CN100405599C - Pixel unit and display device - Google Patents

Pixel unit and display device Download PDF

Info

Publication number
CN100405599C
CN100405599C CNB2006100012771A CN200610001277A CN100405599C CN 100405599 C CN100405599 C CN 100405599C CN B2006100012771 A CNB2006100012771 A CN B2006100012771A CN 200610001277 A CN200610001277 A CN 200610001277A CN 100405599 C CN100405599 C CN 100405599C
Authority
CN
China
Prior art keywords
electrode
pixel unit
overlapping
area
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2006100012771A
Other languages
Chinese (zh)
Other versions
CN1825587A (en
Inventor
王涌锋
余良彬
董畯豪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AUO Corp
Original Assignee
AU Optronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AU Optronics Corp filed Critical AU Optronics Corp
Priority to CNB2006100012771A priority Critical patent/CN100405599C/en
Publication of CN1825587A publication Critical patent/CN1825587A/en
Application granted granted Critical
Publication of CN100405599C publication Critical patent/CN100405599C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Liquid Crystal (AREA)

Abstract

The invention provides a pixel unit and a display device. The pixel unit comprises a first metal layer and a second metal layer, wherein the first metal layer is provided with a grid electrode and a first electrode, the second metal layer is provided with a drain electrode, a source electrode and a second electrode, the drain electrode is overlapped with the grid electrode to form a first overlapped area, the source electrode is overlapped with the grid electrode to form a second overlapped area, the second electrode is overlapped with the first electrode to form a third overlapped area, and the first electrode and the second electrode are close in size and are mutually staggered. The pixel unit can be applied to a display device. The capacitance value of the storage capacitor of the invention can change along with the capacitance value change of the parasitic capacitor, so the offset of the capacitance value of the parasitic capacitor caused by the alignment error can be automatically compensated, and the voltage change of the storage capacitor is further fixed. When the voltage variation of the storage capacitor is fixed, the voltage variation of the storage capacitor can be compensated by adjusting the common voltage.

Description

像素单元及显示装置 Pixel unit and display device

技术领域technical field

本发明是关于一种像素单元,特别是有关于一种可自动补偿寄生电容的电容值的像素单元。The present invention relates to a pixel unit, in particular to a pixel unit capable of automatically compensating the capacitance of a parasitic capacitance.

背景技术Background technique

图1a是已知像素单元的示意图。如图所示,像素单元1包括薄膜晶体管(Thin Film Transistor;TFT)12以及储存电容(storage capacitor;Cs)14。薄膜晶体管12具有栅极电极122、源极电极124以及漏极电极126。栅极电极122耦接栅极线16,源极电极124耦接源极线18。Figure 1a is a schematic diagram of a known pixel unit. As shown in the figure, the pixel unit 1 includes a thin film transistor (Thin Film Transistor; TFT) 12 and a storage capacitor (storage capacitor; C s ) 14 . The thin film transistor 12 has a gate electrode 122 , a source electrode 124 and a drain electrode 126 . The gate electrode 122 is coupled to the gate line 16 , and the source electrode 124 is coupled to the source line 18 .

由于栅极电极122是由第一金属层所构成,而源极电极124及漏极电极126是由第二金属层所构成,因此,当一半导体层的区域128设置于第一金属层及第二金属层之间时,则栅极电极122、漏极电极126重叠栅极电极122的重叠区A、以及漏极电极126可构成一寄生电容(parasitical capacitor;CP)。另外,栅极电极122、源极电极124重叠栅极电极122的重叠区B、以及源极电极124可构成另一寄生电容。Since the gate electrode 122 is made of the first metal layer, and the source electrode 124 and the drain electrode 126 are made of the second metal layer, when the region 128 of a semiconductor layer is disposed on the first metal layer and the second metal layer When between the two metal layers, the gate electrode 122 , the overlapping region A where the drain electrode 126 overlaps the gate electrode 122 , and the drain electrode 126 can form a parasitic capacitor (C P ). In addition, the gate electrode 122 , the overlapping region B where the source electrode 124 overlaps the gate electrode 122 , and the source electrode 124 may constitute another parasitic capacitance.

图1b显示图1a的像素单元的等效电路图。图1c显示图1a的像素单元的时序图。请参考图1b及图1c,栅极线16上的扫描信号在时间t1时,由低逻辑电平转换成高逻辑电平,用以导通薄膜晶体管12。储存电容14与液晶电容CLC根据源极线18上的数据信号开始充电,并在时间t1内充电至电压V1FIG. 1b shows an equivalent circuit diagram of the pixel unit in FIG. 1a. FIG. 1c shows a timing diagram of the pixel unit of FIG. 1a. Please refer to FIG. 1b and FIG. 1c , the scanning signal on the gate line 16 is converted from a low logic level to a high logic level at time t1 to turn on the thin film transistor 12 . The storage capacitor 14 and the liquid crystal capacitor C LC start to charge according to the data signal on the source line 18 , and charge to the voltage V 1 within the time t 1 .

在时间t1之后,栅极线16上的扫描信号由高逻辑电平转换成低逻辑电平,使得薄膜晶体管12由导通状态转换成不导通状态,此时储存电容14的电压V14应保持在电压V1。然而由于薄膜晶体管12的栅极电极122与漏极电极126间具有寄生电容Cp,故将使得储存电容14的电压V14由电压V1下降ΔV。After time t1 , the scanning signal on the gate line 16 is converted from a high logic level to a low logic level, so that the thin film transistor 12 is converted from a conduction state to a non-conduction state, and the voltage V 14 of the storage capacitor 14 is now Should be kept at voltage V 1 . However, due to the parasitic capacitance C p between the gate electrode 122 and the drain electrode 126 of the thin film transistor 12 , the voltage V 14 of the storage capacitor 14 will drop by ΔV from the voltage V1 .

