CN100344982C - Test fixture in high frequency measuring chip of laser in structure of monocoplanar electrode - Google Patents
Test fixture in high frequency measuring chip of laser in structure of monocoplanar electrode Download PDFInfo
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- CN100344982C CN100344982C CNB2004100811830A CN200410081183A CN100344982C CN 100344982 C CN100344982 C CN 100344982C CN B2004100811830 A CNB2004100811830 A CN B2004100811830A CN 200410081183 A CN200410081183 A CN 200410081183A CN 100344982 C CN100344982 C CN 100344982C
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- 238000012360 testing method Methods 0.000 title claims abstract description 24
- 239000004020 conductor Substances 0.000 claims description 17
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- 229910052738 indium Inorganic materials 0.000 claims description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
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- 230000001174 ascending effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 10
- 239000000523 sample Substances 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 9
- 239000002241 glass-ceramic Substances 0.000 description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 8
- 239000010931 gold Substances 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000007812 deficiency Effects 0.000 description 2
- 239000006112 glass ceramic composition Substances 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
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- 239000013307 optical fiber Substances 0.000 description 1
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Abstract
Description
技术领域technical field
本发明属于光电子器件领域,是一种用于测量非共面电极的高速半导体激光器芯片的夹具。The invention belongs to the field of optoelectronic devices, and relates to a fixture for measuring a high-speed semiconductor laser chip of a non-coplanar electrode.
背景技术Background technique
高速光源作为光信号的发生器件,是光纤通信系统中最为关键的部件之一。高速半导体激光器是目前光通信系统中最主要的光源。半导体激光器的高频性能从一定程度上决定着光通信系统的传输速率,因此对半导体激光器高频特性的准确测量就变得十分重要。As a device for generating optical signals, a high-speed light source is one of the most critical components in an optical fiber communication system. High-speed semiconductor lasers are the most important light sources in optical communication systems at present. The high-frequency performance of semiconductor lasers determines the transmission rate of optical communication systems to a certain extent, so it is very important to accurately measure the high-frequency characteristics of semiconductor lasers.
半导体激光器芯片大多是长方体结构,其上下表面镀有金属电极,对应着激光二极管的P极与N极。然而目前商用的高频微波探针通常都是共面结构的,无法使探针的两极直接同时接触到芯片的两极。通常的方法是先将芯片N极压焊在一镀有共面金电极的热沉的一个电极上,然后从芯片P极引出一根金丝到热沉的另一电极,从而可以从热沉上的共面电极测量非共面的芯片。Most of the semiconductor laser chips have a cuboid structure, and the upper and lower surfaces are plated with metal electrodes, corresponding to the P pole and N pole of the laser diode. However, the current commercial high-frequency microwave probes are usually coplanar structures, and the two poles of the probe cannot directly contact the two poles of the chip at the same time. The usual method is to first press-weld the N pole of the chip on one electrode of a heat sink coated with a coplanar gold electrode, and then lead a gold wire from the P pole of the chip to the other electrode of the heat sink, so that the Coplanar electrodes on non-coplanar chips.
但是该方法有如下两方面的不足:其一,由于从热沉共面电极所测得的芯片响应中,将包含由热沉和金丝所引入的寄生元件的响应,而且这些寄生元件的影响是很明显的,因此测量不够准确。要获取芯片真实的响应,还需要对测量结果做一系列的校准来扣除相关的影响,这使得测量变得复杂;其二,压焊芯片和金丝的过程增加了测量的复杂程度和芯片受损的可能性,而且芯片一旦压焊在热沉上就无法取下,这些都给实际工作造成了很大的不便。But this method has the following two deficiencies: First, because the chip response measured from the coplanar electrode of the heat sink will include the response of the parasitic elements introduced by the heat sink and the gold wire, and the influence of these parasitic elements is obvious, so the measurement is not accurate enough. To obtain the real response of the chip, it is necessary to do a series of calibrations on the measurement results to deduct the relevant influence, which makes the measurement more complicated; secondly, the process of bonding the chip and the gold wire increases the complexity of the measurement and the impact of the chip. The possibility of damage, and once the chip is bonded to the heat sink, it cannot be removed, which has caused great inconvenience to the actual work.
发明内容Contents of the invention
本发明的目的在于,提供一种测量非共面电极激光器芯片的高频测试夹具,在该夹具的辅助下,共面微波探针能够对非共面电极激光器芯片直接进行高频测量,避免了原方法采用热沉和金丝以及压焊工艺的不足之处。The purpose of the present invention is to provide a high-frequency test fixture for measuring non-coplanar electrode laser chips. With the aid of the fixture, the coplanar microwave probe can directly perform high-frequency measurement on non-coplanar electrode laser chips, avoiding the The original method adopts the deficiencies of heat sink and gold wire and pressure welding process.
