CN100394244C - Apparatus and method for providing fluid for immersion lithography - Google Patents

Apparatus and method for providing fluid for immersion lithography Download PDF

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CN100394244C
CN100394244C CN 200480023888 CN200480023888A CN100394244C CN 100394244 C CN100394244 C CN 100394244C CN 200480023888 CN200480023888 CN 200480023888 CN 200480023888 A CN200480023888 A CN 200480023888A CN 100394244 C CN100394244 C CN 100394244C
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fluid
pressure
space
porous
member
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CN 200480023888
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CN1839333A (en
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A·K·T·普恩
L·W·F·霍
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株式会社尼康
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion

Abstract

本发明的实施例是针对控制流体流量和压力以便为浸没光刻提供稳定条件的系统和方法。 Embodiments of the present invention is directed to control fluid flow and pressure to provide a stable condition for immersion lithography systems and methods. 在漫没光刻过程期间,向透镜(22)和基片(16)之间的一空间(34)提供一流体。 During the lithography process is not diffuse, to provide a fluid to a space (34) between the lens (22) and the substrate (16). 流体被供给到所说空间,并通过一个与所说空间流体连通的一个多孔元件(51)从所说空间回收流体。 Fluid is supplied to said space, and recovering the fluid from said space by a porous element (51) a fluid communication with said space. 把多孔元件中的压力保持在多孔元件的起泡点以下,就能消除在流体回收期间由空气与流体相混合所产生的噪音。 The pressure in the porous element is maintained at below the bubble point of the porous element can eliminate noise generated during the mixing fluid recovery phase consists of air and fluid. 在一个实施例中,所说的方法包括:通过一个多孔元件经由一回收流体线路从所说空间抽吸流体;在从所说空间抽吸流体期间,把多孔元件中的流体压力保持在多孔元件的起泡点以下。 In one embodiment, said method comprising: drawing the fluid from the space via a porous member via a fluid line recovery; during aspiration fluid from the space, the fluid pressure in the porous element is held in the porous element the bubble point.

Description

为浸没光刻提供流体的装里和方法本申请基于下面美国临时专利申请,并要求享有这些美国临时专 Providing fluid for immersion lithography apparatus and methods in the present application is based on U.S. Provisional Patent Application below, and claims the benefit of the U.S. Provisional Patent

利申请的权益,这些美国临时专利申请为:2003年9月3日提交的No.60/500312和2004年2月2日提交的No.60/541329。 Rights of patent applications, which are US Provisional Patent Application is: No.60 / 500312 and No.60 / 541329 February 2, 2004, filed September 3, 2003 submission. 在此引用这些 In these references

美国临时专利申请的全文作为参考。 US Provisional Patent Application entirety by reference.

技术领域 FIELD

本发明总体上涉及一种为漫没光刻(immersion lithography)提供流体的系统和方法,更具体地说,是一种控制流体流量和压力以便为漫没光刻提供穗定条件的系统和方法。 The present invention relates generally to a system and method for providing a fluid to diffuse not lithography (immersion lithography), and more particularly, to a system and method for controlling fluid flow and pressure conditions in order to provide ear set not diffuse lithography .

背景技术 Background technique

膝光装置是一种精密组件,在半导体处理期间,它通常被用于把困像从一分划板转移到半导体晶片上。 Knee optical device is a precision component, during semiconductor processing, it is commonly used to transfer images from a trapped reticle onto a semiconductor wafer. 一种典型的瀑光装置包括:一照明源; 一分划板台组件,用于保持着一分划板; 一光学组件; 一晶片台组件,用于保持着半导体晶片; 一测量系统; 一控制系统。 A typical waterfall optical apparatus comprising: an illumination source; a reticle stage assembly for holding a reticle with; an optical assembly; a wafer stage assembly for holding a semiconductor wafer; a measuring system; a Control System. 涂敷有抗蚀剂的晶片被放置在从一形成图案的掩膜发射的辐射路径中,并且被这种辐射曝光。 A resist coated wafer is placed in the path of a patterned mask the emitted radiation, and such radiation is exposed. 当抗蚀剂被显影时,掩膜图案被转移到晶片上。 When the resist is developed, the mask pattern is transferred onto the wafer. 在显微镜方法中,超紫外线(EUV)辐射通过一薄的样本而被传递到一个涂敷有抗蚀剂的板上。 In microscopy, the extreme ultraviolet (EUV) radiation is transmitted to a resist-coated substrate by a thin samples. 当抗蚀剂被显影时,就留下与样本结构相关的剖析形状。 When the resist is developed, leaving the shape of the correlation analysis of the sample structure.

浸没光刻是这样一种技术,它可以利用数值孔径大于l地进行膝光,从而能提高投射光刻的分辨率,这种分辨率要大于传统的"干式" 系统的分辨率的理论最大值。 Theoretical immersion lithography is a technique that is greater than the numerical aperture can be performed knee l light, thereby improving the resolution of projection lithography, the resolution is greater than the resolution of the conventional "dry" system maximum value. 通过对最终光学元件和涂敷有抗蚀剂的目标(即,晶片)之间的空间进行填充,浸没光刻就可以利用那些如果用其它方式就会在光-空气分界面处被在内部全部反射的光线进行咏光。 By certain of the resist coating and the final optical element (i.e., a wafer) to fill the space between the immersion lithography can use that if the light would otherwise - is inside the air all at the interface Wing light is reflected light. 采用与浸没流体(或抗蚀刑或透镜材料,最少的那一个)的折 Using the immersion fluid (or sentence or a lens resist material, that a minimum) folding

射率(index) —样髙的数值孔径是可以的。 Reflectance (index) - the numerical aperture Gao like are possible. 与具有相同数值孔径的干式系统相比,通过浸没流体的折射率,流体浸没还增大了晶片的焦点深度,即在晶片的竖直位置的可容忍误差.因此,浸没光刻能提高分辨率,能从248nm转变为193nm。 Compared with dry systems having the same numerical aperture, by the refractive index of the immersion fluid, the fluid also increases the depth of focus of the immersion of the wafer, i.e., the tolerable error in a vertical position of the wafer. Thus, immersion lithography can improve the resolution of rate, the transition from 248nm to 193nm. 然而,不象瀑光波长中的转变,采用浸没方式就无需研发新的光源、光学材料或涂敷层,并且允许在相同的波长采用与传统的光刻相同或相似的抗蚀剂.在只有最终光学元件和它的支座和晶片(以及可能还有支撑台)与浸没流体相接触的浸没系统中,在诸如污染控制的领域中已经为传统的工具研制了许多技术和设计,直接应用到浸没光刻。 However, unlike the optical wavelength conversion waterfall, without the need to use immersion way to develop a new light source, optical material, or coating layer, and allows the use of identical or similar conventional lithographic resist at the same wavelength. Only in final optical element and its support and the wafer (and possibly also the supporting table) immersion system in contact with the immersion fluid, such as in the field of pollution control in many techniques have been developed and designed as a conventional tool, applied directly to the immersion lithography.

浸没光刻的一个难题在于设计一个用于在最终光学元件和晶片之间输送和回收诸如水的流体的系统,以便为浸没光刻提供一个稳定的条件。 Immersion lithography a problem is to design a system for transporting and recovering fluids such as water between the final optical element and the wafer, so as to provide a stable condition for immersion lithography.

