CN100500926C - Vacuum inner film coating machine - Google Patents

Vacuum inner film coating machine Download PDF

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Publication number
CN100500926C
CN100500926C CNB2007100733356A CN200710073335A CN100500926C CN 100500926 C CN100500926 C CN 100500926C CN B2007100733356 A CNB2007100733356 A CN B2007100733356A CN 200710073335 A CN200710073335 A CN 200710073335A CN 100500926 C CN100500926 C CN 100500926C
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China
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vacuum
coating machine
film coating
valve
inner film
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Expired - Fee Related
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CNB2007100733356A
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Chinese (zh)
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CN101033538A (en
Inventor
黄川黔
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Huizhou Huiyang Xintian Glass Craft Products Co Ltd
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Individual
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Abstract

This invention relates to a vacuum internal film-plating machine used in small spherical or cup devices and its application method including a vacuumizing system set with an air pipe connected with a pump controlling the vacuum system and an electric system controlling the valve, said vacuum system is connected with an evaporation system via the pipe, which includes a supply switch and resistance evaporation source composed of a vacuum cavity, a base with a pump-nozzle and tungsten filament for evaporation, in which, Mo positive and negative are fixed on the base, one end of the filament is fixed on the Mo positive and the other end is fixed on the negative and both electrodes pass the base to connect with the supply switch by lead.

