CH586118A5 - - Google Patents

Info

Publication number
CH586118A5
CH586118A5 CH17775A CH17775A CH586118A5 CH 586118 A5 CH586118 A5 CH 586118A5 CH 17775 A CH17775 A CH 17775A CH 17775 A CH17775 A CH 17775A CH 586118 A5 CH586118 A5 CH 586118A5
Authority
CH
Switzerland
Application number
CH17775A
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH17775A priority Critical patent/CH586118A5/xx
Priority to NL7504118A priority patent/NL7504118A/xx
Priority to DE2557667A priority patent/DE2557667B2/de
Priority to GB52523/75A priority patent/GB1485097A/en
Priority to FR7600096A priority patent/FR2297093A1/fr
Publication of CH586118A5 publication Critical patent/CH586118A5/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
CH17775A 1975-01-07 1975-01-07 CH586118A5 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CH17775A CH586118A5 (de) 1975-01-07 1975-01-07
NL7504118A NL7504118A (nl) 1975-01-07 1975-04-07 Werkwijze voor het aanbrengen van naast elkaar liggende, dicht aan elkaar aansluitende, ver- schillende lagen op een transparante onderlaag.
DE2557667A DE2557667B2 (de) 1975-01-07 1975-12-20 Verfahren zur Aufbringung von nebeneinanderliegenden, dicht aneinander anschließenden unterschiedlichen Belägen auf einer lichtdurchlässigen Unterlage
GB52523/75A GB1485097A (en) 1975-01-07 1975-12-23 Coatings on a transparent substrate
FR7600096A FR2297093A1 (fr) 1975-01-07 1976-01-05 Procede pour deposer des revetements differents contigus jointifs sur un substrat transparent et produits obtenus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH17775A CH586118A5 (de) 1975-01-07 1975-01-07

Publications (1)

Publication Number Publication Date
CH586118A5 true CH586118A5 (de) 1977-03-31

Family

ID=4181012

Family Applications (1)

Application Number Title Priority Date Filing Date
CH17775A CH586118A5 (de) 1975-01-07 1975-01-07

Country Status (5)

Country Link
CH (1) CH586118A5 (de)
DE (1) DE2557667B2 (de)
FR (1) FR2297093A1 (de)
GB (1) GB1485097A (de)
NL (1) NL7504118A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3712335A1 (de) * 1987-04-11 1988-10-20 Vdo Schindling Verfahren zur herstellung einer struktur
GB9203595D0 (en) * 1992-02-20 1992-04-08 Philips Electronics Uk Ltd Methods of fabricating thin film structures and display devices produced thereby
JP2500050B2 (ja) * 1992-11-13 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション リム型の位相シフト・マスクの形成方法
DE102004034417B4 (de) * 2004-07-15 2007-09-27 Schott Ag Verfahren zur Herstellung eines beschichteten Substrats mit gewölbter Oberfläche

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH284109A (de) * 1952-02-06 1952-07-15 Ernst Jun Dr Ruest Verfahren zur Herstellung von mit Teilungen, Gittern, Strichzeichnungen, Flächenmarken usw. versehenen Gegenständen.
DE1060717B (de) * 1956-04-13 1959-07-02 Franz Wagner Verfahren zur Herstellung von Rastern, Zeichnungen u. a. auf Filmen, Glaesern und anderen Traegern

Also Published As

Publication number Publication date
DE2557667A1 (de) 1976-07-08
NL7504118A (nl) 1976-07-09
GB1485097A (en) 1977-09-08
FR2297093A1 (fr) 1976-08-06
DE2557667B2 (de) 1978-08-24

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Legal Events

Date Code Title Description
PL Patent ceased