由于储存电容14与液晶电容CLC所储存的电压代表像素单元1要呈现的亮度,故当储存电容14的电压发生变化时,将使得像素单元1呈现错误的亮度。已知的解决方式是改变施加于第一电极22的共通电压Vcom。当储存电容14的电压V14下降ΔV时,则将原本的共通电压Vcom1减小ΔV而成为Vcom2,以补偿寄生电容Cp所造成的影响。Since the voltage stored in the storage capacitor 14 and the liquid crystal capacitor C LC represents the brightness to be displayed by the pixel unit 1 , when the voltage of the storage capacitor 14 changes, the pixel unit 1 will display a wrong brightness. A known solution is to vary the common voltage V com applied to the first electrode 22 . When the voltage V 14 of the storage capacitor 14 drops by ΔV, the original common voltage V com1 is reduced by ΔV to become V com2 , so as to compensate the influence caused by the parasitic capacitance C p .

在制造大尺寸的显示面板时,由于光刻掩膜的面积不足以覆盖大尺寸的显示面板,故必须将显示面板划分成许多区域,再分别对不同区域里的像素单元进行曝光、显影、蚀刻等微影工艺。When manufacturing a large-sized display panel, since the area of the photolithography mask is not enough to cover the large-sized display panel, the display panel must be divided into many areas, and then the pixel units in different areas are exposed, developed, and etched. And other lithography process.

当某一种微影工艺发生对位误差时,则可能影响像素单元里的重叠区A的面积。当重叠区A的面积发生变化时,则寄生电容Cp的电容值也会随着变化。由于各区域里的像素单元并非同时被制成,故各区域可能具有各自的对位误差,因而造成每一区域里的像素单元的寄生电容的电容值均不相同。When an alignment error occurs in a certain lithography process, it may affect the area of the overlapping region A in the pixel unit. When the area of the overlapping region A changes, the capacitance value of the parasitic capacitor C p will also change accordingly. Since the pixel units in each area are not manufactured at the same time, each area may have its own alignment error, thus resulting in different capacitance values of the parasitic capacitors of the pixel units in each area.

当同一显示面板上的寄生电容的电容值不相同时,则无法利用调整共通电压的方式来补偿寄生电容所造成的影响。When the capacitance values of the parasitic capacitors on the same display panel are different, the influence caused by the parasitic capacitors cannot be compensated by adjusting the common voltage.

发明内容Contents of the invention

本发明即是为了解决上述现有技术的缺失而提出的。The present invention is proposed in order to solve the deficiency of the above-mentioned prior art.

本发明提供一种像素单元,包括一第一以及第二金属层。第一金属层具有一栅极电极以及一第一电极。第二金属层具有一漏极电极、一源极电极、以及一第二电极。漏极电极重叠栅极电极之处为一第一重叠区。源极电极重叠栅极电极之处为一第二重叠区。第二电极重叠第一电极之处为一第三重叠区。第一及第二电极的大小相近,并相互错开。The invention provides a pixel unit including a first and a second metal layer. The first metal layer has a gate electrode and a first electrode. The second metal layer has a drain electrode, a source electrode, and a second electrode. The place where the drain electrode overlaps the gate electrode is a first overlapping region. The place where the source electrode overlaps the gate electrode is a second overlapping region. The place where the second electrode overlaps the first electrode is a third overlapping region. The first and second electrodes are similar in size and staggered from each other.

另外,所述第一重叠区的面积的变化率与第三重叠区的面积的变化率为一正相关系,即正比关系。In addition, the rate of change of the area of the first overlapping region and the rate of change of the area of the third overlapping region have a positive phase relationship, that is, a proportional relationship.

本发明另提供一种显示装置,包括一扫描驱动器、一数据驱动器以及多个像素单元。扫描驱动器用以提供扫描信号。数据驱动器用以提供数据信号。每一像素单元包括一第一以及第二金属层。第一金属层具有一栅极电极以及一第一电极。第二金属层具有一漏极电极、一源极电极、以及一第二电极。漏极电极重叠栅极电极之处为一第一重叠区。源极电极重叠栅极电极之处为一第二重叠区。第二电极重叠第一电极之处为一第三重叠区。该第一及第二电极的大小相近,并相互错开。The present invention further provides a display device including a scan driver, a data driver and a plurality of pixel units. The scan driver is used for providing scan signals. The data driver is used for providing data signals. Each pixel unit includes a first and a second metal layer. The first metal layer has a gate electrode and a first electrode. The second metal layer has a drain electrode, a source electrode, and a second electrode. The place where the drain electrode overlaps the gate electrode is a first overlapping region. The place where the source electrode overlaps the gate electrode is a second overlapping region. The place where the second electrode overlaps the first electrode is a third overlapping region. The first and second electrodes are similar in size and staggered from each other.

由于本发明的储存电容的电容值会随着寄生电容的电容值变化而变化,故可自动补偿寄生电容的电容值因对位误差所产生的偏移,进而固定储存电容的电压变化量。Since the capacitance value of the storage capacitor of the present invention changes with the capacitance value of the parasitic capacitor, the offset of the capacitance value of the parasitic capacitor due to the alignment error can be automatically compensated, thereby fixing the voltage variation of the storage capacitor.

而当储存电容的电压变化量固定时,则可利用调整共通电压的方法,来补偿储存电容的电压变化量。When the voltage variation of the storage capacitor is fixed, the method of adjusting the common voltage can be used to compensate the voltage variation of the storage capacitor.

为让本发明的上述和其它目的、特征、和优点能更明显易懂,下文特举出较佳实施例,并配合所附图式,作详细说明如下:In order to make the above-mentioned and other purposes, features, and advantages of the present invention more clearly understood, the preferred embodiments are specifically listed below, together with the accompanying drawings, and are described in detail as follows:

附图说明Description of drawings

图1a为已知像素单元的示意图。Fig. 1a is a schematic diagram of a known pixel unit.