Description

Vacuum inner film coating machine
Technical field:
The present invention relates to a kind of inner film coating machine, refer in particular to a kind of vacuum inner film coating machine and using method thereof that is used for ball-shaped or cup type gadget.
Background technology:
Present general vacuum inner film coating machine is because structure more complicated and overall volume are huge, so it is very high that the cost of machine seems, and because the operation steps of these vacuum inner film coating machines is many, and the time of finishing interior plated film is long, production efficiency is low, inefficiency of production can seem when needs are mass-produced, the operation steps of general vacuum inner film coating machine is: open diffusion pump heating 1.5 to 2 hours earlier, and then open roughing vacuum pump successively and begin pumping process, open lobe pump again, be to open slightly to take out valve and essence is taken out valve successively, and then the beginning evaporate process, after evaporation is finished, rotational workpieces, the workpiece that plated film is finished in taking out is followed deflation course then.
General vacuum inner film coating machine will be opened diffusion pump heating 1.5 to 2 hours at work earlier, and then open roughing vacuum pump successively, sequence of operations such as lobe pump, complex operation step, work period is long, holding pump and diffusion pump will be opened always in the process of work in addition, have so not only wasted electric energy but also have been easy to generate Peril Incident.
Based on the weak point of above-mentioned conventional vacuum inner film coating machine, the inventor has designed the present invention's " vacuum inner film coating machine and using method thereof ".
Summary of the invention
The present invention is directed to above-mentioned the deficiencies in the prior art, main purpose is to provide a kind of life cycle of the product obviously to shorten, and inner coating operation step is simple and convenient, has also saved the vacuum inner film coating machine and the using method thereof of 80% above electric power resource.
The technical solution adopted for the present invention to solve the technical problems is:
A kind of vacuum inner film coating machine, comprise a pumped vacuum systems, it is provided with a tracheae, this pumped vacuum systems connects an electrical system that is used to control the pump and the valve opening and closing of pumped vacuum systems, described pumped vacuum systems connects a vapo(u)rization system by tracheae, this vapo(u)rization system comprises a power switch and a resistance-type evaporation source, the resistance-type evaporation source is by vacuum chamber, be provided with the base of the mouth of pipe of bleeding, the tungsten filament that is used for evaporation is formed, be fixed with positive electrode and negative potential on the base, one end of tungsten filament is fixed on positive electrode, the other end of tungsten filament is fixed on negative potential, positive electrode with utilize after negative potential passes base lead and power switch mutually electricity connect.
Be provided with the silica gel circle between the bottom of described positive electrode and vacuum chamber, this silica gel circle is used for sealed air-tight and insulation between the bottom of positive electrode and vacuum chamber.
Described tungsten filament is fixed on positive electrode and the negative potential with screw.
Described positive electrode and negative potential are respectively molybdenum positive electrode and molybdenum negative potential, or positive electrode and negative potential are respectively copper positive electrode and copper negative potential.
Described pumped vacuum systems is provided with a mechanical pump that is used to vacuumize, mechanical pump connects an ELECTROMAGNETIC VACUUM band qi of chong channel ascending adversely valve by tracheae, the far-end of ELECTROMAGNETIC VACUUM band qi of chong channel ascending adversely valve and tracheae also is provided with electronic high vacuum butterfly valve, and the other end of electronic high vacuum butterfly valve also is connected with and is used to inflate the inflation valve that takes off workpiece.
" ten " word vertical tube one end is connected with the bleeding point of two groups of vapo(u)rization systems in the pipeline between electronic high vacuum butterfly valve and the inflation valve, " ten " word vertical tube the other end is connected with an end of high-vacuum electromagnetic valve, and the other end of high-vacuum electromagnetic valve is provided with successively and is used to obtain more diffusion pump, the vacuum gauge that is used for measurement of vacuum and the direct connection mechanical pump of condition of high vacuum degree.
Be provided with one between the workpiece of vacuum chamber upside and required interior plated film and be used for sealed air-tight and insulating sealed silicon cushion rubber.
Described tungsten filament is shaped as ' m ' shape, volution or waviness.
A kind of above-mentioned vacuum inner film coating machine and using method thereof, its using method is:
At first aluminium (copper) sheet or aluminium (copper) bar are placed on the tungsten filament of resistance-type evaporation source of a, b group, the workpiece of plated film is placed on the sealed silicon cushion rubber in will needing again;
Open electronic high vacuum butterfly valve then, utilize mechanical pump that vacuum chamber is vacuumized processing;
When vacuum tightness arrives 5X10 -2During Pa, the power turn-on switch is to the tungsten filament heating of switching on;
Be heated to certain hour at tungsten filament, aluminium (copper) sheet or aluminium (copper) bar that are placed on the tungsten filament just begin evaporation;
After evaporation is finished, close a, b and organize electronic high vacuum butterfly valve, the electronic high vacuum butterfly valve of opening c, d group simultaneously vacuumizes processing to the vacuum chamber of resistance-type evaporation source of c, d group, open the inflation valve of a, b group simultaneously, take off the workpiece of a, b group and on its tungsten filament, put aluminium (copper) sheet or aluminium (copper) bar and need in the workpiece of plated film;
When the vacuum tightness of c, d to 5X10 -2During Pa, the power turn-on switch is to the tungsten filament heating of switching on;
Be heated to certain hour at tungsten filament, aluminium (copper) sheet or aluminium (copper) bar that are placed on the tungsten filament just begin degree of steaming; So circulation.
The beneficial effect of a kind of vacuum inner film coating machine of the present invention and using method thereof is:
1. volume is little, pumping speed is fast, production efficiency is high;
2. maintenance of the equipment is convenient;
3. saving electric energy.
Description of drawings
The invention will be further described below in conjunction with drawings and Examples.
Fig. 1 is the structural principle synoptic diagram of the embodiment of the invention one;
Fig. 2 is the cross-sectional view of resistance-type evaporation source of the present invention;
Fig. 3 is the structural principle synoptic diagram of the embodiment of the invention two.
The drawing reference numeral explanation:
10, pumped vacuum systems 10a pumped vacuum systems 11, mechanical pump
12, ELECTROMAGNETIC VACUUM band qi of chong channel ascending adversely valve 13, tracheae 14, electronic high vacuum butterfly valve
14a, electronic high vacuum butterfly valve 15, inflation valve 15a, inflation valve
16, high-vacuum electromagnetic valve 16a, high-vacuum electromagnetic valve 17, diffusion pump
18, vacuum gauge 19, direct connection mechanical pump 20, vapo(u)rization system
21, resistance-type evaporation source 211, vacuum chamber 212, base
213, tungsten filament 214, molybdenum negative potential 215, molybdenum positive electrode
