, and the ratio of disappearance increases.
And by the adapter 23 that the blow-off outlet of ring-type is become long blow-off outlet 237 is installed, even be the path of identical length to irradiation position P ', by the path L21 in the adapter 23 that becomes high temperature, plasma also is difficult to cool off.It only is after coming out from the nearest opening portion of irradiation position P ' that plasma is cooled, and to the path L22 that arrives actual irradiation position, even irradiation position P ' leaves nozzle body 33, the ratio of plasma disappearance also diminishes.Like this, need not use excessive plasma generation nozzle, the plasma generation nozzle of the minor diameter of low, the easy control of use cost only just can be equably to wide workpiece W irradiation plasma.
Wherein, light in case use the adapter 23 of the gas Temporarily Closed that sprays from plasma generation nozzle 31, just is difficult to know plasma, or oneself extinguishes.Therefore, in the present embodiment, in adapter 23, be provided with the optical sensor 24 (optical detecting unit) that detects the plasma light in the plasma chamber 232
By optical sensor 24 is set, although can not directly see the front end of plasma generation nozzle 31, can infer also that from the color of plasma light and brightness plasma just lights, still extinguish, and, can infer the temperature of plasma and size etc. from just lighting color under the situation and brightness etc.According to this testing result, control can be controlled the illuminating state of plasma to the air demand that each plasma generation nozzle 31 provides then.
In addition, in the present embodiment, use the stub tuner unit 70X of corresponding respectively each plasma generation nozzle 31 setting, can control the illuminating state of plasma.Adjust the length that the waveguide short-circuit line 71 of each stub tuner unit 70X stretches out to waveguide space 130, make the length of stretching out elongated, the energy that corresponding plasma generation nozzle 31 is consumed reduces.
As optical sensor 24, for example can use photo-electric conversion elements such as photodiode or phototriode.Preferably, arrange a plurality of these elements, or make an element divisions become a plurality of detection zones, and the filter of the selection wavelength that can discern the luminescence of plasma color is set.Penetrate on the optical sensor 24 and be provided with installing hole, penetrate to indoor, install with the method that embeds in this installing hole from plasma chamber 232 1 ends.
If plasma generation nozzle 31 of short duration runnings (for example about 5 minutes), adapter 23 becomes high temperature because of the above-mentioned plasma that accumulates in inside like that, even extinguish, if revest microwave, also lights easily., when turning round again again when plasma generation nozzle 31 starting or after stopping of short duration running etc., under the state of this adapter heat radiation, and with plasma generation nozzle 31 monomers plasma is lighted to compare, be difficult to light.Therefore,,, under the state that this adapter 23 is loaded onto, also can plasma be lighted by on adapter 23, adding this heater 25 of configuration in order to improve starting performance, and just can the uniform irradiation plasma from just lighting the back.Therefore, be particularly suitable for being interrupted and transport the so frequent Workpiece processing apparatus S2 that lights/extinguish plasma repeatedly of workpiece W to be processed.
In addition in the present embodiment, be described cooling tubing 39 by cooling water channel is set, compare with air cooling with fin, can obtain high cooling effect.Therefore, can prevent to cause the lax of center conductive body 32, can stably light, and can prevent that the heat transferred from plasma generation nozzle 31 is produced into the dewfall phenomenon to waveguide 10 when low temperature because of containment member 35 worsens.In addition, be the outlet of the microwave absorbing pipe in cooling tubing 39 usefulness pipelines 391 and the dummy load 60 that cooling water flow port 61 is connected, common cooling water is circulated, can shared cooling water cycling mechanism.
In addition, be mounted at a plurality of plasma generation nozzles 31 and be arranged in the direction vertical promptly under the situation on the length direction D2 of this waveguide 10 with workpiece W throughput direction D1, as amplifying expression among Fig. 7, the axis D3 of adapter 23 is mounted to the angle [alpha] inclination that only departs from regulation with respect to the orientation of plasma generation nozzle 31 (length direction of waveguide 10).
With such formation, can make the plasma that blows out from the length direction end of the blow-off outlet 237 of described length, and not conflict mutually between the adjacent adapter 23, near the plasma density that can be suppressed at the described end reduces.
In addition, the length direction end of this blow-off outlet 237 is seen overlapping from described throughput direction D1.Can make thus from relative plasma density low, near the blow-off outlet 237 length direction ends irradiation workpiece W plasma density substantially evenly.Lap W4 can suitably determine according to the shape of the length of chamber portion 2321,2322, blow-off outlet 237, gas flow etc.
Distortion execution mode to above-mentioned second execution mode describes below.Figure 20 is that expression is amplified the profile of expression to plasma generation nozzle 31 in the Workpiece processing apparatus of the distortion execution mode of second execution mode and adapter 23, and Figure 21 is the exploded perspective view of adapter 23, and these figure correspond respectively to Figure 16 and Figure 17.In this distortion execution mode, the installation constitution of 24 pairs of adapters 23 of optical sensor is with above-mentioned different.Remaining formation is identical with described Figure 16 and Figure 17, and corresponding part uses the same reference numerals to represent, and omits its explanation.
Specifically, from long plasma chamber 232 1 ends, extension is provided with the thin pipeline made from the material with light-proofness energy 238.At the front end of this pipeline 238, in the box of the heat insulating component 239 that constitutes by Teflon (Teflon, registered trade mark) etc., optical sensor 24 is installed.Blocking member 241 is clipped between the outlet of optical sensor 24 and pipeline 238.