图1b显示图1a的像素单元的等效电路图。FIG. 1b shows an equivalent circuit diagram of the pixel unit in FIG. 1a.

图1c显示图1a的像素单元的时序图。FIG. 1c shows a timing diagram of the pixel unit of FIG. 1a.

图2a显示本发明的像素单元的第一实施例。Fig. 2a shows a first embodiment of the pixel unit of the present invention.

图2b显示本发明的像素单元的第二实施例。Fig. 2b shows a second embodiment of the pixel unit of the present invention.

图3a显示本发明的像素单元的第三实施例。Fig. 3a shows a third embodiment of the pixel unit of the present invention.

图3b显示本发明的像素单元的第四实施例。Fig. 3b shows a fourth embodiment of the pixel unit of the present invention.

图4a~图5b显示本发明的像素单元的其它实施例。4a-5b show other embodiments of the pixel unit of the present invention.

主要组件符号说明:Description of main component symbols:

1:像素单元;      12:薄膜晶体管;1: pixel unit; 12: thin film transistor;

14:储存电容;     122、21:栅极电极;14: Storage capacitor; 122, 21: Gate electrode;

124、23:源极电极;126、24:漏极电极;124, 23: source electrodes; 126, 24: drain electrodes;

16、20:栅极线;      18、27:源极线;16, 20: gate line; 18, 27: source line;

128、42、44:区域;   A、B、C:重叠区;128, 42, 44: area; A, B, C: overlapping area;

22:第一电极;        25:第二电极;22: first electrode; 25: second electrode;

26:连接线。26: connecting line.

具体实施方式Detailed ways

由于寄生电容Cp的存在,故当薄膜晶体管12由导通状态切换至不导通状态时,则储存电容14的电压会发生变化,其电压变化量ΔV如下式所示:Due to the existence of the parasitic capacitance Cp , when the thin film transistor 12 is switched from the conduction state to the non-conduction state, the voltage of the storage capacitor 14 will change, and the voltage change ΔV is as follows:

ΔVΔV == (( VV gateoffgate off -- VV gateongateon )) CC gdgd CC gdgd ++ CC SS ++ CC otherother .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. (( 11 ))

其中,Cgd为寄生电容Cp的电容值,CS为储存电容14的电容值,Cother为其它电容(如液晶电容CLC)的电容值;Vgateoff为薄膜晶体管12不导通时的栅极电压;Vgateon为薄膜晶体管12导通时的栅极电压。Wherein, C gd is the capacitance value of the parasitic capacitance C p , C S is the capacitance value of the storage capacitor 14 , C other is the capacitance value of other capacitances (such as the liquid crystal capacitance C LC ); V gateoff is the capacitance value of the thin film transistor 12 when it is not conducting Gate voltage; V gateon is the gate voltage when the thin film transistor 12 is turned on.

在未发生对位误差时,若薄膜晶体管12由导通状态切换至不导通状态时,则储存电容14的电压变化量ΔV1如下式所示:When no alignment error occurs, if the thin film transistor 12 is switched from the conduction state to the non-conduction state, the voltage variation ΔV 1 of the storage capacitor 14 is expressed as follows:

ΔΔ VV 11 == (( VV gateoffgate off -- VV gateongateon )) CC gdgd 11 CC gdgd 11 ++ CC SS 11 ++ CC otherother .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. (( 22 ))

其中,Cgd1为未发生对位误差时的寄生电容Cp的电容值;CS1为未发生对位误差时的储存电容14的电容值。Wherein, C gd1 is the capacitance value of the parasitic capacitor C p when no alignment error occurs; C S1 is the capacitance value of the storage capacitor 14 when no alignment error occurs.

而在发生对位误差时,若薄膜晶体管12由导通状态切换至不导通状态时,则储存电容14的电压变化量ΔV2如下式所示:When an alignment error occurs, if the thin film transistor 12 is switched from the conduction state to the non-conduction state, the voltage variation ΔV 2 of the storage capacitor 14 is as follows:

ΔΔ VV 22 == (( VV gateoffgate off -- VV gateongateon )) CC gdgd 22 CC gdgd 22 ++ CC SS 22 ++ CC otherother .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. (( 33 ))

其中,Cgd2为发生对位误差时的寄生电容Cp的电容值;CS2为发生对位误差时的储存电容14的电容值。Wherein, C gd2 is the capacitance value of the parasitic capacitance C p when the alignment error occurs; C S2 is the capacitance value of the storage capacitor 14 when the alignment error occurs.

为了固定储存电容14的电压变化量,故令ΔV1=ΔV2后,可得:In order to fix the voltage variation of the storage capacitor 14, after setting ΔV 1 =ΔV 2 , it can be obtained:

(( VV gateoffgate off -- VV gateongateon )) CC gdgd 11 CC gdgd 11 ++ CC SS 11 ++ CC otherother == (( VV gateoffgate off -- VV gateongateon )) CC gdgd 22 CC gdgd 22 ++ CC SS 22 ++ CC otherother .. .. .. (( 44 ))

化简式(4)后可得下式:After simplifying formula (4), the following formula can be obtained:

CC gdgd 11 CC gdgd 22 == CC SS 11 ++ CC otherother CC SS 22 ++ CC otherother .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. (( 55 ))

由式(5)可知,当寄生电容Cp的电容值Cgd因对位误差由原本的Cgd1偏移为Cgd2时,若将储存电容14的电容值由原本的CS1调整成CS2时,便可使储存电容14的电压变化量不受对位误差的影响。It can be known from formula (5) that when the capacitance C gd of the parasitic capacitance C p is shifted from the original C gd1 to C gd2 due to the alignment error, if the capacitance of the storage capacitor 14 is adjusted from the original C S1 to C S2 , the voltage variation of the storage capacitor 14 will not be affected by the alignment error.

