CH572101A5 - - Google Patents

Info

Publication number
CH572101A5
CH572101A5 CH660773A CH660773A CH572101A5 CH 572101 A5 CH572101 A5 CH 572101A5 CH 660773 A CH660773 A CH 660773A CH 660773 A CH660773 A CH 660773A CH 572101 A5 CH572101 A5 CH 572101A5
Authority
CH
Switzerland
Application number
CH660773A
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cit Alcatel filed Critical Cit Alcatel
Publication of CH572101A5 publication Critical patent/CH572101A5/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Ceramic Capacitors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
CH660773A 1972-05-12 1973-05-10 CH572101A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7217007A FR2183603B1 (en) 1972-05-12 1972-05-12

Publications (1)

Publication Number Publication Date
CH572101A5 true CH572101A5 (en) 1976-01-30

Family

ID=9098417

Family Applications (1)

Application Number Title Priority Date Filing Date
CH660773A CH572101A5 (en) 1972-05-12 1973-05-10

Country Status (6)

Country Link
BE (1) BE799398A (en)
CH (1) CH572101A5 (en)
DE (1) DE2323988C2 (en)
FR (1) FR2183603B1 (en)
GB (1) GB1372167A (en)
IT (1) IT987402B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0200088A1 (en) * 1985-05-03 1986-11-05 Fried. Krupp Gesellschaft mit beschränkter Haftung Wear-resistant coated hard-metal body and method for the production thereof

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2359432C3 (en) * 1973-11-29 1984-08-09 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Process for the production of aluminum-coated foils for capacitors and device for carrying out the process
GB9225270D0 (en) * 1992-12-03 1993-01-27 Gec Ferranti Defence Syst Depositing different materials on a substrate
GB2273110B (en) * 1992-12-03 1996-01-24 Gec Marconi Avionics Holdings Depositing different materials on a substrate
AU2004269356A1 (en) * 2003-08-29 2005-03-10 Northrop Grumman Corporation Titanium foil metallization product and process
US6923868B2 (en) 2003-09-23 2005-08-02 Gba S.A. Installation for electron-ray coatication of coatings

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1257918B (en) * 1962-12-18 1968-01-04 Siemens Ag Integrated circuit
US3432913A (en) * 1962-12-26 1969-03-18 Philips Corp Method of joining a semi-conductor to a base
US3371406A (en) * 1965-11-26 1968-03-05 Philips Corp Hermetic electrical lead-in assembly
US3418423A (en) * 1966-12-23 1968-12-24 Philips Corp Fluorine-resistant electrical terminal
DE1954499A1 (en) * 1969-10-29 1971-05-06 Siemens Ag Process for the production of semiconductor circuits with interconnects

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0200088A1 (en) * 1985-05-03 1986-11-05 Fried. Krupp Gesellschaft mit beschränkter Haftung Wear-resistant coated hard-metal body and method for the production thereof
US4728579A (en) * 1985-05-03 1988-03-01 Fried. Krupp Gesellschaft Mit Beschrankter Haftung Wear resistant, coated, metal carbide body and a method for its production

Also Published As

Publication number Publication date
DE2323988A1 (en) 1973-11-22
FR2183603A1 (en) 1973-12-21
IT987402B (en) 1975-02-20
DE2323988C2 (en) 1982-10-28
FR2183603B1 (en) 1974-08-30
BE799398A (en) 1973-11-12
GB1372167A (en) 1974-10-30

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Legal Events

Date Code Title Description
PL Patent ceased