CN100545989C - Shadow mask cleaning and recycling process - Google Patents
Shadow mask cleaning and recycling process Download PDFInfo
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- CN100545989C CN100545989C CNB2008100209755A CN200810020975A CN100545989C CN 100545989 C CN100545989 C CN 100545989C CN B2008100209755 A CNB2008100209755 A CN B2008100209755A CN 200810020975 A CN200810020975 A CN 200810020975A CN 100545989 C CN100545989 C CN 100545989C
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- shadow mask
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W30/00—Technologies for solid waste management
- Y02W30/50—Reuse, recycling or recovery technologies
- Y02W30/82—Recycling of waste of electrical or electronic equipment [WEEE]
Abstract
The present invention is a shadow mask cleaning and recycling process, it is characterized in that the processing step of this method is divided into, 1) the citric acid cleaning; 2) washed with de-ionized water; 3) sodium hydroxide solution cleans; 4) washed with de-ionized water; 5) acetic acid cleans; 6) washed with de-ionized water; 7) ammoniacal liquor cleans; 8) the morphine quinoline cleans; 9) hyperthermia drying.Beneficial effect of the present invention: a kind of brand-new shadow mask net cleaning method is provided, can thoroughly wash the shadow mask cleaning and recycling process of bismuth oxide on the shadow mask, it is determined by process conditions, the bismuth oxide that shadow mask is online is thoroughly removed, making recovery shadow mask net get back to production line as parts fully reuses, thereby improve the recovery value of shadow mask net greatly, have wide economic worth and social value.The present invention is used for the cleaning of electron wastes shadow mask net and reclaims technology, has good economic benefit and environmental benefit, wide application prospect.
Description
Technical field
The present invention relates to a kind of shadow mask and clean the method that reclaims, this method can be widely used in the recycling of shadow mask.Belong to shadow mask and clean the recovery technology field.
Background technology
In all color CRT picture tubes, all need shadow mask, a lot of apertures are arranged on the shadow mask, the last light emitting pixel point of the corresponding screen in each hole, the electron gun divergent bundle is luminous by the last fluorescent material of shadow mask eyelet bombardment screen, shadow mask plays RGB and selects the look effect, reaches red rifle and excites the rouge and powder point, and blue electron gun excites the blue powder point, green electron gun excites green powder point, thereby presents colour.Yet electronics bombards shadow mask at a high speed; time can produce heat once long; cause the shadow mask metal to expand with heat and contract with cold and be out of shape; can not guarantee when causing electron beam that red rifle excites the rouge and powder point by shadow mask; green electron gun excites green powder point; blue electron gun excites the blue powder point, random look can occur on the screen like this, can't normally reduce realistic colour.On shadow mask, evenly spray one deck bismuth oxide,, so spraying bismuth oxide technology is just arranged in the production process one because the crisp rigidity of bismuth oxide just can prevent the shadow mask temperature distortion.But when reclaiming shadow mask, there is the more crisp particle of one deck bismuth oxide bisque part to come off above, much can stops up shadow mask hole, directly return production line and can't use, must thorough removing bismuth oxide and normally use of spraying again.Yet, still find no the method for thorough removing bismuth oxide in the prior art.Cause the shadow mask net to scrap recycling according to old metal.
Summary of the invention
The present invention is intended to propose a kind of shadow mask cleaning and recycling process that can thoroughly wash bismuth oxide on the shadow mask, it is determined by process conditions, the bismuth oxide that shadow mask is online is thoroughly removed, making recovery shadow mask net get back to production line as parts fully reuses, thereby improve the recovery value of shadow mask net greatly, have wide economic worth and social value.
