CH712199A1 - Device for depositing thin layers on a substrate and roll material with a substrate having such layers. - Google Patents

Abstract

The invention relates to a device for depositing thin layers by at least two self-limiting surface reactions on a moving film web (FB), the device having a coating plate (1) and a counter-plate (2) arranged opposite thereto, the coating plate having a plurality of feed regions and discharge regions Reaction and purge gas and the counter-plate has at least one supply area for purge gas or air, wherein means (R1, R2, U1, U2) are present to move the film web between the two plates and wherein the supplied gases form gas cushion, which the film web during the passage between the two plates supported against this and keep them at a distance from them. The coating plate and / or the counterplate are porous in at least one feed region for a gas outlet which is distributed over this area in a planar manner. The invention also provides a roll material with a film web on which thin layers are deposited by at least two self-limiting surface reactions, wherein the film web is rolled up together with an intermediate layer and / or provided on the thin layers with a protective layer.

Description

Description TECHNICAL AREA

The invention relates to a device for depositing thin layers by at least two self-limiting surface reactions on a substrate, wherein the device comprises a coating plate and a counter-plate arranged opposite thereto, wherein the coating plate at least a plurality of supply areas and discharge areas for reaction and purge gas a purge gas or air supply region, means being provided to move the substrate between the two plates, and wherein the supplied gases form gas pockets which support and maintain the substrate against the substrate as it passes between the two plates.

The invention also relates to a roll material with a film web with such layers.

STATE OF THE ART

Self-limiting surface reactions of the type considered are in particular the so-called "Atomic Layer Deposition" (ALD) or the so-called "Molecular Layer Deposition" (MLD). For deposition, the surface to be coated is brought into contact successively with different, but not self-reactive, so-called precursors or reaction gases containing precursors. In between is rinsed with an inert gas in each case. Since each individual reaction gas does not react with itself, the partial reactions are self-limiting. The layer growth is thereby limited to only one monolayer at any partial reaction, even at arbitrarily long time.

In the case of ALD, the reaction gases may be trimethylaluminum (TMA) on the one hand and water vapor (H 2 O) on the other hand. The purge gas is nitrogen (N2). The AIOx layer which can be achieved with this is, with sufficient quality and thickness, suitable as a transparent barrier layer for so-called Organic Light Emitting Diodes (OLEDs) in order to protect them against water vapor and atmospheric oxygen. With regard to water vapor (H 2 O), a so-called Water Vapor Transmission Rate (WVTR) of less than 10 -6 g rrf 2 day-1 and with respect to oxygen (O 2) a so-called Oxygen Transmission Rate (OTR) of less than 10 5 cm 3 m. 2 day-1 bar-1 at least 20 ° C and 50% rel. Humidity requires. For this purpose, the thickness of the barrier layer should be about 25 nm, wherein it is preferably combined with other inorganic and / or organic layers. To achieve a thickness of 25 nm AIOx, approximately 150-400 coating cycles are required. For this use, the substrate should also be transparent.

[0005] WO 2012/005 577 A1 discloses an apparatus for depositing AIOx layers by means of ALD technology on substrates in the form of wafers, which are moved individually between a coating plate and one of these opposing counter plates. The coating plate has a plurality of reaction and purge gas supply regions along the direction of movement of the wafers. These are arranged in groups according to the above-mentioned coating cycles. The counter plate is provided with several supply areas for purge gas. Together with side walls, the two plates form a tunnel, wherein in the sidewalls discharge areas for reaction and purge gas are provided. The gases supplied via the two plates thereby flow in the tunnel transversely to the direction of travel of the substrates. The supplied gases form gas bags, which support the substrate in the passage between the two plates against these and keep them at a distance from them. As means for moving the substrates between the two plates, pressure differences in the direction of movement of the substrates on successive zones serve.

From WO 2014/193 234 A1 a device of the type mentioned is known, in which also substrates in the form of wafers are moved individually between a coating plate and one of these oppositely arranged counter-plate through. The coating plate has a plurality of reaction and purge gas supply and discharge regions traversed along the direction of movement of the wafers. The back plate is provided with multiple supply and discharge areas for purge gas. The gases supplied via the two plates flow both in and against the direction of movement of the wafers. The supplied gases form gas bags, which support the substrates during the passage between the two plates against these and keep them at a distance from them. As a means to move the wafers between the two plates, serve outer, not further described transport elements.

The device known from WO 2013/151 430 A1 differs from that known from WO 2014/193 234 A1 in that the counter-plate is designed like the coating plate.

From WO 2014/123 415 A1 discloses a device is known with a of a film web on a partial circumference circulated, optionally rotating coating drum. The coating drum has a plurality of supply and discharge regions for reaction and purge gas, which are traversed by the film web. The gases supplied via the feed regions thereby flow predominantly in or against the direction of travel of the film web to the discharge regions. In the feed regions, the film web is held on a gas cushion at a distance from the surface of the coating drum. In individual embodiments, an outer cover is present, but has no influence on the guidance of the film web. The distance of the film web from the coating drum results from the strength of the mentioned gas cushion on the one hand and the web tension in conjunction with the curvature of Foli enbahn on the other hand. The supply and discharge areas are again arranged in groups according to the above-mentioned coating cycles. When the coating drum rotates, the individual feed and discharge areas or the groups formed with these are used several times per revolution of the film web. To supply and discharge of the reaction and purge gases in or out of the rotating drum complex connections between mutually moving parts are required.

From DE 10 2008 005 659 B4 a deflecting element for flexible sheet material is known with a guide wall which defines a convexly curved guide surface. The baffle is traversed by Luftausblaskanälen, which open via Luftausblasöffnungen to the guide surface and which are provided for blowing compressed air, which form a supporting air cushion for the sheet over the guide surface. In this case, the guide surface is formed by a microporous wall section.

Whether the abovementioned, low transmission rates are achieved by a coating, was previously carried out on patterns separated (offline) from the coating process with special equipment, with long measurement times were required.

PRESENTATION OF THE INVENTION

The invention has inter alia the object to improve a device of the type mentioned in terms of application and performance. In particular, it should enable high production rates and, with a structurally simple design, be economical to purchase and operate.

This object is achieved by a device having the features of claim 1, which is therefore characterized in that the means are adapted to move as a substrate a film web in a straight alignment between the two plates, and that the coating plate and / or the counter-plate is formed in at least one supply area porous to a distributed over this area surface gas outlet.