In this distortion execution mode, when described optical sensor 24 is set, the light time of seizure in the plasma chamber 232 of high-temperature plasma gas is accumulated in inside, not that this optical sensor 24 is set directly in the plasma chamber 232, owing to be arranged to be clipped between heat conduction little the light wall pipe road 238 and heat insulating component 239, so can further suppress heat conduction to optical sensor 24.
Figure 22 amplifies the profile of expression to plasma generation nozzle 31 in the Workpiece processing apparatus of the other distortion execution mode of second execution mode and adapter 23, and Figure 23 is the exploded perspective view of adapter 23.In this distortion execution mode, optical sensor 24 is not installed on adapter 23, and is contained in the position of leaving this adapter 23, for example be contained on the substrate etc. of control system, described plasma light transmits by optical fiber 242.Remaining formation is identical with described Figure 16 and Figure 17, and corresponding part uses the same reference numerals to represent, and omits its explanation.
Penetrate at long plasma chamber 232 1 ends installing hole 2329 is set.Embed collector lens 243 from the inboard of installing hole 2329 with heat resistance.On the other hand, embed an end of optical fiber 242 from installing hole 2329 outsides.In the supporting member 244 of the other end of optical fiber 242 on substrate that is arranged at control system etc., across lens 245 and optical sensor 24 relative configurations.
Adopt such formation, optical sensor 24 is the influence of the heat of suspension adapter 23 not, can suppress the deterioration of optical sensor 24 etc. reliably.
The 3rd execution mode
Figure 24 is the stereogram of the plasma generating unit PU3 (plasma producing apparatus) of expression the 3rd execution mode.In addition, the part identical with Fig. 1, Fig. 2 uses the same reference numerals to represent, and omits the explanation to these parts.In the 3rd execution mode, other examples of photography portion 100 and photography direction moving part 200 have been represented to have as optical detecting unit, photography portion 100 takes from the image of the plume P of plasma generating unit 30 (plasma generation nozzle 31) ejection, according to the image of plume P, carry out the example of various controls.
Such as shown in figure 24, photography portion 100 is by using photo-electric conversion element such as CCD, can photographing moving picture or the known video camera of rest image constitute, have lens section 101 and main part 102.Main part 102 has rectangular box body, the photography direction moving part 200 that is used to make the photography direction of photography portion 100 to move in the configuration of the bottom surface of box body.
Photography direction moving part 200 comprises: place main part 102 shooting board 201, be installed in to connect the axle 202 of shooting board 201 and be installed on the axle 202 on the bottom surface of main part 102 and make the photography portion 100 fan-shaped motor that wave 203.Motor 203 is under the control of overall control part 194 shown in Figure 25, photography portion 100 is shaken along the orientation of plasma generation nozzle 31, such as shown in figure 24, photography portion 100 can take to the plasma generation nozzle 31 that is configured in right-hand member from the plasma generation nozzle 31 that is configured in left end.
Electric formation to the Workpiece processing apparatus S3 of the 3rd execution mode describes below.Figure 25 is the block diagram of the control system 90 of expression Workpiece processing apparatus S3.This control system 190 is by CPU formations such as (central processing units), and function aspects comprises: microwave output control part 191, gas flow control part 192, motor control part 193, overall control part 194.In addition, also have to overall control part 194 give the operation signal of regulation operating portion 195, control motor 203 motor control part 196 and to the fault of user notification device and show the Stateful Inspection portion 197 of the image of taking with photography portion 100.
Microwave output control part 191 carry out from the startup of microwave generating apparatus 20 output microwaves-stop to control, the control of output intensity, generate the pulse signal of regulation, the action that the apparatus main body 21 of microwave generating apparatus 20 produces microwaves is controlled.Specifically, when microwave output control part 191 receives the microwave stop signal in the operation control section 1942 of narration from behind, make microwave generating apparatus 20 stop microwave output,, make microwave generating apparatus 20 beginning microwaves outputs when operation control section 1942 receives the microwave output signal.
Gas flow control part 192 carries out the flow control of the processing gas that each the plasma generation nozzle 31 to plasma generating unit 30 provides.Specifically, air supply pipe 1922 is connected high-pressure gas cylinder etc. and handles between gas source 1921 and the plasma generation nozzle 31, the switch that is arranged on the flow control valve 1923 on the air supply pipe 1922 is controlled, and its aperture is adjusted.In addition, gas flow control part 192 is receiving under the situation of shutdown signal from operation control section 1942, closes flow control valve 1923, receiving under the situation of opening signal, open flow control valve,, adjust the aperture of flow control valve 1923 according to the level of opening signal.
In addition, in Figure 25, only represented a gas flow control part 192 and flow control valve 1923, in fact corresponded respectively to eight plasma generation nozzles 31, eight gas flow control parts 192 and flow control valve 1923 have been arranged.And eight gas flow control parts 192 are controlled respectively by overall control part 194.In addition, the number of gas flow control part 192 and flow control valve 1923 is not limited to eight, can suitably change according to the number of plasma generation nozzle 31.
The action that 193 pairs of motor control part make conveying roller 80 drive the drive motor 1931 that rotates is controlled, and begins to carry and stop the control etc. of conveying workpieces W and transporting velocity.
Just, according to the control program of giving in advance, beginning conveying workpieces W, and workpiece W guiding plasma generating unit 30, provide the processing gas of regulation flow to each plasma generation nozzle 31, and give microwave power, make it to produce plasma (plume P), conveying workpieces W on one side is on one side to the jet surface plume P of workpiece W.Like this, can handle a plurality of workpiece W continuously.
