CN100521219C - 单片集成的具有双焦微透镜阵列的cmos图像传感器 - Google Patents
单片集成的具有双焦微透镜阵列的cmos图像传感器 Download PDFInfo
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- CN100521219C CN100521219C CNB2006100295111A CN200610029511A CN100521219C CN 100521219 C CN100521219 C CN 100521219C CN B2006100295111 A CNB2006100295111 A CN B2006100295111A CN 200610029511 A CN200610029511 A CN 200610029511A CN 100521219 C CN100521219 C CN 100521219C
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- microlens array
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CNB2006100295111A CN100521219C (zh) | 2006-07-28 | 2006-07-28 | 单片集成的具有双焦微透镜阵列的cmos图像传感器 |
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CNB2006100295111A CN100521219C (zh) | 2006-07-28 | 2006-07-28 | 单片集成的具有双焦微透镜阵列的cmos图像传感器 |
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CN101114662A CN101114662A (zh) | 2008-01-30 |
CN100521219C true CN100521219C (zh) | 2009-07-29 |
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CNB2006100295111A Expired - Fee Related CN100521219C (zh) | 2006-07-28 | 2006-07-28 | 单片集成的具有双焦微透镜阵列的cmos图像传感器 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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EP2802009B1 (en) * | 2013-05-08 | 2021-03-24 | ams AG | Integrated imaging device for infrared radiation and method of production |
CN105399041A (zh) * | 2015-10-19 | 2016-03-16 | 苏州工业园区纳米产业技术研究院有限公司 | 传感器的微凸状氧化层结构及其制造方法 |
CN105575797A (zh) * | 2015-12-23 | 2016-05-11 | 苏州工业园区纳米产业技术研究院有限公司 | 一种使蚀刻后晶圆上介质倾斜角变小的光阻回流制备方法 |
TWI696842B (zh) * | 2018-11-16 | 2020-06-21 | 精準基因生物科技股份有限公司 | 飛時測距感測器以及飛時測距方法 |
CN110793651A (zh) * | 2019-09-10 | 2020-02-14 | 华中科技大学 | 一种提高spad阵列相机探测效率的方法 |
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Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Effective date: 20111130 |
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Effective date of registration: 20111130 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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Granted publication date: 20090729 Termination date: 20190728 |
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CF01 | Termination of patent right due to non-payment of annual fee |