CN100447669C - Aqueous emulsion type cylinder photoresist - Google Patents
Aqueous emulsion type cylinder photoresist Download PDFInfo
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- CN100447669C CN100447669C CNB2005100247289A CN200510024728A CN100447669C CN 100447669 C CN100447669 C CN 100447669C CN B2005100247289 A CNB2005100247289 A CN B2005100247289A CN 200510024728 A CN200510024728 A CN 200510024728A CN 100447669 C CN100447669 C CN 100447669C
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- epoxy resin
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- type cylinder
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Abstract
The present invention discloses aqueous emulsion type circular net photoresist composed of a water solution of modified SBQ resin, a compound of light solidification resin and epoxy resin, an epoxy resin solidification agent, a photopolymerization initiator, low grade alkyl fatty alcohol, etc. The present invention blends the light solidification resin having compatibility with the epoxy resin and the epoxy resin, and a proper amount of low grade alkyl fatty alcohol is added. Toxic solvents, such as toluene, etc., are not used, so stable aqueous emulsion is conveniently made. A flower type screen made by the stable aqueous emulsion is solidified by light to form an interpenetrating network. Under the condition that chromium free ions are used as photosensitizer, the water developing fastness and the printing fastness are increased. In use, the present invention has no toxic gas discharge and no waste liquid discharge with heavy metal ions, and has industrial use value.
Description
Technical field
The present invention particularly adopts modification SBQ resin to make the aqueous emulsion type cylinder photoresists as photosensitizer about a kind of aqueous emulsion type cylinder photoresists.
Background technology
As everyone knows, aqueous emulsion type cylinder photoresists principal ingredient in the market is to constitute photosensitive system with dichromate/PVA; Constitute bonding system with epoxy resin.Because price comparison is cheap, the time shutter is shorter, shines sheet laser broad (between the 370-530nm), the photoresists rete can carry out advantages such as photoactivate in proportion, has ruled domestic and international ROTARY SCREAM PRINTING market for a long time.
Above-mentioned aqueous emulsion type cylinder photoresists are sneaked into photosensitizer dichromate aqueous solution in the photosensitive system before use, are coated with certain thickness glue-line on the net tube.After the drying, form light-sensitive surface.Then the film sheet of tool flower type positive is fitted with it, (hereinafter to be referred as the exposure of flower type) exposes.Corresponding to the part of the non-colored type of film sheet, be subjected to light after, hydroxyl reaction among chromium ion and the PVA forms water-fast macromolecular compound, and securely attached on the mesh; And corresponding to film film clips type part, because of not being subjected to light, photochemical reaction does not take place.When water flushing half tone carried out water development, the resin of photocuring owing to still water-soluble, can not washed away by water, made mesh still be through hole.So on cylinder, constitute design, be convenient to the mill base of biting.In other words, above-mentioned aqueous emulsion type cylinder photoresists, when preparation flower type half tone, good water development fastness (being water flushing fastness) is that the photochemical reaction between dichromate/PVA is contributed.
Yet, because the toxicity of chromium ion has brought difficulty for the discharging of developer solution.After entering 21st century, the human survival environment of paying attention to is sought sustainable development.The aqueous emulsion type cylinder photoresists of chromium ion are not adopted in development, have mentioned agenda.Replace dichromate to make photosensitizer with diazo resin and be successfully used to prepare the PLATE SCREAM PRINTING masterplate, but still exist dark reaction and exposure time change to cause disadvantages such as video picture operability reduction; And when diazo resin was used to prepare cylinder flower type half tone, the water development fastness can not satisfy the commercial production requirement far away from dichromate.
Grand (the Jap.P.: 71905 of the Japanese industry technology Yuan Shi village state early 1980s, 1983-04-28 and Jap.P.: 5761～5762,1981-02-06) having studied the PVA photosensitive resin (hereinafter to be referred as the SBQ resin) that connects skill styryl pyridine group also at first discloses as after the water development halftone screen photosensitive resin, (the MURAKAMICO. of silk screen Co., Ltd. in the Japan village, LTD) realized industrialization, released commodity such as AQVA soi ER and successfully be used for the plain net half tone.But the report that the SBQ resin is successfully used to the aqueous emulsion type cylinder photoresists is not arranged as yet so far.