Using defective nozzle test section 1941, detect in eight plasma generation nozzles 31 and have at least under the situation of a defective nozzle, operation control section 1942 makes microwave generating apparatus 20 stop the output of microwave to microwave output control part 191 output microwave stop signals.
With defective nozzle test section 1941, detect in eight plasma generation nozzles 31 and have at least under the situation of a defective nozzle, operation control section 1942 closes flow control valve 1923 to flow control portion 192 output shutdown signals.
In addition, operation control section 1942 is microwave stop signal notice microwave output control part 191, and after gas flow control part 192 output shutdown signals, through behind the certain hour, in order to begin to generate plasma again again, to microwave output control part 191 output microwave generation signals, and to gas flow control part 192 output opening signals.
In addition, in that continuous detect for three times has a plasma generation nozzle 31 at least under the situation of defective nozzle with defective nozzle test section 1941, operation control section 1942 judges that plasma generating unit PU3 breaks down the signalling trouble Stateful Inspection portion 197 of handle assembly.
Defect processing to the plasma generation nozzle 31 that detects Workpiece processing apparatus S3 describes below.Figure 26 is the flow chart that expression detects the defect processing of plasma generation nozzle 31.At first, in step S1, the user opens abridged mains switch among the figure, and operation control section 1942 begins from source power supply each circuit supply to constituent apparatus.
In step S2, operation control section 1942 is opened flow control valve to gas flow control part 192 output opening signals, from handling gas supply source 1921 to plasma generation nozzle 31 air feed.Wherein, operation control section 1942 is all exported opening signal to eight the gas flow control parts 192 corresponding to eight plasma generation nozzles 31.
In step S3, operation control section 1942 produces microwave to microwave output control part 191 output microwave generation signals by microwave generating apparatus 20.Like this, eight plasma generation nozzles 31 produce plasma, and to the workpiece W irradiation plasma of carrying with conveying mechanism C.
In step S4, defective nozzle test section 1941 is to microwave output control part 191 output microwave output signals, and after gas flow control part 192 output opening signals, under the situation through 3 seconds (being "Yes" in S4), photography portion 100 is taken from the plume P (step S5) of plasma generation nozzle 31 ejections.On the other hand, in step S4, do not have to handle turning back to step S4 under the situation through 3 seconds (is "No" at S4).
Figure 27 is that the figure of the situation of plume P takes in explanation photography portion 100.In the example of Figure 27, the framework of photography portion 100 has the size that once can take two plume P.In addition, photography portion 100 usefulness photography direction moving parts 200 shake, and framework F is slided with certain speed v.In addition, photography portion 100 is positioned under the situation of left end of swing range, and photography portion 100 is arranged to exist in the framework F two plume P that begin first and second plasma generation nozzle 31 ejection from a left side.
At first, when defective nozzle test section 1941 is positioned at left end in photography portion 100, make photography portion 100 take the image of plume P.Then, defective nozzle test section 1941 is taken behind two plume P of first left and second plasma generation nozzle 31 ejection, passed through the shooting stand-by time of regulation, promptly enter in framework F, make photography portion 100 take plume P up to two plume P from third left and the 4th plasma generation nozzle 31 ejections.
Like this, defective nozzle test section 1941 makes the plasma generation nozzle 31 of photography portion 100 from left end, sequentially takes two at every turn, adds up to the image of taking four plume P altogether.In addition, described photography stand-by time adopts the total length predetermined value by the translational speed and the plasma generating unit 30 of photography portion 100.
In addition, the number of the plume P that photography portion 100 once takes is not limited to two, also can take one by one, can also take four at every turn, also can once take eight.
In step S6,1941 pairs of four images taking with photography portion 100 of defective nozzle test section, the image processing of enforcement regulation detects whether whole plasma generation nozzle 31 is all lighted.
Specifically, defective nozzle test section 1941 carries out extracting the treatment of picture that shows plume P out from each image of taking with photography portion 100, in each image, the image that shows plume P can be extracted out under two the situation, judges that the plasma generation nozzle 31 that generates these plumes P is normal.On the other hand, in each image, the image that shows plume P can only be extracted out under one the situation, shows perhaps under situation about also can't pump out of image of plume P that the plasma generation nozzle 31 that judgement can not spray plume P is defective nozzle.
In addition, in each image,, under the area of the plume P that extracts out the situation littler, judge that the plasma generation nozzle 31 of this plume of ejection P is a defective nozzle than setting even under the situation of extracting two plume P out.Setting adopts the value that obtains in advance in the experiment.
Wherein, in four images taking with photography portion 100, for example in first image, show in right side area under the situation of image of a plume, defective nozzle test section 1941 is judged the not plasma generation nozzle 31 generation plasmas from being positioned at left end, show in left field under the situation of image of a plume that defective nozzle test section 1941 judges that a left side plays second plasma generation nozzle 31 and produced defective.Remaining 3 image specifies out the plasma generation nozzle 31 that does not generate plasma too.
In addition, defective nozzle test section 1941 for example by the image to taking with photography portion 100, is implemented the model matching treatment with benchmark plume image, extracts the image of expression plume P out.Perhaps to image with 100 shootings of photography portion, implement YUV (brightness and colourity) conversion, indicate colourity according to the pixel in the predefined scope of the colourity of plume P, under the situation more than the certain area of regional continued presence that constitutes by the pixel that indicates, the zone that is made of this pixel is extracted out, as the image that shows plume P.
In step S6, under the situation that does not detect defective nozzle with defective nozzle test section 1941, (in S6, be "Yes"), handle turning back to step S4.Implement the shooting of photography portion 100 again.On the other hand, detecting (being "No") under the situation that has a defective nozzle at least in S6 with defective nozzle test section 1941, operation control section 1942 makes microwave generating apparatus 20 stop the output (step S7) of microwave to microwave output control part 191 output microwave stop signals.
In step S8, operation control section 1942 stops to all plasma generation nozzle 31 air feed to all gas flow control parts 192 output shutdown signals.
In step S9, judge for three times under the situation that to have a plasma generation nozzle 31 at least are defective nozzles (in S9, being "Yes") continuous with defective nozzle test section 1941, operation control section 1942 judges that plasma producing apparatus PU has fault, continue to stop microwave output, stop air feed, and continue to stop the driving (step S11) of plasma producing apparatus PU.
In step S12, operation control section 1942 makes Stateful Inspection portion 197 show the image that is used for to the out of order regulation of user report plasma producing apparatus PU.In this case, for example show in Stateful Inspection portion 197 that " first plasma generation nozzle is played on a left side and the 4th plasma generation nozzle do not spray plasma.", " first plasma generation nozzle does not spray plasma, and the 4th plasma generation nozzle ejection situation worsens." which plasma generation nozzle 31 is statements of defective nozzle in such, eight plasma generation nozzles of expression.In addition, also can in Stateful Inspection portion 197, show the expression image of all plasma generation nozzles 31 as shown in Figure 3,, defective nozzle occur with illustrated mode report defective nozzle for example red flicker etc.
In step S9, under situation about also not having (in S9, being "No") with 31 defective nozzles of defective nozzle test section 1941 continuous three judgement plasma generation nozzles, whether the processing of operation control section 1942 determining step S9 was passed through 3 seconds after ending, (in S10, be "Yes") having passed through under 3 seconds the situation, make to handle and turn back to step S2, under not having (being "No" in S10), make to handle to turn back to step S10 through 3 seconds situation.
Workpiece processing apparatus S3 according to above explanation, in order in Stateful Inspection portion 197, to show the image of taking with photography portion 100, even photography portion 100 is not set at each plasma generation nozzle 31, also can take the image of plume P, can monitor the state of plasma generation nozzle with simple formation.
In addition, take the image of the plume P that generates from plasma generation nozzle 31, based on the image of the plume P that takes, detection defective nozzle.Wherein, owing to do not spray plume P or the ejection plume P littler than normal plume from defective nozzle, so, can detect defective nozzle accurately by taking the image of plume P.
Distortion execution mode to described the 3rd execution mode describes below.Figure 28 is the block diagram of control system 190a of the Workpiece processing apparatus S3a of expression distortion execution mode.This Workpiece processing apparatus S3a is characterised in that, constitutes overall control part 194 by system control substrate 198 and microcomputer 199, and microcomputer 199 receives the image of taking with the photography 100a of portion by communication line NT.In addition, in Workpiece processing apparatus S3a, the part identical with the Workpiece processing apparatus S3 that illustrates previously adopts identical Reference numeral, omitted explanation, only difference described.
The 100a of photography portion is made of known web camera, under the control of system control substrate 198, takes the image of plume P, and NT sends to microcomputer by communication line.Communication line NT can adopt communication lines such as the Internet, public telephone line network, leased line network and LAN.
Have at least under the situation of a defective nozzle detecting in eight plasma generation nozzles 31 with defective nozzle test section 1941a, operation control section 1942a control system control basal plate 198 makes system control substrate 198 to microwave output control part 191 output microwave stop signals.
In addition, have at least under the situation of a defective nozzle detecting in eight plasma generation nozzles 31 with defective nozzle test section 1941a, operation control section 1942a control system control basal plate 198 makes system control substrate 198 output shutdown signals.
In addition, operation control section 1942a is to microwave output control part 191 notice microwave stop signals, and after gas flow control part 192 notice shutdown signals, through certain hour, in order to restart to generate plasma again, control system control basal plate 198 makes system control substrate 198 to microwave output control part 191 output microwave generation signals, and to gas flow control part 192 output opening signals.
In addition, even restart to generate microwave with stipulated number, judging that having a plasma generation nozzle 31 at least is under the situation of defective nozzle continuous three times with defective nozzle test section 1941a, judge that also plasma producing apparatus PU3 has fault, operation control section 1942a has fault to the 197a of Stateful Inspection portion report plasma producing apparatus PU3.The 197a of Stateful Inspection portion is made of the display unit with microcomputer 199.
As mentioned above, if adopt this Workpiece processing apparatus S3a, constitute overall control part 194 by microcomputer and system control substrate 198, then be connected by communication line NT with the 100a of photography portion, so can use the fault of microcomputer telemonitoring plasma producing apparatus PU3 owing to microcomputer.In addition, owing on the 197a of Stateful Inspection portion, show the image of taking with the photography 100a of portion, so can telemonitoring plasma generation nozzle 31.
Not explanation in the distortion execution mode of described the 3rd execution mode and it, but Stateful Inspection portion 197,197a also can show the image of being taken by photography portion 100,100a with infrared ray thermal image instrument.
Above Workpiece processing apparatus of the present invention and plasma producing apparatus according to first～the 3rd execution mode explanation, be fit to very much to be applied to glass substrate such as the etch processes device of semiconductor substrates such as semiconductor wafer and film formation device, plasm display panel and printed circuit board (PCB) cleaning device, in the sterilization treatment device of medicine equipment etc. and the decomposer of protein etc.
In addition, mainly comprise following invention in the above-described embodiment.