举例而言,假设未发生对位误差时,寄生电容Cp的电容值Cgd1为0.05pF,储存电容14的电容值CS1为0.7pF,而其它的电容值Cother为0.8pF。当发生对位误差时,寄生电容Cp的电容值Cgd2则为0.05+ΔCgd pF,储存电容14的电容值CS2则为0.8+ΔCS pF,而其它的电容值Cother为0.8pF,代入式(5)后可得:For example, assuming no alignment error occurs, the capacitance C gd1 of the parasitic capacitor C p is 0.05 pF, the capacitance C S1 of the storage capacitor 14 is 0.7 pF, and the other capacitances C other are 0.8 pF. When an alignment error occurs, the capacitance C gd2 of the parasitic capacitance C p is 0.05+ΔC gd pF, the capacitance C S2 of the storage capacitor 14 is 0.8+ΔC S pF, and the other capacitance C other is 0.8pF , after substituting into formula (5), we can get:

0.050.05 0.050.05 ++ ΔΔ CC gdgd == 0.70.7 ++ 0.80.8 0.70.7 ++ ΔΔ CC SS ++ 0.80.8 .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. (( 66 ))

ΔΔ CC SS == 1.51.5 0.050.05 ·&Center Dot; ΔΔ CC gdgd == 3030 ·&Center Dot; ΔΔ CC gdgd .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. .. (( 77 ))

若寄生电容Cp的电容值Cgd的变化量ΔCgd=0.01pF时,则储存电容14的电容值CS的变化量ΔCS只要等于0.3pF,便能补偿对位误差所造成的影响。因此,由式(7)可知,寄生电容Cp的电容值Cgd与储存电容14的电容值CS呈正相关(如正比关系)。If the variation ΔC gd of the capacitance C gd of the parasitic capacitor C p =0.01pF, then the variation ΔCS of the capacitance CS of the storage capacitor 14 is equal to 0.3pF, which can compensate the influence caused by the alignment error. Therefore, it can be known from the formula (7) that the capacitance C gd of the parasitic capacitance C p is positively correlated with the capacitance CS of the storage capacitor 14 (such as a proportional relationship).

图2a显示本发明的像素单元的第一实施例。本发明的像素单元可应用于显示装置中,用以接收显示装置的扫描驱动器(未显示)所输出的扫描信号及数据驱动器(未显示)所输出的数据信号。Fig. 2a shows a first embodiment of the pixel unit of the present invention. The pixel unit of the present invention can be applied in a display device for receiving a scan signal output by a scan driver (not shown) and a data signal output by a data driver (not shown) of the display device.

像素单元至少包括第一及第二金属层,用以构成像素单元的驱动装置。如图所示,第一金属层具有栅极电极21及第一电极22。栅极电极21耦接栅极线(gate line)20。栅极线20用以提供扫描驱动器(未显示)所输出的扫描信号予栅极电极21。The pixel unit at least includes first and second metal layers for forming a driving device for the pixel unit. As shown in the figure, the first metal layer has a gate electrode 21 and a first electrode 22 . The gate electrode 21 is coupled to a gate line 20 . The gate lines 20 are used to provide scan signals output by a scan driver (not shown) to the gate electrodes 21 .

第二金属层具有源极电极23、漏极电极24、以及第二电极25。源极电极23耦接源极线(source line)27。源极线27用以提供数据驱动器(未显示)所输出的数据信号予源极电极23。The second metal layer has a source electrode 23 , a drain electrode 24 , and a second electrode 25 . The source electrode 23 is coupled to a source line 27 . The source line 27 is used for providing the data signal outputted by the data driver (not shown) to the source electrode 23 .

漏极电极24重叠栅极电极21之处为重叠区A,源极电极23重叠栅极电极21之处为重叠区B。第二电极25重叠第一电极22之处为重叠区C。第一电极22与第二电极25的大小相近,并相互错开。第二金属层还包括一连接电极26,用以连接漏极电极24及第二电极25,其并不会重叠第一金属层的任何区域。Where the drain electrode 24 overlaps the gate electrode 21 is an overlapping region A, and where the source electrode 23 overlaps the gate electrode 21 is an overlapping region B. The overlapping region C is where the second electrode 25 overlaps the first electrode 22 . The first electrode 22 and the second electrode 25 are similar in size and staggered from each other. The second metal layer also includes a connecting electrode 26 for connecting the drain electrode 24 and the second electrode 25 , which does not overlap any area of the first metal layer.

由于在第一金属层与第二金属层之间具有一半导体层,故栅极电极21、重叠区A及漏极电极24可构成如图1b所示的寄生电容Cp,而第一电极22、重叠区C及第二电极25可构成储存电容14。栅极电极21、源极电极23及漏极电极24可构成如图1b所示的薄膜晶体管12。Since there is a semiconductor layer between the first metal layer and the second metal layer, the gate electrode 21, the overlapping region A and the drain electrode 24 can form a parasitic capacitance Cp as shown in FIG. 1b, and the first electrode 22 , the overlapping region C and the second electrode 25 can form the storage capacitor 14 . The gate electrode 21 , the source electrode 23 and the drain electrode 24 can constitute a thin film transistor 12 as shown in FIG. 1 b .

虽然在栅极电极21、重叠区B及源极电极23也可形成一寄生电容,但当薄膜晶体管12不导通时,栅极电极21及源极电极23之间的寄生电容并不会影响储存电容14所储存的电荷,故在此不考虑栅极电极21及源极电极23之间的寄生电容。Although a parasitic capacitance can also be formed at the gate electrode 21, the overlapping region B and the source electrode 23, when the thin film transistor 12 is not turned on, the parasitic capacitance between the gate electrode 21 and the source electrode 23 will not affect The electric charge stored in the storage capacitor 14, therefore, the parasitic capacitance between the gate electrode 21 and the source electrode 23 is not considered here.

