CH559378A5CH1116571ACH1116571ACH559378A5CH 559378 A5CH559378 A5CH 559378A5CH 1116571 ACH1116571 ACH 1116571ACH 1116571 ACH1116571 ACH 1116571ACH 559378 A5CH559378 A5CH 559378A5
Authority
CH
Switzerland
Application number
CH1116571A
Original Assignee
Oce Van Der Grinten Nv
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Publication date
Application filed by Oce Van Der Grinten NvfiledCriticalOce Van Der Grinten Nv
Publication of CH559378A5publicationCriticalpatent/CH559378A5/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/016—Diazonium salts or compounds
G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
B41N3/00—Preparing for use and conserving printing surfaces
B41N3/03—Chemical or electrical pretreatment
B41N3/036—Chemical or electrical pretreatment characterised by the presence of a polymeric hydrophilic coating
Landscapes
Physics & Mathematics
(AREA)
Spectroscopy & Molecular Physics
(AREA)
General Physics & Mathematics
(AREA)
Photosensitive Polymer And Photoresist Processing
(AREA)