Plasma producing apparatus of the present invention comprises: the microwave generating unit produces microwave; Gas supply part provides the gas of plasmaization; Plasma generation nozzle comprises the receiving member that receives described microwave, and according to the energy of the microwave that receives, and sprays after making described gaseous plasmaization; And optical detecting unit, detect the light that the gas of described plasmaization sends, generate electrical information.
The generation state of light that the gas of plasmaization sends and plasma has correlation.According to this formation, owing to the electrical information that can obtain, so, can be used to obtain the control of stable plasma (plume) according to this information based on this light.
In this formation, preferably, have control part, according to the electrical information of described optical detecting unit output, control in the power of the quantity delivered of described plasma oxidizing gases and described microwave at least.Like this, can reliably and simply control plasma generation state.
In described formation, preferably, described optical detecting unit comprises: light conducting member, have first end and second end, and described first end is close to the front end of described plasma generation nozzle and installs; The opto-electronic conversion member with described plasma generation nozzle separate configuration, is connected on second end of described light conducting member; And efferent, the signal of telecommunication output of the signal of telecommunication that obtains by described opto-electronic conversion member as expression plasma illuminating state.
According to this formation, the faint signal of telecommunication that obtains by opto-electronic conversion is not subjected to the influence of microwave noise, in efferent, can correctly be converted to the output that is used for described control and be used for output of described demonstration etc.Like this, the control and the demonstration of plasma illuminating state can be correctly reflected, stable plume can be obtained.In addition, because the opto-electronic conversion member not around nozzle, so can make shone thing near nozzle, can shine highdensity plasma.
In this formation, preferably, described opto-electronic conversion member and efferent are contained in the shielding cover body.According to this formation, can reduce described microwave noise to the opto-electronic conversion member and the influence of the efferent of the signal after handling opto-electronic conversion itself, can more correctly be used for the output of described control and the output that is used to show etc.
In addition, if described light conducting member, is arranged side by side a plurality of described first ends along the gas emission direction of described plasma generation nozzle, then can monitor the intensity of plume more meticulously.
In addition, preferably, also comprise waveguide, arrange on it a plurality of described plasma generation nozzles are installed, transmit the microwave that is generated by described microwave generating unit, corresponding respectively each the plasma generation nozzle of described light conducting member is provided with.According to this formation, can tackle the processing of a plurality of processed workpieces or large-area processed workpiece.
In addition, preferably, second end of each light conducting member is aligned in the sensitive surface of an opto-electronic conversion member.According to this formation owing to pre-determined the luminous quantity of the standard of each plasma generation nozzle, so from the luminous quantity of a plurality of plasma generation nozzles and, can unify the several plasma generation nozzles of supervision effectively and light.
In described formation, preferably, also comprise: medial electrode and lateral electrode, being concentric shape is configured in the described plasma generation nozzle, described plasma generation nozzle makes between this medial electrode and the lateral electrode and produces glow discharge, generate plasma,, under normal pressure, spray the gas of plasmaization from the ring-type blow-off outlet between two electrodes by between described two electrodes, providing processing gas; And adapter, the blow-off outlet of described ring-type is transformed into the blow-off outlet of described length, this adapter is installed in the front end of described plasma generation nozzle, the plasma chamber that comprises the length that is communicated with described ring-type blow-off outlet, on a side of this chamber, long opening is arranged, described optical detecting unit is set, detects the indoor plasma light of described plasma.
According to this formation, because the adapter that the blow-off outlet of the ring-type of plasma generation nozzle is transformed into the blow-off outlet of described length is installed, need not use excessive plasma generation nozzle, the plasma generation nozzle of the minor diameter of low, the easy control of use cost only just can be equably to described wide workpiece irradiation plasma.
In case use such adapter, then be difficult to differentiate the plasma illuminating state., on this adapter, optical detecting unit is housed, detects the indoor plasma light of plasma, do not light so can infer from the color of plasma light and brightness that plasma is lighted still, and under situation about lighting the temperature etc. of plasma.Therefore, according to the result of this detection, can control the illuminating state of plasma reliably.
In this case, preferably, described optical detecting unit comprises optical sensor, this optical sensor is arranged on the indoor end of described plasma, and indoor at this plasma, the member with having heat resistance and light transmission is divided into described optical sensor one side and remaining interior space.
According to this formation, the plasma of plasma gas that accumulates high temperature in inside is indoor, be not optical detection device to be exposed be provided with, but the member that has heat resistance and a light transmission with glass etc. separately.Therefore, the overheated of described optical sensor can be suppressed, the described overheated influences that cause such as increase can be suppressed because of change of sensitivity and dark current.
In addition, preferably, described optical detecting unit comprises optical sensor, and this optical sensor is arranged on the front end that extends the light wall pipe road that is provided with from described plasma chamber one end.Also the overheated of described optical sensor can be suppressed with this formation, the described overheated influences that cause such as increase can be suppressed because of change of sensitivity and dark current.
In addition, preferably, described optical detecting unit comprises optical sensor and optical fiber, and it is indoor that an end face of described optical fiber is close to described plasma, and the other end of described optical fiber is connected on the described optical sensor with described adapter separate configuration.Also can suppress the overheated of optical sensor with such formation.
In described formation, described optical detecting unit comprises: photography portion, take the image of the plume that constitutes by gas from the plasmaization of described plasma generation nozzle ejection; And Stateful Inspection portion, show image with the plume of described photography portion shooting.
According to this formation, because photography portion takes from the image of the plume of plasma generation nozzle generation, Stateful Inspection portion shows the plume image of taking, so the user can directly monitor the state of plasma generation nozzle.In addition, by photography portion being configured to take the whole zone of plasma generation nozzle, even be not that each plasma generation nozzle all is provided with photography portion, also can take the image of plume, can monitor the state of plasma generation nozzle with simple formation.