Because the SBQ resin has numerous excellent in performance, for example: dark reaction does not take place, storage stability is good, but novel package, and reuse is convenient, simple to operate, but coated half tone is not hindered by oxygen during photopolymerization, particularly light sensitivity height (example: even the styryl pyridine group content is below 1%mol every a few days exposure still video picture (be commonly called as and can make pre-coated version), also show fabulous film speed) advantage such as [Jap.P.: 62446, (980-05-10)].Present inventors replace dichromate/PVA photosensitive system with the SBQ resin and attempt to prepare novel aqueous emulsion type cylinder photoresists.Practice shows that water development fastness difference is the fatal shortcoming of SBQ resin.Because its photocuring reaction occurs in above the hydroxyl unlike dichromate/PVA system, only occur over just the two keys position in the content styryl pyridine group seldom.For the emulsion type photoresists, have the enough moisture performance of loosing before the exposure in order to make, and a good water development, must have the hydroxyl of q.s in the SBQ resin.Before and after the exposure, hydroxy radical content does not change in the photosensitive resin constituent, exposure back remaining hydroxyl will cause the water swelling phenomenon of optical cross-linked resin, even can be dashed from mesh by the water of band pressure, be difficult to guarantee the integrality and the reappearance of flower type image on the flower type half tone.Therefore, be in the photoresists in photosensitive source with the SBQ resin, must at first manage to improve the water resistance of light-curable glue film.
In addition, in the aqueous emulsion type cylinder photoresists, the epoxy resin of bonding system is with after the dissolving of toluene equal solvent at present, and the emulsification of going again makes.From be applied to the pre-dried forming process of filming, the volatilization of poisonous toluene solvant exists problems such as influencing labor safety, contaminated environment, and the aqueous emulsion type cylinder photoresists that do not contain toxic solvents such as toluene are developed in expectation.
Summary of the invention
The objective of the invention is to disclose a kind of novel aqueous emulsion type cylinder photoresists, to solve the above-mentioned problems in the prior art.
The objective of the invention is to realize: adopt the SBQ resin to replace dichromate/PVA, and in this resin, further introduce the unsaturated link of photopolymerization, increase the photo-crosslinking point, thereby improved the water development fastness by following technical method.In addition, that adds q.s has the light-curable resin of compatibility with epoxy resin, mixes with it, makes emulsion.Coat half tone with this emulsion, after the drying, the exposure of flower type.Unsaturated group in the resin that light accepting part divides participates in photopolymerization reaction simultaneously, is cross-linked into network, and epoxy resin is anchored on the nickel screen mesh.During water development, be unlikely because of the hydroxyl that exists in the SBQ resin is subjected to the water swelling and come off, reach the expection fastness.During the further hot setting of flower type half tone, formed epoxy resin that network wrapped up by photocuring and carry out chemical crosslinking with hardening agent and form three-dimensional structure, provide enough printing fastness to final photoresists rete.
A kind of aqueous emulsion type cylinder photoresists of the present invention, these photoresists are composed of the following components by weight percentage;
Modification SBQ resin aqueous solution 5%～40%
The thing 5%～15% that dissolves each other of photo curable resin and epoxy resin
Epoxy curing agent 5%～13%
Photoepolymerizationinitiater initiater 0.03%～1%
Low alkyl group fatty alcohol 0.2～10%
Water surplus.
Epoxy resin of the present invention is selected from a kind of or its potpourri in bisphenol A type epoxy resin, bisphenol f type epoxy resin, resorcinol type epoxy resin, line style phenol formaldehyde (PF) epoxy resin, orthoresol formaldehyde epoxy resin, the pliability epoxy resin.
Photo curable resin of the present invention can be acrylic modified epoxy resin, acrylic acid modified polyurethane resin, photo curable resin, should be earlier and epoxy resin mix, go emulsification afterwards again, as feature.
Epoxy curing agent of the present invention is selected from a kind of or its potpourri in phenolics, etherification of phenolic resin, polyamide, aromatic amine, alicyclic amine, aromatic anhydride class, alicyclic acid anhydrides class, halogen-containing anhydrides, the boron trifluoride-amine complex.
Low alkyl group fatty alcohol of the present invention is selected from methyl alcohol, ethanol, n-propanol, isopropyl alcohol, normal butyl alcohol, isobutyl alcohol.
Photoepolymerizationinitiater initiater can adopt the material that is easy to generate free radical under illumination, selects a kind of or its potpourri from benzoin alkylether class, di-tert-butyl peroxide, tert-butyl group anthraquinone, thioxanthones, as composition main composition thing.Also can adopt the Photoepolymerizationinitiater initiater of laser explosure.