216, silica gel circle 217, sealed silicon cushion rubber 22, power switch
Embodiment
Vacuum inner film coating machine and using method thereof, its vacuum inner film coating machine comprises a pumped vacuum systems (10), it is provided with a tracheae (13), this pumped vacuum systems (10) connects one and is used to control the pump of pumped vacuum systems (10) and the electrical system of valve opening and closing, the invention is characterized in: described pumped vacuum systems (10) connects a vapo(u)rization system (20) by tracheae (13), this vapo(u)rization system (20) comprises a power switch (22) and a resistance-type evaporation source (21), resistance-type evaporation source (21) is by vacuum chamber (211), be provided with the base (212) of gas tube orifice, the tungsten filament (213) that is used for evaporation is formed, be fixed with positive electrode (215) and negative potential (214) on the base (212), one end of tungsten filament (213) is fixed on positive electrode (215), the other end of tungsten filament (213) is fixed on negative potential (214), positive electrode (215) with utilize after negative potential (214) passes base (212) lead and power switch (22) mutually electricity connect, negative potential (214) links to each other with base (212).
Be provided with silica gel circle (216) between the bottom of positive electrode (215) and vacuum chamber (211), this silica gel circle (216) is used for sealed air-tight and insulation between the bottom of positive electrode (215) and vacuum chamber (211).
Tungsten filament (213) is fixed on positive electrode (215) and the negative potential (214) with screw.
Positive electrode (215) and negative potential (214) are respectively molybdenum positive electrode and molybdenum negative potential, or positive electrode (215) and negative potential (214) are respectively copper positive electrode and copper negative potential.
Pumped vacuum systems (10) is provided with a mechanical pump that is used to vacuumize (11), mechanical pump (11) connects an ELECTROMAGNETIC VACUUM band qi of chong channel ascending adversely valve (12) by tracheae (13), the far-end of ELECTROMAGNETIC VACUUM band qi of chong channel ascending adversely valve (12) and tracheae (13) also is provided with electronic high vacuum butterfly valve (14) and (14a), and the electronic high vacuum butterfly valve (14) and the other end (14a) also are connected with and are used to inflate the inflation valve (15) that takes off workpiece and (15a).
" ten " word vertical tube one end is connected with the bleeding point of two groups of vapo(u)rization systems (20) in the pipeline between electronic high vacuum butterfly valve (14), (14a) and inflation valve (15), (15a), " ten " word vertical tube the other end is connected with the end of high-vacuum electromagnetic valve (16), (16a), and the other end of high-vacuum electromagnetic valve (16), (16a) is provided with successively and is used to obtain the more diffusion pump of condition of high vacuum degree (17), the vacuum gauge (18) that is used for measurement of vacuum and direct connection mechanical pump (19).
Vacuum chamber (211) upside and required in be provided with a sealed silicon cushion rubber (217) that is used for sealed air-tight between the workpiece of plated film.
Described tungsten filament (213) is shaped as ' m ' shape, volution or waviness.
Vacuum inner film coating machine and using method thereof, its using method is:
1), at first aluminium (copper) sheet or aluminium (copper) bar are placed on the tungsten filament (213) of resistance-type evaporation source (21) of a, b group, the workpiece of plated film is placed on the sealed silicon cushion rubber (217) in will needing again;
2) open electronic high vacuum butterfly valve (14), then, utilize mechanical pump (11) that vacuum chamber (211) is vacuumized processing;
3), when vacuum tightness to 5X10 -2During Pa, power turn-on switch (22) is to tungsten filament (213) heating of switching on;
4), be heated to certain hour at tungsten filament (213), aluminium (copper) sheet or aluminium (copper) bar that are placed on the tungsten filament (213) just begin evaporation;
5), after evaporation is finished, close electronic high vacuum butterfly valve (14), open electronic high vacuum butterfly valve (14a) simultaneously the vacuum chamber (211) of resistance-type evaporation source (21) of c, d group is vacuumized processing, open inflation valve (15) simultaneously, take off the workpiece of a, b group and on its tungsten filament (213), put aluminium (copper) sheet or aluminium (copper) bar and need in the workpiece of plated film;
6), the vacuum tightness as c, d arrives 5X10 -2During Pa, power turn-on switch (22) is to tungsten filament (213) heating of switching on;
7) be heated to certain hour at tungsten filament (213), aluminium (copper) sheet or aluminium (copper) bar that are placed on the tungsten filament (213) just begin evaporation;
8) after evaporation is finished, close electronic high vacuum butterfly valve (14a), open electronic high vacuum butterfly valve (14) simultaneously the vacuum chamber (211) of resistance-type evaporation source (21) of a, b group is vacuumized processing, open inflation valve (15a) simultaneously, take off the workpiece of c, d group and on its tungsten filament (213), put aluminium (copper) sheet or aluminium (copper) bar and need in the workpiece of plated film, carry out the interior coating process of vacuum of workpiece next time, so circulation.
When the vacuum tightness of pumped vacuum systems (10) can not meet the demands, then adopt after slightly the taking out of pumped vacuum systems (10a) again essence to take out and to reach requirement.
In embodiment one and embodiment two, the four row's car modes that adopt, this mode can be carried out the evaporation of two workpiece simultaneously, just can carry out the evaporate process of two workpiece in addition after preceding two workpiece are finished evaporation at once, improve production efficiency significantly, and saved electric energy.If the workpiece of plated film is bigger in needing, the pumpdown time is long or the operator is skilled, action is fast, then can adopt six row's cars, eight row's car modes.
The enforcement principle of embodiment two: product a, b are one group, are vented to 10X10 by the high vacuum butterfly valve (14) of mechanical pump (11) through slightly taking out effect earlier -0Pa closes high vacuum butterfly valve (14) then, opens essence and takes out the high-vacuum electromagnetic valve (16) of effect and bled by direct connection mechanical pump (19); Open the high vacuum butterfly valve (14a) of product c, d simultaneously, the air pressure in product a, b drops to 5X10 -2During Pa, power turn-on switch (22) is to vapo(u)rization system (20) tungsten filament (213) energising of product a, b, beginning evaporation.After evaporation is finished, close high-vacuum electromagnetic valve (16), open inflation valve (15), take off the product a and the b of filming process in finishing; Conversion valve then, (14a) closes with the high vacuum butterfly valve, opens high-vacuum electromagnetic valve (16a); After will taking out tungsten filament (213) in the vapo(u)rization system (20) of product a, b more and putting aluminum strip, put into the product of new needs plated film again, open high vacuum butterfly valve (14) then, vapo(u)rization system (20) power switch (22) of closed another set product c, d, beginning evaporation, so constantly circulation.
The above, it only is the preferred embodiment of a kind of vacuum inner film coating machine of the present invention and using method thereof, be not that technical scope of the present invention is imposed any restrictions, every foundation technical spirit of the present invention all still belongs in the scope of technical solution of the present invention above any trickle modification, equivalent variations and modification that embodiment did.

