CH606474A5 - - Google Patents

Info

Publication number
CH606474A5
CH606474A5 CH1543074A CH1543074A CH606474A5 CH 606474 A5 CH606474 A5 CH 606474A5 CH 1543074 A CH1543074 A CH 1543074A CH 1543074 A CH1543074 A CH 1543074A CH 606474 A5 CH606474 A5 CH 606474A5
Authority
CH
Switzerland
Application number
CH1543074A
Inventor
William L Underkofler
Theodore D Zucconi
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of CH606474A5 publication Critical patent/CH606474A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents
    • C23C18/405—Formaldehyde
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/38—Coating with copper
    • C23C18/40—Coating with copper using reducing agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
CH1543074A 1973-12-17 1974-11-20 CH606474A5 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00425363A US3844799A (en) 1973-12-17 1973-12-17 Electroless copper plating

Publications (1)

Publication Number Publication Date
CH606474A5 true CH606474A5 (xx) 1978-10-31

Family

ID=23686229

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1543074A CH606474A5 (xx) 1973-12-17 1974-11-20

Country Status (10)

Country Link
US (1) US3844799A (xx)
JP (1) JPS5713623B2 (xx)
BR (1) BR7410493D0 (xx)
CA (1) CA1036876A (xx)
CH (1) CH606474A5 (xx)
ES (1) ES433445A1 (xx)
FR (1) FR2254652B1 (xx)
GB (1) GB1454946A (xx)
IT (1) IT1025917B (xx)
NL (1) NL7415500A (xx)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4431685A (en) * 1982-07-02 1984-02-14 International Business Machines Corporation Decreasing plated metal defects
US4478883A (en) * 1982-07-14 1984-10-23 International Business Machines Corporation Conditioning of a substrate for electroless direct bond plating in holes and on surfaces of a substrate
US4707377A (en) * 1983-10-31 1987-11-17 International Business Machines Corporation Copper plating
JPS6096767A (ja) * 1983-10-31 1985-05-30 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 銅めつき方法
US4534797A (en) * 1984-01-03 1985-08-13 International Business Machines Corporation Method for providing an electroless copper plating bath in the take mode
US4525390A (en) * 1984-03-09 1985-06-25 International Business Machines Corporation Deposition of copper from electroless plating compositions
US4650333A (en) * 1984-04-12 1987-03-17 International Business Machines Corporation System for measuring and detecting printed circuit wiring defects
US4655833A (en) * 1984-05-17 1987-04-07 International Business Machines Corporation Electroless copper plating bath and improved stability
US4666858A (en) * 1984-10-22 1987-05-19 International Business Machines Corporation Determination of amount of anionic material in a liquid sample
US4639380A (en) * 1985-05-06 1987-01-27 International Business Machines Corporation Process for preparing a substrate for subsequent electroless deposition of a metal
US4654126A (en) * 1985-10-07 1987-03-31 International Business Machines Corporation Process for determining the plating activity of an electroless plating bath
US4904506A (en) * 1986-01-03 1990-02-27 International Business Machines Corporation Copper deposition from electroless plating bath
DE3668914D1 (de) * 1986-04-11 1990-03-15 Ibm Deutschland Verfahren zur regenerierung eines stromlosen verkupferungsbades und vorrichtung zur durchfuehrung desselben.
US4908242A (en) * 1986-10-31 1990-03-13 Kollmorgen Corporation Method of consistently producing a copper deposit on a substrate by electroless deposition which deposit is essentially free of fissures
US5318803A (en) * 1990-11-13 1994-06-07 International Business Machines Corporation Conditioning of a substrate for electroless plating thereon
US5316803A (en) * 1992-12-10 1994-05-31 International Business Machines Corporation Method for forming electrical interconnections in laminated vias
US5495665A (en) * 1994-11-04 1996-03-05 International Business Machines Corporation Process for providing a landless via connection
US5773132A (en) * 1997-02-28 1998-06-30 International Business Machines Corporation Protecting copper dielectric interface from delamination
US6197688B1 (en) 1998-02-12 2001-03-06 Motorola Inc. Interconnect structure in a semiconductor device and method of formation
US6852152B2 (en) * 2002-09-24 2005-02-08 International Business Machines Corporation Colloidal seed formulation for printed circuit board metallization
JP5820202B2 (ja) * 2010-09-30 2015-11-24 Ｄｏｗａエレクトロニクス株式会社 導電性ペースト用銅粉およびその製造方法

Also Published As

Publication number Publication date
ES433445A1 (es) 1977-01-01
CA1036876A (en) 1978-08-22
BR7410493D0 (pt) 1975-09-16
GB1454946A (en) 1976-11-10
US3844799A (en) 1974-10-29
NL7415500A (nl) 1975-06-19
JPS5093235A (xx) 1975-07-25
JPS5713623B2 (xx) 1982-03-18
DE2442935A1 (de) 1975-06-19
FR2254652B1 (xx) 1976-10-22
DE2442935B2 (de) 1976-01-08
FR2254652A1 (xx) 1975-07-11
IT1025917B (it) 1978-08-30

Similar Documents

Publication Publication Date Title
AR201758A1 (xx)
AU476761B2 (xx)
AR201235Q (xx)
AR201231Q (xx)
AU474593B2 (xx)
AU474511B2 (xx)
AU474838B2 (xx)
FR2254652A1 (xx)
AU476714B2 (xx)
AR201229Q (xx)
AU472848B2 (xx)
AU476696B2 (xx)
AR199451A1 (xx)
AU477823B2 (xx)
AR195948A1 (xx)
AR197627A1 (xx)
AR200256A1 (xx)
AR196382A1 (xx)
AR195311A1 (xx)
AR201432A1 (xx)
AU476873B1 (xx)
AR200885A1 (xx)
AU477824B2 (xx)
AR210729A1 (xx)
AR196123Q (xx)

Legal Events

Date Code Title Description
PL Patent ceased