Photoepolymerizationinitiater initiater can with photopolymerization promoter and sensitizer and usefulness, photopolymerization promoter and sensitizer are selected from tertiary amines, 2 methyl isophthalic acids-[4-methyl mercapto phenyl]-2-morpholinyl-1-acetone such as benzoic acid system, right-dimethyl amido benzoic acid ethyl ester, right-dimethyl amido benzoic acid isopentyl ester, 2-dimethyl aminoethyl benzoic ether.
The stabilizing agent that novel aqueous emulsion type cylinder photoresists of the present invention can add the antioxidant known, light and heat is phenols, hydroquinones, hindered amines, triazines etc. for example.Addition is with respect to 0.001～0.5% of whole aqueous emulsion type cylinder photoresists weight.
Under the prerequisite that does not influence performance of the present invention, can add the auxiliary agent of the interpolation in the common photosensitive compoistion, as: dyestuff, pigment, surfactant, defoamer, ultraviolet light absorber, flower type excipient wax emulsion class etc.
The present invention also can suitably add diazo resin before the use as required.It is with respect to 0.02%～0.1% of whole aqueous emulsion type cylinder photoresists weight.
Specifications of raw materials:
Per 100 parts of epoxy resin add 20～50 parts of photo curable resins, stir cp/25 ℃ of light-curable resin range of viscosities (6500～20000).Unsaturated group content (0.1～0.5) mol/100g.
SBQ resin: make versus buy (U.S. source business Co., Ltd.)
Modification SBQ resin: self-control
PH 4.0～6.0
Solid content % 10.0～14.0w.t
Viscosity 1500～4500cp/25 ℃
SBQ％ 0.5～1.5w.t
Other unsaturated group content % 0.3～1.0w.t
Modification SBQ resin method for making:
With solid content is the SBQ resin aqueous solution (make versus buy) of (12-14) %, regulates its PH≤2.5 with acid, is warming up to 40-90 ℃, add N-hydroxyalkyl (methyl) acrylic acid salt, be incubated 1-9 hour, reduce to the room temperature neutralization, make PH=4.0～6.0, be modification SBQ resin aqueous solution.
The method for making of aqueous emulsion type cylinder photoresists of the present invention:
In the dissolve each other thing and the hardening agent of 100 parts of photo curable resins and epoxy resin, add auxiliary agent as required, carry out emulsification with SBQ resin and 0～15 portion of non-ionic surfactant of 100～250 parts of modifications, make emulsion.
The method for making of colored type net tube of the present invention:
At the order number is on 25～155 purpose nickel screens, is coated with above-mentioned emulsion type garden net photoresists, after 40 ℃ of heated-air dryings, and the exposure of flower type.Soak in 20～40 ℃ of water after 1-3 minute, the flowing water flushing obtains the flower type and films.Further after 150～180 ℃, solidified 0.5～2.0 hour, obtain flower type half tone.
Aqueous emulsion type cylinder photoresists disclosed in this invention, its advantage shows: in use, and the nonhazardous gas discharging, heavy metal free ion discharging of waste liquid, available water is developed; The present invention has adopted the photo curable resin blend with it that compatibility is arranged with epoxy resin, adds an amount of low alkyl group fatty alcohol, does not adopt toxic solvents such as toluene, has made stable aqueous emulsion easily.With this colored type half tone for preparing, step curing forms interpenetrating networks through photocuring, and epoxy resin is anchored on the nickel screen; Solidify behind high temperature, with the cross linking of epoxy resin of linear structure, the wear-resisting fatigue proof printed material that generates three-dimensional structure has been realized doing under the situation of photosensitizer at no chromium ion, has improved the water development fastness and has printed fastness, has industrial use value.
Embodiment
Below in conjunction with embodiment the present invention is further described.
Embodiment 1
Epoxy resin/hardening agent 130g
Modification SBQ resin aqueous solution: (13% weight phenol specific concentration) 225g
Thia a species of orchid ketone 3g
Normal butyl alcohol 20g
Water 185g
Epoxy resin is Bisphenol F type 6420, adds 25g in every 100g epoxy resin, and unsaturated group content is the acrylic modified epoxy resin of 0.4mol/100g; Hardening agent adopts etherification of phenolic resin 248.
The emulsion that above-mentioned prescription is made is cast on the nickel screen.After 40 ℃ of heated-air dryings, the exposure of flower type.In 30 ℃ of water, soak, go into bloom type and manifest.1.5 with the tap water flushing, do not fill in net after minute, image repetition is good.Flower type half tone is printed 3 myriametre fabrics after 180 ℃ of elevated temperature heat are solidified 1 hour, the flower type does not have breakage.
Embodiment 2:
Epoxy resin/hardening agent 140g
Modification SBQ resin aqueous solution: (13% weight concentration) 240g
Benzoin dimethylether 5g
Ethanol 25g
Water 190g
Epoxy resin is bisphenol A-type E-31, and adding 28g unsaturated group content in every 100g epoxy resin is the acrylic modified epoxy resin of 0.15mol/100g; Hardening agent adopts polyamide 6 50.
Be modulated into aqueous emulsion with above-mentioned prescription, be cast on the nickel screen, after 40 ℃ of heated-air dryings, the exposure of flower type is soaked in 25 ℃ of water, manifests pattern.1.5 with the tap water flushing, present design after minute.Image repetition is good.Flower type half tone is printed 3 myriametre fabrics after 180 ℃ of elevated temperature heat are solidified 1.5 hours, the flower type does not have breakage.
Embodiment 3:
Epoxy resin/hardening agent 60g
Modification SBQ resin aqueous solution: (13% weight concentration) 60g
Isopropyl thioxanthone 2g
Methyl alcohol 12g
Water 466g
Epoxy resin is bisphenol A-type E21, and adding 30g unsaturated group content in every 100g epoxy resin is the acrylic acid modified polyurethane resin of 0.25mol/100g; Hardening agent adopts tung oil acid anhydride.
Embodiment 4:
Epoxy resin/hardening agent 96g
Modification SBQ resin aqueous solution: (13% weight concentration) 150g
Thia a species of orchid ketone 3g
4-dimethyl-ethyl benzoate 3g
Isopropyl alcohol 20g
Water 320g
Epoxy resin is bisphenol A-type E35, and adding 20g unsaturated group content in every 100g epoxy resin is the acrylic modified epoxy resin of 0.30mol/100g; Hardening agent adopts 4.4 ' diamino-diphenyl sulfone addition product.
Be modulated into aqueous emulsion with above-mentioned prescription, be cast on the nickel screen, after 40 ℃ of heated-air dryings, the exposure of flower type is soaked in 25 ℃ of water, and pattern is seen in entry.With the tap water flushing, obtain design after 2 minutes.Image repetition is good.Flower type half tone is printed 3 myriametre fabrics after 180 ℃ of elevated temperature heat are solidified 1 hour, the flower type does not have breakage.
Comparative example 1:
Epoxy resin/curing agent toluene solution (70% concentration) 175g
SBQ resin aqueous solution: (13% concentration) 175g
Water 150g
Epoxy resin is bisphenol A-type E21, and hardening agent is a tung oil acid anhydride, all is mixed with 70% weight concentration with toluene.
Become O/W type emulsion with above-mentioned compositional modulation, be cast on the nickel screen.After 40 ℃ of heated-air dryings, the exposure of flower type.Soak in 20 ℃ of water, go into bloom type and manifest, with the tap water flushing, non-illumination partly comes off simultaneously after 2 minutes, and illumination part also part comes off, and the flower type is imperfect.
Claims (6)
1, a kind of aqueous emulsion type cylinder photoresists, it is characterized in that: the aqueous emulsion type cylinder photoresists are composed of the following components by weight percentage:
Modification SBQ resin aqueous solution 5%～40%
The thing 5%～15% that dissolves each other of photo curable resin and epoxy resin
Epoxy curing agent 5%～13%
Photoepolymerizationinitiater initiater 0.03%～1%
Low alkyl group fatty alcohol 2%～10%
Water surplus,
Described SBQ resin is the PVA photosensitive resin that connects skill styryl pyridine group,
Described modification SBQ resin aqueous solution is to be made by following method: be the SBQ resin aqueous solution of 12%-14% with solid content, regulate its PH≤2.5 with acid, be warming up to 40-90 ℃, add N-hydroxyalkyl (methyl) acrylic acid salt, be incubated 1-9 hour, reduce to the room temperature neutralization, make PH=4.0～6.0, be modification SBQ resin aqueous solution
Photo curable resin is selected from acrylic modified epoxy resin or acrylic acid modified polyurethane resin.
2, according to the aqueous emulsion type cylinder photoresists of claim 1, it is characterized in that: epoxy resin is selected from a kind of or its potpourri in bisphenol A type epoxy resin, bisphenol f type epoxy resin, resorcinol type epoxy resin, line style phenol formaldehyde (PF) epoxy resin, orthoresol formaldehyde epoxy resin, the pliability epoxy resin.
3, according to the aqueous emulsion type cylinder photoresists of claim 2, it is characterized in that: photo curable resin and epoxy resin mix, emulsification.
4, according to the aqueous emulsion type cylinder photoresists of claim 1, it is characterized in that: epoxy curing agent is selected from a kind of or its potpourri in phenolics, etherification of phenolic resin, polyamide, aromatic amine, cycloaliphatic amines, aromatic anhydride, alicyclic acid anhydrides, halogen-containing acid anhydrides, the boron trifluoride-amine complex.
5, according to the aqueous emulsion type cylinder photoresists of claim 1, it is characterized in that: the low alkyl group fatty alcohol is selected from methyl alcohol, ethanol, n-propanol, isopropyl alcohol, normal butyl alcohol or isobutyl alcohol.
6, according to the aqueous emulsion type cylinder photoresists of claim 1, it is characterized in that: Photoepolymerizationinitiater initiater is selected from a kind of or its potpourri in benzoin alkylether, di-tert-butyl peroxide, tert-butyl group a species of orchid quinone, the thia a species of orchid ketone.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100247289A CN100447669C (en) | 2005-03-29 | 2005-03-29 | Aqueous emulsion type cylinder photoresist |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100247289A CN100447669C (en) | 2005-03-29 | 2005-03-29 | Aqueous emulsion type cylinder photoresist |
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| CN1667508A CN1667508A (en) | 2005-09-14 |
| CN100447669C true CN100447669C (en) | 2008-12-31 |
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| CNB2005100247289A Expired - Fee Related CN100447669C (en) | 2005-03-29 | 2005-03-29 | Aqueous emulsion type cylinder photoresist |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101241304B (en) * | 2007-02-09 | 2012-05-09 | 上海中大科技发展有限公司 | Waterfast environment-friendly type rotary screen stenciling photoresist |
| CN101592864B (en) * | 2008-05-30 | 2012-07-11 | 上海中大科技发展有限公司 | Single-component water-emulsion type rotary screen stenciling sensitive material |
| CN101813887B (en) * | 2010-04-12 | 2012-05-09 | 东莞长联新材料科技有限公司 | Method for enhancing thermal stability of diazo photosensitive emulsion |
| JP5521800B2 (en) * | 2010-06-08 | 2014-06-18 | Ｊｓｒ株式会社 | Radiation-sensitive resin composition, cured film, method for forming cured film, and display element |
| CN103849349B (en) * | 2014-03-14 | 2016-03-09 | 江南大学 | A kind of aqueous adhesive and preparation method thereof |
| CN106094434A (en) * | 2016-08-23 | 2016-11-09 | 浙江荣生科技有限公司 | A kind of preparation method of high rapidity high stable novel photoactive glue |
| CN106079849A (en) * | 2016-08-29 | 2016-11-09 | 盛虹集团有限公司 | A kind of preparation method of polyester fabric efficient free steam cleaning printing cylinder |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4564580A (en) * | 1983-06-30 | 1986-01-14 | Kogyo Gijutsuin | Photosensitive resin composition |
| JPH0667429A (en) * | 1991-09-30 | 1994-03-11 | Agency Of Ind Science & Technol | Photosensitive resin composition for screen printing plate, photosensitive film and screen printing plate made by using the same |
| CN1230568A (en) * | 1998-03-12 | 1999-10-06 | 互应化学工业株式会社 | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| US6238841B1 (en) * | 1998-05-12 | 2001-05-29 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| JP2001352157A (en) * | 2000-06-06 | 2001-12-21 | Goo Chemical Co Ltd | Photo-setting type plugging ink for manufacturing printed wiring board with through-hole and method for manufacturing printed wiring board with through-hole using the same ink |
-
2005
- 2005-03-29 CN CNB2005100247289A patent/CN100447669C/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4564580A (en) * | 1983-06-30 | 1986-01-14 | Kogyo Gijutsuin | Photosensitive resin composition |
| JPH0667429A (en) * | 1991-09-30 | 1994-03-11 | Agency Of Ind Science & Technol | Photosensitive resin composition for screen printing plate, photosensitive film and screen printing plate made by using the same |
| CN1230568A (en) * | 1998-03-12 | 1999-10-06 | 互应化学工业株式会社 | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| US6238841B1 (en) * | 1998-05-12 | 2001-05-29 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
| JP2001352157A (en) * | 2000-06-06 | 2001-12-21 | Goo Chemical Co Ltd | Photo-setting type plugging ink for manufacturing printed wiring board with through-hole and method for manufacturing printed wiring board with through-hole using the same ink |
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| CN1667508A (en) | 2005-09-14 |
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