CN100567553C - Washing unit - Google Patents
Washing unit Download PDFInfo
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- CN100567553C CN100567553C CNB2005100936991A CN200510093699A CN100567553C CN 100567553 C CN100567553 C CN 100567553C CN B2005100936991 A CNB2005100936991 A CN B2005100936991A CN 200510093699 A CN200510093699 A CN 200510093699A CN 100567553 C CN100567553 C CN 100567553C
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- mask
- aforementioned
- scavenging solution
- washing fluid
- carrying device
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/02—Devices for holding articles during cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/06—Cleaning involving contact with liquid using perforated drums in which the article or material is placed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/10—Vacuum distillation
Abstract
A kind of can the removal attached to washing unit by the organic materials of the mask that metallic film constituted.Washing unit of the present invention possesses: by the 1st and the 2nd rinse bath (21,22) of predetermined scavenging solution clean mask (10); Vacuum distilling apparatus (30) in order to the scavenging solution of this rinse bath of vacuum distilling (21,22); The scavenging solution of vacuum distilling is cooled to the 1st water cooler (31) of room temperature; Make the 1st return line (101) that is back to the 2nd rinse bath (22) by the 1st water cooler (31) institute refrigerative scavenging solution; Utilize predetermined washing fluid mask (10) to be washed the 1st and the 2nd flushed channel (51,52) of processing; The air distillation device (60) of the scavenging solution of this flushed channel of distillation (51,52) under normal pressure; The washing fluid of air distillation is cooled to the 2nd water cooler (61) of room temperature; Make the 2nd return line (102) that is back to the 2nd flushed channel (52) by the 2nd water cooler (61) institute refrigerative washing fluid.
Description
Technical field
The present invention relates to a kind of washing unit, particularly relate in the evaporation step of the organic materials that organic EL uses, remove attached to washing unit by the organic materials of the mask that metallic film constituted.
Background technology
In recent years, use the organic EL display of organic electroluminescent (Electro Luminescence :) assembly to call " organic EL " in the following text, replaced the display unit of CRT and LCD and be subjected to advising order, just researched and developed a kind of organic EL display that for example possesses in order to the thin film transistor (Thin Film Transistor :) that drives this organic el element to call " TFT " in the following text.
Organic el element is formed by lamination in regular turn: by the formed anode of transparency electrode of ITO (Indium Tin Oxide tin indium oxide) etc.; The hole transporting layer that is constituted by MTDATA (4,4-two (3-aminomethyl phenyl phenylamino) biphenyl) grade in an imperial examination 1 hole transporting layer, TPD (4,4,4-three (3-aminomethyl phenyl phenylamino) triphenylamine) grade in an imperial examination 2 hole transporting layers; The Bebq2 (10-benzene man's cap used in ancient times [h] hydroxyquinoline-beryllium complex (10-benzo[h] quinolinol-beryllium complex) that comprises pyridine ketone (Quinacridone) derivative) formed luminescent layer; By the formed electron supplying layer of Bebq2; Reach structure by the formed negative electrode of aluminium alloy.
Aforesaid organic el element is luminous by supplying with electric current in order to the driving that drives this organic el element with TFT.That is, from anode institute injected holes with combine again in luminescent layer inside from negative electrode institute injected electrons, excite in order to the organic molecule that forms luminescent layer and produce exciton (exciton).Luminous by luminescent layer in the process of this exciton radiation inactivation, this light can be discarded to the outside and carry out luminous via insulativity substrates such as transparent anode and glass substrates from transparent anode.
In each of above-mentioned organic el element layer, the organic materials that is used to form hole transporting layer, luminescent layer, electron supplying layer has low, the characteristic of water-fast branch not of solvent resistance.Therefore can't utilize the photoetching technique of semiconductor technology.Therefore, by using vapour deposition method with the mask (shielding) that for example metallic film was constituted, above-mentioned organic materials selectivity evaporation is driven with on the insulativity substrate of TFT possessing, with the pattern of the hole transporting layer, luminescent layer, electron supplying layer and the negative electrode that form organic el element.
Figure 15 to Figure 17 shows the example of use at the mask (mask) of the evaporation of this organic materials.Figure 15 is the top view of the mask used of organic EL of explanation conventional example.Figure 16 is the sectional view along the X-X line of Figure 15.Figure 17 is the sectional view along the Y-Y line of Figure 15.To shown in Figure 17, mask 10 is that for example nickel (Ni) and the iron metallic films such as (Fe) of a plurality of fine holes 11 of each several microns degree are constituted by for example having in length and breadth as Figure 15.By these holes 11, make above-mentioned organic materials selectivity evaporation on the insulativity substrate.The mask 10 that is made of the aforementioned metal film is fixed on the metal frame 12 that is made of for example nickel (Ni) and iron (Fe).The edge portion of this mask 10 is supported by this metal frame 12.In addition, form by in order to keep a plurality of snap portions 13 of this metal frame 12 in the edge portion of metal frame 12.Below, abbreviate the mask 10 that is fixed on metal frame 12 as " mask 10 ".
In addition, Xiang Guan technical literature is the following patent documentation of enumerating.
(patent documentation 1)
TOHKEMY 2004-103269 communique
Summary of the invention
The problem that invention institute desire solves
Organic el element is corresponding colored to be shown when having each luminescent layer of 3 natural colored red, green, blues, as the evaporation step 1 of organic materials is to use the mask of usefulness of all kinds repeatedly and carry out.Therefore, along with the number of times of evaporation repeatedly is many more, organic materials with lamination in which floor mode attached to the surface of mask 10.That is, shown in the sectional view of mask that evaporation has organic materials shown in Figure 180, organic materials 1 also not only is formed on the surface of mask 10, and should make the mode of organic materials 1 by a plurality of holes 11 originally to clog, the periphery formation lip portions 1a in hole 11.
So, the protuberance that the hole of mask 10 11 can the reason organic materialss be constituted and narrowing down, thereby the problem that exists this organic materials evaporation to reduce in the precision of insulated substrate.
Countermeasure as solving foregoing problems has a kind of same mask that repeatedly do not use, and promptly discards used mask behind whenever predetermined evaporation number of times, and is changed to the method for untapped mask.But, when using this method, be used for the untapped mask costliness of the evaporation of the organic materials that aforementioned organic EL uses, therefore the problem that exists cost to increase.
