CH597362A5 - - Google Patents
Info
- Publication number
- CH597362A5 CH597362A5 CH1816373A CH1816373A CH597362A5 CH 597362 A5 CH597362 A5 CH 597362A5 CH 1816373 A CH1816373 A CH 1816373A CH 1816373 A CH1816373 A CH 1816373A CH 597362 A5 CH597362 A5 CH 597362A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45576—Coaxial inlets for each gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD16806572A DD106417A1 (US06589383-20030708-C00041.png) | 1972-12-27 | 1972-12-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH597362A5 true CH597362A5 (US06589383-20030708-C00041.png) | 1978-03-31 |
Family
ID=5489648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1816373A CH597362A5 (US06589383-20030708-C00041.png) | 1972-12-27 | 1973-12-27 |
Country Status (7)
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3869793D1 (de) * | 1987-01-27 | 1992-05-14 | Asahi Glass Co Ltd | Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase. |
| DE3741708A1 (de) * | 1987-12-09 | 1989-06-22 | Asea Brown Boveri | Einrichtung zur materialabscheidung aus der gasphase |
| DE102005056322A1 (de) * | 2005-11-25 | 2007-06-06 | Aixtron Ag | VPE-Reaktor mit koaxial zueinander angeordneten Quellgasrohren |
-
1972
- 1972-12-27 DD DD16806572A patent/DD106417A1/xx unknown
-
1973
- 1973-11-03 DE DE19732355058 patent/DE2355058A1/de active Pending
- 1973-12-05 CS CS839273A patent/CS169180B1/cs unknown
- 1973-12-17 GB GB5840473A patent/GB1451643A/en not_active Expired
- 1973-12-17 PL PL16739373A patent/PL89600B1/pl unknown
- 1973-12-26 FR FR7346389A patent/FR2221535B3/fr not_active Expired
- 1973-12-27 CH CH1816373A patent/CH597362A5/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| FR2221535B3 (US06589383-20030708-C00041.png) | 1976-10-22 |
| PL89600B1 (US06589383-20030708-C00041.png) | 1976-11-30 |
| GB1451643A (US06589383-20030708-C00041.png) | 1976-10-06 |
| DD106417A1 (US06589383-20030708-C00041.png) | 1974-06-12 |
| DE2355058A1 (de) | 1974-07-11 |
| CS169180B1 (US06589383-20030708-C00041.png) | 1976-07-29 |
| FR2221535A1 (US06589383-20030708-C00041.png) | 1974-10-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |