CN100349034C - Interference regulating display assembly and method for manufacturing same - Google Patents
Interference regulating display assembly and method for manufacturing same Download PDFInfo
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- CN100349034C CN100349034C CNB031589286A CN03158928A CN100349034C CN 100349034 C CN100349034 C CN 100349034C CN B031589286 A CNB031589286 A CN B031589286A CN 03158928 A CN03158928 A CN 03158928A CN 100349034 C CN100349034 C CN 100349034C
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Images
Abstract
The present invention relates to an interference adjustment display component. The display component at least comprises a first electrode, a second electrode, two supports and a water repellent layer, wherein the two supports are positioned between the first electrode and the second electrode to form a chamber; the water repellent layer covers the surface of the first electrode, which faces the chamber, to cause the surface of the first electrode to be not capable of adsorbing water molecules, and therefore, the distance between the first electrode and the second electrode can not collapse because of adsorbing water vapor. The present invention also provides the manufacturing method of the interference adjustment display component.
Description
Technical field
The present invention relates to a kind of plane display module and its manufacture method, and be particularly related to a kind of interference adjusting display module and its manufacture method.
Background technology
Flat-panel screens is owing to have little, the lightweight characteristic of volume, very advantageous in the monitor market of Portable display device and the application of little space.Existing flat-panel screens is removed LCD (LiquidCrystal Display, LCD), organic electric exciting light-emitting diode display (Organic Electro-Luminescent Display, OLED) and plasma display panel (Plasma Display Panel, PDP) or the like outside, a kind of plane display mode of light interference type that utilizes is suggested.
This kind has low electric power power consumption, rapid answer (Response Time) and bistable state (Bi-Stable) characteristic in itself by the characteristic of the formed display of light interference type changeable colour picture element cell array, the panel of display will be can be applicable to, particularly can be applicable to Portable (Portable) product, for example mobile phone (Mobile Phone), PDA(Personal Digital Assistant), portable computer (Portable Computer) or the like.
United States Patent (USP) the 5th, 835 has disclosed a kind of adjustment assembly array (VisibleSpectrum Modulation Arrays) of visible light No. 255, and it constitutes unit and is a kind of changeable colour picture element unit, can be used as the usefulness of flat-panel screens.See also Figure 1A, it is the cross-sectional view of existing changeable colour picture element unit.Each changeable colour picture element unit 100 comprises bottom electrode 102 and top electrode 104 on transparency carrier 110, is supported by stilt 106 between bottom electrode 102 and the top electrode 104 and forms a chamber (Cavity) 108.The distance that bottom electrode 102 and top electrode are 104, just the length of chamber 108 is D, the length D of chamber 108 generally can be less than 1 μ m.Bottom electrode 102 is a smooth incident electrode, has absorptivity, but the absorption portion visible light.104 of top electrodes are a smooth reflecting electrode, utilize driven can make it produce deformation.
Usually utilize the incident light source of white light as this changeable colour picture element unit 100, white light is blended together by the light of various different wave lengths in the visible light spectrum scope (Wave Length represents with λ).When incident light passes bottom electrode 102 and when entering in the chamber 108, only has the incident light of coincidence formula 1.1 medium wavelengths restriction to produce constructive interference and the output that is reflected in chamber 108, wherein N is a natural number.In other words,
2D＝Nλ
1 (1.1)
When the double length 2D of chamber 108 satisfies lambda1-wavelength λ
1Integral multiple the time, can make this lambda1-wavelength λ
1In this chamber 108, produce constructive interference, and export this wavelength X
1Reflected light.At this moment, observer's eyes are observed along the direction of incident light incident bottom electrode 102, can see that wavelength is λ
1Reflected light, therefore, changeable colour picture element unit 100 is in "open" state, be a bright attitude state.
Figure 1B illustrates the diagrammatic cross-section of changeable colour picture element unit 100 after adding voltage among Figure 1A.Please refer to Figure 1B, under the driving of voltage, top electrode 104 can produce deformation because of electrostatic attraction, sinks to the direction of bottom electrode 102.
