CN100505986C - Substrate processing device - Google Patents
Substrate processing device Download PDFInfo
- Publication number
- CN100505986C CN100505986C CNB2006101277036A CN200610127703A CN100505986C CN 100505986 C CN100505986 C CN 100505986C CN B2006101277036 A CNB2006101277036 A CN B2006101277036A CN 200610127703 A CN200610127703 A CN 200610127703A CN 100505986 C CN100505986 C CN 100505986C
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- China
- Prior art keywords
- mentioned
- soup
- reservoir
- board treatment
- substrate board
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/38—Exhausting, degassing, filling, or cleaning vessels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/017—Cleaning
Abstract
The present invention relates to a substrate processing apparatus used in wet etching and stripping process. The substrate processing apparatus comprises: a box supplying the substrates; a processing part integrated with the top of the box, processing the substrates with reagent solution; a container integrated with the bottom of the box, containing the reagent solution; an aspirator disposed in the container, recycling the reagent solution to the processing part; and a spray part connected with the aspirator, spraying the reagent solution to the substrates in the processing part.
Description
Technical field
The present invention relates to a kind of substrate board treatment, specifically, to be used to carry out the handling part and the reservoir formation integrative-structure of video picture, etching, stripping process, and be provided for the aspirator of soup that circulates, thereby improve the substrate board treatment of treatment effeciency in inside.
Background technology
Usually, in the display equipment production process, the operation that forms circuit diagram on glass substrate is made up of following operation: at substrate surface coating photosensitive resin (photosensitive-polymer), form the operation of light-sensitive surface; By the operation of certain circuit pattern with light-sensitive surface exposure, video picture; The operation of etching substrate surface; The operation of utilizing after the etching work procedure organic solvent etc. to peel off.
In these display equipment production process, above-mentioned etching work procedure is divided into wet etching and dry-etching operation.
That is, wet etching is to utilize chemical solution to carry out etched operation, and dry-etching is to utilize gases such as plasma to carry out etched operation.
This wet etching and stripping off device are usually by forming with the lower part: the handling part that carries out etching and stripping process; Be independent of above-mentioned handling part setting, and store the reservoir of soup; Connect reservoir, and supply the pump of soup to handling part.
Therefore, when substrate was carried out etching and stripping process, the soup that will be stored in reservoir by pump was supplied to handling part, and carried out treatment process.
But in this substrate board treatment, pump and processing section are arranged, and with this soup that circulates, therefore thermal loss take place easily in the soup cyclic process, are difficult to keep suitable temperature at the etching work procedure herb liquid.
And the branch of pump and handling part is arranged, the problem that can cause soup cyclic process herb liquid to leak.
In addition, the branch of reservoir and handling part is arranged, and needs to increase the space that is used to be provided with reservoir, has therefore increased the volume of equipment.
Summary of the invention
The present invention does in view of the above problems, its purpose is to provide a kind of pump that will be used for aspiration medicinal liquid to be arranged on the reservoir inside that constitutes integrative-structure with handling part, thereby makes the thermal loss that takes place in the soup cyclic process reach minimum and can keep substrate board treatment temperature required in the etching work procedure.
Another object of the present invention provides a kind of pump and reservoir of making and becomes one structure, thereby can prevent the substrate board treatment that soup leaks in cyclic process.
Another object of the present invention provides and a kind ofly improves space availability ratio by the space of occupying that dwindles reservoir, and makes each bath become modularization, thus substrate board treatment that can rapid corresponding process variations.
Another object of the present invention provides a kind of vibrations when reducing motor-driven, thereby can improve the substrate board treatment of technology stability.
To achieve these goals, the invention provides a kind of substrate board treatment, it comprises:
The casing of supply substrate; Constitute integrative-structure with the top of above-mentioned casing, and aforesaid substrate is carried out the handling part of soup treatment process; Constitute integrative-structure with the bottom of above-mentioned casing, and store the reservoir of the required soup of above-mentioned soup treatment process; Be positioned at the inside of above-mentioned reservoir, and soup be circulated to the aspirator of above-mentioned handling part; And be connected in above-mentioned aspirator, and with the injection portion of the medical liquid spraying that is drawn into substrate to the above-mentioned handling part.Above-mentioned box house is divided into top and the bottom by demarcation strip, and top is handling part, and the bottom is a reservoir, and the part of above-mentioned demarcation strip is provided with peristome, thereby makes soup be supplied to reservoir from handling part.