Therefore, the invention provides a kind of washing unit of removing the organic materials of using attached to organic EL by the mask that metallic film constituted.
The means of dealing with problems
Washing unit of the present invention proposes at the problems referred to above, and this washing unit is in order to remove the washing unit of the organic materials of using attached to the organic EL by the mask that metallic film constituted, to have following feature.
That is, washing unit of the present invention possesses: by the rinse bath of predetermined scavenging solution clean mask; Handle the flushed channel of mask by predetermined washing fluid flushing; Carrying device keeps this mask with the predetermined angular beyond the level, will be with this mask conveyance that this predetermined angular was kept to rinse bath and flushed channel, so that the metallic film of mask can be because of the stress damaged that gravity caused.
Moreover the aforementioned carrying device of washing unit of the present invention under the state that keeps this mask, erects towards vertical direction, and keeps this mask with aforementioned predetermined angular after keeping mask at first under horizontal state.
Moreover the aforementioned carrying device of washing unit of the present invention possesses: keep tool, its mode with the part of the mask of this carrying device institute mounting of crimping is slided; And hook portion, in order to departing from of mask the opposing party edge portion of suppressing to cause because of the crimping that keeps tool; Utilize to keep tool and hook portion to seize the edge portion of mask on both sides by the arms, and keep this mask.
Moreover the aforementioned carrying device of washing unit of the present invention is according to proximate circular-arc curvilinear desired trajectory, carries out the switching of the travel direction from vertical direction towards horizontal direction continuously, or the switching from horizontal direction towards vertical direction.
Moreover, the aforementioned rinse bath of washing unit of the present invention and flushed channel are to have carrier in the movable liquid in each groove, to can transfer carrier in the liquid above the liquid level that rises to scavenging solution or washing fluid in atmosphere by the mask of carrying device institute conveyance, carrier can together be immersed in the scavenging solution or in the washing fluid with this mask in the liquid of mask and mounting is had.
The invention effect
According to washing unit of the present invention, in the evaporation step of the organic materials that organic EL uses, can suitably remove attached to organic materials by the mask that metallic film constituted.
Therefore, even reuse same mask, also can not form the lip portions that constitutes by this organic materials at the periphery of mask aperture, so Kong Buhui narrows down.As a result, the precision that can as far as possible suppress the evaporation of organic materials reduces.
Therefore and in the evaporation step of organic materials, can use same mask, can avoid as far as possible as increasing because of exchanging the cost that untapped mask causes in traditional evaporation step.Owing to need not carry out the discarded of used mask, therefore can suppress environmental pollution as far as possible because of should discarded being caused.
Moreover, according to washing unit of the present invention, when the conveyance mask that the removal of organic materials is carried out, carrying device is to keep mask with the predetermined angular beyond the level, will be with this mask conveyance that this predetermined angular was kept to rinse bath and flushed channel, therefore, can not produce under the situation of damage, can remove organic materials attached to this mask at the metallic film of mask.
Moreover aforementioned carrying device by carrying out moving of vertical direction and horizontal direction continuously, moves according to proximate circular-arc curvilinear desired trajectory when the conveyance mask.Therefore, can avoid switching to horizontal direction or the stress that impulse caused when horizontal direction switches to vertical direction as far as possible, and produce metal fatigue or damage by the mask that metallic film constituted because of moving from vertical direction.
Description of drawings
Fig. 1 is the explanatory view of cleaning system of the washing unit of the embodiment of the invention;
Fig. 2 is the explanatory view of cleaning system of the washing unit of the embodiment of the invention
Fig. 3 is the explanatory view of cleaning system of the washing unit of the embodiment of the invention;
Fig. 4 is the sectional view of conveyer of the washing unit of the embodiment of the invention;
Fig. 5 is the sectional view of conveyer of the washing unit of the embodiment of the invention;
Fig. 6 is the sectional view of conveyer of the washing unit of the embodiment of the invention;
Fig. 7 is the sectional view of conveyer of the washing unit of the embodiment of the invention;
Fig. 8 is the sectional view of conveyer of the washing unit of the embodiment of the invention;
Fig. 9 is the stereographic map of conveyer of the washing unit of the explanation embodiment of the invention;
Figure 10 is the stereographic map of conveyer of the washing unit of the explanation embodiment of the invention;
Figure 11 is the stereographic map of conveyer of the washing unit of the explanation embodiment of the invention;
Figure 12 is the stereographic map of conveyer of the washing unit of the explanation embodiment of the invention;
Figure 13 is the stereographic map of conveyer of the washing unit of the explanation embodiment of the invention;
Figure 14 is the stereographic map of conveyer of the washing unit of the explanation embodiment of the invention;
Figure 15 is the top view of the mask used of organic EL of explanation conventional example;
Figure 16 is the sectional view along the X-X line of Figure 15;
Figure 17 is the sectional view along the Y-Y line of Figure 15;
Figure 18 is the sectional view of the mask of evaporation organic materials.
The primary clustering nomenclature
1 organic materials 1a lip portions
10 masks, 11 holes
12 metal frames, 13 snap portions
21 the 1st rinse baths 22 the 2nd rinse bath
21a, 22a the 1st ultrasonic vibrator
21b, 22b the 1st agitator 21c, 21c the 1st temperature sensor
Carrier 23,53 overflow grooves in 21d, 22d the 1st liquid
30 Zhen Kong Zheng Evaporated device 30r cooling pans
40 the 1st temperature regulators, 42,47,72 pumps
51a, 52a the 2nd ultrasonic vibrator
52b, 52b the 2nd agitator 51c, 52c the 2nd temperature sensor
52 the 2nd flushed channels, 54 accumulator tanks
55 the 3rd coolers, 60 air distillation devices
60b, 91b valve 61 the 2nd cooler
70 the 2nd temperature regulator 70h the 2nd heat exchanger 7
80 water sepn grooves, 90 separators
91 accumulating tank 91f upper limit sensors
91e lower limited sensor 99 vacuum driers
101 the 1st return lines 102 the 2nd return line
200 210 box caskets
221 the 1st arms 222 the 2nd arm
230 the 2nd shifting apparatus, 240 carrying devices
241 keep tool 242 hook portions
Embodiment
Secondly, the washing unit of the embodiment of the invention is described.As the mask that is cleaned body be with at Figure 15 employed same mask 10 to traditional evaporation step shown in Figure 17.That is, this mask is along the predetermined pattern that forms organic materials, and the metallic film in the hole 11 of each several microns degree is constituted by being formed with in length and breadth.This metallic film is made of for example nickel (Ni) and iron (Fe).In addition, be fixed with by nickel (Ni) and iron (Fe) in the edge portion of this mask and constituted metal frame 12.Metal frame 12 has snap portion 13.Below, abbreviate the mask 10 that is fixed on metal frame 12 as " mask 10 ".
