CH655506B - - Google Patents
Info
- Publication number
- CH655506B CH655506B CH584382A CH584382A CH655506B CH 655506 B CH655506 B CH 655506B CH 584382 A CH584382 A CH 584382A CH 584382 A CH584382 A CH 584382A CH 655506 B CH655506 B CH 655506B
- Authority
- CH
- Switzerland
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB08133096A GB2109392B (en) | 1981-11-03 | 1981-11-03 | Photopolymerisable materials for use in producing screen printing stencils |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH655506B true CH655506B (US20110009641A1-20110113-C00273.png) | 1986-04-30 |
Family
ID=10525595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH584382A CH655506B (US20110009641A1-20110113-C00273.png) | 1981-11-03 | 1982-10-05 |
Country Status (9)
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4780486A (en) * | 1983-10-26 | 1988-10-25 | Dow Corning Corporation | Fast ultraviolet radiation curing silicone composition |
| US5162389A (en) * | 1983-10-26 | 1992-11-10 | Dow Corning Corporation | Fast ultraviolet radiation curing silicone composition having a high refractive index |
| US5124212A (en) * | 1983-10-26 | 1992-06-23 | Dow Corning Corporation | Articles prepared from fast ultraviolet radiation curing silicone composition |
| US4946874A (en) * | 1983-10-26 | 1990-08-07 | Dow Corning Corporation | Fast ultraviolet radiation curing silicone composition containing two vinyl polymers |
| US5169879A (en) * | 1983-10-26 | 1992-12-08 | Dow Corning Corporation | Fast ultraviolet radiation curing silicone composition |
| US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
| US4764395A (en) * | 1985-11-06 | 1988-08-16 | Ciba-Geigy Corporation | Process for finishing a textile fabric with a radiation crosslinkable compound |
| GB2202858A (en) * | 1987-03-26 | 1988-10-05 | Sericol Group Ltd | Photopolymerisable compositions for producing screen printing stencils |
| JPH0693118B2 (ja) * | 1987-06-15 | 1994-11-16 | 日本製紙株式会社 | 感光性シート |
| US5264318A (en) * | 1987-06-15 | 1993-11-23 | Sanyo-Kokusaku Pulp Co., Ltd. | Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin |
| GB8716378D0 (en) * | 1987-07-11 | 1987-08-19 | Autotype Int Ltd | Photopolymerisable compositions |
| US5128387A (en) * | 1987-07-28 | 1992-07-07 | Borden, Inc. | Extensible and pasteurizable radiation curable coating for metal |
| US5128391A (en) * | 1988-02-24 | 1992-07-07 | Borden, Inc. | Extensible and pasteurizable radiation curable coating for metal containing organofunctional silane adhesion promoter |
| US5015557A (en) * | 1989-09-14 | 1991-05-14 | Mais Ralph G | Silk screen process |
| GB2263699B (en) * | 1992-02-03 | 1995-11-29 | Sericol Ltd | Photopolymerizable alcohols and compositions containing them |
| US5359928A (en) * | 1992-03-12 | 1994-11-01 | Amtx, Inc. | Method for preparing and using a screen printing stencil having raised edges |
| IL111014A (en) * | 1994-09-21 | 1999-05-09 | Scitex Corp Ltd | Ink compositions and a method for making same |
| WO1999018134A1 (en) * | 1997-10-08 | 1999-04-15 | Angus Chemical Company | Uv cured coatings containing tertiary amino alcohols |
| US6092464A (en) * | 1998-03-19 | 2000-07-25 | M J Grant Company | Three-dimensional raised image screen printing |
| FR2816545B1 (fr) * | 2000-11-16 | 2003-08-15 | Grosfillex Sarl | Procede et installation d'impression par serigraphie, encre d'impression |
| US20040192876A1 (en) * | 2002-11-18 | 2004-09-30 | Nigel Hacker | Novolac polymer planarization films with high temparature stability |
| WO2005017617A1 (en) * | 2003-07-17 | 2005-02-24 | Honeywell International Inc. | Planarization films for advanced microelectronic applications and devices and methods of production thereof |