Like the device known from WO 2014/123 415 A1, the device according to the invention is thus designed to coat a film web in a continuous flow and is not limited to individual wafers or the like. The advantages already achieved with the device known from WO 2014/123 415 A1 are at least achieved by the device according to the invention. However, by moving the film web in a straight orientation through the device according to the invention, its positioning relative to the two plates is independent of their web tension. This makes the web guide more stable and less susceptible to interference than the web guide to a coating drum. The claimed movement of the film web between the two plates is also much easier to implement than the drive of the wafers in the device known from WO 2014/123 415 A1, in particular by pressure differences in the direction of successive zones. The two plates of the device according to the invention can be mounted stationary, which eliminates the considerable design effort required for the rotation of the coating drum in the device known from WO 2014/123 415 A1. Above all, however, no complicated connections between mutually moved parts are required for the supply and discharge of the reaction and purge gases. By forming the coating plate and / or the counter-plate in at least one feed area porous for a gas outlet distributed over this area over the area, the gas cushion forming there is extremely robust, which likewise has a favorable and stabilizing effect on the contactless web guide between the plates. In the porous layer, an isotropic back pressure is formed. The robust gas cushion also makes it possible to choose the distance between the film web and the coating and / or counter-plate very small, in particular less than 100 pm, preferably even less than 50 pm. The smaller the distance, the greater is the flow velocity of the purge gas in the direction of an adjacent or adjacent feed region for reaction gas for the same gas flow. A high flow rate is beneficial to the effectiveness of flushing with the purge gas. As a result, the feed regions in the direction of travel of the film web, in particular for purge gas, can be made short. This in turn allows to accommodate a large number of groups along the length of the coating plate. Since this also makes it difficult to undesirably mix different reaction gases, for example, by diffusion of a precursor against the purge gas flow, it is also necessary to flush less thoroughly with purge gas between adjacent supply regions for different reaction gases. A further advantage of the porous surface is that a uniform gas outlet can be realized even with feed regions that are transverse to the direction of travel of the film web.

Together, the measures mentioned allow compared to the device known from WO 2014/123 415 A1 a much higher web speed with correspondingly higher production rates and a lower purge gas consumption.

In the case of ALD, the reaction gases may be trimethylaluminum (TMA) on the one hand and steam (H 2 O) on the other hand for producing an AIOx layer. The purge gas is nitrogen (N2). As an alternative to an AIGy layer, it is also possible, for example, to produce an AIOx-TiO 2 nanolaminate, where TiCl 4 can be used as the TiO 2 precursor.

Preferably, the coating plate and the counter-plate are porous in all feeding areas. However, individual feed areas could also be designed with slots and / or holes. This may be advantageous in particular for the supply of reaction gases with low vapor pressure, such as those for MLD coatings. In addition, the slots and / or holes can be cleaned more easily than the porous material, whereby any deposits, for example due to thermal decomposition of a reaction gas, are more tolerable.

More preferably, the film web is kept in the discharge areas on a gas cushion at a distance from the surface of the coating cylinder by a small, defined back pressure is generated in the gas discharge.

The inventive device is preferably suitable for coating film webs up to a width of 200 cm and thus by inline or subsequent parts of the web for standard widths, for example, 30 to 50 cm. The entire device is further preferably designed for a web speed of the film web up to 120 m / min. For an ALD process of the type mentioned, web speeds in the range of 20 m / min to 80 m / min are suitable.

Because of the at least in ALD coatings short reaction time of the reaction gases, the expansion of the feed areas in the direction of the film web even at such web speeds only 5 mm to 30 mm, in particular 10 mm to 20 mm, to be. The extent of the discharge regions in the direction of the film web even needs to be only 0.3 mm to 1.5 mm, in particular 0.5 mm to 1 mm. This is especially true if the distance between the film web and the coating plate is kept smaller than 100 pm.

Further preferred embodiments of the inventive device are characterized in the dependent claims.

Thus, the two plates, for example, arranged to each other at a fixed distance or in a variable, by the pressure of the gas cushion against a counterforce certain distance against each other movably mounted.

Preferably, only one gas connection is present on the coating plate per gas type, which communicates with the associated supply or discharge regions of the coating plate through channels in the coating plate.

When discharge regions in the direction of the film web are respectively present only adjacent to a pair of supply regions, wherein the forward feed region of the pair of supply regions in the running direction of the film web is a purge gas supply region and the rear reaction gas supply region results in an improved one Utilization of the supply areas for purge gas.

The separation of the various reaction gases can be ensured in spite of each only adjacent to a pair of feed areas existing discharge areas that the supply areas for purge gas are measured longer in the direction of the film than the respective adjacent supply areas for reaction gas and / or in that the purge gas is supplied at a higher pressure than the reaction gases.

The space between the two plates is laterally preferably open in the inventive device. Therefore, and in view of the fact that reaction gas such as TMA should preferably not escape into the environment, it is advantageous to provide in each case a discharge region for the reaction gas in the coating plate transverse to the running direction of the film web on both sides adjacent to at least one feed region for a reaction gas.

For the same reason and to support the film web well their edge regions well, it is preferred that the coating plate has transversely to the direction of the film web on both sides of at least one feed region for a reaction gas each still one, swept by the film web supply area for purge gas.

As mentioned above, several hundred coating cycles may be required to achieve a sufficient barrier thickness. In order to achieve the respectively required number of coating cycles, the film web of a device according to the invention can be fed several times in succession. Alternatively or additionally, several devices according to the invention could be operated in series with pairs of coating and counter plates. It can be provided that the plurality of pairs of coating and counter plates in series and preferably arranged in a stack and Bahnumlenkungsmittel are present in order to supply the film web to the individual pairs in succession. In an arrangement in the stack results in an extremely compact design.

For a double-sided coating of the film web, the counter-plate may also be formed as a coating plate and be provided along the direction of the film web with multiple supply and discharge areas for reaction and purge gas. It is preferred if the supply and discharge areas of both plates are formed congruent.

An inventive device with two coating plates can be used except for double-sided coating of a film web for one-sided coating of two film webs in abutment with each other. With particular advantage, however, an apparatus according to the invention with two coating plates can be used for double coating only one side of a film web, provided that the film web after a first pass between the two plates with suitable web turning means turned and the two plates back to back with a part in the first pass the film web is fed again for a second pass between the two plates.

In one embodiment, at least one feed region in the coating plate of the device according to the invention is associated with a UV lamp. With this, oxygen radicals OVO) supplied there can be generated as reaction gases from the ozone (03) according to the reaction equation: 03 + h -> 0 (1D) + 02 (a1Ag) [0031] If in a subsequent feed range a metal-containing reaction gas is supplied, this can react with the generated oxygen radicals to form a metal oxide. Preferably, the UV lamp is an amalgam lamp (low-pressure mercury vapor lamp) which emits UVC radiation and / or VUV radiation having wavelengths of 254 nm and / or 185 nm. In this embodiment, the ozone-containing gas must be externally generated, for example, from oxygen-containing gas with an ozone generator. The mentioned 185 nm radiation is less suitable for ozone photolysis than the 254 nm radiation, but may assist the process by cleavage of adsorbed and optionally partially oxidized precursor molecules. The advantage of using oxygen radicals 0 (1D) instead of H20 as precursor is, above all, that the desorption of H20 is omitted as the slowest, the process speed limiting substep. In addition, there is a higher density of the layer produced at a lower process temperature and a greater layer growth per coating cycle.

