CN100561317C - The method of the substrate of liquid crystal panel and formation alignment film - Google Patents
The method of the substrate of liquid crystal panel and formation alignment film Download PDFInfo
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- CN100561317C CN100561317C CNB2005100512778A CN200510051277A CN100561317C CN 100561317 C CN100561317 C CN 100561317C CN B2005100512778 A CNB2005100512778 A CN B2005100512778A CN 200510051277 A CN200510051277 A CN 200510051277A CN 100561317 C CN100561317 C CN 100561317C
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Abstract
A kind of method that forms alignment film at first provides a substrate, and this substrate has a viewing area and a non-display area.Form a water wettability rete on the substrate in the viewing area, and with an alignment film material fluid drips on the water wettability rete, then make the alignment film material liquid curing become an alignment film.In addition, before splashing into alignment film liquid, also can in non-display area, form a hydrophobicity rete earlier.Form in the method for alignment film in the present invention, water wettability rete and/or hydrophobicity rete can define the profile of alignment film and make the alignment film thicknesses of layers even.
Description
Technical field
The invention relates to a kind of method of substrate and formation alignment film of liquid crystal panel, and particularly relevant for a kind of manufacture method of alignment film, it can make alignment film have face uniformly.
Background technology
In recent years, the liquid crystal display cells with advantages such as frivolous, light and handy, low power consumptions is widely used on the displays such as personal computer, mobile phone, electronic digit assistant, TV, video camera, surveying instrument.Generally speaking, liquid crystal panel is made of two plate bases and the liquid crystal layer that is disposed between two substrates.No matter be active-matrix formula LCD or passive matrix type LCD, all must have alignment film on two plate bases, and the major function of alignment film is liquid crystal molecule is carried out orientation.In addition, during in the electrode of two substrates, obtain the same display characteristic at impressed voltage in order to make liquid crystal panel displays.Generally speaking, all can provide tilt angle of liquid crystal molecule (angle on the molecular axis of liquid crystal molecule and alignment film surface) in advance.Therefore, alignment film is giving to play the part of considerable role on the liquid crystal molecule tilt angle.
At present, the formation method of alignment film is in the mode of inkjet nozzle (inkjet) alignment film material to be coated on the substrate 100 mostly.Please refer to Fig. 1, it illustrates the coating method of existing inkjet nozzle.Wherein, inkjet nozzle 10 splashes into alignment film material liquid 10a on substrate 100.Generally speaking, ink-jet technology is divided into thermal bubble type (Thermal bubble) ink-jet technology and piezoelectric type (Piezoelectric) ink-jet technology.Mainly be comparatively extensive with the application of piezoelectric ink jet technology now, and the piezoelectric ink jet technology utilizes piezoelectric actuated (not illustrating) to produce deformation because of applying voltage, extruding alignment film material liquid 10a produces high pressure and liquid is sprayed.The alignment film material liquid 10a of ejection is attached to the surface of substrate 100.Therefore, can be coated with moving in needed zone by the start of control nozzle.
Then, please refer to Fig. 2, the vertical view of aforesaid substrate shown in it 100 makes the alignment film material liquid 10a that splashes into substrate 100 leave standstill a period of time, can make it diffuse to form face 130 gradually, as shown in Figure 3.Toast again at last and promptly form an alignment film.Yet, the thickness inequality that the most normal problem that runs into of this kind method is the alignment film that forms, and also wayward for the profile of alignment film.And the quality quality of alignment film can cause very big influence for the display characteristic of liquid crystal panel.
Summary of the invention
Purpose of the present invention just provides a kind of method that forms alignment film, and it can form the alignment film with homogeneous film thickness and perfect profile by the substrate surface in the viewing area.
A further object of the present invention provides a kind of substrate of liquid crystal panel, and it has the alignment film of homogeneous film thickness and perfect profile.
Therefore, the present invention proposes a kind of method that forms alignment film, and the method at first provides a substrate, and this substrate has a viewing area and a non-display area, and described non-display area is around described viewing area; On described substrate, form one silica layer; Remove the described silicon oxide layer in the described non-display area; With uv irradiation method or laser treatment method or plasma processing method described silicon oxide layer is handled, made described silicon oxide layer surface be water wettability, so that the silicon oxide layer in the described viewing area is converted into a water wettability rete.Then, with the alignment film material fluid drips of a possess hydrophilic property on the water wettability rete.At last, make the alignment film material liquid curing of described possess hydrophilic property become an alignment film.
