CN100549199C - A kind of manufacture method of magnetron sputtering Co-Cr-Ta alloy target - Google Patents
A kind of manufacture method of magnetron sputtering Co-Cr-Ta alloy target Download PDFInfo
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- CN100549199C CN100549199C CNB2007103038212A CN200710303821A CN100549199C CN 100549199 C CN100549199 C CN 100549199C CN B2007103038212 A CNB2007103038212 A CN B2007103038212A CN 200710303821 A CN200710303821 A CN 200710303821A CN 100549199 C CN100549199 C CN 100549199C
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Abstract
The invention belongs to metallurgical preparation field, particularly a kind of manufacture method of magnetron sputtering Co-Cr-Ta alloy target.This method is with 99.95% electrolytic cobalt, 99.9% electrolysis chromium, and 99.9% tantalum is a raw material, through vacuum melting, ingot casting, forging, rolling, thermal treatment (or through vacuum melting, ingot casting, rolling, thermal treatment), be machined to finished product then.Alloying constituent at% scope is: Co 73-88%, Cr 8-25%, Ta 2-6%; Teeming temperature is more than fusing point 50 ℃～150 ℃ in fusion process, and forging temperature is at 1000 ℃～1200 ℃, and rolling temperature is 1100 ℃～1300 ℃, and thermal treatment temp is 700 ℃～1000 ℃, is incubated 4～10 hours, quenches then.It is accurate that the present invention compared with prior art has the finished product Composition Control, is evenly distributed the purity height of finished product, the advantage that density is big, magnetic spectroscopy susceptibility is high.
Description
Technical field
The invention belongs to metallurgical preparation field, particularly a kind of manufacture method of magnetron sputtering Co-Cr-Ta alloy target.
Background technology
Along with the progress of development of science and technology and society, magnetic recording medium just proposes the perpendicular magnetic recording pattern towards big storage capability, high-density development as far back as the eighties, and CoCr, CoCrPt, CoCrTa and CoCrPtTa are main magnetic recording medias.Because the film purity height that magnetically controlled sputter method plates out, structure control is accurate, makes the method that magnetic elements extensively adopts and become the depositing high-quality magneticthin film.But the magnetron sputtering deposition magneticthin film exists the problem that the ferromegnetism target is difficult to normal sputter, and this difficulty has hindered the production and the application of high performance magnetic film and device.Solve this difficult problem, one of method is exactly to improve the magnetic susceptibility of ferromegnetism target (PTF, Pass Through Flux).
At present, the method for manufacturing magnetron sputtering Co-Cr-Ta alloy target mainly contains two kinds:
1, powder sintering
This method is earlier with the material vacuum induction melting, adopts quick quenching technique to make strip then, is broken into powder, and sintering under high temperature, high pressure is again through being machined to finished product.
The advantage of this method is: distributed components, accurate composition control.Shortcoming is: in broken and sintering process, inevitably can introduce impurity, technical process is longer, and product density and magnetic spectroscopy susceptibility are lower.(JP?Patent?Number：308080/1992)
2, vacuum induction melting method
This method is with the material vacuum induction melting, ingot casting, and through forging, rolling (or ingot casting is directly rolling) is machined to finished product at last then.
The advantage of this method is: technical process is shorter, and the impurity of introducing is less, the height that magnetic spectroscopy susceptibility is made than powder method.The shortcoming of this method is: technology will strictly be controlled, otherwise the principal constituent deviation is big, and magnetic spectroscopy susceptibility is still lower.
Summary of the invention
The object of the present invention is to provide a kind of finished product Composition Control accurate, be evenly distributed, the purity height of finished product, the manufacture method of the magnetron sputtering Co-Cr-Ta alloy target material that density is big, magnetic spectroscopy susceptibility is high.
According to above-mentioned purpose, the technical scheme of integral body of the present invention is: adopt vacuum induction melting method, adjust proportion scale and fixing melting technology, the assurance Composition Control is accurate; Adopt deformation processing and heat treated way to improve the density and the magnetic spectroscopy susceptibility of product.
According to above-mentioned purpose and whole technical scheme, the concrete technical scheme of the present invention is with vacuum induction melting prepared Co-Cr-Ta alloy, promptly by batching, melting, ingot casting, forging, rolling, thermal treatment, finished product is made in machining then, and concrete steps are as follows:
1, batching: take by weighing electrolysis Co, Cr and Ta metal block by proportion scale.Material purity is more than 99.9%, and alloying constituent wt% scope is: Co 73-88%, Cr 8-25%, Ta 2-6%;
2, melting, ingot casting: the metal block that weighs up is put into the vacuum induction melting furnace crucible, smelt by common smelting technology, refining time is 9～13 minutes, casting when Co-Cr-Ta alloy melt temperature reaches more than the liquidus surface 50～150 ℃;
3, forge: melting gained ingot blank is placed in the retort furnace, forges into the slab of specified dimension 1000～1200 ℃ of insulations after 1～1.5 hour;
4, rolling: as the slab after the above-mentioned forging to be put into the retort furnace of steel rolling special use, be rolled into the slab of specified dimension 1100～1300 ℃ of insulations after 1～1.5 hour;
5, thermal treatment: rolling good slab is put into heat treatment furnace, and the uniform temperature zone of heat treatment furnace must be greater than the length for the treatment of product, 700～1000 ℃ of insulations 4～10 hours; Rapid then taking-up is put into icy salt solution and is quenched;
6, machining: by the dimensional requirement machining, first line cuts into the disk of specified dimension with the Co-Cr-Ta alloy slab after the thermal treatment, becomes to meet the Co-Cr-Ta alloy target material of dimensional precision again with the lathe car.