Instead of externally generated, ozone-containing gas oxygen radicals 0 (1D) can be generated as a reaction gas also locally from supplied, oxygen-containing gas by using a VUV lamp: 02 + h -> 0 (3P) + 0 (1D) Preferably, the VUV lamp is a 172nm Xe2 * excimer lamp. The 172 nm radiation can also assist the process by cleaving adsorbed and possibly partially oxidized precursor molecules. In this embodiment eliminates the mentioned ozone generator. Another possibility for the local generation of oxygen radicals 0 (1D) from supplied, oxygen-containing gas is the use of a plasma source. This could also generate other radicals, for example H radicals from H2 for depositing metallic layers or N radicals from N2 or NH3 for depositing nitride layers.

For self-limiting surface reactions such as ALD or MLD, a process temperature which is elevated in relation to the ambient temperature is generally favorable. To comply with the respective desired process temperature, for example in the range of 80-120 ° C, it may be necessary to supply suitably tempered reaction and / or purge gases and / or to temper the coating and / or the counter-plate. So that the film web already has a suitable temperature when it enters the gap between the two plates, suitable means for heating it may be arranged upstream of the two plates in their running direction. These means preferably comprise a heating section equipped with hot air feeds and / or IR radiators. The film web can be heated on the heating to a higher temperature than the process temperature, for example, to dry the carrier film and / or the planarization or to compensate for a possible cooling of the film web between the heating and the inlet between the first two plates. If a plurality of plate pairs are arranged in series or in a stack, each plate pair may be preceded by means for heating the film web in its direction of travel. The device according to the invention may further be provided with a measuring device passed through by the film web, which is arranged downstream of only one coating and counterplate or only one precoat and precoat counterplate for inline determination of oxygen or nitrogen transmission rates (OTR or NTR) during the passage thin layers deposited between these plates. In this case, the measuring device is preferably connected in terms of data technology to a device arranged later in the direction of travel of the film web for inscribing and / or coding the film web (FB) with the determined OTR or NTR values. This data could also be stored on mobile memories e.g. are stored in the film sleeve, from where they are available in the further processing of the coated film web or other requirements.

The device according to the invention is preferably part of a system in which the film web is unrolled from a first roll and rolled up again after being coated on a second roll. Since ALD or MLD coatings with thicknesses in the nanometer range are very sensitive to mechanical loads, it is known per se to roll up the coated film web together with a protective intermediate layer (so-called interleave) which is fed by a further unwinding. However, the intermediate layer is usually saturated with the gases present in their environment as well as with water. According to a development of the invention, means are provided to produce the intermediate layer inline from a shapeless mass in the same pass as the coating of the film web. In this case, the intermediate layer can be prepared virtually anhydrous and be equipped by incorporating getters for water molecules in the material of the intermediate layer even with the functionality to keep dry by receiving water molecules, the coated film web on the roll to their further processing or even dry. To ensure the function of the getters, the material of the interlayer must be permeable to water molecules.

Alternatively, or in addition to an intermediate layer, which is removed in the wide processing of the coated film web again, a protective layer can also be applied inline in the same run with the ALD or MLD coating on an ALD or MLD coating that at the Weitverarbeitung the coated film web remains on this. In the further processing of the film web, it then forms the basis for any further layers applied to it, in particular OLED layers. The protective layer may also contain getter for water molecules. If the ALD or MLD coating is to serve as a transparent barrier layer for OLEDs, these must also be transparent. According to a further development of the invention, therefore, means are provided to generate the protective layer inline from a shapeless mass in the same run with the ALD or MLD coating. Since the protective layer becomes part of a final product such as an OLED, it is advantageous if the protective layer contains, in addition to a getter for water, also a getter for oxygen molecules. To ensure that the take-up capacity of the getters is not exhausted before a finished end product is present, the getters must be present in sufficient quantity, and the getter-containing film web must be sufficiently protected against ingress of atmospheric moisture and atmospheric oxygen. Within a roll, the getters are largely protected, since air can only be admitted at the end of the roll, which can be prevented by suitably designed protective packaging of the roll or blanks. The circumference of the roll is protected by the ALD / MLD thin films also present on the film web. The invention accordingly also provides a roll material with a film web on which thin layers are deposited by at least two self-limiting surface reactions (ALD / MLD), wherein the film web is rolled up together with an intermediate layer and / or provided with a protective layer on the thin layers, wherein the intermediate layer and / or the protective layer for water molecules is permeable and provided with getters for water molecules.

Alternatively, or in addition to getters for water and / or oxygen molecules, the protective layer may be electrically conductive to later form a transparent anode, for example, an OLED. If the protective layer is to contain getters and should be electrically conductive, two separate layers are preferably applied, wherein the layer applied first contains getters and the subsequently applied layer is electrically conductive.

The invention will be further explained by means of embodiments with reference to the drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

In each case only schematically show:

1 shows an embodiment of an inventive device with a coating plate and one of these oppositely disposed counter plate, with retractable and unrolling means and various auxiliary units.

2 shows in a partial cross section details of a possible construction of the coating and the counterplate with porous feed regions for a gas outlet distributed over these regions in a planar manner;

Fig. 3 at a) is a plan view of a group of supply and discharge areas for reaction and purge gas of a coating plate for performing an ALD coating cycle and b) a cross section of this group;

Fig. 4 at a) is a plan view of a different set of supply and discharge areas for reaction and purge gas of a coating plate for performing an ALD coating cycle and b) a cross section of this group;

5 shows a cross-section of a group of reaction and purge gas supply and discharge regions of a coating plate for performing an ALD coating cycle with a UV lamp associated with a reaction gas supply region;

6 is a cross-sectional view of a group of reaction and purge gas supply and discharge regions of a coating plate for performing an ALD coating cycle with a plasma source associated with a reaction gas supply region;

Fig. 7 is a cross-sectional view of a group of reaction and purge gas supply and discharge regions of a coating plate for performing an ALD coating cycle with another plasma source associated with a reaction gas supply region;

Fig. 8 under a) a plurality of pairs of coating and counter-plates, which a film web is fed in series and b) the same pairs in an open state;

9 shows under a) a plurality of pairs of coating and counter plates arranged in a stack, to which a film web is fed in series, and under b) the same pairs with a pair in an opened state;

10 shows a pair of plates in which also the counter-plate is designed as a coating plate.

FIG. 11 is a perspective view of a plate pair with two coating plates, wherein web deflection means are provided, through which the film web is fed after a first pass through the plate pair for further coating;

12 perspective view of four arranged in a stack of plate pairs each with coating plates, which a film web is fed in series and web turning means are provided, via which the film web is the four pairs after a first serial pass turned over for further coating;

Figure 13 is a stack arrangement with three pairs of plates through the two film webs or two parts of a film web in series, with separate guide rollers are provided for the two webs between the plate pairs;

14 shows an embodiment of an apparatus according to the invention with four plate pairs of coating plates arranged in a stack for a double pass of the film web, wherein a measuring device is arranged between the first and the second plate pair;

15 shows an embodiment of an apparatus according to the invention with four pairs of stacking plates for a double pass of the film web, wherein a measuring device is arranged between a pair for a one-sided precoating and the stack; and

16 shows an embodiment of the measuring device with a measuring plate and a counter-measuring plate under a) in a plan view of the inside of the measuring plate and b) in a cross section.

WAYS FOR CARRYING OUT THE INVENTION

The apparatus of Figure 1 comprises a roll R1 for unwinding and a roll R2 for unwinding a film web FB in a roll-to-roll process. The core of the device is a pair of plates 10 with a coating plate 1 and a counter-plate 2 for an ALD or MLD coating of the film web. The film web runs between two guide rollers U1, U2 stretched straight through a gap between the two plates 1,2 by without touching them by being held on gas cushion at a distance from the surface thereof. In the direction of travel of the film web in front of the pair of plates 1,2 different aggregates 30 are present for the preparation of the film web for their ALD or MLD coating. These include a particulate cleaning aggregate 31, for example in the form of a soft adhesive rubber roller or air blade, a surface treatment aggregate 32 for adhesion enhancement such as corona discharge, plasma treatment or ultraviolet irradiation, and a coating application aggregate 33. This may include a so-called slot die. The aggregate 33 for coating is followed by a drying section 34 for its drying and / or thermal or radiation-related crosslinking. The coating may be a so-called pre-planarizer and primer. As a further unit for preparing the film web for their coating is also a heating channel 35 is present, which is equipped for example with hot air feeds and / or with IR lamps to heat the film web to a favorable process temperature for their coating.

Downstream of the pair of plates 1, 2 in FIG. 1 is a measuring device 40, which, in terms of data technology, is connected to a device 50 arranged further back in the running direction of the film web for inscribing and / or coding the film web. These two devices will be described in more detail below.

The device of Fig. 1 is preferably set up and operated in a clean room, which is indicated by the drawn in Fig. 1 frame. At least the deflecting rollers provided with a dot pattern are so-called air rollers with a porous surface layer from which cleaned air flows out to form a gas cushion which keeps the film web at a distance from its web tension and so deflects it without contact.

Fig. 2 shows in section two short, opposite portions of the two, in the running direction of the film web FB itself substantially longer plates 1,2, below the coating plate 1 and above the counter-plate 2 is shown. The at the of the film web traversed gap 11 between the two plates 1,2 adjacent surfaces of these plates are flat. The coating plate 1 has a plurality of reaction and purge gas supply regions formed by ladle-like recesses filled with an open-porous porous sintered material. One of these pan-like depressions is designated by 12. Gas fed to the pan-like depressions 12 via channels, one of which is denoted by 13. The connection between the channels 13 and the pan-like recesses 12 is made by narrow grooves 14 in the bottom of the pan-like recesses 12. To overcome the back pressure caused by the porous material, the gas is supplied with a certain overpressure. Below and in the porous material distributes the gas supplied and occurs evenly distributed from this into the gap 11. Compared to the film web forms this supporting gas cushion.

For the derivation of the supplied via the feed regions gases Ableitungsbereiche are present, which are designed as grooves, one of which is denoted by 15. The grooves 15 open into further channels, one of which is denoted by 16. In order for the supplied gas to flow to the discharge areas, it requires a certain pressure drop in the direction of this.

The counter-plate 2 has at least one gas supply region extending over a plurality of supply and discharge regions of the coating plate 1, and this supply region is also formed using a porous material in a cup-like recess 17. Also from this porous material, the supplied gas exits evenly distributed and forms a gas cushion against the film web. The two-sided gas cushion keep the film web at a distance from the surfaces of the two plates 1, 2, so that the film web passes through contactlessly between them. One of the feed channels for supplying the at least one feed region with gas in the counterplate 2 is designated by 18.

The first four feed regions of FIG. 2 in the direction of travel of the film web, together with the two illustrated discharge regions, are suitable as a group, in particular for an ALD coating cycle using TMA and H 2 O as reaction gases and of N 2 as purge gas. The coating plate 1 is provided with a plurality of such groups, wherein in the partial view of Fig. 2 of the following group only two feed areas are shown. For the considered ALD process, the extent of the feed and discharge areas in the direction of the film web can be dimensioned as already indicated above. With these dimensions, 10-100 groups can be accommodated over a length of 1-3 m in the direction of travel of the film web for a corresponding number of ALD coating cycles. The preferred length of the two plates 1,2 is 2 m with 34 groups and more than 200 supply and discharge channels 12 and 15, respectively.

Preferably, the supply and discharge channels in this number are not individually led out of the coating plate 1, but within this interconnected so that the number of gas connections to the coating plate 1 is substantially lower. Particularly preferably, only one gas connection is present per gas type on the coating plate. In the case of an ALD coating cycle using TMA and H20 as reaction gases and of N2 as purge gas, these would be five ports, namely three for the supply of these gases and one port for the separate discharge of the TMA / N2 or H20 accumulating in the discharge regions / N2 exhaust gases.

The distances of the film web to both plates 1, 2 should be as low as stated above. The distance of the coating plate 1 of the counter-plate 2 can be fixed but also variable and in this case be determined by the pressure of the gas cushion against a counter force. A suitable counterforce can be applied mechanically, for example by compression springs, or pneumatically or hydraulically, wherein a plate is preferably arranged stationary. In a horizontal arrangement, the weight of the upper plate at least contribute to the counterforce.

Fig. 3a shows a plan view of the area of a group of supply and discharge areas for reaction and purge gas of a coating plate 1 for performing an ALD coating cycle, and Fig. 3b shows a cross section of this group. In the direction of the film web FB, the coating plate 1 may or should be provided with a plurality of such groups adjacent to one another. A feed zone for TMA as the reaction gas is cross-hatched transversely to the direction of travel of the film web and one for H 2 O as reaction gas in the direction of travel of the film web.

With a dot pattern, the areas are provided, is supplied via the N2 as purge gas. The derivation areas are not hatched. Except for the discharge areas, all surfaces are porous for an evenly distributed gas outlet. About the back plate 2 is also N2 or simply ambient air supplied. The first supply area for purge gas N2 in the direction of travel of the film web is wider than the three subsequent ones. If the illustrated group follows a corresponding group on the coating plate 1, the first supply zone for purge gas N2 follows a feed zone for H20. The widening of the first supply zone for purge gas N2 takes into account the fact that the desorption of H20 is a slower process than that of TMA.