Technical solution of the present invention: shadow mask cleaning and recycling process, it is characterized in that the processing step of this method is divided into,
1) citric acid cleans, and shadow mask is tilted, puts into lentamente (this requires as follows, purpose is to prevent the wire side distortion) citric acid rinse bath immersion, this technological requirement: acid strength 5-7%, acid liquor temperature 50-70 ℃, soak time 10-30 second;
2) washed with de-ionized water, shadow mask moved on in the washed with de-ionized water groove (contain ultrasonic wave), purpose is to reduce the concentration of mask surface acid and remove rusty stain, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 20-40 second, rinse bath cleaning liquid inside (overflow suitable for reading) pH value 〉=4;
3) sodium hydroxide solution cleans, and shadow mask is moved on in the NaOH rinse bath, utilizes the character of amphiprotic substance, make oxidation secret with NaOH generation chemical action.This technological requirement: concentration of lye 25-30%, soak time 6-10 minute, alkali liquid temperature 85-105 ℃;
4) washed with de-ionized water, shadow mask moved on in the washed with de-ionized water groove (contain ultrasonic wave), purpose is to reduce the concentration of mask surface alkali and remove bismuth oxide, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 20-40 second, rinse bath cleaning liquid inside (overflow suitable for reading) pH value≤9;
5) acetic acid cleans, and shadow mask is moved on to (bubbling) in the acetic acid rinse bath, purpose be further in and the residual alkali lye and the clean surface speckle of mask surface, this technological requirement: acetate concentration 1.4-1.8%, scavenging period 10-20 second;
6) washed with de-ionized water, shadow mask is moved on to (bubbling) in the washed with de-ionized water groove, and purpose is to reduce the concentration of mask surface acetic acid, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 20-40 second, rinse bath cleaning liquid inside (overflow suitable for reading) pH value 6-7;
7) ammoniacal liquor cleans, and shadow mask is moved on to (bubbling) in the ammoniacal liquor rinse bath, purpose be further in and the residual acetic acid of mask surface.This technological requirement: ammonia concn 0.05-0.09%, scavenging period 10-20 second;
8) the morphine quinoline cleans, and shadow mask is moved on in the morphine quinoline rinse bath (bubbling), and purpose is that the mask surface oiling is protected.This technological requirement: morphine quinoline concentration 0.05-0.09%, scavenging period 10-20 second, temperature 55-65 ℃;
9) hyperthermia drying, treat that liquid above the shadow mask does not drip till, shadow mask is put on the oven dry frame of baking oven and is dried, take out the oven dry back.This technological requirement: oven temperature 120-220 ℃, drying time 30-60 minute;
The beneficial effect that the present invention has compared to existing technology: the invention provides a kind of brand-new shadow mask net cleaning method, can thoroughly wash the shadow mask cleaning and recycling process of bismuth oxide on the shadow mask, it is determined by process conditions, the bismuth oxide that shadow mask is online is thoroughly removed, making recovery shadow mask net get back to production line as parts fully reuses, thereby improve the recovery value of shadow mask net greatly, have wide economic worth and social value.The present invention is used for the cleaning of electron wastes shadow mask net and reclaims technology, has good economic benefit and environmental benefit, wide application prospect.
Embodiment
The super screen of embodiment 1:25 inch bismuth oxide shadow mask cleans
1) citric acid cleans, and shadow mask is tilted, puts into lentamente (this requires as follows, purpose is to prevent the wire side distortion) citric acid rinse bath immersion, this technological requirement: acid strength 5%, 50 ℃ of acid liquor temperatures, soak time 10 seconds;
2) washed with de-ionized water, shadow mask moved on in the washed with de-ionized water groove (contain ultrasonic wave), purpose is to reduce the concentration of mask surface acid and remove rusty stain, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 20 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value 〉=4;
3) sodium hydroxide solution cleans, and shadow mask is moved on in the NaOH rinse bath, utilizes the character of amphiprotic substance, make oxidation secret with NaOH generation chemical action.This technological requirement: concentration of lye 25%, soak time 6 minutes, 85 ℃ of alkali liquid temperatures;
4) washed with de-ionized water, shadow mask moved on in the washed with de-ionized water groove (contain ultrasonic wave), purpose is to reduce the concentration of mask surface alkali and remove bismuth oxide, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 20 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value≤9;
5) acetic acid cleans, and shadow mask is moved on to (bubbling) in the acetic acid rinse bath, purpose be further in and the residual alkali lye and the clean surface speckle of mask surface, this technological requirement: acetate concentration 1.4%, scavenging period 10 seconds;
6) washed with de-ionized water, shadow mask is moved on to (bubbling) in the washed with de-ionized water groove, and purpose is to reduce the concentration of mask surface acetic acid, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 20 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value 6-7;
7) ammoniacal liquor cleans, and shadow mask is moved on to (bubbling) in the ammoniacal liquor rinse bath, purpose be further in and the residual acetic acid of mask surface.This technological requirement: ammonia concn 0.05%, scavenging period 10 seconds;