This technical process promptly will be passed through batching, melting, ingot casting, rolling, thermal treatment for vacuum induction melting prepared Co-Cr-Ta alloy, and finished product is made in machining then, and concrete steps are as follows:
A, batching: take by weighing electrolysis Co, Cr and Ta metal block by proportion scale.Material purity is more than 99.9%, and alloying constituent wt% scope is: Co 73-88%, Cr 8-25%, Ta 2-6%;
B, melting, ingot casting: the metal block that weighs up is put into the vacuum induction melting furnace crucible, smelt by common smelting technology, refining time is 9～13 minutes, casts when Co-Cr-Ta alloy melt temperature reaches more than the liquidus surface 50～150 ℃;
C, rolling: above-mentioned ingot casting is put into the retort furnace of steel rolling special use, be rolled into the slab of specified dimension 1100～1300 ℃ of insulations after 1～1.5 hour;
D, thermal treatment: rolling good slab is put into heat treatment furnace, and the uniform temperature zone of heat treatment furnace must be greater than the length for the treatment of product, 700～1000 ℃ of insulations 4～10 hours; Rapid then taking-up is put into icy salt solution and is quenched;
E, machining: by the dimensional requirement machining, first line cuts into the disk of specified dimension with the Co-Cr-Ta alloy slab after the thermal treatment, becomes to meet the Co-Cr-Ta alloy target material of dimensional precision again with the lathe car.
It is accurate that the present invention compared with prior art has the finished product Composition Control, is evenly distributed the purity height of finished product, the advantage that density is big, magnetic spectroscopy susceptibility is high.Above-mentioned advantage is specific as follows: Composition Control accurately≤0.2at%, density is up to 9.20g/cm
3More than, purity is up to more than 99.93%, and magnetic spectroscopy susceptibility is more than 60%, and gas and metals content impurity are all lower.。
Embodiment
According to the manufacture method and the raw material of magnetron sputtering Co-Cr-Ta alloy target material of the present invention, 7 batches of Co-Cr-Ta alloy disks have been prepared.Table 1 is raw materials used and processing step, processing parameter and a prior art Comparative Examples contrast table of the embodiment of the invention; Table 2 embodiment of the invention is compared with the prior art the performance comparison table of routine product.Contrast is for convenience listed the processing parameter and the performance of prior art Comparative Examples in the table in, and wherein 1-7# is the embodiment of the invention, and 8-10# is the prior art Comparative Examples.
Table 1 table 1 is raw materials used and processing step, processing parameter and a prior art Comparative Examples contrast table of the embodiment of the invention
Table 2 embodiment of the invention is compared with the prior art the performance table of routine product
Claims (2)
1. the manufacture method of a magnetron sputtering Co-Cr-Ta alloy target, it is characterized in that technical process is with vacuum induction melting prepared Co-Cr-Ta alloy, promptly will pass through batching, melting, ingot casting, forging, rolling, thermal treatment, finished product is made in machining then, and concrete steps are as follows:
A, batching: take by weighing electrolysis Co, Cr and Ta metal block by proportion scale.Material purity is more than 99.9%, and alloying constituent wt% scope is: Co 73-88%, Cr 8-25%, Ta 2-6%;
B, melting, ingot casting: the metal block that weighs up is put into the vacuum induction melting furnace crucible, smelt by common smelting technology, refining time is 9～13 minutes, casts when Co-Cr-Ta alloy melt temperature reaches more than the liquidus surface 50～150 ℃;
C, forging: melting gained ingot blank is placed in the retort furnace, forges into the slab of specified dimension 1000～1200 ℃ of insulations after 1～1.5 hour;
D, rolling: the slab after the above-mentioned forging is put into the retort furnace of steel rolling special use, be rolled into the slab of specified dimension 1100～1300 ℃ of insulations after 1～1.5 hour;
E, thermal treatment: rolling good slab is put into heat treatment furnace, and the uniform temperature zone of heat treatment furnace must be greater than the length for the treatment of product, 700～1000 ℃ of insulations 4～10 hours; Rapid then taking-up is put into icy salt solution and is quenched;
F, machining: by the dimensional requirement machining, first line cuts into the disk of specified dimension with the Co-Cr-Ta alloy slab after the thermal treatment, becomes to meet the Co-Cr-Ta alloy target material of dimensional precision again with the lathe car.