3, discharge regions in the direction of travel of the film web are respectively provided adjacent to each of the two supply regions for reaction gas TMA and H20, wherein the flows illustrated by the arrows in FIG. 3b are established. All gases flow in and against the direction of the film web to the nearest discharge area. In FIG. 3 a, discharge regions are provided transversely to the running direction of the film web only in each case adjacent to the feed region for the reaction gas TMA. As a result, its outflow from the gap between the two plates 1, 2 should be prevented transversely to the running direction of the film web. Corresponding discharge areas are not provided at the supply area for the reaction gas H20, since the leakage of water into the environment is generally not critical. If this is not the case or if another reaction gas is used, lateral discharge areas could also be provided here. Finally, as also shown in FIG. 3a, the feed region for the purge gas extends transversely to the direction of travel of the film web on both sides beyond it, so that the film web is supported over its entire surface on a gas cushion. This also applies to the counter-plate 2, which preferably terminates at the edge with the coating plate 1.

Fig. 4a shows a plan view of a different set of supply and discharge areas for reaction and purge gas of a coating plate 1 for performing an ALD coating cycle and Fig. 4b shows a cross section of this group. This differs from the embodiment according to FIG. 3 in that here discharge areas in the running direction of the film web FB are present only adjacent to a pair of feed areas, wherein the direction of travel of the film web respectively front feed area of the pair of feed areas a feed area for purge gas and the rear is a feed region for reaction gas. This has the consequence that the purge gas flows counter to the direction of the film web, whereas the reaction gases flow in the direction of the film web. As a result, the feed areas for purge gas can be utilized virtually throughout its entire length, instead of only half the length for desorption of the reaction gases.

The halving of the number of exhaust slots allows to reduce the gas consumption for the gas cushion. Furthermore, the reaction gases are thereby better utilized: In the embodiment according to FIG. 3, TMA, for example, which flows out in the vicinity of an exhaust region adjoining to the left, can get into it without ever having come into contact with the film web.

The separation of the various reaction gases can be ensured in spite of the reduced number of discharge areas, that the purge gas pressure is slightly higher than the reaction gas pressure. A small part of the purge gas will thereby flow over the adjacent supply region for reaction gas into a more remote discharge region, which is also indicated in Fig. 4b) by a short arrow. The same can be achieved by a certain extension of the supply ranges for purge gas, for example by 20% compared to the supply areas for the reaction gases.

Since, as already mentioned, when using TMA and H 2 O as reaction gases, the desorption of H 2 O is slower than the desorption of TMA and thus rate-determining, also in FIG. 4 for a more effective desorption of H 2 O the feed region for purge gas in the direction of travel of the film web formed after the supply area for H20 longer than the supply area for purge gas in the direction of the film web after the supply area for TMA. However, the extension of the rinsing field for the H20 desorption alone makes only limited sense. In order to ensure the flow direction of the purge gas over a large portion of the length of the feed area against the film travel direction, the adjacent supply area for TMA must also be extended accordingly. The feed areas are characterized only in pairs the same length. The extension factor may e.g. 1.5 amount.

Fig. 5 shows a cross section of a group of reaction and purge gas supply and discharge regions of a coating plate 1 with opposing backing plate 2 for performing an ALD coating cycle. As in FIG. 4, discharge regions in the direction of travel of the film web FB are present only adjacent to a pair of feed regions. In the direction of the film web several such groups should be present to each other. A supply region 21 for a reaction gas is assigned a UV lamp 22. This is arranged in a groove between the feed region 21 and a discharge region 23 and extends transversely to the direction of travel of the film web over the width thereof. In the feed region 21, an ozone-containing gas is supplied which flows in the running direction of the film web completely over the UV lamp to the discharge region 23. The ozone (03) in the ozone-containing gas is preferably generated centrally for all supply areas to be supplied thereto in an external ozone generator (not shown) of oxygen-containing gas. The UV lamp 22 preferably generates UVC radiation and / or VUV radiation having a wavelength of 254 nm and / or 185 nm. With this radiation, oxygen radicals OVD) are generated from the ozone in the supplied ozone-containing gas flowing through the UV lamp 22 by photolysis. These react with a metal-containing reaction gas to form a metal oxide, which in the subsequent coating cycle in the second feed region is fed to the following group of feed and discharge regions (corresponding to the second feed region 24 of the illustrated group). Since the oxygen radicals O ('D) are very short-lived, the UV lamp is arranged at a small distance of, for example, 2 mm from the film web. Thus, a sufficiently large part of the generated radicals can come into contact with the film web. The UV lamp 22 may be provided on the back with a reflector in order to exploit the light emitted backwards against the coating plate 1. By touching contact with the coating plate 1, the UV lamp could also be cooled.

Instead of externally generated, ozone-containing gas oxygen radicals O ('D) as a reaction gas from supplied in the feed region 17, oxygen-containing gas locally by using a VUV lamp such as a Xe2 * -Ex-cimer lamp instead of the UV Lamp 22 are generated.

Fig. 6 shows a cross section of a group of supply and discharge areas for reaction and purge gas according to Fig. 5, but instead of the UV or VUV lamp 22 for generating oxygen radicals 0 (1D), a plasma source 25th is provided. A plasma is thereby generated by surface discharge (Surface Dielectric Barrier Discharge Plasma (SDBD)) directly in the gap between the plasma source 25 and the film web FB, which in turn due to short distances favorable in view of the short-lived oxygen radicals 0 (1D) , 25.1 and 25.2 designate high-voltage electrodes which are embedded in a dielectric 25.3. The high voltage electrodes are switched in phase opposition. In comparison to a circuit with only one HV electrode and one ground electrode, this can halve the necessary potential of the HV electrodes with respect to ground. 25.5 designates a channel for a cooling liquid also in the dielectric 25.3.

Fig. 7 shows a cross section of a group of supply and discharge areas for reaction and purge gas according to Fig. 6, but instead of the plasma source 25, a plasma source 26 is provided. In this case, the plasma is generated in a discharge zone in a gap between two adjacent dielectrics 26.3 and 26.4. The high-voltage electrodes 26.1 and 26.2, which are in turn connected in antiphase, are embedded in the two dielectrics by cooling channels 26.5 and 25.6. In this case, the oxygen-containing gas is not supplied via an adjoining supply region as in FIG. 6, but flows directly through the gap between the two dielectrics 26.3 and 26.4. The supply area 21 of FIG. 6 is thereby eliminated, with its space being used for the slightly wider plasma source 26. In this embodiment, an ion bombardment of the film web is avoided at the price of longer distances from the place of generation of the radicals to the film web FB. To bring the short-lived radicals nevertheless quickly from the discharge zone to the film web, a high flow rate can be adjusted. Because of the resulting high amount of gas can be used as the oxygen-containing gas air. If the gas flow through the discharge zone is sufficiently high, the cooling of the electrode can be dispensed with.

When using a plasma source, it does not necessarily require an increased process temperature. Preferably, the coating is carried out only slightly above the ambient temperature, so that heating means such as the heating channel 35 can be dispensed with at the same time moderate expense for the cooling of the plasma sources.