The washing unit of present embodiment is to be formed with in the evaporation step of insulativity substrate of drive TFT at the organic materials evaporation that organic EL is used, and removes attached to the aforementioned organic materials by the mask that metallic film constituted 10 that is used for evaporation.The integral body of the washing unit of present embodiment constitute with the cleaning system of the organic materials of using in order to the organic EL that removes attached to mask 10, reach greatly different in order to the conveyer of conveyance mask 10.
At first, with reference to the formation of the Qing Xi Xi System of the washing unit of description of drawings present embodiment.Fig. 1 is the explanatory view of cleaning system of the washing unit of present embodiment.In Fig. 1, omitted the integrant of conveyance Xi System.
As shown in Figure 1, the cleaning system of the washing unit of present embodiment possesses: by the 1st and the 2nd rinse bath 21,22 of predetermined scavenging solution clean mask 10; And utilize predetermined washing fluid that the mask 10 that is given clean by the 1st and the 2nd rinse bath 21,22 is washed the 1st and the 2nd flushed channel 51,52 of processing.
Aforementioned predetermined scavenging solution is hydrocarbon (HC) scavenging solution that is for example.In addition, aforementioned pre-fixing liquor is to have the boiling point solvent that comprise fluorine (F) lower than aforementioned scavenging solution, for example hydrogen fluorine ether (hydrofluoroether, HFE).The proportion of this washing fluid is bigger than moisture.And, has the effect that washing fluid enters subtlety more and catches scavenging solution really by utilizing the little aforementioned washing fluid of surface tension that the big aforementioned scavenging solution of surface tension is washed.
Secondly, the formation of the 1st and the 2nd rinse bath 21,22 in the cleaning system of washing unit of present embodiment is described.
This washing unit possesses at the 1st rinse bath 21 overflow groove of accumulating from the scavenging solution of the 1st rinse bath 21 overflows 23 is arranged.And this washing unit possesses in order to from comprising the scavenging solution of the organic materials of removing with washing unit clump mask 10, utilizes vacuum distilling only to extract the vacuum distilling apparatus 30 of scavenging solution out.Comprise organic cleaning of materials liquid from 21 overflows of the 1st rinse bath to overflow groove 23, and flow into vacuum distilling apparatuses 30 from this overflow groove 23.The organic materials that is deposited in vacuum distilling apparatus 30 is in cooling pan 30r cooling and be expelled to the outside.
In the distillation of aforesaid scavenging solution, heating this scavenging solution and being distilled under vacuum state.Thus, can make about 155 ℃ boiling point lowering of this scavenging solution, the Heating temperature when making distillation reduces as far as possible.
This washing unit possesses the 1st water cooler 31 that the scavenging solution by vacuum distilling apparatus 30 vacuum distillings is cooled to room temperature.The scavenging solution that is cooled to room temperature by aforementioned the 1st water cooler 31 is back to the 2nd rinse bath 22 by the 1st return line 101.
In this case, room temperature is " 10 ℃ to 40 ℃ ", and preferably " 20 ℃ to 30 ℃ " are 25 ℃ better.
Vacuum distilling by aforementioned scavenging solution, cooling, and reflux, can carry out the processing of mask 10 in room temperature.Therefore, can suppress tension force that stress produced or damage because of heat as far as possible.
Moreover the aforementioned the 1st and the 2nd rinse bath 21,22 possesses with so that the 1st ultrasonic vibrator of the not icon of aforementioned scavenging solution vibration, so that scavenging solution arrives the surface of mask 10 really.Moreover for the temperature of correspondence by the scavenging solution that vibration caused of the 1st ultrasonic vibrator rises, the 1st and the 2nd rinse bath 21,22 possesses the 1st temperature regulator 40 that the temperature of scavenging solution is given inching.
At this, the 1st temperature regulator 40 possesses the 1st heat exchanger 40h and pump 42, is cooled off the scavenging solution of the 1st and the 2nd rinse bath 21,22 by the 1st heat exchanger 40h.And the 1st temperature regulator 40 flows into the 1st and the 2nd rinse bath 21,22 according to whether making by the 1st heat exchanger 40h refrigerative scavenging solution via pump 42, and the fine tune temperature of the scavenging solution of this each groove is put in order in room temperature.
Moreover scavenging solution is recycled by strainer and is filtered.As shown in Figure 1, at its circulation pathway, be that the path of rinse bath the 21, the 1st temperature regulator 40, pump 42, rinse bath 21 is provided with strainer, but this strainer is other path different with this path, also can be provided with and this path and the path of establishing, the i.e. path of rinse bath 21, strainer, pump 42, rinse bath 21.
As mentioned above, can carry out inching to the scavenging solution of the 1st and the 2nd rinse bath 21,22 by the 1st temperature regulator 40.
Secondly, the formation of the 1st and the 2nd flushed channel 51,52 in the cleaning system of washing unit of present embodiment is described.
This washing unit possesses at the 1st flushed channel 51 overflow groove of accumulating from the washing fluid of the 1st flushed channel 51 overflows 53 is arranged.
This washing unit possesses in order to from comprising the washing fluid that enters the impurity of the micro-scavenging solution of the 2nd rinse bath 22 of the 1st flushed channel 51 or micro-organic materials etc. via mask 10, utilizes air distillation under the normal pressure to remove the air distillation device 60 of this impurity.Washing fluid to overflow groove 53, and flows into air distillation devices 60 from this overflow groove 53 from 51 overflows of the 1st flushed channel.
The boiling point of aforementioned washing fluid is during for 60 ℃ of degree for example, as has the distillation of scavenging solution of the boiling point of about 160 ℃ of degree, need not use so that the vacuum distilling of this boiling point lowering.Therefore, utilize air distillation device 60 to carry out air distillation under the normal pressure (normal atmosphere).Trap coil (trap coil) 60t of the temperature of the washing fluid that evaporates during distillation by making washing fluid liquefaction liquefies.