One embodiment of the invention form in the method for alignment film, after forming the water wettability rete and with the alignment film material fluid drips before on the water wettability rete, also be included in formation one hydrophobicity rete on the substrate in the non-display area.
One embodiment of the invention form in the method for alignment film, and the step of above-mentioned formation hydrophobicity rete comprises, at first, deposition one material layer on substrate, this material layer be selected from polysilicon, amorphous silicon, silicon nitride and combination thereof one of them.Then, remove material layer in the viewing area.At last, material layer is carried out a treatment step, so that the surface of material layer is hydrophobicity.
One embodiment of the invention form in the method for alignment film, and above-mentioned treatment step comprises UV-irradiation, laser treatment or Cement Composite Treated by Plasma.
One embodiment of the invention form in the method for alignment film, and aforesaid substrate is a thin-film transistor array base-plate.
One embodiment of the invention form in the method for alignment film, and aforesaid substrate is a colored optical filtering substrates.
The present invention proposes a kind of method that forms alignment film again.The method at first provides a substrate, and this substrate has a viewing area and a non-display area, and described non-display area is around described viewing area; On described substrate the deposition one material layer, described material layer be selected from polysilicon, amorphous silicon, silicon nitride and combination thereof one of them; Remove the described material layer in the described viewing area; With uv irradiation method or laser treatment method or plasma processing method described material layer is carried out a treatment step,, be converted into a hydrophobicity rete on the substrate in non-display area so that the surface of described material layer is hydrophobicity.Then with the alignment film material fluid drips of a possess hydrophilic property on the substrate of viewing area.At last, make the alignment film material liquid curing of described possess hydrophilic property become an alignment film.
One embodiment of the invention form in the method for alignment film, and aforesaid substrate is a thin-film transistor array base-plate.
One embodiment of the invention form in the method for alignment film, and aforesaid substrate is a colored optical filtering substrates.
The present invention reintroduces a kind of method that forms alignment film, and the method at first provides a substrate, and substrate has a viewing area and a non-display area.Then, form a restraining barrier on the substrate in non-display area, wherein, the restraining barrier height be higher than substrate surface one predetermined altitude and with an alignment film material fluid drips on the substrate of viewing area.At last, make the alignment film material liquid curing become an alignment film.
One embodiment of the invention form in the method for alignment film, and the method that forms the restraining barrier is included in and forms a photoresist layer on the substrate.Then, carry out a photoetching process with the patterning photoresist layer.
One embodiment of the invention form in the method for alignment film, and aforesaid substrate is a thin-film transistor array base-plate.
One embodiment of the invention form in the method for alignment film, and aforesaid substrate is a colored optical filtering substrates.
The present invention proposes a kind of substrate of liquid crystal panel in addition, and it comprises a substrate, a water wettability rete and an alignment film.Wherein, substrate has a viewing area and a non-display area, and the water wettability rete is configured on the substrate in the viewing area, and in addition, alignment film is configured on the water wettability rete.
In the substrate of the described liquid crystal panel of one embodiment of the invention, above-mentioned water wettability rete is an one silica layer, and the surface of silicon oxide layer is a water wettability.
In the substrate of the described liquid crystal panel of one embodiment of the invention, also comprise a hydrophobicity rete, be configured on the substrate in the non-display area.
In the substrate of the described liquid crystal panel of one embodiment of the invention, the material of above-mentioned hydrophobicity rete be selected from polysilicon layer, amorphous silicon layer, silicon nitride and combination thereof one of them, and its surface is a hydrophobicity.
In the substrate of the described liquid crystal panel of one embodiment of the invention, aforesaid substrate is a thin-film transistor array base-plate.
In the substrate of the described liquid crystal panel of one embodiment of the invention, aforesaid substrate is a colored optical filtering substrates.
The present invention proposes a kind of substrate of liquid crystal panel again, and it comprises a substrate, a hydrophobicity rete and an alignment film.Wherein, substrate has a viewing area and a non-display area.And the hydrophobicity rete is configured on the substrate of non-display area, and alignment film is configured on the substrate in the viewing area.
In the substrate of the described liquid crystal panel of one embodiment of the invention, the material of above-mentioned hydrophobicity rete be selected from polysilicon layer, amorphous silicon layer, silicon nitride and combination thereof one of them, and its surface is a hydrophobicity.
In the substrate of the described liquid crystal panel of one embodiment of the invention, aforesaid substrate is a thin-film transistor array base-plate.
In the substrate of the described liquid crystal panel of one embodiment of the invention, aforesaid substrate is a colored optical filtering substrates.
