CH526641A - Apparatus for applying a metallic coating to a substrate - Google Patents

Apparatus for applying a metallic coating to a substrate

Info

Publication number
CH526641A
CH526641A CH280470A CH280470A CH526641A CH 526641 A CH526641 A CH 526641A CH 280470 A CH280470 A CH 280470A CH 280470 A CH280470 A CH 280470A CH 526641 A CH526641 A CH 526641A
Authority
CH
Switzerland
Prior art keywords
applying
substrate
metallic coating
metallic
coating
Prior art date
Application number
CH280470A
Other languages
German (de)
Inventor
Clyde Elam Richard
Peter Talboom Frank
Original Assignee
United Aircraft Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Aircraft Corp filed Critical United Aircraft Corp
Publication of CH526641A publication Critical patent/CH526641A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
CH280470A 1969-03-13 1970-02-26 Apparatus for applying a metallic coating to a substrate CH526641A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80695769A 1969-03-13 1969-03-13

Publications (1)

Publication Number Publication Date
CH526641A true CH526641A (en) 1972-08-15

Family

ID=25195220

Family Applications (1)

Application Number Title Priority Date Filing Date
CH280470A CH526641A (en) 1969-03-13 1970-02-26 Apparatus for applying a metallic coating to a substrate

Country Status (11)

Country Link
US (1) US3590777A (en)
BE (1) BE744849A (en)
BR (1) BR7017400D0 (en)
CH (1) CH526641A (en)
DE (1) DE2012077B2 (en)
ES (1) ES376669A1 (en)
FR (1) FR2032895A5 (en)
GB (1) GB1273336A (en)
IL (1) IL33785A (en)
NL (1) NL7001998A (en)
SE (1) SE364075B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4242652A1 (en) * 1992-12-17 1994-06-23 Leybold Ag Electron beam deposition appts.

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2101638B (en) * 1981-07-16 1985-07-24 Ampex Moveable cathodes/targets for high rate sputtering system
US4433242A (en) * 1981-08-20 1984-02-21 Cabot Corporation ESR Hollows molten metal/slag interface detection
US4514469A (en) * 1981-09-10 1985-04-30 United Technologies Corporation Peened overlay coatings
DE3136465A1 (en) * 1981-09-15 1983-03-31 Siemens AG, 1000 Berlin und 8000 München Appliance and method for coating substrates by vapour deposition
US4744407A (en) * 1986-10-20 1988-05-17 Inductotherm Corp. Apparatus and method for controlling the pour of molten metal into molds
US5273102A (en) * 1991-06-05 1993-12-28 General Electric Company Method and apparatus for casting an electron beam melted metallic material in ingot form
US6145470A (en) * 1998-12-11 2000-11-14 General Electric Company Apparatus for electron beam physical vapor deposition
UA71572C2 (en) * 1999-08-04 2004-12-15 Дженерал Електрік Компані An electron beam physical vapor deposition apparatus for application of coating on articles
DE102005049906B4 (en) * 2005-10-17 2009-12-03 Von Ardenne Anlagentechnik Gmbh Method and apparatus for evaporating evaporation material
US20070141233A1 (en) * 2005-12-21 2007-06-21 United Technologies Corporation EB-PVD system with automatic melt pool height control
EP2025773A1 (en) * 2007-07-19 2009-02-18 Applied Materials, Inc. Vacuum evaporation apparatus for solid materials
US20090020070A1 (en) * 2007-07-19 2009-01-22 Michael Schafer Vacuum evaporation apparatus for solid materials
US20140261080A1 (en) * 2010-08-27 2014-09-18 Rolls-Royce Corporation Rare earth silicate environmental barrier coatings

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2415644A (en) * 1942-11-16 1947-02-11 Harold L Austin Method and apparatus for continuously applying a coating to a web and controlling the thickness of the same
US2584660A (en) * 1949-09-24 1952-02-05 Eastman Kodak Co Vacuum coating process and apparatus therefor
CH311812A (en) * 1951-11-05 1955-12-15 Zeiss Carl Fa Evaporation device.
US3167454A (en) * 1959-12-24 1965-01-26 Zenith Radio Corp Fluidized-bed type of coating apparatus
US3086889A (en) * 1960-03-21 1963-04-23 Stokes F J Corp Method and apparatus for coating a continuous sheet of material
US3347701A (en) * 1963-02-05 1967-10-17 Fujitsu Ltd Method and apparatus for vapor deposition employing an electron beam
FR84908E (en) * 1963-04-04 1965-05-07 Commissaria A L En Atomique Improvements in casting processes, in particular ingots, and in particular uranium carbide
US3373278A (en) * 1965-01-06 1968-03-12 United States Steel Corp Determination of vapor coating rate by x-rays emitted from said vapor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4242652A1 (en) * 1992-12-17 1994-06-23 Leybold Ag Electron beam deposition appts.

Also Published As

Publication number Publication date
ES376669A1 (en) 1972-05-01
SE364075B (en) 1974-02-11
NL7001998A (en) 1970-09-15
DE2012077A1 (en) 1970-09-17
IL33785A (en) 1973-07-30
US3590777A (en) 1971-07-06
FR2032895A5 (en) 1970-11-27
DE2012077B2 (en) 1974-01-03
BR7017400D0 (en) 1973-04-05
BE744849A (en) 1970-07-01
GB1273336A (en) 1972-05-10
IL33785A0 (en) 1970-03-22

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Legal Events

Date Code Title Description
PL Patent ceased