This washing unit possesses the 2nd water cooler 61 that the washing fluid by 60 air distillations of air distillation device is cooled to room temperature.The washing fluid that is cooled to room temperature by aforementioned the 2nd water cooler 61 is back to the 2nd flushed channel 52 by the 2nd return line 102.
At this, between the 2nd water cooler and the 2nd return line 102, possess water sepn groove 80 is arranged, the moisture that this water sepn groove 80 is used for containing the washing fluid of moisture through air distillation separates with washing fluid.Washing fluid is back to the 2nd flushed channel 52 through after separating water sepn by the 2nd return line 102.
In addition, this washing unit from the accumulator tank 54. of the washing fluid of the 1st flushed channel 51 or the evaporation of the 2nd flushed channel 52 for example possesses recovery, and it is that 150: 1 to 10: 1 temperature gets final product that the temperature in the accumulator tank 54 are set to the vapour pressure of the 2nd flushed channel 52 and steam ratio in the accumulator tank 54.Accumulator tank 54 possesses the 3rd water cooler 55.The 3rd water cooler 55 makes accumulator tank 54 be cooled to for example subzero about 25 ℃, and the vapour pressure of accumulator tank 54 can be hanged down to about one of about percentage of the 1st flushed channel 51 or the 2nd flushed channel 52 thus, and the washing fluid of evaporation can flow into accumulator tank 54.The washing fluid that flows into accumulator tank 54 flows into water sepn groove 80, and the moisture that contains is back to the 2nd flushed channel 52 by the 2nd return line after separating.
Vacuum distilling by aforementioned scavenging solution, cooling, and reflux, can handle in the flushing that room temperature be carried out mask 10.Therefore, can suppress tension force that stress produced or damage because of heat as far as possible.
In addition, in above-mentioned washing unit, be immersed in washing fluid, therefore will have the scavenging solution of trace can move to the washing fluid of the 1st flushed channel 51, and mix with this washing fluid via mask 10 owing to will be immersed in the mask 10 of scavenging solution.Therefore, this washing unit possesses the separator 90 that the washing fluid that will contain scavenging solution is separated into scavenging solution and washing fluid.This separator 90 is by after making the washing fluid evaporation that contains scavenging solution, utilize the washing fluid of this evaporation of cooling such as water cooler, and liquefaction reclaimed.Isolating washing fluid like this flows into water sepn groove 80, and contained moisture after separating, is back to the 2nd flushed channel 52 by the 2nd return line 102.
Moreover this washing unit possesses to be accumulated by 90 isolating scavenging solutions of this separator, from the washing fluid (containing scavenging solution) before the normal pressure distillation that air distillation device 60 flows into, and flows into the accumulating tank 91 of separator 90 again.
At this, accumulating tank 91 possesses the upper limit sensor 91f that detects the liquid level upper limit that flows into the scavenging solution accumulate and washing fluid, and the lower limited sensor 91e that detects this liquid level lower limit.By the switching of valve 60b, make washing fluid flow into accumulating tank 91 from air distillation device 60,91f detects liquid level up to upper limit sensor.Along with the isolating number of times that carries out this scavenging solution and washing fluid repeatedly increases, the washing fluid that is accumulated in accumulating tank 91 includes many scavenging solutions that flow into and accumulate at accumulating tank 91 from separator 90.Therefore, the washing fluid that contains this scavenging solution is understood slack-off in separator 90 evaporations and isolating speed.
Therefore, in accumulating tank 91, detected result according to lower limited sensor 91e, instrumentation begins time point arrives lower limit to the liquid level of washing fluid time from the separation of separator 90, this time of arrival is when longer than the scheduled time, the scavenging solution that is included in the washing fluid in this accumulating tank is regarded as state of saturation, and finishes the separation of separator 90.After finishing the separation of separator 90, isolating scavenging solution flows into vacuum distilling apparatus 30 in accumulating tank 91.
By above processing, separate the scavenging solution that is contained in washing fluid, can only utilize again washing fluid.
In addition, aforementioned the 1st flushed channel 51 and the 2nd flushed channel 52 possess with so that the 2nd ultrasonic vibrator of the not icon of aforementioned washing fluid vibration, so that this washing fluid arrives the surface of mask 10 really.Moreover in order to respond the temperature rising by the scavenging solution that vibration caused of the 2nd ultrasonic vibrator, the 1st and the 2nd flushed channel 51,52 possesses the 2nd temperature regulator 70 that the temperature of scavenging solution is given inching.
At this, the 2nd temperature regulator 70 possesses the 2nd heat exchanger 70h and pump 72, is cooled off the washing fluid of the 1st and the 2nd flushed channel 51,52 by the 2nd heat exchanger 70h.And the 2nd temperature regulator 70 flows into the 1st and the 2nd rinse bath 51,52 according to whether making by the 2nd heat exchanger 70h refrigerative washing fluid via pump 72, and the fine tune temperature of the washing fluid of this each groove is put in order in room temperature.
As mentioned above, can carry out inching to the scavenging solution of the 1st and the 2nd flushed channel 51,52 by the 2nd temperature regulator 70.
Secondly, the interior detailed formation of each groove of the 1st and the 2nd rinse bath 21,22 and the 1st and the 2nd flushed channel 51,52 is described.Fig. 2 is the sectional view of explanation the 1st and the 2nd rinse bath 21,22.Fig. 3 is the sectional view of explanation the 1st and the 2nd flushed channel 51,52 and accumulator tank 54.In Fig. 2 and Fig. 3, omitted overflow groove 23,53.
As shown in Figure 2, the 1st and the 2nd rinse bath 21,22 possesses carrier 21d, 22d in the 1st ultrasonic vibrator 21a, 22a, the 1st agitator 21b, 22b, the 1st temperature sensor 21c, 21c and movable the 1st liquid respectively.At this, the 1st ultrasonic vibrator 21a, 22a make this scavenging solution produce vibration and get final product, so that scavenging solution arrives the surface of mask 10 really, and make itself and mask over against to, but 11 formula of enumerating of cleaning the surface of mask 10, compare with the situation of cleaning many pieces blanket formula, the effect of the former the 1st ultrasonic vibrator 21a, 22a is bigger.And the 1st agitator 21b, 22b are in order to stir this scavenging solution, so that scavenging solution flows at the 1st and the 2nd rinse bath 21,22.
