CH549231A - Lichtempfindliches element. - Google Patents

Lichtempfindliches element.

Info

Publication number
CH549231A
CH549231A CH760369A CH760369A CH549231A CH 549231 A CH549231 A CH 549231A CH 760369 A CH760369 A CH 760369A CH 760369 A CH760369 A CH 760369A CH 549231 A CH549231 A CH 549231A
Authority
CH
Switzerland
Prior art keywords
sensitive element
light sensitive
light
sensitive
Prior art date
Application number
CH760369A
Other languages
German (de)
English (en)
Original Assignee
Gaf Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gaf Corp filed Critical Gaf Corp
Publication of CH549231A publication Critical patent/CH549231A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CH760369A 1968-05-22 1969-05-19 Lichtempfindliches element. CH549231A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73127968A 1968-05-22 1968-05-22
US73128068A 1968-05-22 1968-05-22

Publications (1)

Publication Number Publication Date
CH549231A true CH549231A (de) 1974-05-15

Family

ID=27112201

Family Applications (1)

Application Number Title Priority Date Filing Date
CH760369A CH549231A (de) 1968-05-22 1969-05-19 Lichtempfindliches element.

Country Status (6)

Country Link
US (2) US3556793A (xx)
CH (1) CH549231A (xx)
DE (1) DE1925551A1 (xx)
FR (1) FR2009112A1 (xx)
GB (2) GB1272618A (xx)
NL (1) NL6907878A (xx)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3647446A (en) * 1970-03-05 1972-03-07 Eastman Kodak Co Process for preparing high-relief printing plates
US3767398A (en) * 1971-10-26 1973-10-23 C Morgan Solid photoresist comprising a polyene and a polythiol
DE2203732C2 (de) * 1972-01-27 1983-06-01 Hoechst Ag, 6230 Frankfurt Mischpolymerisate und diese enthaltende lichtempfindliche Kopiermassen
US3969119A (en) * 1972-06-29 1976-07-13 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromaticglyoxy groups
US3888671A (en) * 1972-06-29 1975-06-10 Richardson Co Photoreactive compositions and products made therewith
US3926642A (en) * 1972-11-09 1975-12-16 Hercules Inc Photopolymer lithographic plate element
GB1488709A (en) * 1973-10-10 1977-10-12 Hercules Inc Photo-oxidizable compositions and elements
US4065314A (en) * 1975-06-09 1977-12-27 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromaticglyoxy groups
US4046577A (en) * 1975-06-09 1977-09-06 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromatic glyoxy groups
EP0002321B1 (en) * 1977-11-29 1981-10-28 Bexford Limited Photopolymerisable elements and a process for the production of printing plates therefrom
JPS5511217A (en) * 1978-07-10 1980-01-26 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method using radiation sensitive high polymer
US4289842A (en) * 1980-06-27 1981-09-15 Eastman Kodak Company Negative-working polymers useful as electron beam resists
US4412043A (en) * 1982-05-03 1983-10-25 E. I. Du Pont De Nemours And Company Vulcanizable ethylene copolymers
JPS5946643A (ja) * 1982-09-09 1984-03-16 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
IT1206738B (it) * 1985-07-01 1989-05-03 Eniricerche Spa Metodo per la terminazione di polimeri viventi ottenuti per polimerizzazione anionica di monomeri dienici e/o vinilaromatici e composti adatti allo scopo.
JPS6210104A (ja) * 1985-07-05 1987-01-19 Nitto Boseki Co Ltd 新規な感光性樹脂の製造方法
DE4016549A1 (de) * 1990-05-23 1991-11-28 Basf Ag Kunstharze
US5393798A (en) * 1992-06-05 1995-02-28 Spenco Medical Corporation Hydrogel material and method of preparation
US5514502A (en) * 1993-08-16 1996-05-07 Fuji Photo Film Co., Ltd. Photopolymerizable composition, color filter, and production of color filter
EP0786701A4 (en) * 1994-10-13 1998-08-12 Nippon Zeon Co PHOTO PAINT COMPOSITION
US5646215A (en) * 1996-10-31 1997-07-08 Dow Corning Corporation Polybutylene containing reactive unsaturated functionality
DE19653631A1 (de) * 1996-12-20 1998-06-25 Basf Coatings Ag Verfahren zum Herstellen von durch Strahlung vernetzbaren polymeren Acryl- oder Methacrylsäureestern

Also Published As

Publication number Publication date
DE1925551A1 (de) 1971-01-14
FR2009112A1 (xx) 1970-01-30
GB1275068A (en) 1972-05-24
GB1272618A (en) 1972-05-03
US3556793A (en) 1971-01-19
US3556792A (en) 1971-01-19
NL6907878A (xx) 1969-11-25

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Legal Events

Date Code Title Description
PL Patent ceased