The present invention has following advantage.
First, because the integrally formed aspirator that is used to extract out soup in the inside of reservoir, thermal loss and pressure that the soup circulation time is taken place descend, keep fluid temperature and the pressure that is fit to carry out etching work procedure with this, can prevent to produce dirt, improve reactive advantage thereby have.
The second, because aspirator is arranged on reservoir inside, therefore can prevent the leakage of soup in cyclic process.
The 3rd, because reservoir and handling part are integrally formed, therefore dwindled the space of occupying of reservoir, improved space availability ratio with this, and because each bath becomes modularization, therefore can rapid corresponding process variations.
The 4th, reduce the vibrations that produce because of motor-driven, thereby can increase technology stability.
The 5th, by handling part, reservoir, aspirator are constituted integrative-structure, but reduction equipment volume and save manufacturing cost.
Description of drawings
Fig. 1 is the stereogram of the substrate board treatment internal structure that is used for wet etching and stripping process of expression the preferred embodiments of the present invention.
Fig. 2 is the side sectional view of Fig. 1.
Fig. 3 is the enlarged drawing of aspirator among Fig. 2.
Embodiment
Below, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings related substrate board treatment.
Fig. 1 is the internal structure stereogram of the substrate board treatment that is used for wet etching and stripping process of expression the preferred embodiments of the present invention, and Fig. 2 is the side sectional view of Fig. 1.
As shown in the figure, substrate board treatment provided by the present invention is applicable to various processing substrate operation, but be usually used in carrying out the device of video picture operation, wet etching operation and stripping process, therefore, describe according to the embodiment that is applicable to video picture, etching and stripping process below.
Substrate board treatment provided by the invention comprises: casing 3, and its inside is divided into top and the bottom; Handling part 5, it is positioned at the top of described casing 3, carries out the soup treatment process; Reservoir 7, the bottom of itself and described casing 3 constitutes one, and stores soup; Aspirator 15, it is positioned at the inside of described reservoir 7, and soup is pumped to above-mentioned handling part 5; Injection portion 11, it is connected in above-mentioned aspirator 15, and with on the medical liquid spraying that the is drawn into substrate G in the handling part 5.
Have in the substrate board treatment of said structure, above-mentioned casing 3 portion within it has certain space, and its inside is divided into top and the bottom by demarcation strip 9.
That is, the top of demarcation strip 9 is provided with handling part 5, and the bottom of demarcation strip 9 is provided with reservoir 7.
And, be provided with the delivery roller R that supports and transmit substrate G in the inside of above-mentioned handling part 5.Therefore, the charging aperture 14 that possesses on the side by casing 3, substrate G can be sent to handling part 5 inside.
In addition, above-mentioned reservoir 7 is structure as a whole with the bottom of handling part 5, in order to store the soup by handling part 5 supplies.
At this moment, distinguish on the demarcation strip 9 of above-mentioned handling part 5 and reservoir 7, possess the peristome 13 that is formed with several through holes, therefore the medicine liquid droplet in the handling part 5 is fallen in the reservoir 7.
So, handling part 5 and the structure that reservoir 7 becomes one can reduce in the prior art that handling part and reservoir independently be provided with, and are used for being provided with the other space of reservoir 7.
And, by handling part 5 and reservoir 7 are formed one, make the bath of process for producing line become modularization, thus can corresponding neatly technique change.
In the foregoing, box house is divided into top and the bottom, but the present invention is not limited thereto, can also adopt box house is divided into about part, or omit the execution mode of demarcation strip.
Have the soup circulation pipe in the described reservoir 7, therefore can suitably change contaminated soup.Described soup circulation pipe comprises the inflow pipe 27 and the effuser 25 of the both sides that are positioned at reservoir 7, and described inflow pipe 27 and effuser 25 are connected with valve 26a, 26b respectively, therefore can carry out opening and closing operations.