In the device according to the invention, a plurality of pairs of coating and counter plates 1, 2 may be provided, to which the film web is fed successively to achieve greater layer thicknesses. Fig. 8a shows such an arrangement with three pairs for ALD coating a film side, wherein the coating plates are each marked with ALD and the counter-plates in each case with N2, although air would be suitable for forming the gas cushion on the counter plates. The film web FB is deflected suitably by means of deflecting rollers 61, 62. In the illustrated arrangement, the freshly coated side of the film web is directed against the 61 designated deflection rollers. At least these are known as air rollers with porous surface layers. From these outflowing air forms opposite the film web gas cushion, which carry the film web and deflect without contact.

For any cleaning of the active surfaces of the plates 1, 2, these can be mounted, for example in a frame construction against each other movable so that they can be moved apart to expand the column 11 in positions as shown in Fig. 8b. In this case, the deflection rollers 61, 62 preferably each move together with the plates 1, 2, as FIG. 8b likewise shows.

Fig. 9a shows an arrangement again with three pairs of plates 1,2, but these are particularly space-saving arranged in a compact stack. In this case, it is preferred if one of the plates is mounted in a stationary manner and the other plates are movably mounted relative thereto. For any cleaning work, a gap 11 is extended after the other. 9 shows the stack with an enlarged gap 11. It is also provided here that the width of the column 11 is variable during the passage of the film web FB and is determined by the pressure of the gas cushion against a counterforce.

Instead of N2, in Fig. 8 and / or Fig. 9 also simply air can be supplied via the counter plates 2 to form the gas cushion.

If the counter-plate 2 is also formed as a coating plate 1, as shown in Fig. 10, the film web FB is coated on both sides. This may be convenient or necessary for certain applications. If two film webs are brought into contact with one another simultaneously by the apparatus of FIG. 10, only their outsides are coated in each case. In view of the fact that a multiple pass through a pair of plates 1, 2 may be required anyway to achieve a desired layer thickness, the device of Fig. 10 may be provided with web inverting means to double pass the same web in only one pass.

Fig. 11 shows such means. In FIG. 11, the film web FB passes from the left for the first time for the first time the horizontally arranged coating plate pair 1, 1 and is then deflected at right angles to the side (in FIG. 11 upward) with a first deflecting roller 71. A second guide roller 72 brings it in the opposite direction to its original direction so that it runs back past the coating plate pair 1, 1. With a third guide roller 73 is a rectangular deflection of the film web to the side against its incoming part (in Fig. 11) down) until it comes after a fourth, right-angle deflection with a guide roller 74 back in flight with its incoming part, but still moving in the opposite direction. With a fifth deflection roller 75, it is finally deflected by 180 ° without lateral deflection, whereafter, together with its incoming part, it passes through the coating plate pair 1, 1 a second time. After that, it runs double-sided coated in Fig. 11 straight ahead to the right. The deflection rollers 71-74 are each aligned diagonally with respect to the respective running direction of the film web and preferably have the same diameter. In the first deflection, the film web is offset by this diameter upwards and at the second deflection by the same amount back down to its original height. In the case of the third and the fourth deflection, in each case an offset is made downwards by this amount so that the film web passes under its incoming part. The double offset down is compensated by the fifth guide roller 75, by being twice as thick as the guide rollers 71-74 is formed. As a result, the film web is raised to its original height and that of its incoming part. Through the described deflections also takes a turn of the film web, so it comes to lie back-to-back with its incoming part on the second pass. By the film web is provided in Fig. 11 on its one, to be coated side with a stripe pattern, your orientation can be easily seen. All guide rollers 71-75 are designed as air rollers for a contactless deflection of the film web.

A double pass of the film web is also possible in series by a plurality of plate pairs or a plate stack. An example with four plate pairs is shown in FIG. 12 in a cross section. The film web FB passes in Fig. 12 from the left horizontally first, the lowest plate pair and occurs after passing through the two middle pairs of plates from the top plate pair horizontally to the left running out. Thereafter, it is first deflected at right angles to the side with a diagonal deflection roller 71 '. A second guide roller 72 'deflects it at a right angle downward without lateral deflection, after which it passes through the plate stack and its incoming part. With a third deflection roller 73 'is a further rectangular deflection without lateral deflection of the film web back towards their incoming part. Thereafter, it is deflected with a fourth, diagonally oriented deflection roller 74 'at right angles to the side so that it comes in alignment with its incoming part, but still moves in the opposite direction to this. With a fifth guide roller 75 ', it is finally deflected by 180 °, after which they come back together and back-to-back with their incoming part in the plate stack and this passes through a second time.

Since the guide rollers 72 'and 73' here neither come into contact with the coated side of the film web nor deflect it to the side, they can be designed as rolling rollers and be in contact with the film web.

Fig. 13 shows in cross-section a stack arrangement with three pairs of plates, wherein in contrast to Fig. 9 here all plates are formed as coating plates through which two film webs or two parts of a film web in series. In addition, separate guide rollers 63, 64 are provided for the two webs or partial webs between the plate pairs. This takes into account the fact that the respective outer track at the deflections must cover a longer path than the respective inner track. By separate guide rollers are provided for the two webs or partial webs, any problems with the web guide can be avoided by their longitudinal displacements against each other. The guide rollers 63, against which the freshly coated side of the film web is directed, are designed as air rollers for a non-contact deflection.

Fig. 14 shows a comparison with Fig. 1 extended embodiment of an inventive device with four pairs of arranged in a stack coating plates 1-8 for a double pass of the film web FB as described above. The measuring device 40 is here arranged between the first 1.2 and the second plate pair 3, 4, wherein the film web, however, passes through the measuring device 40 only after its first passage through this plate pair 1, 2. To enable a simple web guide on the measuring device 40, a placeholder 9 is arranged between the first 1, 2 and the second plate pair 3, 4. The example according to FIG. 12 executed return and turn the film web for a second pass is not shown in detail in Fig. 14. Only a portion of the recycled portion of the film web is designated by FB '.

After its coating in the double pass through the plate stack 1-8, the film web in the embodiment of FIG. 14 passes further units 80 for inline production of a layer or further coating of the film web, which in principle could already be provided in FIG ,

The layer produced with the aggregates 80 may be an intermediate layer (interleave) which is rolled up together with the film web on the roll R2, but whose processing is removed again at the latest after production of the end product (for example OLED). It must be detachable from the film web for this purpose. Such an intermediate layer serves primarily to cushion the thin and sensitive ALD or MLD layers on the roll R2 and to protect against damage. On the roll, the film web can namely be exposed to a considerable winding pressure. The intermediate layer can be produced from a formless, in particular liquid, crosslinkable resin composition which is poured or extruded, for example, from a sheet die onto a rotating coating roll. Even on the coating roller, the mass can be crosslinked with UV light, so that a self-supporting web is formed. This can then be merged with another roll with the film web. The material for the intermediate layer may also be an extruded, thermoplastically deformable so-called hot melt mixture, which does not require any crosslinking after the jobs. In this case, the UV irradiation can be omitted, but the coating roller would have to be designed as a cooling roller. The intermediate layer and the mentioned inline suitable for their production units are not shown in Fig. 14. The material used for the production of the intermediate layer can be provided with particular advantage also with getters for water molecules, to thereby keep the coated film web on the roll R2 to dry until their further processing or even dry in addition. The getter can also be applied to an additionally separately supplied film web (not shown) or enclosed between two additional separately supplied film webs.