At this moment, the distance that bottom electrode 102 and top electrode are 104, just the length of chamber 108 is d, this d can equal zero.That is to say that the D in the formula 1.1 will replace with d, in the wavelength of all light, the wavelength (λ of coincidence formula 1.1 is only arranged in the incident light
2) can in chamber 108, produce constructive interference, penetrate bottom electrode 102 and export via the reflection of top electrode 104.In this changeable colour picture element unit 100, it is λ that bottom electrode 102 is designed to wavelength
2Light have higher absorptivity, so all light in the incident light are all by filtering, the observer for observing along the direction of incident light incident bottom electrode 102 will can not see that any light is reflected out.Therefore, be in "off" state to changeable colour picture element unit 100 this moment, is a dark attitude state.
As mentioned above, under the driving of voltage, top electrode 104 can produce deformation because of electrostatic attraction, sinks to the direction of bottom electrode 102, makes this changeable colour picture element unit 100 switch to "off" state by "open" state.And when changeable colour picture element unit 100 will switch to "open" state by "off" state, then must remove the voltage that is used for driving top electrode 104 deformation earlier.Then, itself the deformation restoring force of paddling one's own canoe, the top electrode 104 that loses the electrostatic attraction effect can revert to the original state as Figure 1A, makes this changeable colour picture element unit 100 present a "open" state.
From the above, this changeable colour picture element unit 100 combines optical thin film principle of interference, reflecting plate processing procedure and MEMS (micro electro mechanical system) framework processing procedure and integrates and form.In the MEMS (micro electro mechanical system) framework, chamber 108 is to form by the sacrifice layer of etching between top electrode 104 and bottom electrode 102.Sacrifice layer is etched remove after, airborne hydrone is very easy to be adsorbed among the chamber 108, produces unnecessary electrostatic attraction between two electrodes.When this changeable colour picture element unit 100 will present a "open" state, but can be because of the electrostatic attraction of hydrone, allow two electrodes adsorb mutually and be close together, make this changeable colour picture element unit 100 present a "off" state on the contrary.How to avoid chamber 108 absorption aqueous vapors and produce unnecessary electrostatic attraction and become an important problem.
Summary of the invention
The object of the present invention is to provide a kind of interference to regulate display module and manufacture method thereof, on the optical thin film of interfering the bottom electrode of regulating display module, form one deck and scold water layer, interfere the surface of the bottom electrode of regulating display module can not adsorb aqueous vapor with protection.
Another object of the present invention is to provide a kind of interference to regulate display module and manufacture method thereof, on the optical thin film of interfering the bottom electrode of regulating display module, form one deck and scold water layer, the distance of interfering between the upper/lower electrode of regulating display module can not subsided because of the absorption aqueous vapor.
Another purpose of the present invention is to provide a kind of interference to regulate display module and manufacture method thereof, is used for improving the display quality that display panel is regulated in reflective interference.
The above-mentioned purpose according to the present invention proposes a kind of manufacture method of regulating display module of interfering, and this manufacture method comprises the following step at least.On transparency carrier, form first transparency conducting layer, light absorbing zone, insulation course and sacrifice layer in regular turn.Form first opening of at least two road vertical bar shapes then among sacrifice layer, insulation course, light absorbing zone and first transparency conducting layer, define bottom electrode, wherein bottom electrode is to be formed by first transparency conducting layer, light absorbing zone and insulation course institute storehouse.Then, coating one deck photosensitive material on transparency carrier allows it fill up above-mentioned first opening and covers on the sacrifice layer, and this photosensitive material of patterning again is so that it forms stilt in first opening.On sacrifice layer and stilt, form second conductive layer then, again in wherein forming second opening of twice vertical bar shape at least, to define at least one top electrode, wherein this top electrode is made up of this second conductive layer after defining, and the bearing of trend of the bearing of trend of above-mentioned second opening and above-mentioned first opening is orthogonal.Then, remove above-mentioned sacrifice layer, on sacrifice layer, form one deck again and scold water layer.