Therefore, when changing because of the contaminated soup of use for a long time, the soup that can more renew by this inflow pipe 27 and effuser 25.
At this moment, can possess above-mentioned inflow pipe 27 and effuser 25 simultaneously, or possess one of them.
As mentioned above, reservoir 7 stored soups can be supplied to handling part 5 by above-mentioned aspirator 15.
Above-mentioned aspirator 15 is by pump 17 Hes that are installed in reservoir 7 inside, is positioned at the outside of above-mentioned casing 3 and constitutes to the magnetic drive portion that pump 17 transmits revolving forces in the noncontact mode by magnetic force.
In more detail, as shown in Figure 3, above-mentioned pump 17 generally includes chemical pumps such as outside teflon pump that coating is handled through chemical resistance or FRP pump.
Said pump 17 comprises: housing 31, and it is positioned at the inner bottom part of reservoir 7; Rotating shaft 37 is arranged on the inside of above-mentioned housing 31 rotationally; Impeller 35, it is installed in the above-mentioned rotating shaft 37, and transmits under the situation of magnetic force in above-mentioned magnetic drive portion 19, rotates and produces suction; The 1st magnetic sheet 42 is positioned in the above-mentioned rotating shaft 37, and accepts magnetic force from magnetic drive portion 19.
Have in the pump of said structure, above-mentioned housing 31 has the suction inlet 21 that sucks soup in its porch, and the soup that has housing 31 inside in the exit is discharged to outside outlet 33.
Therefore, after the soup of reservoir 7 can the suction inlet 21 by above-mentioned housing 31 sucks, be discharged to above-mentioned injection portion 11 by outlet 33.
In addition, the upper part of above-mentioned rotating shaft 37 rotatably is fixed on the inside of the rib 38 that is positioned at housing 31 tops by bearing 39.And the end portion of above-mentioned rotating shaft 37 rotatably is fixed on the bottom of housing 31 by rib 40 and bearing 41.
Therefore, above-mentioned rotating shaft 37 can be in housing 31 inner rotations.
In addition, the mid portion of above-mentioned rotating shaft 37 has the above-mentioned impeller 35 with its formation one, and end portion has above-mentioned the 1st magnetic sheet 42.
At this moment, above-mentioned the 1st magnetic sheet 42 be configured to at the 2nd magnetic sheet 43 of back narration across casing 3 structure in correspondence with each other.
Therefore, the magnetic force that the 2nd magnetic sheet of magnetic drive portion 19 produces passes casing 3, and when passing to the 1st magnetic sheet 42 in the noncontact mode, impeller 35 can rotate.
As mentioned above, when impeller 35 rotated, impeller 35 will be pushed the soup of housing 31 inside open and produce the suction of certain pressure, and with this soup that sucks in reservoir 7 through suction inlet 21, and the soup that sucks is discharged to above-mentioned injection portion 11 by outlet 33.
In addition, above-mentioned magnetic drive portion 19 is connected in the group of motors 20 that produces revolving force and the rotating shaft of above-mentioned group of motors 20, and comprises the 2nd magnetic sheet 43 that produces magnetic force and pass to above-mentioned impeller 35.
Above-mentioned the 1st magnetic sheet 42 and the 2nd magnetic sheet 43 preferably include magnetics such as magnet, and as mentioned above, it is the center that two magnetic sheets are with casing 3, at the outside and inner non-contact structure in correspondence with each other separated by a distance of casing 3.
In addition, above-mentioned the 1st magnetic sheet 42 and 43, two of the 2nd magnetic sheets can be magnetics, perhaps also can be to have only the 2nd magnetic sheet 43 to be magnetic.At this moment, magnetic can be permanent magnet or electromagnet.
Therefore, when the 2nd magnetic sheet 43 is rotated by group of motors 19, magnetic force will pass casing 3, be delivered on the 1st magnetic sheet 42 in the noncontact mode.
As a result, in the process of impeller 35 transferring power, can prevent the noise that produces because of contact, and need not on casing 3, to form connector etc., therefore also can prevent liquid leakage.