In addition, the 1st temperature sensor 21c, 21c are carrying out temperature when adjusting with the scavenging solution in 40 pairs the 1st of the 1st temperature regulators and the 2nd rinse bath 21,22, detect the temperature of this scavenging solution, with as with reference to temperature.In addition, carrier 21d, 22d have the function that keeps this mask 10 and be immersed in scavenging solution when mask 10 is carried out clean in the 1st liquid.And carrier 21d, 22d preferably have and make the vibrating function of mask 10 integral body towards vertical vibration in the 1st liquid, so that washing fluid arrives the surface of mask 10 really.
As mentioned above, in the 1st and the 2nd rinse bath 21,22, by carrying out the vibration of scavenging solution with the 1st ultrasonic vibrator 21a, 22a, carry out the stirring of scavenging solution with the 1st agitator 21b, 22b, carry out shaking of mask 10 with carrier 21d, 22d in the 1st liquid, and can utilize this scavenging solution that mask 10 is carried out clean really.
Similarly, as shown in Figure 3, the 1st and the 2nd flushed channel 51,52 possesses carrier 51d, 52d in the 2nd ultrasonic vibrator 51a, 52a, the 2nd agitator 52b, 52b, the 2nd temperature sensor 51c, 52c and movable the 2nd liquid respectively.At this, the 2nd ultrasonic vibrator 51a, 52a make the vibrative vibrator of this washing fluid.And the 1st agitator 51b, 52b are in order to stir this washing fluid, so that washing fluid flows at the 1st and the 2nd flushed channel 51,52.
The 2nd temperature sensor 51c, 52c are carrying out temperature when adjusting with the washing fluid in 70 pairs the 1st of the 2nd temperature regulators and the 2nd flushed channel 51,52, detect the temperature of this washing fluid, with as with reference to temperature.In addition, carrier 51d, 52d have the function that keeps this mask 10 when handling and be immersed in washing fluid in that mask 10 is washed in the 2nd liquid.And carrier 51d, 52d preferably have and make the vibrating function of mask 10 integral body towards vertical vibration in the 2nd liquid, so that washing fluid arrives the surface of mask 10 really.
Moreover, possess the 3rd water cooler 55 and the 3rd temperature sensor 54c with the accumulator tank 54 of the 2nd flushed channel 52 conductings.The 3rd water cooler 55 makes accumulator tank 54 be cooled to the temperature lower than the 1st and the 2nd flushed channel 51,52.This cooling temperature is at foregoing for example subzero about 25 ℃.The washing fluid through evaporation of importing accumulator tank 54 liquefies by so-called trap coil (trap coil) 54t and is recovered in this accumulator tank 54.
In addition, above the liquid level of the washing fluid of the 1st and the 2nd flushed channel 51,52, possess 57,58 and 2 the 4th temperature sensor 50c of the 3rd and the 4th temperature regulator are arranged.The temperature of the liquid level top of the washing fluid of the 3rd temperature regulator 57 by making the 1st and the 2nd flushed channel 51,52 is cooled to for example subzero about 10 ℃, and forms the 1st gas cloud 59a that diffuses to the outside of the 1st and the 2nd flushed channel 51,52 in order to the washing fluid that suppresses evaporation.In addition, the 4th temperature regulator 58 is that the top temperature with the 1st gas cloud 59a is adjusted at the temperature slightly higher than room temperature, flows into the 2nd gas cloud 59b in this groove and form in order to the outside atmosphere that suppresses the 1st and the 2nd flushed channel 51,52.
At this, the temperature detection result of 2 the 4th temperature sensor 50c of the best foundation of the adjustment of the aforementioned temperature of the 3rd and the 4th temperature regulator 57,58 is carried out.And when the aforementioned temperature adjustment of the aforementioned the 3rd and the 4th temperature regulator 57,58 is adjusted to default preset temperature, also can omit any or all of 2 the 4th temperature sensor 50c.
As mentioned above, in the 1st and the 2nd flushed channel 51,52, by carrying out the vibration of scavenging solution with the 2nd ultrasonic vibrator 51a, 52a, carry out the stirring of washing fluid with the 2nd agitator 51b, 52b, carry out shaking of mask 10 with carrier 51d, 52d in the 2nd liquid, and can utilize this washing fluid that mask 10 is washed processing really.
Above the liquid level of the washing fluid of the 1st and the 2nd flushed channel 51,52, possess the 3rd and the 4th temperature regulator 57,58 is arranged, therefore can not make under the washing fluid of the 1st and the 2nd flushed channel 51,52 evaporations diffuses to state in the atmosphere, by the capable recovery of accumulator tank 54 Jin.
Secondly, the mobile of scavenging solution in the cleaning system of washing unit of present embodiment be described.At the 1st rinse bath 21 and the 2nd rinse bath 22 dipping masks 10 and when carrying out clean, can sneak into scavenging solution from the organic materials that mask 10 is removed.And when flowing into the 2nd rinse bath by the scavenging solution that the 1st return line 101 refluxes, the scavenging solution of the 1st and the 2nd rinse bath 21,22 can overflow to the 1 overflow groove 23.The scavenging solution of overflow flows into vacuum distilling apparatus 30.At this, be depressurized to about 0.8 air pressure in the vacuum distilling apparatus 30, and be heated to for example about 120 ℃, to carry out the vacuum distilling of scavenging solution.The organic materials that is deposited in the bottom of vacuum distilling apparatus 30 also is expelled to periodicity the outside in cooling pan 30r cooling.
The boiling point of this scavenging solution is for example about 160 ℃, but heating and distill this scavenging solution in vacuum state can make this boiling point lowering thus, and the Heating temperature when making distillation is reduced to for example about 120 ℃.And above-mentioned distillation is vacuum distilling, therefore can not contain moisture at scavenging solution in the distillatory process.
Scavenging solution through vacuum distilling and removal organic materials is cooled to room temperature by the 1st water cooler 31, and is back to the 2nd rinse bath by the 1st return line 101.
In addition, the part of the scavenging solution of the 1st and the 2nd rinse bath 21,22 is cooled off by the 1st heat exchanger 40h that is installed in the 1st temperature regulator 40, and this refrigerative scavenging solution suitably flows into the 2nd rinse bath 22 via pump 42.