It may be difficult to wind two webs together without at least a slight mutual adhesive effect. Therefore, it is preferred if the intermediate layer is provided with adhesive effects, as is known, for example, from those described in WO 2015/132 410 A1.

On the other hand, the layer produced with the aggregates 80 can be a protective layer permanently bonded to the film web for the ALD or MLD layers, which remains on the film web during further processing of the film web. In this case, the layer produced by the aggregates 80 may be permanently connected to the film web and must also be applied to the coated side of the film web, as shown in FIG. 14 also. In FIG. 14, the aggregates 80 correspondingly comprise an aggregate 81 for applying the coating to the moving film web, for example, again in the form of a slot die, followed by a drying section 82 for drying thereof and / or thermal or radiation-related crosslinking. Also, a protective layer permanently attached to the ALD or MLD layer may contain getters suitable for water and oxygen.

FIG. 15 shows yet another embodiment of a device according to the invention in turn with four pairs of coating plates 1-8 arranged in a stack for a double pass of the film web FB as in FIG. 14. In contrast to FIG. 14, the measuring device 40 however, disposed here between a precoat plate 91 and a precoat counterplate 92 and the complete stack of the eight coating plates 1-8. The counter plate is located directly on the back of the coating plate 1. The heating channel 35 located there in FIG. 14 is displaced accordingly against the film running direction. The precoat plate 91 may be configured like a counter plate 2 according to any one of the above-described coating plates 1 and the precoat counter plate 92. In the latter, air is preferably used to form the gas cushion.

The dashed line in Fig. 14 and Fig. 15 each indicated an encapsulation for the thermal insulation of the plate stack and the heating channel 35 and for the extraction of purge gas. A corresponding encapsulation could also be provided in FIG. 1.

FIG. 16 shows an embodiment of a measuring device 40, as is preferably used in FIGS. 1, 14 and 15. It serves to determine an OTR value of the ALD or MLD coating previously produced during the passage through the plate pair 1, 2 or 91, 92. The measuring device 40 has, similar to the pairs of coating and counter plates 1, 2, two opposing flat plates, wherein one of these plates is referred to below as a measuring plate 41 and the other as a counter-measuring plate 42. The film web FB runs between the two plates 41, 42 in a straight line supported on gas cushion contactlessly, as can be seen in Fig. 16b). Their previously coated during the passage through the plate pair 1, 2 and 91, 92 coated side is directed against the measuring plate 41. Both plates 41,42 are identical and arranged congruent. Their inner sides, as shown in FIG. 16a) in plan view of the inside of the measuring plate 41, have a central measuring zone 43, in which a collecting groove 44 with a central removal opening 45 is formed. Surrounded on all sides, the measuring zone 43 is surrounded by a porous area 46 for the distributed distribution of gas to form the gas cushion. In the region 46 in the direction of the film web in front of and behind the measuring zone 43 there are in each case two discharge regions extending transversely to this running direction, one of which is denoted by 47. The resulting gas flows are indicated by arrows in FIG. 16b). In the measuring plate 41, high-purity nitrogen N 2 is supplied as the gas for the gas cushion. In the counter plate 42, however, ambient air or pure oxygen is supplied to the gas cushion. In each case, a much smaller amount of gas is taken from the measuring zones, so that a certain back pressure is formed there. The gas taken from the measuring zone 43 of the measuring plate 41 is supplied as a measuring gas to an oxygen sensor (not shown) and subsequently discharged into the environment. In parallel with this, a corresponding quantity of the high-purity nitrogen N2 supplied to the gas cushion of the measuring plate 41 in the region 46 is branched off for background measurement and fed to a further oxygen sensor (not shown) and subsequently likewise released into the environment. The difference determined by the two oxygen sensors with regard to the oxygen content in both measured gases is based on the oxygen diffusion from the ambient air supplied via the counter-measuring plate 42 through the coated film web into the oxygen-free nitrogen gas of the measuring plate 41 and is therefore a measure of the desired OTR value.

The determination of the OTR value after only one pass of the film web through the plate pair 1, 2 or the plate pair 91.92 is advantageous over the determination of the OTR value after an optionally even double pass through all plate pairs 1-8, because the barrier layer produced in this case is not very thick and the OTR value is still relatively large. Accordingly, this value can be measured directly inline in a relatively short measuring time in the passage of the film web by the measuring device 40. For this reason, the pair of plates 91, 92 in the film running direction, as also shown in Fig. 15, can be even shorter than the plates 1-8, for example less than half as long. The arrangement of the measuring device in FIG. 15 has the advantage, compared to that of FIG. 14, that the use of oxygen-containing air in the counter-precoating plate 92 preconditions the film web with respect to O 2.

The OTR value which probably results after an optionally double pass through all disk pairs 1-8 can be determined by extrapolation based on offline comparative measurements. A favorable effect here is that likely leaks of the complete barrier, in particular due to foreign particles present on the film web, are already recognizable on the still incomplete barrier.

The measuring device 40 of FIG. 16 can also be used to determine an NTR value. In this case, high-purity argon may be supplied as the gas for the gas cushion in the measuring plate 41, and ^ sensors must be used instead of oxygen sensors. The counter-plate in this case would supply pure nitrogen N2 or air.

With the device 50, which is data-technically connected to the measuring device 40, the film web can be labeled and / or coded with the measured value determined by the measuring device 40 or a data derived therefrom in the same pass. This can be done by printing, embossing technology, punching technology, or by a change of material properties, for example with a laser. With inkjet printing technology, the required information can be accommodated in a few square millimeters, for example in the form of a 2D matrix code. So that the imprint does not bother or is not easily recognizable, it can be made with transparent or fluorescent ink. Since in the further processing of the coated film web, for example for OLED structures, only relatively short sections of 40-50 cm of the film web are required and these are subdivided even further, it is preferable to include each such section or even part with at least one measured value provided even if a reliable measurement can be determined only on a longer portion of the film web. The measured values can be applied, for example, in a raster of 100 mm × 100 mm, or in accordance with the subsequent further processing, in a peripheral zone which is not critical for subsequent further processing, but also on the non-coated rear side of the film web over its coated surface. The coding can also be carried out so that it can be read out later automatically, for example by contactless coding of magnetic strips or transponders present in an edge zone. The corresponding data could alternatively or additionally also be stored on mobile memories e.g. are stored in the film sleeve, from where they are available in the further processing of the coated film web or other requirements.

The coating and counter plates work basically in any position, preferably the horizontal, but more preferably the vertical position. In a horizontal position, a deflection of the plates under their weight may optionally be corrected by appropriate support. The same applies to the precoat plates and the plates of the measuring device. With dynamic adjustment of the plate spacing, a contribution of gravity to the opposing force is rather unfavorable, at least in the case of several plates arranged in abutment against one another in a stack.

LIST OF REFERENCE SIGNS

R1 roll for unrolling R2 roll for reeling FB, FB 'film web U1, U2 guide rollers 1-8 coating and counter plates 10 plate pair 11 gap 12 pan-like depressions 13 channels for gas supply 14 connecting grooves 15 grooves for gas discharge 16 channels for gas discharge 17 pan-like Recess 18 Feeding channels 21 Feeding area 21 for a reaction gas 22 UV lamp 23 Leading area 24 Second feed area 25 Plasma source 25.1.25.2 High voltage electrode 25.3 Dielectric 25.5 Channel for cooling liquid 26 Plasma source 26.3,26.4 Dielectrics 26.1.26.2 High voltage electrode 26.5,26.6 Cooling channels 30 Aggregates 31 Unit for particle cleaning 32 Aggregate for surface treatment 33 Aggregate for applying a coating 34 Drying section

Claims (15)

35 heating channel 40 measuring device 41 measuring plate 42 counter-measuring plate 43 measuring zone 44 collection groove 45 removal opening 46 porous area 47 discharge areas 50 Device for labeling and / or coding the film web 61.62 deflection rollers 63.64 deflection rollers 71-75 deflection rollers 71-75 'deflection rollers 80 aggregates 81 aggregate 81 for applying the coating 82 drying section 91 precoat plate 92 precoat counterclaim patent claims 1. Device for depositing thin layers by at least two self-limiting surface reactions (ALD / MLD) on a substrate (FB), wherein the device has at least one coating plate (1) and at least one oppositely arranged counter-plate (2), wherein the coating plate (1 ) has a plurality of feed regions (12) and discharge regions (15) for reaction and purge gas and the counter plate (2) at least one supply region (17) for purge gas or air, wherein means (R1, R2, U1, U2) are present, the substrate (FB) between the two plates (1, 2) to move through, and wherein the supplied gases form gas cushion, which supported the substrate (FB) in the passage between the two plates (1,2) against them and keep them at a distance from them , characterized in that the means (R1, R2, U1, U2) are adapted to as a substrate (FB) a film web in a straight alignment between the two plates (1,2) through to move, and that the coating plate (1) and / or the counter-plate (2) in at least one feed region (12, 17) is formed porous for a distributed over this area surface gas outlet. 2. Apparatus according to claim 1, characterized in that the two plates (1, 2) arranged to each other at a fixed distance or in a variable, by the pressure of the gas cushion against a counterforce certain distance against each other are movably mounted. 3. Device according to one of claims 1-2, characterized in that on the coating plate (1) per gas each only one gas connection is present, with the associated Zuführungs- or discharge areas (12, 15) of the coating plate (1) through channels (13, 16) in the coating plate (1) is in communication. 4. Device according to one of claims 1-3, characterized in that discharge areas (15) in the running direction of the film web (FB) in each case only adjacent to a pair of feed areas (12) are provided, wherein in the running direction of the film web (FB) respectively The front feed section of the pair of feed sections is a purge gas supply section and the rear section is a reaction gas feed section. 5. Device according to one of claims 1-4, characterized in that the feed regions (12) for reactivated ons and / or purge gas in the direction of the film web (FB) have a different extent. 6. Device according to one of claims 1-5, characterized in that the coating plate (1) transversely to the running direction of the film web (FB) on both sides of at least one feed region (12) for a reaction gas in each case a, of the film web (FB) overflow discharge area ( 15) for the reaction gas and / or a feed region (12) for purge gas. 7. Device according to one of claims 1-6, characterized in that a plurality of pairs of coating and counter-plates (1-8, ALD, N2) are arranged in series and preferably in a stack and web deflection means (61,62) are provided to to feed the film web (FB) to the individual pairs one after the other. 8. Device according to one of claims 1-7, characterized in that the counter-plate also formed as a coating plate and along the running direction of the film web (FB) a plurality of supply and discharge regions (12, 15) for reaction and purge gas, wherein the feed and diverting areas of both plates (1, 1) are preferably formed congruent, and wherein web turning means (71-75) are provided to turn the film web (FB) after a first pass between the two plates (1, 1) and the two Plates (1, 1) back to back with a part of the film web located in the first pass for a second pass between the two plates (1, 1) again. 9. Device according to one of claims 1-8, characterized in that at least one feed region (21) of a coating plate (1) a UV lamp (22), preferably a UVC radiation having a wavelength of 254 nm generating UV lamp, or a VUV lamp (22), preferably a Xe2 * -Excimerlampe with 172 nm wavelength associated with. 10. Device according to one of claims 1-9, characterized in that at least one supply region in a coating plate, a plasma source (25; 26) is associated. 11. Device according to one of claims 1-10, characterized in that means for heating and / or drying of the film web (FB) of the coating and counter-plate (1,2) in the running direction of the film web (FB) are arranged upstream, these Means preferably comprise a equipped with hot air feeders and / or IR radiators heating channel (35). 12. Device according to one of claims 1-11, characterized in that it is provided with a traversed by the film web (FB) measuring device (40), which only one coating and counter-plate (1,2) or only one Vorbeschichtungs- and Vorbeschichtungsgegenplatte (91, 92) is arranged downstream for the inline determination of OTR or NTR values of the deposited during the passage between these plates (1,2; 91,92) thin layers and wherein preferably the measuring device (40) data technically with a in the direction of Film web (FB) further rear device (50) for labeling and / or coding of the film web (FB) is connected to the determined OTR or NTR values. 13. Device according to one of claims 1-12, characterized in that means (R2) for rolling up the running film web (FB) together with a water molecules permeable and provided with getters for water molecules intermediate layer and means for producing the intermediate layer of a shapeless mass Inline in the same run with the coating of the film web are present. 14. The device according to any one of claims 1-13, characterized in that means (80) for producing a water molecules permeable and provided with getters for water and / or oxygen molecules protective layer on the thin, by at least two self-limiting surface reactions (ALD / MLD ) on the film web (FB) produced layers of an informal mass inline with the production of these thin layers in the same run of the film web are present, the getters are preferably transparent. 15. roll material with a film web (FB) on which by at least two self-limiting surface reactions (ALD / MLD) thin layers are deposited, characterized in that the film web (FB) rolled up together with an intermediate layer and / or on the thin layers with a Protective layer is provided, wherein the intermediate layer and / or the protective layer for water molecules is permeable and provided with getters for water and / or oxygen molecules.