发明内容 SUMMARY

本发明的实施例是针对控制流体流量和压力以便为漫没光刻提供稳定条件的系统和方法。 Embodiments of the present invention is directed to control fluid flow and pressure to provide a stable condition not diffuse lithography system and method. 在浸没光刻过程期间,向透镜和基片之间的一空间提供一流体。 During the immersion lithography process, providing a fluid to a space between the lens and the substrate. 流体被供给到所说空间,并通过一个与所说空间流体连通的一个多孔元件从所i兌空间回收流体。 A porous element fluid is supplied to said space, and in communication with said space through a fluid recovered from the fluid space against i. 4巴多孔元件中的压力保持在多孔元件的起泡点以下,就能消除在流体回收期间由空气与流体相混合所产生的噪音。 A pressure of 4 bar at the porous element is kept below the bubble point of the porous element can eliminate noise generated during the mixing fluid recovery phase consists of air and fluid. 起泡点是多孔元件的一个特征,它取决于多孔元件中的孔(最大孔)的尺寸大小以及流体与多孔元件所形成的接触角(它是基于多孔材料特性和流体特性的一个参数)。 The bubble point is a feature of the porous element, it depends on the size and the contact angle of the fluid with the porous element is formed in the pores of the porous element (largest pores) (which is based on a characteristic parameter of a porous material and fluid properties). 由于起泡点通常是一个非常低的压力,因此,这种低压的控制就成为一个重要的问题。 Since the bubble point is usually a very low pressure, so this low pressure control has become an important issue.

本发明的一个方面是针对一种在浸没光刻系统中从一透镜和一基片之间的一个空间回收流体的方法。 One aspect of the invention is directed to a method in an immersion lithography system for recovering fluid from a space between a substrate and a lens. 该方法包括:通过一个多孔元件经由一条回收流线路从所说空间抽吸流体;在从所说空间吸取流体期间,把多孔元件中的压力保持在多孔元件的起泡点以下。 The method comprising: drawing the fluid from the space via a porous member via a recovery flow line; during draw fluid from said space, the pressure in the porous element is kept at below the bubble point of the porous member.

在某些实施例中,保持压力的步骤包括:提供一个被保持在一预定压力的溢流容器;把通过多孔元件经由回收流线路从所说空间回收的流体引导到溢流容器内.保持压力的步躁还包括:把流体从溢流容器虹吸到一收集箱内。 In certain embodiments, the step of maintaining the pressure comprises: providing an overflow container is maintained at a predetermined pressure; guided via the recovery flow line from said recovered fluid through a porous spatial element within the overflow container holding pressure. impatient step further comprising: a fluid siphoning from the overflow container to a collecting tank. 流体在重力作用下被向下虹吸到设置在溢流容器下面的收集箱内.在另外一些实施例中,保持压力的步骤包括:提供一流体液位緩冲件;通过多孔元件经由一緩冲流线路把流体从所说空间吸到流体液位緩冲件;感测流体液位緩沖件处的压力或流体液位; 根据所感测到的流体液位緩沖件处的压力或流体液位,对通过多孔元件经由回收流线路从所说空间吸取的流体进行控制。 The fluid is siphoned under gravity downwardly into the collection box disposed below the overflow container in some other embodiments, the step of maintaining the pressure comprises: providing a body fluid class bit buffer; through the porous member via a buffer a fluid flow line from said buffer space sucked fluid level; fluid level sensing pressure or fluid level of the buffer member; according to the sensed pressure or fluid level detected at the element level of the buffer fluid, for controlling the fluid sucked from the space through the porous member via the recovery flow line. 控制流体流的步骤包括:控制一个被设置在回收流线路中位于多孔元件下游的可变阀。 The step of controlling fluid flow comprising: controlling a variable valve is provided located downstream of the porous element in the recovery flow line. 在另外一些实施中,保持压力的步骤包括:提供一流体液位緩冲件; 通过多孔元件经由一緩沖流线路把流体从所说空间抽吸到流体液位緩沖件;感测流体液位緩冲件处的压力或流体液位;根据所感测到的流体液位緩沖件处的压力或流体液位,控制通过多孔元件的回收流线路出口处的真空压力。 In other embodiments, the step of maintaining the pressure comprises: providing a bit body fluids class buffer; the buffer fluid into the fluid level through the porous member via a buffer element from the space flow lines; fluid level sensing buffer pressure or fluid level at the punch member; according to the pressure or fluid level detected fluid level sensed at the buffer, by controlling the vacuum pressure recovery at the outlet of the flow line of the porous member. 控制真空压力的步骤包括:控制回收流线路出口处的一收集箱中的一真空调节器。 The step of controlling the vacuum pressure comprising: controlling a collection tank recovered at the outlet of the flow lines a vacuum regulator.

根据本发明的另一个方面,提供了一种在一浸没光刻系统中用于从一透镜和一基片之间的一空间回收流体的装置,该装置包括: 一内部件,该内部件具有一透镜开口,以便容纳透镜的一部分,并且把透镜设置成与基片分离开,使其被所说空间间隔开,以便在透镜和基片之间的空间中接收流体。 According to another aspect of the invention, there is provided an apparatus for recovering fluid from a space between a substrate and a lens for an immersion lithography system, the apparatus comprising: an inner member, the inner member having a lens opening for receiving a portion of the lens, and the lens is arranged to be separated from the substrate, said space so as to be spaced apart so as to receive a fluid in the space between the lens and the base sheet. 一外部件被设置在内部件周围,该外部件具有一多孔元件,该多孔元件与所说空间以及一流体回收出口流体连通, 以便经由多孔元件把流体从所说空间抽吸到流体回收出口。 An outer member is provided around the inner member, the outer member having a porous element, the porous element to said space and an outlet in fluid communication with the fluid recovery so as to draw fluid from said fluid recovery to the outlet space via the porous element . 一压力控制系统与多孔元件流体连通,以便在经由多孔元件从所说空间抽吸流体期间,把多孔元件的表面处的压力保持在多孔元件的起泡点以下。 A pressure control system in fluid communication with the porous element, so that during the suction of fluid from the space via the porous element, the pressure at the surface of the porous element is kept at below the bubble point of the porous member.

在一些实施例中,压力控制系统包括: 一溢流容器,该溢流容器与多孔元件流体连通; 一真空调节器,用于调节溢流容器中的压力。 In some embodiments, the pressure control system comprising: an overflow vessel, the overflow container in fluid communication with the porous member; a vacuum regulator for regulating the pressure of the overflow vessel. 一收集箱与溢流容器流体连通,并且位于该溢流容器的下方。 A fluid overflow collection tank communicates with the container, and located below the overflow vessel. 在另一些实施例中,压力控制系统包括: 一流体液位緩沖件,该流体液位緩 In other embodiments, the pressure control system comprising: a bit body fluid cushion member class, slow the fluid level

冲件与多孔元件流体连通; 一传感器,用于感测流体液位緩沖件处的压力或流体液位; 一控制器,用于根据传感器感测到的传感器信号, 调节通过流体回收出口从所说空间抽吸的流体的流量,在经过多孔元件从所说空间抽吸流体期间,以便把多孔元件的表面处的压力保持在多孔元件的起泡点以下.压力控制系统包括一阀,该阀被设置在流体回收出口的下游,并且控制器被用于控制该阀,以便调节通过流体回收出口从所说空间抽吸的流体的流量。 Pieces in fluid communication with the porous member; a sensor for sensing pressure or fluid level at the fluid level buffer; a controller, a sensor according to the measured signal sensor senses, by adjusting the fluid recovery from the outlet pumping said fluid flow space, through the porous element during draw fluid from said space to the pressure at the surface of the porous element is maintained at below the bubble point of the porous member. the pressure control system comprises a valve that fluid recovery is provided downstream of the outlet, and the controller is for controlling the valve to adjust the flow rate sucked from the space through the fluid outlet of the fluid recovery. 在另外一些实施例中,压力控制系统包括: 一收集箱,该收集箱与流体回收出口流体连通; 一可控真空调节器,用于调节收集箱中的压力。 In other embodiments, the pressure control system comprising: a collection tank, the collection tank and an outlet in fluid communication with the fluid recovery; a controllable vacuum regulator for regulating the pressure in the collection tank. 控制器被用于控制可控真空调节器,以便通过控制收集箱中的压力来调节通过流体回收出口从所说空间抽吸到收集箱的流体的流量。 The controller is used to control a controllable vacuum regulator in order to regulate the flow of fluid recovered by the suction outlet from the space to the collecting tank by controlling the pressure of the fluid in the collection tank.