Secondly, the mobile of scavenging solution in the cleaning system of washing unit of present embodiment be described.When the 1st flushed channel the 51, the 2nd flushed channel 52 floods masks 10 and carries out clean, can sneak into washing fluid from the organic materials that mask 10 is removed.And when flowing into the 2nd flushed channel 52 by the washing fluid that the 2nd return line 102 refluxes, the washing fluid of the 1st and the 2nd flushed channel 51,52 can overflow to the 2 overflow grooves 53.
The washing fluid of this overflow flows into vacuum distilling apparatus 60.Therefore as have the distillation of scavenging solution of the boiling point of about 160 ℃ of degree at this, the boiling point of washing fluid is for example 60 ℃ of degree,, need not use so that the vacuum distilling of this boiling point lowering.Therefore, be in the air distillation device 60 under normal pressure (normal atmosphere), be heated to above for example about 65 ℃, of this boiling point to carry out the air distillation of washing fluid.
By air distillation, remove the organic materials impurity such as (by mask 10 conveyances that are attached with scavenging solution) that is included in washing fluid.In the process of normal pressure distillatory washing fluid, be mixed with moisture, but utilize the proportion bigger, be separated into moisture and washing fluid than this moisture in air distillation.This washing fluid is cooled to room temperature by the 2nd cooling fluid 62, and flows into water sepn groove 80.
The washing fluid of removing moisture in water sepn groove 80 is back to the 2nd flushed channel 52 by the 2nd return line 102.
In addition, though flow into air distillation device 60 but without the part of the washing fluid of air distillation, promptly comprise of the switching of the washing fluid of micro-scavenging solution (being blended in washing fluid) according to valve 60b via mask 10, flow into accumulating tank 91, after the upper limit that arrives accumulating tank 91, valve 60b can close, and stops the inflow of washing fluid.And the washing fluid in the accumulating tank 91 flows into separator 90, and the beginning washing fluid separates with scavenging solution.
When detecting the liquid level of the washing fluid in the accumulating tank 91, open valve 60b again, washing fluid is flowed in the accumulating tank 91 from air distillation device 60 by lower limited sensor 91e.
By the separator 90 isolating washing fluid utilizations proportion bigger, after utilizing water sepn groove 80 to remove moisture, be back to the 2nd rinse bath 52 by the 2nd return line 102 than this moisture.Flow into accumulating tank 91 by separator 90 isolating scavenging solutions.
Along with carrying out repeatedly separating of this scavenging solution and washing fluid, the washing fluid that is accumulated in accumulating tank 91 includes many scavenging solutions that flow into and accumulate from separator 90 in accumulating tank 91.Therefore, the washing fluid that contains this scavenging solution is understood slack-off in separator 90 evaporations and isolating speed.
Therefore, in accumulating tank 91, according to the detected result of lower limited sensor 91e to the liquid level of the washing fluid of accumulating tank 91, instrumentation begins time point arrives lower limit to the liquid level of washing fluid time from the separation of separator 90, this time of arrival is when longer than the scheduled time, the scavenging solution that is included in the washing fluid in this accumulating tank 91 is regarded as state of saturation, and finishes the separation of separator 90.Open the valve 91b that originally closes then, make isolating scavenging solution inflow vacuum distilling apparatus 30 in accumulating tank 91.
Moreover,, import and be cooled to for example subzero about the 25 ℃ accumulator tank 54 lower, and reclaimed by the 3rd water cooler 55 from the washing fluid of the 1st and the 2nd flushed channel 51,52 evaporation than the 1st and the 2nd flushed channel 51,52.The washing fluid that is recycled to accumulator tank 54 flows into water sepn groove 80, and utilizes the proportion about 1.5 to remove moisture, is back to the 2nd rinse bath 52 by the 2nd return line 102.
Secondly, with reference to the conveyer of the washing unit of description of drawings present embodiment.Fig. 4 to Fig. 8, Figure 11 to Figure 14 are the sectional views of conveyer of the washing unit of the explanation embodiment of the invention.Fig. 9 and Figure 10 are the stereographic maps of conveyer of the washing unit of the explanation embodiment of the invention.Among Fig. 4 to Figure 14, the integrant of cleaning system only be for shown in the bright required a part of integrant of conveyance Xi System De Said.
To shown in Figure 14, the conveyer of the washing unit of present embodiment possesses as Fig. 4: be arranged on the platform 200 and a plurality of masks 10 be accommodated in the box casket 210 of horizontal direction; Has the 1st shifting apparatus 220 that takes out the 1st arm 221 of 1 mask 10 from box casket 210; The 2nd shifting apparatus 230 with the 2nd arm 222 that grips mask 10; Carrying device 240 with mask 10 conveyances to the 1 and the 2nd rinse bath 21,22 and the 1st and the 2nd flushed channel 51,52.At this, carrying device 240 has the hook portion 242 on the one side that keeps mask 10 when conveyance mask 10.
Secondly, the action of conveyer of the washing unit of present embodiment is described.As shown in Figure 4, the 1st arm 221 of the 1st shifting apparatus 220 can be flexible, takes out 1 mask 10 from box casket 210.Secondly, as shown in Figure 5, the 1st shifting apparatus 220 descends the 1st arm 221, and mask 10 is positioned in the predetermined position of platform 200.Secondly, as shown in Figure 6, the 2nd shifting apparatus 230 utilizes the 2nd arm 222 to grip mask 10, and as shown in Figure 7, mask 10 is positioned on the carrying device 240.
Moreover, as shown in Figure 8, the carrying device 240 that mounting has a mask 10 vertical direction revolve turn 90 degrees about, and erect to plumbness.And the mask 10 of mounting also revolves towards vertical direction simultaneously and turn 90 degrees and erect on carrying device 240.The carrying device 240 of this moment and the state that is positioned in the mask 10 of carrying device 240 are presented in the stereographic map of Fig. 9.
So, become plumbness,, can avoid metal fatigue or damage as far as possible constituting the metallic film stress application of mask 10 (stress that gravity produced that metallic film is applied or by the stress that is produced that shakes of liquid) in order to make carrying device 240 and mask 10.In addition, lean against vertical direction, also have the effect of good removal liquid by making mask 10.
Angle when aforementioned carrying device 240 rotates with mask 10 differs and is decided to be about 90 degree.That is, as long as utilize the metallic film that constitutes mask 10 because of stress that gravity produced can not produce the angle of metal fatigue or damage as far as possible, carrying device 240 and mask 10 also can rotate to level and vertical in addition angle.