The above-mentioned purpose according to the present invention proposes the manufacture method that display module is regulated in another kind of reflective interference, and this manufacture method comprises the following step at least.On transparency carrier, form first transparency conducting layer, light absorbing zone, insulation course in regular turn, scold water layer and sacrifice layer.Then at sacrifice layer, scold first opening that forms at least two road vertical bar shapes among water layer, insulation course, light absorbing zone and first transparency conducting layer, define bottom electrode, wherein bottom electrode is by first transparency conducting layer, light absorbing zone, insulation course and scolds water layer institute storehouse to form.Then, coating one deck photosensitive material on transparency carrier allows it fill up above-mentioned first opening and covers on the sacrifice layer, and this photosensitive material of patterning again is so that it forms stilt in first opening.On sacrifice layer and stilt, form second conductive layer then, again in wherein forming twice vertical bar shape second opening at least, to define at least one top electrode, wherein this top electrode is made up of second conductive layer of definition back, and the bearing of trend of the bearing of trend of above-mentioned second opening and above-mentioned first opening is orthogonal.Then, remove above-mentioned sacrifice layer, wherein above-mentionedly scold the water layer protection insulation course injury-free when removing.
The above-mentioned purpose according to the present invention proposes a kind of interference and regulates display module, and this display module comprises bottom electrode, top electrode, stilt at least and scolds water layer.Above-mentioned top electrode and bottom electrode are arranged in parallel, and the chamber that stilt then can supply incident light to interfere with formation between bottom electrode and top electrode scolds water layer then to cover bottom electrode on the surface of chamber.Above-mentioned surface of scolding water layer in order to the protection bottom electrode makes it can not adsorb aqueous vapor and top electrode is subsided to the bottom electrode place.
According to a preferred embodiment of the present invention, above-mentionedly scold the material of water layer to be preferably silane compound, for example can be the two silane of hexamethyl.
The present invention scolds water layer at the surface coverage last layer of bottom electrode, and the insulation course that makes surface hydrophilic is the hydrone in the absorbed air again.Therefore, the distance between upper/lower electrode just can not subsided because of the absorption aqueous vapor, shows so that high-quality image to be provided.
Description of drawings
Figure 1A is the cross-sectional view of existing changeable colour picture element unit.
Figure 1B is the diagrammatic cross-section of changeable colour picture element unit 100 after adding voltage among Figure 1A.
Fig. 2 A to Fig. 2 D is a kind of manufacturing process sectional view of regulating display module of interfering of a preferred embodiment of the present invention.
Fig. 3 A to Fig. 3 D is a kind of manufacturing process sectional view of regulating display module of interfering of another preferred embodiment of the present invention.
Embodiment
The bottom electrode that display module is regulated in existing interference is combined by transparency conducting layer, light absorbing zone and siliceous inorganic insulation layer institute storehouse, and the material of wherein siliceous inorganic insulation layer is general normal to be monox or silicon nitride, so its surface is a water wettability.After sacrifice layer removes by the structure release etch, be the chamber length of light interference type display unit by the supreme interelectrode distance of inorganic insulation layer.In addition, interfere to regulate in the display module two interelectrode distances usually all in micron grade, in addition littler.Therefore the water in air molecule very easily adsorbs and accumulates between the upper and lower electrode, produces unnecessary electrostatic attraction between two electrodes, makes changeable colour picture element unit be in "off" state always, causes the show image defective.
Therefore, existing when removing sacrifice layer in order to solve in interfere regulating the manufacture process of display module, the optical thin film of bottom electrode is caused the problem of damage, the invention provides a kind of interference and regulate display module and manufacture method thereof.In preferred embodiment of the present invention, scold water layer (hydrophobic layer) at the inorganic insulation layer surface coverage last layer of bottom electrode, make it can not adsorb aqueous vapor with the surface of protecting inorganic insulation layer, with head it off.
Embodiment one
Please refer to Fig. 2 A to Fig. 2 D, it is a kind of manufacturing process sectional view of regulating display module of interfering of a preferred embodiment of the present invention.In Fig. 2 A, on transparency carrier 200, form first transparency conducting layer 205, light absorbing zone 210, insulation course 215 and sacrifice layer 220 in regular turn.
The material of above-mentioned first transparency conducting layer 205 for example can be tin indium oxide (Indium Tin Oxide; ITO), indium zinc oxide (Indium Zinc Oxide; IZO), zinc paste or indium oxide, the material of light absorbing zone 210 for example can be metal, as aluminium, silver or chromium or the like.The material of insulation course 215 for example can be monox or silicon nitride, and the material of sacrifice layer 220 for example can be metal, amorphous silicon (amorphous silicon) or polysilicon (polysilicon).