2, a kind of manufacture method of magnetron sputtering Co-Cr-Ta alloy target is characterized in that technical process is with vacuum induction melting prepared Co-Cr-Ta alloy, promptly will be by batching, vacuum melting, ingot casting, rolling, thermal treatment, finished product is made in machining then, and concrete steps are as follows:
A, batching: take by weighing electrolysis Co, Cr and Ta metal block by proportion scale.Material purity is more than 99.9%, and alloying constituent wt% scope is: Co 73-88%, Cr 8-25%, Ta 2-6%;
B, melting, ingot casting: the metal block that weighs up is put into the vacuum induction melting furnace crucible, smelt by common smelting technology, refining time is 9～13 minutes, casts when Co-Cr-Ta alloy melt temperature reaches more than the liquidus surface 50～150 ℃;
C, rolling: above-mentioned ingot casting is put into the retort furnace of steel rolling special use, be rolled into the slab of specified dimension 1100～1300 ℃ of insulations after 1～1.5 hour;
D, thermal treatment: rolling good slab is put into heat treatment furnace, and the uniform temperature zone of heat treatment furnace must be greater than the length for the treatment of product, 700～1000 ℃ of insulations 4～10 hours; Rapid then taking-up is put into icy salt solution and is quenched;
E, machining: by the dimensional requirement machining, first line cuts into the disk of specified dimension with the Co-Cr-Ta alloy slab after the thermal treatment, becomes to meet the Co-Cr-Ta alloy target material of dimensional precision again with the lathe car.
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| CNB2007103038212A CN100549199C (en) | 2007-12-26 | 2007-12-26 | A kind of manufacture method of magnetron sputtering Co-Cr-Ta alloy target |
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| CNB2007103038212A CN100549199C (en) | 2007-12-26 | 2007-12-26 | A kind of manufacture method of magnetron sputtering Co-Cr-Ta alloy target |
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| CN101195882A CN101195882A (en) | 2008-06-11 |
| CN100549199C true CN100549199C (en) | 2009-10-14 |
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101824599B (en) * | 2010-05-24 | 2012-07-04 | 陕西斯瑞工业有限责任公司 | Method for preparing Cr target by adopting vacuum casting method |
| CN104975264B (en) * | 2010-07-29 | 2020-07-28 | 吉坤日矿日石金属株式会社 | Sputtering target for magnetic recording film and method for producing same |
| CN102485948A (en) * | 2010-12-06 | 2012-06-06 | 北京有色金属研究总院 | FeCoTaZr alloy sputtering target material and manufacture method thereof |
| CN102424940A (en) * | 2011-12-20 | 2012-04-25 | 宁波江丰电子材料有限公司 | Preparation method for high-purity cobalt target |
| CN102677005B (en) * | 2012-05-21 | 2013-11-06 | 烟台希尔德新材料有限公司 | Method for manufacturing large-sized high-density chromium target |
| CN104646930B (en) * | 2013-11-21 | 2017-07-04 | 安泰科技股份有限公司 | The manufacture method of Ni W Cr alloy target materials |
| CN104651788B (en) * | 2013-11-21 | 2017-03-15 | 安泰科技股份有限公司 | Ni Fe W alloys targets and its manufacture method |
| CN109161729B (en) * | 2018-10-26 | 2020-12-08 | 南方科技大学 | Cobalt-chromium-tantalum alloy and preparation method thereof |
| CN114540669A (en) * | 2022-02-22 | 2022-05-27 | 东莞理工学院 | Cobalt-chromium alloy for finger ring and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001073125A (en) * | 1999-09-08 | 2001-03-21 | Nikko Materials Co Ltd | Co-Ta ALLOY SPUTTERING TARGET AND ITS PRODUCTION |
| JP2001303242A (en) * | 2000-04-27 | 2001-10-31 | Mitsui Mining & Smelting Co Ltd | Manufacturing method of sputtering target |
| CN1827843A (en) * | 2001-04-11 | 2006-09-06 | 黑罗伊斯有限公司 | Pt-co based sputtering targets |
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- 2007-12-26 CN CNB2007103038212A patent/CN100549199C/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001073125A (en) * | 1999-09-08 | 2001-03-21 | Nikko Materials Co Ltd | Co-Ta ALLOY SPUTTERING TARGET AND ITS PRODUCTION |
| JP2001303242A (en) * | 2000-04-27 | 2001-10-31 | Mitsui Mining & Smelting Co Ltd | Manufacturing method of sputtering target |
| CN1827843A (en) * | 2001-04-11 | 2006-09-06 | 黑罗伊斯有限公司 | Pt-co based sputtering targets |
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