CH584917A5 - - Google Patents
Info
- Publication number
- CH584917A5 CH584917A5 CH463074A CH463074A CH584917A5 CH 584917 A5 CH584917 A5 CH 584917A5 CH 463074 A CH463074 A CH 463074A CH 463074 A CH463074 A CH 463074A CH 584917 A5 CH584917 A5 CH 584917A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH463074A CH584917A5 (enrdf_load_html_response) | 1974-04-03 | 1974-04-03 | |
ES434873A ES434873A1 (es) | 1974-04-03 | 1975-02-19 | Procedimiento para la fabricacion de fotoplantillas para impresion serigrafica. |
DE19752514213 DE2514213A1 (de) | 1974-04-03 | 1975-04-01 | Verfahren zur herstellung von photoschablonen |
NL7503998A NL7503998A (nl) | 1974-04-03 | 1975-04-03 | Werkwijze voor het maken van fotosjablonen. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH463074A CH584917A5 (enrdf_load_html_response) | 1974-04-03 | 1974-04-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH584917A5 true CH584917A5 (enrdf_load_html_response) | 1977-02-15 |
Family
ID=4279717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH463074A CH584917A5 (enrdf_load_html_response) | 1974-04-03 | 1974-04-03 |
Country Status (4)
Country | Link |
---|---|
CH (1) | CH584917A5 (enrdf_load_html_response) |
DE (1) | DE2514213A1 (enrdf_load_html_response) |
ES (1) | ES434873A1 (enrdf_load_html_response) |
NL (1) | NL7503998A (enrdf_load_html_response) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54121802A (en) * | 1978-03-13 | 1979-09-21 | Tokyo Ouka Kougiyou Kk | Photosensitive printing plate |
JPH0269746A (ja) * | 1988-08-01 | 1990-03-08 | Internatl Business Mach Corp <Ibm> | ホトレジストの形成方法、ポリマー構造体、ホトレジスト |
-
1974
- 1974-04-03 CH CH463074A patent/CH584917A5/xx not_active IP Right Cessation
-
1975
- 1975-02-19 ES ES434873A patent/ES434873A1/es not_active Expired
- 1975-04-01 DE DE19752514213 patent/DE2514213A1/de not_active Withdrawn
- 1975-04-03 NL NL7503998A patent/NL7503998A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
DE2514213A1 (de) | 1975-10-16 |
ES434873A1 (es) | 1976-12-16 |
NL7503998A (nl) | 1975-10-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased | ||
PL | Patent ceased |