在一些特定的实施例中,内部件与外部件间隔开一中间间隔。 In some particular embodiments, the inner member and the outer member is spaced apart from an intermediate spacing. 内部件包括一内部腔室,该内部腔室形成透镜和基片之间的间隔的一部分,并且,内部件具有一些孔,这些孔被设置在内部腔室的上方,以便实现把流体引入到内部腔室内和把流体从内部腔室抽吸出中的至少一种功能,内部件具有一些孔,这些孔被设置在透镜开口的对置侧, 以便把流体引入到内部腔室。 Inner member comprises an inner chamber, the inner chamber forms a portion of the interval between the lens and the substrate, and the inner member having a number of apertures are provided above the inside of the chamber, in order to achieve a fluid introduced into the interior the chamber and the fluid from the interior chamber of the at least one function, the inner member having a number of apertures are disposed on opposite sides of the lens opening, so that the fluid is introduced into the internal chamber. 内部件包括一对緩沖槽,这对緩冲槽沿着浸没光刻系统的扫描方向被设置在透镜开口的对置侧。 Inner member includes a pair of buffer tank, the buffer tank which is disposed on opposite sides of the scanning direction of the lens opening of the immersion lithography system. 内部件具有一些清洗孔,并且,所说的这对緩冲槽中的每个緩冲槽与至少一个清洗孔流体连通。 Some cleaning member having an internal bore, and said pair of each of the buffer tank in the buffer tank in communication with at least one cleaning fluid orifice. 多孔元件选自由网、多孔材料、其内具有蚀刻孔的元件所构成的组。 Member selected from the group consisting of porous mesh, a porous material, having an inner set of elements composed of etched holes.

根据本发明的另外一个方面,提供了一种装置,该装置包括:一光学投射系统,该光学投射系统具有一最终光学元件,该光学投射系统用于把一图像投射到一工件上; 一台,当困像被投射到工件上时, 该台用于支撑着光学投射系统附近的工件。 According to another aspect of the present invention, there is provided an apparatus, the apparatus comprising: a projection optical system, the optical projection system having a final optical element, the optical projection system used to project an image onto a workpiece; a when the projected image is stuck onto the workpiece, the table for supporting the workpiece near the projection optical system. 在最终光学元件和工件之间设置一间隔,该间隔被用于充填一浸没流体。 A spacer disposed between the final optical element and the workpiece, the spacer is used to fill an immersion fluid. 一多孔材料被设置成邻近所说间隔,用于回收从所说间隔流出的流体。 A porous material is disposed adjacent said spacer, said spacer for flowing the fluid from the recovery. 一控制系统被用于保持多孔材料上的压力„该压力等于或小于多孔材料的起泡点。 A control system is used to maintain pressure on the porous material, "the bubble point pressure is equal to or less porous material.

附图说明 BRIEF DESCRIPTION

图l是根据本发明实施例的浸没光刻的简化平面示意图; Figure l is a simplified schematic plan view of an embodiment of the immersion lithography according to the present invention;

困2是根据本发明一个实施例的在浸没光刻中用于流体输送和回收的一喷嘴的立体图; 2 is a perspective view of a trapped fluid delivery nozzle and recovered in immersion lithography according to an embodiment of the present invention is used;

图3是困2中的喷嘴的简化剖面图; FIG 3 is a simplified cross-sectional view of the nozzle trapped in 2;

图4是图2中的喷嘴的内部件的剖面图; FIG 4 is a sectional view of the nozzle of the inner member of Figure 2;

困5是根据另一个实施例的喷嘴的简化剖面困; 5 is a simplified trapped trapped sectional view of another embodiment of a nozzle;

图6是4艮据本发明一个实施例在浸没光刻系统中用于流体回收的压力控制系统的简化示意图; FIG 6 is a Gen 4 embodiment according to the present invention, a simplified schematic diagram of a fluid pressure in accordance recovered in an immersion lithography system control system;

图7是根据本发明另一个实施例在漫没光刻系统中用于流体回收的压力控制系统的简化示意图; FIG 7 is another embodiment of the present invention, a simplified schematic diagram of a pressure fluid recovery lithography system for controlling the system did not diffuse;

图8是根据本发明另一个实施例在漫没光刻系统中用于流体回收的压力控制系统的简化示意困; Figure 8 is another embodiment of the invention in a simplified diffusely not recovered fluid pressure control system for a lithography system schematic trapped;

图9是根据本发明另一个实施例在带有防止水停滞功能的浸没光刻系统中用于流体回收的压力控制系统的简化示意图。 FIG 9 is a pressure for the fluid recovered in Example immersion lithography system with a function to prevent stagnation of water in a simplified schematic diagram of a control system according to another embodiment of the present invention.

具体实施方式 Detailed ways

图l表示出了一个浸没光刻系统10,它包括: 一分划板台12,在该分划板台上支撑有一分划板; 一投射透镜14; 一晶片16,该晶片被支撑在一晶片台18上》在投射透镜14的最终光学元件22的周围设置有一浸没装置20,以便在最终光学元件22和晶片16之间提供和回收流体,所说流体可以是诸如水或气体的流体,所说的浸没装置20有时也被称作喷头或喷嘴.在本实施例的浸没光刻系统10中,在扫描瀑光期间,分划板和晶片16在各自的扫描方向上被同步移动。 Figure l shows an immersion lithography system 10, comprising: a reticle stage 12, the reticle stage supports a reticle; a projection lens 14; 16 a wafer, the wafer is supported in a the wafer stage 18 'of the projection lens 14 of the final optical element 22 is provided around a submerged device 20, so that the fluid supply and recovery, said fluid may be a fluid such as water or gas in between the final optical element 22 and the wafer 16, immersion of said device 20 is sometimes called a nozzle or spray head 10, during the scanning light falls, the reticle and the wafer 16 is moved on the respective synchronized scanning direction in an immersion lithography system according to the present embodiment.

图2和图3表示出了在浸没光刻中用于在最终光学元件22和晶片16之间输送和回收流体的装置或喷嘴20。 Figures 2 and 3 shows an apparatus or nozzle 20 for immersion lithography fluid between the delivery and recovery of the final optical element 22 and the wafer 16. 图2表示出了喷嘴20的底视立体图,该喷嘴20包括一外部件30和一内部件32。 Figure 2 shows a perspective view of a bottom nozzle 20, the nozzle 20 includes an outer member 30 and an inner member 32. 内部件32形成一内部腔室34,以便在最终元件22和晶片16之间接收流体。 Inner member 32 inside a chamber 34 formed so as to receive fluid between the final element 22 and the wafer 16. 内部件32具有一些孔38,以便流体流入和流出内部腔室34。 Inner member 32 having a number of holes 38, so that the inside fluid into and out of the chamber 34. 如图2所示, 在最终光学元件22的两侧都设置有一些孔38。 2, on both sides of the final optical element 22 are provided with holes 38. 内部件32具有一个环绕着内部腔室34的平坦部33。 Inner member 32 has an internal chamber surrounding the flat portion of 33 34. 该平坦部33基本上平行于晶片16。 The flat portion 33 is substantially parallel to the wafer 16. 聂终光学元件22和晶片16的端面之间的距离Dl要大于平坦部33和晶片16之间的距离D2。 Nie distance Dl between the final optical element and the end face 22 of the wafer 16 is larger than the distance D2 between the flat portion 33 and the wafer 16. 距离Dl可以为1.0-5.0mm,距离D2可以为0.5-2.0mm。 Distance Dl may be 1.0-5.0mm, distance D2 may be 0.5-2.0mm. 在另一个实施例中,距离Dl基本上等于距离D2。 In another embodiment, the distance Dl is substantially equal to the distance D2. 内部件32还包括一对带有清洗孔42的緩沖件或緩冲槽40。 Inner member 32 further includes a pair of buffer member or buffer tank 40 with the cleaning hole 42. 緩冲件40被设置在平坦部33处或附近,緩冲件40位于最终光学元件22的对置侧。 Cushioning member 40 is disposed at or near the flat portion 33, 40 located on opposite sides of the final optical element of the cushioning member 22. 图4表示出了内部件32沿扫描方向44的剖面图。 Figure 4 shows a cross-sectional view taken along the scanning direction 32 of the inner member 44.

通过一中间间隔或槽48把外部件30与内部件32间隔开,所说的中间间隔或槽48可被称作大气槽。 By an intermediate space or groove 48 and the inner member 30 outer member 32 is spaced apart from said intermediate spacer 48 may be referred to as grooves or slots atmosphere. 外部件30包括一个或多个流体回收孔50,这些流体回收孔50被设置在最终光学元件22的对置侧。 The outer member 30 includes one or more fluid recovery holes 50, the fluid recovery holes 50 are provided on opposite sides 22 of the final optical element. 一个多孔元件51被设置在一槽或外部腔室53内,该槽或外部腔室53 在内部件32周围延伸并且与这对流体回收孔50流体连通。 A porous member 51 is disposed within a groove or the outer chamber 53, and the groove 32 extends around the outer or inner member chamber 53 which communicates with the fluid apertures 50 for fluid recovery. 多孔元件51可以是一网,也可以由具有孔的多孔材料制成,孔的尺寸大小通常约在50-200微米的范围内。 The porous member 51 may be a network, may also be made of a porous material having pores, pores size is typically in the range of about 50-200 microns. 例如,多孔元件51可以是丝网,该丝网包括由金属、塑料或类似制成的编织条或层状材料,多孔金属,多孔玻璃,多孔塑料,多孔陶瓷,或具有以化学方式蚀刻(例如通过光刻) 的孔的片材,外部件30还包括一流体緩沖出口56和一流体回收出口58。 For example, the porous member 51 may be a screen, which screen comprises a metal, plastic or the like made of a braided strip or sheet material, porous metal, porous glass, porous plastics, porous ceramics, or having chemically etched (e.g. through the sheet, the outer member bore photolithography) of the buffer 30 further includes a fluid outlet 56 and a fluid recovery outlet 58. 如图5所示,在喷嘴20,的另一个实施例中,内部件32不与最终光学元件22接触,也不与最终光学元件22形成一密封,而是与最终光学元件22间隔开。 5, the embodiment 32 is not in contact with the final optical element 22 inside the nozzle member 20 in another, embodiment, does not form a seal with the final optical element 22, but the final optical element 22 spaced apart. 然而,该间隔可允许流体被暴露于空气。 However, this interval may allow fluid to be exposed to air.

喷嘴20的一个特征在于它被制成两件式,即外部件30和内部件32。 Characterized in that a nozzle 20 which is of a two-part, i.e., the outer member 30 and inner member 32. 内部件32把流体保持在透镜和晶片表面之间,外部件30主要用于流体回收。 Inner fluid retaining member 32 between the lens and the wafer surface, the outer member 30 is mainly used for fluid recovery. 在流体回收期间,振动可从外部件30通过多孔元件51 被传递到光刻系统的其它部件,包括内部件32,该内部件32可被用于把一自动聚焦光束引导到晶片16。 During fluid recovery, the vibration member 3051 is externally transmitted through the porous element to the other components of the lithography system, comprising an inner member 32, the inner member 32 may be used to autofocus beam to a wafer 16. 在外部件30和其上安装有外部件30的安装件之间可安装一减振材料,以l更减小从外部件30传递的振动。 And the outer member 30 on which is mounted a damping material may be mounted between the mounting member 30 of the outer member, in order to further reduce the vibrations l transmitted from the outer member 30. 此外,具有多孔元件的外部件30易于被污染,因此需要对其进行更换维护。 Further, the outer member having a porous element 30 is easily contaminated, thus requiring replacement thereof maintained. 把外部件30做成一个单独部件,有利于使维护更容易。 The outer member 30 made of a single member, is conducive to making the maintenance easier.

与更换整个喷嘴20相反,这还可以减小更换外部件之后的重新调节和 In contrast to replacing the entire nozzle 20, which may further reduce the readjusted after being replaced and the outer member

重新校准时间。 Re-calibration time. 如果喷嘴20被制造成两个单独部件,那么还可以改善 If the nozzle 20 is manufactured as two separate components, it can also improve

喷嘴20的可制造性。 Manufacturability of the nozzle 20. 应当知道,在一些可选实施例中,喷嘴20可以由一个单一件制成。 It is appreciated that, in some alternative embodiments, the nozzle 20 may be made of a single one.

喷嘴20的另一个特征在于内部件32和外部件30之间的大气槽48。 Another feature of the nozzle 20 lies between the atmospheric groove 30 and the inner member 32 outer member 48. 这条大气槽48用作一隔断边缘,如果流体回收速率快于流体供给速率,那么,该隔断边缘就阻止内部件30中的流体被外部件30上的多孔元件51吸出。 This air slot 48 is used as a cut off edge, the fluid recovery rate is faster than if the fluid supply rate, then the edge of the blocking member 30 prevents the interior of the fluid is sucked out of the porous element 51 on the outer member 30. 在没有隔断边缘的情况下,必须要保持流体回收速率和流体供给速率之间的平衡,以便在扫描期间流体能被一直保持在内部件32内。 In the case where no edge of the partition, must maintain a balance between the fluid recovery rate and the fluid supply rate, so that the fluid can be held within the inner member 32 it has been during the scan. 设置有这种大气槽48,就可以把回收速率设置在最大值,以便在扫描期间使流体漏出外部件30减到最少。 This atmosphere is provided with a groove 48, the recovery rate can be provided at the maximum, so that the leakage of the fluid to minimize the outer member 30 during scanning. 大气槽48还用作一緩沖件,以便在扫描期间流体流入和流出,从而使对水供给和回收的要求减到最小。 Atmosphere groove 48 also serves as a cushioning member, such that fluid flow into and out during the scan, so that the requirements for the water supply and recovery is minimized.

在浸没光刻的过程中,从一干燥状态,把一流体填充到投射透镜14和晶片16之间,在其它时间,对流体进行回收。 In the immersion lithography process, from a dry state, a fluid is filled between the projection lens 14 and the wafer 16, at other times, the fluid is recovered. 例如,在一新的晶片开始膝光时,在开始瀑光之前把流体完全充满内部件32的内部腔室34。 For example, when a new wafer knee light begins, before starting to light it falls completely filled with fluid chamber 34 inside the inner member 32. 在这个过程期间,理想地是,在投射透镜14和晶片16或其它光学路径例如自动聚焦光束之间没有气泡存在。 During this process, ideally, in the other optical path 16 or the projection lens 14 and the wafer, for example, no air bubbles present between the autofocusing light beam. 内部件32的内部腔室中的流体供给被设置在该腔室中的最高点(通过孔38),从而使流体从上向下进行填充,这样就可以在填充过程期间把气泡驱逐出内部腔室。 The highest point of the fluid supply chamber inside the inner member 32 is disposed in the chamber (through holes 38), so that the fluid filled from top to bottom, so that you can during the filling process air bubbles expelled from the interior cavity room. 在这个实施例中(这组孔38位于一侧),流体被理想地从一侧开始供给,从而流体从一侧被填充到另一侧,这样就又可以把气泡逐出, 以便避免夹杂一些空气。 In this embodiment (the set of apertures 38 on one side), fluid is supplied from the side over the start, so that the fluid is filled from side to side, so that they can be expelled from the bubble, in order to avoid some of the inclusions air. 也可以釆用其它的结构布置,只要流体从内侧向外填充即可。 And also can be arranged with other structures, as long as the fluid can be filled from the inside outward.

有时,必须从内部件32的内部腔室完全回收流体。 Sometimes, the fluid must be fully recovered from the internal chamber 32 of the inner member. 在图4中,在内部件32的每个緩冲件40中具有小孔42。 In FIG. 4, each of the buffer member 32 of the inner member 40 having apertures 42. 当流体必须被完全回收时, 这些孔42用于快速地进行流体回收或流体清洗。 When fluid must be completely recovered, the holes 42 for rapidly recovering fluid or cleaning fluid. 利用高真空,结合晶片台18中的少许移动,把流体从这些孔42吸出,这就使得可以在一合理时间回收全部流体。 With high vacuum, with little movement of the wafer stage 18, the fluid is sucked out of the hole 42, which makes all of the fluid can be recovered in a reasonable time.

内部件32具有两组或两排孔38,用于供给或回收流体。 Two or inner member 32 having two rows of holes 38, for supplying or recovering the fluid. 每排孔都能被独立地控制使其进行供给或回收流体。 Each row of holes can be independently controlled to supply or recover the fluid. 在两排孔都被选择用于供给流体的情况下,所有的流体都通过外部件30中的多孔元件51被回收。 In the two rows of holes have been selected for fluid supply, all of the fluid 51 are recovered through the outer member 30 is a porous member. 由于两排孔都被用于供给流体,因此,在内部腔室中的压力会增大,从而造成投射透镜14的最终光学元件22或晶片16或两者都产生变形。 Since the two rows of holes are used to supply the fluid, and therefore, the pressure inside the chamber increases, causing the projection lens 22 or the wafer 16 or both the final optical element 14 are deformed. 此外,橫贯最终光学元件22的流体也会被限制,从而最终使得最终光学元件22和晶片16之间的温度升高,造成不良的影响。 Further, the fluid traverses the final optical element 22 will also be restricted, so that the final temperature of the final optical element 22 between the raised and the wafer 16, resulting in adverse effects. 另一方面,如果一排孔被选择用于供给流体,而另一排孔被选择用于回收流体,那么,流体流就将横贯最终光学元件22被驱动,这样就使温度升高量减到最小。 On the other hand, if a row of holes is selected for supplying the fluid, and the other row of holes is selected for recovering the fluid, then the fluid flow will traverse the final optical element 22 is driven, thus raising the temperature to minus a minimum. 此外,与从两排孔来供给流体时所产生的压力相比,这种方式还能减小压力。 Furthermore, compared to the pressure from the two rows of holes is supplied to the produced fluids, this method can also reduce the pressure. 在这种情况中,减小了需要通过多孔元件51来回收的流体,从而减弱了多孔元件的回收要求。 In this case, by reducing the need for porous element 51 recovered fluid, thus weakening the recycling requirements of the porous element. 在另外的喷嘴结构中,可以采用多重流体供给和回收,以便使性能优化。 In a further nozzle structure may be employed multiple fluid supply and recovery, so as to optimize performance.

在晶片台18的扫描移动期间(沿着图2中的扫描方向44),流体可以被拖入和拖出内部件32的内部腔室。 During the scanning movement of the wafer stage 18 (along the scan direction 44 in FIG. 2), may be a fluid into and out of the interior chamber 32 of the inner member. 当流体被拖出时,流体就通过外部件30中的多孔元件51被回收。 When the fluid is dragged out, is recovered by the fluid 51 on the outer member 30 is a porous member. 当晶片台18沿着相反方向移动时,空气可以被拖入到内部件32的内部腔室34内。 When the wafer stage 18 moves in the opposite direction, the air can be sucked into the internal chamber 32 of the inner member 34. 在这期间,緩冲件40中的流体以及从内部腔室34所供给的流体帮助再填充沿着扫描方向被拖动的流体,从而阻止空气进入内部腔室内。 During this period, the buffer member 40 and helping the fluid supplied from the fluid 34 inside the refill chamber is dragged along the scan direction of the fluid, thereby preventing air from entering the interior cavity. 緩冲件40和多孔元件51 —起作用,以便在晶片台18的扫描移动期间,使从外部件30 泄漏出的流体以及拖入到内部件32内的空气减到最少。 Cushioning member 40 and the porous element 51-- function, so that during the scanning movement of the wafer stage 18, so that leaking from the outer member 30 and the fluid sucked into the air in the inner member 32 is reduced to a minimum.

在把多孔元件51中的压力保持在起泡点以下的情况下来通过多孔元件51回收流体,就能消除在流体回收期间由空气和流体的混合所产生的噪音。 When the pressure in the porous element 51 is maintained at below the bubble point of the porous member 51 down through a fluid recovery can eliminate noise generated during the fluid recovery by the mixing of air and fluid. 起泡点是多孔元件51的一个特征,它取决于多孔元件51中的孔(最大孔)的尺寸大小以及流体与多孔元件51所形成的接触角(它是基于多孔材料特性和流体特性的一个参数)。 The bubble point is a feature of the porous element 51, depending on the size of pores of the porous member 51 (maximum aperture) and the contact angle of the fluid with the porous element 51 is formed (which is based porous material properties and fluid properties of a parameter). 由于起泡点通常是一个非常低的压力(例如,大约1000帕斯卡),因此,这种低压的控制就成为一个重要的问题。 Since the bubble point is usually a very low pressure (e.g., about 1000 Pascal), and therefore, such a low-voltage control becomes an important issue. 图6 - 7表示出了在流体回收期间把压力保持在起泡点以下的两种具体方式。 Figure 6 - 7 shows two specific ways during the recovery of the fluid is maintained at a pressure below the bubble point.

在图6的压力控制系统100中,利用一真空调节器102,并借助于一个通过一回收流线路106(该回收流线路与流体緩冲出口57相连) 与多孔元件51流体连通的溢流容器或箱104,在多孔元件51的表面处保持一个在起泡点以下的压力。 In the pressure control system 100 of FIG. 6, the use of a vacuum regulator 102, and a recovery flow by means of a line 106 (the recovery flow line and a fluid outlet connected to the buffer 57) the overflow vessel 51 in fluid communication with the porous element or box 104, maintained at a point below the bubble pressure at the surface of the porous element 51. 多孔元件51的表面处的压力等于由真空调节器102保持的压力减去由多孔元件51上方的流体高度所产生的压力。 The pressure at the surface of the porous element 51 is equal to the pressure regulator 102 is held by the vacuum pressure generated by subtracting the height of the fluid above the porous element 51 produced. 利用溢流箱104来多孔元件51上方的流体的恒定高度,就可以容易地控制多孔元件51的表面处的压力。 Constant height above the overflow tank 104 to the porous element 51 of the fluid can be easily pressure control porous member 51 at the surface. 那些通过多孔元件51被回收的流体将溢出,并且沿着虹吸线路108被向下吸到一个被设置在溢流箱104下面的收集箱110内。 Those fluids through the porous element 51 overflows to be recovered, and 108 is downwardly disposed within a sucked below the overflow tank 104 collection tank 110 along line siphon. 一条可选的流通路径112被连接在溢流箱104和收集箱110之间,以^更帮助平衡溢流箱104和收集箱110 之间的压力,从而有利于流体沿着虹吸线路108流动。 An alternative flow path 112 is connected between the collection tank 104 and the overflow tank 110 to a more ^ help equalize the pressure between the overflow tank 104 collection tank 110 and to facilitate flow of fluid along line 108 siphon. 这种压力控制系统100的一个特征在于它是一个被动系统(passive system),无需控制。 Such a pressure control system 100 is characterized in that it is a passive system (passive system), without control.

在图7所示的压力控制系统120中,在流体液位緩冲件124处利用一真空调节器122来把多孔元件51的表面处的压力保持在起泡点以下,其中的流体液位緩冲件124通过一緩沖流线路126 (该緩冲流线路与流体緩冲出口56相连)与多孔元件51流体连通。 In the pressure control system 120 shown in FIG. 7, the fluid level in the buffer 124 by means of a regulator member 122 to the vacuum pressure at the surface of the porous member 51 is kept in the bubble point, which slow the fluid level punching member 124 by a stream buffer circuit 126 (the buffer flow line 56 is connected to the fluid outlet buffer) 51 in fluid communication with the porous element. 利用一压力变换器或一水位传感器128来测量流体液位緩冲件124处的压力或流体液位(fluid level )。 Using a pressure transducer or a fluid level sensor 128 to measure the fluid level or pressure level of the buffer 124 at the (fluid level). 然后把传感器信号用于反馈控制130,把传感器信号反馈到一阀132,该岡132被设置在(与流体回收出口58相连的) 一回收流线路134中,该回收流线路134被连接在多孔元件51和一收集箱136之间。 The sensor signal is then used for feedback control 130, the sensor signal is fed to a valve 132, 132 is provided at the Oka (connected to the outlet 58 of the fluid recovery) a recovery flow line 134, the recovery flow line 134 is connected to the porous and a member 51 between the collection tank 136. 阀132可采用任何适合的阀,例如比例阀或可变岡。 Valve 132 can be any suitable valve such as a proportional valve or a variable Gang. 可变阀132可被调节,以便控制通过流体回收线路134流向收集箱136 的流体流,从而把流体液位緩冲件124的压力或流体液位保持在一个预定值。 The variable valve 132 may be adjusted to control the flow through the fluid collection tank 134 of fluid flow recovery line 136, so that the fluid level in the buffer 124 at a pressure to maintain a fluid level or a predetermined value. 收集箱136处于一个受一高真空调节器138控制的相对较高的真空下,以便进行流体回收。 Collection tank 136 is at a relatively high vacuum by a high vacuum regulator 138 controls, for fluid recovery. 在这种流体控制系统120中,无需溢流箱,并且收集箱136可以被设置在该系统中的任何地方,无需被设置在溢流箱下面。 In such a fluid control system 120, without the overflow tank, and collection tank 136 may be provided anywhere in the system, and need not be disposed below the overflow tank. 理想地是,在流体回收线路134中设置一开/关阀140,当不需要流体回收时,就把该开/关阀140关闭。 Ideally, provided with a on / off valve 140 in the fluid recovery circuit 134, when no fluid recovery, which put on / off valve 140 is closed.

在图8中,压力控制系统160类似于图7所示的系统120,并且相同的附图标记表示相同的部件。 In FIG. 8, the pressure control system 160 is similar to system 120 shown in FIG. 7, and like reference numerals refer to like parts. 这个系统160不采用阀132来对流体回收进行反馈控制,而是采用一可控制真空调节器162来对流体回收进行反馈控制。 This system does not use valves 132 to 160 for feedback control of fluid recovery, instead of using a vacuum regulator 162 may be controlled to perform feedback control of the fluid recovery. 真空调节器162典型的是可电子控制的,以便根据来自压力变换器或水位传感器128的传感器信号来调节收集箱136中的真空压力。 A typical vacuum regulator 162 is electronically controlled, so as to regulate the pressure in the vacuum collection tank 136 in accordance with a sensor signal from the pressure transducer or sensor 128 of the water level. 真空调节器162可被调节,以便控制通过流体回收线路134流到收集箱136的流体流,从而把压力或流体液位緩沖件124的流体液位保持在一预定值。 The vacuum regulator 162 may be adjusted to control the flow of fluid collection tank 136 flows through the fluid recovery line 134, so that the pressure of the fluid level or fluid level cushioning member 124 is maintained at a predetermined value. 当不需要回收流体时,就关闭流体回收线路134中的开/关阀140。 When no fluid recovery, recycle line 134 is closed in a fluid on / off valve 140.

图9表示出了根据本发明另外一实施例的一种在浸没光刻系统中用于回收流体的压力控制系统180,这种压力控制系统能防止水发生停滞。 Figure 9 shows another embodiment for recovering one kind of pressure fluid in an immersion lithography system 180 according to an embodiment of the control system of the present invention, such a pressure control system capable of preventing the occurrence of stagnant water. 这种压力控制系统180与图7中的系统120相类似,并且相同的部件采用相同的附图标记来表示。 System 180 in FIG. 7 which is similar to the pressure control system 120, and like parts are designated by the same reference numerals. 此外,流体液位緩冲件124与水供给或水回收器182流体连通,以便向流体液位緩冲件124供给水或从流体液位緩沖件124回收水,从而防止水停滞。 Further, the fluid level 182 of fluid cushioning member 124 with the water supply or the water recovery unit in communication to the fluid level to the buffer member or a buffer member 124 for supplying water recovered water 124, so as to prevent stagnation of water from the fluid level. 可以利用一可选的泵或一类似的移动部件在流体液位緩冲件124和水供给或回收器182 之间引导流动。 An optional pump may be utilized or a like moving member 182 between the fluid level in the buffer 124 and a water supply or recovery boot flow. 水或流体停滞时间过长,就可能在水中滋生细菌/審菌。 Stagnant water or fluid for too long, it could breed bacteria / bacteria in the water trial. 在正常操作下,流体液位緩冲件124处的水是停滞的,因为从网51 回收的水将经过位于网高度的小管流到收集箱136。 Under normal operation, the fluid level 124 of the buffer water is stagnant, since the flow of water from the collection tank 136 through the network 51 located at the height of the net recovery tubules. 在正常操作期间, 通过把流体引入或引出流体液位緩冲件124,就可以防止滋生细菌/霉菌的问题。 During normal operation, the fluid into or out through the fluid level buffer 124, the problem can be bacteria / mildew prevention.

应当知道,上面的描述只是解释性的,并不是限制性的。 It should be appreciated that the above description is illustrative and not restrictive. 对于本领域的技术人员而言, 一旦阅读上面的描述,许多实施例就会是很显然的。 For those skilled in the art upon reading the foregoing description, many embodiments will be apparent. 因此,本发明的范围并不是参照上述描述来确定的,而是参照所附的权利要求以及它的等同范围来确定的。 Accordingly, the scope of the invention be determined not with reference to the above description, but rather determined by reference to the appended claims and its equivalents range.

