CN101008077B - 单阴极等离子沉积非晶、纳米晶层的方法 - Google Patents
单阴极等离子沉积非晶、纳米晶层的方法 Download PDFInfo
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Abstract
本发明提供了一种单阴极等离子沉积非晶、纳米晶层的方法,适用于在单晶硅或SiO 2表面形成非晶+次表层纳米晶沉积层,涉及到辉光溅射沉积非晶、纳米晶工艺以及沉积材料种类。其特征在于:采用单阴极结构辉光溅射装置及方法,以Mg、Al合金靶材为阴极,阴极电压:300-650V,Ar气气压:20-45Pa,上述单晶硅或SiO 2与靶材垂直间距为:30-40mm。该技术为制备非晶薄膜开辟了新的材料体系与工艺方法。
Description
技术领域
本发明提供了一种单阴极等离子沉积非晶、纳米晶层的方法,适用于在金属及单晶硅或SiO2表面表面制备具备良好的结构性能(耐蚀、耐磨)以及物理性能的改性表层领域,涉及到辉光溅射沉积非晶、纳米晶工艺以及沉积材料种类。
背景技术
随着人类认识的发展和技术的进步,从20世纪50年代涌现了若干新型非晶态材料,包括非晶合金、纳米晶、非晶半导体、非晶超导体、非晶离子导体和有机高分子玻璃等。“非晶”是指组成材料的原子呈短程有序而长程无序的状态,“纳米晶”是指材料的晶粒尺寸小于100nm的材料。非晶合金中原子的混乱排列情况类似于玻璃,故又称为金属玻璃。大块非晶合金材料具有良好的物理性能、化学性能以及机械性能。例如,Zr基非晶合金的同时拥有高的抗拉强度、高的屈服强度、高的断裂韧性、高的冲击断裂能、高的疲劳强度、高的耐蚀性能等。因而非晶合金材料在航天航空、汽车、精密制造、电子通讯与计算机、生物医学等领域有着广泛的应用前景。目前所制备大块非晶材料种类基本可以分为铁基与非铁基(主要包括Mg基、La基、Pd基、Zr基、Ti基等)。非晶的制备工艺涉及将合金从液态或气态快速凝固,凝固过程中的冷却速度非常快,以致将原子的液体组态冻结下来。常用的制备非晶的方法根据所形成的非晶的尺寸范围(2维、3维)可分为:1.非晶薄膜:磁控溅射法、离子束增强沉积法、激光快速凝固法等;2.块体非晶:铜模吸铸法、粉末冶金技术、熔体水淬法、压铸法、非晶条带直接复合等。上述这些方法尚无法实现在纯金属自身表面形成单元非晶层。
发明内容
本发明的目的在于通过辉光等离子轰击溅射沉积为手段,提供一种单阴极等离子沉积非晶、纳米晶层的方法,能在纯金属或单晶硅或SiO2表面表面形成非晶+次表层纳米晶沉积层,该沉积层表面具有优异的机械性能。
一种单阴极等离子沉积非晶、纳米晶层的方法,适用于在纯金属表面自形成非晶+次表层纳米晶沉积层,其特征在于:采用单阴极结构辉光溅射装置及方法,单阴极辉光溅射工艺为:阴极电压:300-650V;Ar气气压:20-45Pa。
一种单阴极等离子沉积非晶、纳米晶层方法,适用于在单晶硅或SiO2表面形成非晶+次表层纳米晶沉积层,其特征在于:采用单阴极结构辉光溅射装置及方法,以mg,Al合金靶材为阴极,阴极电压:300-650V;Ar气气压:20-45Pa,单晶硅或SiO2表面与靶材垂直间距为:30-40mm。通过调节靶材电压、靶材与单晶硅或SiO2表面之间的距离以及通入真空室中的Ar气气压,达到控制靶材的溅射量与非金属表面的温度。
本发明的优点:非晶是一种新型材料,它具有很多优良的性能,如具有高的强度、硬度、耐磨性、耐蚀性、超塑性及较好的软磁性等良好的性能。其中在化学性质中最有价值的是具有优异的耐蚀性能。非晶合金在化学结构方面由单一的均匀固体相组成,没有晶体那样的结构缺陷,如位错、晶格缺陷、晶界、孪晶、层错等。非晶态合金中排列是长程无序的,所以非晶合金的这种化学结构的均一性,使得非晶态合金具有良好的耐腐蚀性能。本发明利用辉光轰击溅射技术,既能够在纯金属表面大面积的得到其他技术所无法得到的纯金属元素的非晶薄膜,同时也可以在单晶硅或SiO2表面表面形成非晶薄膜,因此该技术为制备非晶薄膜开辟了新的材料体系与工艺方法。
附图说明:
图1是纯铁表面形成的非晶薄膜的透射电镜照片。其中图1(a)是非晶薄膜的形貌;图1(b)是衍射花样。
图2是纯铁次表面形成的纳米晶的透射电镜照片。其中图2(a)是纳米晶的
图3是单晶Si基片上形成MgAlSi非晶合金的SEM照片。
图4是单晶Si基片上形成MgAlSi非晶合金的表面形貌SEM照片。
图5是纯钛表面形成的非晶+纳米晶合金的SEM照片。
图6是SiO2基片上形成MgAlSi非晶合金的SEM照片。
图3中标号名称:1为MgAlSi非晶薄膜。
具体实施方案
下面结合实施例对本发明作进一步详细说明。
实例一:
图1(a)为以纯铁为阴极,经过3小时等离子轰击沉积,得到的表层为非晶透射电镜照片,其中沉积工艺为:靶材600V,气压为30Pa,沉积时间3h。图1(b)为非晶薄膜衍射花样。由于衍射花样为典型的非晶晕斑,因此可以证明纯铁表层形成了非晶薄膜。图2(a)为该试样次表层形成的纳米晶的透射电镜照片,可见该纳米晶的晶粒尺寸小于10nm,次表层的衍射花样,如图2(b)表明其具有纳米晶特有的断续衍射环。纯铁经离子轰击表面形成的非晶+纳米晶沉积层的硬度(HV239)较未处理的纯铁的硬度(HV162)有了明显提高。
实例二:
图3为以纯Mg、Al合金为靶材,在单晶硅表面形成的MgAlSi非晶合金薄膜的SEM照片,其中沉积工艺为:靶材600V,气压为30Pa,靶材与单晶硅间距为35mm,沉积时间3h。图4为MgAlSi非晶合金薄膜的表面形貌。因此,可见辉光等离子沉积技术可以在非金属表面沉积表面非晶薄膜+次表面纳米晶金属沉积层。
实例三:
图5为以纯Ti为阴极,经过3小时等离子轰击沉积,得到的表层为非晶+次表层纳米晶的SEM照片,其中沉积工艺为:靶材600V,气压为30Pa,沉积时间3h。图6为纯Mg、Al合金为靶材,在二氧化硅表面形成的MgAlSi非晶合金薄膜的SEM照片,其中沉积工艺为:靶材600V,气压为30Pa,靶材与单晶硅间距为35mm,沉积时间3h。从图可见这两种材料表面形成的非晶+纳米晶表面层的致密、连续且与基体材料结合良好。
Claims (1)
1.一种单阴极等离子沉积非晶、纳米晶层方法,适用于在单晶硅或SiO2表面形成非晶+次表层纳米晶沉积层,其特征在于:采用单阴极结构辉光溅射装置及方法,以mg、Al合金靶材为阴极,阴极电压:300-650V,Ar气气压:20-45Pa,上述单晶硅或SiO2与靶材垂直间距为:30-40mm。
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