More than, embodiment at being suitable for magnetic drive portion with noncontact mode driving pump is illustrated, but the present invention is not limited thereto, and the present invention also can adopt at box house common group of motors is installed, and this group of motors directly connected pump, and come the mode of driving pump with this.Certainly, described in this case group of motors should possess water-proof function.
In addition, the soup of discharging from the outlet 33 of said pump 17 is supplied to handling part 5 by above-mentioned injection portion 11.
Above-mentioned injection portion 11 comprises common known configurations injection apparatus.
That is, its structure is made of the feed tube 23 of the outlet 33 that is connected in pump 17, the playpipe 45 of supply soup, a plurality of nozzles 47 that are formed on the playpipe 45.
Therefore, the soup of supplying via playpipe 45 sprays by nozzle 47, thereby is fed to the surface of substrate G, to handle.
Below, with reference to accompanying drawing, further describe the course of work of the related substrate board treatment of the preferred embodiments of the present invention.
As shown in Figure 1 to Figure 3, when utilizing substrate board treatment provided by the invention that substrate G is carried out video picture, etching and stripping process, at first utilize delivery roller R substrate G to be transferred to the inside of casing 3.
Afterwards, drive aspirator 15 and extract the soup that is stored in the certain water level in the reservoir 7 out, and it is ejected on the substrate G of handling part 5.
That is, when driving the magnetic drive portion 19 of above-mentioned aspirator 15, the 2nd magnetic sheet 43 will rotate, and magnetic force passes casing 3, passes to the 1st magnetic sheet 42 in the noncontact mode, with this impeller 35 is rotated.
As mentioned above, when impeller 35 in housing 31 inside, when rotating with certain speed, because of housing 31 inside are in the state that has soup, so impeller 35 will push these soups open, makes the housing 31 inner negative pressure that produce.
With this, by the suction inlet 21 of housing 31, soup is inhaled into housing 31 inside, and the soup that is inhaled into can be discharged to housing 31 outsides.
The soup that is discharged from is supplied to playpipe 45 by the feed tube 23 of injection portion 11, and the soup that is supplied to playpipe 45 is injected in the surface of substrate G by a plurality of nozzles 47, can carry out etching and lift-off processing with this to substrate G.
So, after the soup that is injected in handling part 5 inside is handled substrate, just come back to the reservoir 7 of bottom by peristome 13 drippages of demarcation strip 9.Afterwards, repeat again to be sucked, and be supplied to the said process of handling part 5 by aspirator 15.
So long as, can on the basis of the technology of the present invention thought, carry out various changes and modification, so the present invention's scope required for protection is not limited to above-mentioned preferred embodiment to the present invention the people who has the ordinary skill level in the technical field of the invention.
Claims (11)
1, a kind of substrate board treatment comprises:
The casing of supply substrate;
With the top of above-mentioned casing be integrative-structure, and aforesaid substrate is carried out the handling part of soup treatment process;
With the bottom of above-mentioned casing be integrative-structure, and store the reservoir of required soup in the above-mentioned soup treatment process;
Be positioned at the inside of above-mentioned reservoir, and soup be circulated to the aspirator of above-mentioned handling part; And
Be connected in above-mentioned aspirator, and with the injection portion of medical liquid spraying to above-mentioned handling part upper substrate,
It is characterized in that:
Above-mentioned box house is divided into top and the bottom by demarcation strip, and top is handling part, and the bottom is a reservoir, and the part of above-mentioned demarcation strip is provided with peristome, thereby makes soup be supplied to reservoir from handling part.
2, substrate board treatment according to claim 1 is characterized in that:
Above-mentioned aspirator comprises, is positioned at the inside of above-mentioned reservoir and is used to extract out the pump of soup; Be positioned at the outside of above-mentioned casing and the magnetic drive portion that transmits revolving force by magnetic force in the noncontact mode to said pump.
3, substrate board treatment according to claim 2 is characterized in that:
Said pump comprises, is positioned at the housing of reservoir bottom; Be arranged on the rotating shaft of above-mentioned enclosure interior rotationally; Be arranged in the above-mentioned rotating shaft, and suck the impeller of fluid by rotatablely moving; Be positioned on the impeller of above-mentioned rotating shaft, and accept magnetic force and make the 1st magnetic sheet of rotating shaft rotation from above-mentioned magnetic drive portion.