此外,本发明还能被用于双台式光刻系统。 Further, the present invention can also be used for dual desktop lithography system. 例如,在美国专利US6262796和US6341007中就公开了双台式光刻系统,在此引用这些专利文件的全文作为参考。 For example, in United States patent US6262796 and US6341007 publicly in a dual desktop lithography system, incorporated the full text of these patent documents incorporated by reference.

Claims (28)

1.一种在浸没光刻系统中从一透镜和一基片之间的空间回收流体的方法,该方法包括: 通过一个多孔元件经由一条回收流线路从所说空间抽吸流体; 在从所说空间抽吸流体期间,把多孔元件中的流体压力保持在多孔元件的起泡点以下。 1. A method for recovering fluid from the space between a lens and a substrate in an immersion lithography system, the method comprising: drawing the fluid from the space via a porous member via a recovery flow line; from the during pumping said fluid space, the fluid pressure in the porous element is kept below the bubble point of the porous member.
2. 根据权利要求1所述的方法,其中,所说保持压力的步骤包括: 把通过多孔元件经由回收流线路从所说空间抽吸的流体引导到一溢流容器内,该溢流容器被保持在一预定压力下。 The method according to claim 1, wherein said step of maintaining the pressure comprises: guiding the recovery flow via the suction line from said space through the porous member of the fluid container within an overflow, the overflow container is is maintained at a predetermined pressure.
3. 根据权利要求2所述的方法,其中,所说保持压力的步骤还包括把流体从溢流容器虹吸到一收集箱内。 3. The method according to claim 2, wherein said step further comprises maintaining the pressure from the fluid overflow container to siphon a collection box.
4. 根据权利要求3所述的方法,其中,流体在重力作用下被向下虹吸到设置在溢流容器下面的收集箱内。 4. The method according to claim 3, wherein the fluid is siphoned under gravity downwardly into the collection box disposed below the overflow container.
5. 根据权利要求1所述的方法,其中,所说保持压力的步骤包括: 通过多孔元件经由一緩冲流线路把流体从所说空间抽吸到一流体液位緩沖件;感测流体液位緩冲件处的压力或流体液位;根据所感测到的流体液位緩冲件处的压力或流体液位,对通过多孔元件经由回收流线路从所说空间抽吸的流体流进行控制。 The method according to claim 1, wherein said step of maintaining the pressure comprises: a fluid pumped into the bit class buffer fluid through the porous member via a flow line from said buffer space; sensing fluid flow pressure or fluid level position at the buffer; according to the pressure or fluid level detected fluid level sensed at the buffer of the suction through the porous member via the recovery flow line from said fluid flow control space .
6. 根据权利要求5所述的方法,其中,控制流体流的步骤包括控制一个被设置在回收流线路中位于多孔元件下游的可变阀。 6. The method according to claim 5, wherein the step of controlling fluid flow comprising a variable valve disposed downstream of the porous element positioned in the recovery flow control line.
7. 根据权利要求l所述的方法,其中,保持压力的步骤包括: 通过多孔元件经由一緩冲流线路把流体从所说空间抽吸到一流体液位緩冲件;感测流体液位緩冲件处的压力或流体液位;根据所感测到的流体液位緩沖件处的压力或流体液位,控制通过多孔元件的回收流线路出口处的真空压力。 7. A method according to claim l, wherein the step of maintaining the pressure comprises: a fluid pumped into the bit class buffer fluid through the porous member via a flow line from said buffer space; sensing the fluid level pressure or fluid level at the buffer; according to the pressure or fluid level detected fluid level sensed at the buffer, by controlling the vacuum pressure recovery at the outlet of the flow line of the porous member.
8. 根据权利要求7所述的方法,其中,控制真空压力的步骤包括控制回收流线路出口处的一收集箱中的一真空调节器。 Step 8. The method according to claim 7, wherein the controlling includes controlling the vacuum pressure at the outlet of the recovery flow line is a collection tank in a vacuum regulator.
9. 一种在浸没光刻系统中用于从一透镜和一基片之间的空间回收流体的装置,该装置包括:内部件,该内部件具有一透镜开口,用于容纳透镜的一部分,并且把透镜定位成通过由所述空间分隔而与基片分离开,以便在透镜和基片之间的所说空间中接收流体;外部件,该外部件被:&置在内部件周围,该外部件具有多孔元件, 该多孔元件与所说空间以及一流体回收出口流体连通,以便经由所说多孔元件把流体从所说空间抽吸到所说流体回收出口;以及压力控制系统,该压力控制系统与所说多孔元件流体连通,以便在经由多孔元件从所说空间抽吸流体期间,把所说多孔元件的表面处的压力保持在多孔元件的起泡点以下。 An apparatus in an immersion lithography system for recovering fluid from the space between a lens and a substrate, the apparatus comprising: an inner member, the inner member having a lens opening for receiving a portion of the lens, and the lens is positioned to be separated by a partition from the substrate by the space for receiving fluid in said space between the lens and the substrate; and the outer member, the outer member is: & around the inner member facing the the outer member having a porous element, the porous element to said space and an outlet in fluid communication with the fluid recovery to the porous member via said fluid from said fluid recovery outlet to said space; and a pressure control system, pressure control the system in fluid communication with said porous member, so that during the suction of fluid from the space via the porous element, the porous surface of said element is maintained at a pressure below the bubble point of the porous member.
10. 根据权利要求9所述的装置,其中,压力控制系统包括: 溢流容器,该溢流容器与所说多孔元件流体连通; 真空调节器,用于调节溢流容器中的压力。 10. The apparatus according to claim 9, wherein the pressure control system comprising: an overflow vessel, the overflow container in fluid communication with said porous member; vacuum regulator for regulating the pressure of the overflow vessel.
11. 根据权利要求10所述的装置,还包括收集箱,该收集箱与溢流容器流体连通,并且位于该溢流容器的下方。 11. The apparatus according to claim 10, further comprising a collection tank, the collection tank in fluid communication with the overflow container, and located below the overflow vessel.
12. 根据权利要求9所述的装置,其中,压力控制系统包括: 流体液位緩沖件,该流体液位緩冲件与多孔元件流体连通; 传感器,用于感测流体液位緩冲件处的压力或流体液位; 控制器,用于根据来自传感器的传感器信号,调节通过流体回收出口从所说空间抽吸的流体的流量,从而在经由多孔元件从所说空间抽吸流体期间,把所说多孔元件的表面处的压力保持在多孔元件的起泡点以下。 12. The apparatus according to claim 9, wherein the pressure control system comprising: a buffer fluid level, the fluid level of the buffer fluid communication with the porous member; a sensor for sensing a fluid level of the buffer pressure or fluid level; a controller for the sensor signals from the sensor, adjusting the flow rate sucked from the space through the fluid outlet of the fluid recovered, so that during the suction of fluid from the space via a porous member, the the pressure at the surface of said porous member is maintained at below the bubble point of the porous member.
13. 根据权利要求12所述的装置,压力控制系统包括一阀,该阀被设置在流体回收出口的下游,并且所说控制器被用于控制该阀,以便调节通过流体回收出口从所说空间抽吸的流体的流量。 13. The apparatus according to claim 12, comprising a pressure control system valve that is disposed downstream of the recycling outlet of the fluid, and said controller is for controlling the valve to adjust the outlet from said fluid recovery by suction fluid flow space.