| ES2461491T3 (es) | 2008-12-12 | 2014-05-20 | Basf Se | Polivinilo lactamas modificadas |
| US20110218295A1 (en) * | 2010-03-02 | 2011-09-08 | Basf Se | Anionic associative rheology modifiers |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3136638A (en) * | 1959-06-26 | 1964-06-09 | Gen Aniline & Film Corp | Photosensitive stencil and process of making the same |
| US3448089A (en) * | 1966-03-14 | 1969-06-03 | Du Pont | Photopolymerizable polymers containing free acid or acid anhydride groups reacted with glycidyl acrylate or glycidyl methacrylate |
| US3510303A (en) * | 1966-12-29 | 1970-05-05 | Corning Glass Works | Thin emulsion deposition stencil screen and method |
| GB1307995A (en) * | 1970-03-06 | 1973-02-21 | Norprint Ltd | Photopolymerisation |
| JPS503041B1 (US20110009641A1-20110113-C00273.png) * | 1970-03-27 | 1975-01-31 | ||
| US3718473A (en) * | 1971-01-27 | 1973-02-27 | Du Pont | Photopolymerizable elements containing hydro philic colloids and polymerizable monomers for making gravure printing plate resists |
| US3787213A (en) * | 1972-01-19 | 1974-01-22 | J Gervay | Process for modifying surfaces using photopolymerizable elements comprising hydrophilic colloids and polymerizable monomers |
| BE795477A (fr) * | 1972-02-16 | 1973-05-29 | Quadrimetal Offset Le | Compositions photopolymerisables ameliorees |
| US3961961A (en) * | 1972-11-20 | 1976-06-08 | Minnesota Mining And Manufacturing Company | Positive or negative developable photosensitive composition |
| AU476446B2 (en) * | 1974-04-18 | 1976-09-23 | Japan Synthetic Rubber Co., Ltd | Photosensitive composition |
| JPS5917414B2 (ja) * | 1975-10-07 | 1984-04-21 | 村上スクリ−ン （株） | スクリ−ン版用感光性組成物及び感光膜 |
| JPS5290304A (en) * | 1976-01-24 | 1977-07-29 | Asahi Chemical Ind | Photoosensitive resin composition for making flexo graphic printing plate |
| DE2853921A1 (de) * | 1978-12-14 | 1980-07-03 | Basf Ag | Strahlungshaertbare waessrige bindemitteldispersionen |
| US4262084A (en) * | 1979-07-02 | 1981-04-14 | Imaging Sciences | Process for preparing a screen stencil |
| JPS568146A (en) * | 1979-07-03 | 1981-01-27 | Kansai Paint Co Ltd | Manufacture of screen plate material |
| US4252888A (en) * | 1980-02-26 | 1981-02-24 | Minnesota Mining And Manufacturing Company | Solder mask composition |
| JPS56120718A (en) * | 1980-02-28 | 1981-09-22 | Asahi Chem Ind Co Ltd | Improved polyurethane type photosensitive resin composition |
| US4360541A (en) * | 1981-02-23 | 1982-11-23 | Celanese Corporation | Radiation cured microvoid coatings |
| US4418138A (en) * | 1981-11-03 | 1983-11-29 | Sericol Group Limited | Photopolymerizable materials for use in producing stencils for screen printing |
-
1981
- 1981-11-03 GB GB08133096A patent/GB2109392B/en not_active Expired
-
1982
- 1982-09-22 US US06/421,270 patent/US4499175A/en not_active Expired - Lifetime
- 1982-09-29 DE DE19823236068 patent/DE3236068A1/de active Granted
- 1982-09-30 NL NL8203802A patent/NL8203802A/nl not_active Application Discontinuation
- 1982-09-30 IT IT23544/82A patent/IT1163009B/it active
- 1982-10-05 CH CH584382A patent/CH655506B/de unknown
- 1982-10-06 CA CA000412897A patent/CA1200037A/en not_active Expired
- 1982-10-12 BE BE0/209229A patent/BE894686A/fr not_active IP Right Cessation
- 1982-10-13 FR FR8217132A patent/FR2515835B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1163009B (it) | 1987-04-08 |
| CA1200037A (en) | 1986-01-28 |
| GB2109392B (en) | 1985-06-26 |
| DE3236068A1 (de) | 1983-05-11 |
| BE894686A (fr) | 1983-01-31 |
| FR2515835B1 (fr) | 1986-02-07 |
| IT8223544A0 (it) | 1982-09-30 |
| DE3236068C2 (US20110009641A1-20110113-C00273.png) | 1993-01-28 |
| US4499175A (en) | 1985-02-12 |
| GB2109392A (en) | 1983-06-02 |
| FR2515835A1 (fr) | 1983-05-06 |
| NL8203802A (nl) | 1983-06-01 |