The present invention reintroduces a kind of substrate of liquid crystal panel, and it comprises a substrate, a restraining barrier and an alignment film.Wherein, substrate has a viewing area and a non-display area.The restraining barrier is configured on the substrate of non-display area, and wherein, the height on restraining barrier is higher than substrate surface one predetermined altitude.In addition, alignment film is on the substrate that is configured in the viewing area.
In the substrate of the described liquid crystal panel of one embodiment of the invention, above-mentioned predetermined altitude is between the 500-1100 dust.
In the substrate of the described liquid crystal panel of one embodiment of the invention, the material on above-mentioned restraining barrier is the photoresist material.
In the substrate of the described liquid crystal panel of one embodiment of the invention, aforesaid substrate is a thin-film transistor array base-plate.
In the substrate of the described liquid crystal panel of one embodiment of the invention, aforesaid substrate is a colored optical filtering substrates.
The method that the present invention forms alignment film is to form on the substrate that utilizes in the viewing area to form a hydrophobicity rete on a water wettability rete and the substrate in non-display area.Utilize the surface hydrophilic of rete and the zone that hydrophobic property defines alignment film, and can make it have face uniformly.Therefore, the method that the present invention forms alignment film makes alignment film have preferable face character, and then makes display panels reach better display quality.
Description of drawings
Fig. 1 is the coating method figure of inkjet nozzle in the prior art;
Fig. 2 is the vertical view of pixel electrode surface;
Fig. 3 is thickness and the uneven alignment film face of profile synoptic diagram;
Fig. 4 A-4E is the flow process diagrammatic cross-section that forms alignment film according to first embodiment of the invention;
Fig. 4 F is the vertical view of the first embodiment alignment film profile;
Fig. 5 A-5E is the flow process diagrammatic cross-section that forms alignment film according to second embodiment of the invention;
Fig. 5 F is the vertical view of the second embodiment alignment film profile;
Fig. 6 A-Fig. 6 F is the flow process diagrammatic cross-section that forms alignment film according to third embodiment of the invention;
Fig. 6 G is the vertical view of the 3rd embodiment alignment film profile;
Fig. 7 A-Fig. 7 D is the flow process diagrammatic cross-section according to the formation alignment film of fourth embodiment of the invention;
Fig. 7 E is the vertical view of the 4th embodiment alignment film profile.
The main element symbol description:
Alignment film 130,230 substrates 200 viewing area 210a
Non-display area 210b silicon oxide layer 222 water wettability rete 222a
Embodiment
The present invention is above-mentioned to be become apparent with other purpose, feature and advantage in order to allow, and preferred embodiment cited below particularly and conjunction with figs. are described in detail below.
First embodiment:
Fig. 4 A-4E is depicted as the flow process diagrammatic cross-section according to the formation alignment film of first embodiment of the invention.Please refer to Fig. 4 A, at first provide a substrate 200, and substrate 200 has a viewing area 210a and a non-display area 210b.In one embodiment, substrate 200 can be a thin-film transistor array base-plate, and it can comprise and disposes thin film transistor (TFT) (TFT), pixel electrode (ITO), scan wiring (Scan line) and data wiring (Data line) etc.In another embodiment, substrate 200 can be a colored filter substrate, and it can comprise and disposes red, green, blue color resin, black matrix" (Black matrix is BM) with shared electrode (Common electrode) etc.
Then, form a water wettability rete 222a at the viewing area of substrate 200 210a.In a preferred embodiment, the method that forms water wettability rete 222a is as described below.Please refer to Fig. 4 B, at first, can utilize chemical vapor deposition method on substrate 200, to deposit one silica layer 222.Then, carry out photoetching and etching technics, removing the silicon oxide layer 222 in the non-display area 210b, and stay the silicon oxide layer 222 in the 210a of viewing area.
Please refer to Fig. 4 C, again the silicon oxide layer on the 210a of viewing area 222 is carried out a treatment step 221, make the surface nature of silicon oxide layer 222 be converted into water wettability, and form a water wettability rete 222a.Above-mentioned treatment step 221 can adopt UV-irradiation, laser treatment or Cement Composite Treated by Plasma.Above-mentioned treatment step 221 can comprise that more collocation one photomask (not illustrating) comes out the silicon oxide layer 222 of viewing area 210a, and non-display area 210b crested is lived.If the use laser treatment then can be selected whether will use shielding.And above-mentioned Cement Composite Treated by Plasma can be to use oxygen gas plasma or hydrogen gas plasma.