8) the morphine quinoline cleans, and shadow mask is moved on in the morphine quinoline rinse bath (bubbling), and purpose is that the mask surface oiling is protected.This technological requirement: morphine quinoline concentration 0.05%, scavenging period 10 seconds, 55 ℃ of temperature;
9) hyperthermia drying, treat that liquid above the shadow mask does not drip till, shadow mask is put on the oven dry frame of baking oven and is dried, take out the oven dry back.This technological requirement: 120 ℃ of oven temperatures, drying time 30 minutes;
The super screen of 2,21 inches bismuth oxides of embodiment shadow mask cleans
1) citric acid cleans, and shadow mask is tilted, puts into lentamente (this requires as follows, purpose is to prevent the wire side distortion) citric acid rinse bath immersion, this technological requirement: acid strength 6%, 60 ℃ of acid liquor temperatures, soak time 20 seconds;
2) washed with de-ionized water, shadow mask moved on in the washed with de-ionized water groove (contain ultrasonic wave), purpose is to reduce the concentration of mask surface acid and remove rusty stain, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 30 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value 〉=4;
3) sodium hydroxide solution cleans, and shadow mask is moved on in the NaOH rinse bath, utilizes the character of amphiprotic substance, make oxidation secret with NaOH generation chemical action.This technological requirement: concentration of lye 27%, soak time 8 minutes, 95 ℃ of alkali liquid temperatures;
4) washed with de-ionized water, shadow mask moved on in the washed with de-ionized water groove (contain ultrasonic wave), purpose is to reduce the concentration of mask surface alkali and remove bismuth oxide, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 30 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value≤9;
5) acetic acid cleans, and shadow mask is moved on to (bubbling) in the acetic acid rinse bath, purpose be further in and the residual alkali lye and the clean surface speckle of mask surface, this technological requirement: acetate concentration 1.6%, scavenging period 15 seconds;
6) washed with de-ionized water, shadow mask is moved on to (bubbling) in the washed with de-ionized water groove, and purpose is to reduce the concentration of mask surface acetic acid, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 30 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value 6-7;
7) ammoniacal liquor cleans, and shadow mask is moved on to (bubbling) in the ammoniacal liquor rinse bath, purpose be further in and the residual acetic acid of mask surface.This technological requirement: ammonia concn 0.07%, scavenging period 30 seconds;
8) the morphine quinoline cleans, and shadow mask is moved on in the morphine quinoline rinse bath (bubbling), and purpose is that the mask surface oiling is protected.This technological requirement: morphine quinoline concentration 0.07%, scavenging period 30 seconds, 60 ℃ of temperature;
9) hyperthermia drying, treat that liquid above the shadow mask does not drip till, shadow mask is put on the oven dry frame of baking oven and is dried, take out the oven dry back.This technological requirement: 170 ℃ of oven temperatures, drying time 45 minutes;
The super screen of 3,29 inches bismuth oxides of embodiment shadow mask cleans
1) citric acid cleans, and shadow mask is tilted, puts into lentamente (this requires as follows, purpose is to prevent the wire side distortion) citric acid rinse bath immersion, this technological requirement: acid strength 7%, 50 ℃ of acid liquor temperatures, soak time 30 seconds;
2) washed with de-ionized water, shadow mask moved on in the washed with de-ionized water groove (contain ultrasonic wave), purpose is to reduce the concentration of mask surface acid and remove rusty stain, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 40 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value 〉=4;
3) sodium hydroxide solution cleans, and shadow mask is moved on in the NaOH rinse bath, utilizes the character of amphiprotic substance, make oxidation secret with NaOH generation chemical action.This technological requirement: concentration of lye 30%, soak time 10 minutes, 105 ℃ of alkali liquid temperatures;
4) washed with de-ionized water, shadow mask moved on in the washed with de-ionized water groove (contain ultrasonic wave), purpose is to reduce the concentration of mask surface alkali and remove bismuth oxide, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 40 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value≤9;
5) acetic acid cleans, and shadow mask is moved on to (bubbling) in the acetic acid rinse bath, purpose be further in and the residual alkali lye and the clean surface speckle of mask surface, this technological requirement: acetate concentration 1.8%, scavenging period 20 seconds;
6) washed with de-ionized water moves on to (bubbling) in the washed with de-ionized water groove with shadow mask, and purpose is to reduce the concentration of mask surface acetic acid, this technological requirement: deionized water resistivity 〉=5M Ω cm, scavenging period 40 seconds, rinse bath cleaning liquid inside (overflow suitable for reading) pH value 7;
7) ammoniacal liquor cleans, and shadow mask is moved on to (bubbling) in the ammoniacal liquor rinse bath, purpose be further in and the residual acetic acid of mask surface.This technological requirement: ammonia concn 0.09%, scavenging period 20 seconds;
8) the morphine quinoline cleans, and shadow mask is moved on in the morphine quinoline rinse bath (bubbling), and purpose is that the mask surface oiling is protected.This technological requirement: morphine quinoline concentration 0.09%, scavenging period 20 seconds, 65 ℃ of temperature;
9) hyperthermia drying, treat that liquid above the shadow mask does not drip till, shadow mask is put on the oven dry frame of baking oven and is dried, take out the oven dry back.This technological requirement: 220 ℃ of oven temperatures, drying time 60 minutes.