In Fig. 2 B, among sacrifice layer 220, insulation course 215, light absorbing zone 210 and first transparency conducting layer 205, form first opening 225 of at least two road vertical bar shapes, define the bottom electrode position, promptly between twice first opening 225.Then, coating one deck photosensitive material 230 on the sacrifice layer 220 with first opening 225 among.The trend of above-mentioned first opening 225 is vertical paper, and its formation method for example can be the lithography method.Bottom electrode is then formed with 215 storehouses of insulation course by first transparency conducting layer 205 after the definition, light absorbing zone 210.Wherein above-mentioned photosensitive material 230 for example can be positive photoresistance, negative photoresistance or various photopolymer, as Polyimide (polyimide), acryl resin or epoxy resin.
In Fig. 2 C, utilize the method for exposure imaging, the photosensitive material of making way among first opening 225 230 carries out chemical reaction to form stilt 235 among first opening 225.On sacrifice layer 220 and stilt 235, form second conductive layer 245 then, among second conductive layer 245, form twice vertical bar shape second opening (figure does not show) at least then, to define at least one top electrode, promptly between twice second opening.The formation method of above-mentioned second opening for example can be the lithography method, and the bearing of trend of its bearing of trend and above-mentioned first opening is orthogonal, promptly is parallel to paper.Top electrode is generally the reflecting electrode that can move up and down by deformation, and it is made up of second conductive layer 245.The material of above-mentioned second conductive layer 245 can be metal, must reflect the light of self-induced transparency substrate 200 below incidents.
In Fig. 2 D, to utilize structure to discharge processing procedure (release etching process) and remove sacrifice layer 220, the method that removes that it is available for example can be long-range electric paste etching method.The precursor of employed etching electricity slurry is to contain fluorine-based or the etchant of chloro in the long-range electric paste etching method, as xenon difluoride, carbon tetrafluoride, boron chloride, Nitrogen trifluoride, sulfur hexafluoride or its combination in any.
In environment, do not have aqueous vapor then or not under the situation of vacuum breaker, and then form one deck and scold water layer 250 on the surface of insulation course 215.The formation method of scolding water layer 250 for example can feed the gas of the organic compound of repellency in the reaction chamber of board, allow the organic compound of surface adsorption one deck repellency of insulation course 215.Yet, this organic compound must contain the hydrogen atom that can form hydrogen bond with the oxygen atom or the nitrogen-atoms of insulation course 215, so that the monox of insulation course 215 or the oxygen atom of silicon nitride surface or the lone pair electrons (lone pair) of nitrogen-atoms are occupied, make it can not produce hydrogen bond and adsorb a pile aqueous vapor with hydrone again.This class organic compound for example can be silanes or silane alcohols (silanol; R
3SiOH) compound, wherein silane compound for example can be the two silane (hexamethyl disilane) of hexamethyl, and the silanol compounds for example can be trimethyl silyl alcohol.
Embodiment two
Please refer to Fig. 3 A to Fig. 3 D, it is a kind of manufacturing process sectional view of regulating display module of interfering of another preferred embodiment of the present invention.In Fig. 3 A, on transparency carrier 300, form first transparency conducting layer 305, light absorbing zone 310, insulation course 315 in regular turn, scold water layer 320 and sacrifice layer 325.
The material of above-mentioned first transparency conducting layer 305 for example can be tin indium oxide (Indium Tin Oxide; ITO), indium zinc oxide (IndiumZinc Oxide; IZO), zinc paste or indium oxide, the material of light absorbing zone 310 for example can be metal, as aluminium, silver or chromium or the like.The material of insulation course 315 for example can be monox or silicon nitride, and the material of sacrifice layer 325 for example can be metal, amorphous silicon (amorphous silicon) or polysilicon (polysilicon).Scold water layer 320 materials for example to can be the organic resin of repellency.
In Fig. 3 B, at sacrifice layer 325, scold first opening 330 that forms at least two road vertical bar shapes among water layer 320, insulation course 315, light absorbing zone 310 and first transparency conducting layer 305, define the bottom electrode position, promptly between twice first opening 330.Then, coating one deck photosensitive material 335 on the sacrifice layer 325 with first opening 330 among.The trend of above-mentioned first opening 330 is vertical paper, and its formation method for example can be the lithography method.Bottom electrode is then formed with 315 storehouses of insulation course by definition back first transparency conducting layer 305, light absorbing zone 310.Wherein above-mentioned photosensitive material 335 for example can be positive photoresistance, negative photoresistance or various photopolymer, as Polyimide (polyimide), acryl resin or epoxy resin.
In Fig. 3 C, utilize the method for exposure imaging, the photosensitive material of making way among first opening 330 335 carries out chemical reaction to form stilt 340 among first opening 330.On sacrifice layer 325 and stilt 340, form second conductive layer 345 then, among second conductive layer 345, form second opening of twice vertical bar shape (figure does not show) at least then, to define at least one top electrode, promptly between twice second opening.The formation method of above-mentioned second opening for example can be the lithography method, and the bearing of trend of its bearing of trend and above-mentioned first opening is orthogonal, promptly is parallel to paper.Top electrode is generally the reflecting electrode that can move up and down by deformation, and it is made up of second conductive layer 345.The material of above-mentioned second conductive layer 345 can be metal, must reflect the light of self-induced transparency substrate 200 below incidents.
In Fig. 3 D, to utilize structure to discharge processing procedure and remove sacrifice layer 325, the method that removes that it is available for example can be long-range electric paste etching method.The precursor of employed etching electricity slurry is to contain fluorine-based or the etchant of chloro in the long-range electric paste etching method, as xenon difluoride, carbon tetrafluoride, boron chloride, Nitrogen trifluoride, sulfur hexafluoride or its combination in any.
By above-mentioned preferred embodiment as can be known, the present invention allows the surface coverage last layer of insulation course of bottom electrode scold water layer, and the insulation course that makes surface hydrophilic is the hydrone in the absorbed air again.Therefore, the distance between upper/lower electrode just can not subsided because of the absorption aqueous vapor, shows so that high-quality image to be provided.
Claims (16)
1, a kind of manufacture method of regulating display module of interfering, it is characterized in that: this manufacture method comprises at least:
On a transparency carrier, form one first electrode layer, wherein this first electrode layer comprises first transparency conducting layer that is formed on the described transparency carrier, and one is formed on light absorbing zone and on described first transparency conducting layer is formed on insulation course on the described light absorbing zone;
On this insulation course, form a sacrifice layer;
Form at least two vertical bar shape first openings among this sacrifice layer and this first electrode layer, to define at least one first electrode, this first electrode is made up of this first electrode layer after defining;
Coating one photosensitive material makes this photosensitive material fill up these first openings and covers this sacrifice layer on this sacrifice layer;
This photosensitive material of patterning is so that this photosensitive material forms stilt in those first openings;
On this sacrifice layer and this stilt, form a second electrode lay;
Form at least two vertical bar shape second openings among this second electrode lay, defining at least one second electrode, and the bearing of trend of the bearing of trend of these second openings and these first openings is orthogonal;
Remove this sacrifice layer; And
On this insulation course, form one and scold water layer.
2, manufacture method according to claim 1 is characterized in that: this insulation course comprises monox or silicon nitride.
3, manufacture method according to claim 1 is characterized in that: form this method of scolding water layer and comprise and allow the organic compound of this insulation course absorption one deck repellency.
4, manufacture method according to claim 3 is characterized in that: this organic compound has the hydrogen atom that can form hydrogen bond with oxygen atom or nitrogen-atoms.
5, manufacture method according to claim 4 is characterized in that: this organic compound comprises silane compound or silanol compounds.
6, manufacture method according to claim 5 is characterized in that: this silane compound comprises the two silane of hexamethyl.
7, manufacture method according to claim 5 is characterized in that: this silanol compounds comprises trimethyl silyl alcohol.
8, a kind of manufacture method of regulating display module of interfering, it is characterized in that: this manufacture method comprises at least:
On a transparency carrier, form one first electrode layer, wherein this first electrode layer comprises first transparency conducting layer that is formed on the described transparency carrier, and one is formed on light absorbing zone and on described first transparency conducting layer is formed on insulation course on the described light absorbing zone;
On this first electrode layer, form one and scold water layer;
Scold formation one sacrifice layer on the water layer at this;
At this sacrifice layer, this scolds first opening that forms at least two vertical bar shapes among water layer, this first electrode layer, defining at least one first electrode, this first electrode after by definition this first electrode layer and this scold water layer institute storehouse to form;
Coating one photosensitive material makes this photosensitive material fill up these first openings and covers this sacrifice layer on this sacrifice layer;
This photosensitive material of patterning is so that this photosensitive material forms stilt in those first openings;
On this sacrifice layer and this stilt, form a second electrode lay;
Form second opening of at least two vertical bar shapes among this second electrode lay, defining at least one second electrode, and the bearing of trend of the bearing of trend of those second openings and those first openings is orthogonal; And
Remove this sacrifice layer, it is injury-free when removing this sacrifice layer that wherein this scolds this insulation course of water layer protection.