In this case, preferably, also comprise: waveguide, arrange on it a plurality of described plasma generation nozzles are installed, transmit the microwave that generates by described microwave generating unit; And the defective nozzle test section, the image of the plume of taking according to described photography portion is arranged in a plurality of plasma generation nozzles from described, detects the defective nozzle that does not spray the plasma oxidizing gases.
According to this formation, because defective nozzle do not spray plume, or to compare with the plume of normal plasma generation nozzle ejection, the little plume of ejection shape is so by taking the plume image, can high Precision Detection go out the defective of plasma generation nozzle.
In this case, preferably, also have operation control section, have at least under the situation of a defective nozzle detecting with described defective nozzle test section, make all plasma generation nozzles stop to spray plume described being arranged as in a plurality of plasma generation nozzles.
According to this formation, in detecting a plurality of plasma generation nozzles, have at least under the situation of a defective nozzle, because the running of plasma producing apparatus is stopped, so can prevent invalid plasma irradiating.
In addition, preferably, described operation control section is after making the gas that stops to spray plasmaization from plasma generation nozzle reach the stipulated time, restart again from the gas of plasma generation nozzle ejection plasmaization, even restart to spray the number of times that the plasma private savings have been carried out regulation, to have a plasma generation nozzle at least be under the situation of defective nozzle detecting with described defective nozzle test section, judges that also plasma producing apparatus has fault.
According to this formation, after making plasma generation nozzle operating provisions number of times, detect that to have a plasma generation nozzle at least be under the situation of defective nozzle, judge that still plasma producing apparatus has fault, so fault that can the high Precision Detection plasma producing apparatus.
In this case, described Stateful Inspection portion is being judged under the out of order situation of plasma producing apparatus that by described operation control section if the fault of report plasma producing apparatus, then the user can discern the fault of plasma producing apparatus apace.
In described formation, preferably, also comprise the photography direction moving part, the shooting direction of described photography portion is moved along the orientation of described a plurality of plasma generation nozzles, make described photography portion take whole plasma generation nozzles.
According to this formation, even the framework of photography portion than the little situation of the scope that once can take whole plasma generation nozzles under, because shooting direction that can travelling shot portion, and can take whole plasma generation nozzles, even so under the very wide situation of the scope that the arrange regional of the plasma generation nozzle on the waveguide is crossed over, also can take the plume that generates from whole plasma generation nozzles.
Workpiece processing apparatus of the present invention to workpiece, is implemented predetermined processing to plasma irradiating, and this Workpiece processing apparatus comprises: plasma producing apparatus, shine the plasma oxidizing gases from the direction of regulation to described workpiece; And travel mechanism, on the face that the direction of illumination with the plasma oxidizing gases intersects, described workpiece and plasma producing apparatus are relatively moved, wherein, described plasma producing apparatus comprises: the microwave generating unit produces microwave; Gas supply part provides the gas of plasmaization; Plasma generation nozzle comprises the receiving member that receives described microwave, and according to the energy of the microwave that receives, and sprays after making described gaseous plasmaization; And optical detecting unit, detect the light that the gas of described plasmaization sends, generate electrical information.
According to such formation, the state that can monitor plasma generation nozzle can be provided, can shine the Workpiece processing apparatus of plasma expeditiously to workpiece.
In described formation, preferably, described optical detecting unit comprises: light conducting member, have first end and second end, and described first end is close to the front end of described plasma generation nozzle and installs; The opto-electronic conversion member with described plasma generation nozzle separate configuration, is connected on second end of described light conducting member; And efferent, the signal of telecommunication output of the signal of telecommunication that obtains by described opto-electronic conversion member as expression plasma illuminating state.
Perhaps, preferably, also comprise: medial electrode and lateral electrode, being concentric shape is configured in the described plasma generation nozzle, described plasma generation nozzle makes between this medial electrode and the lateral electrode and produces glow discharge, generate plasma,, under normal pressure, spray the gas of plasmaization from the ring-type blow-off outlet between two electrodes by between described two electrodes, providing processing gas; And adapter, the blow-off outlet of described ring-type is transformed into the blow-off outlet of described length, this adapter is installed in the front end of described plasma generation nozzle, the plasma chamber that comprises the length that is communicated with described ring-type blow-off outlet, on a side of this chamber, long opening is arranged, wherein, described optical detecting unit is set, detects the indoor plasma light of described plasma.
Perhaps, preferably, described optical detecting unit comprises: photography portion, take the image of the plume that constitutes by plasma oxidizing gases from described plasma generation nozzle ejection; And Stateful Inspection portion, show image with the plume of described photography portion shooting.
Claims (21)
1. plasma producing apparatus comprises:
The microwave generating unit generates microwave;
Gas supply part provides the gas of plasmaization;
Plasma generation nozzle comprises the receiving member that receives described microwave, and according to the energy of the microwave that receives, and sprays after making described gaseous plasmaization;
And optical detecting unit, detect the light that the gas of described plasmaization sends, generate electrical information.
2. plasma producing apparatus according to claim 1 is characterized in that, also comprises control part, according to the electrical information of described optical detecting unit output, controls in the power of the quantity delivered of described plasma oxidizing gases and described microwave at least.
