CN100537050C - Coated device - Google Patents
Coated device Download PDFInfo
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- CN100537050C CN100537050C CNB2005100034757A CN200510003475A CN100537050C CN 100537050 C CN100537050 C CN 100537050C CN B2005100034757 A CNB2005100034757 A CN B2005100034757A CN 200510003475 A CN200510003475 A CN 200510003475A CN 100537050 C CN100537050 C CN 100537050C
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- substrate
- type travel
- travel mechanism
- gap nozzle
- guide rail
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Abstract
The invention provides a coater advantageous in space which can continuously coat a glass substrate with a coating liquid. A pair of parallel rails (2, 2) are installed on a base plate (1), a substrate placing stage (3) is arranged in the center between the rails (2, 2), a first and a second gate-type transfer mechanisms (4, 5) are laid symmetrically about a center line crossing the rails at a right angle in a width direction of the substrate placing stage as a reference in a plan view and independently across the rails in a freely moving way, and slit nozzles (6, 7) are held to the first and the second gate-type transfer mechanisms (4, 5) in a liftable way.
Description
Technical field
The present invention relates to a kind of liquid that will apply and be coated in applying device on the substrate surface of glass substrate etc.
Background technology
As the applying device that forms the colour filter of 3 primary colors on the glass substrate of using at color liquid crystal, be documented in the patent documentation 1, and as the applying device of plasma display with the phosphor paste of coating 3 primary colors on the light-emitting substrate, people have proposed patent documentation 2 disclosed devices.
The applying device that patent documentation 1 is disclosed, above the workbench that ball-screw moves, set 2 gap nozzles, with two glass substrates be positioned in dividually above-mentioned workbench above, on two glass substrates, apply respectively simultaneously with above-mentioned 2 gap nozzles, this compares with situation about applying with 1 gap nozzle, can shorten the time.
The applying device that patent documentation 2 is disclosed, the substrate-placing workbench is configured between the pair of guide rails, 3 door type travel mechanisms between pair of guide rails, have been set up, in these 3 door type travel mechanisms, be separately installed with the gap nozzle that is used to apply R (red), G (green), B (indigo plant) look phosphor paste, by 3 door type travel mechanisms versicolor paste of coating on glass baseplate surface successively.
Patent documentation 1: the spy opens flat 10-No. 216599 communiques
Patent documentation 2: the spy opens communique 2002-No. 140982
No matter be the applying device that patent documentation 1 or patent documentation 2 disclose, all be coating liquid input slit nozzle with 1 coating institute consumption, if coating finishes, then will apply liquid once more and supply with gap nozzle.Therefore, can not carry out the coating of follow-up glass substrate immediately after coating, the coating liquid of 1 coating amount can only be supplied with after the gap nozzle, begin the coating of next time again, the result causes stand-by time long.
In addition, the applying device that patent documentation 1 discloses only simply by with 2 gap nozzles two glass substrates being applied, does not have big difference with the situation that disposes two table apparatus.In addition, because or the structure of movable workbench, so the vibration of moving is directly passed to glass substrate.
Moreover, the applying device that patent documentation 2 discloses, 3 door type travel mechanisms are in a side standby of substrate-placing workbench, outermost type travel mechanism is far away from the standby of substrate-placing workbench, and coating finishes back door type travel mechanism when opposition side moves, outermost type travel mechanism also will be away from the substrate-placing workbench, and the result causes the whole maximization of device.
In addition, in the applying device that patent documentation 2 discloses, when glass substrate maximizes, must cause a type travel mechanism also elongated, when the guide rail walking, door type travel mechanism itself can produce distortion, this will pass to gap nozzle, and giving evenly, coating has brought obstacle.
Summary of the invention
In order to address the above problem, applying device of the present invention, central configuration between the pair of parallel guide rail has the substrate-placing workbench, the the 1st and the 2nd type travel mechanism is but that benchmark, left and right symmetrically are erected between the above-mentioned guide rail also independent ambulation to observe width center line with the substrate-placing workbench of above-mentioned guide rail quadrature on the plane, and gap nozzle liftably remains in the 1st and the 2nd the type travel mechanism.
Adopt this structure, during with a gap nozzle coating, can supply with coating liquid, therefore, do not need stand-by time, can shorten the productive temp time to another gap nozzle.
In addition, the moving area in the above-mentioned the 1st and the 2nd type travel mechanism in the position of leaving the substrate-placing workbench, disposes predistribution portion, cleaning part and standby portion in turn, thereby can keep the state of gap nozzle well.
In addition, above-mentioned type travel mechanism comprises the drive division that engages with each guide rail; And when the walking of this drive division, stop the beam that is erected to gap nozzle transmission distortion between the drive division, and like this, a door type travel mechanism is difficult to produce distortion during walking, even some distortion a little, this distortion also can stop to the gap nozzle transmission by beam.
The invention effect
According to the present invention, during with a gap nozzle coating, coating liquid can be supplied to another gap nozzle, can obtain the applying device of excellent in efficiency.In addition, according to the present invention, plant bulk can be so not big, and, even door type travel mechanism walks at a high speed, can not produce baneful influence to gap nozzle yet.
Description of drawings
Fig. 1 is all vertical views of applying device of the present invention.
Fig. 2 is the A direction view of Fig. 1.
Fig. 3 is the cutaway view of the B-B direction of Fig. 1.
Description of symbols: the 1st, base station, the 2nd, guide rail, the 20th, slot part, the 21st, stator, the 3rd, the substrate-placing workbench, 4 is the 1st type travel mechanisms, the 40th, drive division, the 41st, beam, the 42nd, rotor, the 43rd, mattress, the 44th, syringe pump, the 45th, coating liquid supply pipe, the 46th, discharge pipe, 5 is the 2nd type travel mechanisms, the 6, the 7th, gap nozzle, the 8th, predistribution portion, the 9th, cleaning part, the 10th, standby portion, 11, the 12nd, lifting unit, L are the width center lines of substrate-placing workbench, and W is a glass substrate.
The specific embodiment
Below, with reference to description of drawings form of implementation of the present invention.Fig. 1 is the whole vertical view of applying device of the present invention, and Fig. 2 is the A direction view of Fig. 1, and Fig. 3 is the cutaway view of the B-B direction of Fig. 1.
Applying device, base station 1 are provided with pair of parallel guide rail 2,2, are being fixed with substrate-placing workbench 3 as the central authorities above the base station 1 in these guide rail 2,2 centre positions.And, but the 1st and the 2nd type travel mechanism 4,5 with the width centre line L of this substrate-placing workbench 3 be benchmark, left and right symmetrically independent ambulation be erected between the above-mentioned guide rail 2,2, in each type travel mechanism 4,5, gap nozzle 6,7 is installed by lowering or hoisting gear 11,12.
Because the 1st and the 2nd type travel mechanism the 4, the 5th, identical structure so a door type travel mechanism 4 only is described, is omitted the detailed description of another type travel mechanism 5.Door type travel mechanism 4 comprises the drive division 40,40 that engages with each guide rail 2,2 and is erected at beam 41,41 between this drive division 40,40.
On guide rail 2, be formed with slot part 20, in this slot part 20, dispose the stator 21 of linear motor, in addition, drive division 40 is provided with the rotor 42 that embeds the linear motor in the above-mentioned slot part 20, moreover, the mattress 43 that is used for forming fine clearance between itself and the guide rail 20 is being installed on the drive division 40.
In addition, above-mentioned beam the 41, the 41st, distortion is erected between the drive division to the transmission of gap nozzle when stoping a type travel mechanism 4 walking, so not necessarily will clip gap nozzle 6 front and back beam 41,41 is set, also can be only in a side setting.
Above-mentioned gap nozzle 6 liftably is supported between the drive division 40,40, and links to each other with syringe pump 44, supplies with 1 time coating liquid from coating liquid supply pipe 45, and after 1 coating finished, unnecessary coating liquid reclaimed from discharge pipe 46.
In addition, the moving area in the above-mentioned the 1st and the 2nd type travel mechanism 4,5 in the position of leaving substrate-placing workbench 3, disposes predistribution portion 8, cleaning part 9 in turn and has the standby portion 10 of dipping tank.