通过改变第一电极22及第二电极25的形状,便可使重叠区C的面积随着重叠区A的面积而改变。本发明并不限制第一电极22及第二电极25的形状,在本实施例中,第一电极22及第二电极25的形状为鱼骨形状。By changing the shapes of the first electrode 22 and the second electrode 25 , the area of the overlapping area C can be changed along with the area of the overlapping area A. Referring to FIG. The present invention does not limit the shapes of the first electrodes 22 and the second electrodes 25 . In this embodiment, the shapes of the first electrodes 22 and the second electrodes 25 are fishbone shapes.

由图2a可知,当漏极电极24及第二电极25因对位误差而向左偏移时,将造成重叠区A、C的面积会变小,使得寄生电容Cp及储存电容14的电容值变小;而当漏极电极24及第二电极25因对位误差而向右偏移时,则重叠区A、C的面积会变大,使得寄生电容Cp及储存电容14的电容值变大。而当重叠区A的面积未改变时,则重叠区C的面积也不会改变。It can be seen from FIG. 2a that when the drain electrode 24 and the second electrode 25 are shifted to the left due to the alignment error, the areas of the overlapping regions A and C will become smaller, so that the parasitic capacitance C p and the capacitance of the storage capacitor 14 The value becomes smaller; and when the drain electrode 24 and the second electrode 25 are shifted to the right due to the alignment error, the area of the overlapping regions A and C will become larger, so that the parasitic capacitance C p and the capacitance value of the storage capacitor 14 get bigger. And when the area of the overlapping area A does not change, the area of the overlapping area C will not change either.

图2b显示本发明的像素单元的第二实施例。图2b所显示的像素单元相似于图2a,不同之处在于第一电极22及第二电极25的形状。在本实施例中,第一电极22及第二电极25的形状为栅栏形状。当漏极电极24因对位误差而水平移动时,第二电极25也会随着水平移动。如图2b所示,漏极电极24垂直栅极线20,因此,第一电极22与第二电极25的开孔垂直栅极线20。Fig. 2b shows a second embodiment of the pixel unit of the present invention. The pixel unit shown in FIG. 2b is similar to that in FIG. 2a, except that the shapes of the first electrode 22 and the second electrode 25 are different. In this embodiment, the shape of the first electrode 22 and the second electrode 25 is a fence shape. When the drain electrode 24 moves horizontally due to the misalignment, the second electrode 25 also moves horizontally. As shown in FIG. 2 b , the drain electrode 24 is perpendicular to the gate line 20 , therefore, the openings of the first electrode 22 and the second electrode 25 are perpendicular to the gate line 20 .

图3a显示本发明的像素单元的第三实施例。图3a所示的像素单元可补偿垂直方向的对位误差。当漏极电极24因对位误差而垂直移动时,第二电极25也会随着垂直移动,进而使得重叠区C的面积随重叠区A的面积变化而变化。如图所示,漏极电极24平行栅极线20,因此,第一电极22与第二电极25的开孔平行栅极线20。Fig. 3a shows a third embodiment of the pixel unit of the present invention. The pixel unit shown in FIG. 3a can compensate the alignment error in the vertical direction. When the drain electrode 24 moves vertically due to the misalignment, the second electrode 25 also moves vertically, so that the area of the overlapping region C changes with the area of the overlapping region A. As shown in the figure, the drain electrode 24 is parallel to the gate line 20 , therefore, the openings of the first electrode 22 and the second electrode 25 are parallel to the gate line 20 .

图3b显示本发明的像素单元的第四实施例。图3b所显示的像素单元相似于图3a,不同之处在于第一电极22及第二电极25的形状。Fig. 3b shows a fourth embodiment of the pixel unit of the present invention. The pixel unit shown in FIG. 3b is similar to that in FIG. 3a, except that the shapes of the first electrode 22 and the second electrode 25 are different.

图2a~图3b所提到的对位误差是发生在第二金属层的源极电极23、漏极电极24及第二电极25。而图4a~图5b所显示的像素单元则可补偿第一金属层与第二金属层之间的半导体层的对位误差。The alignment errors mentioned in FIGS. 2 a to 3 b occur in the source electrode 23 , the drain electrode 24 and the second electrode 25 of the second metal layer. However, the pixel units shown in FIGS. 4 a to 5 b can compensate the alignment error of the semiconductor layer between the first metal layer and the second metal layer.

如图4a、图4b所示,半导体层具有区域42及44,区域42重叠栅极电极21,区域44重叠第一电极22。当区域42因对位误差而向左移动时,则造成栅极电极21与区域42的重叠区面积减少;而当半导体层的区域42向右移动时,则造成栅极电极21与区域42的重叠区面积增加。As shown in FIGS. 4 a and 4 b , the semiconductor layer has regions 42 and 44 , the region 42 overlaps the gate electrode 21 , and the region 44 overlaps the first electrode 22 . When the region 42 moves to the left due to the alignment error, the overlapping area of the gate electrode 21 and the region 42 decreases; and when the region 42 of the semiconductor layer moves to the right, the overlap between the gate electrode 21 and the region 42 The area of overlap increases.