3. plasma producing apparatus according to claim 1 is characterized in that,
Described optical detecting unit comprises:
Light conducting member has first end and second end, and described first end is close to the front end of described plasma generation nozzle and installs;
The opto-electronic conversion member with described plasma generation nozzle separate configuration, is connected on second end of described light conducting member;
And efferent, the signal of telecommunication output of the signal of telecommunication that obtains by described opto-electronic conversion member as expression plasma illuminating state.
4. plasma producing apparatus according to claim 3 is characterized in that, described opto-electronic conversion member and efferent are contained in the shielding cover body.
5. plasma producing apparatus according to claim 3 is characterized in that described light conducting member is provided with a plurality of, and each described first end is arranged side by side along the gas emission direction of described plasma generation nozzle.
6. plasma producing apparatus according to claim 3, it is characterized in that, also comprise waveguide, arrange on it a plurality of described plasma generation nozzles are installed, corresponding respectively each the plasma generation nozzle of the microwave that transmission is generated by described microwave generating unit, described light conducting member is provided with.
7. plasma producing apparatus according to claim 6 is characterized in that second end of each light conducting member is aligned in the sensitive surface of an opto-electronic conversion member.
8. plasma producing apparatus according to claim 1 is characterized in that also comprising:
Medial electrode and lateral electrode, being concentric shape is configured in the described plasma generation nozzle, described plasma generation nozzle makes between this medial electrode and the lateral electrode and produces glow discharge, generate plasma, by between described two electrodes, providing processing gas, under normal pressure, spray the gas of plasmaization from the ring-type blow-off outlet between two electrodes;
And adapter, the blow-off outlet of described ring-type is transformed into the blow-off outlet of described length, this adapter is installed in the front end of described plasma generation nozzle, comprises the plasma chamber of the length that is communicated with described ring-type blow-off outlet, on a side of this chamber long opening is arranged,
Wherein, described optical detecting unit is set, detects the indoor plasma light of described plasma.
9. plasma producing apparatus according to claim 8, it is characterized in that, described optical detecting unit comprises optical sensor, this optical sensor is arranged on the indoor end of described plasma, and indoor at this plasma, be divided into described optical sensor one side and remaining interior space with member with heat resistance and light transmission.
10. plasma producing apparatus according to claim 8 is characterized in that described optical detecting unit comprises optical sensor, and this optical sensor is arranged on the front end that extends the light wall pipe road that is provided with from an end of described plasma chamber.
11. plasma producing apparatus according to claim 8 is characterized in that,
Described optical detecting unit comprises optical sensor and optical fiber,
It is indoor that an end face of described optical fiber is close to described plasma, and the other end of described optical fiber is connected on the described optical sensor with described adapter separate configuration.
12. plasma producing apparatus according to claim 1 is characterized in that,
Described optical detecting unit comprises:
The image of the plume that is made of the gas from the plasmaization of described plasma generation nozzle ejection is taken by photography portion;
And Stateful Inspection portion, show image with the plume of described photography portion shooting.
13. plasma producing apparatus according to claim 12 is characterized in that also comprising:
Waveguide is arranged on it a plurality of described plasma generation nozzles is installed, and transmits the microwave that is generated by described microwave generating unit;
And the defective nozzle test section, the image of the plume of taking according to described photography portion is arranged in a plurality of plasma generation nozzles from described, detects the defective nozzle that does not spray the plasma oxidizing gases.
14. plasma producing apparatus according to claim 13, it is characterized in that, also comprise operation control section, be arranged in a plurality of plasma generation nozzles detecting with described defective nozzle test section, have at least under the situation of a defective nozzle, make all plasma generation nozzles stop to spray plume.
15. plasma producing apparatus according to claim 14, it is characterized in that, described operation control section, stop to spray the gas of plasmaization after the stipulated time making from plasma generation nozzle, restart again from the gas of plasma generation nozzle ejection plasmaization, even restart to spray the number of times that plasma has carried out regulation, to have a plasma generation nozzle at least be under the situation of defective nozzle detecting with described defective nozzle test section, judges that also plasma producing apparatus has fault.
16. plasma producing apparatus according to claim 15 is characterized in that, described Stateful Inspection portion is being judged under the out of order situation of plasma producing apparatus by described operation control section, the fault of report plasma producing apparatus.
17. plasma producing apparatus according to claim 13, it is characterized in that, also comprise the photography direction moving part, the shooting direction of described photography portion is moved along the orientation of described a plurality of plasma generation nozzles, make described photography portion take all described a plurality of plasma generation nozzles that are arranged in.
18. a Workpiece processing apparatus to workpiece, is implemented predetermined process to plasma irradiating, this Workpiece processing apparatus comprises:
Plasma producing apparatus shines the plasma oxidizing gases from the direction of regulation to described workpiece;
And travel mechanism, on the face that the direction of illumination with the plasma oxidizing gases intersects, described workpiece and plasma producing apparatus are relatively moved,
Wherein, described plasma producing apparatus comprises:
The microwave generating unit generates microwave;
Gas supply part provides the gas of plasmaization;
Plasma generation nozzle comprises the receiving member that receives described microwave, and according to the energy of the microwave that receives, and sprays after making described gaseous plasmaization;
And optical detecting unit, detect the light that the gas of described plasmaization sends, generate electrical information.
19. Workpiece processing apparatus according to claim 18 is characterized in that,
Described optical detecting unit comprises:
Light conducting member has first end and second end, and described first end is close to the front end of described plasma generation nozzle and installs;
The opto-electronic conversion member with described plasma generation nozzle separate configuration, is connected on second end of described light conducting member;
And efferent, the signal of telecommunication output of the signal of telecommunication that obtains by described opto-electronic conversion member as expression plasma illuminating state.