本发明解决其技术问题的技术方案是:The technical scheme that the present invention solves its technical problem is:
本发明一种测量非共面电极激光器芯片的高频测试夹具,其特征在于,包括:A high-frequency test fixture for measuring non-coplanar electrode laser chips according to the present invention is characterized in that it comprises:
多个导体平板,该导体平板为矩形,该多个导体平板相互叠放焊接构成多台阶结构;A plurality of conductor plates, the conductor plates are rectangular, and the plurality of conductor plates are stacked and welded to form a multi-step structure;
该多台阶结构的落差均不相同。The drop of the multi-step structure is not the same.
其中所述的导体平板的材料为镀金的微晶玻璃。The material of the conductor plate is gold-plated glass ceramics.
其中所述的多台阶结构的级数为2到15级。The number of stages of the multi-step structure is 2 to 15.
其中所述的落差是由小到大或由大到小。Wherein said drop is from small to large or from large to small.
其中所述的多台阶结构的两相邻台阶落差相差5μm。The step difference between two adjacent steps of the multi-step structure described therein is 5 μm.
其中所述的多台阶结构的各台阶面镀有金属铟层,并制作有相应台阶序号。Each step surface of the multi-step structure described herein is plated with a metal indium layer, and is manufactured with a corresponding step serial number.
该方案的有益效果是:通过导体台阶结构将半导体芯片的N电极转到与其P电极基本共面,从而避免了使用热沉和金丝及其给测量带来的影响;不同落差的多级台阶结构使该夹具能够适应各种不同厚度的激光器芯片的高频特性测量;台阶结构表面的铟层使芯片无需焊接即可与测试夹具保持良好接触;芯片的出光面可以尽量靠近该夹具台阶结构的边缘,这有利于测试过程中的光耦合。The beneficial effect of this scheme is: through the conductor step structure, the N electrode of the semiconductor chip is turned to be substantially coplanar with its P electrode, thus avoiding the use of heat sinks and gold wires and their influence on measurement; multi-level steps with different drop The structure enables the fixture to adapt to the high-frequency characteristic measurement of laser chips of various thicknesses; the indium layer on the surface of the step structure enables the chip to maintain good contact with the test fixture without welding; the light-emitting surface of the chip can be as close as possible to the step structure of the fixture edge, which facilitates light coupling during testing.
附图说明Description of drawings
为进一步说明本发明的技术内容,以下结合实施例及附图详细说明如后,其中:In order to further illustrate the technical content of the present invention, the following detailed description is as follows in conjunction with the embodiments and accompanying drawings, wherein:
图1为该方案测试夹具的外观图;Fig. 1 is the external view of the test fixture of this scheme;
图2为该方案测试夹具的构造示意图;Fig. 2 is the structural representation of this scheme test fixture;
图3为该方案测试夹具的工作过程示意图。Fig. 3 is a schematic diagram of the working process of the test fixture of this scheme.
图1中1-10标示该测试夹具的台阶结构中由低到高的台阶序号;图2中a、b分别表示构成台阶结构的两镀金的微晶玻璃平板;图3中1表示共面微波探针,2表示待测的非共面电极半导体激光器芯片,它被放置在测试夹具的第5级台阶上。1-10 in Figure 1 indicates the step number from low to high in the step structure of the test fixture; a and b in Figure 2 represent two gold-plated glass-ceramic plates that constitute the step structure respectively; 1 in Fig. 3 represents
具体实施方式Detailed ways
请参阅图1所示,本发明一种测量非共面电极激光器芯片的高频测试夹具,包括:Please refer to shown in Fig. 1, a kind of high-frequency test fixture of measuring non-coplanar electrode laser chip of the present invention comprises:
多个导体平板10,该导体平板10为矩形,该多个导体平板10相互叠放焊接构成多台阶结构20;所述的导体平板10的材料为镀金的微晶玻璃;所述的多台阶结构20的级数为2到15级;A plurality of
该多台阶结构20的落差均不相同;所述的落差均不同的多台阶结构20,其是由小到大或由大到小;所述的多台阶结构20的两相邻台阶落差相差5μm;所述的多台阶结构20的各台阶面镀有金属铟层,并制作有相应台阶序号。The drop of the
请参阅图2所示,本发明一种非共面电极半导体激光器测试夹具的制造示意图,其中包括:Please refer to shown in Fig. 2, the manufacture sketch map of a kind of non-coplanar electrode semiconductor laser test fixture of the present invention, including:
步骤1.利用微晶玻璃材料制作导体平板10,并将其表面镀上一定厚度的金层。通过对微晶玻璃材料磨制过程和镀金时间的控制,来得到不同厚度的镀金微晶玻璃平板;Step 1. Make the
步骤2.在制作完成的镀金微晶玻璃导体平板10的上表面的右上角,按照厚度的大小次序制作台阶序号;
步骤3.利用焊接技术将制作完成的两镀金微晶玻璃导体平板10按序号次序焊接成台阶结构。此即构成多台阶结构20中的一个单元;Step 3. Utilize welding technology to weld the fabricated two gold-plated glass-
步骤4.重复构造3中所描述的台阶结构从而构成多台阶,并在各台阶面上镀上金属铟层。Step 4. Repeat the step structure described in structure 3 to form multiple steps, and plate a metal indium layer on the surface of each step.
参阅图3,本发明的工作过程为:Referring to Fig. 3, the working process of the present invention is:
1.根据激光器芯片2厚度数据,确定其应被放置在哪级台阶上进行测量。如激光器芯片厚度为108μm,则应被放置在第5级台阶上;1. According to the thickness data of the
2.将芯片2放置在该级台阶尽量靠近边缘的一边,使其P电极中心位置与第5级台阶上台阶面的间距小于共面微波探针两针尖的间距;2. Place the
3.用共面高频微波探针1的一极压住激光器芯片的P极,探针的另一极则正好压住第5级台阶上台阶面,即可对激光器进行高频特性的测量;获得的数据即为芯片准确的高频特性数据;3. Use one pole of the coplanar high-frequency microwave probe 1 to press the P pole of the laser chip, and the other pole of the probe just presses the upper surface of the fifth step to measure the high-frequency characteristics of the laser. ; The obtained data is the accurate high-frequency characteristic data of the chip;
4.完成一枚芯片的测试以后,即可将其取下。重复1-3所述的过程,即可进行不同厚度其他高速激光器芯片的测试。4. After completing the test of a chip, it can be removed. Repeat the process described in 1-3 to test other high-speed laser chips with different thicknesses.
本发明将表面镀有金层的微晶玻璃平板叠放并焊接,制作成多台阶结构,通过台阶的落差将半导体激光器芯片的N电极转换到与P电极基本共面的位置,把芯片放置在该台阶面上,共面微波探针的两极可同时分别接触台阶面和芯片顶部的P极,从而可以直接对芯片进行高频特性测量;各微晶玻璃平板的厚度不同,因而各级台阶有着不同的落差,从最低一级台阶向上,每上升一级台阶,台阶的落差增大5μm。这样当最低一级台阶的落差为80μm,台阶总数为10级,则最高一级台阶的落差为140μm。这一落差范围能够适应绝大部分激光器芯片的厚度。虽然芯片厚度可能与台阶落差不相等,但两者差最大为2.5μm,一般商用的共面微波探针能够承受这一最大误差;各台阶面上制作有落差标记,通过该标记可以方便的确定某一芯片应放在哪一级台阶上进行测试最为合适;台阶面上镀有一定厚度的金属铟层,能保证被测芯片同该夹具之间的良好接触,从而无需焊接就能进行测量;整个测试夹具是热和电的良导体,因而对高频测试影响很小,测量得到的高频响应即为芯片准确的高频性能。The present invention stacks and welds glass-ceramic plates coated with a gold layer on the surface to form a multi-step structure, and converts the N electrode of the semiconductor laser chip to a position substantially coplanar with the P electrode through the drop of the steps, and places the chip on the On the stepped surface, the two poles of the coplanar microwave probe can contact the stepped surface and the P pole on the top of the chip respectively, so that the high-frequency characteristics of the chip can be directly measured; the thickness of each glass-ceramic plate is different, so the steps of each level have different For different heights, from the lowest step upward, the height of the step increases by 5 μm for each step up. In this way, when the drop of the lowest step is 80 μm and the total number of steps is 10, the drop of the highest step is 140 μm. This drop range can adapt to the thickness of most laser chips. Although the thickness of the chip may not be equal to the step difference, the difference between the two is at most 2.5 μm, and the general commercial coplanar microwave probe can bear this maximum error; each step surface is marked with a drop mark, which can be conveniently determined. It is most appropriate for a certain chip to be tested on which level of step; the surface of the step is coated with a certain thickness of metal indium layer, which can ensure good contact between the chip under test and the fixture, so that it can be measured without welding; The entire test fixture is a good conductor of heat and electricity, so it has little effect on high-frequency testing, and the measured high-frequency response is the accurate high-frequency performance of the chip.
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH01228189A (en) * | 1988-02-01 | 1989-09-12 | Alcatel Nv | Method and apparatus for determining characteristics of optical parameter of semiconductor laser |
CN1238566A (en) * | 1998-02-19 | 1999-12-15 | 日本电气株式会社 | Semiconductor photodetector and manufacturing method thereof |
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Publication number | Priority date | Publication date | Assignee | Title |
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JPH01228189A (en) * | 1988-02-01 | 1989-09-12 | Alcatel Nv | Method and apparatus for determining characteristics of optical parameter of semiconductor laser |
CN1238566A (en) * | 1998-02-19 | 1999-12-15 | 日本电气株式会社 | Semiconductor photodetector and manufacturing method thereof |
Non-Patent Citations (4)
Title |
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光探测器芯片的高频特性测量 张胜利,孙建伟,刘宇,祝宁华,中国激光,第31卷第7期 2004 * |
光通信用10Gbit/s激光器模块及关键技术 祝宁华,谢亮,中国有色金属学报,第14卷第1期 2004 * |
电吸收调制器和DFB激光器集成器件的测量 王幼林,刘宇,孙建伟,祝宁华,半导体学报,第24卷第9期 2003 * |
高速光探测器封装的优化设计 张胜利,刘宇,孙建伟,祝宁华,光学学报,第24卷第5期 2004 * |
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