Claims (6)

1, a kind of vacuum inner film coating machine, it comprises a pumped vacuum systems (10), one tracheae (13), this pumped vacuum systems (10) connects vapo(u)rization system (20) by tracheae (13), this pumped vacuum systems (10) also connects one and is used to control the pump of pumped vacuum systems (10) and the electrical system of valve opening and closing, it is characterized in that: this vapo(u)rization system (20) comprises a power switch (22) and a resistance-type evaporation source (21), resistance-type evaporation source (21) is by vacuum chamber (211), be provided with the base (212) of gas tube orifice, the tungsten filament (213) that is used for evaporation is formed, be fixed with positive electrode (215) and negative potential (214) on the base (212), one end of tungsten filament (213) is fixed on positive electrode (215), the other end of tungsten filament (213) is fixed on negative potential (214), positive electrode (215) with utilize after negative potential (214) passes base (212) lead and power switch (22) mutually electricity connect; Described pumped vacuum systems (10) is provided with a mechanical pump that is used to vacuumize (11), mechanical pump (11) connects an ELECTROMAGNETIC VACUUM band qi of chong channel ascending adversely valve (12) by tracheae (13), ELECTROMAGNETIC VACUUM band qi of chong channel ascending adversely valve (12) also is respectively equipped with the first electronic high vacuum butterfly valve (14) and the second electronic high vacuum butterfly valve (14a) with the far-end of tracheae (13), and the other end of the first electronic high vacuum butterfly valve (14) and the second electronic high vacuum butterfly valve (14a) is connected with respectively and is used to inflate first inflation valve (15) and second inflation valve (15a) that takes off workpiece; One end of ducted first " ten " the word vertical tube between the first electronic high vacuum butterfly valve (14) and first inflation valve (15) is connected with the gas tube orifice of first group of vapo(u)rization system (20), and the other end of first " ten " the word vertical tube is connected with an end of the first high-vacuum electromagnetic valve (16); One end of ducted second " ten " the word vertical tube between the second electronic high vacuum butterfly valve (14a) and second inflation valve (15a) is connected with the gas tube orifice of second group of vapo(u)rization system (20), and the other end of second " ten " the word vertical tube is connected with an end of the second high-vacuum electromagnetic valve (16a); The other end of the first high-vacuum electromagnetic valve (16) and the second high-vacuum electromagnetic valve (16a) is provided with successively and is used to obtain the more diffusion pump of condition of high vacuum degree (17), the vacuum gauge (18) that is used for measurement of vacuum and direct connection mechanical pump (19).
2, vacuum inner film coating machine according to claim 1, its vacuum inner film coating machine is characterised in that between the bottom of described positive electrode (215) and vacuum chamber (211) and is provided with silica gel circle (216) that this silica gel circle (216) is used for sealed air-tight and insulation between the bottom of positive electrode (215) and vacuum chamber (211).
3, vacuum inner film coating machine according to claim 1, its vacuum inner film coating machine are characterised in that described tungsten filament (213) is fixed on positive electrode (215) and the negative potential (214) with screw.
4, vacuum inner film coating machine according to claim 1, its vacuum inner film coating machine is characterised in that described positive electrode (215) and negative potential (214) are respectively molybdenum positive electrode and molybdenum negative potential, or positive electrode (215) and negative potential (214) are respectively copper positive electrode and copper negative potential.
5, vacuum inner film coating machine according to claim 1, its vacuum inner film coating machine be characterised in that described vacuum chamber (211) upside and required in be provided with a sealed silicon cushion rubber (217) that is used for sealed air-tight between the workpiece of plated film.
6, vacuum inner film coating machine according to claim 1, its vacuum inner film coating machine are characterised in that described tungsten filament (213) is shaped as " m " shape, volution or waviness.
CNB2007100733356A 2007-02-12 2007-02-12 Vacuum inner film coating machine Expired - Fee Related CN100500926C (en)

