CH601492A5 - - Google Patents

Info

Publication number
CH601492A5
CH601492A5 CH145176A CH145176A CH601492A5 CH 601492 A5 CH601492 A5 CH 601492A5 CH 145176 A CH145176 A CH 145176A CH 145176 A CH145176 A CH 145176A CH 601492 A5 CH601492 A5 CH 601492A5
Authority
CH
Switzerland
Application number
CH145176A
Inventor
Jiri Dlouhy
Original Assignee
Bbc Brown Boveri & Cie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bbc Brown Boveri & Cie filed Critical Bbc Brown Boveri & Cie
Priority to CH145176A priority Critical patent/CH601492A5/xx
Priority to DE19767606084 priority patent/DE7606084U1/de
Priority to DE19762608323 priority patent/DE2608323A1/de
Publication of CH601492A5 publication Critical patent/CH601492A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH145176A 1976-02-06 1976-02-06 CH601492A5 (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CH145176A CH601492A5 (enrdf_load_stackoverflow) 1976-02-06 1976-02-06
DE19767606084 DE7606084U1 (de) 1976-02-06 1976-02-28 Anordnung zum zerstaeuben von festkoerpern im hochvakuum, insbesondere von dielektrischen stoffen in wechselspannungs- kathodenzerstaeubungs-anlagen
DE19762608323 DE2608323A1 (de) 1976-02-06 1976-02-28 Anordnung zum zerstaeuben von festkoerpern im hochvakuum, insbesondere von dielektrischen stoffen in wechselspannungs- kathodenzerstaeubungs-anlagen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH145176A CH601492A5 (enrdf_load_stackoverflow) 1976-02-06 1976-02-06

Publications (1)

Publication Number Publication Date
CH601492A5 true CH601492A5 (enrdf_load_stackoverflow) 1978-07-14

Family

ID=4210768

Family Applications (1)

Application Number Title Priority Date Filing Date
CH145176A CH601492A5 (enrdf_load_stackoverflow) 1976-02-06 1976-02-06

Country Status (2)

Country Link
CH (1) CH601492A5 (enrdf_load_stackoverflow)
DE (2) DE7606084U1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19527476A1 (de) * 1995-07-27 1997-01-30 Leybold Ag Sputtertarget, insbesondere mit großen Abmessungen, sowie ein Verfahren zu seiner Herstellung

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2685011B1 (fr) * 1991-12-13 1994-02-04 Elf Aquitaine Ste Nale Procede de preparation d'un element de cible pour pulverisation cathodique et cibles, notamment de grande surface, realisees a partir de cet element.
US6340415B1 (en) 1998-01-05 2002-01-22 Applied Materials, Inc. Method and apparatus for enhancing a sputtering target's lifetime
DE102006008973B4 (de) * 2006-02-23 2014-09-11 Von Ardenne Anlagentechnik Gmbh Kühlbare Trägerplatte für Targets in Vakuumzerstäubungsanlagen
DE202015100433U1 (de) 2014-01-30 2015-02-09 Fhr Anlagenbau Gmbh Fügeverbindung zwischen zwei Elementen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19527476A1 (de) * 1995-07-27 1997-01-30 Leybold Ag Sputtertarget, insbesondere mit großen Abmessungen, sowie ein Verfahren zu seiner Herstellung

Also Published As

Publication number Publication date
DE7606084U1 (de) 1978-01-26
DE2608323A1 (de) 1977-08-11

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Legal Events

Date Code Title Description
PL Patent ceased
PL Patent ceased