为避免栅极电极21与区域42的重叠区面积影响寄生电容Cp的电容值,故当栅极电极21与区域42的重叠区面积改变时,则同时改变第一电极22与区域44的重叠区的面积。如图5a及图5b所示,当半导体层因对位误差而垂直移动时,区域42及44的面积也会随着变化。In order to prevent the overlapping area of the gate electrode 21 and the region 42 from affecting the capacitance value of the parasitic capacitance Cp , when the overlapping area of the gate electrode 21 and the region 42 changes, the overlapping of the first electrode 22 and the region 44 is also changed. area of the district. As shown in FIG. 5 a and FIG. 5 b , when the semiconductor layer moves vertically due to misalignment, the areas of the regions 42 and 44 also change accordingly.

由于本发明的储存电容的电容值会随着寄生电容的电容值变化而变化,故可自动补偿寄生电容的电容值因对位误差所产生的偏移,进而固定储存电容的电压变化量。Since the capacitance value of the storage capacitor of the present invention changes with the capacitance value of the parasitic capacitor, the offset of the capacitance value of the parasitic capacitor due to the alignment error can be automatically compensated, thereby fixing the voltage variation of the storage capacitor.

当储存电容的电压变化量固定时,则可利用调整共通电压(commonvoltage)的方法,来补偿储存电容的电压变化量。When the voltage variation of the storage capacitor is fixed, the method of adjusting the common voltage can be used to compensate the voltage variation of the storage capacitor.

虽然本发明已以较佳实施例揭露如上,然其并非用以限定本发明,任何熟习此技艺的人,在不脱离本发明的精神和范围内,可作些许的更动与润饰,因此本发明的保护范围当视申请专利范围所界定的为准。Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Anyone skilled in this art can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, this The scope of protection of an invention shall be determined by the scope of the patent application.

Claims (34)