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CNB2007100733356A CN100500926C (en) 2007-02-12 2007-02-12 Vacuum inner film coating machine

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Application Number Priority Date Filing Date Title
CNB2007100733356A CN100500926C (en) 2007-02-12 2007-02-12 Vacuum inner film coating machine

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CN100500926C true CN100500926C (en) 2009-06-17

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106586282A (en) * 2016-12-09 2017-04-26 安徽亿瑞深冷能源科技有限公司 Independently controllable high-temperature equipment provided with multiple vacuum cavities
CN107858648A (en) * 2017-12-06 2018-03-30 昆山浦元真空技术工程有限公司 A kind of heavy membrane process of new type stainless steel. corrosion resistance vacuum cup inner bag thermal reflecting coating
CN116791056A (en) * 2023-06-30 2023-09-22 安徽其芒光电科技有限公司 Exhaust heating method of vacuum coating equipment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2731366A (en) * 1948-12-28 1956-01-17 Libbey Owens Ford Glass Co Method of vapor depositing coatings of aluminum
CN2438724Y (en) * 2000-09-07 2001-07-11 中国科学院长春光学精密机械与物理研究所 Vacuum coating film medium resistance heating evaporation boat active electrode

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2731366A (en) * 1948-12-28 1956-01-17 Libbey Owens Ford Glass Co Method of vapor depositing coatings of aluminum
CN2438724Y (en) * 2000-09-07 2001-07-11 中国科学院长春光学精密机械与物理研究所 Vacuum coating film medium resistance heating evaporation boat active electrode

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Effective date of registration: 20190822

Address after: 516200 Baishi Village, Qiuchang Town, Huiyang District, Huizhou City, Guangdong Province

Patentee after: Huizhou Huiyang Xintian Glass Craft Products Co., Ltd.

Address before: 518112 Room B-1205, Bihu Garden, Longgang Central City, Shenzhen City, Guangdong Province

Patentee before: Huang Chuanqian

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Addressee: Huang Chuanqian

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Granted publication date: 20090617

Termination date: 20190212