CN100410179C - Method for preparing gallium nitride nano crystal using sol-gel method - Google Patents
Method for preparing gallium nitride nano crystal using sol-gel method Download PDFInfo
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- CN100410179C CN100410179C CNB2006100162711A CN200610016271A CN100410179C CN 100410179 C CN100410179 C CN 100410179C CN B2006100162711 A CNB2006100162711 A CN B2006100162711A CN 200610016271 A CN200610016271 A CN 200610016271A CN 100410179 C CN100410179 C CN 100410179C
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CNB2006100162711A CN100410179C (en) | 2006-10-25 | 2006-10-25 | Method for preparing gallium nitride nano crystal using sol-gel method |
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CNB2006100162711A CN100410179C (en) | 2006-10-25 | 2006-10-25 | Method for preparing gallium nitride nano crystal using sol-gel method |
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CN1944268A CN1944268A (en) | 2007-04-11 |
CN100410179C true CN100410179C (en) | 2008-08-13 |
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Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105543968B (en) * | 2015-12-21 | 2018-06-05 | 江苏锡沂高新区科技发展有限公司 | A kind of method that low cost prepares gallium nitride |
CN105502313B (en) * | 2015-12-24 | 2018-06-05 | 上海欣鑫化工有限公司 | A kind of method that gallium nitride nano crystal is prepared using double screw extruder |
CN105483828B (en) * | 2015-12-24 | 2018-06-26 | 成都新柯力化工科技有限公司 | A kind of preparation method for improving gallium nitride quality |
CN107364838B (en) * | 2017-06-19 | 2019-12-03 | 南开大学 | The preparation method of the gallium nitride nano material of iron series element doping |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4144116A (en) * | 1975-03-19 | 1979-03-13 | U.S. Philips Corporation | Vapor deposition of single crystal gallium nitride |
CN1398790A (en) * | 2002-08-20 | 2003-02-26 | 浙江大学 | Rod-like polycrystal GaN and its two-step prepn process |
CN1490243A (en) * | 2002-10-17 | 2004-04-21 | 中国科学技术大学 | Hot synthetic preparation of metastable rock salt phase nano gallium nitride in solvent |
JP2005154193A (en) * | 2003-11-25 | 2005-06-16 | Kitagawa Ind Co Ltd | Method of manufacturing group iii nitride |
CN1789114A (en) * | 2005-12-15 | 2006-06-21 | 太原理工大学 | High purity gallium nitride nanometer line preparation method |
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2006
- 2006-10-25 CN CNB2006100162711A patent/CN100410179C/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4144116A (en) * | 1975-03-19 | 1979-03-13 | U.S. Philips Corporation | Vapor deposition of single crystal gallium nitride |
CN1398790A (en) * | 2002-08-20 | 2003-02-26 | 浙江大学 | Rod-like polycrystal GaN and its two-step prepn process |
CN1490243A (en) * | 2002-10-17 | 2004-04-21 | 中国科学技术大学 | Hot synthetic preparation of metastable rock salt phase nano gallium nitride in solvent |
JP2005154193A (en) * | 2003-11-25 | 2005-06-16 | Kitagawa Ind Co Ltd | Method of manufacturing group iii nitride |
CN1789114A (en) * | 2005-12-15 | 2006-06-21 | 太原理工大学 | High purity gallium nitride nanometer line preparation method |
Non-Patent Citations (2)
Title |
---|
立方相β-GaN纳米晶的气相化学反应制备研究. 方鲲,高善民,邱海林,曹传宝,朱鹤孙.物理学报,第54卷第5期. 2005 |
立方相β-GaN纳米晶的气相化学反应制备研究. 方鲲,高善民,邱海林,曹传宝,朱鹤孙.物理学报,第54卷第5期. 2005 * |
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Assignee: Tianjin Ranyue Environmental Protection Innovative Technology Co., Ltd. Assignor: China National Academy Nanotechnology & Engineering Contract record no.: 2010120000122 Denomination of invention: Method for preparing gallium nitride nano crystal using sol-gel method Granted publication date: 20080813 License type: Exclusive License Open date: 20070411 Record date: 20100910 |
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Effective date of registration: 20151125 Address after: 300457, room 306, building C4, Tian Da Science Park, No. fourth, 80 Avenue, Tianjin economic and Technological Development Zone Patentee after: Tianjin Zhongtian Genon Technology Co. Ltd. Address before: 300457 No. fourth, 80 Avenue, Tianjin economic and Technological Development Zone Patentee before: China National Academy Nanotechnology & Engineering |
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