In addition, shown in the stereographic map of Figure 10, the maintenance tool that is installed in carrying device 240 in advance is to be crimped on the snap portion 13 of this mask 10 with the chimeric mode of the snap portion 13 of mask 10.Thus, mask 10 can not cause damage to the surface of its metallic film, and by the maintenance tool 241 and hook portion 242 maintenance of seizing on both sides by the arms of carrying device 240.
As the above-mentioned mask that remains on this carrying device 240 10 and carrying device 240 together by conveyance to the cleaning system of washing unit, i.e. the 1st and the 2nd rinse bath 21,22 (and the 1st and the 2nd flushed channel 51,52).At this, during this conveyance, carrying device 240 is shown in the sectional view of Figure 11, and continuity is carried out moving of vertical direction and horizontal direction, shown in track 1 and 8 among this figure, moves according to the curvilinear desired trajectory of approximate circle arcuation.In addition, the A among Figure 11, B, C have shown the position (highly) of vertical direction of the liquid level information of scavenging solution or washing fluid.
Moving of carrying device 240 by having desired trajectory, can avoid switching to horizontal direction or the stress that impulse produced when horizontal direction switches to vertical direction as far as possible, cause producing metal fatigue or damages by the mask 10 that metallic film constituted because of moving from vertical direction.
In addition, carrying device 240 moves with predetermined speed.This predetermined speed is the speed that the stress that blast or impulse produced when moving by carrying device 240 can not produce the degree of metal fatigue or damage on by the mask 10 that metallic film constituted.Or aforementioned predetermined speed is the predetermined speed that the sinuous flow that produced when moving by carrying device 240 can not impel the evaporation of the washing fluid in the 1st and the 2nd flushed channel 51,52.
Secondly, as shown in figure 12, the carrying device 240 of mounting mask 10 is by on conveyance to the 1 rinse bath 21.And be installed in as shown in Figure 3, the liquid level top that carrier 21d in the 1st liquid of the 1st rinse bath 21 can rise to scavenging solution.And in the 1st liquid carrier 21d rise to carrying device 240 same positions after, or carrying device 240 moves to and rises in the 1st liquid of liquid level top of scavenging solution behind the carrier 21d same position, remove the crimping of the maintenance tool 241 of carrying device 240, and mask 10 can be moved to carrier 21d in the liquid.
Then, as shown in figure 14, mounting has that carrier 21d can drop in the scavenging solution in the 1st liquid of mask 10, and mask 10 can be immersed in scavenging solution.And mask 10 when scavenging solution takes out, is carried out Figure 14, Figure 13, process shown in Figure 12 in regular turn.With Figure 12 to the 1st rinse bath 21 shown in Figure 14 similarly, the carrying device 240 that mounting has a mask 10 by conveyance on the 2nd rinse bath 22.And after carrier 21d is immersed in scavenging solution in via the 1st liquid, taken out at mask 10.
As mentioned above, when the scavenging solution dipping mask 10 of the 1st and the 2nd rinse bath 21,22, carrying device 240 be not immersed under the situation of scavenging solution, can carrying out clean.That is, can avoid scavenging solution attached to carrying device 240 as far as possible.Therefore, the scavenging solution that can as far as possible avoid the 1st and the 2nd rinse bath 21,22 via carrying device 240 by the washing fluid of conveyance to the 1 and the 2nd flushed channel 51,52.
With Figure 12 to the 1st rinse bath 21 shown in Figure 14 similarly, the carrying device 240 that mounting has a mask 10 by conveyance on the 1st flushed channel 51.And after carrier 51d is immersed in the washing fluid in via the 2nd liquid, taken out at mask 10.Moreover, the carrying device 240 that mounting has a mask 10 by conveyance on the 2nd flushed channel 52.And after carrier 52d is immersed in the washing fluid in via the 2nd liquid, taken out at mask 10.
As mentioned above, when the washing fluid dipping mask 10 of the 1st and the 2nd flushed channel 51,52,, can wash processing carrying device 240 not being immersed under the situation of washing fluid.That is, can avoid washing fluid attached to carrying device 240 as far as possible.Therefore, can avoid when carrying out clean, washing fluid is attached to carrying device 240 as far as possible, and this washing fluid is by the scavenging solution of conveyance to the 1 and the 2nd flushed channel 51,52.
In addition, aforementioned carrying device 240 is when being immersed in scavenging solution or washing fluid with mask 10, and preferably the track 1 to 4 according to Figure 11 moves.That is, initial carrying device 240 temporarily stops from the height that A moves to B according to track 1 again.Zai Ting Zhi Time is not to stop suddenly, makes it simultaneously to stop but slowing down lentamente, so that can be to mask 10 stress applications.And after carrier 21d, 22d, 51d, 52d rose to the height of B in the liquid that does not show, carrying device 240 carrier 21d, 22d, 51d, 52d in liquid paid mask 10, move to the height of C simultaneously from B.Then, carrying device 240 is in the mode of the height that returns A, moves towards vertical direction according to track 4.
Moreover aforementioned carrying device 240 is when taking out mask 10 from the liquid of scavenging solution or washing fluid, and preferably the track 5 to 8 according to Figure 11 moves.That is, initial carrying device 240 moves to the height of C from A according to track 5.Secondly, in mode, move towards horizontal direction according to track 6 near carrier 21d, 22d, 51d, 52d in the liquid.Then, carrying device 240 temporarily stops from the height that C moves to B according to track 7 again.Then, carrying device 240 moves to the height of A simultaneously with the mode displacement that carrier 21d, 22d, 51d, 52d from the liquid of the height that rises to B pick up mask 10 from B according to track 8.At this moment, for make carrying device 240 can be not sharply up direction move, preferably increase translational speed lentamente.By with upper type, carrying device 240 can move under the state that mask is not applied aforesaid stresses.
At this, carrying device 240 also can be with other mask 10 conveyances different with the mask 10 of finishing this conveyance to other groove behind the arbitrary groove with 10 conveyances to the 1 of 1 mask and the 2nd rinse bath 21,22 or the 1st and the 2nd flushed channel 51,52.
At last, mounting carrying device 240 that mask 10 arranged by conveyance to vacuum drier 99 shown in Figure 1 and give drying.
