CN100583393C - Acid washing technique of diode flowing out from acid washing machine - Google Patents

Acid washing technique of diode flowing out from acid washing machine Download PDF

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Publication number
CN100583393C
CN100583393C CN200810124575A CN200810124575A CN100583393C CN 100583393 C CN100583393 C CN 100583393C CN 200810124575 A CN200810124575 A CN 200810124575A CN 200810124575 A CN200810124575 A CN 200810124575A CN 100583393 C CN100583393 C CN 100583393C
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China
Prior art keywords
cleaning
time
diode
deionized water
ultrasonic
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN200810124575A
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Chinese (zh)
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CN101345185A (en
Inventor
陆国华
吴亚红
陈炎
丁维新
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RUGAO RIXIN ELECTRONIC CO Ltd
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Priority to CN200810124575A priority Critical patent/CN100583393C/en
Publication of CN101345185A publication Critical patent/CN101345185A/en
Application granted granted Critical
Publication of CN100583393C publication Critical patent/CN100583393C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The invention discloses an acid cleaning process used for a diode, which consists of four times of cleaning; the former three times of cleaning are carried out in deionized water by using ultrasonic under the conditions of identical ultrasonic powder and different resistivity, temperature and flux. The cleaning of the first time is carried out in the deionized water with a certain flux under the heating condition; the cleaning of the second time and the third time are carried out only in the deionized water; the cleaning of the fourth time uses the anhydrous alcohol to carry out the dehydration on the diode. The process of the invention effectively removes the impurities on the surface of the diode by the cleaning under the conditions of heating and ultrasonic, and leads the surface of the diode to be cleaner; the deionized water is used, thus saving the water resource; the cleaning time is shortened and the production efficiency is improved by the multi-step cleaning.

Description

A kind of cleaning of the diode that pickling machine is flowed out
Technical field
The present invention relates to a kind of cleaning of diode, be specifically related to a kind of by ultrasonic wave, heat and clean, the cleaning of the diode that pickling machine is flowed out.
Background technology
At present, two kinds of common cleaning and ultrasonic waves for cleaning are taked in the cleaning of diode.Common cleaning is when cleaning products, and the cleannes of product are not enough, influence product quality.Though ultrasonic waves for cleaning has improved the cleannes of product, still can not tackle the problem at its root, and scavenging period is long relatively slightly.
Summary of the invention
The invention provides a kind of by ultrasonic wave, the cleaning of the diode that pickling machine is flowed out that cleans of heating.
In order to solve above technical problem, the cleaning of a kind of diode that pickling machine is flowed out of the present invention, be made of four cleanings, all use ultrasonic waves for cleaning in first three time cleaned, its innovative point is: clean the cleaning of heating in the deionized water of certain flow the described first time; Only clean for the second time and for the third time and in deionized water, clean; The 4th cleaning dewatered to diode for absolute ethyl alcohol.
Deionization resistivity of water 〉=10M Ω CM that clean the described first time.
Temperature 45-50 ℃ of the deionized water that described first time cleans.
The flow of the deionized water that clean the described first time is 450-550L/h.
The water of described second and third time cleaning is deionized water.
Described the 4th cleaning absolute ethyl alcohol dewaters to diode.
All clean the ultrasonic wave that all uses 1KW, guarantee to clean fully.
The advantage of above technology is:
1, adopts above-mentioned technology,, effectively remove the impurity on diode surface, the diode surface is more cleaned by the ultrasonic waves for cleaning of heating.
2, connect use deionized water, conserve water resource (2000-2500L/h).
3, shortened scavenging period by multistage cleaning, enhanced productivity.
Embodiment
This technology is totally four cleaning processes, and it cleans as follows respectively:
Clean for the first time: pickling machine flows out product, enters in first rinse bath, feeds the above deionized water of resistivity 10M Ω CM in the groove, this current heater via temperature is controlled in about 45 ℃, flow control is at 500L/h, and product rests in the rinse bath, by the flowing water ultrasonic cleaning.
Clean for the second time: product enters second ultrasonic cleaning tank behind first rinse bath, be the above deionized water of 10M Ω CM in the groove, cleaning products once more in this groove, the water that this groove uses be after grade used deionized water.
Clean for the third time: directly feed the above deionized water of 12M Ω CM in the 3rd ultrasonic cleaning tank, flow control is at 2000-2500L/h.
More than clean all by ultrasonic waves for cleaning for three times, cleaning each time, ultrasonic time was controlled at about 1 minute.
Clean for the 4th time: add the absolute ethyl alcohol more than 98% in the ultrasonic cleaning tank, the product of three ultrasonic cleaning in front is dewatered.