1.一种像素单元,其特征在于包括:1. A pixel unit, characterized in that it comprises: 一第一金属层,具有一栅极电极以及一第一电极;以及a first metal layer having a gate electrode and a first electrode; and 一第二金属层,具有一漏极电极、一源极电极、以及一第二电极,漏极电极重叠栅极电极之处为一第一重叠区,源极电极重叠栅极电极之处为一第二重叠区,第二电极重叠第一电极之处为一第三重叠区;其中,第一及第二电极的大小相近,并相互错开。A second metal layer has a drain electrode, a source electrode, and a second electrode, where the drain electrode overlaps the gate electrode is a first overlapping region, and where the source electrode overlaps the gate electrode is a In the second overlapping area, the place where the second electrode overlaps the first electrode is a third overlapping area; wherein, the first and second electrodes are similar in size and staggered from each other. 2.如权利要求1所述的像素单元,其特征在于,所述第一重叠区的面积的变化率与第三重叠区的面积的变化率为一正相关系。2 . The pixel unit according to claim 1 , wherein the rate of change of the area of the first overlapping region is positively related to the rate of change of the area of the third overlapping region. 3 . 3.如权利要求2所述的像素单元,其特征在于,所述正相关系为一正比关系。3. The pixel unit according to claim 2, wherein the positive phase relationship is a proportional relationship. 4.如权利要求1所述的像素单元,其特征在于,通过改变第一及第二电极的形状,使得第三重叠区的面积随着第一重叠区的面积而变化。4. The pixel unit as claimed in claim 1, wherein the area of the third overlapping region varies with the area of the first overlapping region by changing the shapes of the first and second electrodes. 5.如权利要求4所述的像素单元,其特征在于,所述第一及第二电极的形状均为鱼骨状。5 . The pixel unit according to claim 4 , wherein the shapes of the first and second electrodes are both fishbone. 6 . 6.如权利要求4所述的像素单元,其特征在于,所述第一及第二电极的形状均为栅栏状。6 . The pixel unit according to claim 4 , wherein the shapes of the first and second electrodes are both fence-like. 7 . 7.如权利要求1所述的像素单元,其特征在于,还包括一连接电极,耦接于第二电极与漏极电极之间,当第一重叠区的面积变化时,连接电极不会重叠栅极电极或第一电极。7. The pixel unit according to claim 1, further comprising a connection electrode coupled between the second electrode and the drain electrode, when the area of the first overlapping region changes, the connection electrodes will not overlap gate electrode or first electrode. 8.如权利要求7所述的像素单元,其特征在于,所述连接电极由第二金属层所构成。8. The pixel unit as claimed in claim 7, wherein the connection electrode is formed of a second metal layer. 9.如权利要求7所述的像素单元,其特征在于,当所述第二电极重叠第一电极时,则构成一电容。9. The pixel unit according to claim 7, wherein when the second electrode overlaps the first electrode, a capacitor is formed. 10.如权利要求9所述的像素单元,其特征在于,所述栅极电极、漏极电极以及源极电极构成一晶体管。10. The pixel unit as claimed in claim 9, wherein the gate electrode, the drain electrode and the source electrode form a transistor. 11.如权利要求1所述的像素单元,其特征在于,当所述第二金属层水平或垂直移动时,将改变第一、第二以及第三重叠区的面积。11. The pixel unit according to claim 1, wherein when the second metal layer moves horizontally or vertically, the areas of the first, second and third overlapping regions will be changed. 12.如权利要求1所述的像素单元,其特征在于,还包括一半导体层,设置于第一及第二金属层之间,该半导体层重叠栅极电极之处为一第四重叠区,并且重叠第一电极之处为一第五重叠区。12. The pixel unit according to claim 1, further comprising a semiconductor layer disposed between the first and second metal layers, where the semiconductor layer overlaps the gate electrode is a fourth overlapping region, And the place overlapping the first electrode is a fifth overlapping area. 13.如权利要求12所述的像素单元,其特征在于,当所述半导体层水平或垂直移动时,将改变第四及第五重叠区的面积。13. The pixel unit according to claim 12, wherein when the semiconductor layer moves horizontally or vertically, the areas of the fourth and fifth overlapping regions will be changed. 14.如权利要求12所述的像素单元,其特征在于,所述第四重叠区的部分与第一重叠区及第二重叠区重叠,第五重叠区的部分与第三重叠区重叠。14 . The pixel unit according to claim 12 , wherein part of the fourth overlapping area overlaps with the first and second overlapping areas, and part of the fifth overlapping area overlaps with the third overlapping area. 15.如权利要求1所述的像素单元,其特征在于,所述栅极电极耦接一栅极线;当漏极电极垂直该栅极线时,则第一及第二电极的开孔垂直该栅极线。15. The pixel unit according to claim 1, wherein the gate electrode is coupled to a gate line; when the drain electrode is perpendicular to the gate line, the openings of the first and second electrodes are perpendicular the gate line. 16.如权利要求1所述的像素单元,其特征在于,所述栅极电极耦接一栅极线;当漏极电极平行该栅极线时,则第一及第二电极的开孔平行该栅极线。16. The pixel unit according to claim 1, wherein the gate electrode is coupled to a gate line; when the drain electrode is parallel to the gate line, the openings of the first and second electrodes are parallel the gate line. 17.如权利要求1所述的像素单元,其特征在于,所述第一电极的形状与第二电极的形状相同。17. The pixel unit according to claim 1, wherein the shape of the first electrode is the same as that of the second electrode. 18.一种显示装置,其特征在于包括:18. A display device, characterized in that it comprises: 一扫描驱动器,用以提供至少一扫描信号;a scan driver, used to provide at least one scan signal; 一数据驱动器,用以提供至少一数据信号;以及a data driver for providing at least one data signal; and 多个像素单元,接收所述扫描信号及数据信号,每一像素单元包括:A plurality of pixel units receive the scanning signal and data signal, each pixel unit includes: 一第一金属层,具有一栅极电极以及一第一电极,该栅极电极接收所述扫描信号;以及a first metal layer having a gate electrode and a first electrode, and the gate electrode receives the scan signal; and 一第二金属层,具有一漏极电极、一源极电极、以及一第二电极,漏极电极重叠栅极电极之处为一第一重叠区,源极电极重叠栅极电极之处为一第二重叠区,第二电极重叠第一电极之处为一第三重叠区;其中,第一及第二电极的大小相近,并相互错开。A second metal layer has a drain electrode, a source electrode, and a second electrode, where the drain electrode overlaps the gate electrode is a first overlapping region, and where the source electrode overlaps the gate electrode is a In the second overlapping area, the place where the second electrode overlaps the first electrode is a third overlapping area; wherein, the first and second electrodes are similar in size and staggered from each other. 19.如 权利要求18所述的显示装置,其特征在于,所述第一重叠区的面积的变化率与第三重叠区的面积的变化率为一正相关系。19. The display device according to claim 18, wherein the rate of change of the area of the first overlapping region and the rate of change of the area of the third overlapping region have a positive phase relationship. 20.如权利要求19所述的显示装置,其特征在于,所述正相关为一正比关系。20. The display device according to claim 19, wherein the positive correlation is a proportional relationship. 21.如权利要求18所述的显示装置,其特征在于,通过改变第一及第二电极的形状,使得第三重叠区的面积随着第一重叠区的面积变化而变化。21. The display device as claimed in claim 18, wherein the area of the third overlapping region varies with the area of the first overlapping region by changing the shapes of the first and second electrodes. 22.如权利要求21所述的显示装置,其特征在于,所述第一及第二电极的形状均为鱼骨状。22. The display device according to claim 21, wherein the first and second electrodes both have a fishbone shape. 23.如权利要求21所述的显示装置,其特征在于,所述第一及第二电极的形状均为栅栏状。23. The display device according to claim 21, wherein the first and second electrodes are both fence-shaped. 24.如权利要求18所述的显示装置,其特征在于,还包括一连接电极,耦接于第二电极与漏极电极之间,当第一重叠区的面积变化时,该连接电极不会重叠栅极电极或第一电极。24. The display device according to claim 18, further comprising a connection electrode coupled between the second electrode and the drain electrode, and when the area of the first overlapping region changes, the connection electrode will not Overlapping the gate electrode or the first electrode. 25.如权利要求24所述的显示装置,其特征在于,所述连接电极由第二金属层所构成。25. The display device as claimed in claim 24, wherein the connection electrode is formed of a second metal layer. 26.如权利要求24所述的显示装置,其特征在于,所述第二电极重叠第一电极时,则构成一电容。26. The display device according to claim 24, wherein when the second electrode overlaps the first electrode, a capacitor is formed. 27.如权利要求26所述的显示装置,其特征在于,所述栅极电极、漏极电极以及源极电极构成一晶体管。27. The display device as claimed in claim 26, wherein the gate electrode, the drain electrode and the source electrode form a transistor. 28.如权利要求18所述的显示装置,其特征在于,当所述第二金属层水平或垂直移动时,将改变第一、第二以及第三重叠区的面积。28. The display device according to claim 18, wherein when the second metal layer moves horizontally or vertically, the areas of the first, second and third overlapping regions will be changed. 29.如权利要求18所述的显示装置,其特征在于,所述像素单元还包括一半导体层,设置于第一及第二金属层之间,该半导体层重叠栅极电极之处为一第四重叠区,并且重叠第一电极之处为一第五重叠区。29. The display device according to claim 18 , wherein the pixel unit further comprises a semiconductor layer disposed between the first and second metal layers, where the semiconductor layer overlaps the gate electrode is a first There are four overlapping regions, and the overlapping first electrode is a fifth overlapping region. 30.如权利要求29所述的显示装置,其特征在于,当所述半导体层水平或垂直移动时,将改变第四及第五重叠区的面积。30. The display device as claimed in claim 29, wherein when the semiconductor layer moves horizontally or vertically, the areas of the fourth and fifth overlapping regions will be changed. 31.如权利要求30所述的显示装置,其特征在于,所述第四重叠区的部分与第一重叠区及第二重叠区重叠,所述第五重叠区的部分与第三重叠区重叠。31. The display device according to claim 30, wherein a part of the fourth overlapping area overlaps with the first overlapping area and a second overlapping area, and a part of the fifth overlapping area overlaps with the third overlapping area . 32.如权利要求18所述的显示装置,其特征在于,所述栅极电极耦接一栅极线;当漏极电极垂直该栅极线时,则第一及第二电极的开孔垂直该栅极线。32. The display device according to claim 18, wherein the gate electrode is coupled to a gate line; when the drain electrode is perpendicular to the gate line, the openings of the first and second electrodes are perpendicular the gate line. 33.如权利要求18所述的显示装置,其特征在于,所述栅极电极耦接一栅极线;当漏极电极平行该栅极线时,则第一及第二电极的开孔平行该栅极线。33. The display device according to claim 18, wherein the gate electrode is coupled to a gate line; when the drain electrode is parallel to the gate line, the openings of the first and second electrodes are parallel the gate line. 34.如权利要求18所述的显示装置,其特征在于,所述第一电极的形状与第二电极的形状相同。34. The display device according to claim 18, wherein the shape of the first electrode is the same as that of the second electrode.
CNB2006100012771A 2006-01-12 2006-01-12 Pixel unit and display device Expired - Fee Related CN100405599C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2006100012771A CN100405599C (en) 2006-01-12 2006-01-12 Pixel unit and display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2006100012771A CN100405599C (en) 2006-01-12 2006-01-12 Pixel unit and display device

