CH588768A5 - - Google Patents

Info

Publication number
CH588768A5
CH588768A5 CH617175A CH617175A CH588768A5 CH 588768 A5 CH588768 A5 CH 588768A5 CH 617175 A CH617175 A CH 617175A CH 617175 A CH617175 A CH 617175A CH 588768 A5 CH588768 A5 CH 588768A5
Authority
CH
Switzerland
Application number
CH617175A
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH588768A5 publication Critical patent/CH588768A5/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
  • Diaphragms And Bellows (AREA)
CH617175A 1974-05-27 1975-05-14 CH588768A5 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2425464A DE2425464C3 (de) 1974-05-27 1974-05-27 Verfahren zur Herstellung von Dunnschicht-Aperturblenden für Korpuskularstrahlgeräte

Publications (1)

Publication Number Publication Date
CH588768A5 true CH588768A5 (xx) 1977-06-15

Family

ID=5916520

Family Applications (1)

Application Number Title Priority Date Filing Date
CH617175A CH588768A5 (xx) 1974-05-27 1975-05-14

Country Status (6)

Country Link
US (1) US3988153A (xx)
JP (1) JPS5110759A (xx)
CH (1) CH588768A5 (xx)
DE (1) DE2425464C3 (xx)
GB (1) GB1509077A (xx)
NL (1) NL7505676A (xx)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5272563A (en) * 1975-12-12 1977-06-17 Heidenhain Gmbh Dr Johannes Electrooptically transmissive structure
US4075497A (en) * 1975-12-31 1978-02-21 Dr. Johannes Heidenhain Gmbh Electron-optically radiatable structure
US4180604A (en) * 1977-12-30 1979-12-25 International Business Machines Corporation Two layer resist system
US4238559A (en) * 1978-08-24 1980-12-09 International Business Machines Corporation Two layer resist system
JPS5562732A (en) * 1978-11-06 1980-05-12 Chiyou Lsi Gijutsu Kenkyu Kumiai Preparation of aperture stop
US4379737A (en) * 1981-11-18 1983-04-12 Armstrong World Industries, Inc. Method to make a built up area rotary printing screen
DE3338717A1 (de) * 1983-10-25 1985-05-02 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung einer roentgenmaske mit metalltraegerfolie
GB2150596A (en) * 1983-11-30 1985-07-03 Pa Consulting Services Mesh structures especially for use in television camera tubes
DE3401963A1 (de) * 1984-01-20 1985-07-25 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von fotoresiststrukturen mit gestuften flanken
US5401932A (en) * 1992-02-07 1995-03-28 Matsushita Electric Industrial Co., Ltd. Method of producing a stencil mask
US5339347A (en) * 1993-04-27 1994-08-16 The United States Of America As Represented By The United States Department Of Energy Method for microbeam radiation therapy
US8240217B2 (en) * 2007-10-15 2012-08-14 Kavlico Corporation Diaphragm isolation forming through subtractive etching
JP2013101929A (ja) 2011-11-07 2013-05-23 Fei Co 荷電粒子ビーム・システムの絞り
CN104599927B (zh) * 2014-12-24 2016-11-30 西安理工大学 一种多孔光阑的制备方法
EP3389055A1 (de) * 2017-04-11 2018-10-17 Siemens Healthcare GmbH Röntgeneinrichtung zur erzeugung von hochenergetischer röntgenstrahlung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2874101A (en) * 1952-09-17 1959-02-17 Farnsworth Res Corp Method of making double-sided mosaic
US3227880A (en) * 1963-08-29 1966-01-04 Bbc Brown Boveri & Cie Collimator for beams of high-velocity electrons
US3421000A (en) * 1965-10-22 1969-01-07 Unit Process Assemblies Workpiece support and mask assemblies for radiation backscatter measuring instruments
US3449221A (en) * 1966-12-08 1969-06-10 Dynamics Res Corp Method of making a monometallic mask
US3847689A (en) * 1972-01-28 1974-11-12 Nasa Method of forming aperture plate for electron microscope

Also Published As

Publication number Publication date
DE2425464B2 (de) 1978-03-09
GB1509077A (en) 1978-04-26
DE2425464A1 (de) 1975-12-11
US3988153A (en) 1976-10-26
NL7505676A (nl) 1975-12-01
DE2425464C3 (de) 1978-11-02
JPS5110759A (xx) 1976-01-28

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Legal Events

Date Code Title Description
PL Patent ceased