After forming water wettability rete 222a, please refer to Fig. 4 D, then utilize inkjet nozzle (inkjet) 10 or alternate manner that an amount of alignment film material liquid 10a is splashed on the water wettability rete 222a.It should be noted that because alignment film material liquid 10a is a hydrophilic material, for example is polymkeric substance such as Polyimide, polyvinyl alcohol (PVA) and polyamide, and therefore, alignment film material liquid 10a will easily be distributed on the surface of water wettability rete 222a.
Please refer to Fig. 4 E, make the alignment film material liquid 10a that drops in water wettability rete 222a surface leave standstill a period of time it is spread gradually.Afterwards, carry out a curing schedule again, can form an alignment film 230.In the present embodiment, above-mentioned curing schedule can be hot baking processing.
Because the character of surface of alignment film material liquid 10a and water wettability rete 222a is all water wettability, therefore help making alignment film material liquid 10a in the evenly diffusion of the surface of water wettability rete 222a.After solidifying, alignment film material liquid 10a just can form face uniformly.
In addition, more can define alignment film 230 profiles by the position of water wettability rete 222a.More detailed description is, because the restriction of acting force between water wettability rete 222a surface and alignment film material liquid 10a surface molecular, therefore, the alignment film material liquid 10a that splashes into also is difficult for diffusing to water wettability rete 222a zone in addition, thereby alignment film 230 profiles that can define, shown in Fig. 4 F, it is depicted as the vertical view of alignment film 230 profiles.After forming alignment film 230, comprise more and carry out subsequent treatment process that it can be to the rub step of (Rubbing) of alignment film 230.
Therefore, shown in Fig. 4 E, it comprises a substrate 200, a water wettability rete 222a and an alignment film 230 with the board structure of the above-mentioned formed liquid crystal panel of method.Wherein, substrate 200 has a viewing area 210a and a non-display area 210b, and water wettability rete 222a is configured on the interior substrate 200 of viewing area 210a, and in addition, alignment film 230 is configured on the water wettability rete 222a.
Second embodiment:
Fig. 5 A-5E is depicted as the flow process diagrammatic cross-section according to the formation alignment film of second embodiment of the invention.Please refer to Fig. 5 A, at first provide a substrate 200, and substrate 200 has a viewing area 210a and a non-display area 210b, and this substrate 200 can be a thin-film transistor array base-plate or colored filter substrate.
Then, form a hydrophobicity rete 242a at the non-display area 210b of substrate 200.In a preferred embodiment, the method that forms hydrophobicity rete 242a is as described below.
Please refer to Fig. 5 B, can utilize plasma-enhanced chemical vapor deposition method (PECVD) on substrate 200, to deposit layer of material layer 242, this material layer 242 can be polysilicon layer, amorphous silicon layer, silicon nitride and combination thereof one of them.Then, carry out photoetching and etching technics, only stay the material layer 242 of patterning in the non-display area 210b.
Please refer to Fig. 5 C, material layer 242 to the last patterning of non-display area 210b carries out a treatment step 221 again, it can be UV-irradiation, laser treatment or Cement Composite Treated by Plasma, makes the surface nature of material layer 242 be converted into hydrophobicity, and then forms a hydrophobicity rete 242a.
Above-mentioned treatment step 221 photomask (not illustrating) of can also arranging in pairs or groups comes out the material layer 242 of non-display area 210b, and viewing area 210a crested is lived.If the use laser treatment then can be selected whether will use shielding.And above-mentioned Cement Composite Treated by Plasma can be to use oxygen gas plasma or hydrogen gas plasma.Certainly, not limiting must be processing mode with above-mentioned, as long as can allow the surface nature of material layer 242 present hydrophobicity.
Please refer to Fig. 5 D, then, utilize inkjet nozzle 10 or alternate manner that an amount of alignment film material liquid 10a is splashed in the 210a of viewing area.Because alignment film material liquid 10a is a hydrophilic material, it can be subjected to surface nature and be separated by hydrophobic hydrophobicity rete 242a.Therefore, utilize the difference of alignment film material liquid 10a and hydrophobicity rete 242a surface nature, can define the profile of alignment film 230.
Please refer to Fig. 5 E, the alignment film material liquid 10a that splashes in the 210a of viewing area is left standstill a period of time, it is spread gradually.Carry out afterwards can forming an alignment film 230 after the curing schedule.In the present embodiment, above-mentioned curing schedule can use hot baking processing.Please refer to Fig. 5 F, it is depicted as the vertical view of alignment film 230 profiles.Certainly, along with the needs of different designs, also can define alignment film 230 profiles by the position of hydrophobicity rete 242a.Therefore, on the contour design of alignment film 230, have more dirigibility.