As mentioned above, by in track shown in Figure 11 1 or 8, moving in circular-arc mode, and in track 1, lentamente translational speed (following direction) is slowed down, and in track 8, lentamente translational speed (going up direction) is quickened, the stress that is applied to mask 10 is reduced.In addition, the action of the carrying device 240 during conveyance mask 10 only otherwise can get final product with carrier collision in the liquid wall of liquid bath or the liquid not can be circular-arcly, can move sharp yet.
And in the aforementioned embodiment, be with scavenging solution and washing fluid as the scavenging solution of hydrocarbon system and the washing fluid of fluorine system, but the present invention is not limited thereto.Promptly, aforementioned scavenging solution and washing fluid can carry out clean (removal of the organic materials that organic EL uses) and flushing processing to mask 10, as long as have, promptly can be used as scavenging solution and washing fluid beyond aforementioned with the same boiling point of the washing fluid of the scavenging solution of hydrocarbon system and fluorine system and with respect to the proportion of moisture.
Claims (6)
1. washing unit possesses in order to remove the organic materials of using attached to the organic EL by the mask that metallic film constituted, it is characterized by:
Rinse bath by the predetermined aforementioned mask of scavenging solution clean;
Handle the flushed channel of aforementioned mask by predetermined washing fluid flushing;
Carrying device, it keeps this mask with the predetermined angular beyond the level, will be with this mask conveyance that this predetermined angular was kept to aforementioned rinse bath and aforementioned flushed channel, so that the aforementioned metal film of aforementioned mask can be because of the stress damaged that gravity caused.
2. washing unit as claimed in claim 1, wherein aforementioned carrying device under the state that keeps this mask, erect towards vertical direction, and keep this mask with aforementioned predetermined angular after keeping aforementioned mask at first under horizontal state.
3. washing unit as claimed in claim 2, wherein aforementioned carrying device is to possess: keep tool, slide in the mode of the part of the aforementioned mask of this carrying device institute mounting of crimping; And hook portion, the aforementioned mask the opposing party edge portion that causes in order to the crimping that suppresses because of aforementioned maintenance tool departs from;
Utilize aforementioned maintenance tool and aforementioned hook portion to seize the edge portion of aforementioned mask on both sides by the arms, and keep this mask.
4. washing unit as claimed in claim 1, wherein aforementioned carrying device carries out the switching of the travel direction from vertical direction towards horizontal direction continuously according to proximate circular-arc curvilinear desired trajectory, or the switching from horizontal direction towards vertical direction.
5. washing unit as claimed in claim 1, wherein aforementioned rinse bath and aforementioned flushed channel have carrier in the movable liquid in each groove,
To in atmosphere, transfer carrier in the aforementioned liquid above the liquid level that rises to aforementioned scavenging solution or aforementioned washing fluid by the aforementioned mask of aforementioned carrying device institute conveyance,
And mounting there is in the aforementioned liquid of aforementioned mask carrier and this mask together is immersed in the aforementioned scavenging solution or in the aforementioned washing fluid.
6. as each described washing unit in the claim 1 to 5, wherein aforementioned predetermined washing fluid is the solvent that comprises fluorine.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004254656 | 2004-09-01 | ||
| JP2004254656 | 2004-09-01 | ||
| JP2005249431 | 2005-08-30 | ||
| JP2005249431A JP4644565B2 (en) | 2004-09-01 | 2005-08-30 | Cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1746331A CN1746331A (en) | 2006-03-15 |
| CN100567553C true CN100567553C (en) | 2009-12-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100936991A Active CN100567553C (en) | 2004-09-01 | 2005-09-01 | Washing unit |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4644565B2 (en) |
| KR (1) | KR100661408B1 (en) |
| CN (1) | CN100567553C (en) |
| TW (1) | TWI298746B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110965021A (en) * | 2019-12-26 | 2020-04-07 | 寰采星科技(宁波)有限公司 | Method and device for repairing blocked holes of metal mask plate |
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| JP4884180B2 (en) * | 2006-11-21 | 2012-02-29 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
| JP5280667B2 (en) * | 2007-11-08 | 2013-09-04 | 株式会社ジャパンディスプレイ | Method for manufacturing organic EL display device and method for cleaning vapor deposition mask |
| KR100891067B1 (en) | 2007-12-03 | 2009-03-31 | 주식회사 동부하이텍 | Wet station apparatus |
| KR101103474B1 (en) * | 2010-08-19 | 2012-01-09 | 현대중공업 주식회사 | Wafer cleaning apparatus |
| JP5877955B2 (en) * | 2011-03-18 | 2016-03-08 | キヤノントッキ株式会社 | Vapor deposition apparatus and vapor deposition method |
| JP2013071062A (en) * | 2011-09-28 | 2013-04-22 | Toho Technology Corp | Vapor deposition mask cleaning device, vapor deposition mask cleaning system and vapor deposition mask cleaning method |
| KR101456614B1 (en) * | 2013-04-25 | 2014-11-03 | 주식회사 케이씨텍 | Method of simulating treatment line layout of mask cleaning system and mask cleaning system using same |
| CN104152846B (en) * | 2014-02-21 | 2016-08-17 | 深圳浚漪科技有限公司 | A kind of mask plate purging system |
| CN111394739B (en) * | 2020-04-26 | 2024-01-05 | 北京七星华创集成电路装备有限公司 | Metal mask plate cleaning equipment |
| CN112553571A (en) * | 2020-12-09 | 2021-03-26 | 四川富乐德科技发展有限公司 | Method for cleaning Open Mask surface IZO evaporation material |
| CN114995052A (en) * | 2022-05-18 | 2022-09-02 | 上海图灵智算量子科技有限公司 | Photomask plate cleaning device |
| CN115382834A (en) * | 2022-09-06 | 2022-11-25 | 苏州清越光电科技股份有限公司 | Mask plate cleaning mechanism and mask plate cleaning equipment |
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Also Published As
| Publication number | Publication date |
|---|---|
| TWI298746B (en) | 2008-07-11 |
| KR100661408B1 (en) | 2006-12-27 |
| KR20060050912A (en) | 2006-05-19 |
| JP4644565B2 (en) | 2011-03-02 |
| CN1746331A (en) | 2006-03-15 |
| TW200617196A (en) | 2006-06-01 |
| JP2006100264A (en) | 2006-04-13 |
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