4, substrate board treatment according to claim 2 is characterized in that:
The outside of said pump has been carried out the chemical resistance coating and has been handled.
5, substrate board treatment according to claim 3 is characterized in that:
The housing of said pump comprises, the suction inlet that is formed on housing one side and soup is flowed into; Be formed on the opposite side of above-mentioned suction inlet, and be used to make the soup that flows into enclosure interior to be expelled to the outlet of handling part direction.
6, substrate board treatment according to claim 3 is characterized in that:
The upper end of above-mentioned rotating shaft and lower end separately by rib and bearings in the top and the bottom of housing, and rotate with this.
7, substrate board treatment according to claim 2 is characterized in that:
Above-mentioned magnetic drive portion comprises, by accepting the group of motors that electric energy produces revolving force; Be arranged in the rotating shaft of above-mentioned group of motors, and apply magnetic force and make the 2nd magnetic sheet of the 1st magnetic sheet rotation of said pump.
8, substrate board treatment according to claim 3 is characterized in that:
The both sides of the 1st above-mentioned magnetic sheet or wherein a side be magnetic.
9, substrate board treatment according to claim 7 is characterized in that:
The 1st above-mentioned magnetic sheet and the both sides of the 2nd magnetic sheet or wherein a side be magnetic.
10, substrate board treatment according to claim 1 is characterized in that:
Above-mentioned injection portion comprises, is connected in the feed tube of above-mentioned aspirator; Be connected in above-mentioned feed tube, and the playpipe of supply soup; Be positioned at above-mentioned playpipe and spray the nozzle of soup to substrate.
11, substrate board treatment according to claim 1 is characterized in that:
The reservoir of above-mentioned casing is provided with more replace tubes of soup more, changes the soup in the above-mentioned reservoir thus.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020050080857A KR100767005B1 (en) | 2005-08-31 | 2005-08-31 | Apparatus for treatment works |
| KR1020050080857 | 2005-08-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1925723A CN1925723A (en) | 2007-03-07 |
| CN100505986C true CN100505986C (en) | 2009-06-24 |
Family
ID=37818109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006101277036A Active CN100505986C (en) | 2005-08-31 | 2006-08-30 | Substrate processing device |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100767005B1 (en) |
| CN (1) | CN100505986C (en) |
| TW (1) | TWI303190B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103794428A (en) * | 2011-12-31 | 2014-05-14 | 四川虹欧显示器件有限公司 | Etching device and etching method |
| CN103805998B (en) * | 2014-03-03 | 2016-07-13 | 常州天合光能有限公司 | Silicon chip wet-method etching equipment and lithographic method thereof |
| KR102634034B1 (en) * | 2019-04-05 | 2024-02-08 | 주식회사 디엠에스 | Substrate processing apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040064992A (en) * | 2003-01-13 | 2004-07-21 | 엘지전자 주식회사 | Apparatus and method of fabricating plasma display panel |
-
2005
- 2005-08-31 KR KR1020050080857A patent/KR100767005B1/en active IP Right Grant
-
2006
- 2006-08-25 TW TW095131270A patent/TWI303190B/en active
- 2006-08-30 CN CNB2006101277036A patent/CN100505986C/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW200708348A (en) | 2007-03-01 |
| CN1925723A (en) | 2007-03-07 |
| KR100767005B1 (en) | 2007-10-15 |
| KR20070025091A (en) | 2007-03-08 |
| TWI303190B (en) | 2008-11-21 |
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| C14 | Grant of patent or utility model | ||
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| ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD. Effective date: 20140227 |
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| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20140227 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
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| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 264205 No. 88-1, Bekaert Road, Weihai Economic and Technological Development Zone, Weihai City, Shandong Province Patentee after: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. Patentee after: DMS Co.,Ltd. Address before: Gyeonggi Do, South Korea Patentee before: DMS Co.,Ltd. Patentee before: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. |