9, manufacture method according to claim 8 is characterized in that: this insulation course comprises monox or silicon nitride.
10, manufacture method according to claim 8 is characterized in that: this scolds the material of water layer to comprise the repellency resin.
11, display module is regulated in a kind of interference, this display module comprise at least one first electrode, one and second electrode that is arranged in parallel of this first electrode and two between this first electrode and this second electrode to form the stilt of a chamber, it is characterized in that: this display module also comprises scolds water layer, and this scolds water layer to cover this first electrode surface to make the surface of this first electrode can adsorbed water molecule on the surface of this chamber.
12, display module is regulated in interference according to claim 11, and it is characterized in that: this scolds water layer to comprise the organic compound or the repellency resin of one deck repellency.
13, display module is regulated in interference according to claim 12, it is characterized in that: this organic compound has the hydrogen atom that can form hydrogen bond with oxygen atom or nitrogen-atoms.
14, display module is regulated in interference according to claim 12, and it is characterized in that: this organic compound comprises silane compound or silanol compounds.
15, display module is regulated in interference according to claim 14, it is characterized in that: this silane compound comprises the two silane of hexamethyl.
16, display module is regulated in interference according to claim 14, and it is characterized in that: this silanol compounds comprises trimethyl silyl alcohol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031589286A CN100349034C (en) | 2003-09-09 | 2003-09-09 | Interference regulating display assembly and method for manufacturing same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031589286A CN100349034C (en) | 2003-09-09 | 2003-09-09 | Interference regulating display assembly and method for manufacturing same |
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| Publication Number | Publication Date |
|---|---|
| CN1595231A CN1595231A (en) | 2005-03-16 |
| CN100349034C true CN100349034C (en) | 2007-11-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| CNB031589286A Expired - Fee Related CN100349034C (en) | 2003-09-09 | 2003-09-09 | Interference regulating display assembly and method for manufacturing same |
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7547568B2 (en) * | 2006-02-22 | 2009-06-16 | Qualcomm Mems Technologies, Inc. | Electrical conditioning of MEMS device and insulating layer thereof |
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|---|---|---|---|---|
| US5822170A (en) * | 1997-10-09 | 1998-10-13 | Honeywell Inc. | Hydrophobic coating for reducing humidity effect in electrostatic actuators |
| US6040937A (en) * | 1994-05-05 | 2000-03-21 | Etalon, Inc. | Interferometric modulation |
| US20020015215A1 (en) * | 1994-05-05 | 2002-02-07 | Iridigm Display Corporation, A Delaware Corporation | Interferometric modulation of radiation |
| WO2003007049A1 (en) * | 1999-10-05 | 2003-01-23 | Iridigm Display Corporation | Photonic mems and structures |
| US20030072070A1 (en) * | 1995-05-01 | 2003-04-17 | Etalon, Inc., A Ma Corporation | Visible spectrum modulator arrays |
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2003
- 2003-09-09 CN CNB031589286A patent/CN100349034C/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6040937A (en) * | 1994-05-05 | 2000-03-21 | Etalon, Inc. | Interferometric modulation |
| US20020015215A1 (en) * | 1994-05-05 | 2002-02-07 | Iridigm Display Corporation, A Delaware Corporation | Interferometric modulation of radiation |
| US20030072070A1 (en) * | 1995-05-01 | 2003-04-17 | Etalon, Inc., A Ma Corporation | Visible spectrum modulator arrays |
| US5822170A (en) * | 1997-10-09 | 1998-10-13 | Honeywell Inc. | Hydrophobic coating for reducing humidity effect in electrostatic actuators |
| WO2003007049A1 (en) * | 1999-10-05 | 2003-01-23 | Iridigm Display Corporation | Photonic mems and structures |
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| CN1595231A (en) | 2005-03-16 |
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