Claims (1)

1, a kind of cleaning of the diode that pickling machine is flowed out, constitute by four cleanings, in cleaning, first three time all use ultrasonic waves for cleaning, it is characterized in that: clean the cleaning of in the deionized water of certain flow, heating the described first time, the deionization resistivity of water that cleans for the first time wherein: 〉=10M Ω CM, temperature is at 45-50 ℃, flow 450-550L/h, ultrasonic power: 1KW; Only clean for the second time and for the third time and in deionized water, clean: the deionization resistivity of water that cleans for the second time wherein: 〉=10M Ω CM, temperature is at 25 ℃, flow 2000-2500L/h, ultrasonic power: 1KW, the deionization resistivity of water of Qing Xiing for the third time: 〉=12M Ω CM, temperature is at 25 ℃, flow 2000-2500L/h, ultrasonic power: 1KW; With absolute ethyl alcohol diode is dewatered for the 4th time, wherein the 4th cleaning carried out processed to diode, ultrasonic power for the absolute ethyl alcohol with concentration 〉=98%: 1KW; The use amount of absolute ethyl alcohol is decided according to product category, must replenish absolute ethyl alcohol when the absolute ethyl alcohol temperature surpasses 70 ℃.
CN200810124575A 2008-08-26 2008-08-26 Acid washing technique of diode flowing out from acid washing machine Expired - Fee Related CN100583393C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200810124575A CN100583393C (en) 2008-08-26 2008-08-26 Acid washing technique of diode flowing out from acid washing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN200810124575A CN100583393C (en) 2008-08-26 2008-08-26 Acid washing technique of diode flowing out from acid washing machine

Publications (2)

Publication Number Publication Date
CN101345185A CN101345185A (en) 2009-01-14
CN100583393C true CN100583393C (en) 2010-01-20

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN200810124575A Expired - Fee Related CN100583393C (en) 2008-08-26 2008-08-26 Acid washing technique of diode flowing out from acid washing machine

Country Status (1)

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CN (1) CN100583393C (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101937845A (en) * 2010-08-24 2011-01-05 如皋市日鑫电子有限公司 Mesa treatment process of diode
CN102244001A (en) * 2011-06-29 2011-11-16 常州佳讯光电产业发展有限公司 Acid-washing dehydration process and device of diode
CN103990612B (en) * 2014-05-30 2016-05-11 贵州雅光电子科技股份有限公司 A kind of diode cleaning parts drying unit and method of operating thereof
CN104399702B (en) * 2014-11-17 2017-01-18 如皋市易达电子有限责任公司 Diode chip pickling process
CN105390376A (en) * 2015-11-24 2016-03-09 如皋市大昌电子有限公司 Cleaning process of diode after pickling
CN107537824A (en) * 2017-09-08 2018-01-05 如皋市下原科技创业服务有限公司 The cleaning of diode after a kind of pickling

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Publication number Publication date
CN101345185A (en) 2009-01-14

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Address after: 226500 Jiangsu city of Rugao Province under the original town LeightonWebworks Road No. 186

Patentee after: Lu Bingqi

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Patentee before: Rugao RiXin Electronic Co., Ltd.

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Address after: 226500, Jiangsu, Rugao Province under the original industrial concentration zone

Patentee after: Rugao RiXin Electronic Co., Ltd.

Address before: 226500 Jiangsu city of Rugao Province under the original town LeightonWebworks Road No. 186

Patentee before: Lu Bingqi

ASS Succession or assignment of patent right

Owner name: LU BINGYI

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Address after: 226500 Jiangsu city of Rugao Province under the original town LeightonWebworks Road No. 186

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Patentee before: Rugao RiXin Electronic Co., Ltd.

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