CH567104A5 - - Google Patents

Info

Publication number
CH567104A5
CH567104A5 CH892472A CH892472A CH567104A5 CH 567104 A5 CH567104 A5 CH 567104A5 CH 892472 A CH892472 A CH 892472A CH 892472 A CH892472 A CH 892472A CH 567104 A5 CH567104 A5 CH 567104A5
Authority
CH
Switzerland
Application number
CH892472A
Original Assignee
Leybold Heraeus Verwaltung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus Verwaltung filed Critical Leybold Heraeus Verwaltung
Publication of CH567104A5 publication Critical patent/CH567104A5/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
CH892472A 1971-10-05 1972-06-15 CH567104A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712149606 DE2149606C3 (en) 1971-10-05 1971-10-05 Device for coating substrates by high-frequency cathode sputtering

Publications (1)

Publication Number Publication Date
CH567104A5 true CH567104A5 (en) 1975-09-30

Family

ID=5821500

Family Applications (1)

Application Number Title Priority Date Filing Date
CH892472A CH567104A5 (en) 1971-10-05 1972-06-15

Country Status (3)

Country Link
CH (1) CH567104A5 (en)
DE (1) DE2149606C3 (en)
FR (1) FR2156032A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169031A (en) * 1978-01-13 1979-09-25 Polyohm, Inc. Magnetron sputter cathode assembly
US4362611A (en) * 1981-07-27 1982-12-07 International Business Machines Corporation Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
US5292394A (en) * 1991-11-13 1994-03-08 Leybold Aktiengesellschaft Apparatus for large-area ionic etching
DE102004029466A1 (en) * 2004-06-18 2006-01-05 Leybold Optics Gmbh Medieninjektor

Also Published As

Publication number Publication date
DE2149606B2 (en) 1979-04-05
FR2156032B1 (en) 1978-03-03
DE2149606C3 (en) 1979-12-06
FR2156032A1 (en) 1973-05-25
DE2149606A1 (en) 1973-04-12

Similar Documents

Publication Publication Date Title
ATA136472A (en)
AU2658571A (en)
AU2691671A (en)
AU2485671A (en)
AU3005371A (en)
AU2952271A (en)
AU2941471A (en)
AU2894671A (en)
AU2742671A (en)
AU2684071A (en)
AU2564071A (en)
AU2473671A (en)
AU2399971A (en)
AU3038671A (en)
AU2486471A (en)
AU3025871A (en)
AU2503871A (en)
AU2456871A (en)
AU2577671A (en)
AU2588771A (en)
AU2654071A (en)
AU2455871A (en)
AU2669471A (en)
AU2885171A (en)
AU2684171A (en)

Legal Events

Date Code Title Description
PL Patent ceased