14. 根据权利要求12所述的装置,其中,压力控制系统包括: 收集箱,该收集箱与流体回收出口流体连通; 可控真空调节器,用于调节收集箱中的压力;其中,所说控制器被用于控制可控真空调节器,以便通过控制收集箱中的压力来调节通过流体回收出口从所说空间抽吸到收集箱的流体的流量。 14. The apparatus according to claim 12, wherein the pressure control system comprising: a collection tank, the collection tank and an outlet in fluid communication with the fluid recovery; controllable vacuum regulator for regulating the pressure in the collection tank; wherein, said the controller is used to control a controllable vacuum regulator in order to regulate the flow of fluid recovered by the suction outlet from the space to the collecting tank by controlling the pressure of the fluid in the collection tank.
15. 根据权利要求9所述的装置,其中,内部件与外部件间隔开一中间间隔。 15. The apparatus according to claim 9, wherein the inner member and the outer member is spaced apart from an intermediate spacing.
16. 根据权利要求9所述的装置,其中,内部件包括一内部腔室, 该内部腔室形成透镜和基片之间的间隔的一部分,并且,内部件具有一些孔,这些孔被设置在内部腔室的上方,以便实现把流体引入到内部腔室内和/或把流体从内部腔室抽吸出。 16. The apparatus according to claim 9, wherein the inner member comprises an inner chamber, the inner chamber forms a portion of the interval between the lens and the substrate, and the inner member having a number of apertures are provided the upper interior of the chamber, in order to achieve a fluid is introduced into the interior of the chamber and / or the aspirated fluid from the interior chamber.
17. 根据权利要求16所述的装置,内部件具有一些孔,这些孔被设置在透镜开口的对置侧,以便把流体引入到内部腔室。 17. The apparatus according to claim 16, the inner member having a number of apertures are disposed on opposite sides of the lens opening, so that the fluid is introduced into the internal chamber.
18. 根据权利要求9所述的装置,内部件包括一对緩冲槽,这对緩冲槽被设置在透镜开口的对置侧。 18. The apparatus according to claim 9, the inner member comprises a pair of buffer tanks which are provided on opposite sides of the lens opening of the buffer tank.
19. 根据权利要求18所述的装置,其中,内部件具有一些清洗孔, 并且所说的这对緩沖槽中的每个緩冲槽与至少一个所说清洗孔流体连通。 19. The apparatus according to claim 18, wherein the inner member having a number of cleaning holes, and said pair of slots in the buffer tank in communication with each cushion of said at least one cleaning fluid orifice.
20. 根据权利要求9所述的装置,其中,多孔元件选自由网、多孔材料、其内具有蚀刻孔的元件所构成的组。 20. The apparatus according to claim 9, wherein the porous element is selected from the group consisting of net, a porous material, having an inner set of elements composed of etched holes.
21. 根据权利要求12所述的装置,还包括与流体液位緩沖件流体连通的一流体供给器或一流体回收器。 21. The apparatus as claimed in claim 12, further comprising a fluid supply with the fluid level in fluid communication with the cushion or a fluid collector.
22. —种装置,包括:光学投射系统,该光学投射系统具有一最终光学元件,该光学投射系统用于把一图像投射到一工件上,在最终光学元件和工件之间限定一间隔,该间隔被用于充填一浸没流体;台,当图像被投射到工件上时,该台用于支撑着邻近光学投射系统的所说工件;多孔材料,该多孔材料被定位成邻近所说间隔,该多孔材料用于回收从所说间隔流出的流体;控制系统,用于保持多孔材料上的压力,该压力等于或小于多孔材料的起泡点。 22. - species apparatus comprising: a projection optical system, the optical projection system having a final optical element, the optical projection system used to project an image onto a workpiece, defining a space between the final optical element and the workpiece, the interval is used to fill an immersion fluid; stage, when an image is projected onto the workpiece, the table for supporting the projection optical system near said workpiece; porous material, the porous material is positioned adjacent said interval, the porous material for recovering fluid from flowing out of said interval; a control system for maintaining the pressure on the porous material, the pressure is equal to or less than the bubble point of the porous material.
23. 根据权利要求22所迷的装置,其中,控制系统包括: 溢流容器,该溢流容器与多孔材料流体连通; 真空调节器,用于调节溢流容器中的压力。 23. The fan apparatus according to claim 22, wherein the control system comprises: overflow container, the fluid overflow container and the porous material of communication; vacuum regulator for regulating the pressure of the overflow vessel.
24. 根据权利要求23所述的装置,其中,还包括: 一收集箱,该收集箱与溢流容器流体连通,并且位于溢流容器的下方。 24. The apparatus according to claim 23, wherein, further comprising: a collection tank, the collection tank in fluid communication with the overflow vessel and the overflow vessel located below.
25. 根据权利要求22所述的装置,其中,控制系统包括: 流体液位緩冲件,该流体液位緩冲件与多孔材料流体连通; 传感器,用于感测流体液位緩冲件处的压力或流体液位; 控制器,用于根据来自传感器的传感器信号,调节通过一流体回收出口从所说间隔抽吸的流体的流量,以便在通过多孔材料从所说空间抽吸流体期间,把多孔材料的表面处的压力保持在多孔材料的起泡点以下。 25. The apparatus according to claim 22, wherein the control system comprising: a buffer fluid level, the fluid level of the buffer fluid and the porous material in communication; a sensor for sensing a fluid level of the buffer pressure or fluid level; a controller for the sensor signals from the sensor by adjusting a recovered fluid outlet spaced from said suction fluid flow from said space so as to draw fluid through the porous material during, the pressure at the surface of the porous material is maintained at below the bubble point of the porous material.
26. 根据权利要求25所述的装置,其中,控制系统包括一阀,该阀被设置在流体回收出口的下游,并且所说控制器被用于控制该阀, 以便调节通过流体回收出口从所说空间抽吸的流体的流量。 26. The apparatus according to claim 25, wherein the control system comprises a valve that is disposed downstream of the recycling outlet of the fluid, and said controller is for controlling the valve to adjust the fluid recovered from the outlet by He said suction fluid flow space.
27. 根据权利要求25所述的装置,其中,控制系统包括: 收集箱,该收集箱与流体回收出口流体连通;可控真空调节器,用于调节收集箱中的压力;其中,所说控制器被用于控制可控真空调节器,以便通过控制收集箱中的压力来调节通过流体回收出口从所说空间被抽吸到收集箱的流体的流量。 27. The apparatus according to claim 25, wherein the control system comprising: a collection tank, the collection tank and an outlet in fluid communication with the fluid recovery; controllable vacuum regulator for regulating the pressure in the collection tank; wherein said control It is used to control the controllable vacuum regulator, so as to regulate the flow of fluid recovered through the outlet of said space to be drawn from the collection tank by controlling the pressure of the fluid in the collection tank.
28. 根据权利要求25所述的装置,还包括与流体液位緩冲件流体连通的一流体供给器或一流体回收器。 28. The apparatus according to claim 25, further comprising a fluid supply with the fluid level in fluid communication with the cushion or a fluid collector.
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EP0811474A2 (en) 1996-02-15 1997-12-10 JOHNSON & JOHNSON VISION PRODUCTS, INC. Apparatus and method for degassing deionized water for inspection and packaging
CN1501175A (en) 2002-11-12 2004-06-02 Asml荷兰有限公司 Lithographic apparatus and device manufacturing method
CN1501170A (en) 2002-11-18 2004-06-02 Asml荷兰有限公司 Lithographic apparatus and device manufacturing method

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