Therefore, shown in Fig. 5 E, it comprises a substrate 200, a hydrophobicity rete 242a and an alignment film 230 with substrate 200 structures of the formed liquid crystal panel of said method.Wherein, substrate 200 has a viewing area 210a and a non-display area 210b, and hydrophobicity rete 242a is configured on the interior substrate 200 of non-display area 210b, and in addition, alignment film 230 is configured on the interior substrate 200 of viewing area 210a.
The 3rd embodiment:
Present embodiment is first embodiment and the utilization that combines of the second embodiment technology, and Fig. 6 A-Fig. 6 F is depicted as the flow process diagrammatic cross-section that forms alignment film according to third embodiment of the invention.Please refer to Fig. 6 A-Fig. 6 B, it represents that first embodiment produces the step of the silicon oxide layer 222 of patterning in the viewing area.Then, please refer to Fig. 6 C, it represents that second embodiment forms the material layer 242 of patterning in non-display area 210b.
Then, please refer to Fig. 6 D, simultaneously the silicon oxide layer 222 of viewing area 210a and the material layer 242 of non-display area 210b are carried out a treatment step 221, can adopt UV-irradiation, laser or Cement Composite Treated by Plasma etc.Make silicon oxide layer 222 be converted into water wettability rete 222a, make material layer 242 be converted into hydrophobicity rete 242a.And the thickness of water wettability rete 222a and hydrophobicity rete 242a can be about equally.
Then, please refer to Fig. 6 E-6F, utilize inkjet nozzle 10 or alternate manner that an amount of alignment film material liquid 10a is splashed on the water wettability rete 222a of viewing area 210a.And making the alignment film material liquid 10a that splashes into leave standstill a period of time spreads it gradually.Carry out a curing schedule afterwards, promptly form an alignment film 230.It should be noted that, alignment film material liquid 10a can be subjected to water wettability rete 222a surface nature and be all hydrophilic influence, and then make alignment film material liquid 10a molecule in the evenly diffusion of water wettability rete 222a surface, and after alignment film material liquid 10a solidifies, can form face uniformly.
In addition, because alignment film material liquid 10a can be subjected to surface nature and be separated by the hydrophobicity material, therefore, alignment film material liquid 10a can not diffuse on the hydrophobicity rete 242a, thereby the profile of the complete maintenance alignment film 230 of energy.Please refer to Fig. 6 G, it is depicted as the vertical view of alignment film profile.
Therefore, shown in Fig. 6 F, it comprises a substrate 200, a water wettability rete 222a, a hydrophobicity rete 242a and an alignment film 230 with substrate 200 structures of the formed liquid crystal panel of said method.Wherein, substrate 200 has a viewing area 210a and a non-display area 210b.Water wettability rete 222a is configured on the interior substrate 200 of viewing area 210a, and hydrophobicity rete 242a is configured on the interior substrate 200 of non-display area 210b.In addition, alignment film 230 is configured on the water wettability rete 222a.
The 4th embodiment:
Fig. 7 A-Fig. 7 D is depicted as the flow process diagrammatic cross-section that forms alignment film 230 according to fourth embodiment of the invention.The present embodiment and second embodiment are similar.Fig. 7 A step is identical with Fig. 5 A of second embodiment.Afterwards, please refer to Fig. 7 B, form restraining barrier 250 on the substrate 200 of non-display area 210b, it can be that the photoresist material is made.Present embodiment with and second embodiment is similar a bit, difference is, second embodiment is that the formation surface nature is the hydrophobicity rete in non-display area 210b, and present embodiment is the restraining barrier 250 that forms the photoresist material in non-display area 210b, but both equally all have the function of definition alignment film 230 profiles.The step of Fig. 7 C to Fig. 7 D is identical with the step of Fig. 5 D to Fig. 5 E of second embodiment afterwards.And formed alignment film profile is shown in Fig. 7 E.
What deserves to be mentioned is that in the present embodiment, when forming restraining barrier 250, its thickness must be higher than a predetermined altitude H, and because generally the thickness of alignment film 230 is approximately between the 500-1100 dust, therefore, predetermined altitude H promptly is about the 500-1100 dust.In more detail, if liquid crystal panel is a stable twisted nematic, then predetermined altitude H is about 700 ± 200 dusts, and in order to ensure the effectiveness that stops on restraining barrier 250, therefore suggestion makes restraining barrier 250 thickness of formation at least greater than 900 dusts.In addition, if liquid crystal panel is the vertical orientation type, then predetermined altitude H is about 900 ± 200 dusts, and similarly, restraining barrier 250 thickness that suggestion forms are at least greater than 1100 dusts.In other words, the thickness on restraining barrier 250 can be according to the adjustment of the thickness of alignment film 230 and is changed.