Hereinbefore, for to the glass substrate W coating liquid coating that is positioned on the substrate-placing workbench 3, when the time point when being positioned at predistribution portion 8 with the 1st type travel mechanism 4 is starting point, move after the preparation coating of carrying out gap nozzle 6 in the predistribution portion 8 by this, drive linear motor, a type travel mechanism 4 is moved to right, coating liquid such as resist liquid or phosphor paste are supplied with to the surface of glass substrate W from gap nozzle 6.During this period, supply with the coating liquid of 1 amount that next will apply to the 2nd type travel mechanism 5.
In addition, during coating, by not shown sensor, the interval between the surface of the lower end of measuring slit nozzle 6 and glass substrate W is by the height and position of lowering or hoisting gear 11,12 adjustment gap nozzles 6, so that this is spaced apart necessarily.
Then,, just the 1st type travel mechanism 4 turned back to cleaning part 9, the ejiction opening of gap nozzle 6 is cleaned, and make it drying in this position in case above-mentioned coating finishes.Move to standby portion 10 again, the front end of gap nozzle 6 is immersed in the dipping tank, and standby.During this, on substrate-placing workbench 3, place new glass substrate W.In addition, also might not make it to be immersed in the dipping tank.
Then, making the 2nd type travel mechanism 5 of standby move to predistribution portion 8 prepares after the discharge, with the above-mentioned linear motor that similarly drives, make a type travel mechanism 5 left direction move, from gap nozzle 7 coating such as resist liquid or phosphor paste liquid is supplied with to the surface of glass substrate W.During this, in advance the coating liquid of follow-up 1 amount that will apply is supplied with the 1st type travel mechanism 4.By carrying out above-mentioned action repeatedly, can on glass substrate W, apply continuously.
Industrial applicibility
Applying device of the present invention, the glass substrate that can be used as in being assembled into various display unit forms overlay film With applying device be used.
Claims (1)
1. applying device, central configuration between the pair of parallel guide rail has the substrate-placing workbench, the the 1st and the 2nd type travel mechanism is the benchmark left and right symmetrically with the width center line of substrate-placing workbench, but be erected between the described guide rail independent ambulation, observe and described guide rail quadrature on the width center line plane of described substrate-placing workbench, the the described the 1st and the 2nd type travel mechanism comprises each drive division that engages with pair of guide rails, be installed in gap nozzle between this drive division via lowering or hoisting gear, and when the walking of described door type travel mechanism, stop distortion to be transmitted to gap nozzle, be erected at the beam between the described drive division, moving area in the described the 1st and the 2nd type travel mechanism, in the position of leaving the substrate-placing workbench, dispose predistribution portion and standby portion in turn.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004343389 | 2004-11-29 | ||
| JP2004343389 | 2004-11-29 | ||
| JP2005070521 | 2005-03-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1799706A CN1799706A (en) | 2006-07-12 |
| CN100537050C true CN100537050C (en) | 2009-09-09 |
Family
ID=36810054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2005100034757A Active CN100537050C (en) | 2004-11-29 | 2005-11-29 | Coated device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100537050C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102320753A (en) * | 2011-08-09 | 2012-01-18 | 深圳市华星光电技术有限公司 | The coating apparatus of glass substrate and coating process thereof |
| CN104722444B (en) * | 2013-12-23 | 2017-03-29 | 昆山国显光电有限公司 | A kind of apparatus for coating |
| JP6817861B2 (en) * | 2017-03-23 | 2021-01-20 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating device and coating method |
| CN109807010A (en) * | 2019-03-07 | 2019-05-28 | 广东震仪智能装备股份有限公司 | Plasma spraying compensation system and compensation method |
-
2005
- 2005-11-29 CN CNB2005100034757A patent/CN100537050C/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN1799706A (en) | 2006-07-12 |
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| C14 | Grant of patent or utility model | ||
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Effective date of registration: 20230627 Address after: Ibaraki Patentee after: Ameco Technology Co.,Ltd. Patentee after: TAZMO CO.,LTD. Address before: Kanagawa, Japan Patentee before: Process Equipment Business Division Preparation Co.,Ltd. Patentee before: TAZMO CO.,LTD. Effective date of registration: 20230627 Address after: Kanagawa, Japan Patentee after: Process Equipment Business Division Preparation Co.,Ltd. Patentee after: TAZMO CO.,LTD. Address before: Kawasaki, Japan Patentee before: TOKYO OHKA KOGYO CO.,LTD. Patentee before: TAZMO CO.,LTD. |