CN100490151C - Controlled silicon structure used for CMOS electrostatic discharge protection - Google Patents
Controlled silicon structure used for CMOS electrostatic discharge protection Download PDFInfo
- Publication number
- CN100490151C CN100490151C CNB2006101177324A CN200610117732A CN100490151C CN 100490151 C CN100490151 C CN 100490151C CN B2006101177324 A CNB2006101177324 A CN B2006101177324A CN 200610117732 A CN200610117732 A CN 200610117732A CN 100490151 C CN100490151 C CN 100490151C
- Authority
- CN
- China
- Prior art keywords
- trap
- district
- well
- diffusion region
- esd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2006101177324A CN100490151C (en) | 2006-10-30 | 2006-10-30 | Controlled silicon structure used for CMOS electrostatic discharge protection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2006101177324A CN100490151C (en) | 2006-10-30 | 2006-10-30 | Controlled silicon structure used for CMOS electrostatic discharge protection |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101174629A CN101174629A (en) | 2008-05-07 |
CN100490151C true CN100490151C (en) | 2009-05-20 |
Family
ID=39422998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006101177324A Active CN100490151C (en) | 2006-10-30 | 2006-10-30 | Controlled silicon structure used for CMOS electrostatic discharge protection |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN100490151C (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102054861B (en) * | 2009-11-05 | 2012-08-01 | 上海宏力半导体制造有限公司 | Bidirectional thyristor and electrostatic protection circuit |
CN101807598B (en) * | 2010-03-17 | 2011-12-14 | 浙江大学 | PNPNP type triac |
CN102142440B (en) * | 2010-12-30 | 2012-08-22 | 浙江大学 | Thyristor device |
CN102522404B (en) * | 2011-12-30 | 2013-09-18 | 无锡新硅微电子有限公司 | Bidirectional SCR ESD protective circuit for low triggered voltage |
CN104022111B (en) * | 2014-06-17 | 2017-01-11 | 东南大学 | Electrostatic discharge protective structure with bidirectional protective capacity |
CN105810679A (en) * | 2014-12-31 | 2016-07-27 | 湘潭大学 | NPNPN-typetype bidirectional silicon controlled rectifier electrostatic protection device and layout thereof |
CN110047921A (en) * | 2018-01-15 | 2019-07-23 | 中芯国际集成电路制造(上海)有限公司 | Bidirectional triode thyristor structure |
CN108807371B (en) * | 2018-06-07 | 2019-07-09 | 湘潭大学 | A kind of high-protection level bidirectional thyristor electrostatic protection device and preparation method thereof |
CN109786374B (en) * | 2019-01-07 | 2021-07-13 | 中国科学院微电子研究所 | ESD protection device of SOI power switch |
CN109742071B (en) * | 2019-01-07 | 2021-04-13 | 中国科学院微电子研究所 | ESD protection device of SOI power switch |
CN109962099A (en) * | 2019-02-25 | 2019-07-02 | 中国科学院微电子研究所 | Bidirectional triode thyristor ESD-protection structure and soi structure |
CN110690213A (en) * | 2019-10-24 | 2020-01-14 | 湖南静芯微电子技术有限公司 | Bidirectional thyristor electrostatic protection device |
-
2006
- 2006-10-30 CN CNB2006101177324A patent/CN100490151C/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN101174629A (en) | 2008-05-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100490151C (en) | Controlled silicon structure used for CMOS electrostatic discharge protection | |
US8039899B2 (en) | Electrostatic discharge protection device | |
TW201902066A (en) | High capacitance bidirectional transient voltage suppressor | |
CN102623449B (en) | ESD Protection Device | |
US5675469A (en) | Integrated circuit with electrostatic discharge (ESD) protection and ESD protection circuit | |
KR20010102184A (en) | Bi-directional esd diode structure | |
CN103490399B (en) | Protection circuit | |
CN103427408A (en) | ESD protection for high voltage applications | |
CN101938119A (en) | Transient voltage suppressor (TVS) with improved clamping voltage | |
US7466527B1 (en) | Electrostatic discharge protection circuit | |
CN111668209B (en) | Low-leakage silicon controlled rectifier for low-voltage ESD protection | |
CN110491875B (en) | Bidirectional thyristor electrostatic protection device | |
CN102054837A (en) | Bidirectional thyristor and electrostatic protection circuit | |
CN102832233A (en) | SCR (silicon controlled rectifier) type LDMOS ESD (lateral double diffusion metal-oxide-semiconductor device electrostatic discharge) device | |
CN102054860A (en) | Bidirectional silicon-controlled rectifier (SCR) and electrostatic protection circuit | |
CN112563261B (en) | High-voltage protection integrated circuit of Complementary Metal Oxide Semiconductor (CMOS) auxiliary trigger Selective Catalytic Reduction (SCR) structure | |
CN102054861B (en) | Bidirectional thyristor and electrostatic protection circuit | |
CN110828453B (en) | Embedded P + injection segmented asymmetric silicon controlled rectifier electrostatic discharge device | |
CN101159263A (en) | Electrostatic discharge protection of a clamp | |
CN101593973B (en) | Static discharging protection circuit | |
CN102693980B (en) | A kind of controllable silicon ESD-protection structure of low trigger voltage | |
KR20060115077A (en) | Electrostatic discharge protection device | |
CN109148438B (en) | High-voltage electrostatic protection device and equivalent circuit | |
CN101452913B (en) | Device structure using silicon controlled rectifier as electrostatic protection | |
CN105374816B (en) | A kind of bidirectional ESD protective device based on Ge-Si heterojunction technique |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20140110 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201206 PUDONG NEW AREA, SHANGHAI TO: 201203 PUDONG NEW AREA, SHANGHAI |
|
TR01 | Transfer of patent right |
Effective date of registration: 20140110 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |