CN100436641C - 一种真空镀膜组态工艺控制方法 - Google Patents
一种真空镀膜组态工艺控制方法 Download PDFInfo
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- CN100436641C CN100436641C CNB2004100823908A CN200410082390A CN100436641C CN 100436641 C CN100436641 C CN 100436641C CN B2004100823908 A CNB2004100823908 A CN B2004100823908A CN 200410082390 A CN200410082390 A CN 200410082390A CN 100436641 C CN100436641 C CN 100436641C
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- 238000000034 method Methods 0.000 title claims abstract description 109
- 238000004886 process control Methods 0.000 title claims abstract description 7
- 230000008569 process Effects 0.000 claims abstract description 96
- 238000007747 plating Methods 0.000 claims abstract description 20
- 238000005269 aluminizing Methods 0.000 claims abstract description 16
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 13
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 11
- 238000001704 evaporation Methods 0.000 claims abstract description 8
- 238000004140 cleaning Methods 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000010849 ion bombardment Methods 0.000 claims description 5
- 238000009792 diffusion process Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 229920002545 silicone oil Polymers 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
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Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNB2004100823908A CN100436641C (zh) | 2004-12-31 | 2004-12-31 | 一种真空镀膜组态工艺控制方法 |
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CNB2004100823908A CN100436641C (zh) | 2004-12-31 | 2004-12-31 | 一种真空镀膜组态工艺控制方法 |
Publications (2)
Publication Number | Publication Date |
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CN1632163A CN1632163A (zh) | 2005-06-29 |
CN100436641C true CN100436641C (zh) | 2008-11-26 |
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CNB2004100823908A Expired - Fee Related CN100436641C (zh) | 2004-12-31 | 2004-12-31 | 一种真空镀膜组态工艺控制方法 |
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CN (1) | CN100436641C (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101130857B (zh) * | 2006-08-23 | 2011-06-01 | 上海华虹Nec电子有限公司 | 物理汽相沉积设备的辅助控制装置和方法 |
CN101592926B (zh) * | 2009-06-25 | 2011-09-14 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种镀膜工艺控制方法及控制系统 |
CN109023274A (zh) * | 2018-08-18 | 2018-12-18 | 昭工表面制品(深圳)有限公司 | 手表表盘字钉真空镀膜方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1455015A (zh) * | 2003-04-14 | 2003-11-12 | 上海奥移电器有限公司 | 锌铝真空蒸发镀膜机 |
CN1532563A (zh) * | 2002-09-09 | 2004-09-29 | ͬ�Ϳ�ҵ��ʽ���� | 光学增透膜及其镀膜方法 |
CN2651263Y (zh) * | 2003-03-26 | 2004-10-27 | 苏贵方 | 双室真空镀膜装置 |
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2004
- 2004-12-31 CN CNB2004100823908A patent/CN100436641C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1532563A (zh) * | 2002-09-09 | 2004-09-29 | ͬ�Ϳ�ҵ��ʽ���� | 光学增透膜及其镀膜方法 |
CN2651263Y (zh) * | 2003-03-26 | 2004-10-27 | 苏贵方 | 双室真空镀膜装置 |
CN1455015A (zh) * | 2003-04-14 | 2003-11-12 | 上海奥移电器有限公司 | 锌铝真空蒸发镀膜机 |
Non-Patent Citations (4)
Title |
---|
浅析真空镀膜技术. 宋永良.甘肃科技,第20卷第7期. 2004 * |
第十二讲:真空工艺. 张以忱.真空,第2期. 2003 * |
第十二讲:真空工艺. 张以忱.真空,第3期. 2003 * |
第十二讲:真空工艺. 张以忱.真空,第5期. 2003 * |
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Publication number | Publication date |
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CN1632163A (zh) | 2005-06-29 |
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Owner name: LANZHOU DC TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: LANZHOU DC AUTOMATION ENGINEERING CO., LTD. Effective date: 20100604 Free format text: FORMER OWNER: LANZHOU JIAOTONG UNIVERSITY |
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Effective date of registration: 20100604 Address after: 730000 Lanzhou hi tech Industrial Development Zone, Gansu province (No. 575 Zhang ha Beach) Patentee after: Lanzhou Dacheng Technology Co., Ltd. Address before: 508 box 118, Anning West Road, Anning District, Gansu 730070, Lanzhou Co-patentee before: Lanzhou Jiaotong Univ. Patentee before: Dacheng Automation Engineering Co., Ltd., Lanzhou |
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Assignee: Changzhou Dacheng Green Coating Science & Technology Co., Ltd. Assignor: Lanzhou Dacheng Technology Co., Ltd. Contract record no.: 2011320000522 Denomination of invention: Vacuum filming configuration process control method Granted publication date: 20081126 License type: Exclusive License Open date: 20050629 Record date: 20110406 |
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