20. Workpiece processing apparatus according to claim 18 is characterized in that also comprising:
Medial electrode and lateral electrode, being concentric shape is configured in the described plasma generation nozzle, described plasma generation nozzle makes between this medial electrode and the lateral electrode and produces glow discharge, generate plasma, by between described two electrodes, providing processing gas, under normal pressure, spray the gas of plasmaization from the ring-type blow-off outlet between two electrodes;
And adapter, the blow-off outlet of described ring-type is transformed into the blow-off outlet of described length, this adapter is installed in the front end of described plasma generation nozzle, comprises the plasma chamber of the length that is communicated with described ring-type blow-off outlet, on a side of this chamber long opening is arranged,
Wherein, described optical detecting unit is set, detects the indoor plasma light of described plasma.
21. Workpiece processing apparatus according to claim 18 is characterized in that,
Described optical detecting unit comprises:
The image of the plume that is made of the gas from the plasmaization of described plasma generation nozzle ejection is taken by photography portion;
And Stateful Inspection portion, show image with the plume of described photography portion shooting.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
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| JP2006040222A JP4837394B2 (en) | 2006-02-17 | 2006-02-17 | Plasma generating apparatus and work processing apparatus using the same |
| JP2006040222 | 2006-02-17 | ||
| JP2006046357 | 2006-02-23 | ||
| JP2006233712 | 2006-08-30 |
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| Publication Number | Publication Date |
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| CN101026921A true CN101026921A (en) | 2007-08-29 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 200710079921 Pending CN101026921A (en) | 2006-02-17 | 2007-02-17 | Plasma generating apparatus and workpiece processing apparatus |
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| JP (1) | JP4837394B2 (en) |
| CN (1) | CN101026921A (en) |
Cited By (4)
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| CN104066456A (en) * | 2011-11-24 | 2014-09-24 | 克里奥医药有限公司 | Gas plasma disinfection and sterlisation apparatus |
| CN104174049B (en) * | 2007-11-06 | 2017-03-01 | 克里奥医药有限公司 | Adjustable applicator component and plasma body sterilizing equipment |
| CN110148861A (en) * | 2019-05-20 | 2019-08-20 | 南华大学 | Annular ion thruster electric connector temperature barrier |
| CN112383997A (en) * | 2020-10-05 | 2021-02-19 | 四川大学 | High-power microwave plasma pulverized coal cracking device |
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| CN114221202B (en) * | 2021-12-01 | 2024-06-07 | 武汉光谷信息光电子创新中心有限公司 | Photoelectric oscillator |
| CN114453345B (en) * | 2021-12-30 | 2023-04-11 | 广东鼎泰高科技术股份有限公司 | Plasma cleaning system |
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| JP2746914B2 (en) * | 1988-05-25 | 1998-05-06 | 九州日本電気株式会社 | Diffusion furnace equipment |
| JP2781996B2 (en) * | 1989-08-18 | 1998-07-30 | 株式会社日立製作所 | High temperature steam generator |
| JPH05146879A (en) * | 1991-04-30 | 1993-06-15 | Toyo Denshi Kk | Nozzle device for plasma working machine |
| JPH10189292A (en) * | 1996-12-25 | 1998-07-21 | Shimadzu Corp | Icp analyzer |
| US6039834A (en) * | 1997-03-05 | 2000-03-21 | Applied Materials, Inc. | Apparatus and methods for upgraded substrate processing system with microwave plasma source |
| JP3271618B2 (en) * | 1999-07-29 | 2002-04-02 | 日本電気株式会社 | Semiconductor manufacturing apparatus and foreign matter inspection / removal method during dry etching |
| JP2002124398A (en) * | 2000-10-17 | 2002-04-26 | Matsushita Electric Ind Co Ltd | Plasma processing method and device |
| JP4009087B2 (en) * | 2001-07-06 | 2007-11-14 | アプライド マテリアルズ インコーポレイテッド | Magnetic generator in semiconductor manufacturing apparatus, semiconductor manufacturing apparatus, and magnetic field intensity control method |
| US20040016402A1 (en) * | 2002-07-26 | 2004-01-29 | Walther Steven R. | Methods and apparatus for monitoring plasma parameters in plasma doping systems |
| JP2005095744A (en) * | 2003-09-24 | 2005-04-14 | Matsushita Electric Works Ltd | Surface treatment method of insulating member, and surface treatment apparatus for insulating member |
| JP3793816B2 (en) * | 2003-10-03 | 2006-07-05 | 国立大学法人東北大学 | Plasma control method and plasma control apparatus |
| WO2005096681A1 (en) * | 2004-03-31 | 2005-10-13 | Gbc Scientific Equipment Pty Ltd | Plasma torch spectrometer |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104174049B (en) * | 2007-11-06 | 2017-03-01 | 克里奥医药有限公司 | Adjustable applicator component and plasma body sterilizing equipment |
| CN104066456A (en) * | 2011-11-24 | 2014-09-24 | 克里奥医药有限公司 | Gas plasma disinfection and sterlisation apparatus |
| CN104066456B (en) * | 2011-11-24 | 2016-11-23 | 克里奥医药有限公司 | Gaseous plasma sterilization and sterilizing installation |
| CN110148861A (en) * | 2019-05-20 | 2019-08-20 | 南华大学 | Annular ion thruster electric connector temperature barrier |
| CN112383997A (en) * | 2020-10-05 | 2021-02-19 | 四川大学 | High-power microwave plasma pulverized coal cracking device |
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| JP2007220501A (en) | 2007-08-30 |
| JP4837394B2 (en) | 2011-12-14 |
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