Claims (1)
1, shadow mask cleaning and recycling process is characterized in that the processing step of this method is divided into,
1) citric acid cleans, and shadow mask is tilted, puts into the citric acid rinse bath lentamente and soak, and wherein shadow mask being tilted, putting into lentamente is in order to prevent wire side distortion, acid strength 5%-7%, 50 ℃-70 ℃ of acid liquor temperatures, soak time 10 seconds-30 seconds;
2) washed with de-ionized water, shadow mask is moved on in the washed with de-ionized water groove that contains ultrasonic vibration, purpose is to reduce the concentration of mask surface acid and remove rusty stain, deionized water resistivity 〉=5M Ω cm, scavenging period 20 seconds-40 seconds, cleaning fluid pH value 〉=4 that the overflow suitable for reading of rinse bath cleaning liquid inside is obtained;
3) sodium hydroxide solution cleans, and shadow mask is moved on in the NaOH rinse bath, makes bismuth oxide and NaOH generation chemical action, concentration of lye 25%-30%, soak time 6 minutes-10 minutes, 85 ℃-105 ℃ of alkali liquid temperatures;
4) washed with de-ionized water, shadow mask is moved on in the washed with de-ionized water groove that contains ultrasonic vibration, purpose is to reduce the concentration of mask surface alkali and remove bismuth oxide, deionized water resistivity 〉=5M Ω cm, scavenging period 20 seconds-40 seconds, cleaning fluid pH value≤9 that the overflow suitable for reading of rinse bath cleaning liquid inside is obtained;
5) acetic acid cleans, shadow mask is moved on in the acetic acid rinse bath, bubbling, purpose be further in and the residual alkali lye and the clean surface speckle of mask surface, acetate concentration 1.4%-1.8%, scavenging period 10 seconds-20 seconds;
6) washed with de-ionized water, shadow mask is moved on to bubbling in the washed with de-ionized water groove, and purpose is to reduce the concentration of mask surface acetic acid, deionized water resistivity 〉=5M Ω cm, scavenging period 20 seconds-40 seconds, the cleaning fluid pH value 6-pH value 7 that the overflow suitable for reading of rinse bath cleaning liquid inside is obtained;
7) ammoniacal liquor cleans, shadow mask is moved on in the ammoniacal liquor rinse bath, bubbling, purpose be further in and the residual acetic acid of mask surface, ammonia concn 0.05%-0.09%, scavenging period 10 seconds-20 seconds;
8) the morphine quinoline cleans, shadow mask is moved on in the morphine quinoline rinse bath, and bubbling, purpose is to the protection of mask surface oiling, morphine quinoline concentration 0.05%-0.09%, scavenging period 10 seconds-20 seconds, 55 ℃-65 ℃ of temperature;
9) hyperthermia drying is put into shadow mask on the oven dry frame of baking oven and is dried 120 ℃-220 ℃ of oven temperatures, drying time 30 minutes-60 minutes; Till treating that liquid above the shadow mask does not drip, take out the oven dry back.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2008100209755A CN100545989C (en) | 2008-08-11 | 2008-08-11 | Shadow mask cleaning and recycling process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2008100209755A CN100545989C (en) | 2008-08-11 | 2008-08-11 | Shadow mask cleaning and recycling process |
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| Publication Number | Publication Date |
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| CN101339879A CN101339879A (en) | 2009-01-07 |
| CN100545989C true CN100545989C (en) | 2009-09-30 |
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| CNB2008100209755A Expired - Fee Related CN100545989C (en) | 2008-08-11 | 2008-08-11 | Shadow mask cleaning and recycling process |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101706216B (en) * | 2009-11-02 | 2012-09-05 | 云南驰宏锌锗股份有限公司 | Method for cleaning accretions of rotary furnace for smelting bismuth |
| CN105838507B (en) * | 2016-05-16 | 2019-02-01 | 深圳市路维光电股份有限公司 | Optical enclosure cleaning agent and cleaning method |
| CN107350246A (en) * | 2017-08-01 | 2017-11-17 | 太仓协鑫光伏科技有限公司 | A kind of method for cleaning filter vat mortar dirt |
| CN108405456A (en) * | 2018-02-24 | 2018-08-17 | 东莞市银泰丰光学科技有限公司 | A kind of glass light guide plate site cleaning method |
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Granted publication date: 20090930 Termination date: 20170811 |