Publications (2)

Publication Number Publication Date
CN1825587A CN1825587A (en) 2006-08-30
CN100405599C true CN100405599C (en) 2008-07-23

Family

ID=36936136

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2006100012771A Expired - Fee Related CN100405599C (en) 2006-01-12 2006-01-12 Pixel unit and display device

Country Status (1)

Country Link
CN (1) CN100405599C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109031814B (en) * 2018-09-06 2021-06-18 Tcl华星光电技术有限公司 Liquid crystal display and array substrate thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030146895A1 (en) * 2002-02-07 2003-08-07 Chao-Chun Chung Pixel driving device for a liquid crystal display
WO2003096114A1 (en) * 2002-05-09 2003-11-20 Samsung Electronics Co., Ltd. Multi-domain liquid crystal display and a thin film transistor substrate of the same
CN1536418A (en) * 2003-04-07 2004-10-13 友达光电股份有限公司 Pixel structure and manufacturing method thereof
US20050219435A1 (en) * 2004-04-06 2005-10-06 Lg.Philips Lcd Co., Ltd. Liquid crystal display device including driving circuit and method of fabricating the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030146895A1 (en) * 2002-02-07 2003-08-07 Chao-Chun Chung Pixel driving device for a liquid crystal display
WO2003096114A1 (en) * 2002-05-09 2003-11-20 Samsung Electronics Co., Ltd. Multi-domain liquid crystal display and a thin film transistor substrate of the same
CN1536418A (en) * 2003-04-07 2004-10-13 友达光电股份有限公司 Pixel structure and manufacturing method thereof
US20050219435A1 (en) * 2004-04-06 2005-10-06 Lg.Philips Lcd Co., Ltd. Liquid crystal display device including driving circuit and method of fabricating the same

Also Published As

Publication number Publication date
CN1825587A (en) 2006-08-30

Similar Documents

Publication Publication Date Title
US6897908B2 (en) Liquid crystal display panel having reduced flicker
US9105248B2 (en) Array substrate, display device and method for driving pixels within each pixel region of the array substrate
US8085352B2 (en) Electrostatic discharge protection circuit, manufacturing method thereof and liquid crystal display device having the same
US7345717B2 (en) Liquid crystal display device with a capacitance-compensated structure
US5701166A (en) Active matrix liquid crystal display having first and second display electrodes capacitively couple to second and first data buses, respectively
US20090073367A1 (en) Array substrate and display panel having the same
US20080062104A1 (en) Display device
US8228451B2 (en) Liquid crystal display
JPH07311390A (en) Liquid crystal display device
US20070096102A1 (en) Liquid crystal display panel
US7659956B2 (en) Pixel unit and display device utilizing the same
CN100405599C (en) Pixel unit and display device
KR20080001106A (en) Array substrate for liquid crystal display device and manufacturing method thereof
Lebrun et al. AMLCD with integrated drivers made with amorphous‐silicon TFTs
CN107577098A (en) A kind of array base palte, liquid crystal display panel and display device
US7830483B2 (en) Liquid crystal display device
JP2960268B2 (en) Active matrix liquid crystal panel, manufacturing method and driving method thereof, and active matrix liquid crystal display
JP4021045B2 (en) Active matrix display device
CN101727837B (en) Liquid crystal display and driving method thereof
KR101182504B1 (en) Array substrate for LCD and the fabrication method thereof
US8842232B2 (en) Thin film transistor with parasitic capacitance compensation structure and liquid crystal display using same
CN106201105A (en) Pressure sensor, sensing method thereof and display panel with pressure sensor
US20120127411A1 (en) Pixel unit, lcd panel, and method for forming the same
JP2002072981A (en) Liquid crystal display device
JP5213587B2 (en) Liquid crystal display

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: YOUDA PHOTOELECTRIC CO., LTD.

Free format text: FORMER OWNER: GUANGHUI ELECTRONIC CO., LTD.

Effective date: 20071123

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20071123

Address after: Hsinchu city of Taiwan Province

Applicant after: AU OPTRONICS Corp.

Address before: Taoyuan County of Taiwan Province

Applicant before: QUANTA DISPLAY INCORPORATION

C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20080723

CF01 Termination of patent right due to non-payment of annual fee