Therefore, shown in Fig. 7 D, it comprises a substrate 200, a restraining barrier 250 and an alignment film 230 with substrate 200 structures of the formed liquid crystal panel of said method.Wherein, substrate 200 has a viewing area 210a and a non-display area 210b.Restraining barrier 250 is configured on the interior substrate 200 of non-display area 210b.In addition, alignment film 230 is configured on the interior substrate 200 of viewing area 210a.
In sum, the method that forms alignment film in the present invention has following advantage at least:
One, because forming the method for alignment film, the present invention can in the viewing area of substrate, form a water wettability rete.Because the water wettability rete can make the alignment film material liquid that is positioned on the hydrophilic membrane spread equably, therefore effectively control the thickness and the profile homogeneity of alignment film.
Two, because forming the method for alignment film, the present invention can in the non-display area of substrate, form a hydrophobicity rete or a restraining barrier.Utilize the hydrophobic film laminar surface characteristic or the position on restraining barrier defining the profile of alignment film, and can make alignment film have preferable thickness evenness.
Three, because the present invention forms the profile that the method for alignment film can be defined alignment film by hydrophobicity and/or water wettability rete or restraining barrier.Therefore, in the design of alignment film profile, also have more dirigibility.
Though the present invention has done explanation as above with preferred embodiment; but it is not in order to limit the present invention; any those skilled in the art; in not breaking away from method of the present invention and scope; can do various replacements and modification, so protection domain of the present invention being as the criterion with defined in claims.
Claims (8)
1. method that forms alignment film is characterized in that comprising:
One substrate is provided, and described substrate has a viewing area and a non-display area, and described non-display area is around described viewing area;
On described substrate, form one silica layer;
Remove the described silicon oxide layer in the described non-display area;
With uv irradiation method or laser treatment method or plasma processing method described silicon oxide layer is handled, made described silicon oxide layer surface be water wettability, so that the silicon oxide layer in the described viewing area is converted into a water wettability rete;
With the alignment film material fluid drips of a possess hydrophilic property on described water wettability rete; And
Make the alignment film material liquid curing of described possess hydrophilic property become an alignment film.
2. a kind of method that forms alignment film according to claim 1, it is characterized in that after forming described water wettability rete and with described alignment film material fluid drips before on the described water wettability rete, also be included in and form a hydrophobicity rete on the substrate in the described non-display area.
3. a kind of method that forms alignment film according to claim 2 is characterized in that the step that forms described hydrophobicity rete comprises:
On described substrate the deposition one material layer, described material layer be selected from polysilicon, amorphous silicon, silicon nitride and combination thereof one of them;
Remove the described material layer in the described viewing area; And
With uv irradiation method or laser treatment method or plasma processing method described material layer is handled, so that described material surface is hydrophobicity.
4. a kind of method that forms alignment film according to claim 1 is characterized in that described substrate is a thin-film transistor array base-plate.
5. a kind of method that forms alignment film according to claim 1 is characterized in that described substrate is a colored optical filtering substrates.
6. method that forms alignment film is characterized in that comprising:
One substrate is provided, and described substrate has a viewing area and a non-display area, and described non-display area is around described viewing area;
On described substrate the deposition one material layer, described material layer be selected from polysilicon, amorphous silicon, silicon nitride and combination thereof one of them;
Remove the described material layer in the described viewing area;
With uv irradiation method or laser treatment method or plasma processing method described material layer is carried out a treatment step,, be converted into a hydrophobicity rete on the substrate in described non-display area so that the surface of described material layer is hydrophobicity;
With the alignment film material fluid drips of a possess hydrophilic property on the substrate of described viewing area; And
Make the alignment film material liquid curing of described possess hydrophilic property become an alignment film.
7. a kind of method that forms alignment film according to claim 6 is characterized in that described substrate is a thin-film transistor array base-plate.
8. a kind of method that forms alignment film according to claim 6 is characterized in that described substrate is a colored optical filtering substrates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN113917718A (en) * | 2021-09-29 | 2022-01-11 | 惠科股份有限公司 | Color developing reagent and method for detecting alignment film boundary |
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